Interpolymerized With Hydrocarbon Monomer Patents (Class 526/272)
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Publication number: 20100255228Abstract: An additive composition for imparting caustic removability to a hot melt adhesive comprises a low molecular weight ?,? ethylenically unsaturated anhydride-containing or acid-containing polymer. The polymer is selected from the group consisting of a low molecular weight carboxylic anhydride homo-polymer or the at least partial ester thereof, a low molecular weight carboxylic anhydride copolymer or the at least partial ester thereof, a low molecular weight carboxylic anhydride polyolefin, a low molecular weight carboxylic anhydride vinyl aromatic copolymer, and a low molecular weight carboxylic anhydride grafted copolymer, or the combination or mixtures thereof. A caustic removable hot melt adhesive composition comprises a hot melt adhesive additive and a conventional hot melt adhesive resin. A caustic removable adhesive label comprises a substrate and a caustic removable hot melt adhesive composition which includes an additive composition.Type: ApplicationFiled: April 5, 2010Publication date: October 7, 2010Applicant: CRAY VALLEY TECHNOLOGY USA, LLCInventors: WILLIAM R. DOUGHERTY, Alan J. Pape, Nestor P. Hansen, W. Paul Boggs, Charles C. Mateer
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Publication number: 20100233100Abstract: An amphiphilic polymeric material which has a straight or branched chain polymer backbone and a multiplicity of side chains attached to the backbone, wherein the backbone is a copolymer of at least one ethylenically-unsaturated aliphatic hydrocarbon monomer and maleic anhydride, or is a terpolymer of maleic anhydride, ethylene, and a further ethylenically unsaturated monomer. A method of synthesising said polymeric material is also provided, together with chewing gum bases, compositions and emulsions comprising amphiphilic polymeric materials.Type: ApplicationFiled: November 26, 2008Publication date: September 16, 2010Applicant: REVOLYMER LIMITEDInventors: Thomas Charles Castle, Roger B. Pettman, Terence Cosgrove
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Patent number: 7790822Abstract: A hyperbranched polymer having pendent olefinic groups and comprising polymer units derived from one or more terminally-unsaturated, acyclic aliphatic diene and polymer units derived from maleic anhydride. Optionally, the hyperbranched polymer may further comprise polymer units derived from one or more 1-alkenes and/or a chain transfer agent. A process to prepare the hyperbranched polymer comprises contacting maleic anhydride with at least one terminally unsaturated acyclic aliphatic diene having at least 7 carbon atoms in the presence of an effective amount of a radical initiator in an aprotic solvent under dilute conditions.Type: GrantFiled: July 15, 2009Date of Patent: September 7, 2010Inventors: Stephen Ernest Jacobson, Patricia Metzger Cotts
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Publication number: 20100197872Abstract: The present invention provides a copolymer that includes at least one alkene monomer, at least one acrylate monomer and at least one the unsaturated organic acid monomer having one or more double bonds, and a method of manufacturing the same.Type: ApplicationFiled: March 28, 2008Publication date: August 5, 2010Applicant: LG CHEM, LTD.Inventors: Byoung-Ho Jeon, Yoo-Young Jung, Ki-Su Ro, Kyung-Seop Noh, Bae-Kun Shin
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Patent number: 7745561Abstract: The invention provides alternatives to traditional polycondensation processes for preparing copolymers. For example, in certain embodiments, the invention provides a process that includes an extrusion step and a solid state polymerization step to prepare high molecular weight block copolymer with a “hard block” contributed by a macrocyclic polyester oligomer (MPO) and a “soft block” contributed by a dihydroxyl-functionalized polymer, an oligoether, and/or a dimerized fatty acid (i.e. a polyol). The invention also provides new copolymer compositions made possible by the new processes—for example, copolymers of higher molecular weight, copolymers with higher weight ratio of soft block units to hard block units, copolymers made with higher molecular weight polyol, and copolymers with hard block units that are themselves random copolyesters of units contributed by a MPO and a cyclic ester.Type: GrantFiled: January 31, 2006Date of Patent: June 29, 2010Assignee: Cyclics CorporationInventors: Steven R. Bahr, James Pawlson
