Abstract: A radiation-sensitive emulsion comprised of high chloride silver halide grains having a central portion accounting for up to 99 percent of total silver and containing a first dopant of Formula (I): [RuL6]n wherein n is −2, −3 or −4, and L6 represents bridging ligands which can be independently selected, provided that at least four of the ligands are anionic ligands, and at least one of the ligands is a cyano ligand or a ligand more electronegative than a cyano ligand; and a second dopant comprising an iridium coordination complex having ligands each of which are more electropositive than a cyano ligand; wherein the first dopant and the second dopants are located together in a common dopant band in an interior shell region of the central portion of the silver halide grains that surrounds at least 70 percent of the silver and, with the more centrally located silver, accounts for 90 percent of the silver halide forming the grains, and wherein the second dopant is present in the silver

Abstract: A method for manufacturing a semiconductor device including, forming a photosensitive-film on a substrate, carrying the substrate on which the photosensitive-film is formed, to an exposure device provided with a mask in which an on-mask-inspection-mark and an on-mask-device-pattern are formed, selectively exposing the photosensitive-film to light to transfer the on-mask-inspection-mark to the photosensitive-film to form a latent-image of the inspection-mark on the photosensitive-film, heating at least that area of the photosensitive-film in which the latent-image of the inspection-mark is formed, measuring the inspection-mark, changing set-values for the exposure device used for the selective exposure, on the basis of result of the measurement so that exposure conditions conform to the set-values, exposing the photosensitive-film on the basis of the changed set-values to transfer the on-mask-device-pattern to the photosensitive-film to form a latent image of the device-pattern on the photosensitive-film, heat

Abstract: The present invention relates to a heat mode-compatible planographic printing plate comprising a photosensitive layer which is capable of recording with an infrared laser and formed by applying a photosensitive layer coating solution onto a hydrophilic support and then drying the photosensitive layer coating solution, the photosensitive layer coating solution being obtained by dissolving or dispersing I) an IR absorber, II) a polymerization initiator, and III) a compound having a polymerizable unsaturated group in a solvent, wherein the residual solvent in the photosensitive layer is 5% by weight or less relative to the weight of the photosensitive layer.

Abstract: Provided is a plate-making method for producing a waterless lithographic printing plate, wherein the method comprises: (I) an exposing step of imagewise exposure of the precursor with a laser with a controlled condition that a portion of a laser-exposed area in a photo-thermal conversion layer in the precursor remains in the photo-thermal conversion layer of the finished printing plate, and (II) a developing step of removing a silicone rubber layer in the laser-exposed area to form an image on the printing plate. The precursor to be processed comprises (A) a support, (B) an undercoat layer formed by applying onto the support a coating liquid that contains a water-soluble or water-dispersible polymer and water as a solvent, and then drying the coating liquid, (C) a photo-thermal conversion layer which comprises polyurethane and a photo-thermal converting agent; and (D) a silicone rubber layer, laminated in that order.

Abstract: A method for imaging patterning compositions comprising the steps of: (1) providing at least one patterning composition layer on a substrate; said patterning composition comprising: (a) at least one acid generator; (b) at least one cross linking resin or compound; (c) at least one binder resin comprising a polymer containing reactive pendant group selected from group consisting of hydroxyl, carboxylic acid, sulfonamide, active imide, alkoxymethylamides and mixtures thereof; and (d) at least one infrared absorber; (2) imagewise exposing the patterning composition layer to actinic radiation; (3) treating the imaged patterning composition layer with heat energy to treat the imaged portions of the composition layer; (4) flood exposing the heat-treated, imaged patterning composition layer with UV light for a predetermined time, said time being sufficient to promote the effective clear-out of non-imaged portions during the developing step without causing substantial deterioration of the imaged portions; and

Abstract: This invention relates to a poly(ethylene terephthalate) photographic multilayer film base having improved properties with regard to cutting, stiffness and curl property. The multilayer film base comprises a multilayer structure, in which a tie layer comprises a PET-based polyester material having a specified amount of monomeric units derived from 1,4-cyclohexanedimethanol (CHDM), such that the support layers of the multilayer film base does not delaminate. This PET-based polyester material can be obtained either by the addition/blending of polyester polymers containing CHDM monomeric units to PET material and/or the incorporation of CHDM monomer units into a PET-polymer backbone at appropriate levels.

