Abstract: A cutting device comprises a base having a solidified organic material layer disposed thereon. A plurality of individual polycrystalline cutting elements are secured in the solidified organic material layer. Each of the plurality of individual polycrystalline cutting elements has a substantially matching geometric configuration.

Abstract: The invention concerns a sanding element with a succession of overlapping lamellas (3, 4) comprising sanding grains (9), characterized in that these lamellas (3, 4) are alternately formed of sanding lamellas (3) and compressible lamellas (4), whereby each sanding lamella (3) rests on a compressible lamella (4).

Abstract: Superabrasive tools and their methods of manufacture are disclosed. In one aspect, a method of improving retention of superabrasive particles held in a solidified organic material layer of an abrading tool, a portion of each of said superabrasive particles protruding out of the solidified organic material layer is provided. The method may include securing a plurality of superabrasive particles in the solidified organic material layer in an arrangement that minimizes mechanical stress impinging on the protruding portion of any individual superabrasive particle when used to abrade a work piece. As an example, the arrangement of the plurality of superabrasive particles may be configured to uniformly distribute frictional forces across substantially each superabrasive particle.

Abstract: A chemical mechanical polishing article can be a single contiguous layer having a polishing surface, the layer being an elongated substantially rectangular sheet having a width and a length at least four times greater than the width. Forming a polishing article can include depositing a liquid precursor on a moving belt, at least partially curing the liquid precursor while on the moving belt to form a polishing layer, and detaching the polishing layer from the belt.

Abstract: Embodiments of the invention relate to polycrystalline diamond (“PCD”) exhibiting enhanced diamond-to-diamond bonding. In an embodiment, PCD includes a plurality of diamond grains defining a plurality of interstitial regions. A metal-solvent catalyst occupies at least a portion of the plurality of interstitial regions. The plurality of diamond grains and the metal-solvent catalyst collectively exhibit a coercivity of about 115 Oersteads (“Oe”) or more and a specific magnetic saturation of about 15 Gauss·cm3/grams (“G·cm3/g”) or less. Other embodiments are directed to polycrystalline diamond compacts (“PDCs”) employing such PCD, methods of forming PCD and PDCs, and various applications for such PCD and PDCs in rotary drill bits, bearing apparatuses, and wire-drawing dies.

Abstract: A grinding wheel is manufactured such that (a) any one of particles for an abrasive grain layer and particles for a substrate layer are put into the press-mold die, and other particles are put onto the particles in the press-mold die, and then the substrate layer and the abrasive grain layer are integrally press-molded to form a non-baked grinding chip with an arcuate shape; (b) depressions are formed on the abrasive grain layer of the non-baked grinding chip; (c) the grinding chip on which the depressions are formed is baked; and (d) the plurality of baked-grinding chips are adhered to a core of the grinding wheel.

Abstract: A chemical mechanical polishing pad manufacturing assembly is provided having a subpad layer having a top surface and a bottom surface; a backing plate having a top side and a bottom side; a sacrificial layer having at least two recessed areas designed to facilitate attachment of a subpad layer to the backing plate; wherein the subpad layer is disposed on the top side of the backing plate and the sacrificial layer is disposed on the bottom side of the backing plate, and wherein the at least two wrap around tabs extend to the bottom side of the backing plate. Also provide is a method of manufacturing a chemical mechanical polishing pad using the chemical mechanical polishing pad manufacturing assembly.

Abstract: A chemical mechanical polishing pad manufacturing assembly is provided having a subpad layer having a top surface and a bottom surface; a backing plate having a top side and a bottom side; a sacrificial layer having at least two recessed areas designed to facilitate attachment of a subpad layer to the backing plate; wherein the subpad layer is disposed on the top side of the backing plate and the sacrificial layer is disposed on the bottom side of the backing plate, and wherein the at least two wrap around tabs extend to the bottom side of the backing plate. Also provide is a method of manufacturing a chemical mechanical polishing pad using the chemical mechanical polishing pad manufacturing assembly.

