Specified Rate-affecting Material Is Heterocyclic Patents (Class 522/26)
  • Patent number: 6852766
    Abstract: A method of multiphoton photosensitizing a photoreactive composition comprises irradiating the composition with light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light. The composition comprises: (a) at least one reactive species that is capable of undergoing such reaction; and (b) at least one multi-component, multiphoton photoinitiator system.
    Type: Grant
    Filed: June 14, 2001
    Date of Patent: February 8, 2005
    Assignee: 3M Innovative Properties Company
    Inventor: Robert J. DeVoe
  • Patent number: 6844136
    Abstract: This present invention discloses a photopolymerisable mixture comprising a polymer binder, a radically photopolymerisable component containing at least one photooxidisable group, a polyethylene glycol di(meth)acrylate containing 2 or more ethylene glycol units, a photoreducible dye and a metallocene. This mixture can be used for preparing high-speed light-sensitive recording materials showing a particularly high resolution, especially for small negative types.
    Type: Grant
    Filed: August 24, 2000
    Date of Patent: January 18, 2005
    Assignee: AGFA-Gevaert
    Inventors: Thorsten Lifka, Sabine Kosack, Thomas Leichsenring, Hans-Joachim Schlosser
  • Patent number: 6844373
    Abstract: A radiation-curable composition having a reduced surface energy and including a reactive dye containing at least one radiation-curable substituent and at least one fluorine-containing substituent. The reactive dye may include any anthraquinone, methine, azo, azine, or xanthene dye adapted to contain at least one radiation-curable substituent and at least one fluorine-containing substituent. The radiation-curable substituent may include (meth)acrylate, styrene, vinyl ether, vinyl ester, N-substituted acrylamide, N-vinyl amide, maleate ester, and fumarate ester.
    Type: Grant
    Filed: May 28, 2002
    Date of Patent: January 18, 2005
    Assignee: Alcatel
    Inventor: Michael B. Purvis
  • Patent number: 6833391
    Abstract: A curable composition includes a multifunctional (meth)acrylate; a substituted or unsubstituted arylether (meth)acrylate monomer; a brominated aromatic (meth)acrylate monomer; and a polymerization intiator. The compositions exhibit high refractive indices and, upon polymerization, the compositons provide films having excellent thermomechanical properties.
    Type: Grant
    Filed: May 27, 2003
    Date of Patent: December 21, 2004
    Assignee: General Electric Company
    Inventors: Bret Ja Chisholm, Anne Herrmann
  • Publication number: 20040249100
    Abstract: A curable composition includes a multifunctional (meth)acrylate; a substituted or unsubstituted arylether (meth)acrylate monomer; a brominated aromatic (meth)acrylate monomer; and a polymerization initiator. The compositions exhibit high refractive indices and, upon polymerization, the compositions provide films having excellent thermomechanical properties.
    Type: Application
    Filed: May 27, 2003
    Publication date: December 9, 2004
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Bret Ja Chisholm, Anne Herrmann
  • Publication number: 20040235976
    Abstract: Aliphatic maleimide compounds having at least one maleimide unit substituted with a functionalized aliphatic radical at the nitrogen atom are provided. The aliphatic radical can be a linear or branched C1 to C10 alkyl, such as methyl or ethyl. The aliphatic maleimide compounds are useful as photoinitiators. Polymerization of compositions that include the aliphatic maleimide compounds may be activated by radiation.
    Type: Application
    Filed: May 10, 2004
    Publication date: November 25, 2004
    Inventors: Charles E. Hoyle, Shan Christopher Clark, E. Sonny Jonsson
  • Patent number: 6815034
    Abstract: A light-curable resin composition includes an acrylate oligomer, an acrylate monomer having 4 or less functional groups, a photopolymerization initiator, a hardness enhancing agent represented by the formula(1), m-terphenyl represented by the formula(2) and a colloidal antistatic agent. The light-curable resin composition has a high antistatic property and a light transmittance, as well as a high hardness and a low shrinkage rate.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: November 9, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Do-hoon Chang, Myong-do Ro, Du-seop Yoon, In-sik Park
  • Publication number: 20040198859
    Abstract: Coinitiator systems for photopolymerization of photopolymerizable compounds containing olefinic unsaturation are described. Such systems comprise (A) either a combination of at least one coumarin photoinitiator and at least one coinitiator compound which is a hydrogen atom donating coinitiator or an electron donating coinitiator, or at least one coumarin photoinitiator having in its molecular structure at least one photosensitizing amino group; and (B) at least one compound containing at least one maleimide or maleic anhydride derivative. Photopolymerizable compositions which comprise, in addition to such a coinitiator system, at least one photopolymerizable compound containing olefinic unsaturation are also described.
