Abstract: The present disclosure provides methods of making a vitreous bond abrasive article and a metal bond abrasive article. An abrasive article preform is produced by an additive manufacturing sub-process comprising the deposition of a layer of loose powder particles in a confined region and selective heating via conduction or irradiation to heat treat an area of the layer of loose powder particles. The loose powder particles include abrasive particles and organic compound particles, as well as vitreous bond precursor particles or metal particles. The abrasive article preform produced by additive manufacturing is subsequently heated to provide the vitreous bond abrasive article comprising the abrasive particles retained in a vitreous bond material, or to provide the metal bond abrasive article. Also, the methods include receiving, by an additive manufacturing device having a processor, a digital object specifying data for an abrasive article, and generating the abrasive article with the manufacturing device.

Abstract: A superabrasive compact and a method of making the superabrasive compact are disclosed. A superabrasive compact may comprise a plurality of polycrystalline superabrasive particles made of surface functionalized superabrasive particle The surface functionalized superabrasive particles may have halogens or organic moiety instead of hydrogen.

Abstract: Disclosed are substances and methods of cleaning musical instruments which are capable of abrading or removing dirt and grime from instrument surfaces or cracks. In one embodiment, the substance comprises a plastic flexible material mixed with at least one abrasive material. In one method of use: (1) a lubricant (such as a water/detergent solution) is gently sprayed on to a small area on the surface of a musical instrument; (2) the substance is, with light to medium pressure, rubbed across the lubricated surface multiple times until the area is visibly clean or smooth to the touch; and (3) steps one and two are repeated until the whole instrument is cleaned or smoothed.

Abstract: Composition, apparatus, and methods of composition and apparatus manufacture, for sharpening a paper shredder blade. Composition includes grinding powder, thickening agent, and additive. The thickening agent may be a white oil, an animal oil, an vegetable oil, or a stearine wax. The additive may be an antirust powder, an antiwear powder, an antistatic powder, or an antioxidation powder. The grinding composition is dispensed into a polyethylene film, and sealed to form the grinding apparatus, as a grinding sheet or a grinding packet. A method for forming a grinding sheet includes selecting the constituent materials for a grinding composition; stirring the constituent grinding composition materials; heating the constituent materials to melting; mixing the constituent materials, while melting and intermixing; cooling and packaging the grinding composition to form a grinding sheet or packet.

Abstract: Composition, apparatus, and methods of composition and apparatus manufacture, for sharpening a paper shredder blade. Composition includes grinding powder, thickening agent, and additive. The thickening agent may be a white oil, an animal oil, a vegetable oil, or a stearine wax. The additive may be an antirust powder, an antiwear powder, an antistatic powder, or an antioxidation powder. The grinding composition is dispensed into a polyethylene film, and sealed to form the grinding apparatus, as a grinding sheet or a grinding packet. A method for forming a grinding sheet includes selecting the constituent materials for a grinding composition; stirring the constituent grinding composition materials; heating the constituent materials to melting; mixing the constituent materials, while melting and intermixing; cooling and packaging the grinding composition to form a grinding sheet or packet.

Abstract: Composition, apparatus, and methods of composition and apparatus manufacture, for sharpening a paper shredder blade. Composition includes grinding powder, thickening agent, and additive. The thickening agent may be a white oil, an animal oil, an vegetable oil, or a stearine wax. The additive may be an antirust powder, an antiwear powder, an antistatic powder, or an antioxidation powder. The grinding composition is dispensed into a polyethylene film, and sealed to form the grinding apparatus, as a grinding sheet or a grinding packet. A method for forming a grinding sheet includes selecting the constituent materials for a grinding composition; stirring the constituent grinding composition materials; heating the constituent materials to melting; mixing the constituent materials, while melting and intermixing; cooling and packaging the grinding composition to form a grinding sheet or packet.

