Abstract: A composition comprises a polyol, a polyethylenimine compound, and a sulfite compound. A method for producing a polyurethane polymer comprises the steps of: (a) providing a polyol; (b) providing an additive composition comprising a polyethylenimine compound and a sulfite compound; (c) combining the polyol and the additive composition to produce a polyol composition; (d) providing an isocyanate compound; and (e) combining and reacting the polyol composition and the isocyanate composition to produce a polyurethane polymer.

Abstract: A system and method for photoresists is provided. In an embodiment a photoresist is developed. Once developed, the photoresist is slimmed using either a direct slimming technique or an indirect slimming technique. In a direct slimming technique the slimming agent is either an alkaline solution or a polar solvent. In the indirect slimming technique a hydrophobic material is diffused into the photoresist to form a modified region and the modified region is then removed.

Abstract: A pattern-forming method includes forming a prepattern on a substrate. A space other than a space in which the prepattern is formed on the substrate is filled with a resin composition containing a compound which is diffusible into the prepattern. The compound is diffused into a part of the prepattern. Portions in which the compound is undiffused in the prepattern are removed using a removing liquid.

Abstract: A developing method including a developing step in which, while a wafer horizontally held by a spin chuck is being rotated, the wafer is developed by supplying a developer onto a surface of the wafer, wherein provided before the developing step is a pre-wetting step in which, simultaneously with the developer being supplied from a first nozzle that is located on a position near a central part of the surface of the rotating wafer, a deionized water as a second liquid is supplied from a second nozzle that is located on a position nearer to an outer peripheral part of the wafer than the first nozzle, to thereby spread out the developer in the rotating direction of the wafer by a wall that is formed by the deionized water flowing to the outer peripheral side of the wafer with the rotation of the wafer.

Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.

Abstract: A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.

Abstract: A method for patterning a substrate with reduced defectivity is described. Once a pattern is formed in a layer of radiation-sensitive material using lithographic techniques, the pattern formed on the substrate is post-treated. The post-treating of the pattern in the layer of radiation-sensitive material is performed to reduce a roughness of the pattern. The post-treating includes performing a treatment process on the pattern to alter a solubility of an exposed surface of the pattern, wherein the treatment process involves performing a first chemical treatment of the pattern using a liquid-phase chemical solution containing a first surfactant, or exposing said pattern to second EM radiation different than said first EM radiation. Following the treatment process, the post-treating includes hard baking the pattern, and performing a second chemical treatment of the pattern using a vapor-phase chemical solution to reduce the roughness.

Abstract: To provide a resist matter improving material containing C4-11 linear alkanediol, and water.

Abstract: A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is supplied to the surface of the wafer, the developer nozzle having a slit-like ejection port whose longitudinal direction is oriented to the direction perpendicular to the radial direction of the wafer. The movement speed of the nozzle is higher than a case where a nozzle with a small-diameter circular nozzle is used, and this enables a development time to be reduced. Further, the thickness of a developing solution on a substrate can be reduced, so that the developing solution can be saved.

Abstract: A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.

Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the polarity by the action of an acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) exposing the resist film via an immersion medium, and (c) performing development with a negative developer.

Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.

Abstract: A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is supplied to the surface of the wafer, the developer nozzle having a slit-like ejection port whose longitudinal direction is oriented to the direction perpendicular to the radial direction of the wafer. The movement speed of the nozzle is higher than a case where a nozzle with a small-diameter circular nozzle is used, and this enables a development time to be reduced. Further, the thickness of a developing solution on a substrate can be reduced, so that the developing solution can be saved.

Abstract: A resist pattern slimming treatment method of performing a slimming treatment on a resist pattern formed on a substrate includes: a slimming treatment step of performing a slimming treatment on the resist pattern by applying a reactant solubilizing the resist pattern onto the resist pattern, then performing a heat treatment on the resist pattern under a heat treatment condition determined in advance, and then performing a developing treatment on the resist pattern; and a first line width measurement step of measuring a line width of the resist pattern before the slimming treatment step. The heat treatment condition is determined based on a measurement value of the line width measured in the first line width measurement step.