    Type: Application
    Filed: April 3, 2003
    Publication date: October 7, 2004
    Inventors: Chau K. Nguyen, Charles E. Hoyle
  • Patent number: 6797739
    Abstract: The preset invention relates to a photosensitive composition, and provides a triazine-based compound comprising new functionalized alkylthio groups of which long term storage characteristics at room temperature as well as photochemical activity as a photopolymerization initiator are superior.
    Type: Grant
    Filed: September 27, 2002
    Date of Patent: September 28, 2004
    Assignee: LG Chemical Co., Ltd.
    Inventors: Sung-Hyun Kim, Chul-Woo Lee, Jin-Seuk Kim, Jae-Hwan Lee, Dong-Chang Choi, Hyuk-Jin Cha
  • Patent number: 6777460
    Abstract: Novel catalyst systems in cationically curable compositions provide colorless cationically cured compositions with improved degree of cure and thermal stability. The curable composition comprises at least one cationically curable monomer and a curing agent comprising Photocurative A or Photocurative B. Photocurative A comprises an effective amount of an accelerating photochemically active salt comprising a photochemically active cation and an accelerating anion, and an effective amount of an inhibiting non-photochemically active salt comprising a non-photochemically active cation and an inhibiting anion. Photocurative B comprises an effective amount of an inhibiting photochemically active salt comprising a photochemically active cation and an inhibiting anion, and an effective amount of an accelerating non-photochemically active salt comprising a non-photochemically active cation and an accelerating anion.
    Type: Grant
    Filed: December 23, 2002
    Date of Patent: August 17, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Michael C. Palazzotto, Stefan H. Gryska
  • Patent number: 6767933
    Abstract: A radiation polymerizable composition comprising: (A) a donor/acceptor component for forming a charge transfer complex said component being selected from the group consisting of: (iii) a bifunctional compound having an electron donor group and an electron withdrawing group and a polymerizable unsaturated group; (iv) a mixture of (a) at least one unsaturated compound having an electron donor group and a polymerizable unsaturated moiety; and (b) at least one unsaturated compound having an electron acceptor group and a polymerizable unsaturated group; and (B) a binder polymer composition.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: July 27, 2004
    Assignee: Ballina PTY LTD
    Inventors: John Lyndon Garnett, Allan Darley Matthews
  • Patent number: 6765036
    Abstract: Photopolymerizable compositions comprise a cationically polymerizable resin and a photoinitiator system comprising: (i) an iodonium salt; (ii) a visible light sensitizer; and (iii) an electron donor compound having an oxidation potential less than that of 1,4-dimethoxybenzene when measured versus a saturated calomel electrode, wherein the photoinitiator system has a photoinduced potential of less than that of 3-dimethylaminobenzoic acid in a standard solution of 2.9×10−5 moles/g diphenyl iodonium hexafluoroantimonate and 1.5×10−5 moles/g camphorquinone in 2-butanone. The compositions polymerize on exposure to light in the visible spectrum and are useful in a variety of applications, including dental adhesives and dental composites.
    Type: Grant
    Filed: January 15, 2002
    Date of Patent: July 20, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Karsten Dede, Thomas Klettke, Thomas Luchterhandt, Joel D. Oxman
  • Patent number: 6756166
    Abstract: Disclosed is a photosensitive resin composition which can be developed using a dilute aqueous alkaline solution after ultraviolet ray exposure, is excellent in pot life, capable of preventing deposits from being generated in a cured coated film, capable of widening heat control tolerance, and is excellent in sensitivity, in heat resistance, in chemical resistance and in electric insulating properties, thereby rendering the composition suitable for use as a solder resist for producing a printed wiring board. This photosensitive resin composition comprises (A) an active energy ray-curable resin having at least two ethylenic unsaturated linkages per molecule thereof, (B) at least one kind material selected from acid salts of N-substituted melamine compound and acid salts of guanamine compound, (C) a photopolymerization initiator, (D) a diluent, and (E) a thermosetting compound. There is also disclosed a printed wiring board where this photosensitive resin composition is employed.
    Type: Grant
    Filed: September 23, 2002
    Date of Patent: June 29, 2004
    Assignee: Tamurakaken Corporation
    Inventors: Takao Ono, Ichiro Miura
  • Patent number: 6749995
    Abstract: Disclosed is a light sensitive composition containing a compound represented by the following formula (1): wherein R1, R2 and R3 independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclic group, provided that R1 and R2 may combine with each other to form a ring or R2 and R3 may combine with each other to form a ring.