Abstract: An imaging member, such as a negative-working printing plate or on-press cylinder, comprises latex polymer-carbon black composite particles. Such imaging members can be prepared with a hydrophilic imaging layer comprised of a heat-sensitive hydrophilic polymer having ionic moieties and the latex polymer-carbon black composite particles as a photothermal conversion material. The latex polymer-carbon black composite particles can be formulated in water or water-miscible solvents without agglomeration with other components such as charged polymers.

Abstract: A lithographic printing plate precursor which comprises a support having provided thereon a layer comprising a hydrophilic medium, wherein the layer comprising a hydrophilic medium contains a hydrophobitization precursor having a hydrophilic surface and a light/heat converting agent which is hydrophilic in itself, or at least on the surface.

Abstract: An aqueous developer for lithographic printing plates and a method for developing the printing plates are disclosed. The developer comprises an organic dispersing agent. The developer develops multi-layer printing plates quickly, with high throughput, but with no sludge formation in the developing process.

Abstract: A method of making a negative-working heat-sensitive lithographic printing plate precursor is disclosed, the method comprising the steps of (a) preparing an aqueous dispersion comprising particles of a hydrophobic thermoplastic polymer A which is not soluble or swellable in an aqueous alkaline developer and particles of a polymer B which is soluble or swellable in an aqueous alkaline developer but not soluble or swellable in water, wherein the glass transition temperature of polymer A is higher than the softening temperature of polymer B; (b) applying the aqueous dispersion on a lithographic substrate having a hydrophilic surface, thereby obtaining an image-recording layer; (c) overall heating the image-recording layer at a temperature which is higher than the softening temperature of polymer B without inducing coalescense of the particles of polymer A. The printing plate precursor has improved mechanical resistance.

Abstract: A photolithographic apparatus in which a light source exposes a substrate for patterning includes an enclosure having a controllable internal ambient for transferring the substrate in and out of the apparatus, a gate valve through which the substrate is transferred into or out of the enclosure, and a gas ejection unit for ejecting a gas into a region in close proximity to the gate valve, and in a direction substantially perpendicular to the direction of movement of the substrate as it is transferred into or out of the enclosure. A gas curtain is formed by the gas ejected by the gas ejection unit, such that an opening of the gate valve is shielded by the gas curtain, thereby suppressing intrusion or leakage of an ambient gas which can occur when the substrate is transferred in or out of the apparatus.

Abstract: A method for preparing a lithographic printing plate involving the steps of subjecting, to imagewise exposure, a presensitized plate for use in making a lithographic printing plate comprising an aluminum substrate provided thereon with a light-sensitive layer formed from a photopolymerizable light-sensitive composition, which comprises a compound having an ethylenically unsaturated double bond, a photopolymerization initiator and a polyurethane resin binder and then developing the imagewise exposed plate with a developer containing an inorganic alkaline agent and a nonionic surfactant, carrying a polyoxyalkylene ether group, having a pH value ranging from 10.0 to 12.5 and an electrical conductivity ranging from 3 to 30 mS/cm.

Abstract: An image forming method using a negative type image forming material is disclosed, and said method comprises the steps of exposing a negative type image forming material to infrared laser imagewise, which image forming material comprises a substrate and an image recording layer formed thereon, comprising (A) a radical generator, (B) a radical-polymerizable compound, (C) an infrared absorbing agent, and (D) a binder polymer; and developing the image forming material with an alkaline developing solution comprising a weak acid or a salt thereof having a dissociation constant pka of from 10 to 13.