Abstract: Embodiments of an apparatus and methods for heating a substrate and a sacrificial layer are generally described herein. Other embodiments may be described and claimed.

Abstract: An edge-covering composition for covering the cut surfaces of a photosensitive printing element to prevent premature curing of the cut surfaces during a process of manufacturing the printing element. The edge-covering composition is an emulsion comprising one or more emulsifiers, one or more-ultraviolet radiation-absorbing materials, optionally, a coloring agent, and optionally, one or more additional additives. The emulsion compositions are easy to apply, non-toxic, inexpensive, and are largely compatible with the solvents used to wash uncured photopolymer from the printing elements during processing.

Abstract: A method of developing a latent image on a photographic element (such as imagewise exposed photographic film) by absorbing a dye precursor into the film, applying a developer solution to the film to develop the latent image and form a dye in the film, scanning the film with light, and detecting at least one of light reflected away from and light transmitted through the film.

Abstract: A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.

Abstract: A method of developing a latent image on a photographic element (such as imagewise exposed photographic film) by absorbing a dye precursor into the film, applying a developer solution to the film to develop the latent image and form a dye in the film, scanning the film with light, and detecting at least one of light reflected away from and light transmitted through the film.

Abstract: A method of processing photographic material in which a fixed volume of processing solution is added to the surface of the material and spread repeatedly over the length of material. The processing solution is added to the material in at least two stages.

Abstract: A method of forming a shallow trench isolation is provided. In the method, a barrier oxide layer is formed on a substrate, and a silicon nitride layer is formed on the barrier oxide layer. A metal layer is formed on the silicon nitride layer, and an ultra-thin photoresist is formed on the metal layer. The ultra-thin photoresist layer is patterned with short wavelength radiation to define a pattern for a shallow trench. The ultra-thin photoresist layer is used as a mask during a first etch step to transfer the shallow trench pattern to the metal layer. The first etch step includes an etch chemistry that is selective to the metal layer over the ultra-thin photoresist layer. The metal layer is used as a hard mask during a second etch step to form the shallow trench by etching portions of the silicon nitride layer, barrier oxide layer and substrate.

Abstract: Disclosed are compositions useful for the pretreatment of polymeric material to be removed from substrates, such as electronic devices. The compositions of the present invention are particularly suitable for pretreating polymer residues from plasma etch processes. Also disclosed are methods of removing such pretreated polymeric material.

Abstract: An adhesive composition includes a polyphenolic polymer which has a first repeating unit and a second repeating unit of the formula: 1

Abstract: In one embodiment, the present invention relates to a method of processing a semiconductor structure including a resist thereon, involving the steps of exposing the semiconductor structure including the resist to acting radiation; contacting the semiconductor structure including the exposed resist with a solution comprising water and from about 0.01% to about 5% by weight of a surfactant; and developing the resist with a developer.

Abstract: In one embodiment, the present invention relates to a method of processing a semiconductor structure including a resist thereon, involving the steps of exposing the semiconductor structure including the resist to actinic radiation; contacting the semiconductor structure including the exposed resist with a solution comprising water and from about 0.01% to about 5% by weight of a surfactant; and developing the resist with a developer.

Abstract: The invention concerns the antistatic processing of photographic products. The process of the invention comprises applying an antistatic composition to the edge of a film reel. The antistatic composition may comprise an aqueous solution of an polymeric aluminosilicate. The invention has application to the improvement of antistatic characteristics during the photographic processing and printing of cinematographic films.

Abstract: An object of the present invention is to provide a thermosetting resin composition which can impart high slidability and great abrasion resistance while maintaining the excellent properties of thermosetting resins such as outstanding heat resistance, high-precision moldability, long-term durability, great mechanical strength, etc. The thermosetting resin composition for a sliding member according to the present invention comprises 100 parts by weight of a thermosetting resin, 50 to 600 parts by weight of an inorganic filler and 2 to 20 parts by weight of polyolefin powder having a particle size of up to 200 .mu.m, the inorganic filler containing potassium titanate fibers in an amount of 2 to 35 parts by weight per 100 parts by weight of the thermosetting resin.