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Patent number: 7737249Abstract: The present invention relates to the formation of low volatile anhydride-containing aromatic vinyl polymers by polymerizing the half ester of the anhydride with a vinyl aromatic monomer followed by devolatilizing the half-ester and reforming the anhydride at elevated temperatures and reduced pressures.Type: GrantFiled: March 9, 2009Date of Patent: June 15, 2010Assignee: Cartilast CorporationInventor: Eugene R. Moore
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Publication number: 20100130706Abstract: The present invention provides a copolymer that includes at least one alkene monomer, at least one acrylate monomer and at least one the unsaturated acid anhydride monomer, and a method of preparing the same.Type: ApplicationFiled: May 15, 2008Publication date: May 27, 2010Inventors: Byoung-Ho Jeon, Yoo-Young Jung, Ki-Su Ro, Kyung-Seop Noh, Bae-Kun Shin
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Publication number: 20100098649Abstract: The present invention relates to the field of perfumery. More particularly, it concerns co-polymers, derived from a maleic anhydride derivative and a ethylenic derivative, comprising at least one ?-oxy or ?-thio carbonyl moiety capable of liberating an active molecule such as, for example, an ?,?-unsaturated ketone, aldehyde or carboxylic ester. The present invention concerns also the use of polymers or co-polymers in perfumery as well as the perfuming compositions or perfumed articles comprising the invention's compounds.Type: ApplicationFiled: October 5, 2007Publication date: April 22, 2010Inventors: Damien Berthier, Andreas Herrmann
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Publication number: 20100063231Abstract: A hyperbranched polymer having pendent olefinic groups and comprising polymer units derived from one or more terminally-unsaturated, acyclic aliphatic diene and polymer units derived from maleic anhydride. Optionally, the hyperbranched polymer may further comprise polymer units derived from one or more 1-alkenes and/or a chain transfer agent. A process to prepare the hyperbranched polymer comprises contacting maleic anhydride with at least one terminally unsaturated acyclic aliphatic diene having at least 7 carbon atoms in the presence of an effective amount of a radical initiator in an aprotic solvent under dilute conditions.Type: ApplicationFiled: July 15, 2009Publication date: March 11, 2010Applicant: E. I. DU PONT DE NEMOURS AND COMPANYInventors: Stephen Ernest Jacobson, Patricia Metzger Cotts
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Publication number: 20090324835Abstract: Polymers comprising monomers having 2-cyano-3,3-diphenyl-prop-2-enoic acid moieties having the formula are disclosed. Compositions comprising said polymers and methods for increasing the UV-absorbing, water resistance, and photostabilizing properties of compositions comprising such polymers also are disclosed.Type: ApplicationFiled: June 27, 2008Publication date: December 31, 2009Inventors: Craig A. Bonda, Anna Pavlovic, Jean Zhang
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Publication number: 20090318649Abstract: The present invention discloses styrene-maleic anhydride copolymers preparations using solventless techniques. The solventless method resulted in reduced amounts of residues, such as unreacted styrene and/or maleic anhydride monomers, which makes the copolymers particularly suitable for bioapplications.Type: ApplicationFiled: March 26, 2009Publication date: December 24, 2009Inventors: Mircea Dan Bucevschi, Monica Colt
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Publication number: 20090305923Abstract: An interpolymer composition comprising monomer-derived units of (i) at least one of an aliphatic olefin containing from 2 to 30 carbon atoms and a vinyl aromatic monomer, and (ii) at least one alpha, beta-unsaturated acylating agent; wherein a portion of said acylating agent monomers is esterified and wherein a portion of said acylating agent monomers is condensed with at least one aromatic amine, provides good viscosity modification and dispersancy performance.Type: ApplicationFiled: April 18, 2005Publication date: December 10, 2009Applicant: THE LUBRIZOL CORPORATIONInventors: Daniel C. Visger, David Price, Leonard E. Orzech, Patrick E. Mosier, Suzanne M. Patterson, Calvin A. James, Barton J. Schober, Christopher Friend, Michael J. Covitch, John K. Pudelski, Renee A. Eveland, Matthew D. Gieselman
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Publication number: 20090292092Abstract: A hyperbranched polymer having pendent olefinic groups and comprising polymer units derived from one or more terminally-unsaturated, acyclic aliphatic diene and polymer units derived from maleic anhydride. Optionally, the hyperbranched polymer may further comprise polymer units derived from one or more 1-alkenes and/or a chain transfer agent. A process to prepare the hyperbranched polymer comprises contacting maleic anhydride with at least one terminally unsaturated acyclic aliphatic diene having at least 7 carbon atoms in the presence of an effective amount of a radical initiator in an aprotic solvent under dilute conditions.Type: ApplicationFiled: July 15, 2009Publication date: November 26, 2009Applicant: E. I. DU PONT DE NEMOURS AND COMPANYInventors: Stephen Ernest Jacobson, Patricia Metzger Cotts