Abstract: A composition is disclosed which is photopolymerizable upon absorption of light in the wavelength range between 300 and 450 nm, the composition comprising a binder, a polymerizable compound, a sensitizer and a photoinitiator, characterized in that the sensitizer is an optical brightening agent. A high speed is obtained, enabling the preparation of a lithographic photopolymer plates with low-cost blue or violet laser diodes.

Abstract: The invention relates to a process for preparing a flexographic printing plate from a photosensitive element having a photopolymerizable layer and a thermally removable layer on the photopolymerizable layer. The process includes imagewise exposing the photosensitive element and thermally treating the exposed element to form a relief suitable for use in flexographic printing. The thermally removable layer can be transparent or opaque to actinic radiation. The invention also relates to a photosensitive element for use in this process. The photosensitive element includes a photopolymerizable layer and at least one thermally removable layer having a filler and a binder, wherein the binder is less than 49% by weight, based on the total weight of the binder and filler.

Abstract: A lithographic printing precursor for lithographic offset printing comprises, a layer of imageable medium on a hydrophilic base. The imageable medium comprises hydrophobic polymer particles in an aqueous medium, a substance for converting light into heat, and a non-crosslinkable aqueous-soluble composition. The lithographic printing precursor may be used to make lithographic printing surfaces that obtain long run lengths on lower quality paper and in the presence of press-room chemicals. The lithographic printing precursor can be imaged and developed on-press and the imageable medium can also be sprayed onto a hydrophilic surface to create a printing surface that may be processed wholly on-press. It can also be processed in the more conventional fully off-press fashion. The hydrophilic surface can be a printing plate substrate or the printing cylinder of a printing press or a sleeve around the printing cylinder of a printing press. The cylinder can be conventional or seamless.

Abstract: In order to shorten the period for the development and manufacture of a semiconductor integrated circuit device there is used, at the time of transferring integrated circuit patterns onto a wafer by an exposure process, a photomask PM1 which is provided partially with light shielding patterns 3a formed of a resist film in addition to light shielding patterns formed of a metal.

Abstract: A method of making a lithographic printing plate is disclosed which comprises the steps of

Abstract: An exposure method comprises the steps of: providing a resist-coated substrate; providing a first mask including first and second regions having respective patterns formed therein; conducting a first exposure process in which the patterns in the first and second regions of the first mask are projected onto the substrate so as to expose first and second regions of the substrate which correspond to the patterns, respectively; and conducting a second exposure process after completion of said first exposure process so as to make an additional exposure of the second region of the substrate. By virtue of the incorporation of the second exposure process so as to make an additional exposure of the second region of the substrate, the resist linewidth which would be otherwise produced in the second region of the substrate by the first exposure process can be compensated through the second exposure process.

Abstract: A process for making thermally imageable negative working compositions comprising the steps of: (1) providing a patterning composition layer on a substrate, said patterning composition comprising: (a) at least one thermal-generator acid generator, (b) at least one cross-linking resin or compound; (c) at least one binder resin comprising a polymer containing at least one reactive pendent group selected from the group, consisting of hydroxyl, carboxylic acid, sulfonamide, alkoxymethylamide and mixtures thereof; and (d) at least one infrared absorber; (2) subjecting the patterning composition layer to a two-stage radiation exposure; (a) one stage being a flood UV-exposure; and (b) the other stage being a imagewise infrared exposure stage; (3) treating the exposed patterning composition with heat energy; and (4) developing the heat treated, exposed patterning composition with an aqueous alkaline developer to remove the non-imaged areas of the patterning composition and leaving the imaged areas substanti

Abstract: A lithographic printing method is disclosed which comprising the steps of providing an imaging material which comprises a support and an image-recording layer that is not removable with a single-fluid ink which comprises an ink phase and a polar phase; image-wise exposure of the image-recording layer to heat or light without substantially ablating said image-recording layer, thereby switching the affinity of the image-recording towards ink or an ink-abhesive fluid and thereby creating a printing master comprising a lithographic image which consists of unexposed areas that have affinity for one phase of said ink phase and polar phase and of exposed areas that have affinity for the other phase of said ink phase and polar phase; printing, wherein the single-fluid ink is supplied to the printing master.

