Abstract: Provided are polymers and photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

Abstract: The invention relates to a polypeptide having oxidoreductase activity which comprises the amino acid sequence set out in SEQ ID NO: 3 or an amino acid sequence encoded by the nucleotide sequence of SEQ ID NO: 4, or a variant polypeptide thereof having 45% or more sequence identity with the sequence of SEQ ID NO: 3. The invention also relates to a process for the production of 2,5-furan-dicarboxylic acid (FDCA) or production of 5-hydroxymethyl-2-furancarboxylic acid (HMF acid).

Abstract: A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising ?-diketone, ?-ester-ketone, ?-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).

Abstract: A compound represented by formula (I): wherein T1 represents a single bond or a C6-C14 aromatic hydrocarbon group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L2 and L3 each independently represent a single bond or a C1-C6 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W1 and ring W2 each independently represent a C3-C36 hydrocarbon ring, R1 and R2 each independently represent a hydrogen atom, a hydroxyl group, or C1-C6 alkyl group, R3 and R4 each independently represent a hydroxyl group, or C1-C6 alkyl group, R5 represents a hydroxyl group or a methyl group, m represents 0 or 1, and t and u each independently represent an integer of 0 to 2.

Abstract: Provided are polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

Abstract: Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.

Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a0) containing an acid-dissociable, dissolution-inhibiting group, and the acid-dissociable, dissolution-inhibiting group has a 1,3-dioxole skeleton.

Abstract: The present invention relates to a furan-based curable compound derived from carbohydrate-based biomass, to a solvent-free curable composition, and to a method for preparing thereof, wherein the furan-based curable compound derived from biomass according to the present invention includes two epoxide functional groups bonded to at least one furan-based compound. The present invention may provide an environmentally friendly next-generation curable compound comprising a novel furan-based compound derived from biomass, which may be substituted for curable materials derived from oil resources, as a basic backbone, as well as a composition containing the same. According to the present invention, a curable material, which has a low contraction ratio during curing as compared to conventional radical-type curing materials, may be obtained, and a compound applied to the novel curing material may be prepared with a combination of excellent efficiency and cost-effectiveness.

Abstract: Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.

Abstract: A polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2?C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.

Abstract: A polymer comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, X represents a linear or branched chain C1-C6 alkylene group, Z represents a group represented by the formula (Ia): wherein R2 is independently in each occurrence a linear or branched chain C1-C6 alkyl group and m represents an integer of 0 to 15, and a structural unit represented by the formula (II): wherein R3 represents a hydrogen atom or a methyl group, R4 is independently in each occurrence a linear or branched chain C1-C6 alkyl group and n represents an integer of 0 to 4.

Abstract: A polymer includes a repeating unit shown by a general formula (1). R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms. Y represents a carbon atom. X represents —X1Z1X2— which is an atomic group which forms a cyclic structure including a heteroatom together with Y. Z1 represents —O—, —S—, —CO—, —COO—, —SO—, or —SO2—. Each of X1 and X2 individually represents a single bond, a methylene group, or an alkylene group having 2 to 25 carbon atoms. Each of X1 and X2 is unsubstituted or substituted with a substituent, and optionally a carbon atom included in X1 and a carbon atom included in X2 are bonded via a divalent group.

Abstract: Since a polymerizable liquid crystal compound represented by the general formula (1) produces polymers exhibiting high optical anisotropy and high chemical resistance, and the optical anisotropy thereof exhibits low wavelength dependence, polymers obtained from a polymerizable liquid crystal composition comprising said polymerizable liquid crystal compound are useable as an optically anisotropic film for polarizers, wave plates, and the like, and are particularly best used in pattern formation that uses photolithography in air. (n represents an integer in the range of 3 to 10, m represents an integer in the range of 0 to 5, and q represents an integer in the range of 1 to 2.

Abstract: A reverse dispersion retardation film is formed by stretching a film containing a norbornene-based ring-opening copolymer containing a structural unit (A) represented by a general formula (1) and a structural unit (B) represented by a general formula (2), wherein a total amount of the structural unit (A) and an exo-form structural unit, among the structural units (B), is not less than 20 mol % but not more than 65 mol % of all the structural units.

Abstract: The present invention provides a copolymer which can prevent problems associated with immersion lithography (including occurrence of a pattern defect such as water mark, and variation in sensitivity or abnormal patterning due to elution of an additive such as a radiation-sensitive acid-generator) and which provides surface characteristics suitable for immersion lithography, and a composition containing the copolymer.

