Abstract: A removal composition is described, having a plurality of abrasive particles, an organic amine, antioxidant, biocide, colorant, corrosion inhibitor, cosolvent, defoamer, dye, enzyme, light stabilizer, odor masking agent, plasticizer, preservative, rust inhibitor, surfactant, thickener, or a combination comprising at least one of the foregoing; from 0 to 1% water, based on the total weight of the removal composition; and a ketal adduct of formula (1) wherein R1 is C1-6 alkyl, R2 is hydrogen or C1-3 alkyl, each R3, R4, and R5 is independently hydrogen or C1-6 alkyl, R6 and R7 are each independently hydrogen or C1-6 alkyl, a=0-3, and b=0-1.

Abstract: A method and composition for removing bulk and ion-implanted photoresist and/or post-etch residue material from densely patterned microelectronic devices is described. The composition includes a co-solvent, a chelating agent, optionally an ion pairing reagent, and optionally a surfactant. The composition may further include dense fluid. The compositions effectively remove the photoresist and/or post-etch residue material from the microelectronic device without substantially over-etching the underlying silicon-containing layer(s) and metallic interconnect materials.

Abstract: A cleaning agent for hard surfaces, which is made of a combination of at least one alkyl pyrrolidone, at least one glycol ether, and at least one anionic surfactant, exhibits very good cleaning power and cleaning speed for dirt of different kinds and can be utilized particularly for cleaning glass.

Abstract: A microbicidal and decontaminant composition comprising an aqueous solution of peroxides and peracids having equilibrium reaction products, a photoreactive surfactant, and a polymer, wherein said polymer interacts with said peroxides and said peracids.

Abstract: The present invention provides compositions which not only effectively kill a broad spectrum of microorganisms present on surfaces on contact but continue to kill microorganisms for a period of time thereafter.

Abstract: Provided are compositions containing a compatible mixture of a cationic surfactant and an anionic surfactant. A composition according to the invention comprises: (a) a first surfactant of formula I: wherein R, R1, R2, and R3 Y, X, and n are as defined below; (b) a second surfactant that is oppositely charged to the first surfactant.

Abstract: The present invention relates to formulations comprising water-soluble granulates of phthalocyanine compounds, to a process for the preparation thereof, and to the use thereof in washing agent and washing agent additive formulations.

Abstract: The invention relates to an aqueous cleaning composition for use in a cleaning process during or after a chemical mechanical planarization for a copper integrated circuit processing, comprising 0.05 to 20 wt % of a nitrogen-containing heterocyclic organic base, 0.05 to 50 wt % of an alcohol amine, 0.01-10 wt % of a quaternary ammonium hydroxide, and water. When used during or after the planarization process, the inventive cleaning composition of the invention can effectively remove residual contaminants from the surfaces of the wafers and simultaneously maintain a good surface roughness of the wafers.

Abstract: The invention relates to gemini surfactants of formula IA wherein A is a core derived from an organic polyhydroxy compound; R1 and R2 are each independently a hydrophobic group; and R3 and R4 are each independently a surfactant head group. Such surfactants can be used as components of fluids used in the petroleum industry or used in formulating cleansing compositions or detergent compositions.

Abstract: The present invention relates to the use of metal complex compounds with terpyridine ligands as oxidation catalysts. The present invention relates also to formulations comprising such metal complex compounds, to novel metal complex compounds, and to novel ligands. The metal complex compounds are used especially tor improving the action of peroxides, for example in the treatment of textile material, without at the same time causing any appreciable damage to fibres and dyeings.

Abstract: The invention relates to compositions and methods of removing silicon-based anti-reflective coatings/hardmask layers.

Abstract: The invention relates to a cleaning agent, characterized in that the cleaning agent comprises a microemulsion or a fluid nanophase system, and has the following components: a) at least one non-water-soluble substance having a solubility in water of less than 4 g per liter; b) at least one amphiphile substance, NP-MCA, that has no tenside structure, does not form structures on its own, has a solubility in water or oil between 4 g and 1000 g per liter, and preferably does not accumulate at the oil-water boundary, with the provision that NP-MCA is not selected from among 2-Ethyl-1,3-Hexanediol, 2-Methyl-2,4-Pentanediol, 2-(n-Butyl)-2-Ethyl-1,3-Propanediol and/or 1,2-Diols; c) at least one anionic, cationic, amphoteric and/or non-ionic tenside; d) water and/or a water-soluble solvent having hydroxyl functionality and, optionally, additives.

