Abstract: A scintillator system is disclosed for detecting incoming radiation. The system makes use of a scintillator structure having first and second dissimilar materials. The first dissimilar material emits a first color of light and the second dissimilar material emits a second color of light different from the first color of light. Either one, or both, of the first or second colors of light are emitted in response to receipt of the incoming radiation. A plurality of light detectors is disposed in proximity to the scintillator structure for detecting the first and second different colors of light and generating output signals in response thereto. A detector electronics subsystem is responsive to the output signals and provides an indication of colors emitted by the scintillator structure to infer at least one property of the incoming radiation.

Abstract: An ultrasonic transducer comprising a coupling element and a piezo element, wherein a metal disk is arranged between the coupling element and the piezo element, wherein the metal disk is connected with the piezo element or with the coupling element by means of an adhesive layer, characterized in that the adhesive layer is producible, at least in certain regions, by means of a photochemically curable adhesive.

Abstract: The present invention relates to substrates comprising a crosslinked network of covalently attached antimicrobial and/or antibiofouling polymers. The crosslinked network of antimicrobial and/or antibiofouling polymers acts highly efficiently against pathogens, e.g. bacteria and fungi. Both the antimicrobial and the antibiofouling cross-linked polymer networks are preferably better resistant to mechanical damage than simple surface-immobilized polymer monolayers. The antimicrobial and/or antibiofouling polymers of the crosslinked network are preferably obtained by ring opening metathesis polymerization (ROMP) and exhibit a molecular weight of preferably more than 30,000 or even 100,000 g mol?1. The crosslinked network of antimicrobial and/or antibiofouling polymers is preferably covalently attached to the surface of a substrate, e.g. an implant, a medical device, medical equipment or a (tissue-supporting) biomaterial, etc.

Abstract: Anaerobic curable compositions are provided, which comprise a (meth)acrylate component, at least a portion which comprises (meth)acrylate-functionalized isosorbide, and methods of their production and use.

Abstract: Compounds of formula III: and salts thereof are disclosed. Also disclosed are methods for preparing compounds of formula III, intermediates useful for preparing compounds of formula III and methods for preparing compounds and materials from compounds of formula III.

Abstract: For a polymer composition, a polymerizable aversive agent is chemically coupled to a substrate element. The chemical coupling is labile to saliva.

Abstract: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 each are H or a monovalent hydrocarbon group, X1 is a divalent hydrocarbon group, k1=0 or 1, and Z forms a 5 or 6-membered alicyclic ring. A resist composition comprising the polymer is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness during both alkaline development and organic solvent development.

Abstract: The invention at hand provides hydrolytically degradable ionic copolymers. These ionic copolymerizates are composed of one cyclic ketene acetal A, one anionic or cationic methacrylic acid derivative B, selected from 2-methyl-methacrylate, [2-(2-methyl-1-methylene-allyloxy)]ethanesulfonate, [2-(2-methyl-1-methylene-allyloxy)ethyl]phosphonate or a quaternary amine of the N,N-dimethylaminoethylmethacrylic acid (DMAEMA) and, optionally, a neutral methacrylic acid derivative C. The hydrolytically degradable anionic copolymers according to the present invention are produced by polymerizing the components A, B and C in the presence of a radical initiator under inert gas atmosphere and subsequent purification. All copolymers according to the present invention are hydrolytically degradable. Copolymers comprising a maximum of 40 mol-% of ester groups in the backbone are additionally biodegradable, wherein in the case of cationic copolymers a maximum of 20 mol-% of quaternized DMAEMA is allowed to be available.

Abstract: A resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R5—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is an acid labile group, R5 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition is of dual-tone type in that an intermediate dose region of resist film is dissolved in a developer, but unexposed and over-exposed regions of resist film are insoluble.

Abstract: Processes for forming propylene from methanol are disclosed. The processes involve converting methanol to a product mixture comprising ethylene and propylene, separating the ethylene from the propylene, dimerizing a first portion of the ethylene to form a product mixture comprising 1-butylene, isomerizing the 1-butylene to form a mixture of cis and trans 2-butylene, and performing olefin metathesis on a second portion of the ethylene and the mixture of cis and trans 2-butylene. In one embodiment, the methanol is produced by converting syngas to methanol, and in one aspect of this embodiment, the syngas, or a portion thereof, is produced from renewable feedstocks. In this aspect, renewable propylene is produced. The propylene can be polymerized to form polypropylene or co- or terpolymers thereof, and when the propylene is made from renewable resources, the resulting polymer is a renewable polymer.

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.

