Sulfur-containing Ring Contains Additional Hetero Atom, I.e., N, O, Se, Te Patents (Class 526/257)
  • Patent number: 11692064
    Abstract: A conjugated azopolymer and methods for making same. The azopolymer includes a plurality of monomer units containing isoindigo with R1 and R2 substituent groups, wherein R1 can be one or more C1 to 30 hydrocarbons; and R2 can be H or F. The azopolymer can have a number average molecular weight (Mn) of 4 to 20 kDa; a weight average molecular weight (Mw) of 12 to 50 kDa; and a poly dispersity index (PDI) of 2 to 3. The polymer can further have selected maximal wavelengths (?max) of 481 to 709 nm and electrochemical reduction events of ?0.4 to ?1.0 V against an Ag/AgCl reference electrode.
    Type: Grant
    Filed: January 19, 2022
    Date of Patent: July 4, 2023
    Assignee: PURDUE RESEARCH FOUNDATION
    Inventors: Jianguo Mei, Christopher Uyeda, John Andjaba, Christopher Rybak
  • Patent number: 11614575
    Abstract: To suppress a phenomenon where an optical axis of the optically anisotropic layer is tilted when the optically anisotropic layer is produced by using a liquid crystalline compound showing smectic phase as a materials showing a higher level of orderliness. An optically anisotropic layer wherein a polymerizable composition, containing one or more polymerizable rod-like liquid crystal compound showing a smectic phase, is fixed in a state of smectic phase, and a direction of maximum refractive index of the optically anisotropic layer is inclined at 10° or smaller to the surface of the optically anisotropic layer, a method for manufacturing the same, a laminate and a method for manufacturing the same, a polarizing plate, a liquid crystal display device, and an organic EL display device.
    Type: Grant
    Filed: November 19, 2020
    Date of Patent: March 28, 2023
    Assignee: FUJIFILM Corporation
    Inventors: Ayako Muramatsu, Shinnosuke Sakai, Teruki Niori, Shinichi Morishima
  • Patent number: 11491472
    Abstract: Disclosed are a preparation method and application of a 4-methyl-5-vinylthiazolyl polymerized spherical ionic liquid catalyst. The method comprises: preparing a functional ionic liquid monomer successfully by taking 4-methyl-5-vinylthiazole as the matrix, and preparing the polymerized spherical ionic liquid from the monomer. The catalyst combines the advantages of both ionic liquid and the polymer, and has the characteristics of large specific surface area, high catalytic activity, high mass transfer rate, good selectivity, high stability, easy recycling and separating, environmental friendliness, wide industrial application prospect, etc.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: November 8, 2022
    Assignee: FU ZHOU UNIVERSITY
    Inventors: Ting Qiu, Dongren Cai, Changshen Ye, Ling Li, Xiaoda Wang, Jinbei Yang, Zhixian Huang, Chen Yang, Hongxing Wang
  • Patent number: 11207417
    Abstract: A polymer-prostaglandin conjugate comprising: a polymer backbone comprising a plurality of moieties of formula (I): where: T represents a triazole moiety; Q is independently selected at each occurrence and may be present or absent and when present represents a linking group; R is selected from the group consisting of linear or branched hydrocarbon; D is selected from prostaglandins; and L is a group of formula (II) wherein R5 is selected from hydrogen and C1 to C6 alkyl; (R) indicates the end of the group bonded to the R group; and (D) indicates the end of the group attached to the group D.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: December 28, 2021
    Assignee: POLYACTIVA PTY LTD
    Inventors: Stephen Lonsdale Birkett, Andrew Craig Donohue, Asha Marina D'Souza, Sarah Man Yee Ng, Adrian Sulistio, Russell John Tait, David Valade, Alan Naylor, Jason Watling
  • Patent number: 11203716
    Abstract: Disclosed is a mixture containing polymerizable compounds having Formulas (III) and (IV) wherein Ar1 and Ar2 are divalent aromatic hydrocarbon or heteroaromatic ring group having D1 or D2 as a substituent; D1 and D2 are C1-C20 organic group having at least one aromatic ring selected from the group consisting of aromatic hydrocarbon ring and heteroaromatic ring; A11-A22 and B11-B22 are alicyclic or aromatic group which may have a substituent, Y11-Y22 and L11-L22 are single bond, —O—, —CO—, —CO—O—, —O—CO—, —NR21—CO—, —CO—NR22—, —O—CO—O—, —NR23—CO—O—, —O—CO—NR24— or —NR25—CO—NR26— where R21—R26 are hydrogen or C1-C6 alkyl group; R4—R9 are hydrogen, methyl group or chlorine; one of f and k is integer of 1 to 3 with the other being integer of 0 to 3; g, j, m and q are integer of 1 to 20; and h, i, n and p are 0 or 1.
