Chemical Reactant Is Ethylenically Unsaturated Patents (Class 522/135)
  • Patent number: 11945917
    Abstract: A composition includes a compound represented by Formula (1) and a pigment. In Formula (1), R1 represents an (m+n)-valent linking group, P1 represents a polymer chain which has a polyester repeating unit in a main chain, and of which a weight-average molecular weight is 1000 or more, P2 represents a polymer chain which is different from P1 and has a repeating unit derived from a monomer having an ethylenically unsaturated bonding group in a main chain, m represents a number of 1 to 9, n represents a number of 1 to 9, and m+n satisfies 4 to 18.
    Type: Grant
    Filed: June 10, 2020
    Date of Patent: April 2, 2024
    Assignee: FUJIFILM Corporation
    Inventors: Yutaro Fukami, Yushi Kaneko, Junichi Ito, Kazuya Ota, Hiromu Koizumi
  • Patent number: 11548959
    Abstract: Provided are a photocurable material composition providing a cured product, which achieves both of a heat deflection temperature of 70° C. or more measured by Method A of JIS K 7191-1 and a Charpy impact strength of 6 kJ/m2 or more measured in conformity with JIS K 7111-1, after UV irradiation, and a cured product thereof. The photocurable material composition includes: 50 parts by weight to 65 parts by weight of a bifunctional urethane (meth)acrylate having (meth)acryloyl groups at both terminals thereof; 15 parts by weight to 25 parts by weight of a compound represented by the formula (4); and 10 parts by weight to 30 parts by weight of at least one of a compound represented by the formula (5) or a compound represented by the formula (6).
    Type: Grant
    Filed: November 11, 2019
    Date of Patent: January 10, 2023
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Terunobu Saitoh, Manami Tomizuka
  • Patent number: 11306167
    Abstract: To provide a fluorinated elastic copolymer excellent in adhesion, processability, mechanical properties, heat resistance and chemical resistance. A fluorinated elastic copolymer having units based on a monomer (a), units based on a monomer (b) and optionally units based on a monomer (c), which has an iodine atom bonded to a terminal of a molecular chain and the unit based on the monomer (b) adjacent to the iodine atom, and which has a proportion of the units based on the monomer (b) of from 0.09 to 2.0 mol % to all units. Monomer (a): monomer selected from the group consisting of tetrafluoroethylene, hexafluoropropylene, vinylidene fluoride, chlorotrifluoroethylene, a perfluoro(alkyl vinyl ether) and 2,3,3,3-tetrafluoropropene; monomer (b): a monomer having at least one type of functional group selected from the group consisting of an epoxy group, a hydroxy group, a carbonyl group-containing group and an isocyanate group; monomer (c): a monomer selected from the group consisting of ethylene and propylene.
    Type: Grant
    Filed: April 29, 2020
    Date of Patent: April 19, 2022
    Assignee: AGC Inc.
    Inventors: Satoko Yasuda, Keisuke Yagi, Takehiro Kose, Yukiko Hattori, Toshikazu Yoneda
  • Patent number: 10793671
    Abstract: Provided is an aliphatic polycarbonate macropolyol including —OAO— and Z(O—)a as repeating units. In the aliphatic polycarbonate macropolyol, the repeating units —OAO— and Z(O—)a are linked to each other via carbonyl (—C(O)—) linkers or are bonded to hydrogen to form terminal —OH groups. The number of moles of the terminal —OH groups is from aZ to aZ+0.2Z (where Z represents the number of moles of the repeating unit Z(O—)a). Further provided is an aliphatic polycarbonate-co-aromatic polyester macropolyol including —OAO— and Z(O—)a as repeating units. In the aliphatic polycarbonate-co-aromatic polyester macropolyol, the repeating units —OAO— and Z(O—)a are linked via carbonyl (—C(O)—) and —C(O)YC(O)— as linkers or are bonded to hydrogen to form terminal —OH groups.
    Type: Grant
    Filed: February 8, 2018
    Date of Patent: October 6, 2020
    Assignee: LOTTE CHEMICAL CORPORATION
    Inventors: Bun Yeoul Lee, Jong Yeob Jeon, Ji Hae Park, Jung Jae Lee, Eun Yeong Hwang
  • Patent number: 10731036
    Abstract: A preceramic resin formulation comprising a polycarbosilane preceramic polymer and an organically modified silicon dioxide preceramic polymer. A ceramic material comprising a reaction product of the polycarbosilane preceramic polymer and organically modified silicon dioxide preceramic polymer is also described. Articles comprising the ceramic material are also described, as are methods of forming the preceramic resin formulation and the ceramic material.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: August 4, 2020
    Assignee: Northrop Grumman Innovation Systems, Inc.
