With Nitrogen-containing Reactant Patents (Class 528/211)
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Patent number: 7956153Abstract: Sterically hindered phenol and phosphite based compounds represented by structural formula II: and their use as antioxidants in a wide range of materials including, but not limited to, food, plastics, elastomers, composites and petroleum based products is disclosed herein.Type: GrantFiled: May 28, 2010Date of Patent: June 7, 2011Assignee: Polnox CorporationInventors: Ashok L. Cholli, Rajesh Kumar
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Publication number: 20110121278Abstract: To provide a solution composition having a significantly high viscosity comprising one or more solvent(s) and one or more polymer(s) having a polystyrene-reduced Z-average molecular weight of 5.0×104 to 5.0×106, and the solution composition allows to easily obtain a film having a favorable film formability and high uniformity.Type: ApplicationFiled: February 4, 2011Publication date: May 26, 2011Applicant: SUMITOMO CHEMICAL CO., LTD.Inventors: Tomoyuki SUZUKI, Kiyotoshi IIMURA, Katsumi AGATA
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Publication number: 20110121338Abstract: A fluoro group-containing compound, a fluoro group-containing polymer, an organic light emitting device including the polymer, and a method of manufacturing the organic light emitting device are provided.Type: ApplicationFiled: June 25, 2010Publication date: May 26, 2011Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jhun-mo Son, Won-jae Joo, Ho-suk Kang, Hye-yeon Yang
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Patent number: 7935775Abstract: Disclosed are novel Mannich bases which are produced by using at least one phenolic compound of formula (I): formaldehyde, and at least one polyamine. Also disclosed is a two-step method for producing Mannich bases, by means of which low viscous Mannich bases are obtained.Type: GrantFiled: May 4, 2004Date of Patent: May 3, 2011Assignee: Sika Technology AGInventors: Ulrich Gerber, Thomas Wigger
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Patent number: 7910667Abstract: A heat curable epoxy composition comprising the contact product of an epoxy resin, an epoxy curing agent and an accelerator for the epoxy curing agent, the curing agent or the accelerator comprising the reaction product of (a) a phenolic resin and (b) a urea compound which is the reaction product of an isocyanate and an alkylated polyalkylenepolyamine having one primary or secondary amine and at least two tertiary amines of the general formula: where R1, R2, R3, R4 and R5 independently represent hydrogen, methyl or ethyl; n and m are independently integers from 1 to 6 and; X is an integer from 1 to 10.Type: GrantFiled: September 11, 2009Date of Patent: March 22, 2011Assignee: Air Products and Chemicals, Inc.Inventors: Gamini Ananda Vedage, Atteye Houssein Abdourazak
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Publication number: 20110034661Abstract: Disclosed is a method for producing a polyphenylene ether, which comprises a step of preparing a polymerization solution composed of 10-25 parts by mass of a phenolic compound (M) and 75-90 parts by mass of an aromatic solvent (A) with the total of the compound and the solvent being 100 parts by mass, and 0.1-10 parts by mass of a catalyst (C) containing a metal salt; a step of performing an oxidative polymerization of the phenolic compound (M) by passing an oxygen-containing gas through the polymerization solution; a step of stopping the polymerization by mixing an aqueous chelating agent solution into the polymerization solution; a step of subjecting a diphenoquinone compound produced as a by-product to a quinone binding process or removal by reduction; and a step of obtaining a polyphenylene ether by separating the aqueous phase through liquid-liquid separation. In the method for producing a polyphenylene ether, 0.001-0.Type: ApplicationFiled: April 16, 2009Publication date: February 10, 2011Applicant: ASAHI KASEI CHEMICALS CORPORATIONInventors: Mutsumi Maeda, Hiroaki Furukawa
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Publication number: 20110009563Abstract: Copolymers comprising recurring units (A) of one or more of the general structural formulae -D-G-Arb-G-, -G-D-G-Arb- and/or -D-G- on one hand, and recurring units (B) of one or more of the general structural formulae —Ara-G-Arb-G-, -G-Ara-G-Arb- and/or —Ara-G- on the other hand, wherein D is a dibenzodiazocine-containing divalent group, Ara is a dibenzodiazocine-free divalent group containing a sulfone unit and/or a ketone unit, Arb is a dibenzodiazocine-free divalent group, and G is an ether or a thiether group. Preferably, recurring units (A) are of the general structural formula -D-G-Arb-G- and recurring units (B) are of the general structural formula —Ara-G-Arb-G-. Method for the preparation of the copolymers, compositions and articles made of the copolymers are also part of the invention.Type: ApplicationFiled: February 10, 2009Publication date: January 13, 2011Applicant: SOLVAY ADVANCED POLYMERS, L.L.C.Inventor: Charles Hoppin
