Visible Imaging Including Step Of Firing Or Sintering Patents (Class 430/198)
  • Patent number: 9155201
    Abstract: Conductive articles and devices have conductive micro-wires formed by curing a photocurable layer on a transparent flexible substrate that has a distortion temperature of less than 150° C. The photocurable layer has a viscosity <5,000 Pascal-seconds at the temperature micro-channels formation and the micro-channels having an average width of less than or equal to 4 ?m and an average depth to average width ratio that is greater than or equal to 1. The photocurable layer is exposed to curing ultraviolet radiation to form a pattern of photocured micro-channels and a conductive composition comprising metal nano-particles is formed in the photocured micro-channels. The conductive composition is cured in the pattern of photocured micro-channels to provide a pattern of conductive micro-wires in the pattern of photocured micro-channels on the transparent flexible substrate. Each of at least 50% of the conductive micro-wires has a sheet resistance of less than 0.025 ohms/sq.
    Type: Grant
    Filed: December 3, 2013
    Date of Patent: October 6, 2015
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Yongcai Wang, John Andrew Lebens, Mitchell Lawrence Wright, Julie A. Cummings
  • Patent number: 9091932
    Abstract: The disclosure relates to a three-dimensional integrated structure comprising a substrate and a plurality of projecting elements projecting from a flat surface thereof and obtained from a patterned and developed dry film photoresist. Advantageously, the three-dimensional integrated structure is highly defined, the projecting elements obtained by the patterned and developed dry film photoresist having a shape factor greater than 6. The three-dimensional integrated structure can be used to directly realize different type of electronic devices, such as microfluidic devices, microreactors or sensor devices.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: July 28, 2015
    Assignee: STMicroelectronics S.r.l.
    Inventors: Corrado Accardi, Stella Loverso, Sebastiano Ravesi, Noemi Graziana Sparta
  • Patent number: 9005879
    Abstract: A method for manufacturing an electrode for a display apparatus includes printing and drying a conductive paste on a substrate, and printing a glass paste on the dried conductive paste, followed by patterning.
    Type: Grant
    Filed: December 5, 2013
    Date of Patent: April 14, 2015
    Assignee: Cheil Industries, Inc.
    Inventors: Ah Reum Koo, Min Su Park, Dong Il Shin, Ryun Min Heo, Won Hee Lee, Myung Sung Jung, Chul Kyu Kim
  • Patent number: 8859193
    Abstract: An embodiment of the present invention provides a method of applying patterned metallization to a ceramic block comprising applying a photodefinable ink to said ceramic block; drying said ink; exposing said photodefinable ink to UV radiation through a predefined mask according to the thickness of the film to form a pattern; developing said pattern in a developer solution thereby forming a patterned ceramic block; and rinsing, drying and firing said patterned ceramic block.
    Type: Grant
    Filed: August 15, 2013
    Date of Patent: October 14, 2014
    Assignee: BlackBerry
    Inventors: Luna H. Chiu, Chen Zhang, John King, Barry Treadway, George Kang
  • Publication number: 20140091235
    Abstract: A scintillator panel including: a plate-like substrate; a grid-like barrier rib provided on the substrate; and a scintillator layer composed of a phosphor filled in cells divided by the barrier rib, wherein the barrier rib is formed of a material which is mainly composed of a low-melting-point glass containing 2 to 20% by mass of an alkali metal oxide. The scintillator panel is provided with a narrow barrier rib with high accuracy in a large area, and the scintillator panel has high luminous efficiency, and provides sharp images.
    Type: Application
    Filed: May 25, 2012
    Publication date: April 3, 2014
    Applicant: Toray Industries, Inc.
    Inventors: Yuichiro Iguchi, Tsubassa Hamano, Yasuhiro Kobayashi
  • Publication number: 20140022031
    Abstract: An embodiment of the present invention provides a method of applying patterned metallization to a ceramic block comprising applying a photodefinable ink to said ceramic block; drying said ink; exposing said photodefinable ink to UV radiation through a predefined mask according to the thickness of the film to form a pattern; developing said pattern in a developer solution thereby forming a patterned ceramic block; and rinsing, drying and firing said patterned ceramic block.