    Inventor: Benjamin W. C. Garcia
  • Patent number: 9708419
    Abstract: The invention concerns a method for preparing block copolymers, comprising a step of controlled free-radical copolymerisation of trifluoroethylene with at least one additional monomer, different from trifluoroethylene, in the presence of a chain transfer agent, said chain transfer agent being a xanthate compound, a trithiocarbonate compound or a monoiodide compound. The invention also concerns the block copolymers likely to be obtained by this method.
    Type: Grant
    Filed: April 25, 2013
    Date of Patent: July 18, 2017
    Assignees: ARKEMA FRANCE, ECOLE NATIONALE SUPERIEURE DE CHIME DE MONTPELLIER
    Inventors: Bruno Ameduri, Ali Alaaeddine
  • Patent number: 9267061
    Abstract: Composition which can be used in structural adhesives, essentially comprising a polymer system suitable for being used in a methacrylate matrix, said polymer system comprising styrene-free block copolymers formed from at least two blocks and preferably from at least three blocks, and said polymer system being solubilized in a matrix of linear or branched acrylic and/or methacrylic monomers and/or of cyclic methacrylates and/or of aromatic methacrylates. Application by incorporation into an adhesive formulation of methacrylate type.
    Type: Grant
    Filed: March 26, 2012
    Date of Patent: February 23, 2016
    Assignee: Adhesifs et Composites Polymers
    Inventors: Nicolas Valloir, Olivier Fradin, Christian Bret, Emilie Vaique, Gerard Chiron, Mathieu Roux
  • Patent number: 8980971
    Abstract: A photocurable resin composition for three-dimensional photofabrication operations, including stereolithography, comprising (A) a cationically polymerizable compound having two or more bisphenol structures and one or more hydroxyl groups, (B) a cationically polymerizable compound other than the component (A), (C) a cationic photoinitiator, (D) a radically polymerizable compound, (E) a radical photoinitiator, and (F) multilayer polymer particles having a core and a shell layer, the shell layer containing functional group-modified rubber polymer particles having at least one reactive functional group.
    Type: Grant
    Filed: May 21, 2013
    Date of Patent: March 17, 2015
    Assignee: DSM IP Assets B.V.
    Inventors: Masahiro Ueda, Katsuyuki Takase, Takahiko Kurosawa
  • Patent number: 8952078
    Abstract: This invention relates to a printing ink and in particular to an ink for ink-jet printing which is cured by irradiation. The ink comprises at least one radiation-curable monomer; at least one passive thermoplastic resin; at least one radical photoinitiator; and at least one colouring agent; wherein the ink has a viscosity of less than 100 mPas at 25° C., and wherein the at least one passive resin is present at 2 to 15 wt % based on the total weight of the ink and has a molecular weight of 1,500 to 70,000.
    Type: Grant
    Filed: July 4, 2007
    Date of Patent: February 10, 2015
    Assignee: Sericol Limited
    Inventor: Nigel Paul Gould
  • Patent number: 8940808
    Abstract: Disclosed is a curable coating agent composition which exhibits excellent wear resistance and weather resistance when applied as a coating agent to plastic or other substrates to be used outdoors. The curable coating agent composition comprises 95 to 65 parts by mass of a component (A) comprising an urethane adduct compound having weather resistance, 5 to 35 parts by mass of a component (B) comprising a specific organosilicon compound, 0.1 to 10 parts by mass of a component (C) which is a radical polymerization initiator, 1 to 12 parts by mass of a component (D) which is an ultraviolet ray absorber, and 10 to 1,000 parts by mass of a component (E) which is an organic solvent, with respect to 100 parts by mass of the components (A) and (B) in total.
    Type: Grant
    Filed: October 13, 2010
    Date of Patent: January 27, 2015
    Assignees: Kabushiki Kaisha Toyota Jidoshokki, Toagosei Co., Ltd.
    Inventors: Tetsuya Mitsuoka, Hidetaka Hayashi, Toshihisa Shimo, Kyoko Kumagai, Naoharu Ueda, Kazumasa Inata, Takeshi Fujita, Yasuyuki Sanai, Eiichi Okazaki, Hiroshi Suzuki, Naomasa Furuta
  • Patent number: 8822563
    Abstract: Disclosed is a curable resin composition comprising a polymer (A) that has a main chain comprising carbon atoms and a side chain having a polymerizing unsaturated linking group and has a cyclic structure in the main chain and/or the side chain, and a compound having a polymerizing unsaturated group. The curable resin composition has good optical characteristics, good heat resistance and good moldability.
    Type: Grant
    Filed: January 18, 2013
    Date of Patent: September 2, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Hiroaki Mochizuki, Naoyuki Morooka, Rie Okutsu, Tatsuhiko Obayashi
  • Patent number: 8809412
    Abstract: The present invention relates to the use of oligomeric siloxane components in radiation-curable formulations which in the cured state offer a particular degree of corrosion control for metallic substrates.
