Hydroxyl Group Patents (Class 526/318.42)
  • Publication number: 20100120924
    Abstract: The present invention provides a novel base material for a dry solid dispersion, a solid dispersion containing the base material, and a composition containing the dispersion; the solid dispersion of the present invention, which contains a poorly soluble component with improved dissolvability, can be obtained by mixing a polyvinyl alcohol-based copolymer, as a base material for the dry solid dispersion, with a poorly soluble component, and then heating it.
    Type: Application
    Filed: April 15, 2008
    Publication date: May 13, 2010
    Applicant: DAIDO CHEMICAL CORPORATION
    Inventors: Shunji Uramatsu, Akane Kida, Hitoshi Shinike, Toshinobu Uemura, Yoshinobu Fukumori
  • Patent number: 7709052
    Abstract: Alkyldiketene-containing aqueous polymer dispersions which are obtainable by miniemulsion polymerization of hydrophobic monoethylenically unsaturated monomers in the presence of alkyldiketenes, processes for the preparation of such polymer dispersions and the use of the thus obtainable dispersions as sizes for paper or as water repellents for leather, natural and/or manmade fibers and textiles.
    Type: Grant
    Filed: October 9, 2003
    Date of Patent: May 4, 2010
    Assignee: BASF Aktiengesellschaft
    Inventors: Rainer Dyllick-Brenzinger, Roland Ettl, Franca Tiarks, Ulrich Riebeling
  • Patent number: 7649067
    Abstract: The present invention relates to a vinyl ester based polymer latex composition obtainable by free radical emulsion polymerization in substantial absence of a protective colloid and in the presence of no or small amounts of a surfactant, and to a process of making the same. The invention further pertains to a dispersion incorporating said vinyl ester based polymer latex composition, products comprising said dispersion, and various uses of the dispersion.
    Type: Grant
    Filed: October 19, 2005
    Date of Patent: January 19, 2010
    Assignee: Wacker Polymers, L.P.
    Inventors: Helmut Zecha, Holger Kuenstle
  • Patent number: 7638563
    Abstract: The polycarboxylic acid concrete admixture of the present invention exhibits properties such as decreasing the concrete viscosity, improving the slump-retaining ability, and suppressing bleeding water, and is improved in the ability to cement compositions or the like. The above-mentioned polycarboxylic acid concrete admixture comprises a polycarboxylic acid polymer containing a polyalkylene glycol in the side chain, wherein the polycarboxylic acid polymer is obtained by polymerizing monomer components containing an alkyl (meth)acrylate monomer and a specific polyalkylene glycol unsaturated monomer and unsaturated carboxylic acid (salt) monomer, and it has a specific weight average molecular weight.
    Type: Grant
    Filed: May 7, 2004
    Date of Patent: December 29, 2009
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Tomotaka Nishikawa, Toru Uno, Hirokazu Yamamoto, Yukiko Nishikawa, Hiromichi Tanaka, Tomiyasu Ueta
  • Publication number: 20090298722
    Abstract: This invention provides acrylate polymers having at least two different ester groups. The ester groups are selected from the following: a) an aralkyl group; b) a linear alkylether group; c) a polyethoxylated alkylaryl group; and d) a polyethoxylated alkyl group, with the proviso that at least one of said ester groups is selected from b) or d). Processes for preparing such polymers and processes for breaking emulsions with these acrylate polymers are also provided.
    Type: Application
    Filed: May 29, 2009
    Publication date: December 3, 2009
    Applicant: BJ SERVICES COMPANY
    Inventor: Harold L. Becker
  • Patent number: 7514205
    Abstract: An antireflection film-forming composition having excellent coatability, capable of significantly inhibiting production of fine microbubbles and capable of forming an antireflection film with a sufficiently decreased standing-wave effect, and having excellent solubility in water and alkaline developers is provided. The composition comprises a polymer having at least one polymerization unit with a hydroxyl group-containing organic group on the side chain, preferably a copolymer having at least one recurring unit of the following formula (2) and/or at least one recurring unit of the following formula (3) and at least one recurring unit of the following formula (4), and/or a salt thereof: wherein R1 and R2 represent a hydrogen atom, a fluorine atom, or a monovalent organic group, m is an integer of 1-20, and A represents a divalent coupling means.
    Type: Grant
    Filed: March 16, 2006
    Date of Patent: April 7, 2009
    Assignee: JSR Corporation
    Inventors: Nakaatsu Yoshimura, Keiji Konno, Norihiro Natsume
  • Publication number: 20090082535
    Abstract: To provide: a (meth)acrylic acid copolymer, which exhibits excellent chelating ability, dispersibility, and gel resistance, and can be preferably used in various applications, for example, in a dispersant such as an inorganic pigment and a metal ion, a detergent builder, and a water treatment agent such as a corrosion inhibitor and a scale inhibitor; and a method for producing the (meth)acrylic acid copolymer; and an application thereof.