    Type: Application
    Filed: August 15, 2013
    Publication date: January 23, 2014
    Applicant: BLACKBERRY LIMITED
    Inventors: Luna H. Chiu, Chen Zhang, John King, Barry Treadway, George Kang
  • Patent number: 8535875
    Abstract: An embodiment of the present invention provides a method of applying patterned metallization to a ceramic block comprising applying a photodefinable ink to said ceramic block; drying said ink; exposing said photodefinable ink to UV radiation through a predefined mask according to the thickness of the film to form a pattern; developing said pattern in a developer solution thereby forming a patterned ceramic block; and rinsing, drying and firing said patterned ceramic block.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: September 17, 2013
    Assignee: Blackberry Limited
    Inventors: Luna H. Chiu, Chen Zhang, John King, Barry Treadway, George Kang
  • Patent number: 8283108
    Abstract: An embodiment of the present invention provides a method of applying patterned metallization to a ceramic block comprising applying a photodefinable ink to said ceramic block; drying said ink; exposing said photodefinable ink to UV radiation through a predefined mask according to the thickness of the film to form a pattern; developing said pattern in a developer solution thereby forming a patterned ceramic block; and rinsing, drying and firing said patterned ceramic block.
    Type: Grant
    Filed: March 19, 2007
    Date of Patent: October 9, 2012
    Assignee: Research in Motion RF, Inc.
    Inventors: Luna H. Chiu, Chen Zhang, John King, Barry Treadway, George Kang
  • Patent number: 8092982
    Abstract: Photosensitive paste compositions, barrier ribs of plasma display panels (PDPs) prepared using the same, and PDPs including the barrier ribs are provided. The photosensitive paste composition includes an organic-inorganic complex sol and an inorganic material, wherein the average refractive index (N1) of the organic-inorganic complex sol and the average refractive index (N2) of the inorganic material satisfy the equation ?0.2?N1?N2?0.2. Using the photosensitive paste composition, patterned barrier ribs for PDPs having high resolution and high precision can be made by exposure to light only once. Barrier ribs having higher reflective indices than conventional barrier ribs can also be obtained.
    Type: Grant
    Filed: March 25, 2008
    Date of Patent: January 10, 2012
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Beom-Wook Lee, Jong-Seo Choi, Kwi-Seok Choi, Dong-Hyun Kang, Seung-Han Lee, Myung-Duk Lim, Hoon-Bae Lee, Bum-Jin Chang, Min-Jae Lee
  • Patent number: 7829256
    Abstract: A photocuring composition includes black particles (A), black particles (B), an organic binder (C), a photopolymerizable monomer (D), and a photopolymerization initiator (E). The black particles (B) have a volume resistivity lower than the volume resistivity of the black particles (A) and an average diameter larger than the average diameter of the black particles (A).
    Type: Grant
    Filed: September 11, 2006
    Date of Patent: November 9, 2010
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventor: Kazunobu Fukushima
  • Publication number: 20100209843
    Abstract: The invention relates to forming an electrically functional pattern on a substrate. More specifically, the invention relates to a process for using a photosensitive element in combination with a sheet having a thick film composition applied to a support.
    Type: Application
    Filed: February 16, 2009
    Publication date: August 19, 2010
    Applicant: E. I. DU PONT DE NEMOURS AND COMPANY
    Inventor: ATSUHIKO SATO
  • Patent number: 7741013
    Abstract: A process for patterning thick film electrically functional patterns using a photosensitive polymer layer. A tacky photosensitive layer is applied onto a substrate surface. The photosensitive layer is imaged with a pattern using actinic radiation, the exposed areas of the photosensitive layer become hardened and non-tacky. A subsequent application of a thick film composition sheet will cause the thick film to adhere to the remaining tacky areas. Upon peeling the sheet, a thick film print pattern will be produced. This step is followed by a processing profile prescribed by the thick film composition used which results in a pattern having electrically functional properties. The invention also extends to a process wherein a thick film composition is recovered from a used sheet.
    Type: Grant
    Filed: February 21, 2006
    Date of Patent: June 22, 2010
    Assignee: E.I. du Pont de Nemours and Company
    Inventor: Roupen Leon Keusseyan
  • Patent number: 7678296
    Abstract: This invention is directed to black conductive compositions, black electrodes made from such compositions and methods of forming such electrodes. In particular, the invention is directed to a single layer bus electrode.
    Type: Grant
    Filed: February 29, 2008
    Date of Patent: March 16, 2010
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Ji-Yeon Lee, Michael F. Barker, Keiichiro Hayakawa, Hisashi Matsumo, Hiroaki Noda, Jerome David Smith
  • Patent number: 7648814
    Abstract: An object of the present invention is to provide a black paste composition suitable for use in laser direct imaging devices employing a light source emitting a laser having a maximum wavelength of 350 to 420 nm, useful in forming a high-definition black matrix pattern efficiently, and superior in storage stability, a black matrix pattern formed by using the composition, a plasma display having the pattern, and a method of forming the black matrix pattern by using the composition. An alkali development-type black paste composition of the present invention comprises (A) a carboxyl group-containing resin, (B) a glass frit, (C) a black pigment, (D) a compound having at least one radically polymerizable unsaturated group in its molecule, and (E-1) an oxime-based photopolymerization initiator represented by the following general formula (I).
