Abstract: The invention pertains to a multilayer assembly comprising: (L1) a first inner layer [layer (L1)] made from a first composition [composition (C1)], said composition (C1) comprising: at least one polymer comprising recurring units derived from ethylene (E) and from chlorotrifluoroethylene (CTFE), and at least one Ti compound; and (L2) a second outer layer [layer (L2)] made from a second composition [composition (C2)], said composition (C2) being substantially free from TiO2-containing additives, said second composition comprising at least one semi-crystalline polymer comprising recurring units derived from ethylene and from at least one fluoromonomer selected from chlorotrifluoroethylene (CTFE), tetrafluoroethylene (TFE) and mixtures thereof, said semi-crystalline polymer having a heat of fusion of at least 35 J/g [polymer (A)].

Abstract: An aromatic vinyl copolymer can exhibit excellent heat resistance and/or transparency and is a copolymer of a monomer mixture, which includes: an exo-methylene butyrolactone compound represented by Formula 1; an aromatic vinyl compound; and a vinyl cyanide compound. wherein R1 and R2 are each independently hydrogen, C1 to C12 alkyl, or C6 to C12 aryl.

Abstract: Embodiments of the present disclosure illustrate systems and methods for the separation of carbon nanotubes (CNTs) in solution and continuously fabrication of functionalized carbon nanotubes (CNTs). In certain embodiments, the CNTs are isolated by sonication and chemical modification of the CNTs using functionalization reactions, including thermo-initiated or sono-initiated free radical polymerization and esterification. Beneficially, sonication facilitates mechanical separation of the CNTs, while the chemical modification of the CNTs results in more favorable interactions between the CNTs and their surrounding media which enables the separated CNTs to remain isolated. Embodiments of the isolated CNTs may also be employed into coating systems.

Abstract: The invention relates to solid polyester granules of the type used as matting agents in paints. In particular, the invention relates to a new redox initiating system for use in a suspension polymerization process that is used to manufacture the solid polyester granules, to a process for the preparation of the solid polyester granules, and to paint compositions containing the solid polyester granules.

Abstract: The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.

Abstract: An anchoring adhesive includes effective amounts of an isocyanurate compound and a vinyl ester compound that react and cure to form a composition having high compressive strength, high tensile strength and low shrinkage. The anchoring adhesive can be used to firmly bond anchor pins to boreholes in concrete, steel, wood, and other substrates.

Abstract: The invention relates to a process for the preparation of a copolymer by free radical mass polymerization of a maleic acid monoester derivative with vinyl ester in the presence of an acid having a pKa of less than 1.8. The copolymer is suitable as a dispersant for hydraulic binders.

Abstract: Disclosed are a maleimide-a-alkylstyrene-based, heat-resistant bulk tetrapolymer and a preparation process thereof. More specifically, disclosed are a bulk tetrapolymer, comprising 5-60 wt % of an N-substituted maleimide monomer, 10-70 wt % of an a-alkylstyrene monomer, 5-50 wt % of an unsaturated nitrile monomer and 3-50 wt % of an aromatic vinyl monomer, as well as a continuous bulk polymerization process for preparing the same. The disclosed bulk tetrapolymer has a weight-average molecular weight (Mw) of 70,000-300,000 and a glass transition temperature of 150-200 DEG C., shows excellent high-temperature thermal stability and heat resistance and a remarkably low melt viscosity, and thus is excellent not only in processability, but also in productivity, processability, moldability and blendability, when it is blended with other resins. Also, the continuous bulk polymerization process is equipped with a devolatilizer and enables the bulk tetrapolymer to be produced at low cost and high efficiency.

Abstract: Aqueous suspension comprising 35-45 wt % of solid diacyl peroxide particles having a d50 in the range 1-10 microns, 0.05-1 wt % of a dispersant, and not more than 1 wt % of an organic solvent. This concentrated peroxide suspension comprises only a minor amount of dispersant, has a low volatile organic content and is nonetheless stable for months and low in viscosity.