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Publication number: 20110003962Abstract: A poly(2,6-dimethyl-1,4-phenylene ether) prepared using a morpholine-containing polymerization catalyst has a monomodal molecular weight distribution with a reduced content of very high molecular weight species. It also exhibits increased morpholine incorporation in the high molecular weight fraction. Compared to commercially available poly(2,6-dimethyl-1,4-phenylene ether) prepared using a di-n-butylamine-containing polymerization catalyst, the poly(2,6-dimethyl-1,4-phenylene ether) of the invention exhibits reduced odor. Compared to other poly(2,6-dimethyl-1,4-phenylene ether) prepared using a morpholine-containing polymerization catalyst, the poly(2,6-dimethyl-1,4-phenylene ether) of the invention exhibits improved molecular weight build during compounding and improved compatibilization with polyamides.Type: ApplicationFiled: July 1, 2009Publication date: January 6, 2011Inventors: Alvaro Carrillo, Stephen M. Farnell, Hua Guo
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Patent number: 7842775Abstract: Featured are novel heterocycle substituted hydroquinones, aromatic copolymers and homopolymers bearing main and side chain polar pyridine units. These polymers exhibit good mechanical properties, high thermal and oxidative stability, high doping ability and high conductivity values. These novel polymers can be used in the preparation and application of MEA on PEMFC type single cells. The combination of the above mentioned properties indicate the potential of the newly prepared materials to be used as electrolytes in high temperature PEM fuel cells.Type: GrantFiled: August 24, 2009Date of Patent: November 30, 2010Assignee: Advent Technologies SAInventors: Maria Geormezi, Nora Gourdoupi
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Patent number: 7842734Abstract: The subject invention relates to the development and characterization of a new series of poly (arylene ether) copolymers containing pyridine and biphenyl or hydroquinone moieties. Preferred polymers can exhibit very good mechanical properties, high thermal and oxidative stability and high doping ability with strong acids. The invention further relates to the preparation and application of MEA on PEMFC type single cells.Type: GrantFiled: May 24, 2007Date of Patent: November 30, 2010Assignee: Advent Technologies SAInventors: Maria Geormezi, Valadoula Deimede, Nora Gourdoupi, Joannis Kallitsis
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Publication number: 20100259163Abstract: Provided are a high polymer compound comprising a repeating unit having a function of a dopant and a repeating unit having a function of a host, a material for organic electroluminescence containing the above high polymer compound and an organic electroluminescence device comprising an anode, a cathode and an organic compound layer comprising a layer interposed between the anode and the cathode, wherein a layer of the above organic compound layers is a light emitting layer, and the organic compound layer contains the material for organic electroluminescence described above. The above high polymer compound is useful as a light emitting material and can achieve a high polymer EL device which is excellent in device characteristics such as a lifetime, a luminous efficiency and the like.Type: ApplicationFiled: December 4, 2008Publication date: October 14, 2010Applicant: Idemitsu Kosan Co., Ltd.Inventors: Yumiko Mizuki, Mitsunori Ito
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Patent number: 7795370Abstract: A tetracarboxylic acid compound of formula (1) or (2) wherein A represents a divalent group; X1, X2 and X3 respectively represent a hydrogen atom or the like; R1, R2, R3 and R4 respectively represent a carboxyl group or an acid anhydride group; n represents 1 or 2; and B represents a cyclic group.Type: GrantFiled: November 14, 2006Date of Patent: September 14, 2010Assignee: Mitsubishi Chemical CorporationInventors: Haruhiko Kusaka, Yuji Ohgomori, Masashi Yamanashi
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Publication number: 20100227998Abstract: A structured organic film comprising a plurality of segments and a plurality of linkers arranged as a covalent organic framework, wherein the structured organic film may be a multi-segment thick structured organic film.Type: ApplicationFiled: March 3, 2010Publication date: September 9, 2010Applicant: XEROX CORPORATIONInventors: Matthew A. HEUFT, Adrien Pierre COTE, Kathy L. DE JONG
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Patent number: 7786244Abstract: Featured are novel heterocycle substituted hydroquinones, aromatic copolymers and homopolymers bearing main and side chain polar pyridine units. These polymers exhibit good mechanical properties, high thermal and oxidative stability, high doping ability and high conductivity values. These novel polymers can be used in the preparation and application of MEA on PEMFC type single cells. The combination of the above mentioned properties indicate the potential of the newly prepared materials to be used as electrolytes in high temperature PEM fuel cells.Type: GrantFiled: September 10, 2007Date of Patent: August 31, 2010Assignee: Advent TechnologiesInventors: Maria Geormezi, Nora Gourdoupi
