From Monomer Containing Three Or More Oxygen Atoms Bonded To A Single Sulfur Atom, E.g., Sulfonate, Etc. Patents (Class 526/287)
-
Patent number: 8552126Abstract: The present invention relates to an aqueous polymer dispersion whose dispersed addition polymer P comprises, copolymerized in free-radically polymerized form, at least one polar monomer having a water solubility of greater than 50 g/liter (measured at 20° C.), and obtainable by free-radically initiated aqueous emulsion polymerization, the polar monomer being metered to the reaction mixture during the polymerization process at a variable, i.e., nonconstant rate, for example in the sense of a rate gradient. The present invention further relates to processes for preparing these aqueous polymer dispersions, to their use as binders and/or in coatings, and also to coatings comprising the polymer dispersion of the invention.Type: GrantFiled: February 17, 2012Date of Patent: October 8, 2013Assignee: BASF SEInventors: Ekkehard Jahns, Sebastian Roller
-
Patent number: 8552130Abstract: Presently described are polymerizable ionic liquids comprising a cation and an aromatic carboxylate anion; wherein the cation, anion, or both comprise a free-radically polymerizable group. Also described are curable compositions comprising such polymerizable ionic liquids and at least one other free-radically polymerizable monomer, oligomer, or polymer.Type: GrantFiled: May 16, 2011Date of Patent: October 8, 2013Assignee: 3M Innovative Properties CompanyInventors: Kevin M. Lewandowski, Yizhong Wang, Larry R. Krepski, Joel D. Oxman, Peiwang Zhu
-
Patent number: 8536251Abstract: The invention relates to a copolymer comprising i) 3 to 40 mol % of an isoprenolpolyether derivative structural unit ? ii) 3 to 40 mol % of a vinyloxypolyether derivative structural unit ? and iii) 35 to 93 mol % of an acid structural unit ?, the structural units of the copolymer which belong to the vinyloxypolyether derivative structural unit ? having longer side chains than the structural units which belong to the isoprenolpolyether derivative structural unit ?.Type: GrantFiled: November 25, 2009Date of Patent: September 17, 2013Assignee: Construction Research & Technology GmbHInventors: Silke Flakus, Klaus Lorenz, Helmut Mack, Christian Scholz, Petra Wagner, Barbara Wimmer, Angelika Hartl, Martin Winklbauer, Manfred Bichler
-
Publication number: 20130236528Abstract: The present invention provides an allergen inhibitor which effectively prevents allergens from reacting with specific antibodies, mitigates the allergic symptoms or prevents appearance thereof, and is less likely to cause unpredictable discoloration and discoloration under usual conditions. The allergen inhibitor of the present invention comprises an allergen-inhibiting compound including a linear polymer having at least one of substituents represented by the formulas (1) to (3) at a side chain. Thus, the allergen inhibitor of the present invention shows excellent allergen-inhibiting effects.Type: ApplicationFiled: April 25, 2013Publication date: September 12, 2013Applicant: Sekisui Chemical Co., Ltd.Inventors: Akihiko FUJIWARA, Taro SUZUKI, Mitsuhito TERAMOTO, Taro SUZUKI, Mitsuhito TERAMOTO
-
Patent number: 8530574Abstract: The present invention provides aqueous finely divided polymer dispersions which at low temperatures are film-forming, exhibit good blocking resistance in a formulation, even at elevated temperatures, and display a low foam tendency, processes for preparing them, and their use as binders for coating substrates.Type: GrantFiled: July 19, 2010Date of Patent: September 10, 2013Assignee: BASF SEInventors: Roelof Balk, Franca Tiarks, Arno Tuchbreiter
-
Publication number: 20130216906Abstract: Provided is a binder for secondary battery electrodes comprising a polymer obtained by polymerizing three or more kinds of monomers with a reactive emulsifying agent. The binder reduces moisture impregnation, improves dispersibility and enhances adhesive force, thus providing a secondary battery with superior safety and cycle characteristics.Type: ApplicationFiled: July 13, 2011Publication date: August 22, 2013Applicant: LG CHEM, LTD.Inventors: MinAh Kang, Young-Min Kim, Chang Bum Ko, Ok Sun Kim
-
Patent number: 8507176Abstract: Provided are radiation-sensitive polymers and compositions which may be used in photolithographic processes. The polymers and compositions provide enhanced sensitivity to activating radiation.Type: GrantFiled: December 30, 2010Date of Patent: August 13, 2013Assignee: Rohm and Haas Electronic Materials LLCInventors: James W. Thackeray, Emad Aqad
-
Publication number: 20130203866Abstract: The invention relates to a polymer which can be obtained by radical emulsion polymerization of at least one acidic vinyl monomer or salt thereof, at least one non-ionic vinyl monomer, in particular preferably a hydrophobic non-ionic vinyl monomer, at least one monomer containing an unsaturated terminal group and a polyoxyalkyene portion, at least one crosslinking monomer, optionally a protective colloid, and is characterized in that the polymerization is controlled such that the gelling effect occurs at least at times, which is achieved by the monomer addition (dosing time) taking place for 40 minutes, particularly preferably for 30 minutes.Type: ApplicationFiled: March 21, 2011Publication date: August 8, 2013Inventors: Vesna Aleksandrovic-Bondzic, Sascha Mertens, Stephan Foerster
