Abstract: A method for manufacturing an organic device includes the steps of applying a photoresist onto at least an active first region arranged on a substrate of the organic device, and removing the photoresist from the substrate in a second region adjacent to the active first region. Additionally, the method includes the steps of applying a passivation layer onto the first and second regions and removing the photoresist and the passivation layer in the active first region.

Abstract: According to one embodiment, generating virtual data by mirroring data based on a dimension measurement result in a measurement region on an inner side of a shot region to a non-shot region on an outer side of a shot edge, and calculating dose data of the measurement region and a non-measurement region based on data in the measurement region and the virtual data are included.

Abstract: Described herein are improved methods of forming polymer films, the polymer films formed thereby, and electronic devices formed form the polymer films. The methods generally include contacting a polymer with a solvent to at least partially solvate the polymer in the solvent, exposing the at least partially solvated polymer and solvent to ultrasonic energy for a duration effective to form a plurality of ordered assemblies of the polymer in the solvent, and forming a solid film of the polymer, wherein the solid film comprises the plurality of ordered assemblies of the polymer.

Abstract: A thin film patterning method may include forming a thin film by coating a precursor solution containing a precursor of metal oxide onto a substrate, soft baking the thin film, exposing the thin film to light by using a photomask, developing the thin film, and hard baking the developed thin film. The precursor may include metal acetate, for example, a zinc acetate-based material, and the metal oxide thin film may include zinc oxide (ZnO).

Abstract: An impurities elimination apparatus including a base plate, a first nozzle for removing impurities on the base plate using air suction, a glass substrate disposed on the base plate, and a second nozzle for coating the glass substrate with an organic material.

Abstract: A method of forming a topographical pattern in a surface of a resist layer, comprising sequential steps of: (a) providing a substrate having a surface; (b) forming a desired thickness resist material layer on the substrate surface; (c) subjecting selected areas of the surface of the resist layer to exposure to an energy beam to form therein a latent image of a desired topographical pattern to be formed therein; (d) contacting the surface of the resist layer with a liquid developing solution comprising a preselected solvent for developing the latent image into the desired topographical pattern while simultaneously supplying ultrasonic energy thereto, the combination of supplying the ultrasonic energy to the preselected solvent providing an increased developing interval and improved image contrast between the exposed and unexposed areas of the layer of resist material, relative to when the liquid developing solution does not comprise the preselected solvent and the ultrasonic energy is not supplied thereto.

Abstract: A color image forming method and apparatus using larger microcapsules each of which contains a plurality of kinds of smaller microcapsules scattered within the larger microcapsule, reacting substances that are mixed with each other to perform a coloring reaction being scattered inside and outside the smaller microcapsule. A protective wall of each smaller microcapsule is broken with a corresponding predetermined ultrasonic stimulus depending upon color component information to thereby cause the reacting substances to diffuse with each other to perform a coloring reaction and hence image printing. The conditions for breaking the protective walls of the respective smaller microcapsules that contain a color former component vary from smaller microcapsule to smaller microcapsule, or are determined depending upon the outer shapes, materials and thickness of the protective walls of the smaller microcapsules.

Abstract: Silver-free, aqueous-based direct thermographic materials are designed to have image tone with near neutral density. Without the use of organic silver salts containing reducible silver ions, the image is formed using a color developing agent precursor that releases a color developing agent when heated to a temperature of at least 80° C., a combination of cyan, yellow and magenta dye-forming color couplers that provide cyan, yellow, and magenta dyes, and a substituted or unsubstituted benzoquinone as an oxidizing agent. No silver metal or silver ions are purposely added to these materials. This combination of components provides a means for controlling image tone without reliance upon conventional toning agents.

Abstract: Silver-free, aqueous-based direct thermographic materials are designed to have image tone with near neutral density. Without the use of organic silver salts containing reducible silver ions, the image is formed using a color developing agent precursor that releases a color developing agent when heated to a temperature of at least 80° C., a combination of cyan, yellow and magenta dye-forming color couplers that provide cyan, yellow, and magenta dyes, and a hindered-amine N-oxyl as an oxidizing agent. No silver metal or silver ions are purposely added to these materials. This combination of components provides a means for controlling image tone without reliance upon conventional toning agents.