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Patent number: 7579420Abstract: A hyperbranched polymer having pendent olefinic groups and comprising polymer units derived from one or more terminally-unsaturated, acyclic aliphatic diene and polymer units derived from maleic anhydride. Optionally, the hyperbranched polymer may further comprise polymer units derived from one or more 1-alkenes and/or a chain transfer agent. A process to prepare the hyperbranched polymer comprises contacting maleic anhydride with at least one terminally unsaturated acyclic aliphatic diene having at least 7 carbon atoms in the presence of an effective amount of a radical initiator in an aprotic solvent under dilute conditions.Type: GrantFiled: April 4, 2006Date of Patent: August 25, 2009Assignee: E. I. du Pont de Nemours and CompanyInventors: Stephen Ernest Jacobson, Patricia Metzger Cotts
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Patent number: 7579403Abstract: Stain resistant composition comprises a hyperbranched polymer having pendent olefinic groups and comprising polymer units derived from one or more terminally-unsaturated, acyclic aliphatic diene and polymer units derived from maleic anhydride. Optionally, the hyperbranched polymer may further comprise polymer units derived from one or more 1-alkenes and/or a chain transfer agent. A method to provide stain resistance to a substrate comprises applying the stain resistant composition to said substrate. Suitable substrates include textiles and hard surfaces.Type: GrantFiled: April 4, 2006Date of Patent: August 25, 2009Assignee: E. I. du Pont de Nemours and CompanyInventors: Stephen Ernest Jacobson, Patricia Metzger Cotts
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Publication number: 20090156765Abstract: A composition includes a coupling agent composition and a polymer precursor. The coupling agent includes a first cycloolefin substituted with at least one anhydride group and the coupling agent is capable of bonding to a filler having a corresponding binding site. The polymer precursor includes a second cycloolefin. An associated article and a method are also provided.Type: ApplicationFiled: December 18, 2007Publication date: June 18, 2009Applicant: GENERAL ELECTRIC COMPANYInventors: Rainer Koeniger, Chad M. Denton
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Patent number: 7547753Abstract: The invention relates to copolymers made from monoethylenically unsaturated monomers with acid groups and a further hydrophobic monomer component for the prevention of inorganic and organic deposits in water supply systems. The invention further relates to a method for production of the above.Type: GrantFiled: June 14, 2003Date of Patent: June 16, 2009Assignee: Ashland Licensing and Intellectual Property LLCInventors: Joerg Issberner, Rainer Poeschmann, Christian Flocken
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Publication number: 20090148777Abstract: A room temperature crosslinkable polymer system comprising an anhydride containing polymer and an oxyalkylene amine and a polymer electrolyte derived therefrom are prepared and employed as ion conducting materials for batteries such as lithium ion battery, solar cells and electrochromic devices is disclosed.Type: ApplicationFiled: December 4, 2008Publication date: June 11, 2009Inventors: Zhiquang Song, Suruliappa G. Jeganathan, Jacqueline Lau, Rakesh Gupta
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Publication number: 20090040618Abstract: An object of the present invention is to provide a light diffuser plate (1) which can illuminate the front side more brightly when incorporated in a surface light source (3) constituting a transmissive image display (2). The light diffuser plate of the present invention comprises a transparent resin and a light diffuser dispersed in the transparent resin, wherein the transparent resin is a transparent resin which has a light transmittance [T600] at a wavelength of 600 nm of 85% or more measured with respect to a thickness of a 2 mm thick plate-shaped specimen, and a ratio [T365/T600] of a light transmittance [T365] at a wavelength of 365 nm to the light transmittance [T600] is 0.90 to 0.99. The transparent resin is polystyrene or the like, an average particle diameter of the light diffuser is from 0.5 to 5 ?m, an absolute value [|?n|] of a difference in a refractive index between the light diffuser and the transparent resin is 0.05 or more, an amount of the light diffuser is from 0.Type: ApplicationFiled: August 7, 2008Publication date: February 12, 2009Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventor: Hironobu Iyama