Abstract: A process for the treatment of a photographic material particularly a high speed photographic material, comprising an emulsion containing silver halide grains the treatment being to reduce the sensitivity of the material to ionizing radiation comprises prior to exposure, subjecting the material to a treatment that reduces the surface image dispersity so that fewer centers develop on each grain. The process may involve subjecting the photographic emulsion to physical pressure to deform the grains to introduce internal trapping centers for latent image formation so that a proportion of the latent image can be formed within the grains rather than on the grain surface.

Abstract: A process is described for healing scratches on the base side of an imaged motion picture film element comprising a polymeric film base having one or more image layers on one side thereof, the process comprising applying an aqueous coating formulation comprised of an aqueous dispersion of a polyurethane to the scratched base side of the motion picture film element, and drying the applied coating formulation to form a polyurethane layer, wherein the polyurethane comprises an aliphatic polyurethane which has a Young's modulus at 100% elongation to break of less than 4000 psi and a Sward hardness value of at least 60. Scratch healing formulations employed in accordance with the invention provide coated layers with superior resistance to blocking, cleaning solvents, and abrasion, and which are more flexible, dry faster, and are more effective in hiding minor scratches than that disclosed in the prior art.

Abstract: A radiation-sensitive emulsion comprised of silver halide grains (a) containing greater than 50 mole percent chloride, based on silver, (b) having greater than 50 percent of their surface area provided by {100} crystal faces, and (c) having a central portion accounting for up to 99 percent of total silver and containing (i) a first dopant comprising an iridium coordination complex containing at least one thiazole ligand and (ii) a second dopant comprising an iridium coordination complex containing at least one substituted thiazole ligand. The combined use of first and second iridium dopants in accordance with the invention provides enhanced toe contrast softening, and can also result in improved latent image keeping stability relative to that expected from the individual effects of such dopants.

Abstract: A radiation-sensitive emulsion comprised of high chloride silver halide grains having a central portion accounting for up to 99 percent of total silver and containing a first dopant of Formula (I): [ML6]n wherein n is zero, −1, −2, −3 or −4; M is a filled frontier orbital polyvalent metal ion, other than iridium, and L6 represents bridging ligands which can be independently selected, provided that at least four of the ligands are anionic ligands, and at least one of the ligands is a cyano ligand or a ligand more electronegative than a cyano ligand; wherein a second dopant comprising an iridium coordination complex having ligands each of which are more electropositive than a cyano ligand is located together with the first dopant in a common dopant band within the central portion of the silver halide grains.

Abstract: A photographic recording element comprising a support bearing at least one radiation-sensitive silver halide emulsion layer comprising silver halide grains containing greater than 50 mole percent chloride, based on silver, and having greater than 50 percent of their surface area provided by {100} crystal faces, wherein (i) a first fraction which comprises from 10-90 wt % of the silver halide grains consists of grains which have a central portion which contains at least 10−7 mole of a hexacoordination metal complex which satisfies formula (I) per mole of silver and less than 10−10 mole of a hexacoordination metal complex which satisfies formula (II) per mole of silver, and (ii) a second fraction which comprises from 10-90 wt % of the silver halide grains consists of grains which have a central portion which contains at least 10−10 mole of a hexacoordination metal complex which satisfies the formula (II) per mole of silver and less than 10−7 mole of a hexacoordination metal com

Abstract: Embodiments of the present invention relate to a method and a system for determining an exposure time of a wafer photolithography process is applied to a wafer photolithography system and is used to determine the preferred exposure time for the L(N) batch production wafer. In one embodiment, at least three batches of the batch test wafers are recalled in a time sequence and the corresponding test values are obtained. A mean value of the test values corresponding to the at least three batches of the batch test wafers is calculated with a predetermined mathematical model. The calculated mean value is compared with a predetermined qualified examination value, and a margin value between the mean value and the qualified examination value is thus determined to adjust and generate an appropriate process exposure time. The preferred process exposure time is then employed as the exposure time of the L(N) batch production wafer.