Abstract: A method of forming a resist pattern on a semiconductor substrate, includes forming a resist film on the semiconductor substrate, and supplying a developing solution on the resist film to remove the resist film, wherein a portion of the resist film remains on the semiconductor substrate. The method also includes providing a rinsing liquid from a rinsing liquid supplying nozzle on the semiconductor substrate on which the patterned resist film is formed in such a way that the rinsing liquid remains on the semiconductor substrate by surface tension, ultrasonic vibration being applied to the rinsing liquid supplying nozzle, and removing the rinsing liquid remaining on the semiconductor substrate.

Abstract: The invention is a developer system for developing a PMMA photoresist having exposed patterns comprising features having both very small sizes, and very high aspect ratios. The developer system of the present invention comprises a developer tank, an intermediate rinse tank and a final rinse tank, each tank having a source of high frequency sonic agitation, temperature control, and continuous filtration. It has been found that by moving a patterned wafer, through a specific sequence of developer/rinse solutions, where an intermediate rinse solution completes development of those portions of the exposed resist left undeveloped after the development solution, by agitating the solutions with a source of high frequency sonic vibration, and by adjusting and closely controlling the temperatures and continuously filtering and recirculating these solutions, it is possible to maintain the kinetic dissolution of the exposed PMMA polymer as the rate limiting step.

Abstract: A method of forming a resist pattern on a substrate, comprises the steps of: forming a resist film on the substrate, supplying a developing solution onto the resist film, submerging the substrate and the resist film formed thereon in a rinsing liquid kept in a rinsing tank, and applying ultrasonic vibration to the rinsing liquid to rinse the developing solution from the resist film submerged in the rinsing liquid.

Abstract: A method of patterning electrically conductive polymers is: forming a surface of a conducting polymer on a substrate, applying a mask to this surface, applying irradiation to form regions of exposed conducting polymer and regions of unexposed conducting polymer, removing the mask, and gently removing by non-chemically reactive means the regions of exposed conducting polymer.

Abstract: A process and system are provide for determining the acceptability of a fluid dispense such as a discrete volume of fluid used to coat a substrate. The fluid dispense is exposed to an energy source and the energy transmitted by the fluid dispense is detected to determine the shape of the fluid dispense. The fluid dispense shape and the timing of the beginning and end of the dispense are compared to previously generated standard dispense profiles and used to determine the acceptability of the shape and/or timing of the fluid dispense. The output from the sensor is used to control further processing of the substrate.

Abstract: A coating apparatus for forming a film on a surface of a substrate to be coated, comprises a holding table for holding the substrate to be coated, a discharge head, containing a coating solution and formed with a plurality of discharge holes at a portion thereof opposing the substrate to be coated, for discharging the coating solution, a fine-vibration plate for applying fine vibrations to discharge the coating solution and driving motor for driving the holding table and the discharge head relative to each other.

Abstract: A method of removing photoresist film with high efficiency of removal and friendliness with the environment while reducing the material consumption and the cost for the ventilation facility, and an apparatus used for the method are provided.

Abstract: There are provided methods for making a reticle for use in a photolithography process, comprising forming at least two printable features on a reticle substrate, and forming at least one sub-resolution connecting structure on the reticle substrate, the sub-resolution connecting structure connecting at least two of the printable reticle features, as well as reticles formed according to such methods. In addition, there are provided computer-implemented methods for designing such a reticle, as well as computer readable storage media, computer systems and computer programs for use in making such reticles. In addition, there are provided photolithographic processes using such a reticle. The reticle may be a binary mask, a phase shift mask, or an attenuated phase shift mask.

Abstract: A method of removing photoresist film with high efficiency of removal and friendliness with the environment while reducing the material consumption and the cost for the ventilation facility, and an apparatus used for the method are provided.

Abstract: In a reticle for transferring a pattern onto a photosensitive layer by a photolithography process, the reticle has a principal pattern and an accessory pattern, and the accessory pattern is divided into a set of continuously arranged sub-patterns.

Abstract: A method of forming a resist pattern on a substrate, comprises the steps of: forming a resist film on the substrate, supplying a developing solution onto the resist film, submerging the substrate and the resist film formed thereon in a rinsing liquid kept in a rinsing tank, and applying ultrasonic vibration to the rinsing liquid to rinse the developing solution from the resist film submerged in the rinsing liquid.

Abstract: A method of forming a resist pattern on a substrate, comprises the steps of: forming a resist film on the substrate, supplying a developing solution onto the resist film, submerging the substrate and the resist film formed thereon in a rinsing liquid kept in a rinsing tank, and applying ultrasonic vibration to the rinsing liquid to rinse the developing solution from the resist film submerged in the rinsing liquid.