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Publication number: 20100203326Abstract: A prepreg, a prepreg laminate including the prepreg, a metal film laminate including the prepreg, and a printed wiring board including the prepreg. The prepreg includes a woven or non-woven fabric substrate; and an aromatic liquid-crystalline polyester amide copolymer, wherein the woven or non-woven fabric substrate is impregnated with the aromatic liquid-crystalline polyester amide copolymer. Therefore, the prepreg is not deformed or does not cause blisters. In addition, the prepreg has low dielectric properties in a high frequency range. Also, a metal film of the metal film laminate or the printed wiring board does not corrode.Type: ApplicationFiled: May 21, 2008Publication date: August 12, 2010Inventor: Tae Jun OK
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Publication number: 20100176376Abstract: A copolymer comprising a repeating unit of the following formula (1) and a repeating unit of the following formula (2): (wherein, a ring A and ring B represent each independently an aromatic ring optionally having a substituent. X is —O—, —S—, —S(?O)—, —S(?O)2—, —Si(R1)2—Si(R1)2—, —Si(R1)2—, —, —B(R1)—, —P(R1)—, —P(?O)(R1)—, —O—C(R1)2— or —N?C(R1)—, and R1 represents a substituent. When there are two or more R1s in the same formula, they may be the same or different.) (wherein, Y is —O—, —S— or —C(?O)—. Ar1 represents an aryl group optionally having a substituent or a monovalent heterocyclic group optionally having a substituent, and there is no substituent connected to atoms of the ring of Ar1, the atoms being adjacent an atom of Ar1 connected to a nitrogen atom in the formula. R3 represents a substituent, and n represents an integer of from 0 to 3. When there are two or more R2s in the formula, they may be the same or different.).Type: ApplicationFiled: October 3, 2006Publication date: July 15, 2010Applicant: SUMITOMO CHEMICAL COMPANY , LIMITEDInventors: Tomoyuki Suzuki, Takanobu Noguchi
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Patent number: 7754843Abstract: New aromatic polyether type copolymers bearing main chain pyridine and side chain pyridine or pyrimidine units, which exhibit good mechanical properties, high thermal and oxidative stability, high doping ability and high conductivity values. The polymers are useful in the preparation and application of MEA on PEMFC type single cells. The polymers are, further, particularly suitable for use in high temperature PEM fuel cells.Type: GrantFiled: April 7, 2008Date of Patent: July 13, 2010Assignee: Advent TechnologiesInventors: Nora Gourdoupi, Maria Geormezi
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Patent number: 7754844Abstract: A polyarylene ether-based compound according to the present invention includes polymer components represented in general formula (1) and general formula (2): wherein Ar indicates a divalent aromatic group, Y indicates a sulfone group or a ketone group, X indicates H or a monovalent cation species, and Ar? indicates a divalent aromatic group.Type: GrantFiled: October 7, 2003Date of Patent: July 13, 2010Assignee: Toyo Boseki Kabushiki KaishaInventors: Yoshimitsu Sakaguchi, Kota Kitamura, Shigenori Nagahara, Masahiro Yamashita, Junko Nakao
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Publication number: 20100159347Abstract: A hyper-branched polymer having a degree of branching in the range of about 0.05 to about 1 includes a dendritic unit, a linear unit, and a terminal unit, wherein the hyper-branched polymer, an electrode for a fuel cell including the hyper-branched polymer, an electrolyte membrane for a fuel cell including the hyper-branched polymer, and a fuel cell including at least one of the electrode and the electrolyte membrane. Such a hyper-branched polymer included in a fuel cell provides excellent thermal resistance and phosphoric acid resistance and increase the performance of the fuel cell.Type: ApplicationFiled: December 16, 2009Publication date: June 24, 2010Applicants: Samsung Electronics Co., Ltd., SNU R&DB FoundationInventors: Seong-woo CHOI, Cheol-hee Ahn, Jung-ock Park, Mi-jung Yim
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Publication number: 20100140141Abstract: The present invention relates to demulsifying and dehydrating formulations of heavy crude oil based block copolymers amine bifunctionalized with low polydispersities. These formulations can contain solvents whose boiling point is in the range from 35 to 200° C., preferably: dichloromethane, chloroform, toluene, xylenes, turbosine, naphtha or mixtures thereof.Type: ApplicationFiled: December 10, 2009Publication date: June 10, 2010Applicant: INSTITUTO MEXICANO DEL PETROLEOInventors: Gabriel Cendejas Santana, Eugenio Alejandro Flores Oropeza, Laura Verónica Castro Sotelo, Aristeo Estrada Buendia, Marcelo Lozada y Cassou, Flavio Salvador Vázquez Moreno