-
Patent number: 8501382Abstract: There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed.Type: GrantFiled: February 19, 2010Date of Patent: August 6, 2013Assignee: The Research Foundation of State Univ. of New YorkInventor: Robert L. Brainard
-
Patent number: 8497315Abstract: The present invention pertains to a process for the preparation of aqueous dispersions which are stabilized with a water-insoluble stabilizing colloid, characterized in that a) in a first step a water-insoluble stabilizing colloid is prepared, with this being prepared, based on the amount of monomer used for the preparation of the stabilizing colloid, by means of radical polymerization, followed by b) the addition of at least one further olefinically unsaturated monomer and at least one initiator, in which process by means of radical polymerization of the further olefinically unsaturated monomer an aqueous dispersion is obtained, on which c) optionally a residual monomer reduction is performed, with this being carried out by means of polymerization of residual monomers and/or by means of physical removal of the residual monomers and optionally further volatile organic components by means of the introduction of vapor and/or gas.Type: GrantFiled: November 15, 2007Date of Patent: July 30, 2013Assignee: Akzo Nobel N.V.Inventors: Hongli Willimann, Jakob Wolfisberg, Ulf Kehrer
-
Publication number: 20130184420Abstract: To provide a monomer composition containing an unsaturated polyalkylene glycol ether-based monomer and having excellent stability. Provided is a monomer composition containing an unsaturated polyalkylene glycol ether-based monomer represented by the following chemical formula (1): YO(R1O)nR2??(1) [in the formula, Y represents an alkenyl group having 2 to 7 carbon atoms; R1O represents one or two or more types of oxyalkylene groups having 2 to 18 carbon atoms; n represents an average addition mole number of oxyalkylene groups and is a number of 5 to 500; and R2 represents a hydrogen atom or a hydrocarbon group having 1 to 30 carbon atoms], an organic acid, and water, and having a pH of 4 to 13.Type: ApplicationFiled: September 22, 2011Publication date: July 18, 2013Applicant: NIPPON SHOKUBAI CO., LTD.Inventor: Hiroshi Kawabata
-
Publication number: 20130177980Abstract: Provided herein is a synthetic polymer-based hydrogel for the self-renewal and expansion of human stem cells such as embryonic stem cells (ESCs) and induced pluripotent stem cells (iPSCs). Also provided are methods of making and using the same.Type: ApplicationFiled: December 6, 2012Publication date: July 11, 2013Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIAInventors: Shyni Varghese, Chien-Wen Chang, Yongsung Hwang
-
Publication number: 20130172490Abstract: In one embodiment of the disclosure, a copolymer and method for manufacturing the same are provided. The copolymer is copolymerized from a composition including: (a) a first hydrophilic monomer, including itaconamic acid, itaconamic salt, or combinations thereof; and (b) a second hydrophilic monomer, including acrylic acid, acrylic salt, acrylamide, or combinations thereof.Type: ApplicationFiled: September 14, 2012Publication date: July 4, 2013Inventors: Tun-Fun WAY, Yu-Ting CHEN, Jiun-Jy CHEN, Kelly TENG
-
Patent number: 8476388Abstract: Polymers useful as catalysts in non-enzymatic saccharification processes are provided. Provided are also methods for hydrolyzing cellulosic materials into monosaccharides and/or oligosaccharides using these polymeric acid catalysts.Type: GrantFiled: October 22, 2012Date of Patent: July 2, 2013Assignee: Midori Renewables, Inc.Inventors: John M. Geremia, Brian M. Baynes, Ashish Dhawan
-
Patent number: 8470513Abstract: A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). R1 represents a hydrogen atom or a methyl group. Each R2 independently represents one of a linear or branched alkyl group having 1 to 12 carbon atoms, a linear or branched alkoxy group having 1 to 12 carbon atoms, and an alicyclic hydrocarbon group having 3 to 25 carbon atoms. p is an integer from 0 to 3, and q is an integer from 1 to 3, and p+q?5. A chemically-amplified positive-tone resist film that is sensitive to extreme ultraviolet rays (EUV) can be formed using the radiation-sensitive resin composition.Type: GrantFiled: September 23, 2011Date of Patent: June 25, 2013Assignee: JSR CorporationInventors: Kota Nishino, Ken Maruyama, Daisuke Shimizu, Toshiyuki Kai
-
Publication number: 20130143163Abstract: A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a composition comprising a copolymer of hydroxystyrene with acenaphthylene and/or vinylnaphthalene and a mixture of an alcohol solvent and an ether or aromatic solvent.Type: ApplicationFiled: December 6, 2012Publication date: June 6, 2013Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventor: SHIN-ETSU CHEMICAL CO., LTD.
