Abstract: The present invention relates to a bioactive glass comprising strontium and silicon dioxide, processes for the production of the bioactive glass and the use of the bioactive glass in medicine.

Abstract: A glass composition of the present invention is manufactured by melting glass raw materials and contains a multicomponent oxide as a main component, and the glass composition contains at least one of helium and neon in an amount of 0.01 to 2 ?L/g (0° C. 1 atm).

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract: A glass composition of the present invention includes the following components, in terms of mass % and mass ppm: 60 to 79% SiO2; 0 to 13% B2O3 (exclusive of 13%); 0 to 10% Al2O3; 0 to 10% Li2O; more than 0% but not more than 20% Na2O; 0 to 15% K2O; 0 to 10% MgO; 0 to 15% CaO; 0 to 15% SrO; 0 to 15% BaO; 0 to 10% ZnO; 0 to 15% Nb2O5; 0 to 20% Ta2O5; more than 0.02% but not more than 10% TiO2; and 0.5 to 50 ppm T-Fe2O3 (where T-Fe2O3 denotes a total iron oxide obtained by converting all of iron compounds into Fe2O3).

Abstract: An ultraviolet ray transmitting glass composition including the following components, in terms of mass % or mass ppm: 60 to 79% SiO2; 0 to 1% B2O3; exceeded 0% but not more than 20% Al2O3; 0 to 10% Li2O; 5 to 20% Na2O; 0 to 15% K2O; 0 to 10% MgO; 0 to 10% CaO; 0 to 15% SrO; 0 to 2% refining agent; 2 to 20 ppm T-Fe2O3 (in which T-Fe2O3 denotes a total iron oxide content obtained by converting all of iron compounds into Fe2O3); and 0 to 200 ppm TiO2. The ultraviolet ray transmitting glass composition is suitable for a glass article, such as a bioanalytical device that is used for analysis using ultraviolet rays.

Abstract: Lithium silicate materials are described which can be easily processed by machining to dental products without undue wear of the tools and which subsequently can be converted into lithium silicate products showing high strength.

Abstract: Lithium silicate materials are described which can be easily processed by machining to dental products without undue wear of the tools and which subsequently can be converted into lithium silicate products showing high strength.

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract: It is to provide a silica glass containing TiO2, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero. A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ti3+ concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200° C., a coefficient of thermal expansion from 0 to 100° C. of 0±150 ppb/° C., and an internal transmittance T400-700 per 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO2, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.

Abstract: A mixed quartz powder contains quartz powder and two or more types of doping element in an amount of from 0.1 to 20 mass %. The aforementioned doped elements include a first dope element selected from the group consisting of N, C and F, and a second dope element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, the lanthanides and the actinides. The “quartz powder” is a powder of crystalline quartz or it is a powder of glassy SiO2 particles. It is made form natural occurring quartz or it is fabricated synthetically. The “quartz powder” may be doped. The compounding ratio of the total amount (M1) of the aforementioned first elements and the total amount (M2) of the aforementioned second elements as the ratio of the number of atoms (M1)/(M2) is preferably from 0.1 to 20. Al as well as the aforementioned doped elements is preferably included in a mixed quartz powder of this invention.

Abstract: A bioactive glass having a composition substantially comprising 30 to 60 mol % of CaO, 40 to 70 mol % of SiO2 and 20 mol % or less of Na2O has low glass transition temperature and/or crystallization temperature, and a sintered calcium phosphate obtained by using the bioactive glass as a sintering aid has excellent biocompatibility, mechanical strength and sinterability.

Abstract: A method of treating sensitive teeth includes (1) attaching a fluoride releasing glass composition to a person's tooth, and (2) allowing fluoride to be slowly released over time in order to reduce chronic and/or acute tooth sensitivity. A preferred glass composition comprises the general empirical formula given below, expressed in approximate weight percent of the element: P: 16-24, F: 5-30, O: 20-40 and at least one of Na, K, Li, or Al in an amount up to a total of about 40 weight percent and optionally, up to about 5 weight percent of boron and/or silicon.

Abstract: A silica glass containing from 3 to 10 mass % of TiO2, which has a coefficient of thermal expansion from 0 to 100° C., i.e. CTE0 to 100, of 0±300 ppb/° C. and an internal transmittance per mm in thickness within a wavelength region of from 200 to 700 nm, i.e. T200 to 700, of at most 80%.

