Abstract: The present invention discloses a polymer having a repeated unit of the formula (II), wherein R1 is H, haloalkyl group or C1-C4 alkyl group; R2 is hydroxyl group, C1-C8 alkoxy group or C1-C8 thioalkyl group; G is (CH2)n, O or S, wherein n is 0, 1, 2, 3 or 4; Rc is a lactone group; and m is 1, 2 or 3. The polymer of the present invention can be used to form the chemical amplified photoresist composition, which can then be applied to general lithography processes, and particularly to the lithography of ArF, KrF or the like light source, and exhibit excellent resolution, figures and photosensitivity.

Abstract: A chemically amplified resist composition consists of an acid generating agent, additive, solvent and a copolymer represented by the following formula: where R1, R2 and R6 are independent of each other and respectively include a hydrogen atom or an alkyl, alkoxymethylene, alkoxyethylene, phenyl, alkoxyalkylene, alkylphenyl, alkoxyphenyl, allyl, benzyl, alkylbenzyl, alkoxybenzyl containing 1 to 34 carbon atoms having or not having an hydroxy, ether, ester, carbonyl, acetal, epoxy, nitrile or aldehyde; R5 is a hydrogen atom, an alkyl or alkoxy group containing 1 to 18 carbon atoms; R7 is a hydrogen atom, an alkyl group containing 1 to 18 carbon atoms, an alkyl group containing alkoxy 1 to 18 carbon atoms or an alkyl group containing ester of 1 to 18 carbon atoms; R3 and R4 are independent and respectively include a hydrogen atom, hydroxy, nitrile, aldehyde, hydroxymethylene, and alkylcarbonyloxy, alky, hydroxyalkylene, alkoxycarbonyl, alkoxymethylene or alkoxyalkanyl group containing 1 to 18 c

Abstract: Disclosed are thermally-stable, red, anthraquinone colorants which contain one or more ethylenically-unsaturated, photopolymerizable radicals and which may be copolymerized with ethylenically-unsaturated monomers to produce colored compositions such as colored acrylic polymers, colored polystyrenes, and similar colored polymeric materials derived from other ethylenically-unsaturated monomers. The compounds possess good stability to ultraviolet light, good solubility in vinyl monomers, good color strength and thermal stability. Also disclosed are acrylic polymeric materials, i.e., polymers derived from acrylic acid esters, methacrylic acid esters and/or other copolymerizable vinyl compounds, having copolymerized therein one or more of the colorant compounds of the present invention.

Abstract: A polymer comprising recurring units of formula (1-1) or (1-2) wherein R1, R2, R3 and R4 are H or C1-15 alkyl, R1 and R2, and R3 and R4, taken together, may form a ring; R5 and R6 are H, C1-15 alkyl, acyl or alkylsulfonyl groups or C2-15 alkoxycarbonyl or alkoxyalkyl groups which may have halogen substituents; and k=0 or 1, and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.

Abstract: By blending novel organosiloxane polymers of the invention with a crosslinking agent and a photoacid generator, photo-curable resin compositions are formulated which can be exposed to radiation in a broad wavelength range and readily form a thin film without oxygen attack. From the compositions, fine patterns having improved dry etching resistance can be formed. Cured coatings of the compositions having improved substrate adhesion, heat resistance, and electrical insulation are suitable as a protective film for electric and electronic parts.

Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as described in the specification. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.

Abstract: Described are chiral liquid crystalline polymer materials and polymerizable compounds used for preparing them. The polymer materials can serve as a carrier material or are coated onto a carrier material. Also described are methods of making such materials and using them to make pigment flakes used in paints, printing inks, spray paints, cosmetic products, colored plastics, optical elements and security applications.

Abstract: A polymerizable composition that includes a monomer of the formula wherein X is hydrogen or one or more of methyl, chlorine, bromine or iodine, R1 is a straight or branched alkyl linking group of 2 to 12 carbon atoms, R2 is hydrogen or methyl, and n is 1 to 3; and a monomer of the formula wherein X1 and X2 are each independently hydrogen or one or more of methyl, chlorine, bromine or iodine, and R2 is hydrogen or methyl is described having a high index of refraction and being suitable for use in forming an optical product.

Abstract: Polymers comprising polycyclic repeating units containing pendant anhydride moieties are disclosed. The polymer can be polymerized from polycycloolefins containing pendant anhydride moieties in the presence of a nickel containing single component catalyst. In optional embodiments the polycycloolefin monomer containing the pendant anhydride functionality can be copolymerized with other polycycloolefin monomers that contain pendant functional groups to yield random copolymer products.