Abstract: An abrasive particle includes a substantially spheroid metal containing matrix having a circumference and a super abrasive material having an average diameter of less than about 8 micrometer at least partially embedded the circumference of the metal containing matrix. The abrasive particle having an average diameter of less than about 200 micrometer.

Abstract: An abrasive article comprises a porous abrasive member, a nonwoven filter medium, and a porous attachment fabric. A plurality of openings in the porous abrasive member cooperates with the nonwoven filter medium to allow the flow of particles from an outer abrasive surface of the porous abrasive member to the porous attachment fabric. Methods of making and using the abrasive articles are included.

Abstract: An improvement in a polishing apparatus for planarizing substrates comprises a tenacious coating of a low-adhesion material to the platen surface. An expendable polishing pad is adhesively attached to the low-adhesion material, and may be removed for periodic replacement at much reduced expenditure of force. Polishing pads joined to low-adhesion materials such as polytetrafluoroethylene (PTFE) by conventional adhesives resist distortion during polishing but are readily removed for replacement.

Abstract: A coated abrasive disk including (1) a loop fabric layer having a plurality of projected filament loops on one side thereof, (2) a carbon fiber textile layer or a glass fiber paper layer in a pre-dried state after impregnation-treatment with an adhesive resin, and (3) a coated abrasive material, which are sequentially stacked and tightly combined together, has an improved elasticity and high cutting performance characteristics.

Abstract: A process of making a laminate and laminate formed thereby and a process of making an abrasive laminate and laminate formed thereby include providing a first moving sheet having a first side and a second side, applying active foaming material in a pre-mixed form to the first side, providing a second moving sheet having a first side and second side, the second sheet provided in a manner such that the first side of the second sheet contacts the foaming material to form an uncured laminate and maintaining the first sheet and the second sheet at a predetermined distance relative to one another during a curing period of the foaming material such that the foaming material bonds to the first sheet and the second sheet and upon curing forms a laminate.

Abstract: The present invention relates to a flexible grinding product and a method of producing the same. Such a grinding product comprises a flexible underlay (1) which consists of two layers laminated to each other. These comprise a lower base layer (2) and an upper layer (3), a cavity layer. The underlay includes a top surface (5) having at least one adhesive layer (6) arranged thereto after lamination and a layer of grinding agent (7) applied by means of the adhesive layer. The grinding product is characterized in that the layer that is coated with grinding agent includes holes which form cavities (4), whereby the cavities provide space for grinding dust and grinding residues and facilitate their removal from the surface being ground.

Abstract: A polycrystalline abrasive composite cutter, including a tool body with a top cutting surface and a flank surface. The composite cutter, joined to a substrate, constitute a shear cutter for a PDC bit, roller-cone bit insert, or other tool that can be highly useful for petroleum drilling or other applications. The body of the polycrystalline abrasive composite cutter includes a plurality of polycrystalline abrasive layers (90) and a plurality of arresting layers (100). The polycrystalline abrasive layers (90) and the arresting layers (100) are arranged to alternate throughout the tool body in a direction normal to the top cutting surface (92) and in a direction normal to a flank surface (94). According to the design, the arresting layers (100) can be oriented so as to substantially arrest crack propagation through the polycrystalline abrasive material.

Abstract: An efficiently processible polishing tool, particularly used for a CMP pad conditioner, capable solving problems in a fixing strength for fixing abrasive grains to a base plate and problems in nonuniform polished surface and a method of effectively manufacturing the polishing tool. The polishing tool (1) comprises a polishing part formed of a super abrasive grain sintered body sintered integrally with the lining material of a cemented carbide. The polishing part comprises a plurality of polishing units (2) with top parts. The top parts are positioned on an approximately same plane. The polishing units (2) are formed by forming a linear groove (3) group in the polishing part.