Abstract: The present invention provides an alkali alumino-silicate Na—F-containing glass material and a method of making the alkali alumino-silicate Na—F-containing glass material, with the glass material capable of being made photosensitive and thus formed into optical elements at wavelengths ranging between about 240 to 350 nm, and more particularly at the standard 248 nm wavelength of excimer lasers. Also disclosed is optical element wherein a refractive index pattern formed in the alumino-silicate Na—F containing glass material, the refractive index pattern including regions of high refractive index and regions of low refractive index, the difference between the refractive indices of the high refractive index regions and the low refractive index regions being at least 4×10?5 at a wavelength of 633 nm.

Abstract: A pressable dental ceramic comprising a mixture of glass and glass-ceramic frits. A refractory filler is also combined with the frits. The dental ceramic contains an amount of leucite less than about 35 percent by weight. Other additives may be included such as pigments, opacifying agents and fluorescing agents. The dental ceramic comprises a cellular-like microstructure comprised of glassy regions surrounded by clusters of leucite crystals distributed around those glassy regions forming a cellular three-dimensional network.

Abstract: The invention relates to a photostructurable body, in particular glass or glass-ceramic, in which the glass is a multicomponent glass and/or the glass-ceramic is a multicomponent glass-ceramic, in each case having a positive change in refractive index ?n as a result of the action of light.

Abstract: A bioactive glass having a composition substantially comprising 20 to 40 mol % of CaO, 40 to 60 mol % of SiO2, and 10 to 20 mol % of MgO is high in bioactivity and mechanical strength, and a sintered calcium phosphate glass using the bioactive glass as a sintering aid is excellent in biocompatibility and mechanical strength.

Abstract: An optical glass wherein an amount of change in refractive index (?n: difference in refractive index between a state before radiation and a state after radiation) caused by radiation of laser beam at wavelength of 351 nm having average output power of 0.43 W, pulse repetition rate of 5 kHz and pulse width of 400 ns for one hour is 5 ppm or below is provided. The optical glass comprises a fluorine ingredient and/or a titanium oxide ingredient and/or an arsenic oxide ingredient. The optical glass suffers little change in refractive index by radiation of strong light having wavelengths of 300 nm to 400 nm such as ultraviolet laser.

Abstract: A glass composition having the general empirical formula given below, expressed in weight percent of the element: P: 16–24, F: 5–30, O: 20–40 and at least one of Na, K, Li or Al in an amount up to a total of 40 wt. % and optionally, up to 5 wt. % of boron and/or silicon. The composition may be used for the treatment and/or prevention of dental caries by providing a slow fluoride releasing device that may be attached to a tooth to release fluoride into the saliva or an individual.

Abstract: The invention relates to an antimicrobial, anti-inflammatory and disinfecting glass, whereby the glass comprises: 30–95 wt. % SiO2,0–40 wt. % Na 2O, 0–40 wt. % K2O, 0–40 wt. % Li2O, 0–35 wt. % CaO, 0–10 wt. % MgO, 0–10 wt. % Al2O3, 0–15 wt. % P2O5 wt. % B2O3?, 0–10 wt. % NaF, 0–10 wt. % LiF, 0–10 wt. % KF, 0–10 wt. % CaF2, 0–5 wt. % Ag2O, 0–10 wt. % MgF2,0–2 wt. % Fe2O3and 0–10 wt. % XJy, where X?Li, Na, K, Rb, Cs, Be, Mg, Ca, Sr, Ba, Ag or Zn and y=1 or y=2 and the sum of XJy> is 10 ppm.

Abstract: The invention concerns an optical colored glass with a composition (in percent by weight based on oxide) of SiO2 30–75; K2O 5–35; B2O3>4–17; ZnO 5–37; F 0.01–10; CdO 0.1–1, S+Se+Te 0.1–1.5 as well as the use of this glass as a long-pass cutoff filter.

Abstract: The invention encompasses a glass-ceramic comprising a continuous glass phase and a crystal phase comprising tetragonal leucite, wherein the glass-ceramic has a crack-free glass phase and a crystal phase comprising leucite crystals distributed essentially homogeneously in the glass phase. The crystal phase has a particle size distribution made of from about 5% to about 70% of a first group of leucite crystals having particle sizes of <1 ?m and from about 30% to about 95% of a second group of leucite crystals having particle sizes of ?1 ?m. The proportion of Li2O in the glass-ceramic is preferably below 0.5% by weight. It is preferred that not only the glass phase but also the crystal phase is essentially free of cracks. The corresponding glass-ceramics are particularly suitable for use in the dental sector, in particular as facing ceramics.

