Abstract: A nanoimprint lithography method includes the following steps. First, a first sacrifice layer, a second sacrifice layer and a nanoimprint resist are formed on a substrate. The nanoimprint resist includes a hyperbranched polyurethane oligomer, a perfluoropolyether; a methylmethacrylate, and a diluent solvent. Second, a master stamp with a first nanopattern formed by a number of projecting portions and gaps is provided, and the first nanopattern is pressed into the nanoimprint resist to form a second nanopattern in the nanoimprint resist. Third, the second nanopattern is transferred to the substrate.

Abstract: The present invention relates to composition comprising at least one compound obtained from the reaction of at least one compound (i) having a refractive index nD20 of at least 1.50 comprising at least one isocyanate-reactable functional group —XH, wherein each of X is, independently, O or NR, at least one polyisocyanate (ii), and, optionally, at least one compound (iii) comprising at least one isocyanate-reactable functional group —YH and at least one curable functional group Q, wherein each of Y is, independently, O, NR or S, and its use for making high refractive index coatings and films.

Abstract: Radiation-curable resins containing a carbonyl-hydrogenated ketone-aldehyde and/or a ring-hydrogenated phenyl-aldehyde resins, and a process for preparing them.

Abstract: The invention relates to a compound containing at least one unsaturated, radically or cationically polymerizable group and at least one carbamate terminal group or urea terminal group.

Abstract: Aqueous polymer composition suitable for coating which comprises the following components dispersed in water: (1) a combination of an acrylic polymer(s) A and an acrylic polymer(s) B where polymer(s) A has a Tg of not more than 30° C. and polymer(s) B has a Tg of at least 35° C., more preferably at least 45° C., which is at least 25° C. higher than the Tg of polymer(s) A, and wherein one or both of polymers A and B bear crosslinker functional groups capable of imparting ambient-temperature crosslinkability to component (1) in a coating formed from the composition via the formation of non-radically-formed covalent bonds; and (2) a self-dispersible, ionically stabilised polymer having olefinically unsaturated bond functionality capable of imparting radiation-curability (preferably uv-radiation curability) thereto in a coating formed from the composition.

Abstract: The present invention provides a photosensitive resin composition capable of forming an insulating film, which is superior in both a roughening property and an adhesiveness, and a via-hole, which is highly reliable in connection, and a multilayer printed circuit board. The present invention provides a photosensitive resin composition containing a first resin, which is an epoxy resin, and a second resin having a N-substituted carbamic acid ester atomic group and a radical polymeric unsaturated bond in its side chain. The second resin is desirably an oligomer having a repeating unit expressed by the following general formula (chem. 1) or (chem. 3) by 3-10 units. Where, X is H or CH3, Y and Z is H or an alkyl group of carbon number 1-4, n is 0 or 1, a part of R1 is an atomic group expressed by the following general formula (chem. 2), the residual R1 is a hydroxyl group, and R2 is an alkylene group of carbon number 1-4.

Abstract: Two-component polyurethane systems composed of an at least bifunctional polyisocyanate component and a polyol component have a polyol component which comprises at least one hydroxyl-containing cyclic acetal and/or ketal.

Abstract: A hard polishing pad with a porous surface for use in chemical-mechanical planarization of semiconductor wafers. The polishing pad has a body with a planarizing surface upon which a slurry may be deposited, and a plurality of particles are suspended in the body. The body is made from a continuous phase matrix material, and the particles are made from a substantially incompressible material that is soluble in the slurry. As a wafer is planarized, the particles at the planarizing surface of the polishing pad dissolve in the slurry and create pores in the pad. Also, because the particles are substantially incompressible, they reinforce the pad to provide a hard, substantially incompressible pad.

Abstract: A photosensitive resin composition includes a urethane oligomer prepared from a hydroxy-functionalized acrylate and/or methacrylate, at least one diol, and 2,4-toluene diisocyanate and 2,6-toluene diisocyanate in a 65:35 weight ratio. The resin composition additionally contains a monomer having at least one acrylate or methacrylate group, and a photoreactive initiator. The photosensitive resin composition may be cured to provide a soft photopolymer printing plate, particularly well suited for printing on corrugated bard.

Abstract: A liquid composition which on exposure to actinic radiation polymerizes to form a heat-curable solid film adhesive, said composition comprising (A) a heat-curable phenol-aldehyde resol resin, (B) a photopolymerizable polyurethane or polyester having, on average, more than one polymerizable acrylic group per molecule, or a mixture of said polyurethane and said polyester, (C) a photopolymerization initiator for (B) and (D) a polyvinylacetal.

Abstract: A liquid composition which on exposure to actinic radiation polymerises to form a heat-curable solid film adhesive, said composition comprising (A) a heat-curable phenol-aldehyde resol resin, (B) a photopolymerisable resin having, on average, more than one polymerisable acrylic group per molecule, (C) a photopolymerisation initiator for (B) and (D) an aminotriazine-formaldehyde resin.

