Ether Or Hydroxy Containing Patents (Class 526/320)
  • Patent number: 6855790
    Abstract: The present invention is directed to ion-sensitive, hard water dispersible polymers. The present invention is also directed to a method of making ion-sensitive, hard water dispersible polymers and their applicability as binder compositions. The present invention is further directed to fiber-containing fabrics and webs comprising ion-sensitive, hard water dispersible binder compositions and their applicability in water dispersible personal care products.
    Type: Grant
    Filed: March 29, 2002
    Date of Patent: February 15, 2005
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Yihua Chang, Pavneet S. Mumick, Frederick J. Lang
  • Patent number: 6852778
    Abstract: Anaerobically curable compositions comprising: (a) a polymerizable monomer having a functional group represented by the general formula: H2C=C(R)? (wherein R is a hydrogen atom or a methyl group) at a terminal of its molecule; (b) an organic peroxide; (c) o-benzoic sulfimide; and (d) a salt selected from the group consisting of sodium salts, potassium salts and calcium salts of weakly acidic substances, have a high curing rate and high bonding strength despite of having high storage stability. In particular, the composition can rapidly bond even adherends such as inactive metals and plastics, with which conventional anaerobically curable compositions are hardly cured.
    Type: Grant
    Filed: June 9, 2000
    Date of Patent: February 8, 2005
    Assignee: Three Bond Co., Ltd.
    Inventor: Aki Kusuyama
  • Patent number: 6852793
    Abstract: Optically transparent, relatively high refractive index polymeric compositions and ophthalmic devices such as intraocular lenses and corneal inlays made therefrom are described herein. The preferred polymeric compositions are produced through the polymerization of one or more copolymers with one or more hydrophilic monomers and optionally one or more aromatic-based monomers, hydrophobic monomers or a combination thereof.
    Type: Grant
    Filed: June 19, 2002
    Date of Patent: February 8, 2005
    Assignee: Bausch & Lomb Incorporated
    Inventors: Joseph C. Salamone, Jay F. Kunzler, Richard M. Ozark, David E. Seelye
  • Patent number: 6849378
    Abstract: A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer includes a comonomer having an acid-labile substituent group or a polar functional group, and a copolymer of alkyl vinyl ether and maleic anhydride. The copolymer is represented by the following structure: where k is an integer of 3 to 8, and where X is tertiary cyclic alcohol having 7 to 20 carbon atoms.
    Type: Grant
    Filed: April 17, 2002
    Date of Patent: February 1, 2005
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sangjun Choi, Hyunwo Kim, Joontae Moon, Sanggyun Woo
  • Patent number: 6846564
    Abstract: The invention relates to cross-linked acrylic microparticles, a method for the production thereof by polymerization in a dispersion in a non aqueous medium and to the uses thereof in covering or moulding compositions involving a favourable compromise between hardness, flexibility and adhesion. The micropparticles are obtained from a composition comprising: 50-99% mols of a constitutent (A) consisting of Cardura E 10 (meth)acrylate and optionally alkyl (meth)acrylate in C2-C8; a compound (B) consisting of at least one monomer or oligomer having at least 2 ethylenic unsaturations; a compound (C) consisting of at least one monomer or oligomer having in addition to one ethylenic unsaturation at least one second function (F1) with the possibility of at least partial chemical modification of the initial functions f1 into final functions f2.
    Type: Grant
    Filed: March 24, 2000
    Date of Patent: January 25, 2005
    Assignee: Cray Valley, S.A.
    Inventors: Jean-Pierre Pascault, Ludovic Valette, Philippe Barbeau, Benoit Magny
  • Patent number: 6846889
    Abstract: A copolymer excellent in vibration-damping property, flame retardancy and transparency, composed of from 20 to 100% by weight of a phosphate monomer (a) unit of the following general formula (1), from 0 to 80% by weight of a (meth)acrylate monomer (b) unit, and from 0 to 30% by weight of the other monomer (c) unit copolymerizable with them; a vibration-damping material 2 and a vibration-damping part composed of this copolymer; and a copolymer composition are disclosed: R1=a hydrogen atom or a methyl group, R2,R3=hydrogen atom; from C1 to C8 alkyl group or alkyl ether group, or aryl group; A=from C2 to C14 alkylene group or poly-oxyalkylene group.
    Type: Grant
    Filed: February 25, 2000
    Date of Patent: January 25, 2005
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Hiroki Nakamura, Tetsuya Sawano
  • Patent number: 6846892
    Abstract: The present invention relates to compositions comprising poly-HEMA having a peak molecular weight between about 25,000 and about 100,000, preferably between 25,000 and 80,000 and a polydispersity of less than about 2 to less than about 3.8 respectively and covalently bonded thereon, at least one cross-linkable functional group. The present invention further relates to low polydispersity poly-HEMA suitable for making the crosslinkable prepolymers, processes for functionalizing and purifying said poly-HEMA to form said crosslinkable prepolymers, viscous solutions made from said crosslinkable prepolymers, hydrogels made from said viscous solutions and articles made from said crosslinkable polymers, hydrogels and viscous solutions.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: January 25, 2005
    Assignee: Johnson & Johnson Vision Care, Inc.