Abstract: A wet cleaning solution, comprising 0.01-3 wt % of an amphoteric imidazolium surfactant capable of forming a complex with metal ions, a pH adjuster, and balanced deionized water. The wet cleaning solution is substantially free of corrosion inhibitor other than the imidazolium amphoteric surfactant.

Abstract: Photoresist strippers and cleaning compositions of this invention are provided by non-aqueous cleaning compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise at least one polar organic solvent, at least one hydroxylated organic amine, and at least one corrosion inhibitor polymer having multiple hydroxyl- or amino-functional groups pendant from the polymer backbone.

Abstract: Detergent compositions comprising a color transfer inhibitor and optionally surfactant(s), the color transfer inhibitor comprising one or more compounds selected from the group consisting of triazine derivatives corresponding to general formulae I and II: T(NH—Ar(CO2M)a)bHalc??(I) X—NH—CH2CH2—(NY—CH2CH2—)nNH—X??(II) wherein T represents a 1,3,5-triazinyl group; Ar represents a phenyl group; each M independently represents a substituent selected from the group consisting of H, Na, Li, and K; each Hal independently represents a halogen selected from the group consisting of Cl, Br, and I; each a independently represents 1, 2 or 3; b and c each represent 1 or 2 wherein b+c=3; each X represents a T(NH—Ar(CO2M)a)bHalc?1 group; each Y independently represents H or X; and n represents a number of 0 to 50, and uses therefor in washing and treating dyed and/or undyed textiles.

Abstract: A method for reducing the adhesion forces between hard surfaces and subsequently occurring soil is described. The method comprises the step of treating the hard surfaces with a liquid composition comprising special copolymers A. These copolymers A comprise structural units originating from a1) one or more special monomers comprising a cyclic amide structure or a2) one or more special alkoxylated monomers and b) one or more special monomers comprising an amido group and a sulfonic acid group in protonated or in salt form and may be crosslinked or non-crosslinked.

Abstract: The present invention relates to the use of metal complex compounds having hydrazide ligands as oxidation catalysts. Further aspects of the invention are formulations comprising such metal complex compounds, novel metal complex compounds and novel ligands. The metal complex compounds are used especially for enhancing the action of peroxides, for example in the treatment of textile material, without at the same time causing any appreciable damage to fibers and dyeings. There is also no appreciable damage to fibers and dyeings if these metal complexes are used in combination with an enzyme or a mixture of enzymes.

Abstract: The present invention provides a bleach activator which is at least one macrocyclic manganese complex selected from the group consisting of [MnIII(rac-14-decane)X2]Y, [MnIII(mes-14-decane)X2]Y.H2O and [MnIII(mes-14-decane)X2]Y represented by Formulas 1-3, as well as a preparation method thereof. Also, the invention provides a bleaching composition and bleaching detergent composition comprising the bleach activator. The bleach activator comprising the manganese complex is used in a granulated form. wherein X is at least one selected from chlorine (—Cl) and acetate (—OOCCH3), and Y is an anion selected from Cl?, Br?, F?, NO3?, ClO4?, OH?, NCS?, N3?, and PF6?.

Abstract: A stripping agent composition for a resist, containing (A) 0.1 to 10% by weight of an amine; (B) 80 to 99% by weight of an organic solvent having a Hansen's solubility parameter of from 18 to 33 MPa1/2; (C) 0.01 to 3% by weight of a sugar; and (D) 0 to 5% by weight of water; a method for stripping a resist, including the step of stripping the resist with the stripping agent composition; and a method for manufacturing a semiconductor device, including the step of stripping a resist with the stripping agent composition. By using the stripping composition of the present invention, for example, a high-quality IC or LSI semiconductor device circuit, especially a compound semiconductor device circuit can be more economically advantageously manufactured.

Abstract: The present invention provides a detergent composition D comprising at least one compound of formula (1) together with at least one compound of formula (2) wherein all substituents have the meanings as defined in the claims; as well as a process using such detergent composition and mixtures comprising fluorescent whitening agents.

Abstract: Antibacterial solution useful as a cleaning agent suitable for cutaneous use by humans or otherwise which is aqueous based, free of alcohol and surfactants and having a quaternary ammonium compound as its principal antimicrobial agent, a number of moisturizing agents and DMDM Hydantoin serving at least as a preservative.

