Abstract: A particulate grinding method and device applies different force fields to drive the grinding medium and the particulates move in different routes but collide only at a grinding area so that they are separated naturally without conventional screening mechanisms, such as a screen or a gap, and prevented from the limitation of mechanical size of the components. Moreover, the invention is applicable to finer particulates. The circulation of particulates is not limited by any small gap of screening mechanisms, so the particulates ill not block the separator.

Abstract: The present invention describes a chemical solution recycling apparatus in a spin etching and cleaning process chamber for manufacturing semiconductor devices. Modification of the exterior dimension and the main structure of the process chamber is not necessary. The recycling apparatus in accordance with the present invention may separate different chemical solutions into different vessels and recycle them thereafter. The recycling apparatus comprises a recycling ring moving up and down to collect the solution and a recycling circular tray for sorting the chemical solutions in different trenches and drains. Therefore, the chemical solutions may be collected by assigned vessels or may be recycled into the process chamber after necessary quality inspections.

Abstract: The invention relates to a method and device for sandblasting, especially removing in a precise manner and/or compacting and/or coating solid surfaces, such as removing defective spots of paint from coats of lacquer, smoothing out soldered and welded joints, removal of contaminated concrete coatings or rust coatings, hardening, planing or coating metal surfaces, wherein a sandblasting agent is added by means of gravity and/or due to the effect of an injector to a carrier air flow produced by an underpessure, conveyed in a flexible hose-line system (13) to a jet lance (14) before being guided via a processing surface subject to low pressure by a sandblasting chamber, whereupon it is returned to the air flow, purified and returned to the circuit, whereby acceleration of the sandblasting agent is produced by the low pressure and the sandblasting chamber is displaced from one processing surface to another.

Abstract: A device for transporting particles of a magnetic material in a selected direction, having a support member having a support surface for supporting the particles, the support surface extending in a selected direction, a magnet arranged to generate a magnetic field retaining the magnetic particles on the support surface, the magnetic field having at least one region of reduced field strength at the support surface relative to a field strength of the magnetic field at the support surface outside said region, and drive means for moving each region of reduced field strength relative to the support surface in a direction having a component in the selected direction.

Abstract: A particulate blaster assembly (100) for use as an attachment to a portable air blower (150) includes an air directing tube (110), a vacuum generating assembly (120), and a particulate material aspirator (130). The air directing tube (110) has an inlet end (112) formed for coupling to the air blower (150) to receive air discharged therefrom and a movable exhaust end (114) formed for discharge of air and particulate material (212) entrained in the air toward a target site (160). The vacuum assembly (120) is coupled to the air directing tube (110) and formed to produce a partial vacuum as air passes in the tube (110) over the vacuum generating assembly (120).

Abstract: A workpiece is cut by being selectively moved along a first axis under a cutting device, the cutting device being selectively moved along a second axis that is perpendicular to the first axis. Motion of the workpiece and the cutting device is controlled to cut a workpiece. In one embodiment of the invention, the workpiece is selectively moved along the first axis by actuation of a first linear motor, and the cutting device is selectively moved along the second axis by actuation of a second linear motor. The cutting device may be a high-pressure fluid jet system.

Abstract: A rotary woodworking machine includes first, second and third rotary woodworking members, and a dust collecting mechanism. The dust collecting mechanism includes first, second, and third dust collecting units for collecting wood dust generated during a woodworking operation of the first, second and third rotary woodworking members, respectively, a dust accommodating unit for receiving the wood dust from the first, second and third dust collecting units, and a blower mechanism which is connected to and which is in fluid communication with the dust accommodating unit and which is operable so as to draw the wood dust in the dust accommodating unit out of the rotary woodworking machine.

Abstract: An efficient method of cleaning various workpieces is the so-called wet blasting, by which the workpieces are exposed to a spraying of water with a content of hard macro particles. Optimally, this blasting medium should be recirculated, but this implies noticeable problems with respect to separation of cleaned-off dirt and worn-down blasting particles. The invention provides for a system for processing units enabling these problems to be overcome in a relatively simple manner for achieving a high efficiency and low costs of the combined system.