    Inventors: Ture Kindt-Larsen, Per Wolff, Jens-Erik Sørensen, Frederik Resen Steenstrup, Hélène Rossignol, Frank F. Molock
  • Patent number: 6844406
    Abstract: The present invention provides novel low molecular weight, high functionality number, polymers. The polymers may be made, for example, by heating (preferably, to a temperature of between about 130° C. and 180° C.) one or more ethylenically unsaturated monomers in the presence of a substantially aprotic solvent system; and maintaining the temperature for a time sufficient to polymerize the monomers to a preferred monomer to polymer conversion percentage of at least about 95 percent by weight. In a presently preferred embodiment, the polymer has a weight average molecular weight between about 900 and 7,000 Dalton and a functionality number of at least 100. The process is also preferably substantially free of chain transfer agents.
    Type: Grant
    Filed: October 4, 2001
    Date of Patent: January 18, 2005
    Assignee: Valspar Sourcing, Inc.
    Inventors: John H. Mazza, Jeffrey Niederst, Thomas R. Mallen
  • Patent number: 6838514
    Abstract: A polymer produced by polymerizing via water-in-oil emulsion polymerization one or more water soluble monomers with one or more polyalkoxylated monomers wherein said one or more polyalkoxylated monomers contains at least 25 alkylene oxide units and wherein said product demonstrates thermothickening properties, its method of manufacture and use thereof is disclosed.
    Type: Grant
    Filed: April 9, 2003
    Date of Patent: January 4, 2005
    Assignee: Rhodia Inc.
    Inventors: Dominic Wai Kwing Yeung, Leo Zhaoqing Liu, Bruno RC Langlois, Dominique Charmot, Pascale Corpart
  • Publication number: 20040266965
    Abstract: A method for making hydrophilic homopolymers and copolymers of poly 2-hydroxyethyl methacrylate. Also disclosed are coatings, films, hydrogels, cosmetic compositions, dermatological compositions, pressure sensitive adhesives containing the hydrophilic homopolymers or copolymers of poly 2-hydroxyethylmethacrylate. Further disclosed are methods of coating substrates with the hydrophilic homopolymers and copolymers of poly 2-hydroxyethyl methacrylate and hydrophilic pressure sensitive adhesives.
    Type: Application
    Filed: March 12, 2004
    Publication date: December 30, 2004
    Applicant: Avery Dennison Corporation
    Inventors: Daniel L. Holguin, H. Paul Barker, Kenneth S. Lin
  • Patent number: 6835325
    Abstract: A crosslinking agent containing a polyallyl ether compound having at least one hydroxyl group derived from a glycidyl group and at least two allyl groups can be used for the production of a highly water-absorbing polymer comprising a polymerizable compound having a carbon-carbon double bond or a salt thereof, has a high solubility in aqueous solution of the monomer and gives a highly water-absorbing polymer having water absorptivity required at practical levels.
    Type: Grant
    Filed: April 19, 2002
    Date of Patent: December 28, 2004
    Assignee: Daiso Co., Ltd.
    Inventors: Shin-ichiro Nakamura, Yasumi Shimizu, Tohru Matsutomi
  • Patent number: 6835762
    Abstract: The present invention provides a new class of materials effective as cure accelerators for anaerobic curable compositions. The addition of these materials into anaerobic adhesives as a replacement for conventional curatives, such as acetyl phenyl hydrazine and maleic acid or toluidines, surprisingly provides at least comparable cure speeds and physcial properties for the reaction products formed therefrom.
    Type: Grant
    Filed: May 31, 2002
    Date of Patent: December 28, 2004
    Assignee: Henkel Corporation
    Inventors: Philp T. Kelmarczyk, Karen R. Brantl
  • Publication number: 20040249099
    Abstract: The invention relates to reactive monomers containing 2-cyanopenta-2,4-dienoate and methacrylic or acrylic double bonds in their molecules. The reactive monomers are easily polymerizable in a variety of ways. The polymerized reactive monomers can form strong adhesive bonds between a variety of substrates. The adhesive bonds are water and humidity resistant, heat resistant, impact and peel resistant and can sustain large loads and stresses. The polymerized reactive monomers are applicable as structural and industrial adhesives, medical and surgical adhesives and optical fibre coatings, and can be used in the manufacture of positive or negative photo or electron beam resists.
