Solid Polymer Or Sicp Derived From Polycarboxylic Acid Or Derivative And Polyol Patents (Class 522/165)
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Patent number: 6190603Abstract: A novel process for producing mouldings, especially contact lenses, is described, comprising the following steps: a) introducing into a mould a prepolymer containing photo crosslinkable groups that is liquid at room temperature or is readily meltable and is substantially free of solvents; b) initiating the photo cross-linking for a period of <20 minutes; c) opening the mould, so that the moulding can be removed for the mould. In accordance with the process according to the invention, it is possible especially to produce contact lenses having valuable properties.Type: GrantFiled: January 22, 1999Date of Patent: February 20, 2001Assignee: Novartis AGInventors: Bettina Steinmann, Friedrich Stockinger
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Patent number: 6187512Abstract: Disclosed is a process which comprises reacting a polymer of the general formula wherein x is an integer of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, with a halomethyl alkyl ether, an acetyl halide, and methanol in the presence of a halogen-containing Lewis acid catalyst, thereby forming a halomethylated polymer.Type: GrantFiled: May 17, 1999Date of Patent: February 13, 2001Assignee: Xerox CorporationInventors: Daniel A. Foucher, Nancy C. Stoffel, Roger T. Janezic, Thomas W. Smith, David J. Luca, Bidan Zhang
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Patent number: 6184263Abstract: A composition which comprises a mixture of (A) a first component comprising a polymer, at least some of the monomer repeat units of which have at least one photosensitivity-imparting group thereon, said polymer having a first degree of photosensitivity-imparting group substitution and being of the formulae specified in the claims, and (B) a second component which comprises either (1) a polymer having a second degree of photosensitivity-imparting group substitution lower than the first degree of photosensitivity-imparting group substitution, wherein said second degree of photosensitivity-imparting group substitution may be zero, wherein the mixture of the first component and the second component has a third degree of photosensitivity-imparting group substitution which is lower than the first degree of photosensitivity-imparting group substitution and higher than the second degree of photosensitivity-imparting group substitution, or (2) a reactive diluent having at least one photosensitivity-imparting group perType: GrantFiled: December 23, 1998Date of Patent: February 6, 2001Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 6151042Abstract: Disclosed is a composition comprising a polymer with a weight average molecular weight of from about 1,000 to about 100,000, said polymer containing at least some monomer repeat units with a first, photosensitivity-imparting substituent which enables crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer also containing a second, thermal sensitivity-imparting substituent which enables further crosslinking or chain extension of the polymer upon exposure to temperatures of about 140.degree. C.Type: GrantFiled: December 23, 1998Date of Patent: November 21, 2000Assignee: Xerox CorporationInventors: Thomas W. Smith, Timothy J. Fuller, Ram S. Narang, David J. Luca
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Patent number: 6124372Abstract: Disclosed is a composition comprising a polymer with a weight average molecular weight of from about 1,000 to about 100,000, said polymer containing at least some monomer repeat units with a first, photosensitivity-imparting substituent which enables crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer also containing a second, thermal sensitivity-imparting substituent which enables further crosslinking or chain extension of the polymer upon exposure to temperatures of about 140.degree. C.Type: GrantFiled: August 29, 1996Date of Patent: September 26, 2000Assignee: Xerox CorporationInventors: Thomas W. Smith, Timothy J. Fuller, Ram S. Narang, David J. Luca
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Patent number: 6114076Abstract: A reactive melt mixing process for the preparation of a low fix temperature toner resin, comprising:(a) mixing a reactive base resin, an initiator, and a polyester with amine functionality, and(b) crosslinking the resulting polymer melt under high shear to form a crosslinked toner resin.Type: GrantFiled: November 29, 1993Date of Patent: September 5, 2000Assignee: Xerox CorporationInventors: Peter G. Odell, Stephan V. Drappel, Michael S. Hawkins