Abstract: The present invention provides compositions and clear oil-in-water microemulsion containing up to 80% w/w of an oil, a surfactant system, a w/w oil/surfactant system ratio between 1 and 3, and a solubilizing-aid ingredient which is not a surfactant neither a VOC compound, the latter being present in an amount sufficient to ensure that the ratio oil/(surfactant+solubilizing aid) is comprised between 0.1 and 5. The present invention concerns also the articles and products associated the compositions and microemulsions, and the methods to manufacture them.

Abstract: A method for treating wood to inhibit leaching of copper compounds into the environment. The method comprises treating the wood with a copper-containing wood preservative and a latex copolymer.

Abstract: Provided is a hair detergent composition comprising the following components (a), (b), and (c): (a) and anionic surfactant, (b) a carboxylic acid selected from hydroxymonocarboxylic acids, dicarboxylic acids, and hydroxydicarboxylic acids, or a salt thereof, and (c) silicone derivative having a group containing both a hydroxyl group and a nitrogen atom as a side chain thereof bonded to a silicon atom. The hair detergent composition provides rich foaming during shampooing and at the same time is capable of giving excellent conditioning effects and luster to the hair.

Abstract: Back end photoresist strippers and residue compositions are provided by non-aqueous compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise a polar organic solvent, a hydroxylated amine, and as a corrosion inhibitor fructose.

Abstract: Water-soluble copolymers which comprise, in copolymerized form, (a) 60 to 99% by weight of at least one monoethylenically unsaturated polyalkylene oxide monomer of the formula I H2C?CR1—X—YR2—OnR3??I ?in which the variables have the following meanings: X is —CH2— or —C(O)—, if Y is —O—; is —C(O)—, if Y is —NH—; is —O— or —O—(CH2)4—, if Y is a chemical bond; Y is —O—, —NH— or a chemical bond; R1 is hydrogen or methyl; R2 is C2-C4-alkylene radicals, which may be identical or different and also linear or branched, but where at least 50% of the radicals R2 are ethylene; R3 is C1-C22-alkyl, phenyl, p-(C1-C12-alkyl)phenyl or hydrogen; n is an integer from 6 to 50, (b) 1 to 40% by weight of at least one nonquaternized dipolar monomer comprising at least one nitrogen atom, (c) 0 to 39% by weight of other nonionic monoethylenically unsaturated monomers and (d) 0 to 10% by weight of other anionic monoethylenically unsaturated monomers and have an average molecular weight Mw of from 2000 to 500 000 D, and the u

Abstract: The present invention relates to amine functionalized lipophilic compounds and their use in personal care products, particularly those for colored hair.

Abstract: A hair cleansing composition containing the following Components (A) to (D): (A) a sulfate surfactant represented by the following formula (1): R1—O—(C2H4O)n—SO3M??(1) (wherein, R1 represents a C10-18 alkyl or alkenyl, n stands for 0 or a positive integer and M represents sodium or ammonium), composed of from 30 to 45 wt. % of a sulfate exhibiting n=0, from 18 to 27 wt. % of a sulfate exhibiting n=1, from 10 to 20 wt. % of a sulfate exhibiting n=2 and the balance of sulfates exhibiting n=3 or greater, and containing the sulfates exhibiting n=0 to 2 in a total amount of 70 wt. % or greater based on the total sulfates, (B) a C6-18 hydrophobic sulfonic acid or salt thereof, (C) a hydroxycarboxylic acid, dicarboxylic acid or aromatic carboxylic acid, (D) an organic solvent; and having a pH of 2 or greater but less than 6.

Abstract: An improved cleaning composition and method adapted to clean a variety of hard surfaces. The improved cleaning composition and method includes the use of a cationic biocide that includes biguanide compounds and/or quats.

Abstract: A composition for removing a photoresist includes about 5 to about 20 percent by weight of an alcoholamide compound, about 15 to about 60 percent by weight of a polar aprotic solvent, about 0.1 to about 6 percent by weight of an additive, and pure water. The alcoholamide compound is chemically structured as follows: where R1 is a hydroxyl group or a hydroxyalkyl group, and R2 is a hydrogen atom or a hydroxyalkyl group.