Abstract: An alkaline-earth aluminosilicate glass having a composition (in % by weight, based on oxide) of SiO2>55-64; Al2O3 13-18; B2O3 0-5.5; M5O 0-7; CaO 5.5-14; SrO 0-8; BaO 6-17; ZrO2 0-2; CeO2 0-0.3; TiO2 0-0.5; CoO 0.01-0.035; Fe2O3 0.005-0.05; and NiO 0-0.

Abstract: The present invention is a thulium doped silicate glass having an excellent fluorescent emission in the 1.4 ?m band, and the usage thereof. The silicate glass of this invention includes: 65˜95 mol % SiO2; 0.5˜30 mol % bivalent metal oxide consisting of one or more material selected from ZnO, BaO, SrO and PbO; and 1˜15 mol % of SnO2 or TiO2, wherein 3˜30 mol % oxygen of the glass composition are replaced with fluorine, and 0.01˜1 mol % of thulium ions are doped, and the fluorescence lifetime of the 3H4 level of the Tm3+ is more than 50 ?s. The silicate glass can be easily formed into a waveguide, such as optical fiber, and it has an excellent ability to splice with the optical fiber for transmission. They have excellent chemical durability and the characteristic of 1.4 ?m band fluorescent emission by suppressing the non-radiative transition through multi-phonon relaxation. Thus they have long fluorescence lifetime of the 3H4 of Tm3+.

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract: The invention relates to a crystalline composition, a poly-crystalline product and an article of manufacture comprising an amount of SiO2, Al2O3, CaO, Fe2O3, TiO2, K2O, P2O5, Cr2O3, ZnO, MgO, Na2O, Li2O, CeO2, ZrO2 and MnO2 and methods for preparation the same.

Abstract: Low-boron, high-barium glass compositions and fine-diameter glass fibers for forming clean room HEPA and ULPA filters, are provided. The compositions and resulting glass fibers preferably comprise a low concentration, less than about 1 weight percent, of boric oxide, a relatively high concentration of barium, such as from about 5.5 to about 18 weight percent barium oxide, and a concentration of alkali oxide ranging from about 10 to about 14.5 weight percent. Alumina is preferably present in the glass fiber compositions and the resulting glass fibers in a range of from about 4 weight percent to about 8 weight percent, and calcium oxide and magnesium oxide are preferably present in a range of from about 1 weight percent to about 6 weight percent and from about 0 weight percent to about 3.5 weight percent, respectively. The glass fiber compositions also preferably include from about 2 to about 6 weight percent zinc oxide, from about 0.1 to about 1.

Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content≦10 ppm, a F wt. % concentration≧0.5 wt. %.

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed with the silicon oxyfluoride glass having a preferred fluorine content<0.5 weight percent. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract: A bioactive glass having a composition substantially comprising 30 to 60 mol % of CaO, 40 to 70 mol % of SiO2 and 20 mol % or less of Na2O has low glass transition temperature, and/or crystallization temperature, and a sintered calcium phosphate glass obtained by using the bioactive glass as a sintering aid has excellent biocompatibility, mechanical strength and sinterability.

Abstract: The invention relates to the use of ions of weakly basic oxides as linking ions for polyacids in cements, preferably polyelectrolyte cements. Suitable ions comprise elements of the scandium series, for example, Sc3+, Y3+, La3+, Ce4+ and all subsequent tri- and tetra-valent lanthanides and the ions Mg2+, Zn2+, Ga2+, In2+. The application of said ions permits a regulation of the cement reaction without surface treatment of the glass powder.

Abstract: The lead-free optical glasses have an index of refraction (nd) between 1.49 and 1.55 and an Abbé number (&ngr;d) between 47 and 59. They contain (in percent by weight on an oxide basis) 60 to 70, SiO2; 0.3 to 5, Al2O3; 16 to 25, Na2O; 0 to 9, TiO2; 0 to 7, advantageously 0.1 to 2, ZrO2; 0 to <0.5, Nb2O5; 0 to 7, Ta2O5 and 0 to 3, F. The lead-free optical glass is advantageously free of arsenic oxide, except for impurities, and contains antimony oxide as a fining agent.