    Type: Grant
    Filed: May 13, 2019
    Date of Patent: December 21, 2021
    Assignee: ZEON CORPORATION
    Inventors: Kei Sakamoto, Kumi Okuyama, Satoshi Kiriki
  • Patent number: 11193065
    Abstract: A liquid crystal composition is provided containing a polymerizable liquid crystal compound, the composition having high preservation stability when dissolved in a solvent and also having the ability to restrain the development of orientation defects of the liquid crystal compound. A method of producing such a liquid crystal composition is also provided with ease. The liquid crystal composition includes a first polymerizable liquid crystal compound having five or more ring structures on its principal chain and represented by the following formula (A) and a second polymerizable liquid crystal compound having five or more ring structures and represented by the following formula (B).
    Type: Grant
    Filed: April 20, 2017
    Date of Patent: December 7, 2021
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Daichi Fujimoto, Haruki Okawa, Shinnosuke Yoshioka, Tatsuaki Kasai
  • Patent number: 11152131
    Abstract: The present disclosure provides compositions including a conductive polymer; and a fiber material comprising one or more metals disposed thereon. The present disclosure further provides a component, such as a vehicle component, including a composition of the present disclosure disposed thereon. The present disclosure further provides methods for manufacturing a component including: contacting a metal coated fiber material with an oxidizing agent and a monomer to form a first composition comprising a metal coated fiber material and a conductive polymer; and contacting the first composition with a polymer matrix or resin to form a second composition.
    Type: Grant
    Filed: June 20, 2018
    Date of Patent: October 19, 2021
    Assignee: THE BOEING COMPANY
    Inventor: Patrick J. Kinlen
  • Patent number: 11111321
    Abstract: Various photocrosslinkable electrochromic polymers are disclosed. The polymers are suitable for an electrochromic layer of an electrochromic device. The polymers are formed with a two-step synthesis method that includes forming a polymer precursor with one or more chromophore blocks, and mixing the polymer precursor with photocrosslinkable monomer units to form the polymer.
    Type: Grant
    Filed: July 29, 2020
    Date of Patent: September 7, 2021
    Assignee: AMBILIGHT INC.
    Inventors: Liyan You, Jiazhi He, Jianguo Mei
  • Patent number: 11029600
    Abstract: A resist composition including a resin component having more than 30 mol % of a structural unit represented by formula (a0-1), and an acid generator represented by formula (b1) in which R01 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; Va01 represents an alkylene group; Ra01 represents an acid dissociable group; Rb01 represents an cyclic hydrocarbon group; Lb01 represents —O—C(?O)— or —C(?O)—O—; Yb01 represents a divalent linking group or a single bond; Vb01 represents a fluorinated alkylene group; Rb02 represents a fluorine atom or a hydrogen atom; provided that the total number of fluorine atoms contained in Vb01 and Rb02 is 2 or 3; and Mm+ represents an m-valent organic cation.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: June 8, 2021
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takehito Seo, Tomoyuki Hirano, Yuta Iwasawa, Yusuke Itagaki
  • Patent number: 10968189
    Abstract: The present invention provides a novel method for producing a 2-hydrazinobenzothiazole derivative. The present invention also provides a method for producing a compound by using the 2-hydrazinobenzothiazole derivative obtained by the production method, and a composition that contains the compound. The present invention also provides a polymerizable composition that is useful in producing film-shaped polymers and contains the compound obtained by the production method. The invention of the present application provides a method for producing a compound represented by general formula (I-C), the method including a step of reacting a compound represented by general formula (I-B) with a compound represented by general formula (I-A) in the presence of at least one compound selected from the group consisting of metal amides, metal hydrides, metal alkoxides, and organic alkali metals. A compound derived from the compound produced by the production method, and a composition that contains the compound are also provided.