Abstract: Disclosed are stabilized body care products, household products, textiles and fabrics comprising an effective stabilizing amount of at least one compound selected from the group consisting of formula (I)-(III) where G1 and G2 are independently alkyl of 1 to 4 carbon atoms or are together pentamethylene, Z1 and Z2 are each methyl, or Z1 and Z2 together form a linking moiety which may additionally be substituted by an ester, ether, hydroxy, oxo, cyanohydrin, amide, amino, carboxy or urethane group, X is an inorganic or organic anion, and where the total charge of cations h is equal to the total charge of anions j; and an organic UV filter selected from (c1) dibenzoylmethane derivatives; (c2) cinnamic acid esters; (c3) camphor derivatives; and (c4) trianilino-s-triazine derivatives.

Abstract: Bis(hydroxyquinoline)-metal complexes and the use thereof as bleach catalysts are described.

Abstract: The present invention provides solutions containing dexpanthenol in combination with xylitol, preferably further including a viscosity-enhancing agent to make solutions viscous so that the viscous solutions are not only capable of cleaning, disinfecting, and/or rinsing a contact lens in a lens case but also capable of cleaning and lubricating the contact lens directly in an eye. Such solutions can provide to the user an ability to clean and to rewet lenses anytime anywhere even without taking them out.

Abstract: The present disclosure relates to compositions useful for maintaining the clean impression of a carpet (that is, its scent and appearance) over an extended time despite occurrences that might damage the carpet surface. The composition, which includes an antimicrobial agent, an enzyme inhibitor, and an odor-reacting compound, can be used by a consumer to remove contaminants from the carpet and to prevent the odor associated with the decomposition of future contamination. Specifically, the composition has been shown effective in neutralizing odors associated with the decomposition of organic materials (such as urine or food spills) by absorbing and/or removing the odor-generating source. A manufacturing treatment composition and methods for using are also disclosed.

Abstract: Disclosed are stabilized body care products, household products, textiles and fabrics which comprise certain sterically hindered amine salt compounds. Dyed products and articles are effectively stabilized against color degradation. The products are for example skin-care products, hair-care products, dentifrices, cosmetics, laundry detergents and fabric softeners, non-detergent based fabric care products, household cleaners and textile-care products.

Abstract: Disclosed are stabilized body care products, household products, textiles and fabrics which comprise certain dialkylhydroxyamine stabilizers, dialkylhydroxylamine stabilizer salts, nitrone stabilizers or amine oxide stabilizers. Dyed products and articles are effectively stabilized against color degradation. The products are for example skin-care products, hair-care products, dentifrices, cosmetics, laundry detergents and fabric softeners, non-detergent based fabric care products, household cleaners and textile-care products.

Abstract: Disclosed are stabilized body care products, household products, textiles and fabrics which comprise certain dialkylhydroxyamine stabilizers, dialkylhydroxylamine stabilizer salts, nitrone stabilizers or amine oxide stabilizers. Dyed products and articles are effectively stabilized against color degradation. The products are for example skin-care products, hair-care products, dentifrices, cosmetics, laundry detergents and fabric softeners, non-detergent based fabric care products, household cleaners and textile-care products.

Abstract: The present invention relates to surfactant/solvent systems for liquid formulations comprising ?) one or more nonaromatic-based surfactants, ?) as solvent, one or more triester(s) of phosphoric acid with alcohols, preferably from the group consisting of 1) monohydric alkanols having 5 to 22 carbon atoms, for example with n-, i- or neo-pentanol, n-hexanol, n-octanol, 2-ethylhexanol, 2) diols or polyols, such as ethylene glycol, propylene glycol or glycerol, 3) aryl, alkylaryl, poly(alkyl)aryl and poly(arylalkyl)aryl alcohols, for example with phenol and/or cresol, octylphenol, nonylphenol, triisobutylphenol, tristyrylphenol, 4) alkoxylated alcohols obtained by reacting the alcohols mentioned above under 1), 2) or 3) with alkylene oxides, preferably (C1-C4)alkylene oxides, and 5) alkoxylated alcohols obtained by reacting monohydric alkanols having 1 to 4 carbon atoms and alkylene oxides.

Abstract: Disclosed are stabilized body care products, household products, textiles and fabrics which comprise certain sterically hindered amine salt compounds. Dyed products and articles are effectively stabilized against color degradation. The products are for example skin-care products, hair-care products, dentifrices, cosmetics, laundry detergents and fabric softeners, non-detergent based fabric care products, household cleaners and textile-care products.

