Monomer Or Polymer Contains Initiating Group Patents (Class 522/904)

Cross-Reference Art Collections

Benzophenone group (Class 522/905)
  • Patent number: 4927865
    Abstract: Anthraquinones of formula I ##STR1## wherein X is the group --CR.sup.2 R.sup.3 --, where R.sup.2 is H, --CH or C.sub.1 -C.sub.5 -alkyl and R.sup.3 is H or --CN, R.sup.1 is H or C.sub.1 -C.sub.5 -alkyl and R is a direct bond or linear or branched C.sub.1 -C.sub.18 -alkylene which, alone or together with the --CR.sup.2 R.sup.3 -- group, can be interrupted by one or more --O-- when R.sup.2 and/or R.sup.3 are not --CN, and curable compositions comprising (a) an epoxy resin, (b) a hardener if necessary, (c) an anthraquinone of formula I and (d) an amino alcohol. The cured compositions are photosensitive and are suitable for the preparation of coatings and metallic images by electroless metal deposition.
    Type: Grant
    Filed: May 12, 1989
    Date of Patent: May 22, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Rudolf Duthaler, Jurgen Finter, Walter Fischer, Visvanathan Ramanathan
  • Patent number: 4921589
    Abstract: This invention relates to a photosensitizer which is bound to a polysiloxane polymer, a method of preparing the bound photosensitizer and a process for using the bound photosensitizer. The photosensitizers which may be used in the invention include rose bengal, rhodamine B, acridine orange, methylene blue and zinc phthalocyanine. The photosensitizer is attached to the polysiloxane by reacting a hydroxyl or vinyl group on the photosensitizer with a hydrogen on the polyhydrosiloxane, thereby binding the photosensitizer into the polymer network. Finally, the bound photosensitizer may be used to oxidize undesirable oxidizable compounds present in a hydrocarbon or aqueous fraction. One specific example is the sweetening of kerosene which involves oxidizing the mercaptans contained in the kerosene.
    Type: Grant
    Filed: December 20, 1988
    Date of Patent: May 1, 1990
    Assignee: Allied-Signal Inc.
    Inventors: Stephen F. Yates, Mary L. Good, Inara M. Brubaker
  • Patent number: 4915804
    Abstract: This invention relates to a photosensitizer which is bound to a titanate polymer, a method of preparing the bound photosensitizer and a process for using the bound photosensitizer. The photosensitizers which may be used in the invention include rose bengal, azure blue, rhodamine B, fluorescein and eosin. The photosensitizer is attached to the titanate by displacing a ligand on the titanate with a hydroxyl group on the photosensitizer. Finally, the bound photosensitizer may be used to oxidize undesirable oxidizable compounds present in a hydrocarbon or aqueous fraction. One specific example is the sweetening of kerosene which involves oxidizing the mercaptans contained in the kerosene to disulfides.
    Type: Grant
    Filed: December 20, 1988
    Date of Patent: April 10, 1990
    Assignee: Allied-Signal Inc.
    Inventors: Stephen F. Yates, Mary L. Good, Romulus Gaita
  • Patent number: 4914004
    Abstract: Radiation-curable two-layer systems containing immobilized photoinitiators are suitable for the production of coatings of constant thickness and good adhesion, and relief structures of high resolution and edge steepness.
    Type: Grant
    Filed: August 28, 1987
    Date of Patent: April 3, 1990
    Assignee: Merck Patent Gesellschaft Mit Beschrankter Haftung
    Inventors: Manfred Kohler, Eike Poetsch, Jorg Ohngemach, Dieter Dorsch, Rudolf Eidenschink, Gerhard Greber
  • Patent number: 4898806
    Abstract: A coated photosensitive material on a support comprising a layer of polyamic acids and polyamic acid aryl esters derived from tetracarboxylic acids or aminodicarboxylic acids containing a benzophenone structural unit and aromatic diamines which are substituted in both ortho-positions by at least one amino group. The material is autophotocrosslinkable and is suitable for producing protective coatings and photographic images, with corresponding polyimides being formed after irradiation by a thermal aftertreatment.