Abstract: The invention provides intermediates of the formula: as well as a method of their preparation by reacting a thiol having at least two hydroxyl groups with a mono-unsaturated organic compound in the presence of a base catalyst. A polymerizable urethane acrylate oligomer or urethane methacrylate oligomer is formed by reacting a polyisocyanate with the intermediate. The polymerizable urethane acrylate oligomer or urethane methacrylate is blended with a polymerization initiator to form a composition which is useful in such applications as adhesives.

Abstract: An anisotropic conductive film is provided which can provide high bonding strength and good conduction reliability when anisotropic conductive bonding is made under the compression bonding conditions of a compression bonding temperature of at most 130° C. for a compression bonding time of at most 3 seconds. The anisotropic conductive film contains a polymerizable acrylic compound, a film-forming rein, conductive particles, and a polymerization initiator. The polymerization initiator contains two types of organic peroxides that do not produce oxygen gas resulting from the decomposition thereof and have different one-minute half-life temperatures. Of the two types of organic peroxides, one organic peroxide that has a higher one-minute half-life temperature produces benzoic acid or a derivative thereof when it decomposes.

Abstract: The present invention discloses styrene-maleic anhydride copolymers preparations using solventless techniques. The solventless method resulted in reduced amounts of residues, such as unreacted styrene and/or maleic anhydride monomers, which makes the copolymers particularly suitable for bioapplications.

Abstract: The embodiments herein relate to a method of synthesizing new improved reactive terpolymer, S-MMA-X (styrene/modified maleic anhydride/X) wherein X is any type of polymers. The method involves synthesizing styrene-modified maleic anhydride complex (SMMA) with the ability to react with all kinds of polymers to produce new reactive terpolymer with formation of nano particles inside them. The nanoparticle formations improve the physio-chemical, thermal and mechanical properties of the newly formed reactive terpolymer when compared to natural rubber, their derivatives, EPDM or other known polymer etc. Depending on the property of the end product polymers produced by the invention, the end use can be varied. In one embodiment, the polymer X is natural rubber (NR) and the end product terpolymer is used as bitumen modifier. In another embodiment, the polymer X is ethylene-propylene diene monomer (EPDM) and the end product terpolymer behaves like a smart particle and absorbs oil and water contaminants.

Abstract: The present invention relates to a method of producing polymers by free-radical polymerization in solution, wherein the polymerization initiator used is an ethanol-soluble initiator, and the solution polymerization is carried out in an alcoholic solvent which comprises 5 to 50% by weight of water.

Abstract: An acrylic copolymer with high heat-resistance is provided. The acrylic copolymer includes repeat units of a monomer of Formula (1) and repeat units of a methacrylic monomer derivative: wherein x is 1-3 and y is 0-3. The acrylic copolymer possesses high heat-resistance and low water absorptivity. The invention also provides a method for preparing the acrylic copolymer.

Abstract: A method is disclosed for producing polyvinyl chloride which includes mixing a vinyl chloride solution with an initiator solution in at least one high shear mixing device comprising at least one rotor/stator set producing a rotor tip speed of at least 5.1 m/sec (1000 ft/min), to form a polymerization mixture; and allowing the mixture to polymerize by free radical polymerization to form polyvinyl chloride. The polymerization mixture may be subjected to free radical polymerization conditions comprising a temperature in the range of about 20° C. to about 230° C. In some embodiments, the high shear mixing device produces a shear rate of at least 20,000 s?1. A system for carrying out the method is also disclosed.

Abstract: The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.

Abstract: The present invention discloses styrene-maleic anhydride copolymers preparations using solventless techniques. The solventless method resulted in reduced amounts of residues, such as unreacted styrene and/or maleic anhydride monomers, which makes the copolymers particularly suitable for bioapplications.

Abstract: The present invention relates to a polymerizable composition comprising a) at least one ethylenically unsaturated monomer and b) at least one hydroxylamine of high molecular weight, preferably a long chain alkyl substituted hydroxylamine. Further aspects of the present invention are a process for polymerizing ethylenically unsaturated monomers, and the use of high molecular weight hydroxylamines for controlled polymerization.

Abstract: The invention relates generally to solid polyester granules of the type used as matting agents in paints. In particular, the invention relates to a new redox initiating system for use in a suspension polymerisation process used to manufacture the solid polyester granules, to a process for the preparation of the solid polyester granules, and to paint compositions comprising solid polyester granules.