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Publication number: 20090036625Abstract: The present invention discloses an amphiphilic polymer, comprising a polymer backbone, at least one hydrophobic side chain, and at least one hydrophilic side chain wherein one end of the hydrophobic side chain is bound to the polymer backbone and one end of the hydrophilic side chain is bound to the polymer backbone. The polymer backbone is derived from a homopolymer or copolymer of an anhydride. In addition, the present invention discloses a water-soluble polymer micell having the above described amphiphilic polymer and forming method and applications thereof.Type: ApplicationFiled: August 1, 2007Publication date: February 5, 2009Applicant: CHUNG YUAN CHRISTIAN UNIVERSITYInventors: Walter Hong-Shong Chang, Cheng-An J. Lin, Jimmy Kuan-Jung Li, Martin Oheim, Aleksey Yakovlev, Anne Feltz, Camilla Luccardini, Maria Teresa Fernandez-Arguelles, Ralph A. Sperling, Wolfgang J. Parak
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Publication number: 20080299557Abstract: The present invention provides copolymers that facilitate nucleic acid analysis, compositions that comprise such copolymers, and methods for making or using such copolymers.Type: ApplicationFiled: February 6, 2006Publication date: December 4, 2008Applicant: QIAGEN GmbHInventors: Ralf Himmelreich, Roland Fabis, Christoph Erbacher, Sabine Werner, Bernd Springer
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Publication number: 20080274073Abstract: The use of terpolymers, obtainable by free radical copolymerization of (a) at least one anhydride of a C3-C10-dicarboxylic acid, (b) at least one 1,1-di-(C1-C3-alkyl)-substituted C4-C8-olefin, (c) polyisobutene having an average molecular weight Mn in the range of from 200 to 10 000 g/mol and, if appropriate hydrolysis, for the preparation of aqueous emulsions or dispersions of hydrophobic substances with the use of not more than 2% by weight of further emulsifier, based on the total aqueous emulsion or dispersion.Type: ApplicationFiled: October 5, 2006Publication date: November 6, 2008Applicant: BASF SE Patents, Trademarks and LicensesInventors: Hubertus Peter Bell, Stephan Huffer, Matthias Kluglein
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Publication number: 20080182918Abstract: The invention relates to a monolithic polymer material comprising alternating copolymers formed by a radical reaction between a maleic anhydride in the form of a base monomer and ethylene comonomers in the form of electron donors. The invention also relates to a method for preparing said monolithic material consisting in carrying out a radical polymerization reaction of a composition which comprises a base composition containing a maleic anhydride in the form of a base monomer associated with the ethylene comonomers in the form of electron donors and/or with other ethylene comonomers in the form of electron donors or receivers and a mixture of pore-forming solvents, wherein said base composition is optionally supplemented with a thermal initiator or photo initiator.Type: ApplicationFiled: March 31, 2006Publication date: July 31, 2008Applicant: UNIVERSITE DES SCIENCES ET TECHNOLOGIES DE LILLEInventors: Katarzyna Chuda, Xavier Coqueret
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Patent number: 7312291Abstract: A new family of concrete admixture additives can be derived from reacting a mixture of olefins/cyclic olefins-maleic anhydride copolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers, or a mixture of styrene-maleic anhydride copolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers, or a mixture of styrene-olefins/cyclic olefins-maleic anhydride terpolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers. These reactions lead to formation of a kind of carboxylic salt containing polymer, which can be used alone in concrete. Only a small amount of this substance is needed to provide excellent water reduction, high concrete flowability and high early strength.Type: GrantFiled: September 4, 2003Date of Patent: December 25, 2007Assignee: Taiwan Gwan Chian Industrial Co., Ltd.Inventor: Theresa Tsai
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Patent number: 7241847Abstract: A process for producing a cycloolefin addition polymer in which one or more cycloolefin monomers can be (co)polymerized by addition polymerization with a small palladium catalyst amount to produce a cycloolefin addition (co)polymer while attaining high catalytic activity. The process for cycloolefin addition polymer production is characterized by addition-polymerizing one or more cycloolefin monomers comprising a cycloolefin compound represented by a specific formula in the presence of a multi-component catalyst comprising (a) a palladium compound and (b) a specific phosphorus compound.Type: GrantFiled: August 4, 2004Date of Patent: July 10, 2007Assignee: JSR CorporationInventors: Noboru Oshima, Michitaka Kaizu, Satoshi Ebata, Takashi Imamura
