Polymer Derived From Aldehyde Monomer Patents (Class 525/328.7)
  • Patent number: 8461253
    Abstract: Disclosed are coating compositions that can be one-component, ambient curable, and waterborne. The coating compositions comprise acrylic copolymer resin particles comprising carbonyl functional groups and a crosslinking agent comprising functional groups, such as hydrazide groups, that are reactive with carbonyl groups.
    Type: Grant
    Filed: January 15, 2010
    Date of Patent: June 11, 2013
    Assignee: PPG Industries Ohio, Inc.
    Inventors: Ronald R. Ambrose, Mark S. Gaston, Brian K. Rearick, Irina G. Schwendeman, Venkateshwarlu Kalsani, Hongying Zhou, Michael J. Ziegler
  • Patent number: 8415424
    Abstract: An aromatic ring-containing polymer for an underlayer of a resist, including a unit structure represented by Chemical Formula 1:
    Type: Grant
    Filed: July 2, 2012
    Date of Patent: April 9, 2013
    Assignee: Cheil Industries, Inc.
    Inventors: Min-Soo Kim, Hwan-Sung Cheon, Sung-Wook Cho, Seung-Bae Oh, Jee-Yun Song
  • Publication number: 20120270994
    Abstract: An aromatic ring-containing polymer for an underlayer of a resist, including a unit structure represented by Chemical Formula 1:
    Type: Application
    Filed: July 2, 2012
    Publication date: October 25, 2012
    Inventors: Min-Soo KIM, Hwan-Sung CHEON, Sung-Wook CHO, Seung-Bae OH, Jee-Yun SONG
  • Publication number: 20120183810
    Abstract: The present invention provides a compound represented by the Formula I: Wherein substituents R16, R17 and R17? are each independently selected from an electron withdrawing group having a Hammett ?p value of from 0.05 to 0.85, provided that one of R16 and R17 is hydrogen.
    Type: Application
    Filed: October 5, 2011
    Publication date: July 19, 2012
    Applicant: TRANSITIONS OPTICAL, INC.
    Inventor: Anu Chopra
  • Patent number: 7956133
    Abstract: A gas-barrier material in which carboxyl groups are ionically crosslinked in an amount corresponding to an acid value of at least 330 mgKOH/g of a resin that has the carboxyl groups in an amount corresponding to an acid value of not smaller than 580 mgKOH/g. The gas-barrier material exhibits excellent gas-barrier property, retort resistance and flexibility under highly humid conditions, enables the film to be cured at a low temperature in a short period of time, and can be favorably produced.
    Type: Grant
    Filed: March 30, 2006
    Date of Patent: June 7, 2011
    Assignee: Toyo Seikan Kaisha, Ltd.
    Inventors: Aki Endo, Hiroshi Sasaki, Yusuke Obu
  • Patent number: 7897672
    Abstract: The problem to be solved is to provide a process for producing a polyoxymethylene copolymer in a molding machine with a reduced generation of formaldehyde gas. In a process for continuously producing a polyoxymethylene copolymer comprising a step of melt-kneading a crude polyoxymethylene copolymer at a temperature not lower than the melting point thereof, devolatilizing under reduced pressure the formaldehyde gas generated as a decomposition product, subsequently mixing a formaldehyde scavenger containing a hydrazide compound (A) while keeping the copolymer in a molten state and immediately pelletizing the mixture, a dispersed solution obtained by slurry-dispersing said (A) in a diluent (B) having a melting point lower than temperature (Ta) which is the lower of the melting point and the decomposition temperature of (A), within a temperature range not lower than the melting point of (B) and lower than (Ta) is used as the formaldehyde scavenger.
    Type: Grant
    Filed: April 10, 2006
    Date of Patent: March 1, 2011
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Satoshi Nagai, Akira Okamura, Daisuke Sunaga
  • Patent number: 7771920
    Abstract: A polymer for crosslinking an anti-reflective film has a high refractive index. An anti-reflective composition containing the polymer for crosslinking is useful in an immersion lithography process using ArF (193 nm) of a semiconductor device manufacturing process.
    Type: Grant
    Filed: June 5, 2008
    Date of Patent: August 10, 2010
    Assignee: Hynix Semiconductor Inc.
    Inventor: Jae Chang Jung
  • Patent number: 7767766
    Abstract: A method of manufacture of soluble, microbiologically active and stable acrolein polymer comprising: (a) polymerising acrolein in the presence of base to form a polymer of acrolein; (b) dissolving the polymer of acrolein in an alcohol selected from monoalcohols and polyols optionally with addition of water to form an alcohol solution of the polymer of acrolein; (c) heating the alcohol solution of the polymer of acrolein; and (d) mixing base with the polymer of acrolein.
    Type: Grant
    Filed: November 5, 2004
    Date of Patent: August 3, 2010
    Assignee: Chemeq Ltd.