    Type: Application
    Filed: March 30, 2006
    Publication date: March 26, 2009
    Applicant: NIPPON SHOKUBAI CO., LTD.
    Inventors: Masato Nakano, Shigeru Yamaguchi, Koji Fukuhara
  • Patent number: 7417102
    Abstract: A coating composition comprises at least one material dispersed in a vinyl or acrylic polymer, wherein the vinyl or acrylic polymer comprises (a) one or more anchor group monomer units (a) having an ionizable or active hydrogen functionality or a functionality that forms a covalent bond with the dispersed material, wherein the ionizable functionality is other than a carboxylic acid group in which the carbonyl carbon is separated from the closest ethylenically unsaturated carbon by at least four atoms and the anchor group monomer units (a) are other than those having polyoxyalkylene groups; (b) about 5% to about 45% by weight of one or more stabilizer monomer units (b) having a carboxylic acid group in which the carbonyl carbon is separated from the closest ethylenically unsaturated carbon by at least four atoms, having polyoxyalkylene groups, having gamma-hydroxy carbamate or beta-hydroxy carbamate groups, and combinations thereof; and (c) up to about 50 percent by weight of aromatic monomer units.
    Type: Grant
    Filed: March 21, 2006
    Date of Patent: August 26, 2008
    Assignee: BASF Corporation
    Inventors: Walter H. Ohrbom, Nicholas Caiozzo, Sergio Balatan, Zenon Paul Czornij, Clair J. Certo, Janice E. Echols, Paul J. Harris
  • Patent number: 7326525
    Abstract: Disclosed herein are top anti-reflective coating polymers used in a photolithography process, methods for preparing the anti-reflective coating polymer, and anti-reflective coating compositions comprising the disclosed anti-reflective coating polymers. The top anti-reflective coating polymers are used in immersion lithography for the fabrication of a sub-50 nm semiconductor device. The top anti-reflective coating polymer is represented by Formula 1 below: wherein R1, R2 and R3 are independently hydrogen or a methyl group; and a, b and c represent the mole fraction of each monomer, and are independently in the range between about 0.05 and about 0.9. Because the disclosed top anti-reflective coatings are not soluble in water, they can be used in immersion lithography using water as a medium for the light source. In addition, since the top anti-reflective coatings can reduce the reflectance from an underlayer, the uniformity of CD is improved, thus enabling the formation of ultrafine patterns.
    Type: Grant
    Filed: March 16, 2005
    Date of Patent: February 5, 2008
    Assignee: Hynix Semiconductor Inc.
    Inventor: Jae-chang Jung
  • Patent number: 7256246
    Abstract: The present invention relates to compositions comprising poly-HEMA having a peak molecular weight between about 25,000 and about 100,000 , preferably between 25,000 and 80,000 and a polydispersity of less than about 2 to less than about 3.8 respectively and covalently bonded thereon, at least one cross-linkable functional group. The present invention further relates to low polydispersity poly-HEMA suitable for making the crosslinkable prepolymers, processes for functionalizing and purifying said poly-HEMA to form said crosslinkable prepolymers, viscous solutions made from said crosslinkable prepolymers, hydrogels made from said viscous solutions and articles made from said crosslinkable polymers, hydrogels and viscous solutions.
    Type: Grant
    Filed: November 8, 2004
    Date of Patent: August 14, 2007
    Assignee: Johnson & Johnson Vision Care, Inc
    Inventors: Ture Kindt-Larsen, Per Wolff, Jens-Erik Sørensen, Frederik Resen Steenstrup, Hèlène Rossignol, Frank F. Molock
  • Patent number: 7183368
    Abstract: Disclosed is a chemical-amplification negative-working photoresist composition used for photolithographic patterning in the manufacture of semiconductor devices suitable for patterning light-exposure to ArF excimer laser beams and capable of giving a high-resolution patterned resist layer free from swelling and having an orthogonal cross sectional profile by alkali-development. The characteristic ingredient of the composition is the resinous compound which has two types of functional groups, e.g., hydroxyalkyl groups and carboxyl or carboxylate ester groups, capable of reacting each with the other to form intramolecular and/or intermolecular ester linkages in the presence of an acid released from the radiation-sensitive acid generating agent to cause insolubilization of the resinous ingredient in an aqueous alkaline developer solution.