    Type: Grant
    Filed: January 23, 1989
    Date of Patent: February 6, 1990
    Assignee: Ciba-Geigy Corporation
    Inventor: Josef Pfeifer
  • Patent number: 4895788
    Abstract: This invention relates to a radiation polymerizable composition for use in a photographic element such as a lithographic printing plate comprising in admixture(a) a binder resin having the general formula-A-B-C-wherein a plurality of each of components A, B and C occur in ordered or random sequence in the resin and wherein A is present in said resin at about 5% to about 20% by weight and comprises groups of the formula ##STR1## B is present in said resin at about 4% to about 30% by weight and comprises groups of the formula ##STR2## and C is present in said resin at about 50% to about 91% by weight and comprises acetal groups consisting of groups of the formulae ##STR3## where R is lower alkyl or hydrogen, and wherein said group I is present in component C from about 75% to about 85%, group II is present in component C from about 3% to about 5%; and group III is present in component C from about 10% to about 22%;(b) a photoinitiator;(c) a photopolymerizable mixture of(1) a polyethoxylate diacrylate monomer; a
    Type: Grant
    Filed: May 26, 1988
    Date of Patent: January 23, 1990
    Assignee: Hoechst Celanese Corporation
    Inventors: John E. Walls, Frank C. Pagano
  • Patent number: 4877818
    Abstract: The invention is directed to a photosensitive polymer composition capable of being electrophoretically depositable as an adherent, uniform photosensitive film on a conductive surface. The photosensitive polymer composition useful for electrodeposition is formed from an aqueous solution or emulsion of at least one polymer having charged carrier groups, a photoinitiator and a source of unsaturation for crosslinking the resulting film upon exposure to actinic radiation. The photosensitive film formed from the photosensitive polymer composition is aqueous developable and resistant to strong inorganic acids and strong bases. The photosensitive polymer composition is useful in the preparation of printed circuit boards, lithographic printing plates, cathode ray tubes, as well as in chemical milling, solder resist and planarizing layer applications.
    Type: Grant
    Filed: January 11, 1988
    Date of Patent: October 31, 1989
    Assignee: Rohm and Haas Company
    Inventors: William D. Emmons, Mark R. Winkle
  • Patent number: 4839253
    Abstract: An electrodepositable photosensitive resin which is a phenolic novolak resin having(i) at least part of the phenolic hydroxyl groups thereof replaced by a quinone diazide sulphonyloxy group, and(ii) at least part of the aromatic rings thereof substituted in a position ortho and/or para to a phenolic hydroxyl group or quinone diazide sulphonyloxy group by a group of formula --CH(R.sup.1)R.sup.2 whereR.sup.1 represents a hydrogen atom, or an alkyl, aryl or carboxylic acid group, andR.sup.2 represents a sulphonic acid group --SO.sub.3 H or a group of formula --A--R.sup.3 --X,R.sup.3 represents an aliphatic, aromatic or araliphatic divalent group which may be substituted by a carboxlic, sulphonic or phosphonic acid group,A represents a sulphur atom or a group of formula --N(R.sup.4)--, where R.sup.4 represents a hydrogen atom or an alkyl group which may be substituted by a carboxylic acid group or by an optionally etherified hydroxyl group, or R.sup.3 and R.sup.
    Type: Grant
    Filed: August 28, 1987
    Date of Patent: June 13, 1989
    Assignee: Ciba-Geigy Corporation
    Inventors: Christopher G. Demmer, Edward Irving
  • Patent number: 4837126
    Abstract: The novel polymers disclosed have the formula: ##STR1## wherein R.sub.1 is R.sub.5 --(z).sub.p ; R.sub.5 is a terminal reactive group --O--; z is --isocyanate--O--; p is zero or 1, however p is zero when m is zero; P .sub.1 is an organic radical; m is zero or 1, however m is zero when n is 1; R.sub.2 is an organic radical; i is an integer from 2 to 6; P.sub.2 is an organic radical; r is zero or 1, however r is zero only when m is zero and n is zero; R.sub.3 is an organic radical; P.sub.4 is the residue from a polyhydroxy compound; n is zero or 1; R.sub.4 is --(v).sub.w --R.sub.6 ; v is --O--isocyanate; w is zero or 1, however, w is zero when m is zero; and R.sub.6 is --O-- terminal reactive group. The polymers are preferably made by first reacting a dianhydride with a polymer having terminal hydroxy groups and then reacting the reaction product with a hydroxy group terminated acrylate or methacrylate or a hydroxy group terminated hydrogen donor containing at least one heterogeneous atom such as O, N, or S.
    Type: Grant
    Filed: June 7, 1985
    Date of Patent: June 6, 1989
    Assignee: W. R. Grace & Co.
    Inventor: Wei Y. Lin
  • Patent number: 4820607
    Abstract: A photosolubilizable composition containing (a) a first compound capable of producing an acid by irradiation with actinic rays and (b) a high molecular weight compound, whose solubility in a developing solution is increased by the action of an acid, and a photosolubilizable composition containing (c) a high molecular weight compound whose solubility in a developing solution is increased by irradiation with actinic radiation, are disclosed. These compositions exhibit high photosensitivity, broad development latitude, and high stability with time.