    Inventor: Matthew Tilbrook
  • Patent number: 7759052
    Abstract: A polymer for crosslinking an anti-reflective film has a high refractive index. An anti-reflective composition containing the polymer is useful in a damascene process and an immersion lithography process using ArF (193 nm) of a semiconductor device manufacturing process.
    Type: Grant
    Filed: June 9, 2008
    Date of Patent: July 20, 2010
    Assignee: Hynix Semiconductor Inc.
    Inventors: Jae Chang Jung, Sung Koo Lee
  • Patent number: 7531297
    Abstract: Disclosed herein is an organic anti-reflective coating polymer suitable for use in ultrafine pattern formation during fabrication of a semiconductor device. The organic anti-reflective coating polymer has a weight-average molecular weight of about 2,000 to about 100,000 and is represented by Formula 1 below: wherein R1 is a C1-C5 linear or branched alkyl group, R2 and R3 are each independently hydrogen or methyl, X is halogen, n is a number from 1 to 5, and a, b and c, representing the mole fraction of each monomer, are each independently from about 0.1 to about 0.9. Also disclosed are an organic anti-reflective coating composition comprising the coating polymer and a method for forming a photoresist pattern with the coating composition.
    Type: Grant
    Filed: July 13, 2006
    Date of Patent: May 12, 2009
    Assignee: Hynix Semiconductor Inc.
    Inventor: Jae Chang Jung
  • Patent number: 7456117
    Abstract: The present invention is directed to ion triggerable, water-dispersible cationic polymers. The present invention is also directed to a method of making ion triggerable, water-dispersible cationic polymers and their applicability as binder compositions. The present invention is further directed to fiber-containing fabrics and webs comprising ion triggerable, water-dispersible binder compositions and their applicability in water-dispersible personal care products, such as wet wipes.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: November 25, 2008
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Kelly D. Branham, W. Clayton Bunyard, Frederick J. Lang, Kevin Possell, Michael R. Lostocco
  • Patent number: 7358304
    Abstract: The invention relates to high-molecular, crosslinked polyvinyl butyrals, obtainable by (self-) crosslinking polyvinyl butyrals that contain coacetalated, acid-functionalized aldehydes. The invention also relates to a method for producing the same and to the use thereof.
    Type: Grant
    Filed: August 31, 2002
    Date of Patent: April 15, 2008
    Assignee: Kuraray Europe GmbH
    Inventors: Bernd Papenfuhs, Martin Steuer, Simon Jonas
  • Patent number: 7205089
    Abstract: A cross-linking polymer for an organic anti-reflective coating that is able to improve the uniformity of an ultra-fine photoresist pattern formed using a photolithography process and an ArF light source with 194 nm wavelength. Organic anti-reflective coatings including the same and a method for forming a photoresist pattern using the same are also disclosed. The disclosed cross-linking polymer is capable of preventing scattered reflection from a bottom film layer, eliminating standing wave effect due to alteration of thickness of the photoresist film, and increasing uniformity of the thickness of photoresist pattern. At the same time, the disclosed cross-linking pattern increases the etching velocity of the organic anti-reflective coating so that it can be easily removed.
    Type: Grant
    Filed: November 15, 2004
    Date of Patent: April 17, 2007
    Assignee: Hynix Semiconductor Inc.
    Inventors: Jae-chang Jung, Cheol-Kyu Bok, Seung Chan Moon, Ki-Soo Shin
  • Patent number: 7157389
    Abstract: The present invention is directed to ion triggerable, water-dispersible cationic polymers. The present invention is also directed to a method of making ion triggerable, water-dispersible cationic polymers and their applicability as binder compositions. The present invention is further directed to fiber-containing fabrics and webs comprising ion triggerable, water-dispersible binder compositions and their applicability in water-dispersible personal care products, such as wet wipes.
    Type: Grant
    Filed: September 20, 2002
    Date of Patent: January 2, 2007
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Kelly D. Branham, W. Clayton Bunyard, Frederick J. Lang, Kevin Possell, Michael R. Lostocco
  • Patent number: 6835784
    Abstract: The present invention relates to high-molecular-weight, crosslinked polyvinyl butyrals obtainable by crosslinking a polyvinyl butyral with at least one di- and/or polycarboxylic acid or derivatives of these as crosslinking reagent, to a process for their production, and to their use.
    Type: Grant
    Filed: October 15, 2002
    Date of Patent: December 28, 2004
    Assignee: Kuraray Specialties Europe GmbH
    Inventor: Bernd Papenfuhs
  • Patent number: 6770720
    Abstract: Disclosed is an organic anti-reflective film composition suitable for use in submicrolithography, comprising a compound of Formula 13 and a compound of Formula 14. The organic anti-reflective film effectively absorbs the light penetrating through the photoresist film coated on top of the anti-reflective film, thereby greatly reducing the standing wave effect. Use of organic anti-reflective films of the present invention allows patterns to be formed in a well-defined, ultrafine configuration, providing a great contribution to the high integration of semiconductor devices. wherein b, c, R′, R″, R1, R2, R3, and R4 are those defined herein.