    Type: Grant
    Filed: November 8, 2004
    Date of Patent: February 27, 2007
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hideo Hada, Takeshi Iwai, Satoshi Fujimura
  • Patent number: 7147994
    Abstract: Disclosed herein are a top anti-reflective coating polymer used in a photolithography process, a method for preparing the anti-reflective coating polymer, and an anti-reflective coating composition comprising the anti-reflective coating polymer. The disclosed top anti-reflective coating polymer is used in immersion lithography for the fabrication of a sub-50 nm semiconductor device. The top anti-reflective coating polymer is represented by Formula 1 below: wherein R1, R2 and R3 are independently hydrogen or a methyl group; and a, b and c represent the mole fraction of each monomer, and are in the range between 0.05 and 0.9. The top anti-reflective coating formed using the anti-reflective coating polymer is not soluble in water and can be applied to immersion lithography using water as a medium for a light source. Since the disclosed top anti-reflective coating can reduce the reflectance from an underlayer, the uniformity of CD is improved, thus enabling the formation of an ultrafine pattern.
    Type: Grant
    Filed: January 11, 2005
    Date of Patent: December 12, 2006
    Assignee: Hynix Semiconductor Inc.
    Inventor: Jae-chang Jung
  • Patent number: 7125944
    Abstract: It is an object of the present invention to provide a cement admixture capable of exhibiting high cement dispersing ability at low addition levels, in particular capable of displaying excellent initial dispersing ability and dispersion retaining ability even in a high water reducing ratio range, and a cement composition in which this admixture is used.
    Type: Grant
    Filed: May 28, 2002
    Date of Patent: October 24, 2006
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Akihiko Yamashita, Hiromichi Tanaka, Tsuyoshi Hirata, Toru Uno, Yoshiyuki Onda
  • Patent number: 7030177
    Abstract: The present invention provides a powdery dispersant for hydraulic compositions, which is excellent in pumping before drying and in pressure resistance and humidity resistance, which comprises one or more copolymers obtained by polymerizing a specific vinyl monomer (1) such as an ethylenically unsaturated carboxylic acid derivative having a polyoxyalkylene group with a specific vinyl monomer (b) such as (meth)acrylic acid etc., wherein the average number of C2-4 oxyalkylene groups or oxystyrene groups added is 45 to 150, (a)/[(a)+(b)]×100 ranges from 15 to 45 (mol-%), and at least a part of the copolymers are monovalent or polyvalent metal salts.
    Type: Grant
    Filed: April 22, 2004
    Date of Patent: April 18, 2006
    Assignee: Kao Corporation
    Inventors: Daisuke Shibai, Kyoichi Shirota
  • Patent number: 7030178
    Abstract: The present invention provides a powdery dispersant for hydraulic compositions, which is excellent in pumping before drying and in pressure resistance and humidity resistance, which comprises one or more copolymers obtained by polymerizing a specific vinyl monomer (1) such as an ethylenically unsaturated carboxylic acid derivative having a polyoxyalkylene group with a specific vinyl monomer (b) such as (meth)acrylic acid etc., wherein the average number of C2-4 oxyalkylene groups or oxystyrene groups added is 45 to 150, (a)/[(a)+(b)]×100 ranges from 15 to 45 (mol-%), and at least a part of the copolymers are monovalent or polyvalent metal salts.
    Type: Grant
    Filed: June 22, 2004
    Date of Patent: April 18, 2006
    Assignee: Kao Corporation
    Inventors: Daisuke Shiba, Kyoichi Shirota
  • Patent number: 6927267
    Abstract: A pressure-sensitive adhesive polymer comprising a reaction product of a C1 to C20 alkyl (meth)acrylate, an ethylenically unsaturated carboxylic acid, a C2 to C8 hydroxyalkyl (meth)acrylate, a vinyl aromatic, optionally a ethylenically unsaturated monomer containing sulfonic acid, and optionally a vinyl ester of a carboxylic acid. The pressure-sensitive adhesive polymer can provide adhesion and cohesion in a temperature range from ?30° C. to 50° C. for the All-temperature pressure-sensitive adhesive market.
    Type: Grant
    Filed: March 7, 2002
    Date of Patent: August 9, 2005
    Assignee: BASF AG
    Inventors: Luis Varela de la Rosa, Timothy P Sanborn, Dieter Urban
  • Patent number: 6900279
    Abstract: A composition that includes a non-gelled copolymer that includes one or more residues of a first polymerizable ethylenically unsaturated monomer containing a pendant amide, ester or carboxylic acid group. The nearest neighboring monomer residues of the majority of the first monomer residues along the copolymer molecule do not contain pendant carbonyl functional groups. The amide, ester or carboxylic acid group of the residues of the first monomer are the post polymerization transesterification, transamidification or hydrolysis reaction product of a C1-C4 alkyl ester group in the unreacted first monomer with a compound selected from amine functional compounds and hydroxy functional compounds. The reacted copolymer is substantially free of cyclical structures resulting from the transesterification, transamidification or hydrolysis reaction. The compositions may be thermosetting compositions useful in multi-layer composite coatings.