    Type: Grant
    Filed: June 4, 2008
    Date of Patent: August 19, 2014
    Assignee: Evonik Degussa GmbH
    Inventors: Emmanouil Spyrou, Rene Koschabek, Burkhard Standke
  • Patent number: 8729147
    Abstract: A flexographic printing ink for use in a flexographic printing process with wet on wet capability, comprising a polymer and a combination of liquids comprising radiation curable monomers and/or oligomers, diluents, colorants, additives, and photoinitiators, the components having the Hansen Solubility Parameters adjusted to generate an ink with a capability to form a gel having the required physical characteristics, and that is in a liquid form in the presence of a small quantity of non reactive solvent, or is brought to a liquid state during the printing process. The disclosure is also directed to a flexographic printing process with wet on wet capability based on controlled polymer or polymer segment precipitation that leads to gel formation of ink compounds by controlling the solubility parameter of the ink system.
    Type: Grant
    Filed: March 28, 2012
    Date of Patent: May 20, 2014
    Assignee: Technosolutions Assessoria Ltda
    Inventors: Valter Marques Baptista, Wilson Andrade Paduan
  • Patent number: 8642234
    Abstract: A carboxyl group-containing photosensitive resin is obtained by reacting an ?,?-ethylenically unsaturated group-containing monocarboxylic acid (c) with a phenolic compound (a) containing the structure represented by the following general formula (I) and having at least two phenolic hydroxyl groups in its molecule, wherein part or the whole of the phenolic hydroxyl groups being modified into an oxyalkyl group, and further reacting a polybasic acid anhydride (d) with the resultant reaction product; wherein R1 represents either one of a hydrocarbon radical of 1 to 11 carbon atoms, a SO2 group, an oxygen atom and sulfur atom, R2 represents a hydrocarbon radical of 1 to 11 carbon atoms, “a” represents an integer of 0 to 3, “n” represents an integer of 1 to 2, and “m” represents an integer of 1 to 10.
    Type: Grant
    Filed: September 13, 2011
    Date of Patent: February 4, 2014
    Assignees: Taiyo Holdings Co., Ltd., Showa Denko K.K.
    Inventors: Nobuhito Ito, Masao Arima, Syouji Nishiguchi, Kouji Ogawa, Masayuki Kobayashi, Atsushi Sakamoto
  • Patent number: 8642673
    Abstract: The present invention relates to the use of alkoxysilane components in the presence of acid-generating photoinitiators in radiation-curable, free-radically crosslinkable formulations which in the cured state offer a particular degree of corrosion control for metallic substrates.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: February 4, 2014
    Assignee: Evonik Degussa GmbH
    Inventor: Emmanouil Spyrou
  • Patent number: 8632952
    Abstract: Provided are a photosensitive resin composition which is soluble in an alkaline aqueous solution and which has a good propagation loss in a visible light wavelength region, a photosensitive resin cured matter, a photosensitive resin film, a photosensitive resin film cured matter and an optical waveguide obtained by using the same. Provided are, to be specific, a photosensitive resin composition comprising (A) a vinyl polymer having at least one chain-polymerizable functional group in a molecule, (B) a polymerizable compound and (C) a polymerization initiator, wherein the component (C) is at least one selected from the group consisting of 2-[2-oxo-2-phenylacetoxyethoxy]ethyl oxyphenylacetate, 2-(2-hydroxyethoxy)ethyl oxyphenylacetate and oligo{2-hyroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]}propanone, a photosensitive resin cured matter, a photosensitive resin film, a photosensitive resin film cured matter and an optical waveguide obtained by using the same.
    Type: Grant
    Filed: November 17, 2008
    Date of Patent: January 21, 2014
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Kouji Suzumura, Tatsuya Makino, Atsushi Takahashi
  • Patent number: 8609743
    Abstract: Disclosed is a method for producing an electrolyte membrane for fuel cells, which is characterized in that a radically polymerizable monomer is graft-polymerized to a resin without using a photopolymerization initiator by bringing the radically polymerizable monomer into contact with the resin after irradiating the resin with ultraviolet light. The electrolyte membrane for fuel cells obtained by ultraviolet irradiation graft polymerization has both excellent oxidation resistance and excellent mechanical characteristics. By using such an electrolyte membrane, there can be obtained a fuel cell exhibiting extremely high performance.
    Type: Grant
    Filed: February 4, 2008
    Date of Patent: December 17, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Mitsuhito Takahashi
  • Patent number: 8574822
    Abstract: A nanoimprint resist includes a hyperbranched polyurethane oligomer, a perfluoropolyether, a methylmethacrylate, a diluent solvent, and a photo initiator. The hyperbranched polyurethane oligomer can be polymerized by a copolymerization of trimellitic anhydride, ethylene mercaptan, and epoxy acrylic acid. The hyperbranched polyurethane oligomer can also be polymerized by a ring-opening copolymerization epoxy acrylic acid and ethylene glycol.