    Type: Grant
    Filed: March 16, 2017
    Date of Patent: April 6, 2021
    Assignee: DIC CORPORATION
    Inventors: Masahiro Horiguchi, Junichi Mamiya
  • Patent number: 10927263
    Abstract: An object of the present invention is to provide a polymerizable composition with which a polymer having a high degree of hardness can be produced. Another object is to provide, for example, an optically anisotropic body, a phase retardation film, an optical compensation film, an antireflection film, a lens, and a lens sheet that are composed of the polymerizable composition and a liquid crystal display element, an organic light-emitting display element, a lighting element, an optical component, a coloring agent, a security marker, a laser emission member, a polarizing film, a coloring material, and a printed item that are produced using the polymerizable composition. The present invention provides a polymerizable composition including a polymerizable compound represented by General Formula (IA) which has a specific structure including a plurality of polymerizable groups.
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: February 23, 2021
    Assignee: DIC CORPORATION
    Inventors: Kouichi Endo, Yasuhiro Kuwana, Mika Takasaki
  • Patent number: 10669482
    Abstract: A liquid crystal composition including a polymerizable liquid crystal compound capable of expressing birefringence with reverse wavelength distribution and a surfactant containing a fluorine atom, a 1-octanol/water partition coefficient of the surfactant being less than 5.0.
    Type: Grant
    Filed: February 23, 2017
    Date of Patent: June 2, 2020
    Assignee: ZEON CORPORATION
    Inventors: Akira Ikeda, Shunpei Nakajima, Masaya Miyamura, Yuki Tamura
  • Patent number: 10597371
    Abstract: The present invention provides a polymerizable compound having high storage stability without causing crystal precipitation when added to a polymerizable composition. The present invention also provides a polymerizable composition containing the compound. When the filmy polymer produced through polymerization of the polymerizable composition is irradiated with UV light, it hardly discolors or peels from substrate. Further, the present invention provides a polymer produced through polymerization of the polymerizable composition and an optically anisotropic body using the polymer.
    Type: Grant
    Filed: February 16, 2016
    Date of Patent: March 24, 2020
    Assignee: DIC CORPORATION
    Inventors: Masahiro Horiguchi, Yutaka Kadomoto
  • Patent number: 10508072
    Abstract: The present disclosure provides a method for producing an acid halide solution that is useful as a production intermediate or the like that allows industrially advantageous production of a polymerizable liquid crystal compound. The method for producing an acid halide solution of the present disclosure includes a step ? of reacting a halogenating agent and a dicarboxylic acid compound in a water-immiscible organic solvent in the presence of a tetraalkylammonium salt to obtain a water-immiscible organic solvent solution including an acid halide, and a step ? of concentrating the obtained water-immiscible organic solvent solution.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: December 17, 2019
    Assignee: ZEON CORPORATION
    Inventors: Kumi Okuyama, Kei Sakamoto, Kanako Sanuki, Hiroki Iwaki
  • Patent number: 10428032
    Abstract: The present invention provides a compound represented by the general formula (I), and a polymerizable composition containing the compound. When the polymerizable composition containing the compound represented by the formula (I) is used to form a filmy product, the resulting filmy product exhibits less change over time in phase difference and reverse wavelength dispersion and when the filmy polymer is irradiated with UV light, peeling from a substrate is unlikely to be caused. Further, the invention provides a polymer obtained through polymerization of the polymerizable composition and an optically anisotropic body obtained using the polymer.
    Type: Grant
    Filed: August 25, 2016
    Date of Patent: October 1, 2019
    Assignee: DIC CORPORATION
    Inventors: Masahiro Horiguchi, Junichi Mamiya, Yoshio Aoki
  • Patent number: 10392343
    Abstract: The present invention is a polymerizable compound represented by a general formula (I), a polymerazable composition, a polymer, and an optically anisotropic product.