    Type: Grant
    Filed: January 29, 2003
    Date of Patent: June 15, 2004
    Assignee: Konica Corporation
    Inventor: Toshiyuki Matsumura
  • Patent number: 6750266
    Abstract: A multiphoton-activatable, photoreactive composition comprises: (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; (b) a photochemically-effective amount of a multiphoton photosensitizer comprising at least one multiphoton up-converting inorganic phosphor; and (c) a photochemically-effective amount of a one-photon photoinitiator system that is capable of being photosensitized by the multiphoton photosensitizer.
    Type: Grant
    Filed: December 28, 2001
    Date of Patent: June 15, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: James G. Bentsen, Robert J. DeVoe, Michael C. Palazzotto
  • Patent number: 6747071
    Abstract: The invention concerns dental compositions. Said composition comprises (1) a silicon crosslinkable and/or polymerizable by cation process; (2) an efficient amount of at least an initiator such as onium borate; (3) at least a photosensitizer; and (4) a dental filler present in the composition in a proportion of at least 10 wt. % relative to the composition total weight. Said dental compositions are useful for making dental prostheses or for dental restoration.
    Type: Grant
    Filed: June 25, 2001
    Date of Patent: June 8, 2004
    Assignee: Rhodia Chimie
    Inventor: Jean-Marc Frances
  • Patent number: 6734221
    Abstract: A radiation-curable composition that includes a cyanoacrylate component or a cyanoacrylate-containing formulation, a photoinitiated radical generating component, and a photoinitiator component is provided.
    Type: Grant
    Filed: March 11, 2002
    Date of Patent: May 11, 2004
    Assignee: Loctite (R&D) Limited
    Inventor: Hanns R Misiak
  • Patent number: 6726795
    Abstract: A radiation-curable composition which includes a cyanoacrylate component or a cyanoacrylate-containing formulation; a metallocene component; and a polymerizingly effective amount of a photoinitiator to accelerate the rate of cure is provided.
    Type: Grant
    Filed: February 20, 2002
    Date of Patent: April 27, 2004
    Inventors: Stan Wojciak, Shabbir Attarwala
  • Patent number: 6713523
    Abstract: The invention discloses a photopolymerizable composition comprising at least one, ethylenic unsaturated bond-containing compound, a hexaaryl-biimidazole compound, and an organoboron compound represented by a specific general formula; and discloses a photosensitive thermal recording material having a recording layer that contains the photopolymerizable composition. The photopolymerizable composition and the photosensitive thermal recording material of the invention are highly sensitive to UV rays and visible to IR rays falling within a wavelength range that includes wavelengths not longer than 450 nm, and are effective for decoloring a dye component that absorbs the rays falling within the wavelength range.
    Type: Grant
    Filed: November 2, 2001
    Date of Patent: March 30, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kozo Nagata, Shintaro Washizu
  • Publication number: 20030229233
    Abstract: Processes are described for the preparation of thioxanthones (Formula I). A reactant mixture of a 2-chlorothiobenzoyl chloride (Formula II) and an aromatic compound (Formula III) is added to a slurry of a Friedel-Crafts catalyst in an organic Friedel-Crafts solvent. Products of the processes may be used for the preparation of a pharmaceutical product for use in the field of psycho-therapeutics, or as activators or sensitizers in the photo-polymerization of ethylenically unsaturated monomers.
    Type: Application
    Filed: April 7, 2003
    Publication date: December 11, 2003
    Inventor: Carsten Berg
  • Patent number: 6630242
    Abstract: A radiation-curable fiber optic coating composition for an inner primary coating includes a coloring agent, preferably a dye or a dye precursor, compatible with the fiber of the fiber optic and capable of imparting a pre-selected color to the inner primary coating, or another coating. The coloring agent can be a reactive dye. Any of the dyes preferably is stabilized by a stabiliser in the colored coating layer, or, preferably, in a more exterior layer.
    Type: Grant
    Filed: July 26, 2000
    Date of Patent: October 7, 2003
    Assignee: DSM N.V.