Abstract: In accordance with the present invention there is provided an imaging element for lithographic offset printing. The imaging element comprises hydrophobic polymer particles in an aqueous medium, a substance for converting light into heat, and a metal complex. The imaging element may be used for printing long run lengths on lower quality paper and in the presence of set-off powder. The imaging element may be imaged and developed on-press and may be sprayed onto a hydrophilic surface to create a printing surface that may be processed wholly on-press. The hydrophilic surface may be a printing plate substrate, the printing cylinder of a printing press, or a seamless sleeve around the printing cylinder of a printing press. This cylinder may be conventional or seamless.

Abstract: According to the present invention there is provided a heat ode imaging element for making a lithographic printing plate having n a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is IR-sensitive and unpenetrable or insoluble for an alkaline developer wherein said first layer and said top layer may be one and the same layer and said first layer and said top layer being the imaging layers; characterized in that said imaging layers have a glass transition temperature of at least 57° C.

Abstract: Disclosed is a method for forming a contact portion of a semiconductor element. An exemplary method includes the steps of depositing an insulation layer on a lower thin film on which there is formed a semiconductor element electrode or a metal wiring pattern, and then realizing an even upper surface of the insulation layer; forming a photosensitive film pattern thereon having a contact or via hole pattern in which inner walls of the contact holes or via holes smoothly curve downward to reach an upper surface of the insulation layer; dry-etching the insulation layer using a mask following the photosensitive film pattern to form contact holes or via holes; removing the photosensitive film pattern, then depositing a barrier metal and tungsten to fill the contact holes or the via holes; and performing a chemical mechanical polishing process to remove the barrier metal and the tungsten from the upper surface of the semiconductor element until the insulation layer is exposed and a flat surface is realized.

Abstract: A method of producing a lithographic printing plate which comprises subjecting a printing plate precursor comprising a support having a metallic compound layer which has a photo-catalytic property and a hydrophilic surface and bears light-heat convertible minute particles on the surface thereof to imagewise irradiation of heat mode to convert polarity of the metallic compound layer, thereby forming an imagewise hydrophobic region. The lithographic printing plate can be repeatedly employed.

Abstract: A lithographic apparatus and process that utilizes dark-field imaging of mask features to introduce an image of those features into an energy sensitive resist material is disclosed. Dark field imaging is accomplished by utilizing off-axis illumination in combination with one or more masks. The zero-order off-axis illumination is lost from the system and is not captured from the downstream imaging optics. The mask or mask contains both lithographic features and non-imaged features. The non-imaged features are too small to be resolved by the imaging optics used to introduce the image into the energy sensitive material. The lithographic features and non-imaged features associated with a particular pattern feature are either present on the same mask, or decoupled where the non-imaged features are on one mask and the lithographic features are on a second mask.

Abstract: A process for treating the periphery of an unexposed photosensitive resin plate, which comprises irradiation of light having a wavelength of not longer than 300 nm on the periphery of the unexposed photosensitive resin plate until the periphery is free of stickiness. The process of the present invention solves problems such as sticking of the peripheral resin of unexposed plates to packages, sticking of unexposed resin to a working table, exposure table or vacuum adhesion sheet, sticking of dust, and so on on the periphery of unexposed plates, and sticking of unexposed resin to hands when handling, while eliminating all defects in handling during the steps of making printing plates.

Abstract: Imagable articles comprising positive working polymeric resins coating onto substrates are given a heat treatment comprising their controlled slow cooling from an elevated temperature. The imagable articles include precursors for lithographic printing plates and for printed circuits. The controlled slow cooling improves the development characteristics of the coatings after an imaging step.