    Type: Grant
    Filed: February 9, 2015
    Date of Patent: August 27, 2019
    Assignee: ZEON CORPORATION
    Inventors: Kei Sakamoto, Kumi Okuyama
  • Patent number: 10351643
    Abstract: An object of the invention is to provide polymerizable compounds having excellent optical characteristics and suited as materials for optically anisotropic articles, compositions containing the polymerizable compounds, polymers obtained by polymerizing the polymerizable compounds, optically anisotropic articles formed of the polymers, and liquid crystal display devices including the optically anisotropic articles.
    Type: Grant
    Filed: November 27, 2014
    Date of Patent: July 16, 2019
    Assignee: DIC CORPORATION
    Inventors: Hiroshi Hasebe, Yoshio Aoki, Kunihiko Kotani, Akihiro Koiso, Hidetoshi Nakata
  • Patent number: 9908963
    Abstract: This invention relates to polymer particles, a process for their preparation, the use of these particles for the preparation of an electrophoretic device, electrophoretic displays comprising such particle, and new copolymer stabilizers.
    Type: Grant
    Filed: March 18, 2014
    Date of Patent: March 6, 2018
    Assignee: Mereck Patent GmbH
    Inventors: Louise D. Farrand, Claire Topping, Kate Belsey, Simon Holder
  • Patent number: 9902708
    Abstract: One embodiment of the present invention can provide an optical material composition that includes a cyclic compound that is represented by formula (1) and an episulfide that is represented by formula (2). Another embodiment of the present invention can provide an optical material production method that includes a step wherein, with respect to the total amount of the optical material composition, 0.0001-10 mass % of a polymerization catalyst is added to the optical material composition and the optical material composition is polymerization cured. (In formula (2), m is an integer from 0 to 4, and n is an integer from 0 to 2.
    Type: Grant
    Filed: March 1, 2016
    Date of Patent: February 27, 2018
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki Kariyazono, Takashi Aoki
  • Patent number: 9856333
    Abstract: The present invention relates to: a polymerizable compound (I), wherein Y1 to Y6 are a chemical single bond, —O—C(?O)—, —C(?O)—O— or the like, G1 and G2 are a divalent aliphatic group, Z1 and Z2 are an alkenyl group, Ax is a fused ring group represented by a formula (II), wherein X is —NR3—, an oxygen atom, a sulfur atom or the like, R3 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and D is a substituted or unsubstituted ring having 1 to 20 carbon atoms that includes at least one nitrogen atom, Ay is a hydrogen atom, an alkyl group, A1 is a trivalent aromatic group or the like, A2 and A3 are a divalent aromatic group having 6 to 30 carbon atoms or the like, and Q1 is a hydrogen atom, or an alkyl group having 1 to 6 carbon atoms.
    Type: Grant
    Filed: October 31, 2016
    Date of Patent: January 2, 2018
    Assignee: ZEON CORPORATION
    Inventors: Kei Sakamoto, Kumi Okuyama
  • Patent number: 9638849
    Abstract: An optical film of the present invention includes an optically anisotropic layer containing a compound represented by the following general formula (1) or an optically anisotropic layer formed by the curing of a polymerizable composition containing a compound represented by the following general formula (1):
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: May 2, 2017
    Assignee: FUJIFILM CORPORATION
    Inventors: Hiroshi Matsuyama, Shinichi Morishima, Yuki Nakazawa
  • Publication number: 20150147696
    Abstract: Provided is a method for producing a polymer compound that has very low contents of impurities such as metal components and exhibits excellent storage stability. The production method gives such a polymer compound. The polymer compound is incorporated into a photoresist resin composition. The method for producing a polymer compound includes the step of filtering a resin solution containing a polymer compound through a filter. The filter is approximately devoid of strongly acidic cation-exchange groups and develops a positive zeta potential. The polymer compound includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) includes at least one monomer units represented by Formulae (a1) to (a3). The monomer unit (b) contains a group capable of releasing a moiety thereof by the action of an acid to develop solubility in an alkali.