Abstract: An aquarium wall cleaning device and a method for manufacturing the same are provided. The device may include a first flexible member including a main body formed from a flexible buoyant material, a first magnetic or magnetically attractable element disposed within the main body of the first flexible member, and a first layer attached to the main body of first flexible member and having an abrasive surface. The first flexible member may be substantially neutrally buoyant or negatively buoyant in water. The device may also include a second member including a main body, a second magnetic or magnetically attractable element disposed within the main body of the second member, and a second layer having a soft surface attached to the main body of the second member. At least one of the first and second magnetic or magnetically attractable elements may include a magnetic material. The other of the first and second elements may be magnetically attracted to the magnetic material.

Abstract: A polishing pad is provided. The polishing pad includes a polishing layer composed of a polymeric matrix and liquid microelements embedded in the polymeric matrix. Open pores defined by the embedded liquid microelements are distributed across a surface of the polishing layer. Due to the microstructural open pores uniformly distributed across a surface of the polishing pad, a polishing operation can be performed at high precision. The polishing pad shows constant polishing performance during the polishing operation, can be stably used, and does not cause a wafer to be scratched. In addition, a method of manufacturing the polishing pad is provided. Since all components used to manufacture the polishing pad are in a liquid phase, manufacturing can be easily performed.

Abstract: An abrasive product for removing stock from a work piece which is defined by a body of composite material consisting of layers of woven fibers bonded together and filled with epoxy-based resin and having a top coat of resin with abrasive particles embedded in the resinous top coat. The invention also includes a method for making such an abrasive product wherein the composite body has woven layers of fiber material bonded together by and filled with resin and a resinous top coat having a plurality of abrasive particular embedded therein is applied over the composite body.

Abstract: The present disclosure relates to a polishing pad. The polishing pad may include a polymer layer having a three-dimensional network therein and a composite layer having the ability to equalize pressure across the pad surface, including a first adhesive wherein the composite exhibits a hydrostatic modulus of 1 to 500 psi when compressed at a pressure of 1 to 50 psi.

Abstract: A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent layer can be positioned below the polishing layer and supporting the window member.

Abstract: An abrasive tool includes an assembly of tool precursors. At least one of the tool precursors has a continuous polycrystalline diamond, polycrystalline cubic boron nitride, or ceramic material cutting element formed into a blade shape. The abrasive tool can additionally include a setting material, which is configured to attach the tool precursors and form a single mass. The selection, arrangement, and setting of the tool precursors can result in an abrasive tool having a predetermined cutting configuration. Methods for forming such an abrasive tool are also disclosed.

Abstract: An abrasive cutting blade is provided to achieve high-quality surface finishes at high feed rates. The blade is fabricated by electroplating fine abrasive onto a steel cathode disc to form a first layer, followed by electroplating a second layer of coarser abrasive onto the first layer. A third layer of fine abrasive is then electroplated onto the second layer. The resulting composite is then removed from the cathode disc to form a multi-grit, multi-layer, hub-less blade.

Abstract: A tool for enlarging a borehole that includes an elongated tubular body; at least one movable arm affixed to the tubular body, the at least one movable arm comprising an outer surface formed of at least one of a matrix material and an abrasive material; and at least one actuating member for expanding at least one movable arm from the collapsed state to an expanded state is disclosed.

Abstract: In one embodiment is provided a method of making an abrasive backing having a smooth surface comprising the steps of providing a paper having a first paper surface and a second paper surface; applying a first synthetic polymeric layer comprising a first synthetic polymeric composition to the first paper surface; and applying a second synthetic polymeric layer comprising a second synthetic polymeric composition to the first synthetic polymeric layer. The method is used to prepare fine abrasive backings having a smooth exterior surface for preparation of fine abrasive papers.

Abstract: Provided is a method of polishing comprising providing a workpiece, providing a fixed abrasive article, providing conditioning particles, and relatively moving the workpiece and the fixed abrasive article in the presence of the conditioning particles to modify the surface of the workpiece and to condition the fixed abrasive. The fixed abrasive article comprises a substrate having a first surface and a region of abrasive composites distributed on the first surface of the substrate. The abrasive composites include a composite binder and abrasive particles, which may be in abrasive agglomerates together with a matrix material. The abrasive particles are harder than the workpiece. The conditioning particles are sufficient to condition one or more of the composite binder, matrix material, and abrasive agglomerates. The hardness of the conditioning particles is less than the hardness of the workpiece and they do not substantially polish the workpiece.