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Publication number: 20100108954Abstract: Polymers comprising a backbone comprising at least one arylamine repeat moiety and at least one linking moiety, wherein the linking moiety does not comprise an aryl moiety. Ink formulations and organic electronic devices such as OLEDs or OPVs can be formed from the polymers and doped polymers. The polymers can be used in a hole injection layer, hole transport layer, a hole extraction layer, or as a host material in an emissive layer. Improved stability can be achieved in organic electronic devices such as OLEDs and OPVs.Type: ApplicationFiled: October 26, 2009Publication date: May 6, 2010Inventors: Jessica Benson-Smith, Christopher T. Brown, Venkataramanan Seshadri, Jing Wang
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Patent number: 7696298Abstract: Polymers and copolymers of formula I: in which m is typically 30 to 500 and n is 0 to 500; Ar is for example, 1,2-phenylene, 1,3-phenylene, 1,4-phenylene, or 2,6-pyridylene; Ar2 and Ar3 are selected from various bivalent aryl and heteroaryl groups; and X is for example, the bivalent SO2 or CO. have high temperature properties which make them useful as films, matrices in carbon fiber reinforced composites and high performance adhesives; processes for preparing the polymers and copolymers employ a novel C—N coupling reaction.Type: GrantFiled: September 2, 2008Date of Patent: April 13, 2010Inventors: Allan S. Hay, Sumiko Matsumura, Antisar R. Hlil
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Publication number: 20100048857Abstract: The manufacture of polyetherquinoxalines may be accomplished by polymerization of quinoxaline and related monomers with a bisphenol under aromatic nucleophilic substitution reaction conditions. A method of manufacture includes contacting a substituted or unsubstituted quinoxaline having replaceable groups at the 2,3 positions with a bisphenol or a bisphenol derivative under aromatic nucleophilic substitution reaction conditions. The resulting polyetherquinoxalines contain quinoxaline groups joined by ether linkages at the 2 and 3 positions of the quinoxaline groups. In one example, the polyetherquinoxaline has a formula represented as wherein “n” is an integer from 1 to 10000, and R1, R2, R3, R4 are independently hydrogen, methyl, CF3, tert-butyl, benzoyl, benzenesulfonyl, a sulfonic acid salt, an aliphatic group, an alicyclic group, or an aryl group, and Ar is an aromatic radical.Type: ApplicationFiled: August 19, 2009Publication date: February 25, 2010Applicant: THE UNIVERSITY OF AKRONInventors: Haci Bayram Erdem, Frank Wayne Harris
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Patent number: 7652125Abstract: A resin composition having high heat resistance and low dielectric constant after heat treatment, a varnish thereof and a semiconductor device using the same are provided by a resin composition including a compound having a structure represented by the general formula (1): wherein, “Ar” is an aromatic group; “a” is 0 or 1; R11 is an organic group having one or more carbon atoms and at least one is a group having an alicyclic structure; when “q” is an integer of 2 or more, R11s may be the same or different from each other; at least one of R1 to R5 and at least one of R6 to R10 on respective benzene rings are Ar-binding sites or R11-binding sites and the others of R1 to R5 and R6 to R10 are each hydrogen, a group having an alicyclic structure, an organic group having 1 to 10 carbon atoms, a hydroxyl group or a carboxyl group; when “a” is 0, at least one of R1 to R5 and R6 to R10 is a group having an alicyclic structure; “q” is an integer of 1 or more; and “X” is any of —O—, —NHCO—, —COHN—, —COO— and —OCO—.Type: GrantFiled: September 29, 2005Date of Patent: January 26, 2010Assignee: Sumitomo Bakelite Company, Ltd.Inventors: Takashi Enoki, Atsushi Izumi, Yumiko Yamamoto, Takahiro Harada
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Publication number: 20100016540Abstract: Ethers of aromatic acids are produced from halogenated aromatic acids in a reaction mixture containing a copper (I) or copper (II) source and a diketone ligand that coordinates to copper.Type: ApplicationFiled: December 18, 2007Publication date: January 21, 2010Applicant: E. I. Du Pont De Nemours and CompanyInventor: Joachim C. Ritter
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Publication number: 20090306310Abstract: A library of functionalized dendritic macromolecules was prepared in extremely high yields using no protecting group strategies and with only minimal purification steps through the use of copper(I)-catalyzed 1,3-dipolar cycloaddition of azides and terminal acetylenes.Type: ApplicationFiled: July 18, 2006Publication date: December 10, 2009Applicant: The Scripps Research InstituteInventors: Peng Wu, Valery Fokin, K. Barry Sharpless
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Publication number: 20090179000Abstract: A method of manufacturing an inkjet printhead, in which a solvent included in a positive photoresist composition or in a non-photosensitive soluble polymer composition which is used to form a sacrificial layer has a different polarity from that of a solvent included in a negative photoresist composition that is used to form at least one of a channel forming layer and a nozzle layer.Type: ApplicationFiled: June 24, 2008Publication date: July 16, 2009Applicants: Samsung Electronics Co., Ltd, Korea Advanced Institute of Science and TechnologyInventors: Jong-jin Park, Su-min Kim, Jin-baek Kim, Yong-ung Ha, Yong-seop Yoon, Byung-ha Park