    Type: Grant
    Filed: January 11, 2008
    Date of Patent: January 19, 2010
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventors: Masaki Sasaki, Kenji Kato, Masao Arima
  • Patent number: 7569165
    Abstract: The invention is directed to black conductive composition(s), black electrodes made from such compositions and methods of forming such electrodes. In particular, the invention is directed to flat panel display applications, including alternating-current display panel applications. Still further, the invention is directed to composition(s) utilizing conductive metal oxides selected from an oxide of two or more elements selected from Ba, Ru, Ca, Cu, Sr, Bi, Pb, and the rare earth metals and photocrosslinkable polymers. These compositions are particularly useful in making photoimageable black electrodes for flat panel display applications.
    Type: Grant
    Filed: March 7, 2006
    Date of Patent: August 4, 2009
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Michael F. Barker, Keiichiro Hayakawa, Jerome David Smith
  • Patent number: 7517632
    Abstract: An object of the present invention is to provide a silver paste composition suitable for use in laser direct imaging devices employing a light source emitting a laser having a maximum wavelength of 350 to 420 nm, useful in forming a high-definition conductive pattern efficiently, and superior in storage stability, a conductive pattern formed by using the composition, a plasma display having the pattern, and a method of forming the conductive pattern by using the composition. An alkali development-type silver paste composition of the present invention comprises (A) a carboxyl group-containing resin, (B) a glass frit, (C) a silver powder, (D) a compound having at least one radically polymerizable unsaturated group in its molecule, and (E-1) an oxime-based photopolymerization initiator represented by the following general formula (I).
    Type: Grant
    Filed: January 11, 2008
    Date of Patent: April 14, 2009
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventors: Masaki Sasaki, Kenji Kato, Masao Arima
  • Patent number: 7507519
    Abstract: Aspects of the invention can provide a patterning forming method capable of patterning a thin film by a simple and inexpensive device. The thin film can be provided on a base member including a photothermal conversion material that converts optical energy into thermal energy and light is radiated onto the base member to remove the thin film corresponding to a light-radiated region, such that the thin film is patterned.
    Type: Grant
    Filed: July 26, 2004
    Date of Patent: March 24, 2009
    Assignee: Seiko Epson Corporation
    Inventor: Naoyuki Toyoda
  • Patent number: 7498121
    Abstract: At least one plasma display panel having barrier ribs for partitioning discharge cells is manufactured from first and second substrates. The manufacturing method includes forming the barrier ribs according to a process including forming a barrier rib forming layer on the first substrate, forming a resist covering the barrier rib forming layer, patterning the resist to form openings thereof corresponding to a predetermined discharge cell pattern, etching the barrier rib forming layer according to the resist pattern, and baking the etched barrier rib forming layer. During the patterning of the resist, an area of an opening distal from a center of the first substrate is formed different from an area of an opening in the vicinity of the center of the first substrate.
    Type: Grant
    Filed: May 27, 2005
    Date of Patent: March 3, 2009
    Assignee: Samsung SDI Co., Ltd.
    Inventor: Joon-Hyeong Kim
  • Patent number: 7429438
    Abstract: A method of fabricating a color filter is provided, which includes the following steps. First, a loose composite film is formed. Next, the loose composite film is patterned to form a patterned composite film. Then, a treatment process is performed to dense the patterned composite film, thereby a color filter is formed.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: September 30, 2008
    Assignee: United Microelectronics Corp.
    Inventor: Yi-Tyng Wu
  • Publication number: 20080102384
    Abstract: A method of fabricating a color filter is provided, which includes the following steps. First, a loose composite film is formed. Next, the loose composite film is patterned to form a patterned composite film. Then, a treatment process is performed to dense the patterned composite film, thereby a color filter is formed.
    Type: Application
    Filed: October 27, 2006
    Publication date: May 1, 2008
    Applicant: United Microelectronics Corp.