-
Publication number: 20130137626Abstract: The invention relates to microcapsules, the capsule walls of which comprise a resin that can be obtained by reacting a) at least one compound selected from the group consisting of a1) amines and a2) aromatic or heteroaromatic compounds which are unsubstituted or substituted with one or more substituents from the group consisting of C1-C20-alkyl, OH, OR, COOH, SH, SR, NHCOR, OCOR, halogen, or an aromatic compound, where R is a C1-C10-alkyl group, with b) at least one aldehydic component that contains at least two carbons atoms per molecule, in the presence of c) at least one copolymer which contains units of 2-acrylamido-2-methylpropane sulphonic acid or salts (AMPS) thereof and/or 2-acrylamido-2-methylpropane phosphonic acid or salts (AMPP) thereof and units of one or more (meth)acrylates.Type: ApplicationFiled: March 14, 2011Publication date: May 30, 2013Applicant: FOLLMANN & CO. GESELLSCHAFT FÜR CHEMIE-WERKSTOFFE UND VERFAHRENSTECHNIK MBH & CO. KGInventors: Klaus Last, Daniel Mues
-
Patent number: 8440385Abstract: A positive resist composition including a base component (A?) which exhibits increased solubility in an alkali developing solution under the action of acid and generates acid upon exposure, the base component (A?) including a resin component (A1) having a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group (wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof).Type: GrantFiled: December 27, 2010Date of Patent: May 14, 2013Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Hirano, Daiju Shiono, Masatoshi Arai
-
Publication number: 20130109823Abstract: The present invention provides novel polymers having chelating functionality and comprising units derived from an ethylenically unsaturated aminocarboxylate monmomer which comprises units derived from ethylenediamino disuccinic acid or its salt and a polymerizable ethylenically unsaturated monomer. The polymerizable ethylenically unsaturated monomer may be selected from divinylbenzene monoepoxide, allylglicidyl ether, and glycidyl(meth)acrylate. The polymer may also comprise units derived from one or more ethylenically unsaturated monomers.Type: ApplicationFiled: October 31, 2012Publication date: May 2, 2013Applicant: ROHM AND HAAS COMPANYInventor: Rohm and Haas Company
-
Publication number: 20130090269Abstract: The present invention relates to a dendritic comb-shaped polymer thickening agent and preparation and application thereof; it is a copolymer obtained by copolymerization of monomer (A) and monomer (B). Monomer (A) is one or more water-soluble unsaturated monomers with olefin chain, and monomer (B) is at least one monomer with the following general structure: wherein R1, R2 is selected from H or C1˜C12 alkyl group, respectively; R3, R4, R5 is selected from H or C1˜C8 alkyl group, C1˜C8 alkylaryl group, C1˜C8 alkyl ether or C1˜C8 alkyl ester group, respectively; A? is selected from COO? or OH. The content of the monomer (A) is 70˜99.99% of the total mass of the monomer (A) and the monomer (B), and the content of monomer (B) is 0.01˜30% of the total mass of the monomer (A) and the monomer (B). The viscosity of the polymer solution with the present polymer is 30% higher than that with common polyacrylamide and it is used in polymer flooding for oil reservoir with permeability lower than 400 mD in oilfields.Type: ApplicationFiled: June 11, 2010Publication date: April 11, 2013Applicant: Petrochina Company LimitedInventors: Jianhui Luo, Huaijiang Zhu, Fengluan Bai, Pingmei Wang, Bin Ding, Jingbo Yang, Qiang Liu, Yuzhang Liu
-
Patent number: 8409721Abstract: This invention provides a method for producing a pigment-dispersing resin which contains divalent group(s) represented by a general formula (I): (in which R1 stands for C1-10 alkylene group, m is an integer of 1-30, and the m recurring units, ?may be the same or different), phosphoric acid group(s) and/or sulfonic acid group(s), characterized by copolymerizing a polymerizable unsaturated monomeric mixture in a reaction solvent containing at least 30 mass %, based on the total mass of the reaction solvent, of an organic solvent having no hydroxyl group and having a solubility in 20° C. water of at least 100 mass %.Type: GrantFiled: April 24, 2008Date of Patent: April 2, 2013Assignee: Kansai Paint Co., Ltd.Inventors: Masami Kobata, Noriyuki Yamada, Hiromi Harakawa
-