Abstract: A grinding water tank apparatus includes a tank for storing grinding water to be used for machining a peripheral edge of an eyeglass lens and recycles the grinding water stored in the tank by circulation. The apparatus further includes an air filter provided at a position in a space higher than the water surface of the grinding water in the tank, and a suction unit for drawing bubbles developing in the tank by way of the air filter.

Abstract: A constitution comprises separated processing of an abrasive grain waste liquid into recycled abrasive grain and a fine abrasive grain mixed liquid in a first centrifugal separator, adding a fresh cutting liquid to the fine abrasive grain mixed liquid to direct the resulting liquid to a second centrifugal separator to subject the same to separated processing in the second centrifugal separator, into waste abrasive grain and a recovered cutting liquid directing the recovered cutting liquid through a recovered cutting liquid tank to a recovered abrasive grain tank, adding fresh abrasive grain and a cutting liquid for dilution to the recovered cutting liquid in the recovered cutting liquid tank and to the recycled abrasive grain to create a recycled abrasive grain mixed cutting liquid, and feeding the recycled abrasive grain mixed cutting liquid to an abrasive grain supply tank.

Abstract: An improved method and apparatus for media blasting a workpiece 20 is described. The media blasting apparatus 10 of the present invention includes a media reclaim and recycle system 35, which reduces media wastage, advantageously improves peening of a workpiece 20 and provides better coverage of the workpiece surface. The media blasting apparatus 10 also includes a pressure chamber 90 for creating a media blast stream, a media metering valve 105 for controlling media flow rate and a powered part hold-down apparatus 130 for holding the workpiece 20 in a predetermined position during a blasting operation. The controlled media flow rate in combination with the powered hold down of the workpiece 20 ensures even and thorough peening of a workpiece surface.

Abstract: The blasting unit includes an enclosure shaped and dimensioned for receiving an article to be treated with abrasive, a first gun carriage supporting a first blast gun for controlled movement relative to the enclosure, a support table maintained within the enclosure and a control system linked to the first gun carriage and the support table. The control system directs movement of the first blast gun and support table to abrasively blast an article with a predefined pattern.

Abstract: In a process and device for calibrating throttle bores, in particular in injection valves for internal combustion engines, by means of hydroerosive machining of the throttle bore with a suspension, the actual through flow is compared to a predetermined reference through flow. When the actual—and reference through flows coincide, the hydroerosive machining is brought to an end. On the outflow side of the throttle bore, a counterpressure is built up, which prevents the cavitation of the fluid.

Abstract: An apparatus for cleaning a passage in an engine block, such as the oil galley and oil galley legs, in which the passage includes an inlet and an outlet end. The apparatus includes a fixture having an interior passageway with an opening. The fixture is dimensioned to abut against the engine block so that the opening in the fixture registers with the engine block passage outlet. An air induction source is then fluidly connected to the fixture passageway so that, upon actuation of the air induction source, the air induction source inducts air through the engine block passage, through the fixture opening, and through the fixture passageway. A feeder containing abrasive shot is then coupled to the engine block passage inlet so that, upon actuation of the air induction source, the abrasive shot is inducted through the engine block passage and into the fixture passageway.

Abstract: A method for recovering noble metal from scrap generated during the manufacture of noble metal units. The method includes providing a cast metal unit such as a dental crown or a jewelry item. The unit is made of some noble metal. The surface of the unit is prepared with an abrading element. A magnetically attractive particulate contaminated scrap is generated. The scrap includes some noble metal and particulate contaminate. The noble metal is magnetically separated from the contaminate. The system includes an abrading element and a rotary tool for operating the element at a speed sufficient to prepare the surface of the units. A collection unit is provided for operation of the element therein. The scrap generated includes a percentage of magnetically attractive contaminate. A refining unit is provided including a magnet positioned therein for magnetically removing the contaminate from the scrap.