Abstract: In a process for the production of colour photographic prints, in which transparent colour photographic originals having a wide range of brightness are reproduced on a colour photographic paper and the colour photographic paper exposed in this manner is subjected to a process comprising at least the stages colour development and silver removal, satisfactory definition both in the highlights and in the shadows is achieved by locally modifying the sensitivity of the colour negative paper before processing as a function of the original and with the modification not being sharply defined.

Abstract: A method of accelerating black and white development comprising contacting a negative-type silver halide photographic element during processing with a developer prebath or a developer bath comprising an accelerator compound of the formula: ##STR1## is disclosed, wherein R.sub.1, R.sub.2, and R.sub.3 are substituents; said R.sub.1, R.sub.2, and R.sub.3 may further combine with each other to form a 5-, 6-, or 7-membered ring; and wherein said developer prebath and developer bath do not contain any iron(III) ion complex salt having bleaching activity.A bath selected from the group consisting of developer prebaths and developer baths for black and white development of a negative-type silver halide photographic element comprising an aqueous solution of accelerator compound of the formula: ##STR2## is also disclosed, wherein R.sub.1, R.sub.2, and R.sub.3 are substituents; said R.sub.1, R.sub.2, and R.sub.

Abstract: A method for processing a silver halide color photographic light-sensitive material comprising a color developing process is disclosed. The color developing process comprisesthe first step of supplying one of a first color developing partial solution containing a color developing agent as a principal component and a second color developing partial solution containing an alkaline agent as a principal component, substantially only to an image-forming surface of the light-sensitive material,the second step of supplying one of the first partial solution and the second partial solution other than that supplied at the first step or a color developing solution containing a color developing agent and an alkaline agent, to the image-forming surface of the light-sensitive material at the same time or just after the first step.

Abstract: The present invention relates to a novel aqueous antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and water, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm, at least one unit containing a crosslinking group and at least one unit derived from a hydrophilic vinyl monomer or a vinyl monomer capable of becoming hydrophilic.

Abstract: The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.

Abstract: It is important to control the temperature during the development stage of a photographic process in order to maximize the efficiency thereof. This is a particular problem when photographic materials are processed in high throughput processors which operate with reduced volume chemistry as these material have a tendency to cool the developer solution if not at the correct temperature. Described herein is a method for improving the temperature stability of the material to be processed by heating it before processing. The material is passed through a conditioning chamber where it is heated to the desired processing temperature prior to entering the development stage of a processor.

Abstract: Layers containing proteinaceous binders, in particular gelatin layers of the kind used, for example, in photographic recording materials, are hardened by means of an instant hardener by casting a hardening system composed of at least two layers over the layer of binder, the lower of these two layers containing the instant hardener while the upper layer, which may be applied together with or immediately after the lower layer, contains a protein-containing binder but no hardener. The hardened layers have improved surface properties (wet scratch resistance, antifriction properties).

Abstract: When irradiated, a mixture of (a) a non-volatile substance containing at least one olefinic double bond and (b) a dibenzalacetone palladium complex deposits zero-valent palladium. Electrically non-conductive carrier materials which have been coated with a layer of said mixture can, after irradiation, be metallized by metal deposition without current, with electrically conductive coatings or patterns being obtained.

Abstract: The methods and apparatus disclosed herein provide commercially viable means to selectively improve the input and output characteristics of photosensitive materials, especially the output contrast variables. The present invention allows commercially available photosensitive material such as the high contrast Ilford Cibachrome Copy CCO Paper.RTM. to display dramatically improved color balance and contrast range characteristics when making reproductions from slides or prints. Recreational, professional and military photo duplication techniques are greatly improved by the present invention.

Abstract: A reducible image-containing element which comprises a support material and a photopolymerized layer provided thereon, said photopolymerized layer having an image area which is cured at the upper part and not cured at the lower part, said non-cured lower part containing at least one of polyvalent phenols and their derivatives in an amount effective in preventing said non-cured lower part from curing.