    Type: Application
    Filed: March 15, 2004
    Publication date: December 9, 2004
    Applicant: Chemence, Inc.
    Inventor: Dimiter Lubomirov Kotzev
  • Patent number: 6828400
    Abstract: Anaerobic and heat curing polymerizable impregnation compositions for sealing pourous articles are disclosed. The compositions contain glycerol, oxygenated glycerol or (meth)acrylate glycerol to improve the washability of the compositions in aqueous solutions. The compositions may contain other compounds to effect the curing characteristics of the sealants.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: December 7, 2004
    Assignee: Henkel Corporation
    Inventors: Frederick F. Newberth, III, Peter J. Chupas
  • Patent number: 6822064
    Abstract: The present invention relates to a polymerizable macromers for applications in medicine and biotechnology and synthesis thereof. Macromers comprises polyvalent various carbohydrates including N-Acetyl Glucosamine(NAG) which bind more efficiently to lysozyme than NAG itself. Effective inhibition of lysozyme is possible even at very low ligand concentrations. The polymerizable macromer could be used for prevention and treatment of bacterial and viral infections. Moreover these macromers can be copolymerized with other comonomers to form stimuli sensitive polymers and used for the recovery of biomolecules. The methodology can be extended to other ligands such as sialic acid and used for preventing influenza and/or rotavirus infections.
    Type: Grant
    Filed: October 29, 2003
    Date of Patent: November 23, 2004
    Assignee: Council of Scientific and Industrial Research
    Inventors: Mohan Gopalkrishna Kulkarni, Jayant Jagannath Khandare
  • Patent number: 6818717
    Abstract: Novel fluorine-containing paper sizes which impart oil and grease resistance to paper and soil-release properties to textile products are described which are the copolymerization products of (a) a perfluoroalkyl-substituted (meth)acrylate or (meth)acrylamide, (b) a secondary- or tertiary-amino or quaternary ammonium group-containing (meth)acrylate or (meth)acrylamide, (c) vinylidene chloride and, optionally, d) other copolymerizable nonfluorinated vinyl monomers.
    Type: Grant
    Filed: February 21, 2003
    Date of Patent: November 16, 2004
    Assignee: Ciba Specialty Chemicals Corporation
    Inventor: Shobha Kantamneni
  • Patent number: 6811960
    Abstract: The present invention provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such photoresist compositions. In particular, photoresist monomers of the present invention comprise a moiety of Formula 4: where R1, R2, R3 and R4 are those defined herein. Photoresist polymers of the present invention have a relatively high etching resistance, and therefore are useful in a thin resist process and a bilayer photoresist process. Moreover, photoresist polymers of the present invention have a high contrast ratio between an exposed region and a non-exposed region.
    Type: Grant
    Filed: May 12, 2003
    Date of Patent: November 2, 2004
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
  • Patent number: 6809889
    Abstract: A radiation curable resin composition for a Fresnel lens is provided, which exhibits a high elastic modulus and a high refractive index and is superior in adhesion to the plastic substrate and is superior in transparency. A lens layer exhibits excellent shape retention over a wide temperature range and is less likely to chip and crack due to an external force. A Fresnel lens sheet using the radiation curable resin composition is also provided. The resin composition comprises, as an essential component, an epoxy (meth)acrylate (a) having an epoxy equivalent per weight of 450 g/eq or more, which has a cyclic structure and two or more (meth)acryloyl groups; a specific trifunctional (meth)acrylate (b); a (meth)acrylate (c) having a molecular weight of 700 or less from an aliphatic polyhydric alcohol having an oxypropylene structure; and a monofunctional (meth)acrylate (d) having a cyclic structure.
    Type: Grant
    Filed: October 16, 2002
    Date of Patent: October 26, 2004
    Assignees: Dainippon Ink and Chemicals, Inc., Dai Nippon Printing Co., Ltd.
    Inventors: Hiroyuki Tokuda, Yasunobu Hirota, Yasuhiro Doi
  • Patent number: 6803172
    Abstract: An organic anti-reflective material, in particular one which prevents back reflection from the surface of or lower layers in the semiconductor device and eliminates the standing waves and reflective notching due to the optical properties of lower layers on the wafer, and due to the changes in the thickness of the photosensitive film applied thereon. The organic anti-reflective polymer is useful for forming ultrafine patterns of 64M, 256M, 1G, and 4G DRAM semiconductor devices. A composition containing such an organic anti-reflective polymer, and an anti-reflective coating formed therefrom and a preparation method thereof are also disclosed.
    Type: Grant
    Filed: October 16, 2002
    Date of Patent: October 12, 2004
    Assignee: Hynix Semiconductor Inc.