Abstract: A bone cement composition contains (a) the product of a polymerisation reaction between a high molecular weight dimethacrylate monomer having a molecular weight of at least 250 and bearing at least one hydrophilic group, a monofunctional methacrylate monomer having a molecular weight of not more than 250 bearing at least one hydrophilic group, an methacrylate monomer, and a polymer having a molecular weight of at least 200,000, and (b) an inorganic filler which is present in an amount of at least about 40% by weight, based on the total weight of the cement composition.

Abstract: The invention pertains to, for example, an improved sorbent and process for removing fermentation inhibitors such as furfural and/or HMF in microbial processes utilizing fermentable sugars obtained from biomass including, for example, in the production of bioalcohols. The sorbent is capable of separating one or more inhibitors from monosaccharides and is characterized by: (1) a Ksugar partition coefficient of less than about 5 and (2) one or more of the following characteristics: (a) a furfural sorption capacity of at least about 200 mg/g sorbent at a furfural solution concentration of 2.5 grams per liter of water; (b) an Mt/M? of at least about 0.9 at 7.5 sec1/2; and (c) a Kfurfural partition coefficient of greater than about 3000.

Abstract: The present invention relates to the use of hydrotalcites as catalysts for the polymerization of unsubstituted or substituted trimethylene carbonate.

Abstract: An ionic polymer of formula VI wherein each b=0 or 1; X is hydrogen, 1/z of a metal ion of charge z, a protonated nitrogen base, or a tetrasubstituted organic ammonium compound; the molar ratio of q:r:s:t=(100-0.1):(0-99.9):(0-50):(0-30); R1, R2 and R3 are hydrogen or C1-4 alkyl; R4, R5, R6 and R7 are hydrogen, C1-4 alkyl or F, wherein F is a functional group that imparts a property to polymer VI, at least one and no more than two of R4, R5, R6 and R7 are F and F is the same or different; G is a single bond or a C1-30 hydrocarbyl group; and for each instance of t when t is not zero, c=0-5 and d=0-5, provided that c+d=1-5, and wherein q, r and s as present in c are independent of any other value of q, r and s.

Abstract: The present invention provides a method for evaluating lithographic characteristics of a lithographic composition containing a copolymer for lithography without actually preparing the composition. The method comprises the steps of: dissolving the copolymer for lithography in a solvent to prepare a test solution; separating a gel-like substance from the test solution; determining a rate of change of a composition ratio, wherein the rate of change of the composition ratio rate refers to a ratio of a difference obtained by subtracting a composition ratio of constitutional units in the copolymer for lithography from a composition ratio of constitutional units in a gel-like substance to the composition ratio of the constitutional units in the copolymer for lithography.

Abstract: A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.

Abstract: The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.

Abstract: The invention generally relates to novel polymers (SMAMPs) and their syntheses and use. The polymers exhibit promising properties of AMPs. In particularly, for example, a ring-opening metathesis polymerization (ROMP) platform was developed that allows syntheses of SMAMPs that employ a minimum number of norbornene-based building blocks and/or enable easy and independent variation of hydrophobic and hydrophilic groups in the monomer units and/or along the polymeric backbone to finetune and select desirable properties of the polymers.

Abstract: The present disclosure provides copolymers including a first monomer including at least one phospholipid possessing at least one vinyl group and a second monomer including a furanone possessing vinyl and/or acrylate groups. Compositions, medical devices, and coatings including such copolymers are also provided.

Abstract: Polycarbon biofuels may be made from feedstock such as wood waste, agricultural wastes and waste paper. The feedstock may be cooked under acidic conditions to convert cellulose and similar material in the feedstock into a biofuel that is hydrophobic, readily pelletized, and has a high energy density. The biofuel may be blended with coal or other fuels to provide blended fuels that may be burned in conventional burners. One process forms a slurry of the feedstock, sparges carbon dioxide through the slurry to achieve a pH below 5 and cooks the slurry at temperatures in the range of 170 C to 300 C until conversion of the feedstock to polycarbon biofuel has occurred. The biofuel may be separated from liquids in the slurry by filtration.

Abstract: A photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R6 is a hydrogen atom or one of a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1. Also disclosed is a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the formula (3): wherein R8 is a hydrogen atom or a methyl group, and R9 is one of a specified subset of hydrocarbon groups.

Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Abstract: A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.

Abstract: A process for preparing a polymer having a 2,5-furandicarboxylate moiety within the polymer backbone and having a number average molecular weight of at least 10,000 (as determined by GPC based on polystyrene standards) includes a first step where a prepolymer is made having the 2,5-furandicarboxylate moiety within the polymer backbone, followed in a second step by a polycondensation reaction. In the first step a 2,5-furandicarboxylate ester is transesterified with a compound or mixture of compounds containing two or more hydroxyl groups, in the presence of a tin(IV) based transesterification catalyst. In the second step at reduced pressure and under melt conditions the prepolymer prepared in the first step is polycondensed in the presence of a tin (II) based polycondensation catalyst until the polymer is obtained. This polymer may then be subjected to Solid State Polycondensation.

Abstract: This invention provides a polyfunctional polymer having high stereoregularity, in particular, isotacticity, and provides a production process thereof. The present invention relates to a polymer having, in a molecule, a repeating unit represented by General Formula (2): wherein R1 and R2 are different, and each represents a hydrogen atom, an alkyl group and an aryl group; * represents an asymmetrical carbon, the polymer containing meso diad (m) and racemo diad (r) at a proportion of 60:40 to 100:0 (m:r). The invention also relates to chemical modifications and a production process of the polymer.

Abstract: Halide displacement from brominated polyisobutylene-co-isoprene) (MIR) under homogeneous and phase-transfer catalyzed reaction conditions is used to prepare acrylate, styrenic and maleimide functionalized elastomers in high yield. These macro-monomer derivatives cross-link efficiently under peroxide initiation to give high modulus, thermoset products that cannot otherwise be accessed from isobutylene-rich elastomers. The extent of cure scales with content of activated C?C, and can extended by co-oligomerization of pendant unsaturation with that contained within multi-functional co-agents.

Abstract: A radiation-sensitive resin composition includes a resin and a photoacid generator. The resin includes a polymer including a first repeating unit shown by a following formula (1) and an acid-dissociable group-containing repeating unit, wherein R1 represents a hydrogen atom or a methyl group, R2 represents an alkylene group having 1 to 12 carbon atoms or an alicyclic alkylene group, and m is an integer from 1 to 3.

Abstract: The invention provides an acetal compound containing an adamantane ring having an alcoholic hydroxyl group which is protected with an acetal group having a carbonyl moiety of branched structure. A photoresist film comprising a polymer comprising recurring units derived from the acetal compound and an acid generator is characterized by a high dissolution contrast when it is subjected to exposure and organic solvent development to form an image via positive/negative reversal.

Abstract: The present disclosure relates to the preparation of acrylate, alkacrylate, allyl, and polycarbonate derivatives of hydroxy ketal esters, and uses thereof.

Abstract: To provide an amorphous fluorinated polymer which is soluble in a fluorinated solvent having a boiling point of at most 70° C., and a fluorinated polymer composition containing it. An amorphous fluorinated polymer characterized by having a fluorine content of at least 50 mass % and an intrinsic viscosity of at least 0.03 g/dL and less than 0.05 dL/g as measured in perfluoro(2-butyltetrahydrofuran) at 30° C.

Abstract: Alcohols are catalytically oxidized to aldehydes, in particular to benzaldehyde and diformylfuran, which are useful as intermediates for a multiplicity of purposes. The invention also relates to the polymerization of the dialdehyde and to the decarbonylation of the dialdehyde to furan.

Abstract: The present disclosure provides copolymers including a first monomer including at least one phospholipid possessing at least one vinyl group and a second monomer including a furanone possessing vinyl and/or acrylate groups. Compositions, medical devices, and coatings including such copolymers are also provided.

Abstract: A (meth)acrylate compound having an aromatic acid-labile group, the (meth)acrylate compound being represented by the following Formula 1: In Formula I, R1 is hydrogen or methyl, R2 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, R3 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, AR is a substituted or unsubstituted phenyl, or a substituted or unsubstituted aryl having from two to four fused aromatic rings, and carbon CAR is bonded directly to an aromatic ring of AR.

Abstract: The present invention provides a polymer containing a structural unit represented by the formula (Ia) or (Ib): wherein R1, R2, R3, n, Z1, R4, R5 and m are defined in the specification, a structural unit represented by the formula (II): wherein R6, R7, R8, R9, Z2, n? and Z? are defined in the specification, and a structural unit represented by the formula (III): wherein R10, R11, 1? and Z3 are defined in the specification.