Abstract: In accordance with the present invention, there are provided free-radical polymerizable compositions comprising polycyclic olefins, wherein the polycyclic olefins contain little, if any, cyclopentenyl unsaturation. As a result, these olefins are sufficiently reactive with the propagating free-radicals during cure to provide a highly crosslinked thermoset resin. Moreover, invention compositions comprise high molecular weight polycyclic olefins having low volatility. Accordingly, the observed undesirable weight loss upon cure of prior art thermosetting compositions is considerably reduced. Further provided by the present invention are compositions comprising functionalized polycyclic olefin monomers. These functionalized olefin monomers provide additional benefits such as increased adhesion to a variety of surfaces and greater control over glass transition temperatures.

Abstract: A polymer comprising recurring units of formula (1-1) or (1-2) wherein R1, R2, R3 and R4 are H or C1-15 alkyl, R1 and R2, and R3 and R4, taken together, may form a ring; R5 and R6 are H, C1-15 alkyl, acyl or alkylsulfonyl groups or C2-15 alkoxycarbonyl or alkoxyalkyl groups which may have halogen substituents; and k=0 or 1, and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.

Abstract: In accordance with the present invention, there are provided free-radical polymerizable compositions comprising polycyclic olefins, wherein the polycyclic olefins contain little, if any, cyclopentenyl unsaturation. As a result, these olefins are sufficiently reactive with the propagating free-radicals during cure to provide a highly crosslinked thermoset resin. Moreover, invention compositions comprise high molecular weight polycyclic olefins having low volatility. Accordingly, the observed undesirable weight loss upon cure of prior art thermosetting compositions is considerably reduced. Further provided by the present invention are compositions comprising functionalized polycyclic olefin monomers. These functionalized olefin monomers provide additional benefits such as increased adhesion to a variety of surfaces and greater control over glass transition temperatures.

Abstract: A functionalized and polymerizable polymer is described which is obtainable by ring-opening metathesis polymerization and is suitable in particular as a dental material and especially as a constituent of dental adhesives owing to an adhesion-boosting effect.

Abstract: A sulfur-containing unsaturated carboxylate compound comprising a sulfur-containing substituent and at least two &agr;,&bgr;-unsaturated carboxylic acid residues, which are each attached to a secondary or tertiary carbon atom via an oxygen atom; a polymerizable composition comprising the sulfur-containing unsaturated carboxylate compound; a cured product prepared by polymerizing the polymerizable composition; an optical component consisting of the cured product; and novel intermediate compounds for preparation of the above carboxylate.

Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula: [(R′)zM(L′)x(L″)y]b[WCA]d wherein [(R′)zM(L′)x(L″)y] is a cation complex where M represents a Group 10 transition metal; R′ represents an anionic hydrocarbyl containing ligand; L′ represents a Group 15 neutral electron donor ligand; L″ represents a labile neutral electron donor ligand; x is 1 or 2; and y is 0, 1, 2, or 3; and z is 0 or 1, wherein the sum of x, y, and z is 4; and [WCA] represents a weakly coordinating counteranion complex; and b and d are numbers representing the number of times the cation complex and weakly coordinating counteranion complex are taken to balance the electronic charge on the overall catalyst complex.

Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

Abstract: A novel ester compound having an alkylcycloalkyl or alkylcycloalkenyl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.

Abstract: Disclosed is a negative photoresist which is suitable for use in photolithography using light of 220 nm or shorter like the light from the ArF excimer laser as exposure light, avoids pattern deformation originated from swelling and has a high adhesion strength to the substrate (a micro pattern is hard to be separated from the substrate) in addition to a dry etching resistance and high resolution.

Abstract: In accordance with the present invention, there are provided novel heterobifunctional monomers and uses for the same. Invention compounds have many of the properties required by the microelectronics industry, such as, for example, hydrophobicity, high Tg values, low dielectric constant, ionic purity, low coefficient of thermal expansion (CTE), and the like. These properties result in a thermoset that is particularly well suited to high performance applications where typical operating temperatures are often significantly higher than those at which prior art materials were suitable. Invention compounds are particularly ideal for use in the manufacture of electronic components, such as, for example, printed circuit boards, and the like.

Abstract: This invention relates to (co)polymers which contain at least one repeat chain unit of the general formula (1) or (2) and optionally contain repeat units of the general formula (3) in which L1 and L2 mean a photoluminescent residue, wherein the proportion of structural units of the formulae (1) and/or (2) is in each case 0.5 to 100 mol. %, and (3) 0 to 99.5 mol. %, and the molar percentages add up to 100, to the use thereof for the production of electroluminescent devices and to the electroluminescent devices.

Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula:

Abstract: The present invention relates to a process of preparing syndiotactic styrenic polymers with a high conversion rate in the form of fine powder, which comprises (a) preparing styrenic polymers in a solid state by reacting a mixture consisting of styrenic monomers, a metallocene catalyst, a cocatalyst and inert organic solvent in a polymerization reactor, (b) separating a portion of the styrenic polymers from the reactor, (c) recycling the portion of the styrenic polymers in the reactor, and (d) reacting the recycled styrenic polymers with styrenic monomers. The styrenic monomers may include olefinic monomers. The monomers can be introduced to a single inlet or multiple inlets of the reactor. A single reactor or a plural number of reactors can be operated in the present invention. The plural numbers of reactors are arranged in series or in parallel. In the present invention, a self-cleaning mono- or twin-axis reactor can be employed to prevent the polymers from agglomerating on the inner wall or the axis.

Abstract: The invention is a curable cyclobutarene based polymer comprising acid functional pendant groups. The cured polymer displays excellent qualities of toughness, adhesion, dielectric constant, and low stress. The preferred system is soluble in an aqueous base and can be used to generate patterned films with excellent resolution without the need to handle organic developer solvents.

Abstract: Disclosed is a negative photoresist which is suitable for use in photolithography using light of 220 nm or shorter like the light from the ArF excimer laser as exposure light, avoids pattern deformation originated from swelling and has a high adhesion strength to the substrate (a micro pattern is hard to be separated from the substrate) in addition to a dry etching resistance and high resolution.

Abstract: Water-soluble polymers of Formula Useful comprising from about 0.001 to about 10.0 mole percent of a Repeating Mer Unit represented by the formula: wherein a is an integer of from 1 to 10, R1 is selected from the group consisting of hydrogen and methyl groups, R2 and R3 are methyl groups, and R9 is selected from the group consisting of NH and O; and TAG is a fluorescing moiety; are described and claimed.

Abstract: This invention relates to a monomer shown by the general formula [1] (wherein X′ is a cyclic hydrocarbon residue containing polymerizable double bond(s), which may have a substituent, Z is a spacer or a direct bond and R is a substituted alkyl or alkenyl group having one or two protected hydroxyl groups as substituent) and a polymer containing a segment derived from the above monomer. The said polymer is useful for a resist composition, etc. utilized in the production of semiconductor elements, etc. and the said monomer is useful as a starting material for the polymer, and a resist composition using the said polymer can remarkably advantageously be used as a resist material for ArF excimer laser beams which has been considered to be a valuable technology for exposure belonging to the coming generation.

Abstract: The invention relates to polyfunctionally reactive polymeric substances which contain at least two structural units of the general formulae (I) and/or (II) in the molecule and whose polymer backbone linkages are C—C bonds, ether bonds, urethane bonds, amide bonds, ketone bonds or combinations thereof. The substances are useful as binders for various applications.

Abstract: A pattern forming material includes a binary copolymer represented by the following general formula or a ternary or higher copolymer obtained by further polymerizing the binary copolymer with another group: 1

Abstract: Polycyclic addition polymers derived from norbornene-type monomers are mixed with a variety of other polymers to generate families of new blends, alloys, and block copolymers.

Abstract: A monomer represented by the following general formula (m-1): wherein R is a group having an alicyclic skeleton, R2s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group, X1 is a bivalent organic group containing a heteroatom, j is an integer of 0 to 3, and R1 is a group selected from the following groups, a monovalent organic group having Si (R1-1), and —(X2)k—R4—(X3)m—C(R6)3  (R1-2), wherein X2 and X3 are a bivalent organic group containing a heteroatom, k and m are an integer of 0 to 3, R4 is a bivalent alkyl group, R6s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group.

Abstract: A polymer of the invention comprising the comonomers ethylene, one or more alpha-olefins having 3 to 20 carbon atoms, and one or more cyclic dienes having up to 30 carbon atoms, said polymer having a density of at least 0.890 gram per cubic centimeter; long chain branching; a plurality of double bonds; an Mw/Mn ratio ratio (PDI) of at least 2.5; a flow activation energy of greater than about 6.5 kcal/mol; and a Relaxation Spectrum Index (RSI), PDI, and Melt Index (MI), such that RSI·MIa>2.7 and RSI·MIa·PDIb is in the range of about 0.8 to about 60, when a and b are about 0.6 and minus 1.2, respectively.

Abstract: This invention relates to (co)polymers which contain at least one repeat chain unit of the general formula (1) or (2) and optionally contain repeat units of the general formula (3) in which L1 and L2 mean a photoluminescent residue, wherein the proportion of structural units of the formulae (1) and/or (2) is in each case 0.5 to 100 mol. %, and (3) 0 to 99.5 mol. %, and the molar percentages add up to 100, to the use thereof for the production of electroluminescent devices and to the electroluminescent devices.