    Inventors: Jibing Lin, Eva I. Montgomery, Paul E. Snowwhite, Jr., James R. Petisce, Anton Kotesky
  • Patent number: 6630521
    Abstract: Disclosed are thermally-stable, red, anthraquinone colorants which contain one or more ethylenically-unsaturated, photopolymerizable radicals and which may be copolymerized with ethylenically-unsaturated monomers to produce colored compositions such as colored acrylic polymers, colored polystyrenes, and similar colored polymeric materials derived from other ethylenically-unsaturated monomers. The compounds possess good stability to ultraviolet light, good solubility in vinyl monomers, good color strength and thermal stability. Also disclosed are acrylic polymeric materials, i.e., polymers derived from acrylic acid esters, methacrylic acid esters and/or other copolymerizable vinyl compounds, having copolymerized therein one or more of the colorant compounds of the present invention.
    Type: Grant
    Filed: November 13, 2001
    Date of Patent: October 7, 2003
    Assignee: Eastman Chemical Company
    Inventors: Michael John Cyr, Max Allen Weaver, Gerry Foust Rhodes, Jason Clay Pearson, Jean Carroll Fleischer
  • Publication number: 20030176520
    Abstract: 4-Cyanocoumarin derivatives which have a distinct sensitivity to visible light, distinct luminescent ability, and satisfactory applicability for photochemical polymerization, dye lasers, and organic electroluminescent elements. Since most of the derivatives have a fluorescent maximum wavelength of 600 to 650 nm, particularly, 610 to 630 nm, they are extremely useful as luminescent agents for organic EL elements which emit visible light in a red-color region, and can be quite useful as luminescent agents in organic EL elements and laser-active substances in dye lasers, as well as luminous bodies as lighting sources for lighting devices, and information displays for visually displaying information.
    Type: Application
    Filed: January 21, 2003
    Publication date: September 18, 2003
    Applicant: KABUSHIKI KAISHA HAYASHIBARA SEIBUTSU KAGAKU KENKYUJO
    Inventors: Yoshio Taniguchi, Toshiki Koyama, Chihaya Adachi, Tomoyasu Saitou, Makoto Satsuki, Akira Shinpo, Sadaharu Suga, Shizuo Tokito, Hisayoshi Fujikawa, Koji Noda, Atsushi Miura, Yasunori Taga
  • Patent number: 6616885
    Abstract: A manufacturing method comprising the steps of forming at first solidified wax layer of a desired shape, depositing onto the first solidified wax layer at least one layer of a liquid resin formulation, solidifying the layer of liquid resin formulation, depositing a second wax layer on to the combination of the first solidified wax layer and the layer of solidified resin formulation, solidifying the second wax layer, and separating the solidified resin formulation from first and second wax layers. Preferably, the resin formulation comprises at least one monofunctional water soluble vinyl or acrylic monomer in combination with a low molecular weight aliphatic polymer having acrylic or methacrylic acid functionality. The solidified wax and resin formulation layers can be machined as may be desired to form mold of a given shape comprising wax layers when the layer of formulation is separated from the wax layers.
    Type: Grant
    Filed: October 4, 2001
    Date of Patent: September 9, 2003
    Assignee: Advanced Ceramics Research, Inc.
    Inventors: John Lang Lombardi, Gregory John Artz
  • Publication number: 20030166738
    Abstract: The invention provides compounds which can generate amine by irradiation with light and are excellent both in photodecomposability and in reactivity and compatibility with amine-curable compounds, and photo-setting compositions containing the compounds. The compounds are carbamoyloxyimino compounds represented by the structural formula (I); and the compositions each comprise one or more of the carbamoyloxyimino compounds and an amine-curable compound. In the formula (I), R1 is an n-valent organic group; R2 and R3 are each hydrogen or an aromatic or aliphatic group; and n is an integer of 1 or above.
    Type: Application
    Filed: February 21, 2003
    Publication date: September 4, 2003
    Inventors: Hideaki Ishizawa, Hiroji Fukui, Takeo Kuroda
  • Patent number: 6610760
    Abstract: A radiation curable composition contains an epoxy-functional silicone polymer, an iodonium photocatalyst and a non-fluorescing polycyclic aromatic compound containing at least one hydroxy, alkoxy or glycidyl ether substituent bonded to an aromatic carbon atom of the compound.
    Type: Grant
    Filed: July 18, 2001
    Date of Patent: August 26, 2003
    Assignee: General Electric Company
    Inventors: Richard Paul Eckberg, Kesheng Feng, Douglas Neckers
  • Patent number: 6599954
    Abstract: An object of the present invention is to completely cure a resin composition highly capable of screening energy radiation, such as a carbon fiber-reinforced composite material (CFRP), simply by exposing the resin composition to UV radiation in the presence of a specific photopolymerization initiator system (reaction catalyst system) comprising at least two components. To this end, the present invention provides a resin curing method wherein, when a resin composition is exposed to energy radiation typified by UV radiation, another kind of first energy than the energy from an energy radiation source is autogenously generated within the resin, and the same kind of second energy is successively generated by the autogenously generated energy, so that the resin composition is cured by means of the first and second energies, or both the first and second energies and the energy from the energy radiation source, whether or not the resin composition contains a substance capable of screening energy radiation.