Abstract: An alcohol-soluble resin and a method for preparing the same, in which the content of vinyl acetate monomer in polymeric raw material is 50% to 90%. In addition, acrylic ester monomer and other reactive functional group-containing compounds have been mixed in the raw material to ensure the performance of resin for special requirements in application. Also provided are products produced by using the resin, such as alcohol-soluble ink, composite adhesive, lustering oil for printing, glazing lacquer for woodware, superficial decorating coatings for plastic materials, safeguard coatings of metal surface and hair colorant, as well as preparation methods.

Abstract: Monomers corresponding to the formula Z2C?CWX(CY2)nCN, in which X represents an atom of oxygen or another atom, Z and Y represent an atom of hydrogen or fluorine, W represents an atom of hydrogen or fluorine or a CF3 group and n is a natural integer between 0 and 10 inclusively. Because of the novel methods of copolymerization and crosslinking, these monomers make it possible to produce fluorosulphonated nitrile elastomers having very low glass transition temperatures (Tg).

Abstract: Compositions comprising a cross-linked isocyanurate homopolymer or other cross-linked triazine homopolymers in the form of a microbead that is porous or non-porous; methods of making; and methods of using the compositions are disclosed.

Abstract: A process for producing a polymer latex includes a step of mixing at least one kind of polymerizable monomer with water and a polymerization initiator to perform a polymerization, wherein the at least one kind of polymerizable monomer includes an acrylonitrile in an amount of 50 mass % or more based on a total amount of the at least one kind of polymerizable monomer.

Abstract: One-component heat-curable sealant composition for the protection of exposed dental surfaces, comprising (a) a polymerisable monomer and/or oligomer which has at least two polymerizable double bonds per molecule, and (b) an initiator system comprising benzoylperoxide in an amount of at least 2 wt.-% based on the total composition.

Abstract: The present invention relates generally to improvements of wear resistant cosmetic compositions. Specifically, this invention relates to a cosmetic composition containing particular copolymers with glass transition temperatures greater than 70° Celsius that demonstrate enhanced wear in combination with a smooth, non-tacky feel. Since most carrier solvents formulated into cosmetics are weak solvents with high boiling points and slow evaporation rates the applied films remain wet and tacky resulting in poor cosmetic performance. The polymers of the present invention overcomes this deficiency due to the high Tg associate with the polymer which yields an apparent faster dry time in the applied coating thus improving the cosmetic's film integrity.

Abstract: A novel polymer support for solid phase peptide synthesis comprising polystyrene backbone and propoxylate function of hexanedioldiacrylate crosslinks having optimum hydrophilic/hydrophobic balance and a process of preparation thereof.

Abstract: The invention relates to a suspension polymerization process for the preparation of styrene-containing (co)polymers, wherein the process comprises the steps of continuously or semi-continuously dosing an initiator to the reaction mixture, said initiator having a specified half-life at the temperature of the reaction mixture to which it is dosed. The invention further relates to styrene based (co)polymer obtainable by said process, and to the use of said styrene (co)polymer in a shaping process.

Abstract: A method of homogeneously polymerizing styrene comprising admixing an ethylenically unsaturated monomer and an initiation system that is soluble in the monomer. This system includes a metal; a peroxide, hydroperoxide or mixture thereof; and a reductant. Under appropriate reaction conditions, the cyclic oxidation and reduction of the metal produces free radicals which initiate homogeneous polymerization of the ethylenically unsaturated monomer. The invention beneficially enables relatively low temperature processing with inexpensive initiation.

Abstract: The present invention relates to a process for preparing novel, monodisperse ion exchangers having chelating functional groups, and their use for adsorbing metal compounds, in particular, heavy metal compounds and noble metal compounds, and also for extracting alkaline-earth metals from saline solutions from alkali metal chloride electrolysis.

Abstract: Polymer solid electrolytes with good film strength, high ionic conductivity and excellent processability are provided, comprising a resin composition for polymer solid electrolytes containing 0.5–5.0% by weight of a curable resin having a specific structure (A), a plasticizer and (B) an electrolyte (C).