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Publication number: 20090181260Abstract: An alkanolamine-modified phenolic resin formulation is formed by reacting a basic catalyst, formaldehyde, water and a benzene-ol to form an intermediate composition to which and an alkanolamine is subsequently added to reduce the presence of free formaldehyde. The alkanolamine-modified phenolic resin formulation can be employed to coat abrasive products having a relatively low free formaldehyde content.Type: ApplicationFiled: December 3, 2008Publication date: July 16, 2009Applicants: Saint-Gobain Abrasive, Inc., Saint-Gobain AbrasifsInventors: Jagmohan Verma, Adiseshaiah K. Seshu, Abdul Habid Pullichola, Olivier Pons Y. Moll, Philippe Espiard
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Patent number: 7511113Abstract: An aromatic ether oligomer or polyaromatic ether comprising the formula: O—Arn; wherein Ar is an independently selected divalent aromatic radical; formed by reacting a dihydroxyaromatic with a dihaloaromatic; and wherein the reaction is performed in the presence of a copper compound and cesium carbonate. The polyaromatic ether is formed when neither the dihydroxyaromatic nor the dihaloaromatic is present in an excess amount. The aromatic ether oligomer is formed by using an excess of either dihydroxyaromatic or dihaloaromatic. A phthalonitrile monomer comprising the formula: formed by reacting a 3- or 4-nitrophthalonitrile with a hydroxy-terminated aromatic ether oligomer. A thermoset formed by curing the phthalonitrile monomer. Processes for forming all the above.Type: GrantFiled: March 17, 2004Date of Patent: March 31, 2009Assignee: The United States of America as represented by the Secretary of the NavyInventors: Teddy M. Keller, Dawn D. Dominguez
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Patent number: 7507784Abstract: Main chain thermotropic liquid crystal esters, ester-imides, and ester-amides were prepared from AA, BB, and AB type monomeric materials and end-capped with phenylacetylene, phenylmaleimide, or nadimide reactive end-groups. The end-capped liquid crystal oligomers are thermotropic and have, preferably, molecular weights in the range of approximately 1000-15,000 grams per mole. The end-capped liquid crystal oligomers have broad liquid crystalline melting ranges and exhibit high melt stability and very low melt viscosities at accessible temperatures. The end-capped liquid crystal oligomers are stable for up to an hour in the melt phase. They are highly processable by a variety of melt process shape forming and blending techniques. Once processed and shaped, the end-capped liquid crystal oligomers were heated to further polymerize and form liquid crystalline thermosets (LCT). The fully cured products are rubbers above their glass transition temperatures.Type: GrantFiled: April 29, 2005Date of Patent: March 24, 2009Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Theodorus J. Dingemans, Erik S. Weiser, Terry L. St. Clair
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Publication number: 20090076241Abstract: Synthesis methods for creating polymeric compounds comprising dihydroxyphenyl derivatives (DHPD), or DHPp i.e. polymers modified with DHPD, with desired surface active effects are described. The polymer backbone of DHPp has structural or performance features that can be tailored to control physical properties of DHPp, allowing it to be useful for different applications i.e. tissue adhesives or sealants, adhesion promoting coatings, and antifouling coatings.Type: ApplicationFiled: September 28, 2008Publication date: March 19, 2009Inventor: Bruce P. Lee
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Publication number: 20090048362Abstract: A method of modifying liquid crystal polymers, which involves a step of irradiating a liquid crystal polymer with the laser beam having a pulse width of 10?12 seconds or less. Using the invention method, the physical strength of the liquid crystal polymers can be improved as compared with the conventional liquid crystal polymers.Type: ApplicationFiled: January 31, 2007Publication date: February 19, 2009Inventors: Ryuzo Ueno, Kunikazu Asaka, Kazuyuki Hirao, Shingo Kanehira, Masaya Kitayama
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Patent number: 7452959Abstract: An aromatic ether oligomer or polyaromatic ether comprising the formula: O—Arn; wherein Ar is an independently selected divalent aromatic radical; formed by reacting a dihydroxyaromatic with a dihaloaromatic; and wherein the reaction is performed in the presence of a copper compound and cesium carbonate. The polyaromatic ether is formed when neither the dihydroxyaromatic nor the dihaloaromatic is present in an excess amount. The aromatic ether oligomer is formed by using an excess of either dihydroxyaromatic or dihaloaromatic. A phthalonitrile monomer comprising the formula: formed by reacting a 3- or 4-nitrophthalonitrile with a hydroxy-terminated aromatic ether oligomer. A thermoset formed by curing the phthalonitrile monomer. Processes for forming all the above.Type: GrantFiled: March 17, 2004Date of Patent: November 18, 2008Assignee: The United States of America as represented by the Secretary of the NavyInventors: Teddy M. Keller, Dawn D. Dominguez