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Patent number: 6090453Abstract: Disclosed is a process which comprises the steps of (a) providing a polymer containing at least some monomer repeat units with halomethyl group substituents which enable crosslinking or chain extension of the polymer upon exposure to a radiation source which is electron beam radiation, x-ray radiation, or deep ultraviolet radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several groups, as specified in the claims, and B is one of several groups, as specified in the claims or mixtures thereof, and n is an integer representing the number of repeating monomer units, and (b) causing the polymer to become crosslinked or chain extended through the photosensitivity-imparting groups. Also disclosed is a process for preparing a thermal ink jet printhead by the aforementioned curing process.Type: GrantFiled: September 30, 1998Date of Patent: July 18, 2000Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 6087414Abstract: Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3##Type: GrantFiled: December 23, 1998Date of Patent: July 11, 2000Assignee: Xerox CorporationInventors: Timothy J. Fuller, Ram S. Narang, Thomas W. Smith, David J. Luca, Raymond K. Crandall
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Patent number: 6063827Abstract: A process for the preparation of an unsaturated polyester which comprises (i) reacting an organic diol with a cyclic akylene carbonate in the presence of a first catalyst to thereby form a polyalkoxy diol, and (ii) optionally adding thereto a further amount of cyclic alkylene carbonate in the presence of a second catalyst, and (iii) subsequently polycondensing the resulting mixture with a dicarboxylic acid.Type: GrantFiled: July 22, 1998Date of Patent: May 16, 2000Assignee: Xerox CorporationInventors: Guerino G. Sacripante, Daniel A. Foucher, J. Stephen Kittelberger, Dongming Li, Marko D. Saban, Alan E. J. Toth, Robert D. Bayley
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Patent number: 6022095Abstract: Disclosed is an improved composition comprising a photopatternable polymer containing at least some monomer repeat units with photosensitivity-imparting substituents, said photopatternable polymer being of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer and a thermal ink jet printhead containing therein a layer of a crosslinked or chain extended polymer of the above formula.Type: GrantFiled: December 23, 1998Date of Patent: February 8, 2000Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller, Thomas W. Smith, David J. Luca, Ralph A. Mosher
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Patent number: 6020119Abstract: Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## or ##STR2## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR3## B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, with a halomethylethyl ether, a hydrohalic acid, and acetic acid in the presence of a halogen-containing Lewis acid catalyst, thereby forming a halomethylated polymer.Type: GrantFiled: May 17, 1999Date of Patent: February 1, 2000Assignee: Xerox CorporationInventors: Daniel A. Foucher, Nancy C. Stoffel, Roger T. Janezic, Thomas W. Smith, David J. Luca, Bidan Zhang
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Patent number: 6007877Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with water-solubility- or water-dispersability-imparting substituents and at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. In one embodiment, a single functional group imparts both photosensitivity and water solubility or dispersability to the polymer. In another embodiment, a first functional group imparts photosensitivity to the polymer and a second functional group imparts water solubility or dispersability to the polymer.Type: GrantFiled: August 29, 1996Date of Patent: December 28, 1999Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 5994425Abstract: Disclosed is an improved composition comprising a photopatternable polymer containing at least some monomer repeat units with photosensitivity-imparting substituents, said photopatternable polymer being of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer and a thermal ink jet printhead containing therein a layer of a crosslinked or chain extended polymer of the above formula.Type: GrantFiled: August 29, 1996Date of Patent: November 30, 1999Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller, Thomas W. Smith, David J. Luca, Ralph A. Mosher
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Patent number: 5958995Abstract: Disclosed is a composition for preparing a thermal ink jet printhead which comprises a mixture of (A) a polymer, some monomer repeat units of which have at least one photosensitivity-imparting group thereon, said polymer having a first degree of photosensitivity-imparting group substitution measured in milliequivalents photosensitivity-imparting group per gram either (1) a polymer having a second degree of photosensitivity-imparting group substitution measured in milliequivalents of photosensitivity-imparting group per gram lower than the first degree of photosensitivity-imparting group substitution, wherein said second degree of photosensitivity-imparting group substitution may be zero, wherein the mixture of the first component and the second component has a third