Abstract: A photoresist composition contains a photoacid generator and a polymer represented by the following formula: wherein R4, R6 and R9 each represents a hydrogen atom or a methyl group, R5 and R7 each represents a C17-23 divalent hydrocarbon group containing a bridged cyclic hydrocarbon group, R8 represents an acid-decomposable group, R10 represents a hydrogen atom or a C1-12 hydrocarbon group, x+y+z equals to 1, and x, y and z stand for 0 to 1, 0 to 1, and 0 to 0.9, respectively, and having a weight average molecular weight of from 1,000 to 500,000. According to the present invention, a chemical modification photoresist composition having high transparency to radiation of 220 nm and shorter and improved in etching resistance can be provided.

Abstract: A composition for a bottom anti-reflective coating material and a method for forming a resist pattern using the composition, which are high in the dry etching rate, high in the resolution, excellent in the resist film thickness dependency and high in the effect of preventing reflective light against exposure light, and provide no intermixing with the photoresist layer, are disclosed, wherein the composition for a bottom anti-reflective coating material comprises a naphthalene group-containing polymer compound having a specific structure.

Abstract: This invention relates to a monomer shown by the general formula [1] ##STR1## (wherein X' is a cyclic hydrocarbon residue containing polymerizable double bond(s), which may have a substituent, Z is a spacer or a direct bond and R is a substituted alkyl or alkenyl group having one or two protected hydroxyl groups as substituent) and a polymer containing a segment derived from the above monomer.The said polymer is useful for a resist composition, etc. utilized in the production of semiconductor elements, etc. and the said monomer is useful as a starting material for the polymer, and a resist composition using the said polymer can remarkably advantageously be used as a resist material for ArF excimer laser beams which has been considered to be a valuable technology for exposure belonging to the coming generation.

Abstract: There is disclosed a photoresist copolymer for DUV light, with which the fine patterns allowable for the high integration of semiconductor devices can be easily obtained in a microlithography process using DUV light. The copolymer is easily prepared by reacting at least two alicyclic olefins at a high temperature and at high pressure in the presence of an initiator.

Abstract: The oxidation of 7,14-diphenylacenaphtho[1,2-.kappa.]fluoranthene (1) at platinum or indium tin-oxide electrodes leads to deposition of a polymer film on the electrode surface that displays many interesting properties including electroactivity, fluorescence, and electrochromism. Thin films of this polymer appear deep blue in the neutral state, but become pale grey upon oxidation and light green or orange upon reduction, depending upon the voltage applied. Soluble oligomers of poly(3,10-(7,14-diphenylacenaphtho[1,2-.kappa.]fluoranthene)) are formed during oxidation of the monomer (1) via radical cation-radical cation coupling reactions and are identical to those chemically synthesized by the Ni(0)-catalyzed coupling of the 3,10-dibromo derivative of 1. Further oxidation of these oligomers leads to intramolecular coupling reactions to form ladder structures within the chains and the eventual precipitation of insoluble polymer onto the electrode.

Abstract: A pattern forming material includes a binary copolymer represented by the following general formula or a ternary or higher copolymer obtained by further polymerizing the binary copolymer with another group: ##STR1## wherein R.sub.1 indicates a hydrogen atom or an alkyl group; R.sub.2 and R.sub.3 independently indicate a hydrogen atom, an alkyl group, a phenyl group or an alkenyl group or together indicate a cyclic alkyl group, a cyclic alkenyl group, a cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group; R.sub.4 indicates a hydrogen atom or an alkyl group; x satisfies a relationship of 0<x<1; and y satisfies a relationship of 0<y<1.

Abstract: A compound represented by the following formula 1: ##STR1## wherein R.sub.1 is an unsubstituted or substituted benzyl group or unsubstituted or substituted phenyl group, method for producing a copolymer comprising copolymerizing a monomer mixture containing the compound, copolymer for lenses containing a copolymerized component represented by the following formula 2 ##STR2## and a lens consisting of the copolymer. The compound of the formula 1 is a reactive dye exhibiting excellent hydrolysis resistance, good copolymerizability with other comonomers, excellent dyeing property and proper solubility in comonomers.

Abstract: A sulfur-containing O-(meth)acrylate compound of the following formula (1) is useful as a starting material for a resin composition used in optical applications such as a lens; ##STR1## wherein R represents hydrogen atom or methyl group; 1 represents an integer from 1 to 3; B is ##STR2## n is 1 or 2, m is 1, 2 or 3 and A is selected from certain arylene, aralkylene, thioether, dithioether or thiopheneylene radicals.

