Contains Compound Containing Keto Group Not Part Of A Ring And A Specified Rate-affecting Material; Or Contains A Specified Rate-affecting Material And A Nonspecified Photoinitiator Or Photosensitizer Patents (Class 522/12)
  • Patent number: 5034429
    Abstract: A photopolymerizable composition comprising (a) an addition polymerizable compound having a boiling point of 100.degree. C. or high under an atmospheric pressure, (b) a photoinitiator, and (c) a benzene derivative can provide a cured film having high strength suitable for producing, e.g. printed circuit boards.
    Type: Grant
    Filed: June 2, 1988
    Date of Patent: July 23, 1991
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Makoto Kaji, Nobuyuki Hayashi, Futami Kaneko
  • Patent number: 5034307
    Abstract: Titanocenes with, for example, .pi.-cyclopentadienyl ligands in which one or two carbo- or heterocyclic aromatic rings are bonded to the titanium, the aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the metal-carbon bond and being substituted by at least one free or etherified or esterified polyoxaalkylene radical, are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated substrates.
    Type: Grant
    Filed: August 21, 1990
    Date of Patent: July 23, 1991
    Assignee: Ciba-Geigy Corporation
    Inventors: Martin Riediker, Eginhard Steiner, Harry Beyeler, Manfred Rembold, Francissek Sitek
  • Patent number: 4970136
    Abstract: Titanocenes with, for example, .pi.-cyclopentadienyl ligands in which one or two carbo- or heterocyclic aromatic rings are bonded to the titanium, the aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the matal-carbon bond and being substituted by at least one free or etherified or esterified polyoxaalkylene radical, are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated substrates.
    Type: Grant
    Filed: June 5, 1989
    Date of Patent: November 13, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Martin Riediker, Eginhard Steiner, Harry Beyeler, Manfred Rembold, Franciszek Sitek
  • Patent number: 4963470
    Abstract: Titanocenes with silylated .pi.-cyclopentadienyl ligands in which one or two carbo- or heterocyclic aromatic rings are bonded to the titanium, the aromatic rings being substituted by fluorine, --CF.sub.3, --C.sub.2 F.sub.5, --CF.sub.2 CL or --CF.sub.2 CH.sub.3 in at least one of the two ortho-positions relative to the metal-carbon bonds, are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated substrates. They are distinguished by a high sensitivity, stability to air and the action of heat, and a high activity in the region of UV light to visible light. They are furthermore readily soluble in the photopolymerizable compositions.
    Type: Grant
    Filed: January 19, 1990
    Date of Patent: October 16, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Bernd Klingert, Franciszek Sitek, Manfred Rembold
  • Patent number: 4940647
    Abstract: The invention comprises a photopolymerizable mixture comprising as the essential constituents a polymeric binder, a compound capable of forming a polymer by free-radical initiated polymerization, a photoinitiator, a leuco dye and a leuco dye stabilizer having at least one epoxy group. The mixture has a better shelf life in the dark than known compositions and is preferably used in the preparation of dry photoresists.
    Type: Grant
    Filed: October 6, 1988
    Date of Patent: July 10, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans-Dieter Frommeld, Hartmut Wiezer
  • Patent number: 4921880
    Abstract: An adhesion promoter for use with ultraviolet radiation curable siloxane composition is made by combining an alkoxysilicon compound of the formula(RO).sub.3 Si--X--Si(OR).sub.3and a compound capable of catalyzing the reaction between two alkoxy groups or an alkoxy group and a hydroxyl group. Ultraviolet radiation curable siloxane compositions with the improved adhesion are obtained by mixing the adhesion promoter with a mixture which has at least one ultraviolet radiation activatable siloxane polymer and a photoinitiator. These compositions can be used as optical fiber coatings, conformal coatings, and other coating application where adhesion to a substrate is important.
    Type: Grant
    Filed: August 15, 1988
    Date of Patent: May 1, 1990
    Assignee: Dow Corning Corporation
    Inventors: Chi-Long Lee, Michael A. Lutz
  • Patent number: 4855468
    Abstract: Titanocenes with .pi.-cyclopentadienyl ligands, in which one or two carbocyclic or heterocyclic aromatic rings are bonded to the metal, the aromatic rings being substituted in at least one of the two ortho-positions relative to the metal-carbon bonds by CF.sub.2 Z (Z=F or substituted or unsubstituted alkyl), are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated compounds. They are distinguished by a high radiation sensitivity, stability to air and thermal effects, and high effectiveness in the range from UV light to visible light.
    Type: Grant
    Filed: September 11, 1987
    Date of Patent: August 8, 1989
    Assignee: Ciba-Geigy Corporation
    Inventors: Martin Riediker, Kurt Meier, Hans Zweifel
  • Patent number: 4849320
    Abstract: The invention provides a process for the production of an image which comprises(i) applying to a substrate a layer of a liquid composition comprising(A) a cationically polymerizable residue(B) a radiation-activated polymerization initator for (A)(C) a radiation-curable residue that is different from (A) and optionally(D) a radiation activated initiator for the cure of (C),(ii) subjecting the composition to actinic radiation having a wavelength at which initiator (B) is activated but at which the residue (C) and/or initiator (D) is not substantially activated, followed by heating, if necessary, so that (A) is polymerized and the layer of liquid composition is solidified, but remains curable,(iii) subjecting the solidified layer in a predetermined pattern to actinic radiation having a wavelength that is different from that of the radiation used in stage (ii) and at which the radiation-curable residue (C) and/or the initiator (D) is activated, such that in the exposed areas (C) is substantially cured, and(iv) re
    Type: Grant
    Filed: April 30, 1987
    Date of Patent: July 18, 1989
    Assignee: Ciba-Geigy Corporation
    Inventors: Edward Irving, Christopher P. Banks
  • Patent number: 4831063
    Abstract: A photocurable composition comprising (1) an epoxy compound having at least one epoxy group and at least one unsaturated double bond in the same molecule; (2) a metal compound present in an amount ranging from 0.001 to 10 wt. %, based on the epoxy compound; and (3) a silicon compound which is capable of forming a silanol group when irradiated with light and which is present in an amount ranging from 0.1 to 20 wt. %, based on the epoxy compound, is characterized by a particularly rapid curing rate.