Abstract: A method of making an abrasive product includes compacting a cohesive layer of abrasive particles and particulate curable binder precursor prior to forming curable shaped structures, and then at least partially curing the curable binder precursor.

Abstract: The present invention relates to an abrasive product and to a method of manufacturing same. Such an abrasive product comprises a structured abrasive coating provided on an upper side (6) comprised by the abrasive product. Herein, abrasive grains (8) and glue (7) are molded on a backing such that the upper side of the abrasive product is provided with a three-dimensional product-specific pattern. This pattern is created by said abrasive grains and glue, which constitute an individual composite grain (9). In generating the pattern, a special computer program is utilized in a computer program product for placing said composite grains randomly over the upper side of the abrasive product. The invention also relates to a casting mould with which the thus obtained pattern may be transferred onto the upper side of the abrasive product. The invention further comprises an arrangement for manufacturing said casting mould.

Abstract: In a vitrified bonded grinding wheel having superabrasive grains 11 such as CBN, diamond or the like bonded with a vitrified bond 12, pores 16 of the vitrified bonded grinding wheel has impregnated thereinto a resin 17 consisting of any resin selected from, e.g., unsaturated polyester, vinyl ester and allyl ester which are in a liquid state at the normal temperature and which have a thermosetting property, and being capable of radical polymerization. Thus, any separation gas or the like is not generated when the impregnated resin is hardened, whereby the strength of the grinding wheel can be enhanced.

Abstract: A composite material comprises a plurality of cores of material selected from the group comprising carbides, nitrides, carbonitrides, cemented carbides, cemented nitrides, cemented carbonitrides and mixtures thereof, dispersed in a matrix. The matrix comprises the components for making an ultra-hard material, such as diamond or cBN abrasive particles, and a suitable binder. The ultra-hard material is polycrystalline in nature and is typically PCD or PcBN. The cores are typically provided as individual particles or in the form of granules. The granules may be further coated with a second coating, which may be a similar material to that of the cores or of an ultra-hard material of a different grade to that of the first coating. The composite material typically takes on a honeycomb structure of a hard material and cores within the pores of the honeycomb structure bonded to the honeycomb structure. The pores of the honeycomb structure may be ordered or random.

Abstract: A web-style polishing pad includes a guide layer through which individual polishing elements protrude on one side and a flexible under-layer attached to the other side. The polishing elements may be affixed at their base to the compressible under-layer and pass through corresponding holes in the guide layer so as to be maintained and translatable in a substantially orthogonal orientation with respect to a plane defined by the guide layer.

Abstract: Disclosed are CMP conditioners which can suppress microscratching of the surface of a semiconductor substrate and can realize stable CMP conditioner properties. The CMP conditioner according to the first aspect of the present invention comprises a support member and a plurality of hard abrasive grains provided on a surface of the support member, wherein the plurality of hard abrasive grains are regularly arranged on the surface of the support member. The CMP conditioner according to the second aspect of the present invention comprises a support member and a plurality of hard abrasive grains provided on the surface of the support member, wherein the plurality of hard abrasive grains are arranged on the surface of the support member regularly and so as for the density of the hard abrasive grains to decrease from the inner side of the support member toward the outer side of the support member.

Abstract: Disclosed is a method for production of a laminate polishing pad which comprises a reduced number of steps and is excellent in productivity rate, and which causes no detachment between a polishing layer and a cushion layer and can prevent the groove clogging caused by a slurry or the like. Also disclosed is a laminate polishing pad produced by the method. A method for production of a laminate polishing pad, comprising the steps of: preparing a cell-dispersed urethane composition by a mechanical frothing process; ejecting the cell-dispersed urethane composition onto a cushion layer continuously while feeding the cushion layer; curing the cell-dispersed urethane composition while controlling the thickness of the composition evenly to form a polishing layer made of a polyurethane foam, thereby producing a long laminate sheet; and cutting the long laminate sheet.