    Type: Grant
    Filed: January 21, 2003
    Date of Patent: May 31, 2005
    Assignee: PPG Industries ohio, Inc.
    Inventors: Simion Coca, Gregory J. McCollum, James B. O'Dwyer, Edward R. Coleridge, Steven V. Barancyk
  • Patent number: 6855785
    Abstract: A heat-curable composition comprising (I) at least one constituent whose molecule comprises on average (A) at least one functional group containing at least one bond which may be activated by means of heat and/or actinic radiation, and/or (B) at least one reactive functional group which is able to undergo thermal crosslinking reactions with groups of its own kind and/or with complementary reactive functional groups, with the proviso that there are always groups (A) and (B) in the composition; said constituent excluding the polyurethane dispersion synthesized from aliphatic polyisocyanates, compounds containing isocyanate-reactive functional groups and containing bonds that may be activated with actinic radiation, low molecular mass aliphatic compounds containing isocyanate-reactive functional groups, compounds containing isocyanate-reactive functional groups and dispersing functional groups, neutralizing agents for the dispersing functional groups, blocking agents for isocyanate groups, and/or compounds c
    Type: Grant
    Filed: August 22, 2001
    Date of Patent: February 15, 2005
    Assignee: BASF Coatings AG
    Inventors: Hubert Baumgart, Uwe Meisenburg, Karl-Heinz Joost
  • Patent number: 6846892
    Abstract: The present invention relates to compositions comprising poly-HEMA having a peak molecular weight between about 25,000 and about 100,000, preferably between 25,000 and 80,000 and a polydispersity of less than about 2 to less than about 3.8 respectively and covalently bonded thereon, at least one cross-linkable functional group. The present invention further relates to low polydispersity poly-HEMA suitable for making the crosslinkable prepolymers, processes for functionalizing and purifying said poly-HEMA to form said crosslinkable prepolymers, viscous solutions made from said crosslinkable prepolymers, hydrogels made from said viscous solutions and articles made from said crosslinkable polymers, hydrogels and viscous solutions.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: January 25, 2005
    Assignee: Johnson & Johnson Vision Care, Inc.
    Inventors: Ture Kindt-Larsen, Per Wolff, Jens-Erik Sørensen, Frederik Resen Steenstrup, Hélène Rossignol, Frank F. Molock
  • Publication number: 20040266965
    Abstract: A method for making hydrophilic homopolymers and copolymers of poly 2-hydroxyethyl methacrylate. Also disclosed are coatings, films, hydrogels, cosmetic compositions, dermatological compositions, pressure sensitive adhesives containing the hydrophilic homopolymers or copolymers of poly 2-hydroxyethylmethacrylate. Further disclosed are methods of coating substrates with the hydrophilic homopolymers and copolymers of poly 2-hydroxyethyl methacrylate and hydrophilic pressure sensitive adhesives.
    Type: Application
    Filed: March 12, 2004
    Publication date: December 30, 2004
    Applicant: Avery Dennison Corporation
    Inventors: Daniel L. Holguin, H. Paul Barker, Kenneth S. Lin
  • Publication number: 20040167309
    Abstract: The monomer of the present invention is represented by the following Formula 1: 1
    Type: Application
    Filed: March 1, 2004
    Publication date: August 26, 2004
    Inventors: Nobuya Saegusa, Akihiro Honma, Hajime Yamada, Takamasa Kawashima, Shojiro Kuwahara
  • Patent number: 6774192
    Abstract: The present invention provides: a photosensitive resin composition, which can form uniform coating films having higher coating film strength without causing surface contamination, decrease of evenness of coating films, decrease of film thickness, and coloring by decomposition in heat treatment of subsequent steps, and has good sensitivity of exposure. The photosensitive resin composition comprises a lactone-ring-containing polymer (A) as an essential component, wherein: the lactone-ring-containing polymer (A) is obtained by carrying out polymerization of comonomers and lactonization at the same time wherein the comonomers include a 2-(hydroxyalkyl)acrylate ester and an acidic-group-containing monomer; and the lactone-ring-containing polymer (A) is obtained by almost quantitatively carrying out lactonization of a 2-(hydroxyalkyl)acrylate ester structural unit.