Abstract: An improved microlithographic imaging system (100) is disclosed. The system comprises a filter (183) substantially aligned with a first image plane, adjacent to an aperture (185). The filter is formed in response to an image projected by a light source (110) through a reticle (160) onto the first image plane. The improved microlithographic imaging system has higher resolution and depth of focus than prior art imaging systems, due to the additional filtering performed by the filter (183). A filter in accordance with the invention can be fabricated easily and inexpensively, using conventional microlithography techniques. A filter in accordance with the invention can also be used to detect or correct flaws in the reticle (160).

Abstract: The inventive dispenser mechanism uniformly develops a photosensitive layer on a substrate. The mechanism uses a developer head that moves in a substantially linear relative motion with respect to the substrate and dispenses a developer at a controlled rate. Contact of the developer material with the photosensitive layer commences a chemical reaction of developing. The mechanism also uses a rinse head that has the same motion as the developer head and travels at the same velocity. The rinse head dispenses a rinse material at a controlled rate. Contact of the rinse material with the developer material on the photosensitive layer retards the chemical reaction of developing. The rinse head waits for a predetermined dwell period after the developer head has dispensed the developer material before dispensing the rinse material. The mechanism may also use a suction head that has the same motion and velocity and removes loose material on a surface of the substrate.

Abstract: A method and an apparatus are disclosed for enhancing the solution diffusibility of a developing liquid in a semiconductor wafer developing unit through the agitation of the liquid by acoustic power. Two embodiments are described using sonic and ultrasonic waves. In the first embodiment, a sonic wave couples into the developing liquid, agitating it and thereby enhancing its solution diffusibility. In the second embodiment, an ultrasonic wave couples into the semiconductor wafer, causing the photoresist pattern to vibrate, again enhancing the solution diffusibility of the developing liquid.

Abstract: A method for forming a layer of resist on a non-planar substrate includes the steps of: dispensing resist onto the substrate; spinning the substrate to spread the resist; and then vibrating the substrate to eliminate voids in the resist. Optionally, the substrate can be inverted and vibrated at the same time to distribute the resist over the sidewalls of any projections or plateaus on the non-planar substrate. Following the vibrating and optional inversion steps, the resist is partially hardened, an edge bead is removed and a backside of the resist is washed. These steps are followed by soft bake, exposure and development of the layer of resist.

Abstract: A method is described for preparing a concentrated dispersion of a photographically useful compound ready-for-use in coating solutions of hydrophilic colloid layers of a silver halide photographic material, wherein said compound has at least one ionisable acid site on its molecule, the said method comprising the steps of deprotonising and solubilising the said compound in alkaline medium; microprecipitating the said compound and milling the microprecipitated compound obtained, coating the said dispersion of a photographically useful compound in non-light-sensitive and/or light-sensitive hydrophilic layers of a silver halide photographic material, wherein milling proceeds during and/or after the microprecipitating step.

Abstract: A method for manufacturing optical components having a periodic or quasi-periodic structure such as diffraction gratings, volume holograms or distributed feedback mirrors in optical fibers. An optical medium is subjected to acoustic waves which induce periodic or quasi-periodic changes in the optical properties of the medium, the changes being at least partially retained on removal of the waves. The changes may result from stress associated with the antinodes of an acoustic standing wave, alteratively the stress distribution associated with a travelling acoustic wave in an electro-viscous liquid may be semi-permanently retained by the solidification of the material resulting from the application of an electric field.

Abstract: A single resist layer lift-off process for forming patterned layers on a substrate, wherein a post-soak bake is used to control the extent to which chlorobenzene penetrates the resist layer. A post-metallization bake can also be employed to improve lift-off of the resist layer. The process of the present invention provides the resist profile with increased overhang length and the sidewalls of the resist profile with a negative slope. Such increased overhang length and negative slope prevent metallization of the sidewalls of the resist, and thus facilitate more rapid removal of the resist during lift-off.

Abstract: A color filter is produced through the steps of: forming a layer of a color filter material including a colorant dispersed in a photosensitive resin on a substrate; and pre-baking, exposing and developing the color filter material layer to leave a color filter pattern on the substrate. In the developing step, a developer liquid is applied in the form of a curtain onto the exposed color filter material layer on the substrate, the substrate is allowed to stand in a substantially still state and then the substrate is supplied with an ultrasonic wave projected perpendicularly to the substrate while being in contact with the developer liquid. The ultrasonic wave is preferably uniformized by at least two rotating reflection or diffusion plates before it is projected onto the substrate. As a result, the color filter pattern can be developed with little development irregularity even on a large-size substrate.