Abstract: Systems and methods are provided for processing abrasive slurry used in cutting operations. The slurry is mixed with a first solvent in a tank. The slurry is vibrated and/or ultrasonically agitated such that abrasive grain contained in the slurry separates from the other components of the slurry and the first solvent. After the abrasive grain has settled to a bottom portion of the container, the other components of the slurry and the first solvent are removed from the tank. The abrasive grain may then be washed with a second solvent. The abrasive grain is then heated and is suitable for reuse in an abrasive slurry.

Abstract: A coated abrasive product includes a particulate material containing green, unfired abrasive aggregates having a generally spheroidal or toroidal shape, the aggregates formed from a composition comprising abrasive grit particles, a nanoparticle binder, a dual function material, and a cross-linking agent. These green unfired abrasive aggregates can also be used in free abrasive products and bonded abrasive products.

Abstract: This invention relates to methods for plate dressing using slurry charged with abrasives and soft polymeric or metallic micro-nano spheres additives to produce substantially uniform abrasive height. Additionally, methods for plate dressing using slurry charged with abrasives and self-assembled polymers to produce substantially uniform abrasive height are disclosed.

Abstract: This invention provides a painted surface treating composition which includes a dispersion medium and an abrasive dispersing in the dispersion medium, and said abrasive has an average particle diameter of 12-55 ?m and a Mohs' hardness of 5.5-6. A painted surface treating method and a painted surface patching method using this painted surface treating composition are also provided.

Abstract: Composition, apparatus, and methods of composition and apparatus manufacture, for sharpening a paper shredder blade. Composition includes grinding powder, thickening agent, and additive. The thickening agent may be a white oil, an animal oil, an vegetable oil, or a stearine wax. The additive may be an antirust powder, an antiwear powder, an antistatic powder, or an antioxidation powder. The grinding composition is dispensed into a polyethylene film, and sealed to form the grinding apparatus, as a grinding sheet or a grinding packet. A method for forming a grinding sheet includes selecting the constituent materials for a grinding composition; stirring the constituent grinding composition materials; heating the constituent materials to melting; mixing the constituent materials, while melting and intermixing; cooling and packaging the grinding composition to form a grinding sheet or packet.

Abstract: A grinding composition for sharpening shredder blades of a shredder includes, based on total weight of the grinding composition, from 51 to 65 wt % of a grinding powder; from 5 to 35 wt % of a viscous grease agent; and from 3 to 30 wt % of at least one functional additive. A grinding sheet formed from the composition is used as a grinding product alone or in a bag. The composition is sealed in a bag and used as a grinding product. A process for manufacturing the latter grinding product employs an automatic form-fill-seal packaging machine. The shredder blades of a paper shredder are sharpened satisfactorily by the grinding composition as the grinding sheet or grinding product is shredded. The useful life of shredders is cost effectively extended while providing convenience in use that saves time and labor.

Abstract: An abrasive slurry, abrasive article, and method is provided for forming an abrasive coating on a surface of a backing. The abrasive slurry includes a continuous phase, a first discontinuous phase of abrasive particles dispersed in the continuous liquid phase, and a second discontinuous phase of binder precursor particles dispersed in the continuous liquid phase, so that the continuous liquid phase carries the first and second discontinuous phases. A coated abrasive article is formed by coating the abrasive slurry onto the surface of the backing, and then removing the continuous phase.

Abstract: The invention provides chemical-mechanical polishing (CMP) compositions and methods for polishing a silicon-containing substrate. A method of the invention comprises the steps of contacting a silicon-containing substrate with a polishing pad and an aqueous CMP composition, and causing relative motion between the polishing pad and the substrate while maintaining a portion of the CMP composition in contact with the surface of the substrate to abrade at least a portion of the substrate. The CMP composition comprises a ceria abrasive, a polishing additive bearing a functional group with a pKa of about 4 to about 9, a nonionic surfactant with an hydrophilic portion and a lipophilic portion wherein the hydrophilic portion has a number average molecular weight of about 500 g/mol or higher, and an aqueous carrier, wherein the pH of the composition is 7 or less. The method reduces defects on the wafers, particularly local areas of high removal.