    Type: Grant
    Filed: May 24, 2012
    Date of Patent: November 5, 2013
    Assignees: Tsinghua University, Hon Hai Precision Industry Co., Ltd.
    Inventors: Zhen-Dong Zhu, Qun-Qing Li, Li-Hui Zhang, Mo Chen
  • Patent number: 8557031
    Abstract: This invention relates to methods for chemically grafting and attaching ceragenin molecules to polymer substrates; methods for synthesizing ceragenin-containing copolymers; methods for making ceragenin-modified water treatment membranes and spacers; and methods of treating contaminated water using ceragenin-modified treatment membranes and spacers. Ceragenins are synthetically produced antimicrobial peptide mimics that display broad-spectrum bactericidal activity. Alkene-functionalized ceragenins (e.g., acrylamide-functionalized ceragenins) can be attached to polyamide reverse osmosis membranes using amine-linking, amide-linking, UV-grafting, or silane-coating methods. In addition, silane-functionalized ceragenins can be directly attached to polymer surfaces that have free hydroxyls.
    Type: Grant
    Filed: January 7, 2011
    Date of Patent: October 15, 2013
    Assignee: Sandia Corporation
    Inventors: Michael Hibbs, Susan J. Altman, Howland D. T. Jones, Paul B. Savage
  • Patent number: 8529681
    Abstract: This invention relates to methods for chemically grafting and attaching ceragenin molecules to polymer substrates; methods for synthesizing ceragenin-containing copolymers; methods for making ceragenin-modified water treatment membranes and spacers; and methods of treating contaminated water using ceragenin-modified treatment membranes and spacers. Ceragenins are synthetically produced antimicrobial peptide mimics that display broad-spectrum bactericidal activity. Alkene-functionalized ceragenins (e.g., acrylamide-functionalized ceragenins) can be attached to polyamide reverse osmosis membranes using amine-linking, amide-linking, UV-grafting, or silane-coating methods. In addition, silane-functionalized ceragenins can be directly attached to polymer surfaces that have free hydroxyls.
    Type: Grant
    Filed: January 7, 2011
    Date of Patent: September 10, 2013
    Assignee: Sandia Corporation
    Inventors: Michael Hibbs, Susan J. Altman, Howland D. T. Jones, Paul B. Savage
  • Patent number: 8463099
    Abstract: The present invention relates to a resin composition for an optical material comprising (A) a carboxylic acid-modified phenoxy resin, (B) a polymerizable compound and (C) a polymerization initiator, a resin film for an optical material comprising the above resin composition and an optical waveguide having a core part and/or a cladding layer formed by using the same. Provided are a resin composition for an optical material which is excellent in a heat resistance and a transparency and which is soluble in an alkaline aqueous solution, a resin film for an optical material comprising the above resin composition and an optical waveguide produced by using the same.
    Type: Grant
    Filed: February 8, 2008
    Date of Patent: June 11, 2013
    Assignee: Hitachi Chemical Company
    Inventors: Tatsuya Makino, Atsushi Takahashi, Masatoshi Yamaguchi, Toshihiko Takasaki, Tomoaki Shibata, Masami Ochiai
  • Patent number: 8420296
    Abstract: Disclosed is a photosensitive resin composition for a color filter protective layer including a cross-linkable alkali soluble resin including a repeating unit represented by the following Chemical Formula 1, a reactive unsaturated compound, a photopolymerization initiator, and a solvent. In Chemical Formulae 1 to 3, R1 to R6 and A1 to A3 are the same as in the detailed description.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: April 16, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Jae-Hyun Kim, Se-Young Choi, Nam-Gwang Kim, Eui-June Jeong, Chang-Min Lee
  • Patent number: 8415437
    Abstract: The present invention relates to melamine-formaldehyde resins bearing (meth)acrylic groups, to processes for preparing them, to their use, and to coating compositions comprising them.
    Type: Grant
    Filed: August 2, 2010
    Date of Patent: April 9, 2013
    Assignee: BASF SE
    Inventors: Reinhold Schwalm, Christine Roesch
  • Patent number: 8382929
    Abstract: An adhesive composition comprising as principal components, a polymerizable component, an ambient temperature radical polymerization catalyst system and a photoinitiator. The adhesive may optionally comprise an adhesion promoter, a toughener, an epoxy, and a filler material. Further, a two-part reactive adhesive comprising, a first part comprising, (i) at least one free radical-polymerizable monomer, (ii) at least one reducing agent, and (iii) a photoinitiator, and a second part comprising an oxidizing agent that is reactive at ambient temperature with the reducing agent to produce free radicals that are capable of initiating and propagating free radical polymerization.