Abstract: Microdermabrasion and suction massage apparatus are included in a single unit and alternatively connectable through a mode switch to a source of vacuum. The microdermabrasion section of the unit includes a crystal pick up station operating with a venturi effect to draw crystals through a hole into an air stream. The size of the hole is variable to control crystal density. A bleed valve is provided to control crystal velocity without controlling crystal density, while a bypass valve is provided to control crystal density without controlling crystal velocity. In an associated method, a microdermabrasion procedure is performed on the skin of a patient at an operative site. The mode switch is operated to activate the suction massage apparatus within the unit. This step is followed by performing a suction massage procedure at the operative site in order to promote healing of the abraded skin. The unit can be back-flushed by connecting various portions of the unit to a pressurized output of the source of vacuum.

Abstract: An apparatus for recovering and cleaning contaminated abrasive blast media. A transportation assembly supplies contaminated blast media to an in feed cylinder within a rotating drum separator. The drum separator is formed from a plurality of elongated spaced parallel-aligned elements that define gradation openings between adjacent elements. The blast media is transported within the drum along the gradation interior surface. An internal spiral vein on the inside of the drum surface moves the media progressively through the drums exposing it to different areas of the drum surface having different gradation configurations. An air wash separator receives filtered blast media from the drum for final separation processing and reuse.

Abstract: A drilling assembly for drilling a borehole into an earth formation is disclosed having a drill string extending into the borehole and a jetting device arranged at a lower part of the drill string, the jetting device is provided with a mixing chamber having a first inlet in fluid communication with a drilling fluid supply conduit, a second inlet for abrasive particles and an outlet which is in fluid communication with a jetting nozzle arranged to jet a stream of abrasive particles and drilling fluid against at least one of the borehole bottom and the borehole wall. The jetting device is further provided with an abrasive particles recirculation system for separating the abrasive particles from the drilling fluid at a selected location where the stream flows from the at least one of the borehole bottom and the borehole wall towards the upper end of the borehole and for supplying the separated abrasive particles to the second inlet.

Abstract: A micro-dermabrasion system and method in which a handpiece includes an axially aligned treatment orifice and laterally offset particle supply and waste removal channels. At least a portion of the particle supply channel is angularly offset relative to the waste removal channel so the particle stream impinges substantially on the center of the treatment orifice. The handpiece employs tapered couplers to permit easy attachment and detachment of particle supply and waste removal lines in a handpiece having a small diameter. The particle supply container is designed to be pre-filled by a supplier, and disposed of when empty without disassembly. The supply container is also constructed to permit controlled aeration of the particles before delivery to the handpiece to reduce clogging of the particle lines and to facilitate continuous adjustment of particle flow rate.

Abstract: A slurry recycling apparatus having a first filter, a dirty side storage tank, slurry pump, second filter, clean side storage tank and slurry outlet, in which used slurry from an edge notch polishing apparatus is delivered to the first screen filter, transported to the dirty side slurry storage tank, pumped from the dirty side slurry storage tank through a second filter that filters out small particulate matter from the slurry and allows the slurry to pass to the clean side slurry storage tank, and finally to the edge notch polishing apparatus as needed. Slurry which is not immediately taken from the clean side slurry storage tank is continuously recycled through the second filter by overflowing from the clean side to the dirty side slurry storage tank where it is there pumped through the second filter back into the clean side slurry storage tank.

Abstract: Disclosed is a clog-free drain system installed in a cutting apparatus. The system includes an expandable cover for covering a path which a chuck table follows, a water case for receiving used machining water guided by the expandable cover, and a drain pool for tentatively storing the used machining water from the water case before allowing it to drain off. The drain pool has its bottom positioned at a level lower than the bottom of the water case, and the drain pool has its drain outlet formed at a level higher than the bottom of the drain pool. The water case has water flow creating apparatus for driving the used machining water to the water pool.

Abstract: A system (1), for shot blasting of a surface, collecting used shot blast media and debris, and separating the debris from the shot blast, has at least one shot blast nozzle (105) with a hood (100) connected to a vacuum hose (110). The system further has a displacement chamber (200) with an inlet connected to the hood by the vacuum hose, an inlet baffle (220), a solid matter collecting and discharging area (205) for receiving solid matter which falls from the gas stream in the displacement chamber, an outlet baffle (225), an outlet (226) for the outgoing gas stream, and a rotary valve (510) for allowing discharge of the solid matter. A first filter unit (300) and a second filter unit (310) are connected to the displacement chamber via a first duct (230). A shot blast media container (600) is connected to a shot blast media feeding hose (120), which is connected to the shot blast nozzle.

