Abstract: Compounds which possess a complementary structure to a desired molecule, such as a biomolecule, in particular polymeric or oligomeric compounds, which are useful as in vivo or in vitro diagnostic and therapeutic agents are provided. Also, various methods for producing such compounds are provided. These polymeric or oligomeric compounds are useful in particular as antimicrobial agents, receptor, hormone or enzyme agonists and antagonists.

Abstract: A photolithographic method for patterning small diameter circles at a high resolution on a layer, comprises the steps of depositing a resist layer on said layer; depositing calibrated microspheres, opaque to a radiation, on the surface of the resist layer; and irradiating said resist layer with said radiation.

Abstract: The present invention concerns stepped mould inserts, a method of producing the same and high-precision stepped microstructure bodies moulded therewith. The present stepped mould inserts and method of producing the same are more simple than previous methods. The lithographically produced regions of a patterned resist layer, which are exposed by development on a flat plate, are filled with metal. The layer may be mechanically removed, down to a predetermined thickness. After the residues of the resist have been dissolved out, if necessary or desired, this operation is repeated from one to several times. The regions removed from the resist layer are filled with metal, covered and separated from the resist layer, thus providing a multistep metallic mould insert. High-precision microstructure bodies having a multistep structure are produced with the present stepped mould insert.

Abstract: Multiple-exposure fine-line interferometric lithography, combined with conventional optical lithography, is used in a sequence of steps to define arrays of complex, nm-scale structures in a photoresist layer. Nonlinearities in the develop, mask etch, and Si etch processes are used to modify the characteristics and further reduce the scale of the structures. Local curvature dependent oxidation provides an additional flexibility. Electrical contact to the quantum structures is achieved. Uniform arrays of Si structures, including quantum wires and quantum dots, are produced that have structure dimensions on the scale of electronic wave functions. Applications include enhanced optical interactions with quantum structured Si, including optical emission and lasing and novel electronic devices based on the fundamentally altered electronic properties of these materials. All of the process sequences involve parallel processing steps to make large fields of these quantum structures.

Abstract: An improved reticle pattern for semiconductor lithography systems that utilize partially coherent or off-axis illumination includes blinder structures located adjacent to the exterior features of the reticle pattern. The blinder structures protect the exterior features from light that is scattered from large low resolution areas of the reticle in a defocus mode of the lithography system. This protects the exterior features projected onto a semiconductor wafer from degradation and improves the resolution, contrast and depth of focus of the lithographic system. In an illustrative embodiment, the reticle pattern is formed as a simple grating in which the exterior features of the grating are protected from image degradation by blinder structures formed as one or more solid blinder lines.

Abstract: A method and arrangement for characterizing features of a patterned material on an underlying layer is disclosed. According to the method, the patterned material is subjected to radiation including a range of wavelengths such that the patterned material absorbs more radiation than the underlying layer, and the underlying layer reflects more radiation than the patterned material. Zeroth order reflected radiation is measured and the reflectance measurement is expressed as a spectrum of the intensity of the reflected radiation as a function of the wavelength of the reflected radiation, or as an average reflectance over a range of wavelengths. The reflectance measurement can be correlated with features of the patterned material. An arrangement of equipment is disclosed for characterizing features of a patterned material according to the method.

Abstract: A method of forming a microstructure having a higher aspect ratio by using a general purpose synchrotron orbital radiation apparatus is provided. A resist layer mainly including a copolymer of methylmethacrylate and methacrylic acid is formed relatively thick on a substrate. Lithography by synchrotron orbital radiation is carried out on the resist layer, to form a resist pattern. By carrying out normal electroplating, electro-forming or the like in accordance with the resist pattern, a microstructure having a high aspect ratio is obtained.

Abstract: There is provided a method for the fabrication of electroluminescence device, comprising the steps of: forming a lower electrode with a predetermined pattern on a substrate: forming a first insulation layer on the lower electrode atop the substrate, in a state of grounding the lower electrode; forming a luminescent layer on the first insulation layer; forming a second insulation film on the luminescent layer; and forming an upper electrode with a predetermined on the second insulation layer. For formation of the first insulation layer, a ferroelectric material is deposited by a sputtering process employing a sputtering apparatus consisting broadly of a vacuum chamber and an external limiter. The transparent lower electrode is electrically connected with the external limiter and grounded through it.