Abstract: The present invention relates to (co)polymers which contain at least one repeat chain unit of the general formula (1) or (2) and optionally repeat units of the general formula (3), ##STR1## in which L.sup.1 and L.sup.2 mutually independently mean a photoluminescent residue, to a process for the production thereof, to the use thereof in electroluminescent devices and to the electroluminescent devices.

Abstract: The subject invention provides a thermoset elastomer comprising a crosslinked pseudorandom or substantially random interpolymer of: (a) from 15 to 70 weight percent of monomer units derived from at least one a-olefin, (b) from 30 to 70 weight percent of monomer units derived from at least one vinylidene aromatic compound, and (c) from 0 to 15 weight percent of monomer units derived from at least one diene. The subject invention further provides a thermoplastic vulcanizate comprising the thermoset elastomers of the invention as provided in a thermoplastic polyolefin matrix. The subject invention further provides processes for preparing the inventive thermoset elastomers and thermoplastic vulcanizates, as well as parts fabricated therefrom. The inventive materials have a superior balance of properties, as compared to EPM and EPDM based materials. The subject invention also pertains to foams and methods for their preparation.

Abstract: The present invention relates to a cycloolefin polymer having a solution viscosity <0.25 dl/g, comprising polymerized units of at least one cycloolefin and, if desired, polymerized units of one or more acyclic olefins, wherein the cycloolefin polymer has at one or both ends an olefinically unsaturated group having at least 3 carbon atoms.

Abstract: A free radical curable composition that includes a free radical curable and a vinyl aromatic compound that is chemically different than the free radical curable component, wherein the vinyl aromatic compound is present in an amount sufficient to decelerate the cure rate of the free radical composition without adversely effecting completion of cure and the properties of the curable composition after it has cured. The composition is particularly useful as a two part adhesive that includes a free radical catalyst system and a diene elastomer.

Abstract: Optically active poly(aryl)ether polymers prepared from monomers containing optically pure spirobiindane and/or indane moieties are disclosed. The chiral poly(aryl)ether polymers are of high molecular weight and exhibit high optical rotations. In addition, the polyethers are thermally stable at high temperatures and exhibit excellent hydrolytic resistance making them useful in high temperature processing applications, in the fabrication of optoelectronics devices, and as polarizing coatings and filters.

Abstract: A polymer for a photo-conductive layer and a preparation method thereof is provided. The polymer is suitable for using as a charge transporting material for a photo-conductive layer owing to its excellent electron transporting capacity as well as high solubility to a solvent and good compatibility with the binder polymer.

Abstract: Processes to prepare polymeric metallocene are provided. Said processes comprise reacting a polymeric ligand, an alkali metal compound, and a transition metal-containing compound to produce said polymeric metallocene. therefor.

Abstract: A method of tackifying an adhesive is provided, the improvement comprising the use of a copolymer consisting of monomer units derived monomers consisting of:(A) 10 to 50% by weight of a terpene with no conjugated double bonds,(B) 20 to 50% by weight of a member selected from the group consisting of olefinically unsaturated monocarboxylic acids containing 3 to 5 carbon atoms and anhydrides thereof, and olefinically unsaturated dicarboxylic acids containing 3 to 5 carbon atoms and anhydrides thereof, and(C) 40 to 50% by weight of an ester selected from the group consisting of esters and semiesters of olefinically unsaturated monocarboxylic containing 3 to 5 carbon atoms and esters and semiesters of olefinically unsaturated dicarboxylic acids containing 3 to 5 carbon atoms, with the proviso that the sum total of said monomers is 100% by weight.

Abstract: A contact lens colored with a poly(meth)acrylate-combined metallophthalocyanine compound represented by the following formula (I): ##STR1## wherein M represents a metal atom to which phthalocyanine can coordinate, R represents a halogen atom, m is an integer of 0 to 4, R.sup.1 represents a hydrogen atom or a methyl group, and A represents a hydrogen atom, a C.sub.1-12 alkyl group, a hydroxyC.sub.1-12 alkyl group or a glycerol group. The colored contact lens has sufficiently high fastness, so that the lens undergoes neither color change nor color fading even when it is sterilized by boiling.

Abstract: Addition polymers containing functionally substituted polycyclic repeat units are prepared in the presence of a single or multicomponent catalyst system containing a palladium metal ion source. The catalysts are not poisoned by functional substituents and show good catalytic activity for polymerizing both endo and exo isomers of the substituted monomers. Optionally, the polymers are terminated with olefinic end groups.