    Type: Grant
    Filed: December 4, 2002
    Date of Patent: August 3, 2004
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jae-chang Jung, Keun-kyu Kong, Min-ho Jung, Sung-eun Hong, Ki-ho Baik
  • Patent number: 6734275
    Abstract: The present invention relates to a method of gluing wood based materials by providing an adhesive system onto wood based materials followed by curing, the adhesive system comprises a urea based amino resin and a hardener composition, wherein the hardener composition comprises an acid and a phenolic resin. The invention also relates to an adhesive system and a hardener composition as well as wood based products obtained by the method or through the use of the adhesive system.
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: May 11, 2004
    Assignee: Akzo Nobel N.V.
    Inventors: Salme Pirhonen, Benyahia Nasli-Bakir, Ingvar Lindh
  • Publication number: 20030166788
    Abstract: The present invention relates to high-molecular-weight, crosslinked polyvinyl butyrals obtainable by crosslinking a polyvinyl butyral with at least one di- and/or polycarboxylic acid or derivatives of these as crosslinking reagent, to a process for their production, and to their use.
    Type: Application
    Filed: October 15, 2002
    Publication date: September 4, 2003
    Inventor: Bernd Papenfuhs
  • Publication number: 20030045645
    Abstract: The present invention is directed to triggerable, water-dispersible cationic polymers. The present invention is also directed to a method of making triggerable, water-dispersible cationic polymers and their applicability as binder compositions. The present invention is further directed to fiber-containing fabrics and webs comprising triggerable, water-dispersible binder compositions and their applicability in water-dispersible personal care products, such as wet wipes.
    Type: Application
    Filed: March 22, 2001
    Publication date: March 6, 2003
    Inventors: Yihua Chang, Frederick J. Lang, Franklin M. Chen, Kelly D. Branham, Kenneth Y. Wang, Kim G. Schick, Walter T. Schultz
  • Publication number: 20020137876
    Abstract: A process for producing amino resin particles includes: a reaction process for obtaining a reaction solution containing an amino resin precursor which is obtained by a reaction of an amino compound with formaldehyde, and having a viscosity in a range of from 2×10−2 Pa.s to 5.8×10−2 Pa.s at a temperature in a range of from 95° C. to 98° C.; an emulsion process for obtaining an emulsion by emulsifying the reaction solution; and a curing process for curing the amino resin precursor in the emulsion state by adding a catalyst to the emulsion. With this producing process, it is possible to readily produce amino resin particles with an essentially uniform particle size (narrow particle size distribution).
    Type: Application
    Filed: December 28, 2001
    Publication date: September 26, 2002
    Applicant: Nippon Shokubai Co., Ltd.
    Inventors: Yasuhiro Yamamoto, Shuji Shimizu, Masafumi Inoue, Hideki Oishi
  • Patent number: 6432861
    Abstract: In a process for reacting an organic compound in the presence of a catalyst comprising, as active metal, at least one metal of transition group VIII of the Periodic Table, either alone or together with at least one metal of transition group I or VII of the Periodic Table, in an amount of from 0.01 to 30% by weight, based on the total weight of the catalyst, applied to a support containing macropores, the support comprises, as a support component, boron(III) oxide in an amount of from 10 to 100% by weight, based on the total weight of the support.
    Type: Grant
    Filed: July 8, 1999
    Date of Patent: August 13, 2002
    Assignee: BASF Aktiengesellschaft
    Inventors: Boris Breitscheidel, Uwe Diehlmann, Alois Kindler, Jochem Henkelmann, Arnd Böttcher
  • Patent number: 6433100
    Abstract: The invention relates to a process for the preparation of polymers containing N→O terminal groups and to compositions comprising polymers obtained by this process. The process comprises polymerizing by atom transfer radical polymerization (ATRP) an aliphatic monomer of oligomer containing ethylene groups in the presence of a polymerization initiator.
    Type: Grant
    Filed: February 22, 2001
    Date of Patent: August 13, 2002
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Andreas Kramer, Andreas Mühlebach, François Rime
  • Patent number: 6288158
    Abstract: A process for modifying superabsorbent polymers is disclosed. The surface of a polymer containing hydrolyzed polyacrylonitrile in the form of particulates, is modified by crosslinking in a water/alcohol reaction mixture and in the presence of silica. The resulting product features improved absorbency under load and lesser degree of gel blocking.
    Type: Grant
    Filed: February 9, 1999
    Date of Patent: September 11, 2001
    Assignee: Bayer Aktiengesellschaft
    Inventors: Sergej Schapowalov, Günter Sackmann, Rolf-Volker Meyer, Siegfried Korte