    Type: Grant
    Filed: June 17, 1999
    Date of Patent: July 29, 2003
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Noriya Hayashi, Shunichi Hayashi
  • Publication number: 20030139484
    Abstract: A multiphoton-activatable, photoreactive composition comprises: (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; (b) a photochemically-effective amount of a multiphoton photosensitizer comprising at least one multiphoton up-converting inorganic phosphor; and (c) a photochemically-effective amount of a one-photon photoinitiator system that is capable of being photosensitized by the multiphoton photosensitizer.
    Type: Application
    Filed: December 28, 2001
    Publication date: July 24, 2003
    Applicant: 3M Innovative Properties Company
    Inventors: James G. Bentsen, Robert J. DeVoe, Michael C. Palazzotto
  • Publication number: 20030134924
    Abstract: Disclosed are thermally-stable, red, anthraquinone colorants which contain one or more ethylenically-unsaturated, photopolymerizable radicals and which may be copolymerized with ethylenically-unsaturated monomers to produce colored compositions such as colored acrylic polymers, colored polystyrenes, and similar colored polymeric materials derived from other ethylenically-unsaturated monomers. The compounds possess good stability to ultraviolet light, good solubility in vinyl monomers, good color strength and thermal stability. Also disclosed are acrylic polymeric materials, i.e., polymers derived from acrylic acid esters, methacrylic acid esters and/or other copolymerizable vinyl compounds, having copolymerized therein one or more of the colorant compounds of the present invention.
    Type: Application
    Filed: November 13, 2001
    Publication date: July 17, 2003
    Inventors: Michael John Cyr, Max Allen Weaver, Gerry Foust Rhodes, Jason Clay Pearson, Jean Carroll Fleischer
  • Patent number: 6579913
    Abstract: Photoactivatable coating composition comprising at least one photoinitiator and a base-catalysed polymerisable or curable organic material comprising at least one polyisocyanate and at least one compound containing isocyanate reactive groups, wherein the isocyanate reactive groups comprise at least one thiol group and the photoinitiator is a photolatent base. Preference is given to a coating composition wherein the photolatent base is selected from the group of N-substituted 4-(ortho-nitrophenyl) dihydropyridine, a quaternary organo-boron photoinitiator, and an &agr;-amino acetophenone. The composition additionally may comprise an organic acid, a metal complex and/or a metal salt as a cocatalyst and/or a sensitiser selected from the group of thioxanthones, oxazines, rhodamines, and preferably from the group of benzo-phenone and derivatives thereof.
    Type: Grant
    Filed: May 24, 2001
    Date of Patent: June 17, 2003
    Assignee: Akzo Nobel N.V.
    Inventors: Huig Klinkenberg, Josephus Christiaan Van Oorschot
  • Patent number: 6569603
    Abstract: There are disclosed a light-sensitive composition which comprises (A) a polymer having a phenyl group substituted by a vinyl group at a side chain, (B) a photopolymerization initiator and (C) a sensitizer which sensitizes the photo-polymerization initiator, or a light-sensitive composition which comprises (A′) a polymer, the above-mentioned (B) and (C), and (D) a monomer having at least two phenyl groups each of which is substituted by a vinyl group in the molecule of the monomer; and a method of forming a relief image which comprises coating the light-sensitive composition as mentioned above on a support, exposing the composition by exposure or scanning exposure and developing the same to form a relief image on the support.
    Type: Grant
    Filed: January 30, 2001
    Date of Patent: May 27, 2003
    Assignee: Mitsubishi Paper Mills Limited
    Inventor: Akira Furukawa
  • Publication number: 20030027882
    Abstract: New photocationic photoinitiator combinations are described that consist of 2,4,6-triarylpyrylium salts with non-nucleophilic anions and electron donors, that are able rapidly to crosslink unpigmented as well as pigmented mixtures based on cycloaliphatic epoxides to form colourless layers such as lacquers and printing inks without generating interfering and toxic emissions.