Abstract: Laminates of aluminum and plastic form the substrate of printing plate precursors that are suitable for imaging in conventional roll-fed imagesetters or phototypesetters.

Abstract: A thermal imaging process comprising the step of imagewise heating a donor element so as to transfer therefrom colored matter onto a contacting receptor element, characterized in that before said imagewise heating said receptor element contains in a layer at least one substance that by heat applied in the transfer of said colored matter undergoes a change giving rise to an increase in optical density.

Abstract: Disclosed herein is a method of forming a thin film pattern on a semiconductor substrate, which comprises a step of forming a photosensitive thin film on a semiconductor substrate, a step of exposing the photosensitive thin film with a fine pattern, a step of performing ultrasonic treatment on the exposed thin film, and a step of developing the ultrasonic-treated thin film for forming a fine pattern.

Abstract: A barrier rib forming method for a PDP including a process of forming an emulsion layer as a filmed deposition upon a glass substrate having transparent electrodes thereon. Exposing the film to ultraviolet rays to produce electrodes with a proper pattern of an emulsion layer thereon. Printing, drying and heating a glass paste deposited on said emulsion. Ultrasonically vibrating the glass substrate to remove the emulsion layer and glass paste from the glass substrate.

Abstract: The present invention relates to a durable pattern forming material having a protective film comprising a radiation cured product of a curable compound, comprising a phosphazene of the formula:--{NP(x) (Y)}.sub.n --wherein at least one of x and y is a polymerizable group and n is at least 3, superior in mechanical, optical and chemical properties which is characterized in that a cured protective film of a curable compound is formed on a photo mask or lith film on which a pattern of desired shape has been provided. This pattern forming material can be suitably used for formation of pattern in production of IC, printed circuit and hybrid IC.

Abstract: A method of forming visible images on a differentiated background comprises the application of thermal energy to a coating of metastable metal colloid on a support. Thermal energy is able to convert the metastable metal colloid to a stable spheroidal form. Computer control of a laser beam or thermal print head can be employed to provide highly resolved images carrying graphic, digital and textural information.

Abstract: A method and apparatus for premetered "patch" coating discrete, incremental surfaces or substrates, such as printed circuit boards, integrated circuits and the like, with a pre-configured layer of a liquid in which a controlled volume per unit area of the liquid is applied to the substrate are disclosed. The liquid is dispensed from an applicator slot that is fluidly coupled to a liquid containing chamber. The volume of the liquid in the liquid containing chamber is varied in order to (1) sharply and distinctly start the coating "patch" by producing a pulse of liquid that flows out of the applicator slot to form a connecting bead of liquid coating on the coating surface and (2) sharply and distinctly terminate the coating "patch" by removing the bead of liquid connecting the applicator slot with the coated surface. The width of the coated "patch" is determined by the length of the applicator slot.

Abstract: An ultrasonic pixel printer is disclosed in which ultrasonic energy is applied to a dye receiver layer to cause the dye to melt and/or sublime and transfer to a receiver.

Abstract: A thermal printer is disclosed in which ultrasonic energy is converted to heat a dye image in a receiver to cause such dye to fuse into such receiver.

Abstract: Disclosed is a photo-pressure sensitive recording sheet developing apparatus in which vibratory pressure generated by an ultrasonic wave generating means is applied to a photo/pressure sensitive recording sheet using microcapsules carrying a latent image formed through exposure to thereby develop the photo/pressure sensitive recording sheet by the vibratory pressure. Preferably, the ultrasonic wave generating means is formed as a single resonance system and has parallel surfaces opposite to each other, each of the opposite surfaces having a vibration mode so that the opposite surfaces are displaced in the directions opposite to each other and substantially along a vertical axis of the opposite surfaces.

Abstract: A process for modifying structural profiles produced by polymerization or depolymerization in resist layers. As a function of the acoustic impedance of the substrate carrying the resist layer, the structures are irradiated with an ultrasonic beam. An ultrasonic beam for which the substrate represents a high impedance is used in order to enhance the contrast of the structures. An ultrasonic beam for which the substrate represents a low impedance is used to weaken the contrast. An acoustic microscope is especially suitable for carrying out the process.