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Patent number: 7112633Abstract: The invention relates to a process for the preparation of compound(s) comprising at least one acrylate or methacrylate group, at least one linear carbonate group and at least one 5-membered cyclic carbonate group. The process comprises (A) a selective ring-opening step and (B) a (meth)acrylation step. The process is environment-friendly and compounds obtained are usable in radiation curable compositions, for example in radiation-curable inks.Type: GrantFiled: August 5, 2002Date of Patent: September 26, 2006Assignee: Surface Specialties, S.A.Inventor: Vincent Stone
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Patent number: 7105602Abstract: The present invention provides a processing aid for thermoplastic resin having a weight average molecular weight of 10,000 to 300,000, which is obtained by polymerizing an alkyl (meth)acrylate, or an alkyl (meth)acrylate and another vinyl monomer copolymerizable therewith, in the presence of a mercaptan having an alkyl ester group with C4-20 alkyl group as a chain transfer agent, and/or an organic peroxide having a tertiary-butyl peroxy group as a polymerization initiator.Type: GrantFiled: April 14, 2000Date of Patent: September 12, 2006Assignee: Kaneka CorporationInventors: Takenobu Sunagawa, Riichi Nishimura, Toshiyuki Mori, Akira Takaki
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Patent number: 7071275Abstract: The invention describes polyisobutenyl derivatives of succinic acid obtainable by: i) reacting a polyisobutene which has a reactive end group content of at least 80% and whose molecular weight distribution is characterized by a maximum MP in the distribution curve in the range from 500 to 20 000 daltons and a ratio of weight average molecular weight to number average molecular weight MW/MN of below 1.4 with maleic acid or maleic anhydride; ii) reacting the polyisobutene-succinic acid derivative obtained in i) with at least one compound I which has at least one primary or secondary amino group and/or an OH group to form an amide or ester bond, and also a process for preparing them and their use as additives in lubricant compositions.Type: GrantFiled: December 18, 2002Date of Patent: July 4, 2006Assignee: BASF AktiengesellschaftInventors: Hans Peter Rath, Arno Lange, Helmut Mach
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Patent number: 7067599Abstract: A copolymer comprising units derivable from (A) one or more olefins of defined chain length; and (B) one or more ethylenically unsaturated compounds different from (A). The copolymers are useful as cold flow improvers in fuel oils.Type: GrantFiled: December 2, 1999Date of Patent: June 27, 2006Assignee: Infineum International Ltd.Inventors: Robert Dryden Tack, Brid Dilworth, Dennis George Peiffer
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Patent number: 7009011Abstract: A stable free radical process for preparing a polymer having acid anhydride functionality includes heating a mixture comprised of a stable free radical agent, maleic anhydride or derivative thereof, and at least one polymerizable electron donor monomer to initiate exothermic reaction and during exotherm of the reaction, adding additional amounts of stable free radical agent to control the reaction temperature. The mixture may also include a stable free radical initiator. In the mixture, the maleic anhydride or derivative thereof preferably comprises from about 10% to about 70%, molar basis, of a total amount of the maleic anhydride or derivative thereof and the at least one polymerizable electron donor monomer. Typically, the heating is to a temperature of from about 100° C. to about 160° C., and the rate of addition of the additional amounts of stable free radical agent is adjusted to control the reaction temperature to be about 160° C. or less.Type: GrantFiled: May 31, 2005Date of Patent: March 7, 2006Assignee: Xerox CorporationInventor: Barkev Keoshkerian
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Patent number: 6987155Abstract: The present invention relates to photoresist monomers, polymers formed therefrom and photoresist compositions suitable for photolithography processes employing a DUV light source, such as KrF (249 nm) and ArF(193 nm); EUV; VUV; E-beam; ion-beam; and X-ray. Photoresist monomers of the present invention are represented by the following Chemical Formula 1: wherein, m is 1 or 2. Polymers of the present invention comprise repeating units derived from the comonomer of Chemical Formula 1, preferably together with monomers of the following Chemical Formula 2: wherein, R* is an acid-labile group, and l is 1 or 2.Type: GrantFiled: March 21, 2003Date of Patent: January 17, 2006Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Chi Hyeong Roh, Jae Chang Jung