Abstract: A polishing plant including a polishing apparatus having a top ring for holding a workpiece and a turn table for polishing a surface of the workpiece held by the top ring. A cleaning apparatus has cleaning machines for cleaning the workpiece polished by the polishing apparatus. At least one drainage pipe connected to the polishing apparatus discharges a waste liquid from the polishing apparatus, and at least one drainage pipe connected to the cleaning apparatus discharges a waste liquid from the cleaning apparatus are provided as separate plural drainage pipe lines, depending on the type of waste liquid. By use of the polishing plant of the present invention, treatment of waste liquids can be efficiently conducted.

Abstract: The present invention provides a slurry delivery system comprising a slurry conduit couplable to a wall of the slurry tank, and configured to receive a slurry therein and deliver a stream of the slurry against an inner wall of the slurry tank. Thus, the system inhibits drying of a slurry within the slurry tank and minimizes agglomeration on the sides of the slurry tank that results from slurry drying on the sides of the slurry tank's wall when the slurry level within the tank rises and falls. This minimization of agglomeration reduces the agglomerates within the slurry supply, which in turn, reduces the number of contaminants and scratches affecting the overall quality of the semiconductor wafer substrate.

Abstract: An constant abrasive feeder of abrasive grains M is formed of a reservoir supply section 20 having a reservoir tank 21 and a buffer tank 31, a stirring hopper 40 for stirring abrasive grains S, and a vibration feeder 60 for supplying the abrasive grains S to an abrasive jet nozzle 5. The abrasive grains S recovered in a cyclone 1 is reserved in the reservoir tank 21 and the buffer tank 31 by a constant quantity, the abrasive grains S is sent from the buffer tank 31 and reserved in a reservoir 43, which is stirred by stirring bars 50, 51 and sent to a supply guide 45. Then, the abrasive grains S is sequentially supplied to a feeder body 61 of the vibration feeder 60 from an opening formed in the supply guide 45.

Abstract: Plastic abrasives for sandblasting, in particular, those to be used in sandblast processing for forming barrier ribs and priming ribs; a sandblast processing method with the use of the same; and a method for treating sandblasting waste matters. A plastic abrasive for sandblasting characterized by being soluble in organic solvents or water/organic solvent mixtures and comprising plastic particles having an average particle size of 5 to 100 &mgr;m; a method for sandblast processing a plasma display panel substrate by using the plastic abrasive; and a method for treating sandblasting waste matters.

Abstract: A method and apparatus for cleaning a tire mold with frozen CO2 cleaning material wherein a portable frame is positioned on a bottom mold of a tire press and has a rotatable frame on which a nozzle support is mounted for swivel action to clean the upper mold half and the lower mold half as the nozzle support is moved radially and circumferentially of the tire mold.

Abstract: A blasting cabinet for use in cleaning a work piece with abrasive intrained in an air stream under pressure. An enclosure having multiple access openings and configured interior surfaces that direct spent abrasive forward to a collection area in spaced relation to the supported work piece on a solid work surface within said cabinet.

Abstract: This invention relates to methods and apparatus for recovering abrasive for use with abrasive jet cutting systems. In one embodiment, an apparatus in accordance with the invention includes an abrasive-laden fluid handling device coupled to a catcher tank of an abrasive jet cutting system, a pre-classifier fluidly coupled to the abrasive-laden fluid handling device, a hydro-classifier fluidly coupled to the pre-classifier, a fine-particle separation tank fluidly coupled to a clarified-fluid flow outlet of the hydro-classifier, a wet abrasive receptacle positioned to receive a wet recovered abrasive discharged from the hydro-classifier, a de-watering device engageable with the wet recovered abrasive in wet abrasive receptacle, and a dryer unit. The abrasive-laden fluid handling device may include an abrasive-laden fluid conduit having a first end in fluid communication with the catcher tank and an abrasive-laden fluid outlet.