Abstract: A photoacid generator compound has the formula (1) wherein a, b, c, d, e, x, L1, L2, L3, L4, R1, R2, X, and Z? are defined herein. The photoacid generator compound exhibits good solubility in solvents typically used to formulate photoresist compositions and negative tone developers. Described herein are a photoresist composition including the photoacid generator compound, a coated substrate including the photoresist composition, and a device-forming method utilizing the photoresist composition.

Abstract: Asymmetric bifunctional silyl (ABS) monomers comprising covalently linked pharmaceutical, chemical and biological agents are described. These agents can also be covalently bound via the silyl group to delivery vehicles for delivering the agents to desired targets or areas. Also described are delivery vehicles which contain ABS monomers comprising covalently linked agents and to vehicles that are covalently linked to the ABS monomers. The silyl modifications described herein can modify properties of the agents and vehicles, thereby providing desired solubility, stability, hydrophobicity and targeting.

Abstract: The present invention relates to a polar group-containing olefin copolymer (A?) which is produced through polymerization using a transition metal catalyst, which has a weight-average molecular weight falling within a specific range and which contains a polar group-containing monomer within a specific range; a multinary polar olefin copolymer (A?) indispensably containing a polar monomer component that has a norbornene skeleton and a carboxyl group or an acid anhydride group and having three or more types of monomer units; and a resin composition (C) containing a specific amount of a polar group-containing olefin copolymer (A) and a specific amount of an olefin resin (B).

Abstract: For a polymer composition, a polymerizable aversive agent is chemically coupled to a substrate element. The chemical coupling is labile to saliva.

Abstract: There is disclosed a polymer having a repeating unit shown by the following general formula (1). There can be, in a photolithography using a high energy beam such as an ArF excimer laser beam and an EUV as a light source, (1) a polymer that gives a resist composition having an appropriate adhesion with a substrate and being capable of forming a pattern having excellent resolution, especially an excellent rectangular pattern profile, (2) a chemically amplified resist composition containing the said polymer, and (3) a patterning process using the said chemically amplified resist composition.

Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.

Abstract: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, PEB, and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition is based on a polymer comprising recurring units (a1) of formula (1) wherein R1 is H or CH3, R2 and R3 are H, F or a monovalent hydrocarbon group, R4 is H or a monovalent hydrocarbon group, R5 and R6 are a monovalent hydrocarbon group, X1 is a divalent hydrocarbon group, and k1=0 or 1. A fine hole or trench pattern can be formed therefrom.

Abstract: There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium salt; a chemically amplified resist composition using the said polymer as a base polymer; and a patterning process using the said chemically amplified resist composition.

Abstract: The present invention relates to a polymerizable composition useful as a liquid crystal device, a display, an optical member, a coloring agent, a security marking, and a laser light emitting member and a thin film obtained from the polymerizable composition. The present invention provides a polymerizable liquid crystal composition having excellent solubility into a solvent, exhibiting good adhesion to a base material, and being capable of realizing a thin film having low haze and no variations and, in addition, provides a thin film having excellent appearance by using the polymerizable liquid crystal composition. The polymerizable liquid crystal composition according to the present invention is used and, thereby, a composition and a thin film having low haze and no variations and, at the same time, having excellent adhesion to a base material can be obtained at a low cost.

Abstract: Anhydrosugar-based monomers prepared from isosorbide, isomannide, and isoidide and resin systems containing these anhydrosugar-based monomers that are partially to fully bio-based, which may produce materials having properties that meet or exceed the properties of similar petroleum derived vinyl ester resins.

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group.

Abstract: A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness. In formula (1), A is —(CR22)m—, B is —(CR52)n—, R2 and R5 are hydrogen or alkyl, m and n are 1 or 2, R3 is alkyl, alkenyl, alkynyl or aryl, R6 is alkyl, alkoxy, alkanoyl, alkoxycarbonyl, hydroxyl, nitro, aryl, halogen, or cyano, and p is 0 to 4.

Abstract: Polymerizable ester compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 is an acid labile group, Aa is a divalent hydrocarbon group which may be separated by —O— or —C(?O)—, and k1 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation ?500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent developed properties.

Abstract: To provide an alcohol compound containing fewer impurities at a high yield by conducting the following steps: a hydroboration process in which a reaction mixture is obtained by reacting in a solvent a compound represented by formula (C) and a boron agent selected from a group of diborane and borane complexes; and an oxidation process in which the pH of the reaction mixture is set at 0.5 to 4, which is conducted after treating the reaction mixture with hydrogen peroxide. In the formula, A1 to A6 are each independently a hydrogen atom, methyl group or ethyl group, and X is an oxygen atom, sulfur atom, methylene group or ethylene group.