Abstract: A process for producing organic peroxide initiators useful in the polymerization of ethylenically unsaturated monomers. The process for making the organic peroxides includes forming an aqueous emulsion of the organic peroxide. The organic peroxide is dispersed as small droplets of from 1 to 10 microns in size in the aqueous emulsion. The organic peroxide may be added to a polymerization reactor containing an ethylenically unsaturated monomer. The organic peroxide functions as a free radical initiator to polymerize the monomer. The organic peroxide may be substantially free of organic solvents and plasticizers. The resulting polymers are of high quality.

Abstract: The invention relates to polymer beads having a high content of diacyl peroxides. A prolongation of the pot life in reaction resins based on high-boiling methacrylate esters is achieved due to this high content of peroxides.

Abstract: The present invention provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such photoresist compositions. In particular, photoresist monomers of the present invention comprise a moiety of Formula 4: where R1, R2, R3 and R4 are those defined herein. Photoresist polymers of the present invention have a relatively high etching resistance, and therefore are useful in a thin resist process and a bilayer photoresist process. Moreover, photoresist polymers of the present invention have a high contrast ratio between an exposed region and a non-exposed region.

Abstract: Photoresist monomers of following Formula 1, photoresist polymers thereof, and photoresist compositions containing the same. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness to a wafer, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. In addition, the photoresist composition has low light absorbance at 157 nm wavelength, and thus is suitable for a photolithography process using ultraviolet light sources such as VUV (157 nm) in fabricating a minute circuit for a high integration semiconductor device. wherein, X1, X2, Y1, Y2, Y3, Y4, Y5, Y6, Y7, Y8, l and m are as defined in the specification of the invention.

Abstract: A polymer blend is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the polymer blend is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 nm, including wavelengths of 157 nm, 193 nm and 248 nm, and has improved sensitivity and resolution. Processes for preparing and using the polymer blend are also provided, as are lithographic photoresist compositions that contain the polymer blend.

Abstract: The invention relates to a method of forming carbon monoxide-containing polymers from multi-component syngas feeds and at least one vinyl comonomer. Feeds useful in the practice of the invention comprise ethylene in an amount ranging from about 5 to about 40 mole %, carbon monoxide is an amount ranging from about 1 to about 40 mole %, hydrogen in an amount ranging from about 4 to about 55 mole %, carbon dioxide in an amount ranging from about 3 to about 10 mole %, and methane in an amount ranging from about 4 to about 85 mole %. The feed may also include acetylene in an amount ranging up to about 10 mole %. The feed may contain at least one free radical-polymerizable vinyl comonomer, or a cofeed containing such a comonomer can be used.

Abstract: The present invention relates to a process for preparing novel, monodisperse ion exchangers having chelating functional groups, and their use for adsorbing metal compounds, in particular, heavy metal compounds and noble metal compounds, and also for extracting alkaline-earth metals from saline solutions from alkali metal chloride electrolysis.

Abstract: The invention relates to polymeric phosphinic acids and their salts of the formula (I) in which X is hydrogen or a 1/m metal of valency m, R1 and R2 are identical or different and are hydrogen, a carboxyl group, a carboxylic acid derivative, an unsubstituted or substituted alkyl group having 1 to 10 carbon atoms, phenyl, benzyl or alkyl-substituted aromatics, R3 and R4 are identical or different and are hydrogen or a vinyl group of the formula (VI) —CR1═CHR2  (VI) in which R1 and R2 have the abovementioned meaning, and {overscore (u)} is the average number of monomer units. The invention also relates to a process for the preparation of the abovementioned compounds and their use.

Abstract: Photoresist polymers, and photoresist compositions using the polymer are disclosed. More specifically, photoresist polymers containing maleimide represented by Formula 1. Photoresist compositions including the photoresist polymers have excellent etching resistance, heat resistance and adhesiveness, and development ability in aqueous tetramethylammonium hydroxide (TMAH) solution. As the compositions have low light absorbance at 193 nm and 157 nm wavelength, they are suitable for a process using ultraviolet light source such as VUV (157 nm). wherein, 1, R1, R2, R3, R, R′, R″, R″′, X, a and b are defined in the specification.