    Inventors: Min-ho Jung, Joong-il Choi
  • Patent number: 6800418
    Abstract: Provided are a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition including the photosensitive polymer.
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: October 5, 2004
    Assignee: Samsung Electronics
    Inventors: Kwang-sub Yoon, Ki-yong Song, Sang-jun Choi, Sang-gyun Woo
  • Patent number: 6800709
    Abstract: A method has been described of preparing monodisperse polymer particles by free radical polymerization or copolymerization of hydrophobic monomers in a water-based system in the presence of cyclodextrin, characterized in that said free radical polymerization is performed with semi-continuous addition of monomer, wherein said monomer is absent before initiating polymerization, and in that a total solid contents of less than 30% by weight is present in said water-based system, in order to provide monodisperse polymer particles which are very suitable for use in many applications as e.g. in inks or toners, in photonic crystal films, in thermal printing plates for computer-to-plate or computer-to-press applications, in inkjet media, in displays, in photographic films, or as a spacing agent.
    Type: Grant
    Filed: March 6, 2002
    Date of Patent: October 5, 2004
    Assignee: AGFA-Gevaert N.V.
    Inventors: Huub Van Aert, Joachim Storsberg, Helmut Ritter, Christiaan Van Roost
  • Publication number: 20040192831
    Abstract: A removable, plasticizer resistant pressure sensitive composition that is particularly useful for PSA applications on plasticizer containing vinyl films is provided. The pressure sensitive adhesive comprises: (a) at least one hydrophobic monomer; (b) about 0.2 to about 10 wt. % of at least one hydrophilic monomer; (c) about 1 to about 40 wt.
    Type: Application
    Filed: March 31, 2003
    Publication date: September 30, 2004
    Inventors: Augustin T. Chen, Hui Liu, Leo Ternorutsky
  • Patent number: 6797768
    Abstract: A pourable liquid composition which is radiation curable comprising an ethylenically unsaturated polymer having radiation polymerisable functionality dissolved in a monomer and is water swellable upon radiation curing.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: September 28, 2004
    Assignee: Ciba Specialty Chemicals Water Treatments Ltd.
    Inventor: Ian Russell Lyons
  • Patent number: 6794473
    Abstract: The present invention provides: an acrylic acid (salt) polymer, which has a low molecular weight and a narrow molecular weight distribution and can display excellent dispersibility, or which has a high molecular weight and a high water solubility; a production process that enables easy production of this polymer; and an acrylic acid (salt) polymer composition comprising this polymer. The acrylic acid (salt) polymer is an acrylic acid (salt) polymer of which not less than 1 weight % of the entirety is accounted for by an acrylic acid (salt) polymer having a specific terminal structure. In addition, the production process for an acrylic acid (salt) polymer comprises the step of carrying out polymerization of a monomer component including an acrylic acid (salt), wherein an acrylic acid (salt) having a furfural content of 200 to 400 weight ppm is used as at least a portion of the acrylic acid (salt) in an amount of not smaller than 10 weight % of the entire monomer component.
    Type: Grant
    Filed: April 22, 2002
    Date of Patent: September 21, 2004
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Shigeru Yamaguchi, Tsuyoshi Hirata, Shorbu Shioji
  • Patent number: 6794475
    Abstract: This invention relates to latex polymers and blends of such latex polymers used to produce articles having superior electrostatic dissipative properties. The polymers and blends comprise one or more (1) polymers, in latex, or dispersion form, of (a) at least one reactive macromer of at least one alkylene oxide having at least one functional group capable of free-radical transformation, (b) optionally, at least one ethylenically unsaturated monomer having at least one carboxylic acid group, and (c) optionally, one or more free radically polymerizable comonomers, and (2) one or more other polymer latexes or dispersions of such polymers as natural rubber, conjugated-diene-containing polymers, hydrogenated styrene-butadiene triblock copolymers, chlorosulfonated polyethylenes, ethylene copolymers, acrylic and/or methacrylic ester copolymers, vinyl chloride copolymers, vinylidene chloride copolymers, polyisobutylenes, polyurethanes, polyureas, and poly-urethane-urea)s.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: September 21, 2004
    Assignee: Noveon IP Holdings Corp.
    Inventors: Julie Vaughn Bialke, John B. Canady, Shui-Jen Raymond Hsu, Alexander V. Lubnin, William F. Masler, III, Beth A. Valentino
  • Patent number: 6794474
    Abstract: The invention is a composition comprising: 40 to 95 parts by weight of one or several monomers (I) of formula (a) wherein: R1 and R2 represent H or CH; A represents a divalent radical of formula (b) or (c) wherein m1 and m2 represent each an integer ranging between 2 and 6; and 5 to 50 parts by weight of a monomer (II) comprising at least a urethane unit and at least two (meth)acrylate functions. The invention is useful for making optical and ophthalmic articles.