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Publication number: 20080255335Abstract: A resin composition having high heat resistance and low dielectric constant after heat treatment, a varnish thereof and a semiconductor device using the same are provided by a resin composition including a compound having a structure represented by the general formula (1): wherein, “Ar” is an aromatic group; “a” is 0 or 1; R11 is an organic group having one or more carbon atoms and at least one is a group having an alicyclic structure; when “q” is an integer of 2 or more, R11s may be the same or different from each other; at least one of R1 to R5 and at least one of R6 to R10 on respective benzene rings are Ar-binding sites or R11-binding sites and the others of R1 to R5 and R6 to R10 are each hydrogen, a group having an alicyclic structure, an organic group having 1 to 10 carbon atoms, a hydroxyl group or a carboxyl group; when “a” is 0, at least one of R1 to R5 and R6 to R10 is a group having an alicyclic structure; “q” is an integer of 1 or more; and “X” is any of —O—, —NHCO—, —COHN—, —COO— and —OCO—Type: ApplicationFiled: September 29, 2005Publication date: October 16, 2008Applicant: SUMITOMO BAKELITE COMPANY LTD.Inventors: Takashi Enoki, Atsushi Izumi, Yumiko Yamamoto, Takahiro Harada
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Publication number: 20080206548Abstract: A benzoxazole resin precursor comprising a first repeating unit which is obtained by the reaction of a bisaminophenol compound and a dicarboxylic acid compound, at least one of which has the diamondoid structure; a benzoxazole resin precursor further comprising a second repeating unit which is obtained by the reaction of a bisaminophenol compound having no diamondoid structure and a dicarboxylic acid compound having no diamondoid structure; a polybenzoxazole resin obtained by the ring-closing reaction with dehydration of the above benzoxazole resin precursor; a resin film constituted with the benzoxazole resin precursor or the polybenzoxazole resin. A polybenzoxazole resin and a resin film having excellent heat resistance and a small permittivity and a semiconductor device using the resin film can be obtained from the benzoxazole resin precursor.Type: ApplicationFiled: June 20, 2005Publication date: August 28, 2008Applicant: Sumitomo Bakelite Co., LTDInventors: Takashi Enoki, Atsushi Izumi
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Publication number: 20080112999Abstract: Described herein are N-substituted monomers and polymers, methods of making such monomers and polymers, and methods of using them in various applications, such as medical devices. In preferred embodiments, the medical device is a stent.Type: ApplicationFiled: October 16, 2007Publication date: May 15, 2008Applicant: REVA Medical, Inc.Inventor: Ernest G. Baluca
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Publication number: 20080113227Abstract: Featured are novel heterocycle substituted hydroquinones, aromatic copolymers and homopolymers bearing main and side chain polar pyridine units. These polymers exhibit good mechanical properties, high thermal and oxidative stability, high doping ability and high conductivity values. These novel polymers can be used in the preparation and application of MEA on PEMFC type single cells. The combination of the above mentioned properties indicate the potential of the newly prepared materials to be used as electrolytes in high temperature PEM fuel cells.Type: ApplicationFiled: September 10, 2007Publication date: May 15, 2008Inventors: Maria Geormezi, Nora Gourdoupi
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Patent number: 7307137Abstract: The present invention is directed to low dielectric polymers and to methods of producing these low dielectric constant polymers, dielectric materials and layers, and electronic components. In one aspect of the present invention, an isomeric mixture of thermosetting monomers, wherein the monomers have a core structure and a plurality of arms, is provided, and the isomeric mixture of thermosetting monomers is polymerized, wherein polymerization comprises a reaction of an ethynyl group that is located in at least one arm of a monomer.Type: GrantFiled: October 18, 2001Date of Patent: December 11, 2007Assignee: Honeywell International Inc.Inventors: Kreisler Lau, Feng Quan Liu, Paul Apen, Boris Korolev, Emma Brouk, Ruslan Zherebin, David Nalewajek, Roger Leung