    Type: Application
    Filed: May 28, 2002
    Publication date: February 6, 2003
    Inventors: Rainer B. Frings, Gerwald F. Grahe
  • Patent number: 6515038
    Abstract: A polymer used in a chemically amplified resist is represented by the following formula: wherein R1, R3 and R5 are each independently selected from the group consisting of —H, and —CH3; R2 is selected from the group consisting of t-butyl, tetrahydropyranyl, and 1-alkoxyethyl; R4 is selected from the group consisting of —H, —CH3, t-butyl, tetrahydropyranyl, and 1-alkoxyethyl; x is an integer ranging from 1 to 4; and wherein l, m, and n are selected such that l/(l+m+n) ranges from 0.1 to 0.5, m/(l+m+n) ranges from 0.01 to 0.5, and (l+m)/(l+m+n) ranges from 0.1 to 0.7.
    Type: Grant
    Filed: July 26, 2001
    Date of Patent: February 4, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Sang-jun Choi
  • Patent number: 6512020
    Abstract: Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g.
    Type: Grant
    Filed: March 28, 2001
    Date of Patent: January 28, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Toshikage Asakura, Hitoshi Yamato, Masaki Ohwa, Jean-Luc Birbaum, Kurt Dietliker, Junichi Tanabe
  • Patent number: 6500877
    Abstract: The present invention discloses an ultraviolet light curable paint composition and method for applying and making such a composition to a substrate. Suitable substrates include glass, metals, and various plastics such as polycarbonates. The disclosed composition does not contain any significant amount of volatile organic solvents that do not become incorporated in the coating or are released to ambient after curing.
    Type: Grant
    Filed: September 25, 2000
    Date of Patent: December 31, 2002
    Assignee: Krohn Industries, Inc.
    Inventor: Roy C. Krohn
  • Patent number: 6489081
    Abstract: Compounds of formula I wherein R1, R2, and R3 independently of one another are hydrogen; C1-C20alkyl which is unsubstituted or substituted by OH, C1-C4alkoxy, C1-C4alkylthio, phenylthio, F, Cl, Br, I, CN, (C1-8alkyl)O—(CO)—, (C1-C4alkyl)—(CO)O— or/and di(C1-C4alkyl)amino; or R1, R2, and R3 independently of one another are C3-C6alkenyl; phenyl which is unsubstituted or substituted by OH, C1-C4alkoxy, C1-C4alkylthio, phenylthio, F, Cl, Br, I, CN, (C1-C8alkyl)O(CO)—, (C1-C4alkyl)—(CO)O— or/— and di(C1-C4alkyl)amino; or R1 and R2 together are C2-C9alkylene, o-xylylene, 2-butenylene, C3-C9oxaalkylene or C3-C9azaalkylene; R4, R5, R6, and R7 independently of one another are sec-C3-C20alkyl, tert-C4-C20alkyl or phenyl wherein these radicals are unsubstituted or substituted by OH, C1-C4alkoxy, C1-C4alkylthio, phenylthio, F, Cl, Br, I, CN, (C1-C8alkyl)O(CO)—, (C1-C4alkyl)—(CO)O— or/and di(C1-C4alkyl)amino; or R4 and R5, and/or R6 and R7
    Type: Grant
    Filed: November 30, 2000
    Date of Patent: December 3, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Akira Matsumoto, Yoshihiko Ito
  • Patent number: 6489374
    Abstract: The invention relates to &agr;-ammonium alkenes, iminium alkenes and amidinium alkenes in the form of their tetraaryl- or triaryl-alkylborate salts that can be converted photochemically into amines, imines or amidines, and to a process for the preparation thereof. The invention relates also to compositions polymerisable or crosslinkable under basic conditions comprising such &agr;-ammonium alkenes, iminium alkenes or amidinium alkenes in the form of their tetra- or tri-arylalkylborate salts, to a method of carrying out photochemically induced, base-catalysed reactions, and to the use of such compounds as photoinitiators for base-catalysed reactions.
    Type: Grant
    Filed: February 16, 2001
    Date of Patent: December 3, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Gisèle Baudin, Sean Colm Turner, Allan Francis Cunningham
  • Patent number: 6485886
    Abstract: New oxime derivatives of formula (I) or. (II), wherein m is 0 or 1; R1 inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R′1 is for example C2-C12alkylene, phenylene, naphthylene; R2 is CN; R3 is C2-C6haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R4, R5, R10 and R11 inter alia are hydrogen, C1-C6alkyl, C1-C6alkoxy; R6 inter alia is hydrogen phenyl, C1-C12alkyl; R7 and R8 inter alia are hydrogen, C1-C12alkyl; or R7 and R8, together with the nitrogen atom to which they are bonded, form a 5-, 6 or 7-membered ring; R9 is for example C1-C12alkyl; and A inter alia is S, O, NR7a; are useful as latent acids, especially in photoresist applications.