    Type: Grant
    Filed: December 8, 2003
    Date of Patent: September 21, 2004
    Assignee: Essilor International Compagnie Generale d'Optique
    Inventors: Gilles Richard, Odile Primel, Leanirith Yean
  • Publication number: 20040176558
    Abstract: A copolymer composition that includes a copolymer comprised of at least 30 mol % of residues having the following alternating residues from a donor monomer and from an acceptor monomer. The copolymer contains at least 15 mol % of an isobutylene type donor monomer and at least 15 mol % of an acrylic monomer as an acceptor monomer. The copolymer is substantially free of maleate or fumarate monomer segments and the copolymer composition is substantially free of Lewis acids and transition metals. Also disclosed is a thermosetting composition that includes a reactant comprising functional groups, a crosslinking agent having at least two functional groups that are reactive with the functional groups first reactant, and a copolymer flow control agent that includes the copolymer composition as well as substrates coated with the thermosetting composition.
    Type: Application
    Filed: October 30, 2003
    Publication date: September 9, 2004
    Inventors: Simion Coca, Edward R. Coleridge, Gregory J. McCollum, James B. O'Dwyer, James E. Poole, Victoria A. Trettel
  • Patent number: 6780952
    Abstract: The silanized (meth)acrylate (I) is manufactured by reacting the anhydride (II) with a silanized compound (III). This process gives a crude mixture containing compound (IV) in addition to compound (I), after which the said mixture may be freed of the lightest compounds by distillation or may be subjected to a distillation to obtain the pure compound (I). R=H or Me; R1, R2, R3=linear or branched C1-C10 alkyl, aryl or aralkyl, these radicals possibly being substituted and possibly containing hetero atoms; R4=H or a radical falling within the definition given above for R1, R2 and R3.
    Type: Grant
    Filed: July 8, 2002
    Date of Patent: August 24, 2004
    Assignee: Atofina
    Inventors: Jean-Michel Paul, Joseph Rondini
  • Patent number: 6780953
    Abstract: The present invention provides a polymer that can be used as an anti-reflective coating (ARC) polymer, an ARC composition comprising the same, methods for producing the same, and methods for using the same. The polymer of the present invention is particularly useful in a submicrolithographic process, for example, using KrF (248 nm) or ArF (193 nm) lasers as a light source. The polymer of the present invention comprises a chromophore that is capable of absorbing light at the wavelengths used in a submicrolithographic process. Thus, the ARC of the present invention significantly reduces or prevents back reflection of light and the problem of the CD alteration caused by the diffracted and/or reflected light. The ARC of the present invention also significantly reduces or eliminates the standing wave effect and reflective notching.
    Type: Grant
    Filed: November 12, 2002
    Date of Patent: August 24, 2004
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Min-Ho Jung, Sung-Eun Hong, Ki-Ho Baik
  • Patent number: 6774197
    Abstract: A hydrophilic ethylenically unsaturated macromonomer is disclosed that is prepared by the addition polymerization of addition polymerizable monomers that include monomers that have hydroxyl or amino functional groups, some of which may be subsequently reacted to provide (meth)acryl ethylenic unsaturation. The macromonomers may be used to form intraocular lenses in situ by polymerization of the macromonomers.
    Type: Grant
    Filed: May 31, 2002
    Date of Patent: August 10, 2004
    Assignee: Commonwealth Scientific and Industrial Research Organization
    Inventors: Anthony Brian Clayton, Timothy Charles Hughes, Peter Agapitos Kambouris, Gordon Francis Meijs
  • Patent number: 6774198
    Abstract: The present invention relates to partially branched polymers having a number-average molecular weight Mn in the range from 500 to 20 000 daltons and synthesized from ethylenically unsaturated monomers including: i) from 80 to 99.9% by weight of monoethylenically unsaturated monomers A, and ii) from 0.1 to 20% by weight of monomers B containing at least two nonconjugated ethylenically unsaturated double bonds, the weight fraction of the monomers A and B being based on the total amount of the ethylenically unsaturated monomers that constitute the polymer.
    Type: Grant
    Filed: January 21, 2003
    Date of Patent: August 10, 2004
    Assignee: BASF Aktiengesellschaft
    Inventors: Horst Binder, Bernd Bruchmann
  • Patent number: 6770219
    Abstract: An antifoulant composition comprising (meth)acrylic acid and one or more (meth)acrylate or (meth)acrylamide antifoulant polymers and a method of preventing fouling in (meth)acrylic acid processes comprising adding the (meth)acrylate or (meth)acrylamide antifoulant polymers to the (meth)acrylic acid process stream.