Abstract: A granule dishwashing apparatus with easily removable granule collectors and method of use. The dishwashing apparatus consists primarily of a treatment chamber, a tank, one or more granule collectors and one or more pumping devices. Soiled articles are placed in the treatment chamber to be washed with a mixture consisting of liquid and granules that is sprayed at the articles under high pressure. The mixture falls toward the tank after impacting the articles, passing through the granule collector(s). A liquid only portion is separated from the mixture at some point using the granule collector(s) so that the articles can be rinsed. At any point following a cleaning cycle, the granule collector(s) can be removed to add more granules and to simplify the cleaning of the apparatus. In a multiple collector system, the granule collectors are connected to actuators so that the collectors can be placed in a release mode or a collect mode depending on the function desired.

Abstract: This method provide a method for fabricating a semiconductor device in which waste water generated by a step of processing a semiconductor is filtered to be clean. In the method, removables 12 trapped by a first filter film 10 are used as a second filter film 13, and clogging of the first filter film 10 is prevented, and an external force such as bubbles is applied to the second filter film 13 to maintain filtering capacity. And when removables are mixed with the filtered water, the filtered water is recirculated again to the tank in which the waste water is stored, and after it is checked that a desired inclusion rate has been reached filtration is started again.

Abstract: An apparatus for supplying a polishing liquid to a polishing section is used for polishing a surface of a semiconductor substrate in the polishing section. The apparatus comprises a supply tank for storing a polishing liquid having given properties, a supply pipe for supplying the polishing liquid to the polishing section, a sensing device for detecting properties of the polishing liquid flowing through the supply pipe, and a stabilization device for maintaining properties of the polishing liquid stored in the supply tank or flowing through the supply pipe within an allowable range on the basis of an output signal from the sensing device.

Abstract: The unction relates to au improved recovery system for blasting works, comprising a space below a perforated floor of the blasting works fox receiving the blast material, and suction channels (21) for leading the blast material from the space below the floor to a classifier by using a blower; the recovery system comprises at least one elongated, substantially horizontal chute (17) opening upwards and arranged into the said space, the chute comprising two side walls (18, 19), and an elongated cover element (20) with two elongated free side edges (22, 23) arranged over the chute; the chute (17) and cover element (20) form between them a discharge channel (21) for the blast material; in addition, the system comprises pneumatic cylinders (26) for moving the cover element (20) in vertical direction between a lower and a raised position so that in the lower position, the side edges (22, 23) of the cover element engage the side walls (18, 19) of the chute and, in the raised position, the side edges (22, 23) of the c

Abstract: A cleaning and restoration system 10 for floors 11 and other hard surfaces is disclosed. The system 10 has an cleaning head 12 which can be moved across a floor 11 or other hard surface. The cleaning head 12 impinges particulate media upon the floor 11 to remove soils and provide a slip-resistant surface. The media is entrained into the air by a pressure tank 17 which includes a classifier 18 for reclaiming a portion of the media for reuse. The pressure tank 17 has a series of dispersion bars 68 for separating the heavy particles to be re-used. The dust, soils, and other undesirable materials are filtered in a dust collector 57 having a cyclonic filter 71. A compressor 20, a vacuum/blower 22, and other components of the system are mounted on a truck 19. A method for utilizing the restoration system 10 is also disclosed.

Abstract: An improved apparatus and methods for recovering abrasive from an abrasive-laden fluid are shown and described. An abrasive-laden fluid handling device is coupled to a catcher tank to collect abrasive-laden fluid and transport it to a hydro-classifier. Wet recovered abrasive is discharged from the hydro-classifier and transferred to a de-watering device. The de-watering device removes water from the abrasive by decanting fluid and via use of an air eduction system. De-watered abrasive is then ejected from the de-watering device to a dryer unit, to be further dried and processed for reuse.

Abstract: A sanding machine with a hand-held sanding unit, with interchangeable heads, connected to a base unit, containing three motors, one to provide suction of debris back through a hose, which has an inner hose containing a driver cable and self lubricating material, which allows the transportation of debris back to the base unit collection unit, connecting the base unit and hand-held unit, a second motor to power a driver cable which turns the hand-held unit, a third motor which is encased inside a collection unit, inside the base unit, which generates electromagnetic vibrations causing filters to release accumulated debris by the interaction of an inner and outer spring.