    Type: Grant
    Filed: April 24, 2001
    Date of Patent: November 26, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Hitoshi Yamato, Toshikage Asakura, Jean-Luc Birbaum, Kurt Dietliker
  • Patent number: 6486225
    Abstract: A photocurable composition comprising (A) 100 parts by weight of a compound having an ethylenically unsaturated group, (B) from 0.001 to 5 parts by weight of a cationic dye having an absorption maximum wavelength in the wavelength region of from 400 to 1,200 nm represented by formula (1: D+·A1−  (1) wherein D+ represents a cation having an absorption maximum wavelength in the wavelength region of from 400 to 1,200 nm, and A1 31 represents an anion, and (C) from 0.
    Type: Grant
    Filed: November 17, 1999
    Date of Patent: November 26, 2002
    Assignee: Showa Denko Kabushiki Kaisha
    Inventors: Hirotoshi Kamata, Takeo Watanabe, Kazuhiko Ooga, Toshio Koshikawa
  • Patent number: 6486227
    Abstract: The present invention is directed to energy-efficient, photoinitiators having the general formula: wherein Z each independently represent wherein R1, R2, R3, R4, R5, R6, R7, R8 are as defined in claim 1, and wherein R9 represents (R10)2O or (R10)3N; wherein R10 represents H or an alkyl group having from one to eight carbon atoms; and wherein R11 represents H, an alkyl group having from one to eight carbon atoms, a benzyl group or an aralkyl group. The present invention is also directed to a method of generating a reactive species, methods of polymerizing polymerizable materials, methods of curing an unsaturated oligomer/monomer mixture, and methods of laminating using the photoinitiators of the present invention. In addition, the present invention is directed to ink compositions, adhesive compositions and resins, and methods of printing using the above-described photoinitiators.
    Type: Grant
    Filed: June 19, 2001
    Date of Patent: November 26, 2002
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Ronald Sinclair Nohr, John G. MacDonald
  • Publication number: 20020168494
    Abstract: The invention discloses a photopolymerizable composition comprising at least one, ethylenic unsaturated bond-containing compound, a hexaaryl-biimidazole compound, and an organoboron compound represented by a specific general formula; and discloses a photosensitive thermal recording material having a recording layer that contains the photopolymerizable composition. The photopolymerizable composition and the photosensitive thermal recording material of the invention are highly sensitive to UV rays and visible to IR rays falling within a wavelength range that includes wavelengths not longer than 450 nm, and are effective for decoloring a dye component that absorbs the rays falling within the wavelength range.
    Type: Application
    Filed: November 2, 2001
    Publication date: November 14, 2002
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Kozo Nagata, Shintaro Washizu
  • Patent number: 6423378
    Abstract: The invention concerns the use of cross-linkable silicone compositions for fast, economical and simple impregnation and/or varnishing of flat joints (e.g. cylinder head gaskets). More precisely it concerns the use of silicone compositions cross-linkable under UV radiation, by cationic process and in the presence of specific phoinitiators selected among onium borates or organometallic complexes, of which the borate counter-anions contain at least a boron bound to at least a substituted phenyl (Me, F). The silicone liquid precursor is a polydimethylsiloxane (PDMS) substituted by cross-linking functional groups, by cationic process (Gfp) under UV of the epoxy of vinyloxy type. These Gfp are present at the rate of 0.15 to 2.0 pr kg of PDMS. The invention also relates to the method for impregnating/varnishing flat joints (e.g. cylinder head gaskets) using the specific PDMS composition+photoinitiator of borate type as well as the treated joints and the composition themselves.
    Type: Grant
    Filed: August 30, 1999
    Date of Patent: July 23, 2002
    Assignee: Rhodia Chimie
    Inventors: Marie-Christine Cotting, GĂ©rard Joubert, Olivier Loubet
  • Patent number: 6398981
    Abstract: The present invention is concerned with photopolymer materials sensitive to infrared, near infrared, red and green light radiation for initiating polymerization and to applications of such photopolymer, like holographic polymer dispersed liquid crystal (H-PDLC) or reversible dye doped photopolymer (RDDP) materials, for making optical devices. The invention relates to holographic polymer dispersed liquid crystal and reversible dye materials having improved electrical and optical switching properties.