    Type: Application
    Filed: July 26, 2013
    Publication date: May 28, 2015
    Applicant: DAICEL CORPORATION
    Inventors: Akira Eguchi, Masamichi Nishimura
  • Publication number: 20150147697
    Abstract: A resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R5—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is an acid labile group, R5 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition is of dual-tone type in that an intermediate dose region of resist film is dissolved in a developer, but unexposed and over-exposed regions of resist film are insoluble.
    Type: Application
    Filed: November 25, 2014
    Publication date: May 28, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Publication number: 20150147698
    Abstract: A negative resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R4—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition exhibits a high resolution due to controlled acid diffusion and forms a resist film which is unsusceptible to swell in the developer and hence to pattern collapse.
    Type: Application
    Filed: November 25, 2014
    Publication date: May 28, 2015
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Publication number: 20150140497
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-0) shown below (wherein V11 represents an aliphatic cyclic group with or without a substituent; R1 represents a lactam-containing cyclic group or a sultam-containing cyclic group; Y1 represents an oxygen atom (—O—), an ester bond (—C(?O)—O—) or a single bond; and W2 represents a group formed by a polymerization reaction of a polymerizable group-containing group).
    Type: Application
    Filed: November 13, 2014
    Publication date: May 21, 2015
    Inventors: Masatoshi Arai, Yoshiyuki Utsumi
  • Publication number: 20150132698
    Abstract: A resin containing a structural unit derived from a compound represented by the formula (aa) wherein T, R1 and Z1 are defined in the specification.
    Type: Application
    Filed: January 23, 2015
    Publication date: May 14, 2015
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji ICHIKAWA, Yusuke FUJI, Satoshi YAMAGUCHI
  • Patent number: 9023964
    Abstract: The present invention relates to conjugated polymers. In various embodiments, the present invention provides a conjugated polymer including a repeating unit including a benzene ring conjugated with the polymer backbone, wherein the benzene ring is fused to two 5-membered rings, wherein each fused 5-membered ring includes N and at least one of O and S. In various embodiments, the present invention provides semiconductor devices including the polymer, and methods of making the polymer.
    Type: Grant
    Filed: March 12, 2014
    Date of Patent: May 5, 2015
    Assignee: Iowa State University Research Foundation, Inc.
    Inventors: Malika Jeffries-EL, Jeremy J. Intermann, Brian C. Tlach
  • Patent number: 9023581
    Abstract: A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).
    Type: Grant
    Filed: June 14, 2011
    Date of Patent: May 5, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd
    Inventors: Akiya Kawaue, Kazushige Dohtani, Yoshiyuki Utsumi, Jun Iwashita, Kenri Konno, Daiju Shiono, Daichi Takaki
  • Patent number: 9017918
    Abstract: A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.
    Type: Grant
    Filed: June 1, 2011
    Date of Patent: April 28, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Seiichiro Tachibana, Koji Hasegawa
  • Publication number: 20150099119
    Abstract: This invention relates to coloured polymer, a process for their preparation, electrophoretic fluids comprising such particles, and electrophoretic display devices comprising such fluids.
    Type: Application
    Filed: May 7, 2013
    Publication date: April 9, 2015
    Inventors: Louise Diane Farrand, Nils Greinert, Claire Topping, Jonathan Henry Wilson, Simon Biggs, Olivier Cayre, Simon Lawson, Alexandre Richez, Simone Stuart-Cole
  • Patent number: 9000111
    Abstract: An optical part comprising a thermoplastic resin having a recurring unit represented by the following formula (1): wherein R represents a hydrogen atom, an alkyl group, or an aryl group; G represents a divalent linking group; A represents an oxygen atom, a sulfur atom, or —N(R1)—; R1 represents a hydrogen atom, an alkyl group, or an aryl group; Q represents an atomic group of forming a hetero ring; and l indicates 0 or 1.