Abstract: An abrasive is fabricated to obtain sliding and grinding effects. In the abrasive, grinding particles are wrapped by a wrapping material. Various sizes and shapes of molds and micro components can be finely polished to obtain mirror-grade surfaces.

Abstract: A CMP polishing slurry of the present invention contains cerium oxide particles, water, and a polymer of at least one of a methacrylic acid and the salt thereof, and/or a polymer of at least one of a methacrylic acid and the salt thereof and a monomer having an unsaturated double bond, preferably contains furthermore a dispersant or a polymer of monomers containing at least one of an acrylic acid and the salt thereof. The present invention provides a CMP polishing slurry and a polishing method that, after polishing, give a polished film having a smaller difference in residual film thickness due to a pattern density difference.

Abstract: A solution for fixed abrasive chemical mechanical polishing process including a protection constituent, a hydrolysis constituent and water is described. The protection constituent is used to protect a silicon nitride and its concentration is between 0.001 wt % and 10 wt %. The hydrolysis constituent is used to hydrolyze a silicon oxide and its concentration is between 0.001 wt % and 10 wt %. The concentration ofthe water is between 80 wt % and 99.998 wt %.

Abstract: A polish composition for metallic surfaces containing a polish and abrasive alumina nanoparticles in a water in oil emulsion composition composed of surfactants, suspending agents, and aluminum oxide particles of high purity of 200 nanometers or less having a median particle diameter of 0.24 microns together with an aliphatic hydrocarbon solvent producing a polish having cleaning properties and an enhanced high glossed surface from a single application.

Abstract: This invention provides for provides for abrasive compositions and methods of use of these compositions for the preparation of surfaces for the application of various coatings such as paints, lacquers and varnishes. The abrasive compositions of the invention provide rapid cleaning and dulling of the underlying surface rendering it suitable for the application of paints or other finishes.

Abstract: The polishing composition contains polyoxyethylene sorbitan mono-fatty acid ester, silicon dioxide, water soluble cellulose, an alkaline compound, and water. The content of polyoxyethylene sorbitan mono-fatty acid ester in the polishing composition is less than 0.0025% by mass. The polishing composition is appropriate for final polishing of silicon wafers.

Abstract: An integral polishing pad includes an elastic support layer and a polishing layer, which is formed on the elastic support layer and has a higher hardness than the elastic support layer. The elastic support layer and the polishing layer are made from materials chemically compatible with each other so that a structural border between the elastic support layer and the polishing layer does not exist. In addition, the integral polishing pad also includes a transparent region, which is transparent to a light source used to detect the surface state of an object being polished and integrated with the other elements of the integral polishing pad. The integral polishing pad has high planarization efficiency and uniform properties, and thus can be reliably used for polishing. In addition, the integral polishing pad prevents a congestion of a polishing slurry and facilitates delivery of the polishing slurry.

Abstract: An abrading composition and a process for abrading factory pre-finished surface coverings, wherein the abrading composition comprises an effective amount of wear-resistant particles, a rheology modifier, and a solvent. This invention further relates to a process to abrade wood floor surfaces and factory pre-finished wood floor surfaces, as well as a process for refinishing a factory pre-finished wood floor using the abrading composition.

Abstract: An aqueous polishing composition for chemical mechanical polishing of semiconductor devices of silica and circuits of aluminum, titanium or titanium nitride; wherein said aqueous composition includes, an oxidizing agent, an inhibitor of a polyalkyleneimine, and a pH buffer, and a method for polishing a semiconductor device by applying the polishing composition at an interface between a polishing pad and the semiconductor device.

Abstract: The object of the present invention is to provide a polishing agent for processing semiconductor, which can control coagulation and sedimentation and has stable and re-productive polishing properties under a proper dispersing condition to prevent generation of polishing flaw. The polishing agent for processing semiconductor comprises a compound having glucose structure, polishing particles and water.