Abstract: A method for the photolithographic production of structures in the submicron range including the following steps:- a photoresist layer comprising a polymer containing carboxylic acid anhydride and carboxylic acid tert. butyl ester groups, a photoinitiator which releases an acid when exposed, and a suitable solvent is applied to a substrate;- the photoresist layer is dried;- the photoresist layer is exposed in an imagewise manner;- the exposed photoresist layer is subjected to temperature treatment;- the photoresist layer treated in this way is subjected to liquid silylation;- the silylated photoresist layer is dry-developed in an anisotropic oxygen plasma;where the temperature treatment is handled in such a way that the photoresist becomes hydrophilic in the exposed areas.

Abstract: Improved adhesion of electroless metal deposited on an organic dielectric layer with phase separated morphology is accomplished by the spontaneous formation of a morphologically and topographically rough surface. In one embodiment a ternary solution of a polar solvent and two polymer precursors of the same polymer which are separable in two phases of different order are cast in film on a substrate and heated to form two phases of different order to spontaneously produce a rough surface. Upon exposure to an alkaline solution, one phase is etched at a faster rate than the other. Seeding and electroless deposition of a metal on the rough surface results in improved adhesion of the metal to the dielectric layer. In a second embodiment a quaternary solution of a polar solvent, a seeding agent, two polymer precursors of the same polymer which are separable in two phases of different order are cast in a thin film on a substrate and heated to form three phases.

Abstract: A method of producing microstructures having regions of different structural height includes providing a layer of positive resist material that is sensitive to X-ray radiation with microstructures on a side facing a source of X-rays. Using a mask, the layer of a positive resist material is partially irradiated with the X-rays. The irradiated regions are removed with the aid of a developer.

Abstract: A process for producing structures in the submicron range is characterized by the following steps:a photoresist layer comprising a polymer constituent with functional groups, which are capable of reacting with primary or secondary amines, and N-blocked imide groups, a photoinitiator which releases an acid when irradiated and a suitable solvent is deposited on to a substrate;the photoresist layer is dried;the photoresist layer is exposed in an imagewise manner;the exposed photoresist layer is subjected to a temperature treatment;the photoresist layer treated in this manner is developed with an aqueous-alkaline or organic developing agent into a photoresist structure; andthe photoresist structure is treated with a chemical agent containing a primary or secondary amine; a defined dark field loss, is adjusted thereby during development in the range of between 20 and 100 nm.

Abstract: A photographic contact printing process is disclosed having application in the mass production of replicate video discs from a master disc, and other applications wherein it is desired to replicate micro-detail over a relatively large area. A problem with conventional contact printing from a mask to a photographic medium is one of maintaining intimate contact over a relatively large area since dust, dirt, etc., are almost impossible to completely eliminate in any practical manner. In accordance with the present invention, a contact printing process is provided wherein intimate contact is not necessary for making high quality contact prints. The present invention recognizes that in contact printing information from a master disc to a replicate disc, the contact printing process is significantly less sensitive to imperfect contact between the master disc and the replicate disc if one employs a replicate disc comprising a photosensitive material having a certain optical properties.

Abstract: The invention relates to a process for producing supports intended for the optical recording and reading of information. A layer containing a diazo compound is deposited onto a metallized substrate. Recording is obtained by exposing the support to light through a mask, the exposed zones of the layer of diazo compound being decomposed. Dry development in ammonia vapors shows up transparent zones and opaque zones corresponding to the information.

Abstract: A simple, inexpensive device and method are disclosed for measuring the effectiveness of a photoresist composition in controlling reflective notching. The device utilized in practicing the method is a metalized silicon wafer having a U-shaped image thereon. This wafer may be coated with a photoresist, exposed through a grating pattern and developed, whereby the degree of notching of the photoresist lines may be readily observed.

Abstract: Irreversible optical recording media record information through local alteration of the optical properties of a recording layer on exposure to light.