Abstract: An optical glass wherein an amount of change in refractive index (&Dgr;n: difference in refractive index between a state before radiation and a state after radiation) caused by radiation of laser beam at wavelength of 351 nm having average output power of 0.43W, pulse repetition rate of 5 kHz and pulse width of 400 ns for one hour is 5 ppm or below is provided. The optical glass comprises a fluorine ingredient and/or a titanium oxide ingredient and/or an arsenic oxide ingredient. The optical glass suffers little change in refractive index by radiation of strong light having wavelengths of 300 nm to 400 nm such as ultraviolet laser.

Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm−1 (I2250) to the scattering peak intensity of 800 cm−1 (I800), i.e. I2250/I800, of at most 1×10−4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10−3 cm−1.

Abstract: Potassium-zinc-silicate glasses are described which because of their high chemical stability as well as their optical properties and favorable working properties are suitable in particular as coating or veneering materials for ceramic dental suprastructures and thus for the preparation of all-ceramic dental restorations, such as crowns or bridges.

Abstract: Organofluorosilicate glass films contain both organic species and inorganic fluorines, exclusive of significant amounts of fluorocarbon species. Preferred films are represented by the formula SivOwCxHyFz, where v+w+x+y+z=100%, v is from 10 to 35 atomic %, w is from 10 to 65 atomic % y is from 10 to 50 atomic %, x is from 1 to 30 atomic %, z is from 0.1 to 15 atomic %, and x/z is optionally greater than 0.25, wherein substantially none of the fluorine is bonded to the carbon. In one embodiment there is provided a CVD method that includes: providing a substrate within a vacuum chamber; introducing into the vacuum chamber gaseous reagents including a fluorine-providing gas, an oxygen-providing gas and at least one precursor gas selected from an organosilane and an organosiloxane; and applying energy to the gaseous reagents in the chamber to induce reaction of the gaseous reagents and to form the film on the substrate.

Abstract: Fluorine-containing glass which comprises silica and contains, in said silica, not more than 10 ppm of OH group, not more than 10 ppm of Cl and not less than 1000 ppm of F, said fluorine-containing glass having a concentration ratio of F/Cl of 100 or more. Also disclosed is fluorine-containing glass which contains not more than 10 ppm of OH group, not more than 10 ppm of Cl and not less than 1000 ppm of F, and has a concentration ratio of F/Cl of 1000 or more.

Abstract: The lead-free optical light flint glass material has a refractive index nd between 1.54 and 1.61 and an Abbe number &ngr;d of between 38 and 45. It has a composition, based on oxide content, of SiO2 from 52 to 62% by weight, Al2O3 from 3 to 8% by weight, Na2O from 7 to 14% by weight, K2O from 8 to 14% by weight, TiO2 from 13 to 18% by weight, ZrO2 from 0 to 5% by weight, with at least one refining agent, if needed, in an amount suitable for the purposes of refining; and with the proviso that a sum total of Na2O and K2O present is greater than 18% by weight.

Abstract: The lead-free optical glasses have an index of refraction (nd) between 1.49 and 1.55 and an Abbé number (&ngr;d) between 47 and 59. They contain (in percent by weight on an oxide basis) 60 to 70, SiO2; 0.3 to 5, Al2O3; 16 to 25, Na2O; 0 to 9, TiO2; 0 to 7, advantageously 0.1 to 2, ZrO2; 0 to <0.5, Nb2O5; 0 to 7, Ta2O5 and 0 to 3, F. The lead-free optical glass is advantageously free of arsenic oxide, except for impurities, and contains antimony oxide as a fining agent.

Abstract: According to one aspect of the present invention an optically active glass contains Sb2O3, up to about 4 mole % of an oxide of a rare earth element, and 0-20 mole % of a metal halide selected from the group consisting of a metal fluoride, a metal bromide, a metal chloride, and mixtures thereof, wherein this metal is a trivalent metal, a divalent metal, a monovalent metal, and mixtures thereof. In addition, any of the glass compositions described herein may contain up to 15 mole % B2O3 substituted for an equivalent amount of Sb2O3.

Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm−1 (I2250) to the scattering peak intensity of 800 cm−1 (I800), i.e. I2250/I800, of at most 1×10−4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10−3 cm−1.