    Type: Grant
    Filed: February 21, 2012
    Date of Patent: February 26, 2013
    Assignee: Lord Corporation
    Inventor: Mark W. Pressley
  • Patent number: 8383695
    Abstract: The present invention relates to a phenoxy resin for an optical material obtained by subjecting at least one selected from specific difunctional epoxy resins and at least one selected from specific difunctional phenols to polyaddition reaction, wherein a film comprising the above phenoxy resin has a refractive index of 1.580 or less at 25° C. and a wavelength of 830 nm, a resin composition for an optical material containing the above phenoxy resin, a resin film for an optical material comprising the above resin composition and an optical waveguide produced by using the above resin composition and/or the above resin film.
    Type: Grant
    Filed: March 15, 2007
    Date of Patent: February 26, 2013
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Tatsuya Makino, Atsushi Takahashi, Toshihiko Takasaki, Tomoaki Shibata, Masami Ochiai
  • Patent number: 8378004
    Abstract: Silicone coatings and moldings are produced from a photocrosslinkable silicone mixture which contains (A) a polyorganosiloxane containing at least two carbon-carbon multiple bonds, (B) an organosilicon compound containing at least two SiH functions, and (C) a cyclopentadienyl-platinum complex catalyst be activatable by light of 200 to 500 nm, wherein the mixture is heated to 40° C. to 250° C., and then irradiated with light of 200 to 500 nm wavelength.
    Type: Grant
    Filed: June 21, 2010
    Date of Patent: February 19, 2013
    Assignee: Wacker Chemie AG
    Inventors: Klaus Angermaier, Philipp Mueller
  • Patent number: 8372894
    Abstract: A method for producing a graft polymer comprises the steps of: a) irradiating a base polymer with an electron beam or a source of ?-radiation, b) contacting a grafting solution with the base polymer, wherein the grafting solution contains at least one oxygen scavenger and at least one graft monomer selected from the group consisting of styrene and styrene derivatives, and c) graft polymerizing the mixture of the base polymer and the grafting solution obtained in step b).
    Type: Grant
    Filed: February 23, 2009
    Date of Patent: February 12, 2013
    Assignee: Belenos Clean Power Holding AG
    Inventor: Dirk Henkensmeier
  • Patent number: 8362103
    Abstract: The invention provides a resin composition which develops excellent flame retardance after curing in spite of its being free from halogen-containing compounds and antimony compounds, which are liable to cause environmental load, and which can give a film meeting the recent sever demands for higher flexing resistance and insulation reliability. Specifically, the invention provides a resin composition which comprises (A) a polyimide precursor and (B) an adduct of an organophosphorus compound represented by formula (1) with a compound having four or more (meth)acrylate groups. It is preferable that the resin composition further contain (C) a phosphazene compound.
    Type: Grant
    Filed: April 30, 2008
    Date of Patent: January 29, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Katsuhiko Funaki, Etsuo Ohkawado, Kousuke Hirota, Syuji Tahara
  • Patent number: 8323750
    Abstract: The present invention relates to a UV irradiation assisted method of surface modification, which comprises: introducing a functional group L onto the surface of a polymer material P through the photochemical reaction of a photosensitive group X under UV irradiation, wherein the photosensitive group X comprises at least one xanthone unit.
    Type: Grant
    Filed: August 20, 2008
    Date of Patent: December 4, 2012
    Assignees: Beijing Wanhexinyuan BioTechnology Co., Ltd., Beijing University of Chemical Technology
    Inventors: Wantai Yang, Zhenhua Huang, Yanhe Tong, Lei Shao
  • Patent number: 8293809
    Abstract: An object of the present invention is to provide a novel cationic photopolymerization initiator that efficiently absorbs light and generates protons. As a means of achieving the object above, a preferred cationic photopolymerization initiator of the present invention includes an initiator comprising a bismuthonium salt represented by the following general formula (II): Wherein R11, R12, and R13 may be the same or different and are each an optionally substituted monocyclic aryl group or an optionally substituted monocyclic heteroaryl group, R14 is an optionally substituted fused polycyclic aromatic group or an optionally substituted fused polycyclic heterocyclic group, and X? is an anion associated with a cation.
    Type: Grant
    Filed: December 11, 2008
    Date of Patent: October 23, 2012
    Assignee: Kyoto University
    Inventors: Yoshihiro Matano, Hiroshi Imahori
  • Patent number: 8247468
    Abstract: The present invention provides a composition for hard coat capable of forming a hard coat layer having the improved anti-staining property, anti-staining durability, scratch resistance, abrasion resistance, antistatic property and the like. A composition for hard coat comprising: an active energy ray-curable silicone-acrylic copolymer (A); an active energy ray-curable polyfunctional compound (B); and an electrically conductive material (C), wherein the active energy ray-curable silicone-acrylic copolymer (A) contains: a polysiloxane block (a-1), an acrylic block (a-2) containing an active energy ray-curable double bond group, and a fluoroalkyl group-containing acrylic block (a-3).