    Type: Grant
    Filed: February 14, 2000
    Date of Patent: June 4, 2002
    Assignee: Universite Laval
    Inventors: Tigran Galstian, Amir Tork
  • Patent number: 6387980
    Abstract: The invention provides dental composition system having curable liquid which is useful alone as a light curable composition and which is useful by mixing with a powder in preselected proportions to form dual cure compositions. The composition system is useful as bonding agent, cement, liner, base, restorative, pit and fissure sealants, and/or core build-up material, having improved adhesion to dentin. After storing the powder and the liquid in separate containers for at least two weeks and then mixing a portion of the powder and a portion of the liquid to form a mixture, the polymerizable compound polymerizes within 20 minutes of the mixing to form a first polymeric material having a flexural strength of at least 50 MPa, and an expansion in water at 37° C. after 90 days of less than 1 percent by volume.
    Type: Grant
    Filed: November 29, 2000
    Date of Patent: May 14, 2002
    Assignee: Dentsply Research & Development Corp.
    Inventors: Kewang Lu, Paul D. Hammesfahr
  • Patent number: 6376638
    Abstract: The present invention relates to a novel latent curing agent which is capable of controlling the initiation reaction stage and is curable by heat and/or UV-light, an epoxy resin composition containing it, and a mixed epoxy composition (blend) having different functional groups. Particularly, it has been found that the epoxy resin composition consisting of an aliphatic type epoxy (CAE) and/or a difunctional bisphenol A type epoxy (DGEBA) has excellent mechanical properties.
    Type: Grant
    Filed: October 28, 1999
    Date of Patent: April 23, 2002
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Jae-Rock Lee, Soo-Jin Park, Geun Ho Kwak
  • Patent number: 6362248
    Abstract: A photochromic polymerizable composition comprising (a) a polyfunctional (meth)acrylate monomer, (b) at least one kind of chromene compound selected from the group consisting of three kinds of chromene compounds represented by particular structural formulas, and (c) a compound having at least one or more epoxy groups in the molecules. The photochromic polymerizable composition offers a photochromic material that exhibits little initial color and excellent photochromism resistance suited for use as lenses for spectacles.
    Type: Grant
    Filed: September 24, 1999
    Date of Patent: March 26, 2002
    Assignee: Tokuyama Corporation
    Inventors: Tadashi Hara, Yuichiro Kawabata, Junji Momoda, Hironobu Nagoh
  • Patent number: 6358354
    Abstract: The invention provides an adhesive formulation for tacking and holding a nozzle plate in alignment on a semiconductor chip for an ink jet pen of an ink jet printer. The adhesive formulation includes a multifunctional epoxy material, a difunctional epoxy material, a fumed silica viscosity control agent, an imidazole-based thermal initiator and a mixed aryl sulfonium salt photoinitiator. Use of the adhesive formulation enables a nozzle plate to be assembled to a semiconductor chip with while substantially maintaining critical alignment between the nozzle plate and semiconductor chip.
    Type: Grant
    Filed: July 5, 2000
    Date of Patent: March 19, 2002
    Assignee: Lexmark International, Inc.
    Inventor: Girish Shivaji Patil
  • Publication number: 20020032249
    Abstract: A radiation curable composition contains an epoxy-functional silicone polymer, an iodonium photocatalyst and a non-fluorescing polycyclic aromatic compound containing at least one hydroxy, alkoxy or glycidyl ether substituent bonded to an aromatic carbon atom of the compound.
    Type: Application
    Filed: July 18, 2001
    Publication date: March 14, 2002
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Richard PAUL Eckberg, Kesheng Feng, Douglas Neckers
  • Patent number: 6335144
    Abstract: Disclosed is a photopolymerizable composition which comprises (i) a sensitizing dye represented by the following formula (I-1), (ii) a titanocene compound, and (iii) an addition polymerizable compound having at least one ethylenically unsaturated double bond: wherein A and B each represents —S—, NR3, or NR4; R3 and R4 each represents a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group; Y1 and Y2 each represents a non-metallic atomic group to form a basic nucleus of a dye together with the adjacent A or B, and the adjacent carbon atoms; R1 and R2 each represents a monovalent non-metallic atomic group, or they may be bonded to each other to form an aliphatic or aromatic ring.
    Type: Grant
    Filed: April 25, 2000
    Date of Patent: January 1, 2002
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasufumi Murota, Tadahiro Sorori
  • Patent number: RE37962
    Abstract: A photopolymerizable composition is disclosed, which comprises an addition-polymerizable compound having at least one ethylenically unsaturated double bond, a sensitizing dye represented by the following formula (I): wherein the all symbols are defined in the disclosure, and a titanocene compound.
    Type: Grant
    Filed: July 21, 2000
    Date of Patent: January 7, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Syunichi Kondo, Kazuo Fujita