Abstract: An abrasive slurry contains an alumina grain, an inorganic salt, a water-soluble chelating agent, an abrasive oil and a hardly water-soluble chelate aluminum salt or chelate nickel salt. The alumina grain has an average particle diameter of from 0.05 to 1 &mgr;m in an amount of from 0.1 to 10% by weight. The inorganic salt is selected from the group consisting of water-soluble inorganic aluminum salt and nickel salt in an amount of from 0.1 to 3% by weight. The content of the water-soluble chelating agent is from 0.1 to 3% by weight. The content of the abrasive oil is from 0.1 to 10% by weight. The content of the hardly water-soluble chelate aluminum salt or chelate nickel salt is not more than 0.1% by weight. The abrasive slurry is used for abrading an insulation layer of a semiconductor integrated circuit and a magnetic thin film head while they are produced.

Abstract: An abrasive article comprising a backing, a plurality of abrasive particles, a binder which adheres the abrasive particles to the backing, and a peripheral coat including an antiloading component is provided. The antiloading component is of the formula (CnH2n+1)—COO—M, wherein n is greater than 17 and M is selected from Group 1 of the Periodic Table, with the proviso that when M is lithium, n is greater than 21. The antiloading component can be included in a coated abrasive article, such as a lapping or structured abrasive article, and a nonwoven abrasive article.

Abstract: The method disclosed here comprises the steps of (a) mixing metal powder, a resin, abrasive grains, and a solid reducing agent at the normal (room) temperature through the melting point of the reducing agent to form a mixture and (b) molding and baking the mixture at the melting point of the reducing agent through that of the metal powder. The solid reducing agent is a fatty acid, preferably stearic acid having a volume ratio of 5 to 20% with respect to the metal powder. With is, it is possible to make metal-resin bond grindstones that give such high-quality mirror surfaces that have conductivity fit for ELID grinding and are not liable to have chippings or scratches and also have an Rmax value of approximately 3 nm or less.

Abstract: An abrasive article is provided for precision grinding purposes, and the article comprises 3 to 25 volume % vitreous bond, 3 to 56 volume % MCA abrasive grain, and 28 to 63 volume % open porosity. Substantially all porosity in the abrasive article is impregnated with a lubricant component consisting of an oil and wax mixture having an oil:wax weight ratio of about 3:1 to about 1:4.

Abstract: An abrasive article is provided that includes a bond system formed from a binder precursor and about 15% by weight or less of a wax-containing modifier. An abrasive article that includes the bond system exhibits an increase of workpiece surface abraded in a Woodsanding Normal Force Test as compared to an abrasive article including a bond system formed from a composition containing substantially no wax-containing modifier.

Abstract: A method for chemical mechanical polishing (CMP) a copper layer (22) begins by forming the copper layer (22). The copper layer (22) is then exposed to a slurry (24). The slurry (24) contains an oxidizing agent such as H.sub.2 O.sub.2, a carboxylate salt such as ammonium citrate, an abrasive slurry such as alumna abrasive, an optional triazole or triazole derivative, and a remaining balance of a solvent such as deionized water. The use of the slurry (24) polishes the copper layer (22) with a high rate of removal whereby pitting and corrosion of the copper layer (22) is reduced and good copper interconnect planarity is achieved. This slurry (24) has good selectivity of copper to oxide, and results in copper devices which have good electrical performance. In addition, disposal of the slurry (24) is not environmentally difficult since the slurry (24) is environmentally sound when compared to other prior art slurries.

Abstract: A magnetorheological fluid comprises non-colloidal magnetic particles, an abrasive, water, glycerol, and an alkaline buffer. The abrasive may be CeO.sub.2, the non-colloidal magnetic particles may be carbonyl iron, and the alkaline buffer may be Na.sub.2 CO.sub.3. The fluid is useful for magnetorheological finishing.

Abstract: A coated abrasive article comprised of a backing having a layer of grains adherently bonded thereto by a binding material, wherein the layer of grains comprises abrasive grains and nonabrasive composite grains, and the nonabrasive composite grains comprise inorganic nonabrasive particles bonded together by a binder selected from the group consisting of a metal salt of fatty acid, colloidal silica, and combinations thereof. The abrasive article has an unexpected abrading efficiency, performing equal to, or superior to, a coated abrasive article containing only abrasive grains. The invention also relates to a bonded abrasive article comprising the abrasive grains and nonabrasive composite grains adhered together.