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Patent number: 6906011Abstract: This invention is directed to a new low molecular weight copolymer (The PIB/UAR copolymer) that may be prepared by reacting a low molecular weight polyisobutene (PIB) having less than about 32 carbon atoms with an unsaturated acidic reagent in the presence of a free radical initiator. No chain transfer agent is required to prepare the low molecular weight PIB/UAR copolymer. The PIB/UAR copolymer may be useful as is, or as an intermediate for (1) polysuccinimides, (2) detergents or dispersants for lube oil or fuels, (3) pour point depressants and (4) surface sizing agents for paper. The PIB/UAR copolymer may be used by itself or as the ester, amide, imide or metal salt derivative of the PIB/UAR copolymer. The PIB/UAR copolymer may be liquid at ambient temperature.Type: GrantFiled: November 9, 2001Date of Patent: June 14, 2005Assignee: Chevron Oronite Company LLCInventors: James J. Harrison, William R. Ruhe, Jr., Kenneth D. Nelson
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Patent number: 6866984Abstract: A photoresist copolymer is prepared from one or more carboxy-substituted bicycloalkene monomers, and this copolymer is used to prepare a photoresist for submicrolithography processes employing deep ultraviolet (ArF) as a light source. In addition to having high etch resistance and thermal resistance, the photoresist has good adhesiveness to the substrate and can be developed in a TMAH solution.Type: GrantFiled: December 18, 2003Date of Patent: March 15, 2005Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
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Patent number: 6808859Abstract: A photoresist copolymer is prepared from one or more carboxy-substituted bicycloalkene monomers, and this copolymer is used to prepare a photoresist for submicrolithography processes employing deep ultraviolet (ArF) as a light source. In addition to having high etch resistance and thermal resistance, the photoresist has good adhesiveness to the substrate and can be developed in a TMAH solution.Type: GrantFiled: June 27, 2000Date of Patent: October 26, 2004Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
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Patent number: 6767980Abstract: The present invention provides a reactive diluent composition which overcomes drawbacks of both the radical-cure and the cationic-cure reactive diluents and can be applied in a broad variety of uses such as paints, inks, adhesives, pressure sensitive adhesives, surface-modifiers, and molding materials; a curable resin composition containing the same; an activated energy ray-curable resin composition; and an activated energy ray-curable ink composition for ink-jet printing. A reactive diluent composition comprising a vinyl ether group-containing (meth)acrylic ester represented by the following general formula (1): CH2═CR1—COO—R2—O—CH═CH—R3 (1) wherein R1 represents a hydrogen atom or a methyl group; R2 represents an organic residue of 2 to 20 carbon atoms; R3 represents a hydrogen atom or an organic residue of 1 to 11 carbon atoms and a hydroxyl group-containing polymerizable compound and/or divinyl ether.Type: GrantFiled: April 19, 2002Date of Patent: July 27, 2004Assignee: Nippon Shokubai Co., Ltd.Inventors: Keiji Yurugi, Akihiko Fukada, Kenji Matsukawa
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Publication number: 20040131968Abstract: A photoresist copolymer is prepared from one or more carboxy-substituted bicycloalkene monomers, and this copolymer is used to prepare a photoresist for submicrolithography processes employing deep ultraviolet (ArF) as a light source. In addition to having high etch resistance and thermal resistance, the photoresist has good adhesiveness to the substrate and can be developed in a TMAH solution.Type: ApplicationFiled: December 18, 2003Publication date: July 8, 2004Applicant: Hyundai Electronics Industries Co., Ltd.Inventors: Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
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Patent number: 6756460Abstract: The present invention provides: a novel water-soluble copolymer which is excellent in performance for uses, such as detergent builders, pigment dispersants, and scale inhibitors. In addition, the present invention provides: a novel liquid detergent builder which has extremely excellent compatibility, high transparency when a liquid detergent composition comprises it, and excellent detergency; and a novel liquid detergent composition comprising the liquid detergent builder.Type: GrantFiled: August 16, 2001Date of Patent: June 29, 2004Assignee: Nippon Shokubai Co., Ltd.Inventors: Takuya Saeki, Junichi Nakamura, Yoshikazu Fujii, Masahito Takagi, Shigeru Yamaguchi