Abstract: When developing a coating such as for instance a light-sensitive exposed layer on a length or plate of material through ultrasonic agitation, the material is carried at a short distance or closely past a bar or a pipe extending substantially perpendicular to the advancing direction of the material and in the entire width of the coating. The bar or the pipe is caused to vibrate by a plurality of ultrasonic transducers while a developer is applied onto the coating adjacent the bar or the pipe in such a manner that the vibrations are transferred from the vibrating bar or pipe to the developer and to a stripe-shaped transverse area of the plate/the length including the coating. In this manner only the part of the developer having touched the ultrasonically agitated pipe or bar or already having hit the stripe of material currently developed is caused to vibrate by the ultrasonic transducers.

Abstract: A process for the production of structures by the polymerization, or fragmentation of resist layers comprising the steps of effecting an incomplete exposure of the resist layer corresponding to the pattern of the structures, and of fully developing the structure in the resist layer by ultrasonic irradiation.An acoustic microscope is preferably used for the ultrasonic irradiation, whereby the formation of the structure in the resist layer may also be observed.

Abstract: In the developing of light sensitive plates, the plates are passed through a tank of developing liquid which is subject to ultrasonic waves to assist the developing action. The tank is preferably protected from the atmosphere to hinder degradation of the developing liquid.

Abstract: An apparatus and method of use thereof is provided for use in pigment printing wherein the apparatus provides for regulated and repeatable results in the development of colored photographic pigmented gelatin images.

Abstract: A process for producing relief copies wherein the light-hardenable layer of a light-hardenable copying material, which contains a photopolymerizable mixture, a photodimerizable polymeric compound or a diazonium salt polycondensation product, is exposed to a light image, the exposed layer is subjected to a brief ultrasonic treatment, and the unexposed areas of the layer are thereafter washed away by means of a developer. As a result of the ultrasonic treatment, shorter exposure times may be used and better in-depth hardening of the layer may be achieved.

Abstract: A process is disclosed for recording an ultrasonic exposure pattern employing an ultrasonographic element containing a support and a recording layer unit. The recording layer unit is placed into contact with a transport liquid and imagewise ultrasonically exposed to accelerate imagewise diffusion from the recording layer unit to the transport liquid, thereby producing in the recording layer unit an ultrasonographic record. Diffusion is further accelerated imagewise by establishing a temperature differential within the transport liquid adjacent the recording layer unit.

Abstract: An ultrasonographic element is disclosed comprised of first and second layers coated on a support, at least one of the layers being a silver halide emulsion layer. One of the layers contains a diffusible ion capable of altering the sensitivity of a silver halide emulsion while the other layer is capable of immobilizing the diffusible ion. Interposed between the layers is a barrier for impeding diffusion of the sensitivity altering ion in the absence of ultrasound. An ultrasonographic image is formed by contacting the element with a transport liquid, ultrasonically exposing the element imagewise to accelerate diffusion of the sensitivity altering ion between the layers, exposing the element to electromagnetic radiation and photographically processing the element to produce an image corresponding to the image pattern of ultrasonic exposure.

Abstract: A method for producing a visible image of an object is disclosed in which a fermental plate is illuminated with ultrasonic waves and a latent image of the object is therefore produced therein which is developed using a solution of chromogenic substrates, comprising, for example, hydrogen peroxide and a water-soluble aromatic amine. An apparatus to practice the disclosed method comprises an ultrasonic generator to generate ultrasonic waves illuminating the object, a fermental plate to receive and convert the ultrasonic waves passed through the object to a visible image, and a tray filled with a developer to develop the latent image of the object in the fermental plate.

Abstract: An ultrasonographic exposure apparatus is disclosed. An ultrasound transducer is positioned in a reservoir so that it is immersed in a transport liquid within the reservoir. An ultrasonographic element is positioned in contact with the transport liquid, and a damper is located to form an interface with the transport liquid adjacent the ultrasonographic element remote from the ultrasound transducer.

Abstract: A process is disclosed of forming in a silver halide photographic element a visible image corresponding to a pattern of ultrasonic exposure. This process is characterized by providing in the photographic element internally fogged silver halide grains and contacting the element with a transport liquid in the presence of a solute capable of rendering the internally fogged silver halide grains developable in a surface developer. The element is then imagewise ultrasonically exposed and developed with a surface developer to produce a visible image defined by the pattern of ultrasonic exposure.