Abstract: This method provide a method for fabricating a semiconductor device in which waste water generated by a step of processing a semiconductor is filtered to be clean. In the method, removables 12 trapped by a first filter film 10 are used as a second filter film 13, and clogging of the first filter film 10 is prevented, and an external force such as bubbles is applied to the second filter film 13 to maintain filtering capacity. And when removables are mixed with the filtered water, the filtered water is recirculated again to the tank in which the waste water is stored, and after it is checked that a desired inclusion rate has been reached filtration is started again.

Abstract: A filter apparatus provided in a fluid pipeline for conveying a treatment fluid. A regenerating pipeline is provided adjacently to the fluid pipeline to convey a regenerating liquid. At least two filter units are switched between the fluid pipeline and the regenerating pipeline by a switching valve device. The filter apparatus enables a filter replacing operation to be carried out smoothly and reliably and is also capable of reliably trapping solid particles contained in the fluid, e.g. an abrasive liquid, continuously without the need of a filter replacing operation, thereby allowing supply of a fluid of high quality and a stable operation free from clogging.

Abstract: During blasting work, large quantities of blasting material (granules, glass, beads, slag and sand) together with residues of blasted color coating are projected over a large area after impact with the surface being blasted. This results in the pollution of large areas of the surrounding environment. The large quantities of dust produced cause problems for the population over a much wider area. The novel suction device prevents blasting material, dust and liquids from escaping from the blasting site and the area immediately surrounding the blast nozzle into the environment during blasting work. A second suction system which functions separately allows the device, with its integrated blast pressure nozzle, to hold itself steady automatically, even in extreme working positions, such as overhead, hereby relieving the operator of this task, and can still be moved laterally in any direction.

Abstract: A method of manufacturing a semiconductor component includes forming a first layer over a semiconductor substrate, providing a mixture comprised of a first component and a second component, optically detecting a concentration of the first component in the mixture, and applying the mixture to the first layer. A chemical-mechanical polishing (CMP) system (100) for use in the method includes a vessel (110) having a first input port (111), a CMP slurry output port (113), and a CMP slurry sensing port (114). The CMP system also includes a refractometer (150) adjacent to the CMP slurry sensing port.

Abstract: A cleaning and restoration system 10 for floors 11 and other hard surfaces is disclosed. The system 10 has an cleaning head 12 which can be moved across a floor 11 or other hard surface. The cleaning head 12 impinges particulate media upon the floor 11 to remove soils and provide a slip-resistant surface. The media is entrained into the air by a pressure tank 17 which includes a classifier 18 for reclaiming a portion of the media for reuse. The pressure tank 17 has a series of dispersion bars 68 for separating the heavy particles to be re-used. The dust, soils, and other undesirable materials are filtered in a dust collector 57 having a cyclonic filter 71. A compressor 20, a vacuum/blower 22, and other components of the system are mounted on a truck 19. A method for utilizing the restoration system 10 is also disclosed.

Abstract: Systems for abrasive action include machinery for creating a vacuum and positive pressure to enable flow control while providing adequate vacuum to both retrieve and capture the spent abrasive material and the abraded material. A first embodiment includes a vacuum and boost operation facilitated by the use of a foot control for high control of abrasion, cleaning and polishing. A second embodiment is for use with human tissue and includes a vacuum only system with filtered air. A third embodiment includes vacuum with automatic boost for skilled medical personnel use and uses a minimum vacuum level to trigger a pre-set boost operation. The system utilizes air filtration, ultra violet, heat oven sterilization and secure waste storage. A manual contact tool is used closely with the area to be abraded supplanting any other control other than the pressing of the manual contact tool against the surface to be abraded, to create sufficient vacuum to trigger boost operation.