Abstract: Use of metal complex compounds of formula (1) and/or (1?) [LnMemXp]zYq??(1), [L?nMemXp]zYq??(1?), wherein all substituents are as defined in the claims, as catalysts for oxidation reactions, and also novel metal complex compounds and novel ligands.

Abstract: Disclosed are stabilized body care products, household products, textiles and fabrics which comprise certain sterically hindered amine salt compounds. Dyed products and articles are effectively stabilized against color degradation. The products are for example skin-care products, hair-care products, dentifrices, cosmetics, laundry detergents and fabric softeners, non-detergent based fabric care products, household cleaners and textile-care products.

Abstract: The present invention provides compositions which not only effectively kill a broad spectrum of microorganisms present on surfaces on contact but continue to kill microorganisms for a period of time thereafter.

Abstract: A method for cleaning articles using a surfactant which is effective in the formation of stable microbubbles is provided. The surfactant for microbubble formation contains a (poly)oxyalkylene adduct (A) of an active hydrogen atom-containing compound (a) represented by formula (1) Z-[(AO)n—H]p??(1) wherein Z is the residue of an active hydrogen-containing compound (a) with a valence of P resulting from removal of the active hydrogen atom or atoms; A is an alkylene group containing 1 to 8 carbon atoms; n is an integer of 1 to 400; and p is an integer of 1 to 100. The foaming power of a 0.02% by weight aqueous solution of the (poly)oxyalkylene adduct (A) as measured at 20° C. by the Ross Miles test is not higher than 50 mm.

Abstract: Disclosed are stabilized body care products, household products, textiles and fabrics which comprise certain sterically hindered amine salt compounds. Dyed products and articles are effectively stabilized against color degradation. The products are for example skin-care products, hair-care products, dentifrices, cosmetics, laundry detergents and fabric softeners, non-detergent based fabric care products, household cleaners and textile-care products.

Abstract: The present invention provides a bleaching composition comprising a [3.3.1] bicycle compound of formula (I) carrying at least one C8-C22-alkyl chain, together with a peroxygen source.

Abstract: The present invention provides a bleaching composition comprising a [3.3.1] bicycle compound of formula (I) carrying at least one C8-C22-alkyl chain, the bleaching composition being substantially devoid of a peroxygen source.

Abstract: The present invention relates to the use of metal complex compounds which have terpyridine ligands and contain at least one quaternized nitrogen atom as oxidation catalysts. The present invention relates also to formulations comprising such metal complex compounds, to novel metal complex compounds and to novel ligands.

Abstract: Hard surface cleaning agents comprising a macrocyclic compound of the general formula L: wherein each of n1, n2 and n3 independently represents 1 or 2; and hard surface cleaning agents comprising a transition metal complex of the general formula (I): [MLaXb]cY??(1) wherein M represents a metal selected from the group consisting of manganese, iron, cobalt, copper, ruthenium, molybdenum, and combinations thereof; X represent a neutral or anionic ligand; Y represents a non-complex-bound anion; a represents 1 or 2; each of b and c independently represents a number of 0 to 6, with the proviso that b and c are selected such that the complex is neutral based on M, X and Y; and L represents a macrocyclic ligand of the general formula L; and methods of cleaning hard surfaces therewith.

Abstract: (Object) To provide a new electronic parts cleaning solution that inhibits the corrosion of silicon or metals other than the silicon, and that efficiently cleans off fine dust or organic matters adhered on the surface of electronic parts, and that does not have white turbidity easily. (Solution) An electronic parts clearing solution which is characterized in containing an anionic surfactant, hydroxide, metal corrosion inhibitor, water, and a nonionic surfactant represented by formula (I) and/or a nonionic surfactant represented by formula (II): HO-((EO)x—(PO)y)z—H??(I) R-[((EO)a—(PO)b)c—H]m??(II) (EO is an oxyethylene group, and PO is an oxypropylene group. x and y, and a and b are positive number, which x(x+y) and a(a+b) are 0.05 to 0.5 respectively, and z and c are positive integers. R is a residue group wherein hydrogen atoms are removed from hydroxyl group of alcohol or amine represented by a group having valency of 1˜4).

Abstract: A photoresist cleaning solution and method for forming photoresist patterns using the same. More specifically, disclosed are a photoresist cleaning solution comprising H2O and an ionic surfactant represented by Formula 1, and a method for forming a photoresist pattern using the same. By spraying the cleaning solution of the present invention over photoresist film before and/or after exposing step, pattern formation in an undesired region caused by ghost images can be removed.