Abstract: An alumina-film-polishing composition is for use in chemical mechanical polishing of an object to be polished that includes an alumina film with an irregular surface, so as to planarize the irregular surface. The polishing composition contains an alumina abrasive grain, and a protection-film-forming agent for forming a protection film on the surface of each of the alumina film and the alumina abrasive grain. The protection-film-forming agent is a water-soluble polymer that has a weight average molecular weight within a range of 100 to 1,000,000 and that is obtained by polymerizing a monomer having at least one OH group or COOH group in its molecule.

Abstract: Superabrasive tools and their methods of manufacture are disclosed. In one aspect, a method of improving retention of superabrasive particles held in a solidified organic material layer of an abrading tool, a portion of each of said superabrasive particles protruding out of the solidified organic material layer is provided. Such a method may include securing the plurality of superabrasive particles in the solidified organic material layer such that the organic material layer wicks up the protruding portions of the superabrasive particles. In addition to the wicking of the organic material layer around the superabrasive particles, various additional parameters may be utilized to improve retention. For example, in another aspect the plurality of superabrasive particles may be secured in an arrangement that minimizes mechanical stress impinging on protruding portions of any individual superabrasive particle when used to abrade a work piece.

Abstract: A method of manufacturing a tool component, which is typically a cutting element or a gauge stone in a rotary drill bit, including a layer of ultra-hard abrasive material bonded to a substrate, the layer of ultra-hard abrasive material comprising a pair of opposed end surfaces, an upper surface defined between the end surfaces, and at least one curved and tapered cutting edge defined at the intersection of the respective end surfaces and the upper surface. The respective cutting edges of the tool component and the respective end surfaces leading to the cutting edges are generally wedge-shaped, the upper surface of the layer following generally the same or a similar profile, at least in the region of the cutting edges.

Abstract: The invention provides a polishing pad for chemical-mechanical polishing comprising a polishing layer, a bottom layer, and a hot-melt adhesive, the hot-melt adhesive joining together the polishing layer and the bottom layer. The hot-melt adhesive comprises between about 2 and about 18 wt. % EVA and is substantially resistant to delamination when the polishing layer attains a temperature of about 40° C. The invention also provides a method of polishing a substrate with the aforementioned polishing pad, as well as a method of preparing such a polishing pad.

Abstract: A Zen Stick manufactured from a wood selected from the group consisting of Black and White Ebony, Olivewood, Bocote, Cocobolo, Purpleheart, Zebrawood, Tulipwood, Kingwood and a blend of Ebony, Olivewood, Cocobolo and Bocote., having a length of approximately eleven inches and a cylindrical outer surface of approximately one and a quarter inches, the cylindrical surface being highly polished.

Abstract: There is disclosed a method for manufacturing a polishing pad that is formed of a urethane foam pad and attached to a turn table to polish a wafer, the method comprising at least steps of: slicing a urethane foam cake to provide the urethane foam pad; and performing press processing with respect to the urethane foam pad with a pressure of 15000 g/cm2 or above, a polishing pad manufactured by this method, and a method for polishing a wafer by using this polishing pad. There can be provided a method for manufacturing a polishing pad that can stably obtain a wafer with high flatness, etc.

Abstract: The present invention relates to an abrasive backing and abrasive cloth and more particularly, to an abrasive backing including an upper weave layer and a lower weave layer which are comprised with warps and wefts, and a binding yarn which connects the upper weave layer and the lower weave layer, wherein the abrasive backing is woven by using the wefts of the upper weave layer having a different thickness from those of the lower weave layer. when the weft of the upper weave layer and that of the lower weave layer have a different thickness, the upper weave layer and the lower weave layer may have uneven surface having different details and coat abrasive materials having different grain sizes.

Abstract: A diamond polishing disc process includes the following steps. First, an adhesive material is coated on outer sides of the woven layer with a plurality of meshes, so as to form an adhesive layer. Next, the adhesive layer is adhered in an accommodation unit. Afterwards, pluralities of diamond particles are implanted in the adhesive layer, and are respectively adhered in each mesh of the adhesive layer. Then, a polymer material is filled into the accommodation unit, so as to fix the diamond particles to the polymer material. Finally, cure the polymer material, and remove it with the diamond particles from the accommodation unit, thus obtaining a diamond polishing disc base with the diamond particles arranged uniformly and having consistent in orientations.