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Patent number: 7273919Abstract: High heat polyethersulfone compositions are provided which possess unexpectedly high glass transition temperatures. The polyethersulfone compositions comprise structural units derived from phthalimide bisphenols such as 3,3-bis(4 -hydroxyphenyl)-N-phenylphthalimide, and structural units derived from at least one biphenyl-bissulfone such as 4,4?-bis((4-chlorophenyl)sulfonyl)-1,1?-biphenyl. The novel polyethersulfone compositions may further comprise structural units derived from one or more biphenols such as 4,4?-biphenol, bisphenols such as BPA, or other electrophilic sulfone monomers, such as bis(4-chlorophenyl)sulfone. In one embodiment, the polyethersulfone composition of the present invention comprises structural groups derived exclusively from 3,3-bis(4-hydroxyphenyl)-N-phenylphthalimide, and 4,4?-bis((4-chlorophenyl)sulfonyl)-1,1?-biphenyl and exhibits a single glass transition of greater than 300° C.Type: GrantFiled: November 21, 2005Date of Patent: September 25, 2007Assignee: General Electric CompanyInventors: Daniel Steiger, Farid Fouad Khouri, Daniel Joseph Brunelle, Amy Beth Koren
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Patent number: 7132496Abstract: The invention relates to the following: a method for step-by-step alkylation of primary polymeric amines by step-by-step deprotonation with a metallo-organic base and a subsequent reaction with an alkyl halide; a method for modifying tertiary polymeric amines with other functional groups; polymers with secondary/tertiary amino groups and with quaternary ammonium groups; polymers with secondary/tertiary amino groups and other functional groups, especially cation exchanger groupings; membranes consisting of the above polymers, either non-crosslinked or ionically or covalently cross-linked; acid-base-blends/membranes, and a method for producing same, consisting of basic polymers with polymers containing sulphonic acid, phosphonic acid or carboxyl groups; the use of ion exchanger polymers as membranes in membrane processes, e.g.Type: GrantFiled: October 30, 2001Date of Patent: November 7, 2006Inventors: Jochen Kerres, W. Zhang, C. Tang
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Patent number: 7049386Abstract: In a method of producing a low dielectric constant polymer, a thermosetting monomer is provided, wherein the thermosetting monomer has a cage compound or aryl core structure, and a plurality of arms that are covalently bound to the cage compound or core structure. In a subsequent step, the thermosetting monomer is incorporated into a polymer to form the low dielectric constant polymer, wherein the incorporation into the polymer comprises a chemical reaction of a triple bond that is located in at least one of the arms. Contemplated cage compounds and core structures include adamantane, diamantane, silicon, a phenyl group and a sexiphenylene group, while preferred arms include an arlyene, a branched arylene, and an arylene ether. The thermosetting monomers may advantageously be employed to produce low-k dielectric material in electronic devices, and the dielectric constant of the polymer can be controlled by varying the overall length of the arms.Type: GrantFiled: June 19, 2002Date of Patent: May 23, 2006Assignee: Honeywell International Inc.Inventors: Kreisler S. Lau, Feng Quan Liu, Boris A. Korolev, Emma Brouk, Ruslan Zherebin, David Nalewajek
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Patent number: 7041779Abstract: A benzobisazole polymer having repeating units of the formula: wherein Q is and wherein Z is —O—, —S— or —NH—. A new method for preparing 1,5-naphthalenedicarboxylic acid from 1,5-diaminonaphthalene under relatively mild conditions in good yields is also described.Type: GrantFiled: January 12, 2004Date of Patent: May 9, 2006Assignee: The United States of America as represented by the Secretary of the Air ForceInventors: Thuy D. Dang, Narayanan Venkatasubramanian, Jar-Wha Lee, Soo-Young Park, Fred E. Arnold, Barry L. Farmer
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Patent number: 6956100Abstract: An object of the present invention is to provide a polyamide resin composition from which the solvent is easily removed during film formation and which gives a film or adhesive layer reduced in residual solvent content. It is suitable for use especially as vanish. The composition and vanish are characterized by comprising as essential ingredients a phenolic hydroxyl group-having aromatic polyamide resin and a cycloalkanone as a solvent and preferably further containing a curable resin.Type: GrantFiled: October 18, 2001Date of Patent: October 18, 2005Assignee: Nippon Kayaku Kabushiki KaishaInventors: Masahiro Imaizumi, Toyofumi Asano, Masaki Shinmoto
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Patent number: 6939940Abstract: Main chain thermotropic liquid crystal esters, ester-imides, and ester-amides were prepared from AA, BB, and AB type monomeric materials and were end-capped with phenylacetylene, phenylmaleimide, or nadimide reactive end-groups. The resulting reactive end-capped liquid crystal oligomers exhibit a variety of improved and preferred physical properties. The end-capped liquid crystal oligomers are thermotropic and have, preferably, molecular weights in the range of approximately 1000-15,000 grams per mole. The end-capped liquid crystal oligomers have broad liquid crystalline melting ranges and exhibit high melt stability and very low melt viscosities at accessible temperatures. The end-capped liquid crystal oligomers are stable for up to an hour in the melt phase.Type: GrantFiled: January 5, 2001Date of Patent: September 6, 2005Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Theodorous J. Dingemans, Erik S. Weiser, Terry L. St. Clair