    Inventor: Yi-Tyng Wu
  • Patent number: 7291444
    Abstract: The present invention relates to a photosensitive ceramic composite and a method for manufacturing a multilayer substrate using the composite. The photosensitive ceramic composite and manufacturing method of the present invention are applicable to circuit members and components for ceramic multilayer substrates for high-frequency wireless communication. The photosensitive ceramic composite contain inorganic particles and a photo sensitive organic components. The inorganic particles have at least surface sections containing an inorganic material having a refractive index less than that of inner sections of the inorganic particles.
    Type: Grant
    Filed: October 28, 2002
    Date of Patent: November 6, 2007
    Assignee: Toray Industries, Inc.
    Inventors: Tomoya Yamashiki, Takenori Ueoka, Mitsuyo Shimba
  • Patent number: 7238463
    Abstract: A method for manufacturing electrodes of a plasma display panel includes providing a front transparent substrate including transparent electrodes on the front transparent substrate, coating a black photosensitive paste film and a main photosensitive conductive paste film of negative-working type on the transparent electrodes, exposing the black photosensitive paste film and main photosensitive conductive paste film to define bus electrodes on the transparent electrodes, wherein exposure energy acting on main regions of the bus electrodes is greater than exposure energy acting on edge regions of the bus electrodes, developing the black photosensitive paste film and main photosensitive conductive paste film to form the bus electrodes, in which a thickness of the edge regions of the bus electrodes is less than a thickness of the main regions of the bus electrodes, and firing the black photosensitive paste film and main photosensitive conductive paste film.
    Type: Grant
    Filed: April 18, 2005
    Date of Patent: July 3, 2007
    Assignee: Chunghwa Picture Tubes, Ltd.
    Inventor: Ching-Hui Lin
  • Patent number: 7232496
    Abstract: The present invention provides a method for manufacturing an electronic part that can cope with downsizing, improvement in performance and quality of a multilayer electronic part.
    Type: Grant
    Filed: March 2, 2005
    Date of Patent: June 19, 2007
    Assignee: TDK Corporation
    Inventors: Masayuki Yoshida, Shunji Aoki, Junichi Sutoh, Genichi Watanabe
  • Patent number: 7214466
    Abstract: The invention is directed to a photoimageable composition comprising: (I) finely divided particles of inorganic material comprising: (a) functional phase particles selected from electrically conductive, resistive, and dielectric particles; (b) inorganic binder having a glass transition temperature in the range of from 325 to 600° C., a surface area of no greater than 10 m2/g and at least 85 wt. % of the particles having a size of 0.1–10 ?m; dispersed in: (II) an organic medium comprising: (a) aqueous developable polymer which is a copolymer, interpolymer or mixture thereof, wherein each copolymer or interpolymer comprises (1) a nonacidic comonomer comprising a C1-10 alkyl acrylate, C1-10 alkyl methacrylate, styrenes, substituted styrenes or combinations thereof and (2) an acidic comonomer comprising ethylenically unsaturated carboxylic acid containing moiety; (g) cationically polymerizable monomer; (h) photoinitiation system; and (i) organic solvent.
    Type: Grant
    Filed: December 14, 2005
    Date of Patent: May 8, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Haixin Yang, Mark R. McKeever
  • Patent number: 7146722
    Abstract: A bond pad structure comprising two bond pads, methods of forming the bond pad structure, an integrated circuit die incorporating the bond pad structure, and methods of using the bond pad structure are provided. Each of the bond pads comprise stacked metal layers, at least one lower metal layer and an upper metal layer. When the two pads are connected by a conductive material, they function as a single pad. The lower metal layer of one of the bond pads forms an extension that extends beneath the upper metal layer of the other of the bond pad. The lower metal extension functions to block the etching of a dielectric layer that is put down over the upper metal layers and the underlying substrate, for example, during a passivation etch to form the bond pad opening, to protect the substrate from damage.
    Type: Grant
    Filed: March 14, 2003
    Date of Patent: December 12, 2006
    Assignee: Micron Technology, Inc.
    Inventor: Guy Perry
  • Patent number: 7135267
    Abstract: The invention is directed to a photo-imageable composition precursor, the precursor composition comprising: (I) finely divided particles of inorganic material comprising: Functional phase particles selected from electrically conductive, resistive, and dielectric particles; inorganic binder having a glass transition temperature in the range of from 325 to 600° C.
    Type: Grant
    Filed: August 6, 2004
    Date of Patent: November 14, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Haixin Yang, Mark Robert McKeever
  • Patent number: 7128631
    Abstract: A system and method are described for self-aligning electrodes for color filters of passive matrix displays.
    Type: Grant
    Filed: November 14, 2003
    Date of Patent: October 31, 2006
    Assignee: Surface Logix, Inc.