    Type: Grant
    Filed: August 14, 1986
    Date of Patent: April 11, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiaki Aoai
  • Patent number: 4814233
    Abstract: A material to which there is applied a polyamic acid ester obtained from aromatic tri-or tetracarboxylic acids which contain benzophenone groups and organic diamines is suitable for producing protective coatings or relief images. After it has been irradiated, the material can be subjected to a heat treatment to convert the polyamic acid ester into the polyimide.
    Type: Grant
    Filed: June 29, 1987
    Date of Patent: March 21, 1989
    Assignee: Ciba-Geigy Corporation
    Inventor: Josef Pfeifer
  • Patent number: 4792506
    Abstract: This invention describes the preparation of some new Mannich polymers and copolymers and teaches their general use as photosensitizers for onium salts for use in the initiation of free radical polymerization of vinyl monomers. These Mannich polymers are unexpectedly more efficient as photosensitizers than are the non-polymeric photosensitizers.
    Type: Grant
    Filed: September 19, 1986
    Date of Patent: December 20, 1988
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Robert J. Devoe, Smarajit Mitra
  • Patent number: 4772538
    Abstract: This invention relates to a radiation polymerizable composition for use in a photographic element such as a lithographic printing plate comprising in admixture(a) a binder resin having the general formula--A--B--C--wherein a plurality of each of components A, B and C occur in ordered or random sequence in the resin and wherein A is present in said resin at about 5% to about 20% by weight and comprises groups of the formula ##STR1## B is present in said resin at about 4% to about 30% by weight and comprises groups of the formula ##STR2## and C is present in said resin at about 50% to about 91% by weight and comprises acetal groups consisting of groups of the formulae ##STR3## where R is lower alkyl or hydrogen, and wherein said group I is present in component C from about 75% to about 85%, group II is present in component C from about 3% to about 5%; and group III is present in component C from about 10% to about 22%;(b) a photoinitiator;(c) a photopolymerizable mixture of(1) a polyethoxylate diacrylate monome
    Type: Grant
    Filed: August 2, 1985
    Date of Patent: September 20, 1988
    Assignee: American Hoechst Corporation
    Inventors: John E. Walls, Frank C. Pagano
  • Patent number: 4761435
    Abstract: Ultraviolet-curable ethylenically unsaturated liquid coating composition are disclosed which consist essentially of:1--polyethylenically unsaturated material in which the ethylenically unsaturated groups are polymerizable groups which are not (meth)acrylate groups;2--a polyamine resin, preferably a polytertiary amine resin; and3--an aryl ketone photosensitizer.
    Type: Grant
    Filed: October 3, 1986
    Date of Patent: August 2, 1988
    Assignee: DeSoto, Inc.
    Inventors: Edward J. Murphy, Ronald S. Conti
  • Patent number: 4714669
    Abstract: Homo- and copolycondensates selected from the group consisting of linear saturated polyamides, polyesters and polyester amides derived from dicarboxylic acids of formula IV ##STR1## wherein Z is a direct bond, methylene, --O--, --S--, --SO--, --SO.sub.2 --, --CO--, --NH-- or alkylidene, R.sup.1 and R.sup.2 are independently alkyl, halogen, cyano, nitro, alkoxy, phenoxy or benzyl, and m and n are independently 0 to 3, are radiation-sensitive and are particularly suitable for the production of protective coatings and relief images.
    Type: Grant
    Filed: March 27, 1986
    Date of Patent: December 22, 1987
    Assignee: Ciba-Geigy Corporation
    Inventors: Josef Pfeifer, Rudolf Duthaler
  • Patent number: 4698295
    Abstract: Polyimides which essentially consist of 0.1 to 100 mol % of at least one structural element of the formula I ##STR1## and 99.9 to 0 mol % of at least one structural element of the fomula II and/or III ##STR2## in which and Z' are a tetravalent aromatic radical, Q' is a trivalent aromatic radical, X and X' are a divalent radical of an organic amine are autophotocrosslinkable. They are suitable for the production of protective films and photographic relief images.