    Type: Grant
    Filed: December 11, 2008
    Date of Patent: August 21, 2012
    Assignee: TDK Corporation
    Inventors: Kenji Yoneyama, Kazushi Tanaka, Hiroyuki Hashiguchi, Koichi Ueda
  • Patent number: 8227522
    Abstract: A surface-modified blade rubber includes a surface modified by being subjected to irradiation treatment that generates radical active sites in the blade rubber and polymerization for graft polymerization starting from a generated radical active site. A method for modifying a blade rubber surface includes subjecting rubber of a blade rubber to irradiation treatment that generates radical active sites and polymerization for graft polymerization starting from a generated radical active site.
    Type: Grant
    Filed: July 13, 2007
    Date of Patent: July 24, 2012
    Assignee: Mitsuba Corporation
    Inventors: Norihito Mizote, Akio Katakai, Masao Tamada
  • Patent number: 8178279
    Abstract: A negative-tone radiation-sensitive resin composition includes an alkali-soluble resin, a radically polymerizable compound, a radiation-sensitive radical initiator, and an organic solvent. The alkali-soluble resin includes a phenolic hydroxyl group. The radically polymerizable compound includes an ethylenically unsaturated double bond. The organic solvent includes an ethylene glycol organic solvent having a saturation vapor pressure of 3 mmHg or less at 20° C. and 1 atmosphere.
    Type: Grant
    Filed: December 21, 2010
    Date of Patent: May 15, 2012
    Assignee: JSR Corporation
    Inventors: Kouji Nishikawa, Akari Sako
  • Patent number: 8129441
    Abstract: The present invention relates to radiation-curable coating compositions which are of low viscosity and comprise (meth)acrylates and divinyl adipate.
    Type: Grant
    Filed: November 8, 2007
    Date of Patent: March 6, 2012
    Assignee: BASF Aktiengesellschaft
    Inventors: Oscar Lafuente Cerda, Yvonne Heischkel, Michael Vetter, Reinhold Schwalm, Nick Gruber
  • Patent number: 8071195
    Abstract: The present invention provides a multi-layered object having a hard coat layer capable of improving anti-staining property, anti-staining durability, scratch resistance, abrasion resistance and the like. A multi-layered object comprising a hard coat layer and a light transmitting layer, wherein the hard coat layer is formed from a composition for hard coat comprising: an active energy ray-curable silicone-acrylic copolymer (A); and an active energy ray-curable polyfunctional compound (B), and wherein the active energy ray-curable silicone-acrylic copolymer (A) contains: a polysiloxane block (a-1), an acrylic block (a-2) containing an active energy ray-curable double bond group and a fluoroalkyl group-containing acrylic block (a-3).
    Type: Grant
    Filed: December 11, 2008
    Date of Patent: December 6, 2011
    Assignee: TDK Corporation
    Inventors: Kenji Yoneyama, Kazushi Tanaka, Hiroyuki Hashiguchi, Akira Yamamoto, Koichi Ueda
  • Patent number: 8063170
    Abstract: Radiation curable compositions comprising at least one radiation curable oligomer obtained from the reaction of one or more carboxyl functional polyester (a) having a glass transition temperature TG and/or melting temperature Tm of less than 30° C., with (b1) one or more (meth)acrylated mono-epoxide, and/or (b2) one or more polyepoxide and one or more ?, ? unsaturated carboxylic acid.
    Type: Grant
    Filed: February 2, 2007
    Date of Patent: November 22, 2011
    Assignee: Cytec Surface Specialities, S.A.
    Inventors: Isabelle Fallais, Thierry Randoux, Marc Decaux
  • Patent number: 8039525
    Abstract: The subject of the invention is a process for producing polyamide, copolyamide, polyolefin, copolyester amide or fluorocarbon resin powder particles on to the surface of which has been grafted at least one functionalized grafting monomer, characterized in that it comprises: a) a step of blending the polyamide or copolyamide powder particles with the functionalized grafting monomer; followed by b) a step of irradiating the powder impregnated with functionalized grafting monomer resulting from a) with photons (?-radiation) or electrons (?-radiation), with a dose ranging from 0.5 to 15 Mrad. The invention also relates to the particles grafted in this way and to the compositions containing such particles.