Abstract: Embodiments of the present invention relate to diamond-silicon carbide composites, superabrasive compacts including such diamond-silicon carbide composites, and methods of fabricating such diamond-silicon carbide composites and superabrasive compacts. In one embodiment, a superabrasive compact includes a substrate and a superabrasive table bonded to the substrate. The superabrasive table comprises diamond-silicon carbide composite including a matrix comprising nanometer-sized silicon carbide grains and micrometer-sized diamond grains dispersed through the matrix. In another embodiment, a method of fabricating a superabrasive compact is disclosed. An assembly comprising a mixture including diamond particles and silicon is formed. The silicon comprises amorphous silicon, crystalline silicon crystallized from amorphous silicon formed by a milling process, or combinations thereof. A substrate is positioned in proximity to the mixture.

Abstract: The present invention provides a resilient hand-held abrasive article comprising a flexible and/or conformable grip comprising a top surface, a bottom surface and individual small high-grip pads attached to each other in a pattern that leaves voids therebetween, the individual small high-grip pads comprising a top and a bottom. The top surface of a sanding article is attached, and in certain embodiments removably attached, to the bottom of the high-grip pads and a bottom surface having abrasive particles coated thereon. In certain embodiments, the flexible and/or conformable grip may not comprise voids.

Abstract: Composite abrasive bodies, which include abrasive product supports, abrasive particles and cured adhesives bonding the abrasive product supports and the abrasive products, are provided. The cured adhesives may be two-component polyurethane or (meth)acrylate adhesives. In addition, methods for preparing the composite abrasive bodies are also provided.

Abstract: The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; and a buffer layer formed between the base material and an upper surface of the membrane with low permeability and embedded into the fibers of the base material. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided.

Abstract: The present invention relates to a method for producing an abrasive. The abrasive is embedded into silazane resin that has been coated onto a work surface. The abrasive may include abrasive particles such as diamond or cubic boric nitride and may additionally include silazane resin which is then embedded in the silazane resin coating.

Abstract: In an embodiment, an abrasive compact includes ultra-hard particles which are sintered, bonded, or otherwise consolidated into a solid body. The compact also includes various physical characteristics having a continuous gradient, a multiaxial gradient, or multiple independent gradients.

Abstract: An abrasive agglomerate includes a plurality of abrasive grains bonded together in a three-dimensional structure by a substantially continuous, non-porous inorganic binder, wherein the abrasive grains have an average size of between about 0.5 microns and about 1500 microns, the inorganic binder is less than about 75 percent, by weight, of the abrasive agglomerate, and the bulk density of the abrasive agglomerate is less than about 90 percent of the bulk density of the abrasive grains.

Abstract: Nonwoven abrasive articles, particularly lofty nonwoven abrasive articles, with a textured, non-planar surface and an abrasive coating thereon. The coating may cover the entire surface or only portions of the surface. The textured surface, composed of peaks or high regions and valleys or recessed regions, provides improved cut performance over nonwoven abrasive articles having a generally planar abrading surface.

Abstract: A coated abrasive disc has a backing comprising a synthetic woven fabric having a first major surface with a presize disposed thereon and a second major surface opposite the first major surface and having a backsize disposed thereon. The presize comprises a reaction product of a curable presize precursor comprising: at least one epoxy resin prepared by reaction of epichlorohydrin with at least one of bisphenol A or bisphenol F, polyfunctional (meth)acrylate, novolac resin, imidazole epoxy cure catalyst, dicyandiamide, and a photoinitiator. A glass woven fabric permeated with an at least partially crosslinked saturant is secured to the second major surface by a thermoplastic laminating adhesive disposed between the second major surface of the synthetic woven fabric and the glass woven fabric. A method of making the same is also disclosed.