    Type: Grant
    Filed: November 8, 1985
    Date of Patent: October 6, 1987
    Assignee: Ciba-Geigy Corporation
    Inventors: Josef Pfeifer, Rudolf Duthaler
  • Patent number: 4696890
    Abstract: A material to which there is applied a polyamic acid ester obtained from aromatic tri-or tetracarboxylic acids which contain benzophenone groups and organic diamines is suitable for producing protective coatings or relief images. After it has been irradiated, the material can be subjected to a heat treatment to convert the polyamic acid ester into the polyimide.
    Type: Grant
    Filed: March 28, 1986
    Date of Patent: September 29, 1987
    Assignee: Ciba-Geigy Corporation
    Inventor: Josef Pfeifer
  • Patent number: 4681923
    Abstract: An electrodepositable photosensitive modified phenolic novolak resin of general formula ##STR1## where Ar.sup.1 represents a divalent aromatic group linked through aromatic carbon atoms to the indicated groups --OR.sup.2 and --CH(R.sup.1)--,Ar.sup.2 represents a trivalent aromatic group linked through aromatic carbon atoms to the indicated groups --OR.sup.2 and --CH(R.sup.1)--,R.sup.1 represents a hydrogen atom or an alkyl, aryl or carboxyl group,R.sup.2 represents a hydrogen atom, an alkyl group which may be substituted by a hydroxyl or alkoxy group, or a group of formula --CO--R.sup.3 --COOH, --SO.sub.2 R.sup.4, --COR.sup.5 or --SO.sub.2 R.sup.5, at least 1% of the groups R.sup.2 representing a group --CO--R.sup.3 --COOH and at least 4% of the groups R.sup.2 representing a group --SO.sub.2 R.sup.4,R.sup.3 denotes a divalent aliphatic, cycloaliphatic, aromatic or araliphatic group,R.sup.4 denotes a 1,2-benzoquinone diazide group or 1,2-naphthoquinone diazide groupR.sup.
    Type: Grant
    Filed: February 21, 1986
    Date of Patent: July 21, 1987
    Assignee: Ciba-Geigy Corporation
    Inventors: Christopher G. Demmer, Edward Irving
  • Patent number: 4672079
    Abstract: A new class of polymeric or polymerizable aromatic-aliphatic ketones, the preferred of which are: 2-hydroxy-2-methyl(4-vinylpropiophenone), 2-hydroxy-2-methyl-p(1-methylvinyl)propiophenone, p-vinylbenzoylcyclohexanol, p-(1-methylvinyl)benzoyl-cyclohexanol and their oligomerization and polymerization products, they being suitable for use as photoinitiators for the photopolymerization of ethylenically unsaturated monomers and prepolymers.Said ketones are produced by subjecting an aromatic substrate, preferably a monomer or oligomer of styrene type, to the following reaction cycle: polymerization - acylation - alphachlorination - nucleophilic substitution with the formation of epoxyether - hydrolysis of the epoxyether; or to other reactions as modifications or alternatives to this cycle.The ketones according to the present invention have high efficiency as photoinitiators both with regard to the useful concentration to be used and with regard to the polymerization rate.
    Type: Grant
    Filed: April 5, 1985
    Date of Patent: June 9, 1987
    Assignees: Fratelli Lamberti S.p.A., Consiglio Nazionale Delle Ricerche
    Inventors: Giuseppe Li Bassi, Luciano Cadona, Carlo Nicora, Carlo Carlini
  • Patent number: 4666953
    Abstract: Polyorganosiloxanes having an average of more than two siloxane repeat units, at least one of which repeat units includes a photoinitiating group bound to the silicon atom thereof, the photoinitiating group having the formula ##STR1## where R.sup.1 and R.sup.2 are the same or different alkyl groups or R.sup.1 and R.sup.2 are alkylene groups linked to each other so that R.sup.1 and R.sup.2 together with the carbon atom to which both are attached comprise a cycloalkyl group, and R.sup.3 is H or hydrocarbyl.Compositions of these polyorganosiloxanes and silicones or organic monomers with free radical curable groups are readily cured by irradiation with UV light.
    Type: Grant
    Filed: March 28, 1985
    Date of Patent: May 19, 1987
    Assignee: Loctite Corporation
    Inventors: Philip Klemarczyk, Steven T. Nakos, Samuel Q. S. Lin
  • Patent number: 4657842
    Abstract: Photosensitive compositions of matter which are capable of undergoing condensation or addition reactions and may or may not be crosslinkable, and which contain an anthraquinone of the formula I ##STR1## in which X, X', R' and R" are as defined in patent claim 1 and X or X' is, for example, --OH or --NH.sub.2, at least one monomeric, oligomeric or polymeric compound which can be reacted with this anthraquinone, for example, if X is --OH, a polymer with terminal glycidyl groups, and, where relevant, a crosslinking agent and/or a salt of a metal of group Ib or VIII of the periodic table, are suitable for image formation by means of electroless metal deposition.