Abstract: An emulsion of a monomer having a radical polymerizable unsaturated bond, which is obtained by emulsifying the monomer in the presence of an emulsifier, and a mixed solution of a specific non-radical polymerizable organosilicon compound and a polymerization initiator, which is soluble in the non-radical polymerizable organosilicon compound, are added to an aqueous medium, followed by emulsion polymerization, hydrolysis, and condensation, to produce a waterborne resin emulsion and a waterborne coating which can form a coating film having superior durability such as water resistance, weathering resistance, or the like.

Abstract: Photoresist monomers, photoresist polymers prepared therefrom, and photoresist compositions using the polymers are disclosed. More specifically, photoresist polymers comprising a photoresist monomer containing fluorine-substituted benzylcarboxylate represented by Formula 1, and a composition comprising the polymer are disclosed. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and can be developed in aqueous tetramethylammonium hydroxide (TMAH) solution. And, the present photoresist composition is suitable to form a fine pattern using deep ultraviolet light source such as VUV (157 nm), since the composition has low light absorbance at 193 nm and 157 nm wavelength. wherein, X1, X2, R1, l and m are defined in the specification.

Abstract: The present invention relates to a process for preparing novel, monodisperse ion exchangers having chelating functional groups, and their use for adsorbing metal compounds, in particular, heavy metal compounds and noble metal compounds, and also for extracting alkaline-earth metals from saline solutions from alkali metal chloride electrolysis.

Abstract: The present invention provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such photoresist compositions.

Abstract: Photoresist monomers of following Formula 1, photoresist polymers thereof, and photoresist compositions using the same. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. In addition, the photoresist composition has low light absorbance at the wavelength of 193 nm, 157 nm and 13 nm, and thus is suitable for a photolithography process using ultraviolet light sources such as VUV (157 nm) and EUV (13 nm) in fabricating a minute circuit for a high integration semiconductor device. wherein, R1, R2, R3, Y, W, m and n are as defined in the specification.

Abstract: Compounds corresponding to formula (I)

Abstract: A non-aqueous, heterogeneous polymerization process comprises heating a reaction mixture of about 5-70%, preferably 10-50%, by weight, of a vinyl amide monomer in an oil as solvent, and a water-soluble cosolvent, and a free radical initiator, optionally in the presence of a crosslinking agent and/or a surfactant, wherein the oil solvent is present in an amount sufficient to keep the resultant polymer in a stirrable state throughout the polymerization. The polymer reaction product is capable of forming a uniform emulsion or gel upon addition of water thereto.

Abstract: The invention relates to a method of forming carbon monoxide-containing polymers from multi-component syngas feeds and at least one vinyl comonomer. Feeds useful in the practice of the invention comprise ethylene in an amount ranging from about 5 to about 40 mole %, carbon monoxide is an amount ranging from about 1 to about 40 mole %, hydrogen in an amount ranging from about 4 to about 55 mole %, carbon dioxide in an amount ranging from about 3 to about 10 mole %, and methane in an amount ranging from about 4 to about 85 mole %. The feed may also include acetylene in an amount ranging up to about 10 mole %. The feed may contain at least one free radical-polymerizable vinyl comonomer, or a cofeed containing such a comonomer can be used.

Abstract: Polymerization process of unsaturated pefluoromonomers, fluoro-containing monomers and optionally in the presence of hydrogen containing olefins, for obtaining polymers contaning hydrogen and fluorine, which utilizes a microemulsion comprising the following components: (a) water; (b) a fluoropolyoxyalkylene having hydrogen-containing end groups and/or hydrogen-containing repeating units; (c) a fluorine-free organic radicalic initiator for the polymerization of fluoro-containing monomers, soluble in component (B); (d) a fluoro-containing surfactant.

Abstract: The invention provides a process for the living free radical addition polymerization of one or more ethylenically unsaturated monomers using at least one free-radical polymerization initiator and in the presence of one or more stable N-oxyl radicals, wherein at least one stable N-oxyl radical has polymerizable double bonds. The invention additionally provides polymers obtainable by this process, having a polydispersity index PDI of from 1.0 to 1.8, and provides for the use of stable N-oxyl radicals having polymerizable double bonds in the living free radical addition polymerization of one or more different ethylenically unsaturated monomers.