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: October 18, 2011
    Assignee: Arkema France
    Inventors: Karine Loyen, Herve Ster, Holger Senff, Thomas Fine
  • Publication number: 20110237702
    Abstract: It is an object of the present invention to provide: a curable composition that has photocurability and provides a cured product excellent in insulating properties; and the cured product. This can be achieved by a photocurable composition that contains, as essential components, (A) a modified polyorganosiloxane compound having a photopolymerizable functional group and an SiH group, (B) a compound having a carbon-carbon double bond, and (C) a photopolymerization initiator. A thin film produced from the curable composition of the present invention has excellent insulating properties. Since the curable composition of the present invention can form a film by solution coating, it is applicable to provide thin-film insulating materials that can be formed by solution coating.
    Type: Application
    Filed: September 30, 2009
    Publication date: September 29, 2011
    Applicant: KANEKA CORPORATION
    Inventors: Masahito Ide, Takao Manabe
  • Patent number: 7999014
    Abstract: A flame retardant suitable for manufacturing a polymer composition is provided. The polymer composition is used for forming a cured film in which a balance among flame retardancy, adhesion, chemical resistance, heat resistance, and elasticity, and so on, is provided. A flame-retardant polymer composition with an excellent balance among the above properties is also provided. The flame retardant of the invention has a structure of Formula (1), (2), or (3): (in which, R1 is hydrogen or methyl, R2 is C2-20 alkylene or C2-20 alkylene in which any —CH2— is replaced by —O—, R3 and R4 are C1-20 alkyl, phenyl, and phenyl substituted by C1-5 alkyl or phenyl, R3 and R4 may also be an integrally-formed cyclic group, and p and q are 0 or 1).
    Type: Grant
    Filed: March 5, 2008
    Date of Patent: August 16, 2011
    Assignee: JNC Corporation
    Inventors: Ryota Mineo, Tomohiro Eto, Yosihiro Deyama, Hiroyuki Satou
  • Patent number: 7999013
    Abstract: Hydrophobic coating compositions are provided as are processes to coat articles with the compositions. Extremely hydrophobic coatings are provided by the compositions. Durable, weatherable and scratch-resistant coatings are provided by compositions comprising a trifluoromethyl-containing component and a hardenable material. Weatherable coatings are also provided by compositions comprising a mobile non-volatile fluorinated component and a hardenable material. Processes are also provided for forming hydrophobic coatings on articles.
    Type: Grant
    Filed: June 16, 2010
    Date of Patent: August 16, 2011
    Assignee: Cytonix, LLC
    Inventor: James F. Brown
  • Patent number: 7935738
    Abstract: A transparent flexible film is provided, formed by curing a composition, comprising: about 40-75 parts by weight of a clay; about 15-45 parts by weight of a water-soluble polymer; about 1-10 parts by weight of a mono-functional acrylic oligomer of formula (I), wherein n1 is an integer 2-25, R1 is C1-10 alkyl or H, and R2 is H or CH3; and about 10-45 parts by weight of a bi-functional acrylic oligomer of formula (II), wherein n2 is an integer 3-50, R3 and R4 are H or CH3.
    Type: Grant
    Filed: May 22, 2008
    Date of Patent: May 3, 2011
    Assignee: Industrial Technology Research Institute
    Inventors: Chih-Kuang Chen, Shih-Ming Chen, Jia-Chi Huang, Young-Jen Lee, Li-Ching Wang
  • Patent number: 7927711
    Abstract: This invention relates to a durable layer for in-mold decoration. The durable layer is formed from a composition comprising (i) a thermally crosslinkable and photochemically or radically graftable polymer, (ii) a non-ethylenical thermal crosslinker, and (iii) a radiation curable multifunctional monomer or oligomer. The durable layer of the present invention has excellent surface quality with a wider geometric tolerance and can be formed at low cost.
    Type: Grant
    Filed: May 1, 2007
    Date of Patent: April 19, 2011
    Assignee: SiPix Chemical Inc.
    Inventors: Xiaojia Wang, Haiyan Gu, Fei Wang, HongMei Zang, Tina Wu, Xin Huo, Rong-Chang Liang
  • Patent number: 7923482
    Abstract: The present invention is to provides an ultraviolet-curable resin composition which contains a composite resin (A) having a polysiloxane segment (a1) having a silanol group and/or a hydrolytic silyl group as well as a polymerizable double bond and a polymer segment (a2) other than the polysiloxane segment (a1), and a photo initiator (B). The ultraviolet-curable resin composition is able to form a cured coating film excellent in weatherability such as scratch resistance, acid resistance, alkali resistance and solvent resistance, without heating.
    Type: Grant
    Filed: March 6, 2006
    Date of Patent: April 12, 2011
    Assignee: DIC Corporation
    Inventors: Hiroshi Matsuzawa, Shinichi Kudo
  • Publication number: 20100305232
    Abstract: The subject of the invention is a process for producing polyamide, copolyamide, polyolefin, copolyester amide or fluorocarbon resin powder particles on to the surface of which has been grafted at least one functionalized grafting monomer, characterized in that it comprises: a) a step of blending the polyamide or copolyamide powder particles with the functionalized grafting monomer; followed by b) a step of irradiating the powder impregnated with functionalized grafting monomer resulting from a) with photons (?-radiation) or electrons (?-radiation), with a dose ranging from 0.5 to 15 Mrad. The invention also relates to the particles grafted in this way and to the compositions containing such particles.