    Type: Grant
    Filed: August 28, 2009
    Date of Patent: April 7, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Ryo Suzuki, Rie Okutsu, Hiroaki Mochizuki, Tatsuhiko Obayashi
  • Publication number: 20150076418
    Abstract: The invention relates to novel conjugated polymers comprising in their backbone one or more divalent donor units, like for example benzo[1,2-b:4,5-b?]dithiophene-2,6-diyl (BDT), that are linked on both sides to an acceptor unit, to methods of preparing the polymers and educts or intermediates used in such preparation, to polymer blends, mixtures and formulations containing the polymers, to the use of the polymers, polymer blends, mixtures and formulations as semiconductors organic electronic (OE) devices, especially in organic photovoltaic (OPV) devices and organic photodetectors (OPD), and to OE, OPV and OPD devices comprising these polymers, polymer blends, mixtures or formulations.
    Type: Application
    Filed: February 15, 2013
    Publication date: March 19, 2015
    Applicant: MERCK PATENT GMBH
    Inventors: Nicolas Blouin, Amy Phillips, Lana Nanson, Steven Tierney, Toby Cull, Priti Tiwana, Stephane Berney, Miguel Carrasco-Orozco, Frank Egon Meyer
  • Publication number: 20150064626
    Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units of tert-butyl or tert-amyl-substituted hydroxyphenyl methacrylate and having a weight average molecular weight of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
    Type: Application
    Filed: July 14, 2014
    Publication date: March 5, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa
  • Publication number: 20150065670
    Abstract: Asymmetric bifunctional silyl (ABS) monomers comprising covalently linked pharmaceutical, chemical and biological agents are described. These agents can also be covalently bound via the silyl group to delivery vehicles for delivering the agents to desired targets or areas. Also described are delivery vehicles which contain ABS monomers comprising covalently linked agents and to vehicles that are covalently linked to the ABS monomers. The silyl modifications described herein can modify properties of the agents and vehicles, thereby providing desired solubility, stability, hydrophobicity and targeting.
    Type: Application
    Filed: September 10, 2014
    Publication date: March 5, 2015
    Inventors: Joseph M. DeSimone, Mathew Finniss, Mary Napier, Ashish Pandya, Matthew Parrott
  • Publication number: 20150065671
    Abstract: A compound represented by the formula (1). A polymer compound comprising the compound. An organic semiconductor material comprising the compound or the polymer compound. An organic semiconductor device comprising an organic layer comprising the organic semiconductor material. An organic transistor comprising a source electrode, a drain electrode, a gate electrode and an active layer, wherein the active layer comprises the organic semiconductor material.
    Type: Application
    Filed: April 16, 2013
    Publication date: March 5, 2015
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Hiroki Terai
  • Publication number: 20150034161
    Abstract: Organic molecule semi-conducting chromophores containing a halogen-substituted core structure are disclosed. Such compounds can be used in organic heterojunction devices, such as organic molecule solar cells and transistors.
    Type: Application
    Filed: February 19, 2013
    Publication date: February 5, 2015
    Inventors: Arnold B. Tamayo, Corey V. Hoven, Thomas K. Wood, Braden Smith
  • Publication number: 20150037733
    Abstract: Provided is an acrylic acid ester derivative which, when used as a constituent unit of a polymer which is included in a photoresist composition for a semiconductor, exhibits excellent lithography characteristics such as LWR and the like. Specifically, provided is an acrylic acid ester derivative represented by the following general formula (1). Furthermore, provided are an intermediate of the acrylic acid ester derivative and a process for producing the same; a polymer containing the acrylic acid ester derivative as a constituent unit; and a photoresist composition for a semiconductor containing the polymer. wherein, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, m, x, and y are as defined in the text of Description.
    Type: Application
    Filed: February 25, 2013
    Publication date: February 5, 2015
    Applicant: KURARAY CO., LTD.