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Publication number: 20040097638Abstract: The invention relates to a polymer synthesizedType: ApplicationFiled: July 2, 2003Publication date: May 20, 2004Applicant: BASF AkiengesellschaftInventors: Alexander Centner, Karl-Heinz Schumacher, Oliver Hartz, Martin Jung
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Patent number: 6723813Abstract: The present invention is a method of preparing an acrylic copolymer having an acid anhydride group with a number average molecular weight of 1,500-5,000 comprising; polymerizing a monomer mixture of a radical polymerizable monomer having an acid anhydride group and another radical polymerizable monomer at a temperature of 150° C. or higher by using a radical initiator, wherein the concentration of the monomer mixture is 50-75 wt %. This method can provide an acrylic copolymer having an acid anhydride group with a relatively low molecular weight that does not cause the problem of yellowing after baking when used in an acid/epoxy curing type clear paint, by means of high temperature polymerization without the use of a large amount of an expensive initiator.Type: GrantFiled: June 17, 2003Date of Patent: April 20, 2004Assignee: Nippon Paint Company, Ltd.Inventors: Tomohito Asai, Shinya Yamada, Yusuke Ninomiya
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Patent number: 6692725Abstract: It was found that if a copolymer of maleic acid or maleic anhydride with an alkyl vinyl ether, which has a specific viscosity of 3.5 or more, is used as an antibacterial-enhancing agent, the action of an antibacterial agent in an oral composition is enhanced and the effect such as adhesion prevention of a soft deposit is improved.Type: GrantFiled: February 19, 2002Date of Patent: February 17, 2004Assignee: Daicel Chemical Industries, Ltd.Inventor: Toshio Endo
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Patent number: 6677102Abstract: A chemical amplifying type positive resist composition, excellent in balance of performance of resolution and sensitivity, having high dry etching resistance and comprising; a resin having a polymerization unit derived from a monomer represented by the following formula (I): wherein R1 and R2 independently represent hydrogen or an alkyl group having 1 to 4 carbons, and R3 represents hydrogen or a methyl group, the resin being insoluble in alkali itself but becoming alkali-soluble due to the action of an acid; and an acid generating agent is provided.Type: GrantFiled: March 11, 2002Date of Patent: January 13, 2004Assignee: Sumitomo Chemical Company, LimitedInventors: Yoshiko Miya, Yasunori Uetani, Hiroaki Fujishima
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Patent number: 6673515Abstract: The invention provides a polymer comprising recurring units of formula (1—1) or (1-2) wherein k is 0 or 1, m is 0, 1, 2, 3 or 4, and n is 1 or 2 and having a weight average molecular weight of 1,000 to 500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.Type: GrantFiled: September 14, 2001Date of Patent: January 6, 2004Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana, Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe, Jun Hatakeyama
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Patent number: 6649714Abstract: A process for polymerizing polycycloolefins containing pendant anhydride moieties is disclosed. The process utilizes a single component nickel containing catalyst of the formula EnNi(C6F5)2 wherein n is 1 or 2 and E represents a neutral electron donor ligand.Type: GrantFiled: February 27, 2003Date of Patent: November 18, 2003Assignee: Sumitomo Bakelite Co., Ltd.Inventors: Saikumar Jayaraman, Brian L. Goodall, Richard Vicari, John-Henry Lipian
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Patent number: 6642336Abstract: A photosensitive polymer which maintains transparency even when exposed to a short-wavelength light source of 193 nm or below, exhibits improved adhesiveness to a substrate, improved contrast and improved resistance to dry etching. The photosensitive polymer includes a first monomer which is alicyclic hydrocarbon carboxylate having an acid-labile C6 to C20 tertiary alicyclic hydrocarbon group as a substituent, and a second monomer which is capable of free radical polymerization.Type: GrantFiled: August 23, 2000Date of Patent: November 4, 2003Assignee: Samsung Electronics Co., Ltd.Inventors: Sook Lee, Ki-young Kwon, Si-hyeung Lee, Kwang-sub Yoon, Hyun-woo Kim, Dong-won Jung, Sang-jun Choi, Sang-gyun Woo