    Type: Grant
    Filed: December 2, 2001
    Date of Patent: August 10, 2004
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Hideo Asano, Kenichi Ueda, Minoru Yamaguchi, Masatoshi Yoshida, Tomomasa Kaneko, Shingo Kataoka
  • Patent number: 6743880
    Abstract: The present invention provides a method for the preparation of hydrophilic water insoluble, gel-free copolymers of 2-hydroxyethyl methacrylate and at least one of acrylic acid or methacrylic acid, and 2-hydroxyethyl methacrylate, 4-hydroxybutyl acrylate and acrylic or methacrylic acid, where the copolymers are prepared in a solution of water and alcohol using monomeric 2-hydroxyethyl methacrylate containing ethylene glycol dimethacrylate impurities up to about 0.15% by weight and substantially in the absence of a chain transfer agent. The copolymers are convertible to water soluble copolymers by pH adjustment. The invention also provides a method for the preparation of a copolymer of 2-hydroxyethyl methacrylate and 4-hydroxybutyl acrylate, and a homopolymer of 2-hydroxyethyl methacrylate in a solution of water and either a monoalcohol or a polyhydric alcohol.
    Type: Grant
    Filed: April 26, 2002
    Date of Patent: June 1, 2004
    Assignee: Avery Denison Corporation
    Inventor: Daniel L. Holguin
  • Patent number: 6706836
    Abstract: A method for the preparation of gel-free poly 2-hydroxyethyl methacrylate substantially in the absence of a chain transfer agent, comprising introducing monomeric 2-hydroxyethyl methacrylate containing ethylene glycol dimethacrylate impurities in the range of about 0.05 to 0.1% by weight into alcohol, polymerizing the 2-hydroxyethyl methacrylate to form a polymerization mixture, and removing the alcohol. Hydrophilic pressure sensitive adhesives are provided by adding polyethylene glycol to the polymerization mixture prior to removing the alcohol.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: March 16, 2004
    Assignee: Avery Dennison Corporation
    Inventors: Daniel L. Holguin, H. Paul Barker, Ivan S. P. Lee, Kenneth S. Lin
  • Patent number: 6653427
    Abstract: A method for the preparation of gel-free poly 2-hydroxyethyl methacrylate substantially in the absence of a chain transfer agent, comprising introducing monomeric 2-hydroxyethyl methacrylate containing ethylene glycol dimethacrylate impurities in the range of about 0.05 to 0.1% by weight into a solution of alcohol and water and polymerizing. The present invention also provides a method for the preparation of gel-free homopolymer of 4-hydroxybutyl acrylate substantially in the absence of a chain transfer agent in an alcohol or in solution of alcohol and water. The present invention also provides a method for the preparation of gel-free copolymer of 2-hydroxyethyl methacrylate and 4-hydroxybutyl acrylate substantially in the absence of a chain transfer agent, comprising introducing monomeric 2-hydroxyethyl methacrylate containing ethylene glycol dimethacrylate impurities in the range of about 0.05 to 0.1% by weight with monomeric 4-hydroxybutyl acrylate into a solution of alcohol and water.
    Type: Grant
    Filed: January 10, 2001
    Date of Patent: November 25, 2003
    Assignee: Avery Dennison Corporation
    Inventor: Daniel L. Holguin
  • Publication number: 20030170563
    Abstract: The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.
    Type: Application
    Filed: March 10, 2003
    Publication date: September 11, 2003
    Inventors: Dong-Won Jung, Sang-Jun Choi, Si-Hyeung Lee, Sook Lee
  • Patent number: 6617373
    Abstract: Ophthalmic lenses, such as corneal contact lenses, include a lens body made of a composition including a lens body made of a composition including a first crosslinked polymer material which is water swellable, and a second polymeric material, other than the first material, selected from water soluble polymeric materials, water swellable polymeric materials and mixtures thereof. The second material is physically immobilized by the first material. Such lenses provide increased water retention and/or increased water content and/or increased modulus and/or reduced friction which increases lens wearer comfort. Compositions and methods for providing such lenses and compositions are also provided.
    Type: Grant
    Filed: December 13, 2001
    Date of Patent: September 9, 2003
    Assignee: Ocular Sciences, Inc.
    Inventors: Jiri Sulc, Zuzana Krcova
  • Publication number: 20030100694
    Abstract: The present invention provides a method for the preparation of hydrophilic water insoluble, gel-free copolymers of 2-hydroxyethyl methacrylate and at least one of acrylic acid or methacrylic acid, and 2-hydroxyethyl methacrylate, 4-hydroxybutyl acrylate and acrylic or methacrylic acid, where the copolymers are prepared in a solution of water and alcohol using monomeric 2-hydroxyethyl methacrylate containing ethylene glycol dimethacrylate impurities up to about 0.15% by weight and substantially in the absence of a chain transfer agent. The copolymers are convertible to water soluble copolymers by pH adjustment. The invention also provides a method for the preparation of a copolymer of 2-hydroxyethyl methacrylate and 4-hydroxybutyl acrylate, and a homopolymer of 2-hydroxyethyl methacrylate in a solution of water and either a monoalcohol or a polyhydric alcohol.