    Type: Grant
    Filed: October 15, 2002
    Date of Patent: August 3, 2004
    Assignee: Nalco Energy Services
    Inventor: David Youdong Tong
  • Patent number: 6770720
    Abstract: Disclosed is an organic anti-reflective film composition suitable for use in submicrolithography, comprising a compound of Formula 13 and a compound of Formula 14. The organic anti-reflective film effectively absorbs the light penetrating through the photoresist film coated on top of the anti-reflective film, thereby greatly reducing the standing wave effect. Use of organic anti-reflective films of the present invention allows patterns to be formed in a well-defined, ultrafine configuration, providing a great contribution to the high integration of semiconductor devices. wherein b, c, R′, R″, R1, R2, R3, and R4 are those defined herein.
    Type: Grant
    Filed: December 4, 2002
    Date of Patent: August 3, 2004
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jae-chang Jung, Keun-kyu Kong, Min-ho Jung, Sung-eun Hong, Ki-ho Baik
  • Patent number: 6767980
    Abstract: The present invention provides a reactive diluent composition which overcomes drawbacks of both the radical-cure and the cationic-cure reactive diluents and can be applied in a broad variety of uses such as paints, inks, adhesives, pressure sensitive adhesives, surface-modifiers, and molding materials; a curable resin composition containing the same; an activated energy ray-curable resin composition; and an activated energy ray-curable ink composition for ink-jet printing. A reactive diluent composition comprising a vinyl ether group-containing (meth)acrylic ester represented by the following general formula (1): CH2═CR1—COO—R2—O—CH═CH—R3  (1) wherein R1 represents a hydrogen atom or a methyl group; R2 represents an organic residue of 2 to 20 carbon atoms; R3 represents a hydrogen atom or an organic residue of 1 to 11 carbon atoms and a hydroxyl group-containing polymerizable compound and/or divinyl ether.
    Type: Grant
    Filed: April 19, 2002
    Date of Patent: July 27, 2004
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Keiji Yurugi, Akihiko Fukada, Kenji Matsukawa
  • Patent number: 6762263
    Abstract: Processes for the controlled radical polymerization of acrylic and related polymers to produce improved low VOC coating materials, or powder coating compositions, the novel polymers so produced, the catalyst systems employed, processes for application of the improved coatings, coatings so produced and objects coated on at least one surface with the novel coatings are disclosed.
    Type: Grant
    Filed: February 1, 2002
    Date of Patent: July 13, 2004
    Assignee: ATOFINA Chemicals, Inc.
    Inventors: Peter A. Callais, Puvin Pichai, Michael G. Moskal, Olivier Guerret
  • Patent number: 6762269
    Abstract: A hydrophobe-containing alkali soluble or swellable copolymer thickener comprising an emulsion polymerization product of (A) an ethylenically unsaturated copolymerizable surfactant monomer having a cloud point of from about 65° C. to about 95° C., wherein the surfactant monomer has the formula M(EO)x(BO)zOR1 wherein M is a residue selected from the group consisting of an ethylenically unsaturated carboxylic acid, and an ethylenically unsaturated dicarboxylic acid, EO is an ethylene oxide unit; BO is a butylene oxide unit; x is from 10 to 45; z is from 5 to 35; provided that x+z is from 20 to 45; and R1 is selected from the group consisting of alkyl, alkylene, cycloalkyl, cycloalkylene, and arylalkyl group wherein the alkyl group has 1 to 4 carbon atoms; (B) an &agr;,&bgr;-ethylenically unsaturated monocarboxylic acid monomer; and (C) a nonionic &agr;,&bgr;-ethylenically unsaturated monomer.
    Type: Grant
    Filed: August 13, 1998
    Date of Patent: July 13, 2004
    Assignee: National Starch and Chemical Investment Holding Corporation
    Inventors: Joseph S. Maxim, Jr., James C. Long, Daniel W. Verstrat
  • Patent number: 6762268
    Abstract: An acetal group containing norbornene-based copolymer useful for a photoresist composition, a method for producing the same, and a photoresist composition containing the same are disclosed. According to the present invention, a copolymer of the present invention has excellent transparency at a wavelength of not more than about 250 nm, excellent resolution, excellent sensitivity, dry etching resistance and excellent adhesion to the substrate.
    Type: Grant
    Filed: April 22, 2002
    Date of Patent: July 13, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung Han Shin, Bong Seok Moon, Ouck Han, Keun Byoung Yoon, Eun Sil Han
  • Patent number: 6762220
    Abstract: A cement additive comprising a polycarboxylic acid type copolymer and/or a salt thereof and a polyalkylene glycol derivative, wherein said polycarboxylic acid type copolymer contains one or more species of copolymers composed of at least an unsaturated polyalkylene glycol type monomer and an unsaturated mono- or dicarboxylic acid type monomer as their monomer components. Concretes in which the additive is used have excellent flow, without significant retarding effect, and a low air entrainment. When used with concrete for steam curing it allows earlier removal of form work.
