Abstract: A photothermographic material comprising, on a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder, and a non-photosensitive outermost layer at a surface side of the support at which the image forming layer is provided, wherein: 1) the non-photosensitive organic silver salt contains 90% by mole or more of silver behenate; and a binder in the outermost layer contains 50% by weight or more of a hydrophobic polymer latex, 2) the outermost layer contains a polymer latex; and a layer adjacent to the outermost layer contains a binder which can lose fluidity upon a decrease in temperature, or 3) the outermost layer contains a polymer latex; and a coating solution for forming the outermost layer can lose fluidity upon a decrease in temperature.

Abstract: The present invention relates to an imaging element comprising at least one imaging layer and a support wherein the support comprises at least one layer comprising a splayant and a layered material, wherein the layered material has an aspect ratio from 20:1 and 500:1 and wherein the layered material comprises less than 10% by weight of the layer. The present invention also relates to a method of making a dimensionally stable imaging element comprising providing a support wherein said support comprises at least one layer comprising a splayant and a layered material, wherein said layered material comprises an aspect ratio of from 20:1 to 500:1 and wherein said layered material comprises less than 10% by weight of said at least one layer; and applying at least one imaging layer.

Abstract: The invention is directed to a process for modifying a water soluble polymer, said process comprising modifying a polymer containing amine groups, by reacting at least one of said amine groups with activated ester, said ester being the reaction product of a carboxyl activator and the carboxyl group of a molecule R—COOH, said R-group being a functional group, to produce a reaction mixture containing a polymer, said polymer containing at least one amide group; subjecting said reaction mixture to at least ion exchange chromatography to purify said reaction mixture, said purification comprising at least partly removing the said reaction product, and/or carboxyl activator.

Abstract: A hydrophilic colloid composition having hydrophobic material dispersed therein and comprising an anionic surface active agent further comprises a cationic surface active agent in an amount sufficient to reduce the viscosity of the composition, the cationic surface active agent comprising a hydrophobic moiety, a non-ionic hydrophilic moiety and a cationic hydrophilic moiety.

Abstract: The invention is directed to a process for modifying a water soluble polymer, said process comprising

Abstract: A photographic element is disclosed comprised of a layer containing radiation-sensitive silver halide grains and a vehicle which can be chill set and is in part derived from gelatin and in part derived from water dispersible starch.

Abstract: The invention provides a method of nucleating silver halide particles wherein said nucleation is carried out in the presence of acid processed ossein (APO) gelatin or chain-extended acid processed ossein (CE-APO) gelatin and the composition formed therefrom.

Abstract: A water-soluble or water-dispersible, non-ionic surface active compound is provided having the formula ##STR1## wherein each Y independently is a hydrophilic polyhydroxyalkyl group;each X independently is ##STR2## each R independently is a hydrophobic substituted or unsubstituted alkyl group or a hydrophobic substituted or unsubstituted aryl group;each n independently is an integer from 2 to 6; and,each m is an integer from 2 to 4.Such surfactants can be used in hydrophilic colloid compositions in the manufacture of photographic materials.

Abstract: A coating composition suitable for use in the preparation of a photographic material comprises an aqueous solution of a hydrophilic colloid and a surface active coating aid having the formulaCF.sub.3 (CF.sub.2).sub.n CH.sub.2 O(glycidyl).sub.m Hwhereinn is an integer from 4 to 7; and,m is an integer from 6 to 45.

Abstract: A silver halide photographic material comprising a support having thereon at least one light-sensitive silver halide emulsion layer, wherein the silver halide emulsion layer or another hydrophilic colloid layer contains a compound represented by the following general formula (I): ##STR1## wherein R.sub.1 and R.sub.2 each represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 30 carbon atoms, and at least one of R.sub.1 and R.sub.2 represents a substituted or unsubstituted hydrocarbon group, including an alkyl group having not less than 6 carbon atoms; L represents a divalent bonding group; and M represents a hydrogen atom or a cation.

Abstract: A process for silylation of positive or negative photosensitive resist layer on a semiconductor wafer after the resist layer has been exposed to radiant energy through a mask which includes introducing a silylating agent to the wafer at high pressure over 760 torr and, usually, at temperatures less than 180.degree. C. Increased pressure increases the rate of silylation, allows practical use of lower process temperatures, and, therefore, allows better process control. Also an apparatus is disclosed for applying the high pressure silylation process to a wafer.

Abstract: A method for processing a silver halide light-sensitive material is disclosed, comprising a support having thereon at least one silver halide emulsion layer with an automatic developing machine which comprises developing an imagewise exposed silver halide light-sensitive material, wherein an amount of organic substances remaining in at least one of the emulsion layer or other hydrophilic colloid layers comprising a surface protective layer after said processing with said automatic developing machine, is not more than about 90 wt % of the weight of said organic substances prior to said processing.

Abstract: A process of producing a photoresist pattern on a circuit board including applying a casein based photoresist film of a thickness of at least 4.0 micrometers to a circuit board, air drying the film, exposing the dried film to actinic radiation through a photomask and developing the exposed photoresist film with soft water to wash away the unexposed areas of the film, thereby leaving an etch resistant pattern of photoresist on the circuit board.

Abstract: The addition of N-methylol acrylamide as an accelerator to casein-based aqueous photoresist compositions reduces the baking temperature required to render the developed resist etch resistant.