Abstract: An adhesive composition comprising a first liquid containing (A) an acrylic compound selected from the group consisting of (meth)acrylic acids and esters thereof, and (B) a polymerization initiator selected from the group consisting of peroxy esters and hydroperoxides, and a second liquid containing (C) a condensation product of an amine and an aldehyde, and (D) a copper salt, wherein an acid phosphate compound of the following formula (I): ##STR1## wherein R is an alkyl group, an alkoxyalkyl group or a CH.sub.2 .dbd.CR.sub.1 --CO(OR.sub.2).sub.m -- group, wherein R.sub.1 is H or CH.sub.3, R.sub.2 is --C.sub.2 H.sub.4 --, --C.sub.3 H.sub.6 --, ##STR2## --C.sub.4 H.sub.8 --, --C.sub.6 H.sub.12 -- or ##STR3## and m is an integer of from 1 to 10; and n is 1 or 2, is contained in the first liquid or in both the first and second liquids.

Abstract: An alkaline-solution-developable liquid image-producing composition useful as a permanent protective layer for printed circuit boards is disclosed comprising at least: (1) an acrylic copolymer with hyroxy group, carboxyl group and branched unsaturated carbon double bond. Its number average molecular weight is 3,000 to 10,000 and its acid value is at least 30 mg KOH/g; (2) a photo reactive monomer with hydroxy group, the number of the unsaturated carbon double bond functional groups should be not less than 2; (3) a melamine compound; and (4) a free radical photo initiator.

Abstract: The invention provides a radiation-curable liquid resin for use as a secondary coating of lightwave guides which is a reaction product of (meth)acrylic acid or -acid chloride or isocyanatoalkyl-(meth)acrylate with a 1:2 addition compound of a diepoxide with a mean molecular weight.ltoreq.1000 and a short-chain .alpha.,.omega. -diol with a mean molecular weight.ltoreq.700 or with a 1:2 addition compound of a diepoxide with a mean molecular weight.ltoreq.400 and a monovalent aliphatic alcohol with a mean molecular weight.ltoreq.200, where the diepoxide is an aliphatic-aromatic or aromatic diglycidylether, an aliphatic or cycloaliphatic diepoxide or a silicon-organodiepoxide, and where the short-chain .alpha.,.omega. -diol is an .alpha..omega. -hydroxy-terminated polyoxyalkylene, an .alpha.,.omega. -hydroxy-terminated polyester, an .alpha.,.omega. -hydroxy-terminated polybutadiene, an .alpha.,.omega. -hydroxyterminated organo-functional polysiloxane or an .alpha.,.omega. -alkanediol with a mean molecular weight.

Abstract: A high speed visible light sensitive photopolymerizable composition useful for printing plates comprising(a) at least one free radically polymerizable monomer having at least one ethylenically unsaturated group,(b) an ethylenically unsaturated free radically polymerizable oligomer having carboxyl groups substituted thereon,(c) a visible light sensitizing initiator system for free radical polymerization comprising an initiator selected from diaryl iodonium salts, halogenated triazines, and triaryl iodonium salts which are photoinitiating electron acceptor compounds having a reduction potential in the range 0.0 to -1.5 eV, spectrally sensititzed with at least one merocyanine sensitizer containing a constrained alkylamino group, preferably a julolidinyl group.

Abstract: Disclosed herein are novel diesters of (meth)acrylic acid represented by the following formula: ##STR1## wherein the mean values of m and n are respectively 0 to 5, preferably 0 to 3, the mean value of m+n is 1 to 10, preferably 1 to 6, and R represents H or CH.sub.3.Also, disclosed herein are resin compositions comprising said diester(s) of (meth)acrylic acid, polyurethane (meth)acrylate(s), monoethylenically unsaturated monomer(s) and initiator(s) of photopolymerization as an optional component.

Abstract: Photopolymerizable compositions containing thermally-softenable, developer resistive polymeric binders are particularly useful in image transfer systems and processes.

Abstract: A radiation curable adhesive composition comprising a liquid oligomer, a chain transfer agent, and an N-methyl compound can give a surface protective film which is slightly influenced in adhesive strength with the lapse of time, and excellent in weather resistance and heat resistance.

Abstract: Compositions of the invention comprise a radiation sensitive compound having ethylenic unsaturation and at least one moiety selected from the group consisting of a urea moiety, a urethane moiety and mixtures thereof, a radiation insensitive compound having a number average molecular weight of at least about 400 comprising at least about 40 percent, by weight, based on the weight of the radiation insensitive compound, of aromatic ring moieties and having a hydroxyl equivalent weight of between about 200 and 1500 and a crosslinking agent reactive with the hydroxyl groups present in said radiation insensitive compound, said crosslinking agent being selected from the group consisting of an aminoplast resin, a blocked isocyanate and mixtures thereof. The composition is capable of being cured using heat and either ultraviolet light or ionizing radiation. A process for applying and curing the composition of the invention on a substrate is also disclosed.

Abstract: Michler's ketone analogs and salts thereof, which are photosensitizers in water-soluble photoinitiator systems used to induce polymerization in free-radically-curable, ethylenically-unsaturated materials, are disclosed. The Michler's ketone analogs have the formula: ##STR1## wherein each R is an alkyl group of 1 to 8 carbon atoms,R.sup.1 is an alkylene group having 1 to 8 carbon atoms,Z is R.sup.1 COOH or R.sup.1 H, andn is an integer having a value of 1 or 2.The photoinitiator systems are useful in imaging systems, and additionally contain a free radical initiator compound selected from iodonium salts, biimidazoles, trialkylphosphites, alkyl peroxides, benzyl halides, alkyl nitrates, and the benzophenones other than (a).