    Inventors: Christopher H. McCoy, John T. Chen, David R. Beaulieu
  • Patent number: 7105256
    Abstract: A photosensitive conductive composition including a silver powder having an X-ray diffraction pattern in which a half width of a silver (111) peak is at least about 0.15°, an organic binder, a photopolymerizable monomer, a photopolymerization initiator and a lead-free glass.
    Type: Grant
    Filed: August 23, 2004
    Date of Patent: September 12, 2006
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventor: Kazunobu Fukushima
  • Patent number: 7105264
    Abstract: Exemplary embodiments of the present invention provide a method to form a patterned conductive film by modifying a conductive thin film on a substrate irrespective of the material used for the substrate. Exemplary embodiments include a substrate having a conductive layer containing a conductive material and a photothermal conversion layer containing a photothermal conversion material that converts light energy into heat energy that is irradiated with a laser beam to fire at least part of the conductive layer with the photothermal conversion material.
    Type: Grant
    Filed: September 1, 2004
    Date of Patent: September 12, 2006
    Assignee: Seiko Epson Corporation
    Inventor: Naoyuki Toyoda
  • Patent number: 7067028
    Abstract: A process for forming an image, the process including the steps of: forming, on a surface of an image receiving layer of an image receiving body A, an adhesive first image including an adhesive composition by using an electrophotographic technique; forming an inorganic pigment second image on the surface of the image receiving layer of the image receiving body A by transferring a transfer layer corresponding to the adhesive first image, transferring an inorganic pigment second image onto an image receiving body B, arranging the inorganic pigment second image on a surface of a ceramic material; and heating the ceramic material to sinter the inorganic pigment image onto the surface of the ceramic material.
    Type: Grant
    Filed: April 21, 2004
    Date of Patent: June 27, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiaki Aono
  • Patent number: 7060411
    Abstract: A dielectric paste of the present invention contains a binder resin, a cross-linking agent, a thermal polymerization initiator, and an inorganic powder, wherein the content of the thermal polymerization initiator is 3 to 30 parts by weight to 100 parts by weight of the total of the binder resin and the cross-linking agent. A method of manufacturing a plasma display, of the present invention, includes a first step of forming electrode patterns using an electrode paste, a second step of forming a dielectric paste coating film using a dielectric paste, a third step of forming barrier rib patterns using a barrier rib paste, a subsequent step of simultaneously firing at least the electrode patterns, the dielectric paste coating film, and the barrier rib patterns, and a step of performing curing after the second step.
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: June 13, 2006
    Assignee: Toray Industries, Inc.
    Inventors: Hiroko Mitsui, Junji Mata, Kentaro Okuyama, Akihiko Tanaka, Hitoshi Nobumasa
  • Patent number: 7026090
    Abstract: A process for forming an image, the process including the steps of: forming, on a surface of an image receiving layer of an image receiving body A, an adhesive first image including an adhesive composition by using an electrophotographic technique; forming an inorganic pigment second image on the surface of the image receiving layer of the image receiving body A by transferring a transfer layer corresponding to the adhesive first image, transferring an inorganic pigment second image onto an image receiving body B, arranging the inorganic pigment second image on a surface of a ceramic material; and heating the ceramic material to sinter the inorganic pigment image onto the surface of the ceramic material.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: April 11, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiaki Aono
  • Patent number: 7025649
    Abstract: A plasma display panel assembly includes electrodes and a dielectric layer covering the electrodes. The dielectric layer is formed of a low-melting-point glass, and the electrodes are formed of a metal containing a crystallized glass. The metal and the low-melting-point glass are simultaneously fired to complete the electrodes and the dielectric layer. Thus, in a manufacturing process of an AC plasma display panel, the number of firing steps can be reduced.
    Type: Grant
    Filed: December 22, 2004
    Date of Patent: April 11, 2006
    Assignee: Fujitsu Limited
    Inventors: Tsutae Shinoda, Norivuki Awaji
  • Patent number: 7018771
    Abstract: The present invention provides a highly reliable technology for manufacturing a substrate with protrusions. After filling an UV-curable transfer material into the grooves of an intaglio plate for transfer, the UV-curable transfer material is cured by irradiating UV rays under the conditions where it is exposed to an atmosphere that contains at least one of oxygen and ozone while a curing-inhibited portion is formed in an area of the UV-curable transfer material exposed to this atmosphere, and the UV-curable transfer material is transferred to the substrate to form the protrusions, while the curing-inhibited portion is made to adhere to the substrate.