Abstract: An abrasive tape comprises a substrate and an abrasive layer, which is overlaid on the substrate and is constituted of fine abrasive grains and a binder, wherein the abrasive layer contains an alkyl sulfosuccinic acid salt ester. The abrasive tape gives little scratching and little chipping to materials to be abraded and has a sufficiently high abrasive powder.

Abstract: Film-backed and paper-backed coated abrasives and methods of making same are described using coatable urea-aldehyde binder precursor compositions including a urea-aldehyde resin and a cocatalyst, which yield more consistent quality coated abrasives. In addition, the compositions have longer pot life and allow curing at lower temperatures. The urea-aldehyde resins have an aldehyde/urea molar ratio of at least about 1.0, more preferably ranging from about 1.0 to about 2.0, and a free aldehyde content ranging from about 0.1 to about 3.0 weight percent based on weight of total aldehyde. The cocatalyst consists essentially of a Lewis acid and a salt selected from the group consisting of ammonium ion salts and organic amine salts. Paper-backed abrasive articles may employ a fabric nonwoven layer between the abrasive coating and the paper layer to reduce abrasive particle shelling.

Abstract: Microcapsules are prepared by dispersing or dissolving an active component or components in a solid matrix-forming material that has been thermally softened to form an encapsulation composition. The encapsulation composition is injected as an intact stream into a quenching liquid to provide solid microcapsules.

Abstract: Abrasive articles are described that include a plurality of abrasive particles, a plurality of coated grinding aid particles, the coated grinding aid particles comprising grinding aid particles coated with an inert, hydrophobic, hydrocarbon-containing substance, and a binder in which the abrasive particles and the coated grinding aid particles are dispersed.

Abstract: An abrasive article having a sheet-like structure having at least one major surface having deployed thereon a plurality of individual abrasive composites, each abrasive composite comprising a plasticizer and a plurality of abrasive particles dispersed in a binder, wherein said binder is formed by polymerizing a binder precursor and said plasticizer being combined with said binder precursor prior to said polymerizing in an amount of 30 to 70 parts plasticizer per 100 parts by weight of the combined binder precursor and plasticizer. There is also a method of using such as abrasive article to reduce the surface finish of a workpiece and a process of making the abrasive article.

Abstract: A non-woven abrasive material including a lofty, open, three dimensional web of non-woven fibers randomly intertwined and carrying abrasive particles and a binder material bonding the fibers together and bonding the abrasive particles to the fibers, with hydrogenated vegetable oil in solid form coating the fibers, particles and binder material at the surface of the web and within voids in the interior of the web, and preferably also with a coating of resinous plastic binder encapsulating the hydrogenated vegetable oil at the surface of the web and within its interior.

Abstract: A blast media for stripping contaminants from a solid surface comprises water soluble abrasive particles and a surfactant which reduces the amount of water soluble residues of blast media remaining on the targeted surface and which enables any residues which remain to be readily removed by fresh water.

Abstract: This invention relates to a composition comprising: water; particulate abrasive dispersed in said water, said abrasive having a Knoop scale hardness of at least about 1000 and an average particle size of from about 1 micron up to a U.S. Sieve Series Number of about 50; and an effective amount of at least one thickener to maintain a stable dispersion of said abrasive in said water. The inventive composition can contain one or more surfactants and/or one or more chelating agents. In one embodiment the invention provides for a water-based polish that can be used on any nonporous surface (e.g., glass, plastic, metal, painted surfaces, waxed surfaces, marble, ceramic, soft-precious and semi-precious stones, semi-conductor materials, metallurgical and geological specimens, Formica, etc.).