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Patent number: 6641974Abstract: Disclosed is a chemically amplified positive photoresist composition including a multi-component copolymer having a polystyrene-reduced weight average molecular weight (Mw) of 3,000 to 50,000 and a molecular weight distribution (Mw/Mn) of 1.0 to 3.0, a low molecular weight additive, an acid generator, and a solvent. A resist composition comprising the additive may provide a resist pattern excellent in sensitivity as well as adhesion to substrate and dry etching resistance. Such a resist composition is a promising material greatly suitable for use in the fabrication of semiconductor devices that are expected to have further fineness. Especially, the resist composition is suitable for KrF or ArF excimer laser lithography and thus useful in the fine engineering of less than 0.20 micron patterns.Type: GrantFiled: January 12, 2001Date of Patent: November 4, 2003Assignee: Korea Kumho Petrochemical Co., Ltd.Inventors: Jae Young Kim, Joo Hyeon Park
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Publication number: 20030199655Abstract: The present invention provides a reactive diluent composition which overcomes drawbacks of both the radical-cure and the cationic-cure reactive diluents and can be applied in a broad variety of uses such as paints, inks, adhesives, pressure sensitive adhesives, surface-modifiers, and molding materials; a curable resin composition containing the same; an activated energy ray-curable resin composition; and an activated energy ray-curable ink composition for ink-jet printing.Type: ApplicationFiled: April 19, 2002Publication date: October 23, 2003Applicant: NIPPON SHOKUBAI CO., LTD.Inventors: Keiji Yurugi, Akihiko Fukada, Kenji Matsukawa
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Patent number: 6632903Abstract: The present invention relates to a semiconductor device using a copolymer-containing photoresist, and a process for manufacturing the same. As a norbornene derivative (monomer) having a hydrophilic group is synthesized and introduced to the backbone chain of a polymer, the polymer according to the present invention has excellent etching resistance and heat resistance, which are the characteristic points of alicyclic olefin structure, and provide excellent resolution due to prominent enhancement of adhesiveness resulted from introducing a hydrophilic group (—OH).Type: GrantFiled: August 21, 2001Date of Patent: October 14, 2003Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
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Publication number: 20030191259Abstract: The present invention relates to photoresist monomers, polymers formed therefrom and photoresist compositions suitable for photolithography processes employing a DUV light source, such as KrF (249 nm) and ArF(193 nm); EUV; VUV; E-beam; ion-beam; and X-ray.Type: ApplicationFiled: March 21, 2003Publication date: October 9, 2003Applicant: Hyundai Electronics Industries Co., Ltd.Inventors: Chi Hyeong Roh, Jae Chang Jung
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Patent number: 6617374Abstract: The present invention relates to a denture adhesive composition comprising mixed salts of an alkyl vinyl ether-maleic acid or anhydride copolymer and/or terpolymer with isobutylene wherein the mixed salt contains a cationic salt function comprising at least about 22.5% calcium cations, from about 15% to about 25% of zinc cations, of the total initial carboxyl groups reacted, the mixed salt containing from about 36% to about 50% free acid component. In addition the present invention relates to denture adhesive compositions comprising the above composition and at least one non-adhesive self-supporting layer. The present invention further relates to a method of increasing the adhesion of dentures to the oral cavity by applying the above compositions to dentures, directly to the oral cavity, palate or ridge of the oral cavity, or applying it to both, and thereafter securing the denture to the ridge or palate of the oral cavity.Type: GrantFiled: September 2, 1999Date of Patent: September 9, 2003Assignee: The Procter & Gamble CompanyInventors: Jayanth Rajaiah, Carole Ann Schumacher, John Roy Whitney, Kimberly Ann Gilday-Weber, Robert Hargitt Culbertson
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Publication number: 20030166811Abstract: A copolymer comprising units derivable from (A) one or more olefins of defined chain length; and (B) one or more ethylenically unsaturated compounds different from (A). The copolymers are useful as cold flow improvers in fuel oils.Type: ApplicationFiled: December 2, 1999Publication date: September 4, 2003Inventors: DENNIS G. PEIFFER, BRID DILWORTH, ROBERT DRYDEN TACK