    Type: Grant
    Filed: April 21, 2005
    Date of Patent: March 28, 2006
    Assignees: Fujitsu Limited, Advanced PDP Development Center Corporation
    Inventors: Osamu Toyoda, Kazunori Inoue, Akira Tokai
  • Patent number: 7011931
    Abstract: A process for forming an electrode pattern for a plasma display panel, the process including coating a photosensitive conductive paste on a film to form a pattern forming layer, laminating the film onto a substrate with the pattern forming layer facing the substrate, exposing the pattern forming layer from above the film through a mask, separating and removing the film and developing the pattern forming layer to remove unexposed areas, and firing the substrate to adhere the exposed areas of the pattern forming layer to the substrate, thus forming an electrode pattern thereon.
    Type: Grant
    Filed: November 1, 2001
    Date of Patent: March 14, 2006
    Assignee: Dai Nippon Printing, Co., Ltd.
    Inventors: Sakurako Hatori, Yasunori Kurima, Nobuaki Kimura, Yozo Kosaka, Satoru Kuramochi
  • Patent number: 7008754
    Abstract: By using a novel method, the exposure time of the photosensitive paste layer is reduced and the exposure fineness of the layer is improved, thereby developing a highly fine circuit substrate of high density having a thermal resistance at a reasonable cost. A circuit substrate is manufactured as follows. A photosensitive paste containing photoresist and a circuit material is applied onto a substrate surface so as to form a photosensitive paste layer (4). This photosensitive paste layer (4) is plotted by a laser beam (8) so as to form a plotted area (7). The photosensitive paste layer (4) is developed and an exposed area (4a) or an unexposed area (4b) is removed so as to form a circuit pattern (17). This circuit pattern (17) is sintered to form a circuit pattern (20) composed of the circuit material. It is possible to form a highly fine circuit pattern of high density by laser beam plotting.
    Type: Grant
    Filed: July 18, 2002
    Date of Patent: March 7, 2006
    Assignee: Daiken Chemical Co., Ltd.
    Inventors: Masatoshi Kato, Akio Harada
  • Patent number: 6974656
    Abstract: The present invention relates to a paste composition, including a bonding agent charged with a metallic powder, to be used in a prototyping procedure, a procedure for obtaining metallic products from said composition, and a metallic product obtained from said procedure. The composition is characterized by the fact that it includes: a bonding agent comprised of at least one photopolymerizable resin, with a viscosity of less than 4000 mPa.s, measured at 25° C., a photoinitiator, in a concentration greater than 0.2% by mass with respect to the mass of the resin, and a metallic powder in a volumetric concentration greater than 40% with respect to the composition, with said composition having a minimum reactivity on the order of 5 mm3/s per watt of lighting power.
    Type: Grant
    Filed: July 19, 2001
    Date of Patent: December 13, 2005
    Assignee: 3D Systems, Inc.
    Inventor: Catherine Hinczewski
  • Patent number: 6908723
    Abstract: A photo-patternable perfluorinated silane sol-gel material is presented that exhibits a high refractive index and propagation losses below 1 dB/cm at the telecommunication wavelengths. The sol-gels are produced with general formula [(CH2)n,R?—Si(O)2]x—[Si(O)4]y—[R?—Si(O)3]z—[R?(CH2)n—M(O)3]w—[R??(CH2)n—Si(O)3]v where O is oxygen, Si is silicon, M is a metal alkoxyde known to form bonds with organic compounds through oxygen donor ligands, and where , R? and R?? are photo cross-linkable groups, and where (CH2)n are alkyl spacers with n being an integer ?0. The sol-gels can be fabricated to produce complex waveguide structures directly onto silica-on-silicon substrates with low bending losses.
    Type: Grant
    Filed: August 15, 2002
    Date of Patent: June 21, 2005
    Assignee: NP Photonics, Inc.
    Inventors: Amir Fardad, Wei Liang, Yadong Zhang
  • Patent number: 6827275
    Abstract: To track a large number of tools, the tools are kept in sets with each set having a container. A silhouette of each tool stored in the container is printed at the point of storage along with a data matrix symbology that has stored in binary code a description of the tool, the part number, and an identification of the kit of which it is a part. The associated tool has etched into the surface thereof a data matrix symbology containing the same information as the code printed at the point of storage. The data matrix symbology is readable by a scanner and a record of all the tools is maintained on a computer. Metal tools, may have a chrome, black oxide or stainless steel surface. To prepare the surface of a metal tool for receiving a data matrix symbology applied by a laser, the surface is sand blasted and coated with an suitable epoxy to inhance contrast.