Abstract: Disclosed is a method for forming a color image comprising exposing a color photographic material, wherein the color photographic material comprises a support having provided thereon at least (1) a photosensitive layer capable of forming a yellow image by imagewise exposure and processing, (2) a photosensitive layer capable of forming a magenta image by imagewise exposure and processing, and (3) a photosensitive layer capable of forming a cyan image by imagewise exposure and processing, each of said photosensitive layers is sensitive to the radiant rays in the range of from 380 to 900 nm, each photosensitive layer has different wavelength corresponding to the maximum spectral sensitivity, the maximum spectral sensitivities of photosensitive layers (1) to (3) gradually diminish from the photosensitive layer having the maximum spectral sensitivity at the shortest wavelength to the photosensitive layer having the maximum spectral sensitivity at the longest wavelength, and exposure is performed by using at least

Abstract: A process for treating the periphery of an unexposed photosensitive resin plate, which comprises irradiation of light having a wavelength of not longer than 300 nm on the periphery of the unexposed photosensitive resin plate until the periphery is free of stickiness. The process of the present invention solves problems such as sticking of the peripheral resin of unexposed plates to packages, sticking of unexposed resin to a working table, exposure table or vacuum adhesion sheet, sticking of dust, and so on on the periphery of unexposed plates, and sticking of unexposed resin to hands when handling, while eliminating all defects in handling during the steps of making printing plates.

Abstract: A gradation image is recorded on a heat-sensitive recording material, which converts light energy applied thereto to heat energy and forms a color in a density according to a quantity of the heat energy by scanning the heat-sensitive recording material in a main scanning direction with a laser beam modulated according to the gradation of an image to be recorded while conveying the heat-sensitive recording material in a sub-scanning direction relative to the laser beam. The heat-sensitive recording material includes a support and a heat-sensitive layer mainly formed of organic material which is formed on the support, and the diameter d of the laser beam as measured in the sub-scanning direction, the recording intervals D in the sub-scanning direction and the sub-scanning frequency f are set to satisfy the formulae:1.66.ltoreq.d/D.ltoreq.1.98+10.sup.4.25 .multidot.f.sup.-1.57 and200 Hz.ltoreq.f.ltoreq.900 Hz.

Abstract: An exposure method includes the phase-shifting mask supply step, the phase-shifting mask being prepared by selectively forming a light-shielding portion and a phase shifter on a substrate, and the resist exposure step of performing both exposure of a resist by dark field illumination light and exposure of the resist by bright field illumination light by using the phase-shifting mask, thereby removing residual resist generated by the influence of the edge of the phase shifter.

Abstract: A method for making a lithographic printing plate according to the silver salt diffusion transfer process image-wise exposes an imaging element with a high intensity short time scanning exposure. The imaging element comprises on a support in the order given a silver halide emulsion layer and a layer containing physical development nuclei. A thus obtained image-wise exposed imaging element is subsequently developed in the presence of a developing agent and silver halide solvent. The image-wise exposure is focused substantially within the silver halide emulsion layer of the imaging element. The present invention further provides an apparatus for carrying out the above method.

Abstract: The invention relates to a photographic member comprising at least one photosensitive silver halide layer on the top of said member and at least one photosensitive silver halide layer on the bottom of said member, a polymer sheet comprising at least one layer of voided polyester polymer and at least one layer comprising nonvoided polyester polymer, wherein the imaging member has a percent transmission of between 38 and 42%, the imaging member further comprises tints, and the nonvoided layer is at least twice as thick as the voided layer.

Abstract: A photographic member comprising a polymer sheet comprising at least one layer of voided polyester polymer and at least one layer comprising nonvoided polyester polymer, wherein the imaging member has a percent transmission of between 40 and 60%, the imaging member further comprises tints, and the nonvoided layer is at least twice as thick as the voided layer.

Abstract: The present invention provides a method for forming a resist pattern which allows a closest pattern to be formed thus solving a problem of misalignment. A substrate has, on the surface thereof, first and second domains having different reflectivity to first light. A resist covers the first and second domains. The first light illuminates the resist and reflects from the surfaces of the first and second domains. A resist pattern forms in the fashion of self-alignment based on the illuminated and reflected light. The sum of the exposure of the illuminated and reflected light is set above a threshold of exposure by which the resist is sensitized in the first domain and set below the threshold of exposure in the second domain.