    Type: Application
    Filed: April 26, 2002
    Publication date: May 29, 2003
    Applicant: Avery Dennison Corporation
    Inventor: Daniel L. Holguin
  • Patent number: 6566472
    Abstract: Binder formulations based on aqueous polymer dispersions having a minimum film-forming temperature of below 10° C. and comprising at least one binder polymer P in the form of an aqueous dispersion comprising at least one anionic emulsifier and at least one nonionic emulsifier.
    Type: Grant
    Filed: August 17, 2000
    Date of Patent: May 20, 2003
    Assignee: BASF Aktiengesellschaft
    Inventors: Roland Baumstark, Stefan Kirsch, Rolf Dersch, Johannes Dobbelaar, Michael Melan
  • Patent number: 6552140
    Abstract: An air-activatable polymerisable composition useful, in the field of adhesives, sealants, surface coatings, moulding resins and composite matrices, comprises: a) at least one free-radically polymerisable monomer, b) an activator system for effective polymerisation of the free-radically polymerisable monomer, said activator system comprising at least one auto-oxidisable compound which is a beta diketone, c) a soluble ionic salt, particularly a transition metal salt, d) and a weak acid or a latent weak acid, with the proviso that the composition does not contain a peroxide, or a peroxide precursor which produces peroxide in the absence of air, or any ingredient which is a significant source of radicals in the absence of air.
    Type: Grant
    Filed: March 16, 2001
    Date of Patent: April 22, 2003
    Assignee: Loctite (R&D) Limited
    Inventors: Brendan J. Kneafsey, Rory B. Barnes
  • Patent number: 6531564
    Abstract: A water-soluble polymeric adhesion promoter is represented by the following formula (I): wherein R is a hydrogen atom, a hydroxyl group or a lower alkyl group having 1 to 4 carbon atoms, and m and k are numbers selected such that m/k is in the range from about 1/0.001 to about 1/0.1, and such that that the polymer (I) has a weight average molecular weight of about 3,000 to about 600,000.
    Type: Grant
    Filed: June 28, 2002
    Date of Patent: March 11, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Se Yong Oh, Chan Eon Park, Sang Min Song
  • Publication number: 20030040593
    Abstract: The monomer of the present invention is represented by the following Formula 1: 1
    Type: Application
    Filed: April 16, 2002
    Publication date: February 27, 2003
    Inventors: Nobuya Saegusa, Akihiro Honma, Hajime Yamada, Takamasa Kawashima, Shojiro Kuwahara
  • Publication number: 20020193542
    Abstract: The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.
    Type: Application
    Filed: August 15, 2002
    Publication date: December 19, 2002
    Inventors: Dong-Won Jung, Sang-Jun Choi, Si-Hyeung Lee, Sook Lee
  • Patent number: 6455654
    Abstract: A water-soluble polymeric adhesion promoter is represented by the following formula (I): wherein R is a hydrogen atom, a hydroxyl group or a lower alkyl group having 1 to 4 carbon atoms, and m and k are numbers selected such that m/k is in the range from about 1/0.001 to about 1/0.1, and such that that the polymer (I) has a weight average molecular weight of about 3,000 to about 600,000.
    Type: Grant
    Filed: January 18, 2001
    Date of Patent: September 24, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Se Yong Oh, Chan Eon Park, Sang Min Song
  • Patent number: 6437027
    Abstract: The present invention relates to a process for producing a powdery dispersant for preparing hydraulic compositions, which process includes adding an reducing agent to a solution predominantly containing a polycarboxylate polymer compound having a polyalkylene glycol chain, drying the resultant mixture, and pulverizing the dried product; the resultant powdery dispersant for preparing hydraulic compositions; and a hydraulic composition containing the dispersant. According to the present invention, there can be provided a powdery dispersant for preparing a hydraulic composition, which has excellent fluidity and dispersibility. The dispersant can be added to cement in advance.
    Type: Grant
    Filed: July 27, 2000
    Date of Patent: August 20, 2002
    Assignee: Taiheiyo Cement Corporation
    Inventors: Hirotaka Isomura, Hiroshi Hayashi, Kazuhisa Tsukada, Koichi Soeda, Kenjiro Makino, Masaki Takimoto
  • Publication number: 20020106568
    Abstract: The present invention provides: a photosensitive resin composition, which can form uniform coating films having higher coating film strength without causing surface contamination, decrease of evenness of coating films, decrease of film thickness, and coloring by decomposition in heat treatment of subsequent steps, and has good sensitivity of exposure. The photosensitive resin composition comprises a lactone-ring-containing polymer (A) as an essential component, wherein: the lactone-ring-containing polymer (A) is obtained by carrying out polymerization of comonomers and lactonization at the same time wherein the comonomers include a 2-(hydroxyalkyl)acrylate ester and an acidic-group-containing monomer; and the lactone-ring-containing polymer (A) is obtained by almost quantitatively carrying out lactonization of a 2-(hydroxyalkyl)acrylate ester structural unit.