Publication number: 20130072405Abstract: The present invention refers to the use of anionic water-soluble polymers being partially or totally neutralized with an organic counter-ion for oil filed application, especially tertiary oil recovery steps.Type: ApplicationFiled: January 26, 2011Publication date: March 21, 2013Inventors: Cédrick Favero, Nicolas Gaillard, Dennis Marroni
-
Patent number: 8394887Abstract: A fluoropolymer comprising: (A) repeating unit derived from an S-sulfate monomer having an —S—SO3— group and carbon to carbon double bond; and (B) repeating unit derived from a fluoromonomer having a fluorine atom and carbon to carbon double bond. This fluoropolymer can be a constituent of water/oil repellent agent having excellent water/oil repelling capability, and is stable in air and permits an arbitrary control of crosslinking.Type: GrantFiled: April 6, 2006Date of Patent: March 12, 2013Assignee: Daikin Industries, Ltd.Inventors: Kiyoshi Yamauchi, Shinichi Minami, Ikuo Yamamoto
-
Publication number: 20130058888Abstract: Compositions comprising soil adsorption polymers for reducing particulates in the air are provided.Type: ApplicationFiled: September 1, 2011Publication date: March 7, 2013Inventors: Robert Joseph MCCHAIN, Robin Lynn McKiernan, Charles William Neal, Chisomaga Ugochi Nwachukwu, Steven Daryl Smith
-
Publication number: 20130059997Abstract: Soil adsorption polymers and method for making same are provided.Type: ApplicationFiled: August 30, 2012Publication date: March 7, 2013Inventors: Steven Daryl Smith, Robert Joseph McChain, Robert Lynn McKiernan, Charles William Neal
-
Publication number: 20130059766Abstract: A cleaning composition including a soil capture agent for cleaning objects.Type: ApplicationFiled: August 30, 2012Publication date: March 7, 2013Inventors: Robin Lynn McKiernan, Steven Daryl Smith, Robert Joseph McChain, Charles William Neal
-
Publication number: 20130059998Abstract: Amino acid-based poly(ester amide) (PEA) macromers (e.g., functional PEA macromers) and methods for preparing amino acid-based poly(ester amide) (PEA) macromers. The functional PEA macromers can comprise functional groups such as hydroxyl, amine, sulfonic acids, carboxyl, thiol and acryloyl at the two terminuses of the PEA macromers. The content of the terminal functional groups on the macromers can be precisely controlled by adjusting the molar ratio of reactive monomers. The resulting versatility of these new functional PEA macromers can be used to fabricate a wide range of PEAs and PEA hybrid derivatives with very different chemical, physical, mechanical, thermal and biological properties. The functional PEA macromers can also be polycondensed into forming block PEA polymers.Type: ApplicationFiled: March 9, 2011Publication date: March 7, 2013Inventors: Chih-Chang Chu, Mingxiao Deng
-
Patent number: 8389202Abstract: A polymer includes a repeating unit shown by a general formula (1). R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms. Y represents a carbon atom. X represents —X1Z1X2— which is an atomic group which forms a cyclic structure including a heteroatom together with Y. Z1 represents —O—, —S—, —CO—, —COO—, —SO—, or —SO2—. Each of X1 and X2 individually represents a single bond, a methylene group, or an alkylene group having 2 to 25 carbon atoms. Each of X1 and X2 is unsubstituted or substituted with a substituent, and optionally a carbon atom included in X1 and a carbon atom included in X2 are bonded via a divalent group.Type: GrantFiled: March 22, 2012Date of Patent: March 5, 2013Assignee: JSR CorporationInventors: Ken Maruyama, Toru Kimura
-
Patent number: 8383749Abstract: The invention relates to a pigment preparation containing (i) at least one organic and/or inorganic pigment, (ii) a dispersant that can be obtained by the polmerization of monomers [A], [B], [C] and [D], where [A] is a monomer of formula (I) wherein A is C2-C4 alkylene and B is a C2-C4 alkylene different from A, and R is hydrogen or methyl, [B] is a monomer of formula (II) wherein D is C3 alkylene, R is hydrogen or methyl, and o is a number between 2 and 500, [C] is an ethylenically unsaturated monomer containing an aromatic group; and [D] is an ethylenically unsaturated monomer containing an alkyl radical.Type: GrantFiled: July 17, 2009Date of Patent: February 26, 2013Assignee: Clariant Finance (BVI) LimitedInventors: Bjoern Fechner, Carsten Schaefer, Alexander Woerndle, Dietmar Beck
-