degree of photosensitivity-imparting group substitution measured in milliequivalents of photosensitivity-imparting group per gram which is lower than the first degree of photosensitivity-imparting group substitution and higher than the second degrType: GrantFiled: August 29, 1996Date of Patent: September 28, 1999Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 5922784Abstract: A coated abrasive article comprises a backing, a first binder (i.e., a make coat) on the backing, and a plurality of abrasive particles in the first binder. The first binder precursor is an energy-curable melt-processable resin containing an epoxy resin, a polyester component, a polyfunctional acrylate component, and a curing agent for crosslinking the epoxy resin that is cured to provide a crosslinked make coating. The invention also relates to a method of producing such coated abrasive articles and a surface-treated porous cloth material.Type: GrantFiled: September 2, 1998Date of Patent: July 13, 1999Assignee: Minnesota Mining and Manufacturing CompanyInventors: Robert J. DeVoe, Gregg D. Dahlke, Kimberly K. Harmon, Craig A. Masmar
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Patent number: 5877230Abstract: A method for the anionic photoinitiation of polymerization or crosslinking of a substrate by irradiating a mixture of a substrate and a photoinitiator, where the photoinitiator is an inorganic transition metal complex which releases on irradiation a polymerization initiating substance consisting essentially of an anionically charged nucleophile that initiates the polymerization or crosslinking reaction, under conditions that allow the anion to initiate polymerization. FIG. 3 is plot of percentage polymerization of ethyl .alpha.-cyanoacrylate containing different concentration of Reineckate's anion.Type: GrantFiled: July 25, 1997Date of Patent: March 2, 1999Assignees: University of Georgia Research Foundation, Inc., The University of GeorgiaInventor: Charles R. Kutal
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Patent number: 5869191Abstract: Linear, tertiary carboxyl functional polyester resins obtainable by reaction ofa) at least one compound A.sub.1, comprising the reaction product of(i) a glycidylester of a mixture of certain highly branched saturated monocarboxylic acids isomers, and(ii) a mixture of said highly branched saturated monocarboxylic acids;b) at least one aromatic or cycloaliphatic dicarboxylic acid compound B;c) optionally at least one dihydroxymonocarboxylic acid compound C; andd) optionally at least one diol compound D; in a certain molar ratio of compounds A.sub.1 :B:C:D, at a temperature of from 100.degree. to 225.degree. C., until essentially all the non-tertiary carboxyl groups as initially present in the reaction mixture have been reacted.Type: GrantFiled: November 24, 1997Date of Patent: February 9, 1999Assignee: Shell Oil CompanyInventors: Ronald Petrus Clemons Van Gaalen, Petrus Gerardus Kooijmans, Eric Johannes Vos
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Patent number: 5849809Abstract: Disclosed is a composition which comprises (a) a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are hydroxyalkyl groups; (b) at least one member selected from the group consisting of photoinitiators and sensitizers; and (c) an optional solvent. Also disclosed are processes for preparing the above polymers and methods of preparing thermal ink jet printheads containing the above polymers.Type: GrantFiled: August 29, 1996Date of Patent: December 15, 1998Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 5761809Abstract: Disclosed is a process which comprises reacting a haloalkylated aromatic polymer with a material selected from the group consisting of unsaturated ester salts, alkoxide salts, alkylcarboxylate salts, and mixtures thereof, thereby forming a curable polymer having functional groups corresponding to the selected salt. Another embodiment of the present invention is directed to a process for preparing an ink jet printhead with the curable polymer thus prepared.Type: GrantFiled: August 29, 1996Date of Patent: June 9, 1998Assignee: Xerox CorporationInventors: Timothy J. Fuller, Ram S. Narang, Thomas W. Smith, David J. Luca, Raymond K. Crandall
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Patent number: 5710233Abstract: Polyurethane elastomers with reduced gas permeability are prepared by reaction of:a) diisocyanates,b) compounds with a molecular weight of 500 to 10,000 having at least two hydrogen atoms that are reactive towards isocyanates,c) compounds with a molecular weight of 61 to 499 having at least two hydrogen atoms that are reactive towards isocyanates, and optionallyd) further auxiliaries and additives,characterized in thati) the ratio of the isocyanate groups in a) to the sum of the isocyanate-reactive groups in b) and c) is between 1:0.80 and 1:1.05 (isocyanate:isocyanate-reactive), andii) the compound b) contains 3 to 15% by wt.Type: GrantFiled: January 6, 1997Date of Patent: January 20, 1998Assignee: Rhein Chemie Rheinau GmbHInventors: Walter Meckel, Klaus Konig, Hans-Dieter Thomas