    Type: Grant
    Filed: January 22, 2003
    Date of Patent: December 7, 2004
    Assignee: UFP Technologies, Inc.
    Inventor: Philip L. Allen
  • Publication number: 20040241585
    Abstract: By using a novel method, the exposure time of the photosensitive paste layer is reduced and the exposure fineness of the layer is improved, thereby developing a highly fine circuit substrate of high density having a thermal resistance at a reasonable cost. A circuit substrate is manufactured as follows. A photosensitive paste containing photoresist and a circuit material is applied onto a substrate surface so as to form a photosensitive paste layer (4). This photosensitive paste layer (4) is plotted by a laser beam (8) so as to form a plotted area (7). The photosensitive paste layer (4) is developed and an exposed area (4a) or an unexposed area (4b) is removed so as to form a circuit pattern (17). This circuit pattern (17) is sintered to form a circuit pattern (20) composed of the circuit material. It is possible to form a highly fine circuit pattern of high density by laser beam plotting.
    Type: Application
    Filed: March 11, 2004
    Publication date: December 2, 2004
    Inventors: Masatoshi Kato, Akio Harada
  • Patent number: 6815149
    Abstract: Provision of a manufacturing method for forming lamination of a plurality of dielectric layers on a substrate of a plasma display panel. A forming process for forming a photosensitive glass material layer and a patterning process for exposing required regions of the resulting photosensitive glass material layer to light are repeated in each formation of a first photosensitive glass material layer L1 and a second photosensitive glass material layer L2. After completion of the individual forming process and the individual patterning process for each of the first and second photosensitive glass material layers L1 and L2, a developing process for removing the unexposed regions and a burning process following the developing process are each performed on both of the first and second photosensitive glass material layers L1 and L2 together.
    Type: Grant
    Filed: March 11, 2003
    Date of Patent: November 9, 2004
    Assignees: Pioneer Corporation, Pioneer Display Products Corporation
    Inventors: Hirofumi Higashi, Shingo Ogane
  • Patent number: 6806021
    Abstract: Disclosed is a method of forming a pattern comprising coating a solution containing a compound having a silicon-nitrogen linkage in the main chain thereof over a surface of a working film to form a mask, replacing the nitrogen in the mask by oxygen, forming a resist film on a surface of the mask, forming a resist pattern by subjecting the resist film to a patterning exposure and to a developing treatment, transcribing the resist pattern to the mask to form a masking pattern, and transcribing the masking pattern to the working film to form a working film pattern.
    Type: Grant
    Filed: April 1, 2002
    Date of Patent: October 19, 2004
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yasuhiko Sato, Yasunobu Onishi
  • Publication number: 20040197695
    Abstract: A process for forming an image, the process including the steps of: forming, on a surface of an image receiving layer of an image receiving body A, an adhesive first image including an adhesive composition by using an electrophotographic technique; forming an inorganic pigment second image on the surface of the image receiving layer of the image receiving body A by transferring a transfer layer corresponding to the adhesive first image, transferring an inorganic pigment second image onto an image receiving body B, arranging the inorganic pigment second image on a surface of a ceramic material; and heating the ceramic material to sinter the inorganic pigment image onto the surface of the ceramic material.
    Type: Application
    Filed: April 21, 2004
    Publication date: October 7, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Toshiaki Aono
  • Patent number: 6800166
    Abstract: The invention relates to a transfer sheet suitable for the formation of electrode patterns, dielectric layers, barrier layers, etc. in plasma display panels (PDPs), field emission displays (FEDS), liquid crystal displays (LCDs), fluorescent displays, hybrid integrated circuits, etc. The transfer sheet comprises a base film and a transfer layer releasably provided on the base film, optionally with a protective film provided on the transfer layer. The transfer layer comprises an inorganic component including a glass frit and an organic component removable by firing, optionally with an electrically conductive powder.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: October 5, 2004
    Assignee: Dal Nippon Printing Co., Ltd.
    Inventors: Yozo Kosaka, Katsuhiko Mizuno, Sakurako Hatori, Kounosuke Tanaka, Nobuaki Kimura, Toshihiko Takeda
  • Patent number: 6790583
    Abstract: A method of producing a light absorbing pattern film coated article with a transmitted light spectrum distribution corresponding to the pattern of a photomask, wherein a light absorbing film coating solution, containing a silicon oxide raw material, a titanium oxide raw material, which contains titanium oxide microparticles, and a gold microparticle raw material, is coated onto the surface of a substrate, the photomask is positioned on top of said coated film, ultraviolet light is irradiated onto said coated film, and said coated film is thereafter heated. By the abovementioned method of producing, this invention can provide light absorbing film coated articles with various transmitted light spectra distribution while keeping the visible light reflectivity low.