Patent number: 8383735Abstract: A pre-cursor block copolymer for sulfonation which, prior to hydrogenation, has the general configuration A-B-A, A-B-A-B-A, (A-B-A)nX, (A-B)nX, A-D-B-D-A, A-B-D-B-A, (A-D-B)nX, (A-B-D)nX or mixtures thereof, wherein A, B and D blocks do not contain any significant levels of olefinic unsaturation. Each A and D block is a polymer block resistant to sulfonation, and each B block is a polymer block susceptible to sulfonation. Each A block is a segment of one or more polymerized para-substituted styrene monomers, each B block contains segments of one or more vinyl aromatic monomers selected from polymerized (i) unsubstituted styrene monomers, (ii) ortho-substituted styrene monomers, (iii) meta-substituted styrene monomers, (iv) alpha-methylstyrene, (v) 1,1-diphenylethylene, (vi) 1,2-diphenylethylene and (vii) mixtures thereof, and each D block contains polymers having a glass transition temperature less than 20° C. and a number average molecular weight of between 1,000 and 50,000.Type: GrantFiled: April 20, 2010Date of Patent: February 26, 2013Assignee: Kraton Polymers US LLCInventors: Carl Lesley Willis, Dale Lee Handlin, Jr., Scott Russell Trenor, Brian Douglas Mather
-
Patent number: 8372929Abstract: The invention relates to copolymers that can be obtained by the polymerization of monomers (A), (B), (C) and (D), where (A) is a monomer of formula (I) wherein A is C2-C4 alkylene and B is a C2-C4 alkylene different from A, R is hydrogen or methyl, m is a number between 1 and 500, and n is a number between 1 and 500, the sum of m+n being equal to between 2 and 1000; (B) is a monomer of formula (II) wherein D is C3 alkylene, R is hydrogen or methyl, and o is a number between 2 and 500; (C) is an ethylenically unsaturated monomer containing an aromatic group; and (D) is an ethylenically unsaturated monomer containing an alkyl radical.Type: GrantFiled: July 17, 2009Date of Patent: February 12, 2013Assignee: Clariant Finance (BVI) LimitedInventors: Bjoern Fechner, Carsten Schaefer, Alexander Woerndle
-
Patent number: 8362180Abstract: Water-soluble, hydrophobically associating copolymers which comprise new types of hydrophobically associating monomers. The monomers comprise an ethylenically unsaturated group and a polyether group with block structure comprising a hydrophilic polyalkylene oxide block which consists essentially of ethylene oxide groups, and a terminal, hydrophobic polyalkylene oxide block which consists of alkylene oxides with at least 4, preferably at least 5 carbon atoms.Type: GrantFiled: May 20, 2010Date of Patent: January 29, 2013Assignee: BASF SEInventors: Roland Reichenbach-Klinke, Thomas Pfeuffer, Kati Schmidt, Thomas Ostrowski, Reinhold J Leyrer, Yulia Fogel, Stefan Friedrich, Peter Gaeberlein, Andrea Orleans, Manfred Schuhbeck, Marcus Guzmann, Markus Rösch, Björn Langlotz
-
Patent number: 8349410Abstract: A polymer formed by controlled radical polymerization includes groups that can be modified after controlled radical polymerization to form a radical. The polymer can be the reaction product of a controlled radical polymerization of radically polymerizable monomers, wherein at least one of the radically polymerizable monomers includes at least one group that can be modified after the controlled radical polymerization to form a radical. A compound includes a first group that is stimulated upon application of energy to the molecule to tether the molecule to a surface or to another polymer chain and a second group comprising a controlled radical polymerization initiator functionality. A block copolymer includes at least a first segment to impart a predetermined functionality to a target surface and at least a second segment including functional groups to interact with the targeted surface to attach the block copolymer to the surface.Type: GrantFiled: August 17, 2007Date of Patent: January 8, 2013Assignees: University of Pittsburgh—of the Commonwealth System of Higher Education, Carnegie Mellon UniversityInventors: Jinyu Huang, Alan J. Russell, Nicolay V. Tsarevsky, Krzysztof Matyjaszewski
-