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract: The invention relates to a glass and a glass-ceramic comprising beta-quartz and/or keatite solid solutions, and to a process for their production, and to their use as substrate material for coating. Glass-ceramic comprising beta-quartz and/or keatite solid solutions with a surface roughness without polishing of Ra<50 nm, a thermal expansion in the temperature range between 20° C. and 300° C. of <1.2·10−6/K, a transmission in the near infrared region at 1050 nm of >85% for a 4 mm thickness, and a composition in % by weight, based on the total composition, containing: 1 Li2O 3.0-5.5 Na2O 0-2.5 K2O 0-2.0 &Sgr; Na2O + K2O 0.5-3.0 &Sgr; MgO + ZnO <0.3 SrO 0-2.0 BaO 0-3.5 B2O3 0-4.0 Al2O3 19.0-27.0 SiO2 55.0-66.0 TiO2 1.0-5.5 ZrO2 0-2.5 &Sgr; TiO2 + ZrO2 3.0-6.0 P2O5 0-8.0 Fe2O3 <200 ppm F 0-0.

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed with the silicon oxyfluoride glass having a preferred fluorine content<0.5 weight percent. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract: An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F2 excimer laser and a high resistance against irradiation of a F2 excimer laser radiation, yet having a uniformity suitable for such a fine patterning using a F2 excimer laser, and to provide an optical member using the same.

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract: Opaque porcelains for use with metal cores in the manufacture of PFM restorations. The porcelains exhibit a coefficient of thermal expansion (CTE) substantially equal to or slightly above the CTE of the metal to which it is applied. The porcelains exhibit a CTE equal to or up to about 1.5×10−6/° C. higher than the dental alloys to which they are applied as the opaque. The porcelains are fabricated from a mixture of two frit compositions. A high expansion, leucite containing frit is combined with a low melting glass frit to provide a porcelain having an expansion in the range of 16.9 to about 18×10−6/° C. in the temperature range of 25°-500° C.

Abstract: An article of manufacture that has a component capable of being sealed with a copper aluminosilicate glass. The sealing glass has a coefficient of thermal expansion (CTEs) of in the range between 20-82×10-7/° C., over a range of 25-500° C.) and a softening points in the range of 660-1000° C. The glass has a composition consisting essentially, in terms of weight percent on an oxide basis, of 35-68 SiO2, 3-25 Al2O3, 2-26 B2O3, 0-20 R2O, 0-30 RO, 2-33 CuO, 0-4 F, 0-10 MxOy, where R2O is an alkali oxide selected from the group consisting of Li2O, Na2O, and K2O, and RO is an alkaline earth oxide selected from the group consisting of CaO, MgO, ZnO, SrO, and BaO, and MxOy is a transition metal oxide selected from the group consisting of Co2O3, TiO2, NiO, MnO2, and Fe2O3. The present invention also pertains to a method of sealing the article.

Abstract: A glass consisting essentially of antimony oxide. An optically active glass consisting essentially of antimony oxide and up to about 4 mole % of an oxide of a rare earth element. A rare earth-doped, antimony oxide-containing glass including 0-99 mole % SiO2, 0-99 mole % GeO2, 0-75 mole % (Al, Ga)2O3, 0.5-99 mole % Sb2O3, and up to about 4 mole % of an oxide of a rare earth element. The oxide of the rare earth element may comprise Er2O3. The glass of the invention further includes fluorine, expressed as a metal fluoride. An optical energy-producing or light-amplifying device, in particular, an optical amplifier, comprising the above-described glass. The optical amplifier can be either a fiber amplifier or a planar amplifier, either of which may have a hybrid composition. Embodiments of the glass of the invention can be formed by conventional glass making techniques, while some of the high content antimony oxide embodiments are formed by splat or roller quenching.

Abstract: The present invention is directed at a copper aluminosilicate glass, having coefficients of thermal expansion (CTEs) of between 20-82×10−7/° C. (over a range of 25-500° C.) and a softening points in the range of 660-1000° C., being suitable for use as a sealing glass, especially for borosilicate glass, and having a composition consisting essentially, in terms of weight percent on an oxide basis, of 35-68 SiO2, 3-25 Al2O3, 2-26 B2O3, 0-20 R2O, 1-30 RO, 2-33 CuO, 0-4 F, 0-10 MxOy, where R2O is an alkali oxide selected from the group consisting of Li2O, Na2O, and K2O, and RO is an alkaline earth oxide selected from the group consisting of CaO, MgO, ZnO, SrO, and BaO, and MxOy is a transition metal oxide selected from the group consisting of Co2O3, TiO2, NiO, MnO2, and Fe2O3.