Abstract: A recording process comprising the steps of: information-wise exposing to radiation a photosensitive thermally developable photographic material, thereby producing a latent image; and heating the photosensitive thermally developable photographic material, characterized in that the photosensitive thermally developable photographic material is on one and the same holding or guiding means during both the information-wise exposure step and the heating step; and the information-wise exposure step is carried out during the heating step; and a method of increasing the photosensitivity of a photosensitive thermally developable photographic material.

Abstract: A method for generating on a lithographic printing plate a screened reproduction of a contone image, comprising the steps of: (1) transporting a thermo-sensitive imaging element through an exposure area; (2) scanwise exposing the thermo-sensitive imaging element according to screened data representative for tones of a contone image with a set (s) of radiation beams (b) as the thermo-sensitive imaging element is transported through the exposure area, characterized in that at any given moment (ta+.DELTA.t) during the exposure at least two radiation beams (bi,bj) of the set of radiation beams impinge on different microdots (ma, ma+.DELTA.m) of a scanline (1a) on the imaging element, so that by completion of the exposure step each effective microdot of the scanline has been impinged by all effective radiation beams of the set.

Abstract: A method for forming a patterned photoresist layer. There is first provided a substrate. There is then formed over the substrate a blanket photoresist layer. The blanket photoresist layer is then implanted with a first ion beam to form an ion implanted blanket photoresist layer. The first ion beam employs a first ion having a first energy and a first dose sufficient such that an ion implanted patterned photoresist layer formed from the ion implanted blanket photoresist layer will not substantially outgas when the ion implanted patterned photoresist layer is exposed to a second beam. The ion implanted blanket photoresist layer is then patterned to form the ion implanted patterned photoresist layer. The method may be employed in selective high energy beam processing of the substrate. The method is particularly suited to selective high energy ion implant processing of semiconductor substrates employed within integrated circuit microelectronics fabrications.

Abstract: A method for making a lithographic printing plate from an original containing multiple tones comprising the steps of frequency modulation screening the multiple image to obtain screened data representing tones of the multiple tone image in terms of halftone dots; reproducing the halftone dots on a lithographic printing plate precursor having a surface capable of being differentiated in ink accepting and ink repellant areas upon scanwise exposure and an optional development step, by means of a scanwise exposure, wherein the scanwise exposure for rendering a halftone dot is intensity modulated.

Abstract: A method is disclosed for sealing the edge of a wafer against slurry debris and contaminants that are encountered during grinding and backlapping of a semiconductor substrate. This is accomplished by depositing a photosensitive polyimide as a dielectric material on a wafer and mounting the wafer on a chuck. A light source is introduced above the wafer and close to the edge of the wafer. The chuck is then spun by means of a spindle, thus exposing an outer ring of the circumferential edge of the wafer to light source. Because polyimide behaves like a negative resist in the art of lithography, the exposed ring is fixed in place such that when the wafer is next developed, only the unexposed polyimide corresponding to the scribe line patterns is dissolved forming "scribe channels", while leaving the ring in tact all along the circumference of the wafer.

Abstract: A method for generating a screened reproduction of a contone image comprises the steps of screening the contone image to obtain screened data representative for tones of the contone image and suitable for driving exposure of microdots on a radiation sensitive imaging element; exposing the microdots according to the screened data by at least one set or plurality (p) of radiation beams (b), characterized in that at a point in time (t) at least two radiation beams of the set of radiation beams impinge on a particular microdot (m) of a scanline (l). In particular is described a method for making a lithographic printing plate comprising the abovementioned steps.

Abstract: The invention relates to a photographic element for digital exposure comprising at least one layer comprising an emulsion of cubic silver iodochloride grain wherein said grain has been sensitized with a gold compound and with less than 1 .mu.mole per silver mole of sulfur.

Abstract: A method is described for reducing light scatter in lithographically producing a resist feature wherein the dosage of light beyond the immediate periphery of the desired feature is subjected to a lower dosage of light than is required to properly define the edges of the resist feature. In addition, a mask is described which is partially opaque in those areas remote from the area delineating the desired feature.