Patent number: 8349981Abstract: The invention relates to anionically modified copolymers that can be obtained by the polymerization of monomers (A), (B), (C) and (D) in order to obtain non-ionic copolymers comprising reactive terminal OH groups, and subsequent reaction of the terminal OH groups to form anionic end groups, where A) is a monomer of formula (I) wherein A is C2-C4 alkylene and B is a C2-C4 alkylene different from A, and R is hydrogen or methyl; (B) is a monomer of formula (II) wherein D is C3 alkylene, R is hydrogen or methyl, and o is a number between 2 and 500; (C) is an ethylenically unsaturated monomer containing an aromatic group; and (D) is an ethylenically unsaturated monomer containing an alkyl radical.Type: GrantFiled: July 17, 2009Date of Patent: January 8, 2013Assignee: Clariant Finance (BVI) LimitedInventors: Bjoern Fechner, Carsten Schaefer, Alexander Woerndle
-
Patent number: 8349979Abstract: An admixture comprises an aqueous composition of a) a copolymeric dispersing component, b) an antifoaming agent component, c) a surfactant component, and d) water. The components may be a blend or physically or chemically attached and result in a stable liquid system that can be used as a dispersing agent for a calcium sulfate compound containing construction chemicals composition.Type: GrantFiled: August 12, 2008Date of Patent: January 8, 2013Assignee: BASF Construction Polymers GmbHInventors: Herbert Hommer, Frank Dierschke, Anja Trieflinger, Konrad Wutz, Manfred Bichler
-
Publication number: 20130001751Abstract: An actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) which includes a repeating unit (A) having an ionic structural moiety which generates an acid anion by being decomposed due to irradiation with actinic rays or radiation, a repeating unit (B) having a proton acceptor moiety, and a repeating unit (C) having a group which generates an alkali soluble group by being decomposed by the action of an acid, and the resin (P) has at least one repeating unit which is represented by the general formulae (I) to (III) below as the repeating unit (A) (the reference numerals in the general formulae represent the meaning of the description in the scope of the claims and the specifications).Type: ApplicationFiled: June 29, 2012Publication date: January 3, 2013Applicant: FUJIFILM CORPORATIONInventor: Naoki INOUE
-
Patent number: 8344084Abstract: An admixture comprises an aqueous composition of a) a copolymeric dispersing component, b) an antifoaming agent component, c) a surfactant component, and d) water. The components may be a blend or physically or chemically attached and result in a stable liquid system that can be used as a dispersing agent for a calcium sulfate compound containing construction chemicals composition.Type: GrantFiled: September 22, 2010Date of Patent: January 1, 2013Assignee: BASF Construction Polymers GmbHInventors: Manfred Bichler, Herbert Hommer, Frank Dierschke, Anja Trieflinger, Konrad Wutz
-
Publication number: 20120322920Abstract: The invention relates to polymers that can be obtained by polymerizing the monomers (A), (B), and (D), and optionally (C), where (A) is a monomer of formula (I), wherein A stands for C2 to C4 alkylene, B stands for a C2 to C4 alkylene different from A, R stands for hydrogen or methyl, m stands for a number from 1 to 500, n stands for a number from 1 to 500, (B) is an ethylenically unsaturated monomer that contains at least one carboxylic acid function, (C) is optionally a further ethylenically unsaturated monomer different from (A) and (B), (D) is a monomer of formula (II), wherein D stands for C2 to C4 alkylene, E stands for a C2 to C4 alkylene group different from D, F stands for a C2 to C4 alkylene group different from E, R stands for hydrogen or methyl, o stands for a number from 1 to 500, p stands for a number from 1 to 500, q stands for a number from 1 to 500, and wherein the weight fraction of the monomers is 35 to 99% for the macromonomer (A), 0.Type: ApplicationFiled: February 15, 2011Publication date: December 20, 2012Applicant: Clariant Finance (BVI) LimitedInventors: Carsten Schaefer, Oliver Mogck
-
Patent number: 8334350Abstract: The present invention relates to an aqueous polymer dispersion whose dispersed addition polymer P comprises, copolymerized in free-radically polymerized form, at least one polar monomer having a water solubility of greater than 50 g/liter (measured at 20° C.), and obtainable by free-radically initiated aqueous emulsion polymerization, the polar monomer being metered to the reaction mixture during the polymerization process at a variable, i.e., nonconstant rate, for example in the sense of a rate gradient. The present invention further relates to processes for preparing these aqueous polymer dispersions, to their use as binders and/or in coatings, and also to coatings comprising the polymer dispersion of the invention.Type: GrantFiled: December 16, 2008Date of Patent: December 18, 2012Assignee: BASF SEInventors: Ekkehard Jahns, Sebastian Roller