Abstract: This invention discloses and claims a series of polycyclic monomers and polymers useful in the production of optical waveguides. The polymers of the invention comprise one or more repeating units represented by the formula (IV): Wherein m, X, R1 and R2 are as defined herein. The films formed from the polymers of this invention exhibit significant changes in refractive index (greater than or equal to 0.5%) after exposure to suitable actinic or thermal energy thereby having superior optical transmission performance, which is of importance for modern optical applications such as wave guiding and optical data storage.

Abstract: Described is a direct method for the fabrication of resorcinarene nanocapsules by photopolymerization of compounds of formula (I), such as resorcinarene tetraalkene tetrathiol (RTATT), in the absence of any template or preorganization. Further, by varying the polymerization media, a variety of other polymeric architectures like lattices, fibrous networks, and nanoparticles were obtained. The morphology and structure were characterized by transmission electron microscopy, energy dispersive spectroscopy, scanning electron microscopy, dynamic light scattering, infrared and nuclear magnetic resonance spectroscopy. These morphologically distinct resorcinarene polymeric architectures contain residual thiol and ene functional groups offering potential functionalization opportunities.

Abstract: The present invention relates an organic liquid composition comprising a mixture of a first polymer with a linear polymeric chain having two photoactive groups as endgroup; and a second polymer with a multifunctional polymeric chain having at least three photoactive groups, that can reversibly and repeatedly crosslink to form a solid polymer network wherein said liquid composition been crosslinked by irradiation with at least one wavelength L1 and been uncrosslinked at least locally by irradiating the network with at least one other wavelength L2 in order to repeatedly adjust shape and optical properties of said composition in its crosslinked state. The composition is applicable as a starting material for intraocular lenses and for other lenses and optical elements.

Abstract: A resist lower layer film-forming composition includes (A) a polymer that includes a cyclic carbonate structure. The polymer (A) includes a structural unit (I) shown by the following formula (1).

Abstract: A retardation film, formed by stretching a film having a norbornene-based ring-opening copolymer containing a structural unit (A) represented by the general formula (1) and a structural unit (B) represented by the general formula (2), wherein the content of structural unity (A) is not less than 5 mol % but not more than 95 mol % relative to the total amount of structural units (A) and (B).

Abstract: The present invention relates to substrates comprising covalently attached antimicrobial polymers, which act as synthetic mimics of antimicrobial peptides (SMAMPs) and are preferably obtained by ring opening metathesis polymerization (ROMP). The inventive antimicrobial polymers exhibit a molecular weight of more than 100,000 g mol?1 and are preferably covalently attached to the surface of a substrate, e.g. an implant, a medical device, medical equipment or a (tissue-supporting) biomaterial, etc. Covalent bonding may be carried out using a photoreactive crosslinker but also by “grafting onto” or “grafting from”. The present invention is also directed to uses of the inventive antimicrobial polymers as defined herein, e.g. for antimicrobially coating a surface of such a substrate with a layer of the inventive antimicrobial polymer.

Abstract: According to the present invention, a novel epoxy group-containing copolymer, including a production process thereof, and an epoxy (meth)acrylate copolymer starting from the epoxy group-containing copolymer, including a production process thereof are provided. The epoxy group-containing copolymer of the present invention contains a specific epoxy group-containing repeating unit and an olefin-based repeating unit. A novel epoxy (meth)acrylate copolymer of the present invention is produced by reacting the epoxy group-containing copolymer with (meth)acrylic acid.

Abstract: A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising ?-diketone, ?-ester-ketone, ?-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).

Abstract: A polymer is obtained from copolymerization of a recurring unit having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and a recurring unit having formula (1) wherein R1 is methyl, ethyl, propyl, methoxy, ethoxy or propoxy, R2 is H or CH3, and m is 1 to 4. The polymer is used as a base resin to formulate a resist composition, which is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure.

Abstract: The present application relates to an affinity material useful in antibody purification.

Abstract: There is provided an electroactive material having Formula I wherein: Q is the same or different at each occurrence and can be O, S, Se, Te, NR, SO, SO2, or SiR3; R is the same or different at each occurrence and can be hydrogen, alkyl, aryl, alkenyl, or alkynyl; R1 through R8 are the same or different and can be hydrogen, alkyl, aryl, halogen, hydroxyl, aryloxy, alkoxy, alkenyl, alkynyl, amino, alkylthio, phosphino, silyl, —COR, —COOR, —PO3R2, —OPO3R2, or CN.