Abstract: A film of a photoresist having phenolic hydroxyl groups is irradiated with far-ultraviolet radiation, and is thereafter developed with an alkaline aqueous solution. Using as a mask a resist pattern thus obtained, dry etching is carried out to form a microscopic pattern. Since the photoresist is highly immune against the dry etching, the microscopic pattern can be formed at a high precision. By adding an azide of a specified structure, the photoresist has its sensitivity to the far-ultraviolet radiation enhanced more.

Abstract: A microform article useful for producing composite images has an image-forming layer separate from a photosensitive layer and allows for the subsequent addition, when needed, just prior to imaging, of a second photosensitive, resist layer for an add-on image. The unique construction and method therefor provide a positive or negative first image, with the possibility of either positive or negative additional images, the images not necessarily being in the same phase.

Abstract: A simplified microfiche recording apparatus and method is provided that images a light image reflected through a fixed mirror train from hard copy or other source in microimage size on an intermediate dry-process film, develops the microimage and transfers the microimage by contact printing to an archival microfiche film. Stations are provided for imaging, developing and transferring which are in fixed relation to each other along a stationary intermediate film head. Single frame advancement of the intermediate film is utilized from station to station, where suitable, to avoid fogging of the intermediate film by insuring that the portion of the intermediate film which is subject to light piping from the transferring station contains developed microimage.

Abstract: This invention relates to a derivative of 2-hydroxy-naphthalene of the general formula ##STR1## wherein A is ##STR2## and X is --OH or ##STR3## and R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are identical or different and are hydrogen, cycloalkyl having up to eight carbon atoms, which is optionally substituted by lower alkyl groups, aralkyl having up to 10 carbon atoms or aryl which is substituted by lower alkyl, lower alkoxy, halogenalkyl or alkyl-substituted amino groups or by halogen, or R.sub.1 and R.sub.2 or R.sub.3 and R.sub.4 in each case are, conjointly with the nitrogen atom to which they are attached, identical or different heterocyclic groups which are optionally substituted by lower alkyl.

Abstract: Radiation is directed toward a support through an ordered array of lateral walls to form interlaid radiation-exposed and shadowed microareas on the support. A first composition is then located on the support in either the shadowed or unshadowed microareas. At least one additional composition is then positioned on the support in laterally displaced microareas forming an interlaid pattern with the first microareas.

Abstract: An optical recording medium for use with a recording apparatus of the type that focuses onto the medium, as the medium is moved in a prescribed fashion, a beam of light that is modulated in intensity in accordance with a data signal to be recorded. The recording medium includes a substrate having a smooth, planar upper surface, with a thin light-absorbing coating overlaying the surface, such coating including an explosive material such as nitrocellulose, and a light-absorbing dye. As the medium is moved with respect to the intensity-modulated beam, the explosive coating is selectively energized by the beam to induce spaced explosions threin, whereby corresponding optically readable irregularities, representative of the data signal, are formed in the outer surface of the coating.

Abstract: A photosensitive recording material which includes in a supported layer a mixture of photosensitive substances in admixture with one or more polymers that are soluble in an alkaline aqueous liquid, characterized in that such mixture of photosensitive substances essentially consists of:(A) at least one photosensitive nitrone of the formula: ##STR1## in which: R is an aromatic hydrocarbon group including a substituted aromatic hydrocarbon group,R.sup.

Abstract: Radiation is directed toward a support through an ordered array of lateral walls to form interlaid radiation-exposed and shadowed microareas on the support. A first composition is then located on the support in either the shadowed or unshadowed microareas. At least one additional composition is then positioned on the support in laterally displaced microareas forming an interlaid pattern with the first microareas.

Abstract: A structure, and method, for producing images such as microform, particularly, microfilm. The structure in its preferred form comprises a flexible substrate having a film, layer or coating of a metal, or metal-like, image forming material on at least one surface thereof. The image forming material, in turn, is provided with a film, layer or coating of an energy sensitive material. The structure is characterized in that it can be exposed to actinic radiation, for example, and developed in a fraction of a second to provide a dry microform having high acuity, contrast and resolution, excellent archival properties, and, significantly, in the case of positive working energy sensitive materials, unique add-on capabilities. The structure and method also have utility in the graphic arts field.