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Patent number: 6864347Abstract: The present disclosure is in part directed to optical devices for modulating light comprising compounds which spontaneously align. The disclosure is also directed to electro-optic compounds wherein chromophore substituents are chemically bound to a chiral polymer. In one embodiment, the chiral polymer comprises a binaphthyl monomeric unit.Type: GrantFiled: June 28, 2002Date of Patent: March 8, 2005Assignee: KVH Industries, Inc.Inventors: Martin Kits van Heyningen, Thierry Verbiest, Andre Persoons, Celeste Samyn, Guy Koeckelberghs
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Patent number: 6855776Abstract: Improved amine-terminated polybutadienes (ATPBs) having one or two terminal groups of the formula —CHRNH2 wherein R is C1-C20 alkyl, are prepared by aminating a secondary hydroxyl-terminated polybutadiene having no ether groups. The ATPBs may be hydrogenated or partially hydrogenated, either prior to or after the animation, to saturate or partially saturate the polymers. Preferred ATPBs are of the formula H2NCHR-(polybutadiene)-CHRNH2 wherein R is C1-C20 alkyl. Polyureas, polyurethanes, crosslinked epoxies, polyamides, and other derivatives with improved properties can be prepared from the ATPBs. The resultant derivatives are useful in liquid binders for braking systems, electric potting compositions, coatings, adhesives, sealants, and water proofing membranes, for example.Type: GrantFiled: November 20, 2002Date of Patent: February 15, 2005Assignee: Sartomer Technology Company, Inc.Inventors: Herbert Shin-I Chao, John Schmidhauser, Alain Robert Drexler, Nan Tian
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Publication number: 20040262574Abstract: It is an object of the present invention to provide a novel triarylamine polymer which is excellent in solubility and film-forming property and has improved thermal stability; a simple process for its production; and an electronic element employing it.Type: ApplicationFiled: April 9, 2004Publication date: December 30, 2004Inventors: Takao Suzuki, Masakazu Nishiyama, Hisao Eguchi
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Patent number: 6818734Abstract: The present invention provides a polybenzazole article superior in light resistance, which contains a light-resisting agent that allows for a regular reflectance of the article of not more than 30% in not less than 30% of the wavelength region of from 450 nm to 700 nm and a production method thereof. The present invention provides a polybenzazole article having noticeably superior light resistance, which is preferable as industrial materials and fireman's garments, and a production method thereof.Type: GrantFiled: February 11, 2000Date of Patent: November 16, 2004Assignee: Toyo Boseki Kabushiki KaishaInventors: Tetsuo Kodama, Yusuke Shimizu
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Patent number: 6812290Abstract: A polyarylene copolymer which comprises (A) aromatic compound units having a main chain containing one or more electron-withdrawing groups therein and (B) aromatic compound units having a main chain containing no electron-withdrawing groups therein, and a proton-conductive membrane comprising the polyarylene copolymer having sulfonic acid groups.Type: GrantFiled: November 26, 2002Date of Patent: November 2, 2004Assignee: JSR CorporationInventors: Kohei Goto, Yoshitaka Yamakawa, Mayumi Kakuta, Igor Rozhanskii
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Patent number: 6803441Abstract: In a method of producing a low dielectric constant polymer, a thermosetting monomer is provided, wherein the thermosetting monomer has a cage compound or aryl core structure, and a plurality of arms that are covalently bound to the cage compound or core structure. In a subsequent step, the thermosetting monomer is incorporated into a polymer to form the low dielectric constant polymer, wherein the incorporation into the polymer comprises a chemical reaction of a triple bond that is located in at least one of the arms. Contemplated cage compounds and core structures include adamantane, diamantane, silicon, a phenyl group and a sexiphenylene group, while preferred arms include an arylene, a branched arylene, and an arylene ether. The thermosetting monomers may advantageously be employed to produce low-k dielectric material in electronic devices, and the dielectric constant of the polymer can be controlled by varying the overall length of the arms.Type: GrantFiled: October 8, 2002Date of Patent: October 12, 2004Assignee: Honeywell International Inc.Inventors: Kreisler Lau, Feng Quan Liu, Boris Korolev, Emma Brouk, Ruslan Zherebin, David Nalewajek