    Type: Application
    Filed: December 2, 2001
    Publication date: August 8, 2002
    Applicant: Nippon Shokubai Co., Ltd.
    Inventors: Hideo Asano, Kenichi Ueda, Minoru Yamaguchi, Masatoshi Yoshida, Tonomasa Kaneko, Shingo Kataoka
  • Patent number: 6426373
    Abstract: Among other things, a photopolymerizing one-component dental material is prepared, containing: 1) 80-10 weight-% of at least one polyfunctional urethane methacrylate and/or at least one polyfunctional urethane acrylate, 2) 10-30 weight-% of at least one polyfunctional acrylate resin, 3) 10-30 weight-% of at least one reactive thinner, 4) 0-20 weight-% of bis-GMA and/or at least one ethoxylated bisphenol-A-dimethacrylate, 5) 0-10 weight-% of at least one filler, 6) 0-1 weight-% of at least one photoinitiator, and. 7) 0-1 weight-% of at least one color pigment.
    Type: Grant
    Filed: August 12, 1999
    Date of Patent: July 30, 2002
    Assignee: Heraeus Kulzer GmbH & Co. KG
    Inventors: Frank Stange, Albert Erdrich, Novica Savic, Teresa Puchalska
  • Patent number: 6410655
    Abstract: A resin composition for an aqueous paint containing different phase structure emulsion particles obtained by multi-stage emulsion polymerization as a binder, wherein the different phase structure emulsion particles have an outermost phase formed by an emulsion polymer of an ethylenic unsaturated monomer, having a glass transition temperature of from −50° C. to 10° C., and satisfy the following conditions (1) to (3): (1) the emulsion polymer forming the outermost phase contains from 1 to 20 mass % of an ethylenic unsaturated monomer having at least one of a polyethylene glycol chain and a polypropylene glycol chain, (2) at least one phase of inner phases from the outermost phase of the different phase structure emulsion particles comprises an emulsion polymer of an ethylenic unsaturated monomer having a glass transition temperature of from 30° C. to 110° C., and (3) the binder has a minimum film-forming temperature of at most 10° C.
    Type: Grant
    Filed: December 8, 2000
    Date of Patent: June 25, 2002
    Assignee: Dai Nippon Toryo Co., Ltd.
    Inventors: Masayoshi Okubo, Shinya Sakaguchi, Atsushi Takamatsu, Hiroharu Sasaki, Kazuyoshi Tsuneta
  • Patent number: 6372815
    Abstract: Ophthalmic lenses, such as corneal contact lenses, include a lens body made of a composition including a lens body made of a composition including a first crosslinked polymer material which is water swellable, and a second polymeric material, other than the first material, selected from water soluble polymeric materials, water swellable polymeric materials and mixtures thereof. The second material is physically immobilized by the first material. Such lenses provide increased water retention and/or increased water content and/or increased modulus and/or reduced friction which increases lens wearer comfort. Compositions and methods for providing such lenses and compositions are also provided.
    Type: Grant
    Filed: April 18, 2000
    Date of Patent: April 16, 2002
    Inventors: Jiri Sulc, Zuzana Krcova
  • Patent number: 6369143
    Abstract: A radiation-sensitive polymer and a chemical amplification resist composition based on the polymer, which can be easily controlled in sensitivity by regulating the content and kind of the carboxylic acid-grafted norbornene derivatives in the matrix polymer and is superior in adherence to substrate and dry etch resistance, so that it can be formed into resist patterns improved in transparency, photosensitivity and resolution by use of KrF or ArF excimer lasers. The polymer is represented by the formula I: wherein, X is an acid-dissociable grafted norbornene derivative selected from the group consisting of the formulas II and III; Y is a carboxylic acid-grafted norbornene derivative represented by the formula IV, and l, m, n and o each are a repeating number not more than 0.5, satisfying the condition that l+m+n+o=l and 0.4≦o≦0.
    Type: Grant
    Filed: June 21, 1999
    Date of Patent: April 9, 2002
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Joo-Hyeon Park, Seong-Ju Kim, Dong-Chul Seo, Sun-Yi Park
  • Patent number: 6361768
    Abstract: A novel hydrophilic ampholytic polymer synthesized by reacting polymerizable amino and carboxy functional ethylenically unsaturated monomers, together with a non-ionic hydrophilic monomer, to provide a polymer having a glass transition temperature (Tg) above about 50° C., and optionally hydrophobic monomer(s), and cross-linking monomer(s). The copolymer is precipitated from a polymerization media which includes a suitable organic solvent. The resulting copolymer is in the form of a fine powder, with submicron particle size. As such it is suitable for use as a thickener or rheology modifier in personal care formulations, such as shampoo, conditioner, and the like, as a bioadhesive, and for other pharmaceutical applications.