Abstract: A polishing table 11 in the CMP apparatus 10 has a diameter smaller than the diameter of a polishing pad 12. The polishing pad 12 is disposed on the polishing table so as to cover the entire top surface of the polishing table 11. A space 13 is formed between outside of the outer peripheral surface of the polishing table 11 and under the outer peripheral bottom surface portion of the polishing pad 12 projecting outside from the edge of the polishing table 11. A trough 14 with an opening 14a on top thereof as a device for withdrawing the used slurry is disposed around the outer peripheral surface of the polishing table 11 so as to be located a part thereof in the space 13.

Abstract: Systems for abrasive action include machinery for creating a vacuum and positive pressure to enable flow control while providing adequate vacuum to both retrieve and capture the spent abrasive material and the abraded material. A first embodiment includes a vacuum and boost operation facilitated by the use of a foot control for high control of abrasion, cleaning and polishing. A second embodiment is for use with human tissue and includes a vacuum only system with filtered air. A third embodiment includes vacuum with automatic boost for skilled medical personnel use and uses a minimum vacuum level to trigger a pre-set boost operation. The system utilizes air filtration, ultra violet, heat oven sterilization and secure waste storage. A manual contact tool is used closely with the area to be abraded supplanting any other control other than the pressing of the manual contact tool against the surface to be abraded, to create sufficient vacuum to trigger boost operation.

Abstract: An improved method and apparatus for media blasting a workpiece 20 is described. The media blasting apparatus 10 of the present invention includes a media reclaim and recycle system 35 , which reduces media wastage, advantageously improves peening of a workpiece 20 and provides better coverage of the workpiece surface. The media blasting apparatus 10 also includes a pressure chamber 90 for creating a media blast stream, a media metering valve 105 for controlling media flow rate and a powered part hold-down apparatus 130 for holding the workpiece 20 in a predetermined position during a blasting operation. The controlled media flow rate in combination with the powered hold down of the workpiece 20 ensures even and thorough peening of a workpiece surface.

Abstract: A preferred embodiment of a workpiece finishing system impinges a grit and fluid slurry onto a workpiece and then recycles the slurry for subsequent reuse. In another aspect of the present invention, a recovery tank is used for generally settling and concentrating the grit in the slurry, and for separating out a portion of the fluid from the grit. A further aspect of the present invention provides a venturi-type nozzle for expelling the grit and fluid onto a workpiece, wherein the nozzle has a selectively movable inlet thereby varying the slurry concentration properties of the nozzle.

Abstract: An improved hand piece apparatus for use with abrasive cleaning devices uses a control switch that can be controlled manually by an operator to controllably regulate the amount a mixture of a pressurized air with abrasive particles at the nozzle head inlet port of the nozzle head assembly.

Abstract: A method and apparatus are provided for reclaiming used abrasives. This is done by achieving a turbulent levitating fluidized bed in an elongated enclosure which is provided with a porous bottom through which air is blown at a desired velocity. In the upper portion of the enclosure there is provided a plurality of suction hoods to remove airborne contaminants and fines from the fluidized bed, leaving only re-usable abrasives. The elongated enclosure can be vibrated, if desired. Also air may be heated to remove moisture from the used abrasives.

Abstract: A first pump collects used slurry which is employed for a CMP technique. A new slurry supply device supplies new slurry having a concentration higher than a concentration of the used slurry, to the used slurry. A sensor measures a concentration of recycled slurry produced by mixing the used slurry with the new slurry. The new slurry supply device stops supplying the new slurry, in a case where the concentration which the sensor measures is equal to or above a predetermined value. A second pump supplies recycled slurry onto a polishing stage, after the used slurry is completely recycled.

Abstract: A slurry recycle process for use in free-abrasive machining operations such as for wire saws used in wafer slicing of ingots, where the used slurry is separated into kerf-rich and abrasive-rich components, and the abrasive-rich component is reconstituted into a makeup slurry. During the process, the average particle size of the makeup slurry is controlled by monitoring the condition of the kerf and abrasive components and making necessary adjustments to the separating force and dwell time of the separator apparatus. Related pre-separator and post separator treatments, and feedback of one or the other separator slurry output components for mixing with incoming used slurry and recirculation through the separator, provide further effectiveness and additional control points in the process.