Abstract: A tamperproof identification card such as a passport or credit card is provided. A diazo photosensitive composition is intimately mixed with a thermo-adhesive resin and is carefully deposited as a uniformly thin layer in one or more zones on a plastic support material. The zones of the photosensitive compositions are developed to reproduce identifying information such as a photograph, identification number, etc. A plastic protective film is then laminated to the support to protect the identifying information. Since the adhesive resin material is intimately mixed throughout the photosensitive composition, the protective plastic film cannot be removed without destroying the information.

Abstract: An apparatus and methods for producing a transmission barrier for inhibiting propagation of light into still unimaged transparent portions of microfiche recording system intermediate film strips by light-piping action are described. The barrier serves to optically isolate the subsequently-to-be-imaged still unexposed portion of the film strip in a dispensing film head from the illumination used to transfer the previously developed image on the exposed portion of the strip onto a permanent recording medium, such as a microfiche film card. In one exemplary form of the invention, the barrier regions are photographically produced dark bands or lines between the longitudinally spaced areas of the film strip to be imaged. These bands or lines are preferably created as latent images during the initial exposure of the intermediate film and subsequently developed at the same time as the record image.

Abstract: A process for forming a high resolution recording medium including at least a high resolution, patterned interference filter formed from at least two reflecting layers separated by an interference layer including the step of removing patterned portions of a reflective layer not protected by a photosensitive layer by means of chemical etching or ion beam etching. When chemical etching is used, the etching process is accelerated to reduce under-etching by maintaining a rapid, thorough, and continuous boundary surface exchange of the etching solution at the boundary between the etching solution and the reflective layer being etched.

Abstract: A process for X-ray microlithography useful in the manufacture of microelectronic devices is provided. In the process, a mask in the form of a thin film of a eutectic is interposed between a source of X-rays and a substrate to selectively expose a layer of X-ray sensitive resist situate on the surface of the substrate. After exposure, the resist is developed to yield in the resist a replica of the submicron minimum feature size pattern of the mask.

Abstract: A high resolution developed color film in which the usual color image is given increased sharpness and resolution by the provision of a metallic silver image interdispersed with and proportional in amount to the color present in the top emulsion layer. The portions not containing color are tanned, and the combination of the silver-color top layer with the tanned uncolored portions provides a high degree of resolution. The developed color film is useful in aerial photography, microfilm and microfiche applications.

Abstract: An image forming method comprising forming a silver image on a photographic material, which comprises a substrate having a silver halide-binder emulsion layer thereon, by exposing and developing the photographic material, heating the photographic material in a gaseous atmosphere containing oxygen until binder at developed silver image areas is substantially removed, and then dissolving away the image-forming silver to leave thermally decomposed binder at the non-silver image areas.

Abstract: This invention relates to 2-hydroxy-3-naphthoic acid amides of the general formula: ##STR1## wherein R.sub.1 is hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, and R.sub.2 and R.sub.3 are identical or different and are hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, or, together with the nitrogen atom to which they are attached, a substituted or unsubstituted heterocyclic group.

Abstract: In a device for projecting a primary image from a transparency along an optical path and for altering the image by selectively directing a writing light source reversably along the optical path toward the transparency, a transparent recording film includes a pre-recorded primary image layer and a secondary layer annotatable by the marking light. The two layers are congruent, and in one embodiment comprise superimposed substrates which are joined mechanically. In another embodiment, the two layers are coated jointly on one substrate, and in a further embodiment the two layers are intimately mixed to form one bifunctional layer. Various means are disclosed whereby the primary image layer is unaffected by the marking light, and the annotatable secondary layer is unaffected by the projection illumination.

Abstract: This invention relates to a recording material containing diazo compounds, in particular a microfilm, comprising a film base which is at least partially pervious to visible radiation, a light-sensitive layer and, on the reverse side of the film base, a filter layer which absorbs light in the long-wave ultraviolet spectral range and in the short-wave visible spectral range, wherein the filter layer is composed of a polymer which is insoluble or has been rendered insoluble by cross-linking, and of at least one yellow to orange-colored dye which is compatible with the constituents of the polymer and absorbs light in the range between about 360 nm and about 500 nm. The invention also relates to a process for the manufacture of a recording material.