    Inventors: Akinobu Takeda, Takashi Fukumoto, Osamu Nakayama
  • Patent number: 8940856
    Abstract: The present invention provides a heterocyclic compound of the following general formula (I): wherein X and Y are different from each other and represent a halogen atom selected from among a chlorine atom, bromine atom and iodine atom, or CF3SO3?, CH3SO3?, C6H5SO3? or CH3C6H4SO3?; R1 represents an optionally substituted monovalent aliphatic hydrocarbon group having two or more carbon atoms; one of A1 and A2 represents —S—, —O—, —Se— or Te—, while the other represents —N?, —P? or —Si(R2)?, wherein R2 represents a hydrogen atom, an optionally substituted monovalent hydrocarbon group, a halogen atom, an amino group or a carbonyl group; and one of two linkages each represented by a solid line and a dashed line is a single bond, while the other is a double bond.
    Type: Grant
    Filed: December 11, 2013
    Date of Patent: January 27, 2015
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kenta Tanaka, Hideyuki Higashimura, Kazuei Ohuchi, Akio Tanaka, Masato Ueda
  • Publication number: 20150017586
    Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of hydroxyanthraquinone or hydroxy-2,3-dihydro-1,4-anthracenedione methacrylate, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
    Type: Application
    Filed: July 3, 2014
    Publication date: January 15, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Publication number: 20140363772
    Abstract: A resist composition including a high-molecular weight compound having a constituent unit represented by general formula (a0-1), a constituent unit (a1) containing a group containing a monocyclic group or a chain group among acid decomposable groups whose polarity increases by action of acid, a constituent unit (a1?) containing a group containing a polycyclic group among acid decomposable groups whose polarity increases by the action of an acid, and a constituent unit (a2) containing a lactone-containing monocyclic group, with a proportion of the constituent unit (a1) being equal to a proportion of the constituent unit (a1?) or more; and a method for forming a resist pattern using the resist composition.
    Type: Application
    Filed: May 29, 2014
    Publication date: December 11, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Junichi Tsuchiya, Yuta Iwasawa
  • Publication number: 20140346400
    Abstract: A method for the synthesis and use of transparent bulk conjugated polymers prepared from liquid monomers via bulk polymerization. The liquid monomer contains pi-electron conjugated moieties and polymerizable moieties. The monomer solution may also have functionalizing additives such as a luminescence additive that includes organic dyes, luminescent molecules, fluorescent compounds, phosphorescent compounds, and luminescent quantum dots. The monomer solution may also have sensitizing additives such as high-energy photo sensitizing compounds, nanoparticles of compounds containing atoms with atomic numbers greater than 52 and neutron sensitizing additives. The monomer solution is polymerized by heating to an elevated temperature with or without addition of an initiator. Alternatively, the monomer is polymerized by photo-induced polymerization. A photoinitiator may be employed to initiate the photopolymerization. Scintillation materials with significant light yields are illustrated.
    Type: Application
    Filed: June 2, 2014
    Publication date: November 27, 2014
    Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Qibing Pei, Qi Chen
  • Publication number: 20140342390
    Abstract: There is provided a method for introducing a temperature-sensitive probe comprising a copolymer, which comprises a thermoresponsive unit and a fluorescent unit, into a cell, and the method using the copolymer further comprising a cationic unit as the temperature-sensitive probe, and the method comprising the step of mixing the copolymer with the cell in a solvent. The copolymer can be preferably used as a fluorescence temperature sensor which measures intracellular temperature since the copolymer has a cationic group and thus enters into a cell without using a special method.
    Type: Application
    Filed: May 20, 2014
    Publication date: November 20, 2014
    Applicants: THE UNIVERSITY OF TOKYO, KIRIN HOLDINGS KABUSHIKI KAISHA
    Inventors: Toshikazu TSUJI, Kumiko IKADO, Seiichi UCHIYAMA, Kyoko KAWAMOTO
  • Patent number: 8883954
    Abstract: A photovoltaic cell is provided that includes a first electrode, a second electrode, and a photoactive layer disposed between the first and second electrodes. The photoactive layer includes a photoactive polymer containing a first monomer repeat unit, which contains a moiety of formula (1): in which A and R are defined in the specification.