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Patent number: 5612445Abstract: The epoxidation of alkyds containing anhydrides or diacids with cycloaliphatic unsaturation results in epoxy resins which cure rapidly in UV light to produce uniform films without the use of flow modifiers. The fatty acid portion of the alkyd functions as an internal plasticizer. Crosslinking occurs through oxirane rings in both the anhydride and fatty acid moieties of the alkyd to produce hard, but not brittle films. Excellent water resistance is obtained without thermal post curing.Type: GrantFiled: February 15, 1995Date of Patent: March 18, 1997Assignee: Arizona Chemical Co.Inventor: Raymond H. Jones
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Patent number: 5582672Abstract: A coated abrasive article comprises a backing, a first binder on the backing, and a plurality of abrasive particles in the first binder. The first binder is a hot melt pressure sensitive adhesive that is energy cured to provide a crosslinked coating. The invention also relates to a method of producing such articles.Type: GrantFiled: June 1, 1995Date of Patent: December 10, 1996Assignee: Minnesota Mining and Manufacturing CompanyInventors: Gary J. Follett, Clayton A. George
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Patent number: 5552453Abstract: An object of the present invention is to provide a water-absorptive material having a satisfactory water-absorptivity in an ion-exchanged water as well as an ionic aqueous solution and also having a satisfactory thermoplastic moldability, and also to provide a water-absorptive molded product having an excellent fabricability including heat-sealability.Thus, the present invention provides a water-absorptive material crosslinked by irradiation with an ionizing radiation or ultraviolet rays, which comprises a hydrophilic high molecular compound having a weight average molecular weight of at least 10,000 obtained by reaction of (i) a polyalkylene oxide compound having an organic compound containing two active hydrogen groups addition-polymerized with an alkylene oxide comprising ethylene oxide as the main component and (ii) a polycarboxylic acid, a polycarboxylic acid anhydride, a lower alkyl ester of polycarboxylic acid or a diisocyanate.Type: GrantFiled: December 16, 1994Date of Patent: September 3, 1996Assignees: Mitsubishi Plastics, Inc., Dai-Ichi Kogyo Seiyaku Co., Ltd.Inventors: Takeshi Fujita, Katsuaki Matsuo, Osamu Kakishita
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Patent number: 5497562Abstract: A system for the solid phase polymerization of polymers comprising a crystallizer, and wherein cold amorphous polymer is introduced to the crystallizer. A source of infrared radiation is associated with the crystallizer, and the polymer is heated by applying infrared radiation thereto. The degree of heating is controlled so that the polymer reaches the crystallization or polymerization temperature without exceeding the polymer melting point.Type: GrantFiled: March 3, 1995Date of Patent: March 12, 1996Assignee: Hosokawa Bepex CorporationInventor: Ilya Pikus
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Patent number: 5486546Abstract: Method of producing a microstructure in a bioresorbable element comprising a material consisting of a major portion of at least one polymer selected from the group including aliphatic polyesters and aliphatic polycarbonates and copolymers thereof. The microstructure is accomplished by using an excimer laser which is operated at a maximum wavelength of 248 nm.Type: GrantFiled: February 7, 1994Date of Patent: January 23, 1996Inventors: Torbjorn Mathiesen, Gunnar Bernhard, Phil Rumsby
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Patent number: 5356740Abstract: Radiation-sensitive compositions comprising(a) a polyester containing structural repeating units of formula (I) ##STR1## wherein Z is a radical of formulae (IIa)-(IIh) ##STR2## wherein Y is a direct bond, C.sub.1 -C.sub.20 alkylene, phenylene, --CH.sub.2 --C.sub.6 H.sub.4 --CH.sub.2 --, cyclopentylene or cyclohexylene, and R.sub.1 and R.sub.2 are each independently of the other hydrogen, methyl or ethyl, with the proviso that R.sub.1 and R.sub.2 are not simultaneously hydrogen, and(b) a substance that generates acid upon exposure to actinic radiation,form a highly sensitive high resolution positive photoresist formulation which is suitable for DUV lithography and, in particular, for making integrated circuits.Type: GrantFiled: November 20, 1992Date of Patent: October 18, 1994Assignee: Ciba-Geigy CorporationInventor: Alfred Steinmann
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Patent number: 5332625Abstract: The present invention is a surface modification process which provides a means of rapidly heating a thin layer of a polymer surface or a thin coating of material on a coated substrate and various surfaces produced by such a process.Type: GrantFiled: August 3, 1992Date of Patent: July 26, 1994Assignee: Minnesota Mining and Manufacturing CompanyInventors: Douglas S. Dunn, Edward C. Yu, Andrew J. Ouderkirk