    Type: Grant
    Filed: November 5, 2001
    Date of Patent: July 13, 2004
    Assignee: MBT Holding AG
    Inventors: Minoru Yaguchi, Hidenori Nagamine, Keita Kanei
  • Patent number: 6759481
    Abstract: A shape memory polymer which is a reaction product of styrene, a vinyl compound, a multifunctional crosslinking agent and an initiator. The shape memory polymer has particular application as a contact lens mold.
    Type: Grant
    Filed: January 24, 2002
    Date of Patent: July 6, 2004
    Inventor: Tat Hung Tong
  • Patent number: 6753126
    Abstract: Disclosed is a polymer for use in a chemically amplified resist, a resist composition including such a polymer is suitable for use in a chemically amplified resist, which is sensitive to KrF or ArF excimer laser and forms a photoresist pattern having low dependence on and good adhesion to substrate, high transparency in the wavelength range of the above radiation, strong resistance to dry etching, and excellencies in sensitivity, resolution and developability. The resist composition can have a stronger etching resistance with a maximized content of unsaturated aliphatic ring in the polymer and a reduced edge roughness of the photoresist pattern with an alkoxyalkyl acrylate monomer employed.
    Type: Grant
    Filed: February 11, 2002
    Date of Patent: June 22, 2004
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Joohyeon Park, Dongchul Seo, Jongbum Lee, Hyunpyo Jeon, Seongju Kim
  • Patent number: 6750303
    Abstract: Functional polymers containing hydroxyl groups as supports for use with catalysts can increase the activity of these catalysts which results in improved ethylene polymerization. The present invention seeks to provide catalysts with improved activity by incorporating 2-hydroxyethyl methacrylate (HEMA) into the support of the catalyst.
    Type: Grant
    Filed: April 30, 2003
    Date of Patent: June 15, 2004
    Assignee: The Governors of the University of Alberta
    Inventors: Peter Phung Minh Hoang, Charles Russell, Jason Roy Kearns, Sieghard E. Wanke, David T. Lynch, Nai-Hong Li
  • Patent number: 6746993
    Abstract: Viscosity index improvers, are disclosed, comprising the following polymer (A1) or (A0). Polymer (A1) has a solubility parameter of 8.6-9.4, a crystallizing initiation temperature of −15° C. or less and a steric hindrance factor (F) of 0-13, and comprises units of at least one of (a) C1-40alkyl group-containing (meth)acrylates, (b) alkyl alkenyl ethers, (c) alkenyl carboxylates and (d) nitrogen-containing unsaturated monomers. Polymer (A0) comprises units of a branched C20-40alkyl group-containing (meth)acrylate (a0) capable of providing a homopolymer having a Tc of 5° C. or less and units of another alkyl (meth)acrylate. Monomers, 2-decyl-tetradecyl methacrylate and 2-decyl-tetradecyl acrylate, are also described, suitable for producing polymers for viscosity index improvers.
    Type: Grant
    Filed: August 7, 2002
    Date of Patent: June 8, 2004
    Assignee: Sanyo Chemical Industries, Ltd.
    Inventors: Tsuyoshi Yuki, Yoshihisa Ota
  • Publication number: 20040106064
    Abstract: A polymer used for a negative type resist composition having a first repeating unit of a Si-containing monomer unit, a second repeating unit having a hydroxy group or an epoxy ring and copolymerized with the first repeating unit is provided.
    Type: Application
    Filed: November 6, 2003
    Publication date: June 3, 2004
    Applicant: Samsung Electronics Co., Ltd.
    Inventor: Sang-Jun Choi
  • Patent number: 6743880
    Abstract: The present invention provides a method for the preparation of hydrophilic water insoluble, gel-free copolymers of 2-hydroxyethyl methacrylate and at least one of acrylic acid or methacrylic acid, and 2-hydroxyethyl methacrylate, 4-hydroxybutyl acrylate and acrylic or methacrylic acid, where the copolymers are prepared in a solution of water and alcohol using monomeric 2-hydroxyethyl methacrylate containing ethylene glycol dimethacrylate impurities up to about 0.15% by weight and substantially in the absence of a chain transfer agent. The copolymers are convertible to water soluble copolymers by pH adjustment. The invention also provides a method for the preparation of a copolymer of 2-hydroxyethyl methacrylate and 4-hydroxybutyl acrylate, and a homopolymer of 2-hydroxyethyl methacrylate in a solution of water and either a monoalcohol or a polyhydric alcohol.