Abstract: The present invention relates to compositions comprising a polymeric substrate comprising at least one volume excluding polymer. In one embodiment, the present invention provides polymeric articles that are capable of acting as osmotic drivers. The articles are capable of maintaining a desired water balance by moving water in or out of a substrate to maintain cation concentration equilibrium between the substrate and its environment.

Abstract: A radiation-sensitive resin composition for liquid immersion lithography includes a resin component, a photoacid generator and a solvent. The resin component includes an acid-dissociable group-containing resin in an amount of more than 50% by mass. The acid-dissociable group-containing resin includes a repeating unit that includes a fluorine atom and an acid-dissociable group in a side chain of the repeating unit.

Abstract: A resist composition including a base resin component (A) and an acid-generator component (B) which generates acid upon exposure, the component (A) including a resin (A1) which has a structural unit (a0) represented by general formula (a-0) shown below: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; a represents an integer of 0 to 2; b represents an integer of 1 to 3; c represents an integer of 1 to 2; and a+b is an integer of 2 or more.

Abstract: There is provided a polymer including a unit represented by Chemical Formula (1): wherein R represents -A1-SO2R1; R1w and R1x are each independently a halogen atom or a hydrogen atom; R1y is a CH3 group, a halogen atom or a hydrogen atom; A01 is a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; A1 is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; R1 is OH, a halogen atom, ONa, OK or OR1a; R1a is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure.

Abstract: Copolymers are disclosed comprising structural units derived from ?-methylene-?-butyrolactone, styrene, methyl methacrylate and acrylonitrile. The copolymers may be used as protective layers in multilayer articles that include UV sensitive substrate materials. The multilayer articles may also include a silicone hardcoat.

Abstract: The invention relates to compounds of formula (I): wherein R1 and R2 are each independently selected from the group: H, F, Cl and CH3; n1 and n2 are each independently integers 3 to 20; q and r are each independently integers 0, 1 or 2, with the proviso that q+r is ?1; D is a divalent chiral radical selected from the group: wherein R3 is a C1 to C6 straight or branched chain alkyl group; and each B1 and B2 is a divalent radical independently selected from the group: R4-substituted-1,4-phenyl, wherein R4 is H, —CH3 or —OCH3; 2,6-naphthyl; and 4,4?-biphenyl; with the provisos that when q+r=3, at least one of B1 and B2 is R4-substituted-1,4-phenyl; and when q+r=4, at least two of B1 and B2 are R4-substituted-1,4-phenyl. The invention further relates to liquid crystal compositions comprising compounds of formula (I) and polymer networks derived from the polymerization of the liquid crystal compositions.

Abstract: Embodiments of the present invention relate generally to non-self imagable and imagable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.

Abstract: The invention relates to a copolymer that can be obtained by the polymerization of the monomers (A), (B) and (C), (A) being a monomer of formula (I) wherein A is C2-C4 alkylene and B is a C2-C4-alkylene different from A, k corresponds to the number 0 or 1, m is a number between 0 and 500, n is a number between 0 and 500, the sum of m+n being equal to between 1 and 1000; (B) contains an ethylenically unsaturated monomer containing an aromatic group; and (C) is an ethylenically unsaturated monomer containing an alkyl radical. The copolymers according to the invention are suitable as dispersants for pigments.

Abstract: A polymer for resist use is prepared by previously charging a reactor with a solution containing a chain transfer agent and holding at a polymerization temperature, and continuously or discontinuously adding dropwise a solution containing monomers and a polymerization initiator to the reactor for radical polymerization. The polymer has a minimized content of a substantially insoluble component. A resist composition using the polymer as a base resin produces a minimized number of defects when processed by photolithography and is useful in forming microscopic patterns.

Abstract: There is provided an electroactive material having Formula I wherein: Q is the same or different at each occurrence and can be O, S, Se, Te, NR, SO, SO2, or SiR3; R is the same or different at each occurrence and can be hydrogen, alkyl, aryl, alkenyl, or alkynyl; and R1 through R6 are the same or different and can be hydrogen, alkyl, aryl, halogen, hydroxyl, aryloxy, alkoxy, alkenyl, alkynyl, amino, alkylthio, phosphino, silyl, —COR, —COOR, —PO3R2, —OPO3R2, or CN.