Abstract: There is provided an electroactive material having Formula I wherein: Q is the same or different at each occurrence and can be O, S, Se, Te, NR, SO, SO2, or SiR3; R is the same or different at each occurrence and can be hydrogen, alkyl, aryl, alkenyl, or alkynyl; R1 through R8 are the same or different and can be hydrogen, alkyl, aryl, halogen, hydroxyl, aryloxy, alkoxy, alkenyl, alkynyl, amino, alkylthio, phosphino, silyl, —COR, —COOK, —PO3R2, —OPO3R2, or CN.

Abstract: According to the present invention, a novel epoxy group-containing copolymer, including a production process thereof, and an epoxy (meth)acrylate copolymer starting from the epoxy group-containing copolymer, including a production process thereof are provided. The epoxy group-containing copolymer of the present invention contains a specific epoxy group-containing repeating unit and an olefin-based repeating unit. A novel epoxy (meth)acrylate copolymer of the present invention is produced by reacting the epoxy group-containing copolymer with (meth)acrylic acid.

Abstract: A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.

Abstract: Asymmetric bifunctional silyl (ABS) monomers comprising covalently linked pharmaceutical, chemical and biological agents are described. These agents can also be covalently bound via the silyl group to delivery vehicles for delivering the agents to desired targets or areas. Also described are delivery vehicles which contain ABS monomers comprising covalently linked agents and to vehicles that are covalently linked to the ABS monomers. The silyl modifications described herein can modify properties of the agents and vehicles, thereby providing desired solubility, stability, hydrophobicity and targeting.

Abstract: The invention relates to an intraocular lens comprising at least one pharmaceutically-acceptable photochromic polymer that enables all or part of the intraocular lens to change colour reversibly when exposed to light.

Abstract: Described herein are compounds and processes that can be used to prepare polymer-based films, particles, gels and related compositions, and processes for delivery of agents, and other uses.

Abstract: The present invention provides a polymerizable tertiary ester compound represented by the following general formula (1a) or (1b). There is provided a polymerizable ester compound useful as a monomer for a base resin of a resist composition having a high resolution and a reduced pattern edge roughness in photolithography using a high-energy beam such as an ArF excimer laser light as a light source, especially in immersion lithography, a polymer containing a polymer of the ester compound, a resist composition containing the polymer as a base resin, and a patterning process using the resist composition.

Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.

Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.

Abstract: Disclosed are an acrylic monomer having a structure represented by formula (1), a polymer containing a repeating unit derived from the acrylic monomer, and a resist composition prepared by using the polymer, which exhibits excellent adhesiveness, storage stability, and enhanced line width roughness, exhibits excellent resolution in both C/H patterns and L/S patterns, has an excellent process window so that an excellent pattern profile can be obtained regardless of the type of the substrate, and exhibits improved contrast.

Abstract: There is provided an electroactive material having Formula I wherein: Q is the same or different at each occurrence and can be O, S, Se, Te, NR, SO, SO2, or SiR3; R is the same or different at each occurrence and can be hydrogen, alkyl, aryl, alkenyl, or alkynyl; R1 through R8 are the same or different and can be hydrogen, alkyl, aryl, halogen, hydroxyl, aryloxy, alkoxy, alkenyl, alkynyl, amino, alkylthio, phosphino, silyl, —COR, —COOR, —PO3R2, —OPO3R2, or CN.

Abstract: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer adapted to form a lactone ring under the action of an acid so that the polymer may reduce its solubility in an organic solvent developer, an acid generator, and an organic solvent displays a high dissolution contrast between the unexposed region of promoted dissolution and the exposed region of inhibited dissolution.

Abstract: An optically active compound having a polymerizable group which is represented by formula (1) or (2). P1-Q1-(A1-Z1)m—X1—(Z1-A1)m-Q1-P2??(1) P1-Q1-(A1-Z1)m—X2??(2) For example, A1 is independently divalent group having ring; Z1 is independently bonding group; m is independently an integer from 1 to 5; Q1 is independently alkylene having 1 to 20 carbons; X1 is a divalent group having chirality; X2 is a monovalent group having chirality, and P1 and P2 are polymerizable groups; and concerns a polymerizable liquid crystal composition, a polymer, an optical device and an article.

Abstract: A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1), (2) or (3) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a reduced acid diffusion rate, and forms a pattern with good profile, minimal edge roughness, and etch resistance. In formula (1), R1, R2, R5, R6, R8, and R9 are alkyl, aryl, or alkenyl, R3, R4, R7, R10, and R11 are hydrogen, alkyl, alkoxy, acyloxy, halogen, cyano, nitro, hydroxyl or trifluoromethyl, M is methylene or ethylene, R is a single bond or linking group.