    Type: Application
    Filed: April 30, 2010
    Publication date: December 2, 2010
    Applicant: Arkema France
    Inventors: Karine Loyen, Herve Ster, Holger Senff, Thomas Fine
  • Patent number: 7759406
    Abstract: The present invention provides a process for producing a polysilsesquioxane graft polymer (1) which includes applying ionizing radiation or heat to a mixture including a polysilsesquioxane compound (2) and a vinyl compound (3), a polysilsesquioxane compound including an iniferter group, and a pressure-sensitive adhesive and a pressure-sensitive adhesive sheet using the polymer. According to the present invention, a process for producing a polysilsesquioxane graft polymer which may be used as a pressure-sensitive adhesive exhibiting excellent heat resistance and cohesive force, and the like are provided. In the formula, A represents a linking group, R1 represents a hydrocarbon group which may have a substituent, R2 represents a hydrogen atom or the like, R3 represents a polar group or the like, R4 represents a hydrogen atom or the like, k1 to k3 represent arbitrary positive integers, 1 to n represent zero or an arbitrary positive integer (excluding the case where “m=n=0”), and Q represents an iniferter group.
    Type: Grant
    Filed: September 22, 2004
    Date of Patent: July 20, 2010
    Assignee: Lintec Corporation
    Inventors: Taketo Kumon, Toshifumi Kageyama, Atsuko Kimura, Toshio Sugizaki, Osamu Moriya
  • Patent number: 7759407
    Abstract: The present invention is directed to a composition of adhering together first and second materials. The composition features a multi-functional reactive compound that includes a backbone group and first and second functional groups; a cross-linker, and a catalyst. The first functional group is responsive to a first actinic energy to form cross-linked molecules and to adhere a subset of the cross-linked molecules to the first material. The second functional group is responsive to a second actinic energy, differing from the first actinic energy to adhere to the second material.
    Type: Grant
    Filed: July 22, 2005
    Date of Patent: July 20, 2010
    Assignee: Molecular Imprints, Inc.
    Inventor: Frank Y. Xu
  • Patent number: 7728049
    Abstract: Disclosed is a radiation-crosslinkable thermoplastic polymer composition, a process for the preparation thereof, an angioplasty balloon and a medical catheter made using such a composition. The composition contains a reactive monomer cross-linker facilitates cross-linking of the reaction product upon contact of the cross-linker-containing composition with energy from a radiation source.
    Type: Grant
    Filed: June 30, 2003
    Date of Patent: June 1, 2010
    Inventor: Alan M. Zamore
  • Patent number: 7714038
    Abstract: Polyolefin waxes bearing (meth)acrylate groups, process for preparing them and their use.
    Type: Grant
    Filed: March 2, 2006
    Date of Patent: May 11, 2010
    Assignee: BASF Aktiengesellschaft
    Inventors: Dietmar Haering, Bernhard Hauer, Thomas Pfeiffer, Andreas Fechtenkoetter, Harald Larbig, Erich Beck
  • Patent number: 7671107
    Abstract: It has been discovered that an initiation reaction is efficiently progressed to a propagation reaction by adding a compound that potentially or directly generates a carbocation to the polymerization system of a cationic ring-opening polymerizable compound, and thus the activation of polymerization is rendered. Namely, the present invention relates to a cationic polymerizable resin composition which is characterized by comprising (A) a compound having at least one functional group capable of cationic ring-opening polymerization in one molecular chain, (B) a cationic polymerization initiator, and (C) a compound to generate a carbocation by the action of active species generated from (B) the cationic polymerization initiator by electromagnetic wave or particle beam.
    Type: Grant
    Filed: November 25, 2004
    Date of Patent: March 2, 2010
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Yuichi Ito, Yasushi Mizuta
  • Patent number: 7662868
    Abstract: The present invention relates to an ink-jet ink composition, which comprises (A) a polybutadiene; (B) a radical polymerizable compound having a (meth)acryloyl group; (C) a radical polymerization initiator; and (D) a colorant. The ink composition is highly sensitive to activated radiant rays and can accordingly be cured in a high sensitivity when irradiated with the same, can maintain its flexibility even after the cure thereof and can accordingly be used suitably in the ink-jet recording method and a method for the preparation of a lithographic printing plate, to thus form printed matters and a lithographic printing plate having high printing durability.
    Type: Grant
    Filed: June 12, 2007
    Date of Patent: February 16, 2010
    Assignee: FUJIFILM Corporation
    Inventor: Ippei Nakamura