Abstract: Release agents with increased affinity toward nano-imprint lithography template surfaces interact strongly with the template during separation of the template from the solidified resist in a nano-imprint lithography process. The strong interaction between the surfactant and the template surface reduces the amount of surfactant pulled off the template surface during separation of a patterned layer from the template in an imprint lithography cycle. Maintaining more surfactant associated with the surface of the template after the separation of the patterned layer from the template may reduce the amount of surfactant needed in a liquid resist to achieve suitable release of the solidified resist from the template during an imprint lithography process. Strong association of the release agent with the surface of the template facilitates the formation of ultra-thin residual layers and dense fine features in nano-imprint lithography.

Abstract: The present invention provides a coating composition and a coating film that comprises a binder containing a UV-curable functional group, a compound containing a fluorine UV-curable functional group, a photoinitiator; and nano-sized particles. The coating film according to the present invention has excellent abrasion resistance and contamination resistance such as fingerprint trace removability and scribbling resistance.

Abstract: The present invention relates to a radiation-curable composition having a refractive index less than 1.40 comprising (1) a curable perfluoropolyether oligomer having a structural formula selected from the group consisting of: and wherein R represents a hydrogen atom or a methyl group, wherein A represents a straight chained or branched alkylene group, wherein m represents an integer from 1 to 4, wherein the integers represented by m within individual —((CF2)m—O)n— repeat units can be the same or different, and wherein n represents an integer from 1 to 20; (2) a diluent; (3) a photo-initiator; and (4) an adhesion promoter; wherein the radiation-curable composition is free of compounds containing —CF3 groups.

Abstract: Disclosed is a photocurable resin composition for nanoimprint, containing a curable monomer component with or without a binder resin. The composition further contains 0.001 to 5 parts by weight of a compound having a reactive functional group and a hydrophobic functional group in the same molecular skeleton, per 100 parts by weight of the total amount of the curable monomer component and binder resin. Preferably, the reactive functional group is at least one functional group selected from the group consisting of hydroxyl groups, epoxy groups, vinyl ether groups, oxetanyl groups, alkoxysilane groups, and free-radically polymerizable vinyl groups, and the hydrophobic functional group is at least one functional group selected from the group consisting of fluorine-containing groups, alkylsilane groups, alicyclic hydrocarbon groups, and aliphatic hydrocarbon groups having 4 or more carbon atoms.

Abstract: To provide a photocurable composition whereby it is possible to obtain a cured product provided with both release property and high refractive index, and a process whereby it is possible to produce a molded product having a high refractive index and having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. The photocurable composition comprising from 61 to 90 mass % of a compound (A) having a refractive index of at least 1.55 at a wavelength of 589 nm before curing and having at least two (meth)acryloyloxy groups, from 2 to 15 mass % of a compound (B) having fluorine atoms and at least one carbon-carbon unsaturated double bond (provided that compound (A) is excluded), from 5 to 35 mass % of a compound (C) having one (meth)acryloyloxy group (provided that compound (B) is excluded), and from 1 to 12 mass % of a photopolymerization initiator (D) (provided (A)+(B)+(C)+(D)=100 mass %).

Abstract: To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface. A photocurable composition 20 comprising from 15 to 60 mass % of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass % of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass % of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass % of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass %) is used.

Abstract: A curable composition comprising a compound (A) having at least one active energy ray curable polymerizable functional group, a fluorine-containing copolymer (B) obtained by (1) copolymerizing a polymerizable monomer (a) having a polyfluoroalkyl group and a polymerizable monomer (b) having a photo-curable functional group, or (2) introducing a photo-curable functional group into a fluorine-containing copolymer (D) obtained by copolymerizing a polymerizable monomer (a) having a polyfluoroalkyl group and a polymerizable monomer (d) having a group capable of introducing a photo-curable functional group, and a photopolymerization initiator.

Abstract: A method of forming a polymer layer on a support surface by the use of a coating agent and polymerizable compounds. The coating agent provides photoreactive groups adapted to attach the agent to the surface, as well as photoreactive groups adapted to remain unattached to the surface, and thus serve as photoinitiators for the activation of polymerizable compounds in order to form a polymer layer thereon. Also provided are coating agents, per se, as well as a method of using such agents and the resultant surfaces and devices fabricated therefrom.

Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

Abstract: Foams comprising blends of thermoplastic and thermoset materials wherein the thermoset forms a discontinuous phase in a continuous thermoplastic phase are described. Foams comprising an uncured thermoset and unreacted radiation-activatable curing agent in a thermoplastic matrix are also described. Additionally described are batch and continuous methods for making the foams. Particular uses for the foams, such as flexographic mounting tapes, are also described.

Abstract: Manufactured articles obtainable from a composition consisting of:1) 100 phr of a fluorinated thermoplastic elastomer having a block structure with at least a fluorinated polymeric segment of B type having elastomeric properties and at least a fluorinated polymeric segment of A type having plastomeric properties,2) from 0.1 to 40 phr of a crosslinking agent able to give peroxidic crosslinking of fluoroelastomers;and subsequent irradiation of the manufactured article by GAMMA or BETA radiations.

Abstract: This invention concerns a process for fluorinating a perfluoroelastomer which has previously been crosslinked by exposure to ionizing radiation. The resulting product has reduced outgassing. This makes perfluoroelastomer parts that have undergone the process particularly useful in clean rooms and for semiconductor manufacturing.

Abstract: A new monomer is used to prepare homo or copolymers containing blocked imide groups which are characterized by deblocking in two stages, first when acid catalyzed and thereafter in aqueous alkaline solutions. Such polymers are, therefore, especially useful in formulating positive photoresist cmpositions. The polymers are combined with a latent photoacid, which when exposed to actinic radiation removes the acid sensitive blocking moiety, preferably an acetal or ketal group, leaving a methylol group or substituted methylol group remaining attached to the nitrogen atom, which groups are subsequenctly removed by exposure to aqueous alkaline developing solutions, leaving only imide groups, ##STR1## The new monomer is a derivative of maleimide in which the imide hydrogen has been replaced with a methylol group, which is subsequently reacted to form an acetal or ketal. Preferred monomers include N-(2,4-dioxa-3,3-dimethylpentyl)-2H,5H-2,5-dioxopyrrole and related compounds.

Abstract: A shaped article of halogenated polymer which is obtained by causing a halogen to react upon a shaped article of a polymer by irradiation of light is irradiated with light in the presence of an acetylene compound to have the acetylene compound graft polymerized onto the shaped article of polymer.

Abstract: A method for enhancing surface properties of a polymeric solid is disclosed involving chlorination in the presence of actinic light to a depth substantially not in excess of 1800 .ANG. and to a chlorine content by weight in said 1800 .ANG. layer not exceeding 20%. Such limited chlorination of only the molecular surface layer provides enhancement of the polymeric solids' surface and barrier properties without any perceptible deterioration of the polymer's bulk physical properties.

Abstract: This invention relates to a method of making perfluorinated elastomeric materials, and to materials made by such methods. In the full synthetic scheme, a partially fluorinated polymeric compound, with moieties to prevent crystallization, is created. It is then crosslinked to a desired degree, then perfluorinated.Various intermediate materials, such as partially fluorinated crosslinked polymers, have useful properties, and are or may become commercially available. One embodiment of this invention therefore relates to perfluorination of a selected partially fluorinated, crosslinked material, which is one step of the full synthetic scheme.

Abstract: Solid organic polymers are chlorinated with chlorine to give chlorinated polymers in the presence of a solvent which contains from 20 to 100% by weight of phosgene and in which the polymer is dissolved or suspended, at or below the boiling point of the mixture of chlorine and solvent, by initiating the reaction with actinic light or another initiator which produces free radicals. A mixture of not less than 50% by weight of phosgene and a chlorofluorocarbon or chlorofluorohydrocarbon, such as chlorotrifluoromethane, can also be used as the solvent, but phosgene is most suitable.

Abstract: Fluorinated polymer surfaces are provided by a process in which ultraviolet radiation is used to assist the surface fluorination reaction.