    Type: Grant
    Filed: October 9, 2013
    Date of Patent: November 11, 2014
    Assignee: Merck Patent GmbH
    Inventors: Paul Byrne, Li Wen, David P. Waller, Taizoon Canteenwala, Patrick Foyle, Edward Jackson
  • Patent number: 8877424
    Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: November 4, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masayoshi Sagehashi, Jun Hatakeyama, Koji Hasegawa, Kazuhiro Katayama
  • Patent number: 8877344
    Abstract: The present invention is directed to phenothiazine-based macromonomer compounds and methods of making the same.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: November 4, 2014
    Assignee: Bayer HealthCare LLC
    Inventors: Jiangfeng Fei, Henry Arndt, Steven Fowler
  • Publication number: 20140308614
    Abstract: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, PEB, and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition is based on a polymer comprising recurring units (a1) of formula (1) wherein R1 is H or CH3, R2 and R3 are H, F or a monovalent hydrocarbon group, R4 is H or a monovalent hydrocarbon group, R5 and R6 are a monovalent hydrocarbon group, X1 is a divalent hydrocarbon group, and k1=0 or 1. A fine hole or trench pattern can be formed therefrom.
    Type: Application
    Filed: March 14, 2014
    Publication date: October 16, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Koji Hasegawa, Masayoshi Sagehashi, Tomohiro Kobayashi, Kazuhiro Katayama
  • Patent number: 8859717
    Abstract: Nitrogen-containing fused ring compound having at least one structural unit selected from the group consisting of a structural unit represented by the formula (1-1) and a structural unit represented by the formula (1-2).
    Type: Grant
    Filed: March 3, 2011
    Date of Patent: October 14, 2014
    Assignees: Sumitomo Chemical Company, Limited, Osaka University
    Inventors: Yutaka Ie, Masashi Ueta, Yoshio Aso, Masato Ueda
  • Patent number: 8841410
    Abstract: It is an object of the present invention to provide a nitrogen-containing condensed ring compound, which can be used as an organic n-type semiconductor having an excellent electron transport property and which is also excellent in terms of solubility in an organic solvent. The nitrogen-containing condensed ring compound of the present invention has a structural unit represented by the following formula (1-1) or formula (1-2): wherein Ar1 represents an aromatic ring; one of Y1 and Y2 represents a single bond, and the other represents —C(R11)(R12)— or —C(?X1)—; one of Y3 and Y4 represents a single bond, and) the other represents —C(R21)(R22)— or —C(?X2)—, and one of Y1 to Y4 represents —C(R11)(R12)— or —C(R21)(R22)—; at least one of W1 and W2 represents —N?; and Z1 and Z2 each represent any one of the groups represented by the formula (i) to the formula (ix).
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: September 23, 2014
    Assignees: Sumitomo Chemical Company, Limited, Osaka University
    Inventors: Yoshio Aso, Yutaka Ie, Masashi Ueta, Masato Ueda
  • Publication number: 20140272727
    Abstract: A method of producing a copolymer, including copolymerizing a monomer (am0) containing a partial structure represented by formula (am0-1) shown below, a monomer (am1) containing an acid decomposable group which exhibits increased polarity by the action of acid and a monomer (am5) containing an —SO2— containing cyclic group in the presence of a nitrogen-containing compound (X) having a conjugated acid with an acid dissociation constant of less than 10 (in the formula, *0 to *4 each represents a valence bond).
    Type: Application
    Filed: March 12, 2014
    Publication date: September 18, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tomoyuki Hirano, Yoshiyuki Utsumi, Junichi Tsuchiya, Yoichi Hori
  • Patent number: 8835579
    Abstract: The present invention relates to a process for polymerizing (hetero)aromatic compounds under formation of aryl-aryl C—C couplings for preparing conjugated polymers with high molecular weight and high regioregularity, and to novel polymers obtainable by this process. The invention further relates to the use of the novel polymers as semiconductors or charge transport materials in optical, electrooptical or electronic devices including field effect transistors (FETs), thin film transistors (TFT), electroluminescent, photovoltaic and sensor devices.
    Type: Grant
    Filed: May 18, 2010
    Date of Patent: September 16, 2014
    Assignee: BASF SE
    Inventors: Pascal Hayoz, Mathias Dueggeli, Martin Elbs, Olivier Frederic Aebischer, Achim Lamatsch