    Type: Grant
    Filed: June 22, 2001
    Date of Patent: September 14, 2004
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventor: Mitsuhiro Kawazu
  • Patent number: 6723494
    Abstract: A conductor pattern is constructed to prevent corners from peeling and raising off a substrate. The conductor pattern has a spiral configuration and includes straight lines and corners connected to the straight lines. The bottom surface cross-sectional width of the conductor pattern is smaller than the top surface cross-sectional width thereof. Moreover, the bottom surface cross-sectional width of the corner is larger than the bottom surface cross-sectional width of the straight line.
    Type: Grant
    Filed: July 12, 2001
    Date of Patent: April 20, 2004
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Yasuhiro Nakata, Keishiro Amaya
  • Publication number: 20040033309
    Abstract: A photo-patternable perfluorinated silane sol-gel material is presented that exhibits a high refractive index and propagation losses below 1 dB/cm at the telecommunication wavelengths. The sol-gels are produced with general formula [(CH2)n, R′—Si(O)2]x—[Si(O)4]y—[R′—Si(O)3]z—[R″(CH2)n-M(O)3]w—[R′″(CH2)n—Si(O)3]v where O is oxygen, Si is silicon, M is a metal alkoxyde known to form bonds with organic compounds through oxygen donor ligands, and where , R″ and R′″ are photo cross-linkable groups, and where (CH2)n are alkyl spacers with n being an integer ≧0. The sol-gels can be fabricated to produce complex waveguide structures directly onto silica-on-silicon substrates with low bending losses.
    Type: Application
    Filed: August 15, 2002
    Publication date: February 19, 2004
    Applicant: NP Photonics, Inc.
    Inventors: M.A. Fardad, Wei Liang, Yadong Zhang
  • Patent number: 6692885
    Abstract: Disclosed is a method of fabricating barrier ribs in a plasma display panel using photosensitive glass powder includes the steps of preparing photosensitive glass powder by reducing a photosensitive glass material to fine powder, putting the photosensitive glass powder or the photosensitive glass powder mixed with a UV-ray transmitting organic material in a mold, aligning a photomask over the photosensitive glass powder and carrying out exposure thereon, carrying out first and second thermal treatment on the photosensitive glass powder so as to generate different crystalline phases at exposed and non-exposed portions, respectively, and forming barrier ribs by etching the portion where the crystalline phase is generated.
    Type: Grant
    Filed: December 28, 2001
    Date of Patent: February 17, 2004
    Assignee: LG Electronics Inc.
    Inventor: Myung-Won Lee
  • Patent number: 6664029
    Abstract: A pattern-forming method which comprises the following steps: (1) laminating an actinic ray-curable coating film layer onto the surface of an insulating film-forming resin layer. (2) irradiating directly or through a photomask an actinic ray or host wave thereonto so as to obtain a predetermined pattern. (3) subjecting the actinic ray-curable coating film layer to a developing treatment to form a resist pattern coating film consisting of the actinic ray-curable coating film layer, (4) and subjecting the insulating film-forming resin layer to a developing treatment, followed by removing.
    Type: Grant
    Filed: August 30, 2000
    Date of Patent: December 16, 2003
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Genji Imai, Kengo Ohnishi, Hiroyuki Honma, Hideo Kogure
  • Patent number: 6656665
    Abstract: The invention concerns a method for producing a pattern on a transparent substrate, particularly a glass or glass-ceramic substrate. According to the invention, there is deposited on at least one area of one face of the substrate, a first layer of a photosensitive resin comprising at least one sensitizing agent and at least one photosensitive compound essentially composed of a polymer with an average degree of cross-linking d° such that it is able to absorb solid particles. Certain areas of said first layer are exposed to light, particularly in order to increase, in a controlled manner, the average degree of cross-linking do of said polymer so as to modulate its absorption capacity. On the first layer is deposited at least one second layer of a mineral-particle-based composition. The substrate is subjected to at least one treatment cycle, particularly in order to fix said mineral particles. The invention also concerns the substrate produced by this method and its applications.
    Type: Grant
    Filed: November 20, 2000
    Date of Patent: December 2, 2003
    Assignee: Saint-Gobain Vitrage
    Inventors: Yves Demars, Jean-Christophe Elluin, Gilles Longchampt