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Patent number: 5278199Abstract: An actinic radiation-reactive pressure-sensitive adhesive composition can be cured in air at a high speed, without irritation and bad smell, and comprises1 a pressure-sensitive adhesive organic compound, and2 an actinic radiation-curable resin comprising (1) one or more polythiol compounds and (2) one or more polyene compounds each having at least two actinic radiation-reactive carbon-to-carbon double bonds in the molecule.Type: GrantFiled: December 21, 1990Date of Patent: January 11, 1994Assignee: Asahi Denka Kogyo K.K.Inventors: Kazuo Ohkawa, Seiichi Saito
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Patent number: 4910233Abstract: The invention relates to a process for crosslinking aromatic polymers containing radiation-sensitive methylene groups (--CH.sub.2 --) by exposing the polymers to ionizing radiation thereby causing crosslinking of the polymers through the methylene groups. Crosslinked polymers are resistant to most organic solvents such as acetone, alcohols, hydrocarbons, methylene, chloride, chloroform, and other halogenated hydrocarbon, to common fuels and to hydraulic fluids in contrast to readily soluble uncrosslinked polymers. In addition, the degree of crosslinking of the polymers depends upon the percentage of the connecting groups which are methylene which ranges from 5 to 50% and preferably from 25 to 50% of the connecting groups and is also controlled by the level of irradiation which ranges from 25 to 1000 Mrads and preferably from 25 to 250 Mrads. The temperature of the reaction conditions ranges from 25.degree. to 200.degree. C. and preferably at or slightly above the glass transition temperature of the polymer.Type: GrantFiled: March 11, 1986Date of Patent: March 20, 1990Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Vernon L. Bell, Stephen J. Havens
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Patent number: 4876173Abstract: A photopolymerizable composition is described, comprising an addition polymerizable unsaturated compound having at least two ethylenically unsaturated double bonds per molecule, a photopolymerization initiator, and a binder, wherein said binder is a copolymer represented by formula (I) ##STR1## wherein Ar.sup.1 and Ar.sup.2 each represent a substituted or unsubstituted phenyl group; and n.sub.1, n.sub.2, n.sub.3, and n.sub.4 each represents mol % of the respective repeating unit, wherein n.sub.1 is from 0 to about 70; n.sub.2 is from 0 to about 70; n.sub.3 is from about 5 to 50; and n.sub.4 is from about 5 to 50; provided that n.sub.1 and n.sub.2 are not 0 at the same time, the sum of n.sub.3 and n.sub.4 is from about 30 to 80. The composition is useful as an alkali-developable light-sensitive layer which provides a photosensitive dry film resist having excellent performance characteristics.Type: GrantFiled: September 2, 1988Date of Patent: October 24, 1989Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuo Maemoto, Masayuki Iwasaki, Minoru Maeda, Yoshimasa Aotani
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Patent number: 4714669Abstract: Homo- and copolycondensates selected from the group consisting of linear saturated polyamides, polyesters and polyester amides derived from dicarboxylic acids of formula IV ##STR1## wherein Z is a direct bond, methylene, --O--, --S--, --SO--, --SO.sub.2 --, --CO--, --NH-- or alkylidene, R.sup.1 and R.sup.2 are independently alkyl, halogen, cyano, nitro, alkoxy, phenoxy or benzyl, and m and n are independently 0 to 3, are radiation-sensitive and are particularly suitable for the production of protective coatings and relief images.Type: GrantFiled: March 27, 1986Date of Patent: December 22, 1987Assignee: Ciba-Geigy CorporationInventors: Josef Pfeifer, Rudolf Duthaler
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Patent number: 4578166Abstract: A shaped article made of a polymeric composition comprising as the essential component a saturated linear polyester or polyamide comprising a structural unit of the formula: ##STR1## wherein R.sup.1 and R.sup.2 are same or different and each represents a monovalent organic group such as a monovalent aliphatic, alicyclic or aromatic group having one or more carbon atoms (preferably 1 to 20 carbon atoms) and m and n are each an integer of 0 to 3 in an amount of 0.01 to 50 moles per 100 moles of the total ester or amide linkages in the molecule of the polyester or polyamide is irradiated with actinic rays so that chain-linking takes place between or among the molecules of the polyester or polyamide, whereby the physical and chemical properties of the shaped article are favorably enhanced.Type: GrantFiled: April 13, 1983Date of Patent: March 25, 1986Assignee: Toyo Boseki Kabushiki KaishaInventors: Keiichi Uno, Hikoichi Nagano, Tadashi Ikegami