Abstract: A method for producing a high resolution, multi-color recording medium comprises the steps of applying a photosensitive masking layer to a substrate, exposing the masking layer, and then developing the masking layer to expose a patterned portion of the underlying substrate. A reflecting layer is then applied over the remaining masking layer and exposed substrate, and then the remaining masking layer is removed, leaving only that portion of the reflecting layer directly over the substrate. A uniformly thick interference layer is then applied over the substrate and the remaining portion of the reflecting layer, and a second reflecting layer is then applied using the same procedures described above in connection with the first reflecting layer.

Abstract: A planar array of microcells is formed in a support. An electrostatic charge pattern is established on the support differentiating first and second interlaid sets of microcells. An electrographic imaging composition is introduced into the first set of microcells, and a second, differing imaging composition is introduced into the second set of microcells. Multicolor photographic elements, particularly dye image transfer photographic elements, can be prepared.

Abstract: A diazo microfilm which is resistant to fading upon exposure to strong light for extended periods of time is provided. The fade-resistant diazo microfilm is produced by saponifying a cellulose alkanoate film to an extent defined by certain infrared absorption parameters.

Abstract: A method of replicating data from a master transmissive optical data storage medium whereby the resulting product displays areas of low reflectivity and high reflectivity. Actinic radiation is shone through transmissive areas onto a silver-halide emulsion photosensitive medium. The photosensitive medium is then chemically developed black. Next, the developed medium is fogged to create a latent image layer of silver precipitating nuclei. Finally, the fogged medium is placed in a monobath comprising a weak silver-halide reducing agent and a rapid-acting silver-halide solvent for partial chemical development and substantial physical development. The resulting product displays areas of low reflectivity, which correspond to the transmissive areas of the master, in a reflective field.

Abstract: Montage films, duplicating films, color guide films, microfiche film, color transparencies and similar visual aids are prepared from photosensitive articles having a layer of a photosensitive composition coated on a transparent support, preferably a flexible plastic transparent support.The exposed articles are developable with water to form the visual aid. The photosensitive layer is formed from a composition which includes a photosensitive reaction product of a condensation product of a diazonium compound with an arylsulfonic acid, and an epoxy resin which is liquid at ambient temperatures. The diazonium compound is preferably a paradiazodiphenylamine and the preferred condensing agent is formaldehyde or paraformaldehyde.The photosensitive layer can be colored with a permanent dye of a color depending on the type and use of the visual aid.

Abstract: Micro-dots carrying indicia identifying the owner of an article and the method of preparing and using such micro-dots. The micro-dots are small pieces of foil of any of several shapes with square being the preferred shape, and having an area defined by sides having an extent in the nature of 0.007 inch. Printed on the area of each dot is indicia identifying a particular owner. The method consists essentially of printing the indicia in multiple units on a large plate with the images being reduced in size by step photographing process, which results in a glass slide having the negatives of the images developed thereon. These images are transferred photographically to a piece of film of the same size which is cut into the individual dots. It is then immersed in a fluid, such as a clear resin, and applied to an article that is to be protected. The article or any part thereof with the micro-dots thereon is retrieved and examined by a microscope to identify the owner.

Abstract: Fine-grain silver halide emulsions of the Lippmann-type are described which comprise derivatives of heterocyclic mercaptans corresponding to the formulae: ##STR1## wherein: each of Z.sub.1 and Z.sub.2 represents the atoms necessary to complete a 5- or 6-membered heterocyclic ring system,n is 0 or 1,X is --CO-- or --CS--,R is an alkyl group or an aryl group, andY is --CO--, --COO--, --CS--, --SO.sub.2 --, --CON(R.sub.1)-- or --CSN(R.sub.1)--, R.sub.1 being hydrogen, alkyl or aryl.Both in reversal and negative processing sharpness of fine detail is improved and the distortion of image-details is reduced. Upon reversal processing yellow staining is also reduced.