-
Patent number: 8329827Abstract: A sulfonated block copolymer which is solid and non-dispersible in water having at least two polymer end blocks A and at least one interior block B wherein each A block is a polymer block resistant to sulfonation and each B block is a polymer block susceptible to sulfonation, wherein the A and B blocks do not contain any significant levels of olefinic unsaturation. Each A block includes one or more segments selected from polymerized (i) ethylene, (ii) monomers of conjugated dienes having a vinyl content less than 35 mol percent prior to hydrogenation, and (iii) mixtures thereof; and each B block comprising segments of one or more polymerized vinyl aromatic monomers selected from (i) unsubstituted styrene monomers, (ii) ortho-substituted styrene monomers, (iii) meta-substituted styrene monomers, (iv) alpha-methylstyrene, (v) 1,1-diphenylethylene, (vi) 1,2-diphenylethylene and (vii) mixtures thereof.Type: GrantFiled: April 20, 2010Date of Patent: December 11, 2012Assignee: Kraton Polymers U.S. LLCInventors: Carl Lesley Willis, Dale Lee Handlin, Jr., Scott Russell Trenor, Brian Douglas Mather
-
Publication number: 20120301817Abstract: An actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit represented by the following formula (1), a resist film using the composition, and a pattern forming method.Type: ApplicationFiled: January 27, 2011Publication date: November 29, 2012Applicant: FUJIFILM CORPORATIONInventors: Takeshi Inasaki, Takayuki Ito, Tomotaka Tsuchimura, Tadateru Yatsuo, Koutarou Takahashi
-
Patent number: 8318882Abstract: The invention relates to anionically modified copolymers that can be obtained by the polymerization of the monomers (A), (B) and (C), obtaining non-ionic polymers containing reactive terminal OH groups, and by subsequent conversion of the terminal OH groups to form anionic end groups, (A) being a monomer of formula (I) wherein A is C2-C4 alkylene and B is a C2-C4alkylene different from A, k corresponds to the number 0 or 1, m is a number between 0 and 500, preferably between 0 and 50, n is a number between 0 and 500, preferably between 0 and 50, the sum of m+n being equal to between 1 and 1000; (B) contains an ethylenically unsaturated monomer containing an aromatic group; and (C) is an ethylenically unsaturated monomer containing an alkyl radical.Type: GrantFiled: July 23, 2008Date of Patent: November 27, 2012Assignee: Clariant Finance (BVI) LimitedInventors: Bjoern Fechner, Carsten Schaefer, Alexander Woerndle
-
Patent number: 8318880Abstract: The invention relates to anionically modified copolymers that can be produced by the polymerization of monomers (A), (B) and (C) to obtain non-ionic polymers with reactive terminal OH groups and by the subsequent reaction of the terminal OH groups to form anionic end groups. According to the invention, (A) is a monomer of formula (I), in which A represents C2-C4 alkene and B represents a C2-C4 alkene that is different from A, R represents hydrogen or methyl, m is a number between 1 and 500, n is a number between 1 and 500, (B) is an ethylenically unsaturated monomer containing an aromatic group and (C) is a ethylenically unsaturated monomer.Type: GrantFiled: April 29, 2008Date of Patent: November 27, 2012Assignee: Clariant Finance (BVI) LimitedInventors: Bjoern Fechner, Carsten Schaefer, Alexander Woerndle
-
Patent number: 8318881Abstract: The invention relates to a copolymer that can be obtained by the polymerisation of monomers (A), (B) and (C), (A) being a monomer of formula (I), in which A represents a C2 to C4alkene and B represents a C2 to C4alkene that is different from A, R represents hydrogen or methyl, m is a number between 1 and 500, n is a number between 1 and 500, (B) is an ethylenically unsaturated monomer containing an aromatic group and (C) is an ethylenically unsaturated monomer containing an alkyl radical. The claimed copolymers are suitable for use as dispersants for pigments.Type: GrantFiled: April 29, 2008Date of Patent: November 27, 2012Assignee: Clariant Finance (BVI) LimitedInventors: Bjoern Fechner, Carsten Schaefer, Alexander Woerndle
-