    Type: Grant
    Filed: April 26, 2002
    Date of Patent: June 1, 2004
    Assignee: Avery Denison Corporation
    Inventor: Daniel L. Holguin
  • Patent number: 6740706
    Abstract: The invention relates to an economical method of making a polymer having reduced VOCs and coating compositions containing such polymers. In one embodiment, the method of invention requires providing a reactant mixture (a), providing a solvent mixture (b) comprising a reactive component (c) which is substantially free of any heteroatoms and is not a crystalline solid at room temperature and comprises (i) from 12 to 72 carbon atoms, and (ii) at least two functional groups, and subjecting the reactant mixture (a) in the solvent mixture (b) to polymerization conditions sufficient to polymerize reactant mixture (a) to provide a mixture (d) of a polymer (a′) in solvent mixture (b), wherein reactive component (c) under the polymerization conditions is substantially nonreactive: (1) with the components of reactive mixture (a), (2) in the polymerization of reactant mixture (a) and (3) with the polymer (a′).
    Type: Grant
    Filed: December 7, 2001
    Date of Patent: May 25, 2004
    Assignee: BASF Corporation
    Inventors: Walter H. Ohrbom, Robert D. Weise, James A. Laugal
  • Patent number: 6737493
    Abstract: To provide a biocompatible material with a high level of safety at a low cost. The biocompatible material has a polymer synthesized from monomers by an anionic polymerization, wherein the polymer has a ratio (Mw/Mn) of a weight-average molecular weight (Mw) to a number-average molecular weight (Mn) in a range of 1.0 to 1.5, in which the weight-average molecular weight is 40,000 or more, and each of the monomers is represented by a following general formula (1): where R1 is a hydrogen atom or a methyl group; R2 is a C1-C4 alkylene group; and R3 is a C1-C4 alkyl group.
    Type: Grant
    Filed: April 25, 2002
    Date of Patent: May 18, 2004
    Assignees: Terumo Kabushiki Kaisha, Kuraray Co., Ltd.
    Inventors: Akira Mochizuki, Kenichi Shimura, Takao Anzai, Kazushige Ishiura, Kenichi Hamada
  • Patent number: 6737460
    Abstract: Vinyl monomers having polyenic side chains derived from highly unsaturated fatty acids represented by the general formula: R1COOH wherein R1 is a C19-24 hydrocarbon having 5 or 6 unsaturated bonds, and the derivatives thereof. Vinyl monomers having polyenic side chains derived from highly polyunsaturated fatty acids and the polymers of said monomers can be provided. In addition polymers having double bonds in the side chain into which various functional groups can be introduced can be provided. Useful utilization of fatty acid esters remaining as the residue in distillation of fish oil can be provided.
    Type: Grant
    Filed: July 17, 1998
    Date of Patent: May 18, 2004
    Assignee: Nippon Suisan Kaisha, Ltd.
    Inventors: Nobushige Doisaki, Shuji Jinno, Kazuhiko Hata, Takeshi Endo
  • Patent number: 6737491
    Abstract: An absorbent binder composition including a monoethylenically unsaturated polymer, such as carboxylic acid, sulphonic acid, or phosphoric acid, or salts thereof, and an acrylate or methacrylate ester that contains an alkoxysilane functionality, or a monomer capable of co-polymerization with a compound containing a trialkoxy silane functional group and subsequent reaction with water to form a silanol group. The absorbent binder composition is particularly suitable for use in manufacturing absorbent articles. A method of making the absorbent binder composition includes preparing a monomer solution, adding the monomer solution to an initiator solution, and activating a polymerization initiator within the initiator solution.
    Type: Grant
    Filed: July 26, 2002
    Date of Patent: May 18, 2004
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Dave Allen Soerens, Jason Matthew Laumer, Kambiz Bayat Makoui
  • Patent number: 6734281
    Abstract: The invention relates to novel oligomers of formula wherein the variables are as defined in the claims. The oligomers of the invention are especially useful for the manufacture of biomedical moldings, for example ophthalmic moldings such as in particular contact lenses.
    Type: Grant
    Filed: March 26, 2002
    Date of Patent: May 11, 2004
    Assignee: Novartis AG
    Inventors: Jens Höpken, Dieter Lohmann
  • Patent number: 6730763
    Abstract: A composition which is useful as a material with excellent weatherability, such as paints, printing ink, adhesive, filler, molding material, or resist, and is especially suitable for use in applications such as OPV and coating materials. The composition comprises as an active ingredient a polymer obtained by continuously polymerizing at a high temperature either a polymerizable monomer having a maleimide group and other polymerizable group or a polymerizable monomer having a succinimide group.
    Type: Grant
    Filed: September 27, 2002
    Date of Patent: May 4, 2004
    Assignee: Toagosei Co., Ltd.
    Inventors: Eiichi Okazaki, Michihiro Kaai