    Type: Grant
    Filed: November 4, 1985
    Date of Patent: April 14, 1987
    Assignee: Ciba-Geigy Corporation
    Inventors: Jurgen Finter, Walter Fischer, Friedrich Lohse
  • Patent number: 4657832
    Abstract: Coated material of a support, onto which is applied a radiation-sensitive coating of a homopolymer or copolymer with at least 5 mol %, based on the polymer, of structural units of the formula I ##STR1## in which R is a divalent aliphatic radical which can be interrupted by hetero-atoms or aromatic, heterocyclic or cycloaliphatic groups, a cycloaliphatic, heterocyclic or araliphatic radical, an aromatic radical in which two aryl nuclei are linked via an aliphatic group, or an aromatic radical which is substituted by at least one alkyl, cycloalkyl, alkoxy, alkoxyalkyl, alkylthio, alkylthioalkyl, hydroxyalkyl, hydroxyalkoxy, hydroxyalkylthio or aralkyl group or in which two adjacent C atoms of the aromatic radical are substituted by an alkylene group, R' independently has the same meaning as R and q is 0 or 1, and in which an aromatic radical R is not substituted by alkylene or by the abovementioned radicals if q is 0. The coating can be crosslinked directly by the effect of radiation.
    Type: Grant
    Filed: May 10, 1984
    Date of Patent: April 14, 1987
    Assignee: Ciba-Geigy Corporation
    Inventor: Josef Pfeifer
  • Patent number: 4622348
    Abstract: Products formed from chlorosulfonyl isocyanate either by sequentially reaction of a hydroxy functional compound followed by reaction of the sulfonyl chloride group with a primary or secondary amine, or by reaction of chlorosulfonyl isocyanate with an excess of primary or secondary amine, are cure accelerators for acrylic compositions. Depending on the choice of alcohol or amine, the accelerator may be functionalized so that it is bound or bindable to an organic or silicone polymer backbone or contains other desirable functionality such as peroxy, photosensitizer, or acrylic groups.
    Type: Grant
    Filed: November 27, 1984
    Date of Patent: November 11, 1986
    Assignee: Loctite Corporation
    Inventors: Anthony F. Jacobine, David M. Glaser
  • Patent number: 4587276
    Abstract: Novel polymeric photocleavable photoinitiators are prepared by the hydrosilation reaction of an organosilicon hydride grafting agent which has a photoinitiating aromatic-aliphatic ketone derivative of at least one organo group, with a polymer having a plurality of unsaturated olefinic or acetylenic sites in the presence of a hydrosilation catalyst. Preferred polymers are butadiene or alkyl substituted butadiene polymers and copolymers and vinyl functional polyorganosiloxanes. The grafting agents have the formula (hv)--R.sup.8 --R.sup.5 --H wherein (hv) is a photoinitiating aromatic-aliphatic ketone group, R.sup.8 is selected from alkylene, alkenylene, alkylenoxy and oxy groups, and R.sup.5 is selected from ##STR1## the R.sup.6 groups are the same or different organo or halo groups and n is an integer.
    Type: Grant
    Filed: August 31, 1983
    Date of Patent: May 6, 1986
    Assignee: Loctite Corporation
    Inventors: Qcheng S. Lien, Robert W. R. Humphreys
  • Patent number: 4585876
    Abstract: Novel xanthones and thioxanthones of the formula I ##STR1## in which A, X, Y, Z, E and E' are as defined in patent claim 1, are described. A is preferably --S-- and E and E' are preferably bonded in the ortho-position relative to one another. The compounds (I) are suitable, for example, as sensitizers for photocrosslinkable polymers or photocurable compositions, or for use in mixtures with polymers with H donor groups for image formation, in particular electrically conductive coatings and patterns, by means of electroless deposition of metals.
    Type: Grant
    Filed: November 14, 1983
    Date of Patent: April 29, 1986
    Assignee: Ciba-Geigy Corporation
    Inventors: Walter Fischer, Jurgen Finter, Hans Zweifel
  • Patent number: 4569953
    Abstract: Exposure to light or an energetic source of radiation of a mixture of a vinyl monomer or prepolymer with a photo-activatable polysilane results in the polymerization of the vinyl monomer or prepolymer.
    Type: Grant
    Filed: February 28, 1984
    Date of Patent: February 11, 1986
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Robert C. West, Andrew R. Wolff