    Type: Grant
    Filed: February 24, 1987
    Date of Patent: May 16, 1989
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shuichi Suzuki, Moriyasu Wada, Shuzi Hayase
  • Patent number: 4775597
    Abstract: Disclosed is a curable filler composition which resists absorption into a porous substrate, particularly one derived from wood, comprising: (1) a liquid, ungelled binder of an unsaturated polyester resin having number average molecular weight of from 500 to 3,000 derived from an ethylenically unsaturated carboxylic acid or anhydride thereof, the unsaturated polyester resin having been reacted with a hydroxyl-containing amine selected from the group consisting of an alkanol amine having a secondary amino group, an alkanol amine having a primary amino group and a mixture thereof, (2) one or more ethylenically unsaturated compounds different from and cocurable with the unsaturated polyester resin, (3) pigment, (4) a free radical initiator, and (5) optionally a carrier solvent for the filler composition.Disclosed is a method of minimizing absorption of a filler composition into a warm or hot porous substrate.
    Type: Grant
    Filed: June 15, 1987
    Date of Patent: October 4, 1988
    Assignee: PPG Industries, Inc.
    Inventors: William J. Birkmeyer, John B. Saunders, Jr., William J. Schillinger
  • Patent number: 4721734
    Abstract: Compounds of the formula ##STR1## wherein R.sub.1 is hydrogen, chlorine, phenyl, dialkylamino of 2-4 carbon atoms or alkyl or alkoxy each of up to 18 carbon atoms; R.sub.2 is hydrogen, chlorine, bromine or alkyl or alkoxy each of up to 4 carbon atoms; R.sub.3 and R.sub.4, which can be the same or different, each is hydrogen or alkyl of up to 6 carbon atoms; R.sub.5 is hydrogen or alkyl or alkanoyl each of up to 4 carbon atoms; and R.sub.6 is hydrogen or methyl, with the proviso that not all of R.sub.1 to R.sub.6 simultaneously are hydrogen, are effective photosensitizers, especially for photopolymerization of unsaturated compounds and for hardening of printing dyes.
    Type: Grant
    Filed: August 31, 1984
    Date of Patent: January 26, 1988
    Assignee: Merck Patent Gesellschaft mit beschrankter Haftung
    Inventors: Juergen Gehlhaus, Manfred Kieser
  • Patent number: 4707432
    Abstract: A free radical polymerizable composition comprising a free radical polymerizable material and a photoinitiator system therefor comprising appropriate amounts of an alpha-cleavage or homolytic bond cleavage, photoinitiator and a ferrocenium salt, said composition being suitable for use in the preparation of protective layers and photographic images.
    Type: Grant
    Filed: September 23, 1985
    Date of Patent: November 17, 1987
    Assignee: Ciba-Geigy Corporation
    Inventors: Leslie R. Gatechair, Gary M. Blumenstein, Peter J. Schirmann
  • Patent number: 4605465
    Abstract: A UV and thermally curable composition comprising(1) a liquid, ethylenically unsaturated monomer, oligomer or prepolymer of the formula: ##STR1## wherein R is H or CH.sub.3, R.sub.1 is an organic moiety and n is at least 2,(2) a thermal initiator for (1) selected from the group consisting of substituted or unsubstituted pinacols, azo compounds, thiurams, organic peroxides and mixtures thereof,(3) a photoinitiator for (1) selected from the group consisting of aldehyde and ketone carbonyl compounds having at least one aromatic nucleus attached directly to the ##STR2## group, benzoin alkyl ethers, diethoxyacetophenone and 2,2-dimethoxy-2-phenylacetophenone,(4) a thermoplastic material, and(5) a non-polymerizable plasticizer for (4).The exposure of the composition to UV radiation under atmospheric conditions and heat in seriatim results in a cured solid product which can be utilized as adhesives, coatings, gaskets, sealants, resists and the like.
    Type: Grant
    Filed: October 4, 1984
    Date of Patent: August 12, 1986
    Assignee: W. R. Grace & Co.
    Inventor: Charles R. Morgan
  • Patent number: 4599155
    Abstract: There is disclosed a resin composition comprising(A) a spiro ortho ester compound and/or a spiro ortho carbonate compound;(B) an aluminum compound; and(C) a silanol compound or a silicon compound which is capable of generating a silanol group;the amounts of components (B) and (C) being within the range of 0.001 to 10% by weight and 0.1 to 20% by weiht, based on the amount of component (A), respectively.The resin composition of this invention is excellent in volumetric shrinkage performance at curing operation and is good in storability. Therefore, the cured product can be used for a wide variety of industrially valuable applications, such as an ink, a coating, an adhesive, a surface coating, an encapsulation and an electrical insulating material.
    Type: Grant
    Filed: September 21, 1984
    Date of Patent: July 8, 1986
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shuichi Suzuki, Moriyasu Wada, Shuzi Hayase