Abstract: Alumina-zirconia lapping abrasives containing tetragonal zirconia at a rate of 30% or less and optionally containing at least one oxide selected from the group consisting of yttrium oxide, calcium oxide, magnesium oxide, titanium oxide and other rare earth oxide in the form of solid solution, which are produced by fusing alumina-zirconia abrasive materials, quenching fused materials to obtain an ingot, crushing the ingot and subjecting the crushed ingot to a heat treatment at a higher temperature than the phase transition temperature of zirconia.

Abstract: The use of small amount of silica sol in conjunction with an organic binding agent significantly increases the strength of the bond in a vitreous bonded alumina containing abrasive wheel.

Abstract: A composition for abrading, polishing, honing or deburring a surface. The composition comprises a polyboron organo silicon polymer loaded with abrasive granules. The silicon-granules are modified with a metallic soap and a polybutylene. The metallic soap and polybutylene are gelled prior to blending with the polymer.

Abstract: Sintered microcrystalline ceramic material based on .alpha.-Al.sub.2 O.sub.3 with an addition of 0.01 to 2.0 weight percent of a cerium compound, consisting of a microcrystalline matrix and 0.1 to 30 volume percent whisker-like needles, whereby said cerium compound is mainly present in the needles. The whisker-like needles give this material a special tenacity combined with good abrasive results.

Abstract: An optical glass fiber polishing apparatus and method utilizing a slurry prised of water, CeO, glycerin and where needed, a base such as NaOh, to realize transmission loss in the fiber as it is polished towards the fiber core. The intensity of light introduced at one end of the fiber is measured at the opposite end, continuously and without interruption of the polishing, to determine polishing progress through the cladding towards the core.

Abstract: A polishing method and abrasive pads used to polish of abrade, for example, lenses. The pad is manufactured with an abrasives such as grains of the mean diameter: 0.5-10 .mu.m of alumina, zirconium oxide, tin oxide, and cerium oxide, a kind of water-soluble cellulose ether selected from the group of hydroxypropylmethyl and the like, and a kind of insolubilizing agent such as glyoxal, citric acid, and the like. The substances above are blended and coated on a sheet-like substrate. In polishing process, only water is poured between the rotating abrasives pad and goods to be polished.

Abstract: A method for polishing hydrophilic contact lenses which comprises applying a polish consisting of a substantially water free material that in solution acts as a surfactant and an optional abrasive material to the lens surface to be polished and applying a moving polishing tool to the lens.

Abstract: A coated abrasive article comprising a backing bearing on one major surface thereof a layer of abrasive grains overcoated with a loading resistant coating and on the other major surface thereof a layer of pressure-sensitive adhesive. The loading resistant coating comprises a lithium salt of a fatty acid. It may also contain additives selected from the group consisting of surfactants, wetting agents, binders, anti-foaming agents, fillers, plasticizers, and mixtures thereof. The use of a lithium salt of a fatty acid significantly reduces the amount of transfer between the loading resistant coating of a first coated abrasive article and the pressure-sensitive adhesive layer of a second coated abrasive article disposed within a package.

Abstract: A compound containing a tall oil fatty acid, oleic diethanol amide, aluminum oxide abrasive material, and organo-treated bentonite provides a polish for metals, such as aluminum, having a uniform viscosity and the abrasive particles uniformly dispersed throughout the carrier. Water may be added to form a scratch removing compound. Mineral spirits may be substituted for the fatty acid in the scratch remover to form a prepolish compound.

Abstract: Process for grinding and/or polishing metal articles in rotofinish equipment, in which (a) an adjusted quantity of said articles, which have a metal surface roughness that is higher than required for the finish, usually larger than 5 .mu.m in AA (i.e. arithmic average); are introduced to a rotofinish apparatus and rotated for some time with (b) an adequate quantity of chips suitable for grinding and/or polishing the metal articles to be treated and (c) a compound that promotes grinding and/or polishing comprising one or more organic acids, wherein the compound is an organic acid or mixture of organic acids or solutions of organic acids in a concentration suitable for grinding and/or polishing the metal articles, and in that the grinding environment also comprises a finely divided metal or alloy with an oxidation potential greater than zero.