    Type: Grant
    Filed: December 29, 1998
    Date of Patent: March 26, 2002
    Assignee: PMD Holdings Corp.
    Inventors: Ramiro Galleguillos, Jodi A. Budrevich, Joseph A. Chiarelli, Harinath B. Bathina, Zahid Amjad
  • Patent number: 6310159
    Abstract: The present invention refers to a paper surface sizing composition comprising a copolymer having: a) structural units derived from ethylenically unsaturated hydrocarbons; structural units derived from monomers selected from esters of ethylenically unsaturated mono-carboxylic acids, half-esters of ethylenically unsaturated dicarboxylic acids, allylethers and vinylethers and mixtures thereof; optionally c) structural units derived from ethylenically unsaturated monomers selected from monocarboxylic acids as well as salts and amides thereof, dicarboxylic acids as well as salts, amides and half-amides thereof, and cyclic anhydrides and imides of dicarboxylic acids and mixtures thereof; and optionally d) structural units derived from alkyl or amino-substituted alkyl acrylates or methacrylates with the proviso, that if no structural units c) are present, the structural units b) are derived from monomers selected from half esters of ethylenically unsaturated dicarboxylic acids.
    Type: Grant
    Filed: January 19, 1999
    Date of Patent: October 30, 2001
    Assignee: The Dow Chemical Company
    Inventors: Jürgen Eiffler, Roger Carlsson, Jürgen Hermanns, Stephen Oliver
  • Publication number: 20010020076
    Abstract: The present invention provides a production process for a terminal-end-stabilized glyoxylic acid (salt)-based polymer, which process enables to reduce the amount of the polymerization solvent, as recovered or removed after the end of the polymerization (before the start of the hydrolysis) or after the end of the hydrolysis, without lowering the production efficiency. The production process for a terminal-end-stabilized glyoxylic acid (salt)-based polymer comprises the step of polymerizing a monomer component including a glyoxylic acid ester in order to produce the terminal-end-stabilized glyoxylic acid (salt)-based polymer, wherein a terminal end stabilizer is used as a reaction medium of the polymerization.
    Type: Application
    Filed: February 22, 2001
    Publication date: September 6, 2001
    Applicant: Nippon Shokubai Co., Ltd.
    Inventors: Takuya Saeki, Akihiko Kanzaki, Junichi Nakamura, Yoshikazu Fujii, Shigeru Yamaguchi
  • Patent number: 6254804
    Abstract: An oxygen scavenger composition, for use in or with plastics materials, includes a polymer or oligomer having at least one cyclohexene group or functionality. The composition produces only low levels of volatile or extractable (from a plastics material in which it is incorporated) products as a consequence of oxygen scavenging.
    Type: Grant
    Filed: December 20, 2000
    Date of Patent: July 3, 2001
    Assignee: Cryovac, Inc.
    Inventors: Andrew E. Matthews, Craig Depree
  • Patent number: 6232419
    Abstract: The present invention provides a novel class of polymer antiscalants which are polymers comprising a 1,2-dihydroxy-3-butene monomer unit and at least one monomer unit derived from the groups consisting of maleic acid, acrylic acid, acrylamide, methacrylic acid, itaconic acid, vinyl sulfonic acid, styrene sulfonic acid, N-tertbutylacrylamide, butoxymethylacrylamide, N,N-dimethylacrylamide, sodium acrylamidomethyl propane sulfonic acid, and salts thereof, with the proviso that said polymers do not contain the monomer unit —(CH2—CH═CH—CH2—O)—.
    Type: Grant
    Filed: November 9, 1999
    Date of Patent: May 15, 2001
    Assignee: Nalco Chemical Company
    Inventors: Prasad Yogendra Duggirala, John David Morris, Peter Edward Reed, Steven John Severtson
  • Patent number: 6194531
    Abstract: A method for producing a cross-linked polymer manifesting a high absorption capacity and having a small content of soluble component by a convenient and expeditious process with high productivity is provided. An absorbent resin such that disposable diapers and other products incorporating the absorbent resin manifest outstanding qualities and a method for the production of the absorbent resin are proposed.
    Type: Grant
    Filed: June 3, 1997
    Date of Patent: February 27, 2001
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Takumi Hatsuda, Toru Yanase, Yasuhiro Fujita, Kazuki Kimura