Publication number: 20120279707Abstract: Methods of providing a cementing fluid comprising an aqueous liquid, a hydraulic cement, and a cement suspending agent that comprises a crosslinked particulate formed by a reaction comprising a first monofunctional monomer, a primary crosslinker, and a secondary crosslinker; placing the cementing fluid in a wellbore penetrating a subterranean formation; and allowing the cementing fluid to set therein.Type: ApplicationFiled: May 5, 2011Publication date: November 8, 2012Applicant: Halliburton Energy Services, Inc.Inventors: Gary P. Funkhouser, Matthew G. Kellum
-
Publication number: 20120276503Abstract: Presently described are curable dental compositions comprising a polymerizable ionic liquid. The polymerizable ionic liquid comprises one or more ethylenically unsaturated (e.g. free-radically polymerizable) groups. Various embodiments of curable dental compositions are described. In some embodiments, the polymerizable ionic liquid is a monofunctional polymerizable ionic liquid comprising an ethylenically unsaturated group. In other embodiments, the polymerizable ionic liquid is a multi-functional polymerizable ionic liquid comprising at least two ethylenically unsaturated groups. The curable dental compositions describe herein can be utilized as dental primers, dental adhesives, dental sealants, and dental composites. In many embodiments, the curable dental compositions further comprise an initiator such as a photoinitiator.Type: ApplicationFiled: December 6, 2010Publication date: November 1, 2012Applicant: 3M INNOVATIVE PROPERTIES COMPANYInventors: Yizhong Wang, Joel D. Oxman, Larry R. Krepski, Peiwang Zhu, Kevin M. Lewandowski, Brian N. Holmes
-
Patent number: 8299192Abstract: Statistic comb polymers obtainable by the radical copolymerization of a vinylic poly(alkylenoxide) compound (A) with an ethylenically unsaturated monomer compound (B) according to the catalytic chain transfer method (CCT). The comb polymers are extremely suitable for hydraulic binder suspensions based on cement, lime, gypsum and anhydrite as they have, for the same dosage, an improved water reducing power over conventional flow agents. The corresponding building material mixtures are characterized by a substantially reduced stickiness and plastic viscosity once said comb polymers are added, which dramatically improves the plasticity of very cement-rich building material mixtures, such as concretes. The building material mixtures using the inventive flow agents have a considerably increased slump flow and an increased shear-thinning behavior as compared to conventional concretes without the tendency to segregate.Type: GrantFiled: August 17, 2004Date of Patent: October 30, 2012Assignee: Construction Research & Technology GmbHInventors: Alexander Kraus, Gerhard Albrecht, Christian Hübsch, Harald Grassl, Angelika Hartl
-
Patent number: 8298748Abstract: A positive resist composition including a base component (A?) which exhibits increased solubility in an alkali developing solution under action of acid and generates acid upon exposure, the base component (A?) including a polymeric compound (A1?) having a structural unit (a5-1) represented by general formula (a5-1), a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) that generates acid upon exposure, the structural unit (a0-2) containing a group represented by general formula (a0-2?) (wherein X? represents an anion moiety represented by one of general formulas (1) to (5)).Type: GrantFiled: May 17, 2010Date of Patent: October 30, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takehiro Seshimo, Yoshiyuki Utsumi, Yoshitaka Komuro, Takeyoshi Mimura, Daichi Takaki
-
Publication number: 20120270155Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic caType: ApplicationFiled: April 18, 2012Publication date: October 25, 2012Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Yoshitaka Komuro, Yoshiyuki Utsumi, Akiya Kawaue, Masatoshi Arai
-
Patent number: 8278405Abstract: There is provided a vinylphenoxy polymer having at least one monomeric unit selected from the group consisting of Formula Ia, Formula Ib and Formula Ic: In the formulae: Y is —OR1SO3Z; R1 is an alkylene group having 1-10 carbon atoms; R2 is an alkyl group or alkoxy group; Z is H or a Group 1 metal; a is an integer from 0 to 4; b is an integer from 0 to 3; and c is an integer from 0 to 2.Type: GrantFiled: December 22, 2009Date of Patent: October 2, 2012Assignee: E I du Pont de Nemours and CompanyInventors: Shawn Yeisley, Che-Hsiung Hsu