Abstract: Disclosed are novel compounds of the formula: ##STR1## wherein: X=--NR.sub.5 R.sub.6, or --OR.sub.7 ;R.sub.1 and R.sub.2 are independently hydrogen, substituted or unsubstituted alkyl, haloalkyl, hydroxyalkyl alkoxyalkyl, alkylaminoalkyl or arylalkyl having up to 18 carbons; cycloalkyl; phenyl or naphthyl; alkylphenyl, cyanophenyl, halophenyl or alkoxyphenyl substituents.R.sub.3 is hydrogen, benzyl, alkoxybenzyl, halobenzyl or alkylbenzyl, provided that if neither R.sub.1 nor R.sub.2 is hydrogen, then R.sub.3 is hydrogen.R.sub.4 is a divalent aromatic group which is substituted or unsubstituted.R.sub.5, R.sub.6, and R.sub.7 are independently hydrogen, alkyl, hydroxyalkyl, haloalkyl, alkoxyalkyl, alkylaminoalkyl, acylaminoalkyl, aminoalkyl or phenylalkyl having up to 12 carbons; a cycloalkyl substituent; phenyl or naphthyl; an alkylphenyl, cyanophenyl, halophenyl or alkoxyphenyl substituent.Furthermore, either R.sub.1 and R.sub.3 or R.sub.1 and R.sub.

Abstract: Radiation sensitive silver halide photographic elements are disclosed which are protected from fog by quaternized aromatic oxatellurazinium salts. The aromatic oxatellurazinium salts can be initially incorporated in the photographic element as manufactured or during processing.

Abstract: In the presence of a novel antifoggant represented by the general formula (I), a silver halide photographic material which has at least one light-sensitive silver halide emulsion layer on a support is development-processed. The developing solution is one containing both dihydroxybenzenes and 3-pyrazolidones, a developing solution containing both dihydroxybenzenes and aminophenoles, or a developing solution containing a primary aromatic amine developer to suppress markedly fog generation at much reduced sacrifice of sensitivity: ##STR1## wherein M represents a hydrogen atom, an alkali metal atom, NH.sub.4 or a mercapto group-protecting moiety which can be split-off in the presence of an alkali; n represents 1, 2 or 3; R.sup.1 represents a hydrogen atom or --COOR.sup.2 ; and R.sup.2 represents a hydrogen atom, an alkali metal atom, NH.sub.4, or an unsubstituted or substituted alkyl, aryl or aralkyl group.

Abstract: There is provided a developer for use in a one-step process for the development of exposed film resulting in an exposurewise pattern of silver particles which are large enough to be used as printing elements in ink-printing techniques, providing a wide range of densities in the developed film. The developer is based on a buffered system of a developing agent, a sulfinic acid salt of the type HO-R-SO.sub.2.M..times.H.sub.2 O where R is a hydrocarbyl group and M is a cation, and a formaldehyde source, with conventional adjuvants such as anti-fogging agents and the like. Instead of the sulfinic acid salt defined above there may be used any compound which upon dissociation in a aqueous medium results in the same active ionic species.

Abstract: A method of color reversal treatment of an exposed silver halide photographic material is disclosed. The method involves treating the exposed material with 2 both type black-and-white developing solutions. The first solution contains a compound represented by the general formula (I):R.sub.2 --S--R.sub.1).sub.d --S--R.sub.2 (I)wherein R.sub.1 represents an alkylene group having 2 to 10 carbon atoms, which may have ether bonds, R.sub.2 represents an alkyl group having 2 to 10 carbon atoms which alkyl group may have substituents, ether bonds or ester bonds, and d represents an integer of 0 to 3. The second black-and-white developing solution is a conventional solution. By utilizing the two solutions and specifically the first solution containing the compound of general formula (I) it is possible to obtain good photographic images having a high maximum density and good color balance.

Abstract: A method for processing a silver halide photographic material having at least one silver halide emulsion layer on at least one side of a support is disclosed. The method is characterized by pretreatment with a solution carried out prior to a development-processing. The solution being substantially unable to cause a development reaction though it contains a developing agent. The method improves the covering power of developed silver without deteriorating the physical properties of the silver halide photographic material.

Abstract: A method of forming a photographic image which comprises development processing with an alkaline aqueous activator solution a silver halide photographic light-sensitive material comprising a support having thereon at least one surface latent image type silver halide emulsion layer, and containing in at least one layer selected from a silver halide emulsion layer and another hydrophilic colloid-layer (1) a hydroquinone series developing agent and (2) an acylhydrazine compound represented by formula (I):R.sup.1 NHNHCOR.sup.2 (I)wherein R.sup.1 represents an unsubstituted or substituted aryl group or alkyl group; and R.sup.2 represents a hydrogen atom, or an unsubstituted or substituted aryl group or alkyl group,wherein the aqueous activator solution or a prebath thereof contains at least one compound represented by formula (II): ##STR1## wherein each of W.sup.1, W.sup.2, W.sup.3, and W.sup.

Abstract: The disclosed method relates to a method for recording flow boundary layers in liquid media by photochemical means. According to the invention, surfaces which can be developed in a plane and to which a photographic film sheet is cemented are exposed under steady-state conditions to the flow of a liquid medium containing a dissolved agent reacting with the photo gelatin layer. The liquid medium may contain agents furnishing HS-ions or agents capable of dissolving silver halide or reducing silver halide. If a photographic film sheet is used, the silver ions of which are reduced to silver, the flow exposure is performed with an agent having oxidizing and dissolving action. With the method disclosed, half-tone photograms of flow boundary layers in liquids can be recorded.

Abstract: A method of forming an extremely high-contrast negative photographic image which comprises image-wise exposing a photographic light-sensitive material comprising a support having thereon a mono-disperse silver halide emulsion layer containing surface latent image type silver halide grains and also containing a compound represented by the following general formula (1):R.sup.1 NHNHCOR.sup.2 (I)wherein R.sup.1 represents an aryl group, R.sup.2 represents a hydrogen atom, a phenyl group or an unsubstituted alkyl group having 1 to 3 carbon atoms, and then processing the exposed light-sensitive material in the presence of a compound having a thioamido moiety in the molecule thereof.

Abstract: For developing residual-moisture photographs according to the wet-film technique, a pre-treatment with a first solution of about 5% ethanolic NaOH is performed first at about 13.degree. C. After the alkali exchange, the exposed film passes through a bath at a bath temperature of 50.degree. C. with a hydroquinone-containing photographic developer. This "Two-bath wet developing method" takes place in daylight. The developed, fixed, rinsed and dried film can be evaluated directly.

Abstract: A multilayer color photographic material suitable for optically recording sound images on a sound track area formed thereon is composed of a support having coated thereon at least one silver halide emulsion layer containing a color coupler in at least a 40 mol% excess of the stoichiometric amount of the coupler to the silver halide contained in the emulsion layer and at least one silver halide emulsion layer containing a color coupler in an amount less than 40 mol% excess of the stoichiometric amount of the coupler to the silver halide in the emulsion layer.The color photographic material is suitably processed by a color intensification development process.

Abstract: A method for depositing a metal on a surface is disclosed. The method comprises treating the surface with a sensitizing solution comprising at least a reducible salt of a non-noble metal and a radiation-sensitive reducing agent for the salt to form a sensitized surface. The sensitized surface is exposed to a source of light radiation to reduce the metal salt to a reduced metal salt species. Either or both of the preceding sensitizing or radiation exposing steps is restricted to a selected pattern on the surface to form a catalytic real image capable of directly catalyzing the deposition of a metal thereon from an electroless metal deposition solution. The catalytic real image is treated with a stabilizer comprising (a) a reducing agent for the non-noble metal ions of said reducible salt, (b) a complexing agent and (c) an accelerator to at least stabilize the catalytic real image.

Abstract: A method of depositing a metal on a surface is disclosed. The method comprises coating the surface with a sensitizing solution comprising at least a reducible salt of a non-noble metal. The coated surface is selectively treated to reduce the metal salt to metallic nuclei to form a catalytic pattern thereon capable of directly catalyzing the deposition of a metal on the nuclei from an electroless metal deposition solution. The selectively treated surface is then exposed to a stripping solution comprising an organic acid selected from (a) a carboxylic acid having a structural formula of ##STR1## where R is a member selected from the hydrogen radical, H, and an alkyl group having 1 to 3 carbon atoms, (b) citric acid and (c) a mixture of any of the foregoing acids, to essentially remove portions of the coated surface which have not been selectively treated.