With Silicon Reactant Which Is Free Of Any Silicon To Carbon Bond Patents (Class 528/39)
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Patent number: 6887934Abstract: Resin modified elastomers, methods of making them and their uses. The method for making the elastomers comprises reacting in a diluent an ?SiH functional siloxane; a diene, diyne or ene-yne compound, a resin having the formula (R13SiO1/2)x(SiO4/2)y(R1SiO3/2)z where each R1 is independently a monovalent hydrocarbon group having 1 to 30 carbon atoms or an unsaturated hydrocarbon group having 2 to 30 carbon atoms x is ?1, y?0, z?0 and y+z?1.Type: GrantFiled: August 26, 2002Date of Patent: May 3, 2005Assignee: Dow Corning CorporationInventors: Michael Salvatore Ferritto, Tina Marie Leaym, William James Schulz, Jr., Janet Mary Smith
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Patent number: 6884512Abstract: The invention relates to an article superior in making a waterdrop slip down a surface of the article. This article includes a substrate; and a functional film formed on a surface of the substrate. This functional film contains: (a) a silica forming a matrix of the functional film; (b) a silylated-terminal dimethyl silicone represented by the general formula [A], the dimethyl silicone being in an amount of from 0.1 wt % to 10 wt %, based on a total weight of the silica; and (c) a fluoroalkylsilane represented by the general formula [B] B(CF2)rCH2CH2Si(CH3)3-s(O?s??[B].Type: GrantFiled: July 29, 2003Date of Patent: April 26, 2005Assignee: Central Glass Company, LimitedInventors: Yoshinori Akamatsu, Soichi Kumon, Kaname Hatakenaka, Haruki Kuramashi, Hiroaki Arai, Shigeo Hamaguchi
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Patent number: 6872456Abstract: This invention pertains to a siloxane resin composition comprising R1SiO3/2 siloxane units, R2SiO3/2 siloxane units and (R3O)bSiO(4-b)/2 siloxane units wherein R1 is an alkyl group having 1 to 5 carbons, hydrogen, or mixtures thereof; R2 is a monovalent organic group having 6 to 30 carbons; R3 is a branched alkyl group having 3 to 30 carbons, b is from 1 to 3; and the siloxane resin contains from 2.5 to 85 mole percent R1SiO3/2 units, 2.5 to 50 mole percent R2SiO3/2 units and 5 to 95 mole percent (R3O)bSiO(4-b)/2 units. The siloxane resin is useful to make insoluble porous resin and insoluble porous coatings. Heating a substrate coated with the siloxane resin at a sufficient temperature effects removal of the R2 and R3O groups to form an insoluble insoluble porous coating having a porosity of 1 to 60 volume percent and a dielectric constant in the range of 1.5 to 3.0.Type: GrantFiled: July 26, 2001Date of Patent: March 29, 2005Assignee: Dow Corning CorporationInventors: Ronald Paul Boisvert, Duane Raymond Bujalski, Kai Su
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Patent number: 6872454Abstract: This invention relates generally to heat curable compositions, particularly well utilized for use as impregnation sealants curable using hydrosilation chemistry. The heat curable compositions of the present invention can be stored and shipped as a one-part composition. The composition includes at least one curable unsaturated organic component, at least one co-reactant, which has at least two functional groups reactive with the organic component, and at least one catalyst of initiating the cure of the composition.Type: GrantFiled: May 18, 2001Date of Patent: March 29, 2005Assignee: Henkel CorporationInventors: Frederick F. Newberth, III, Peter J. Chupas
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Patent number: 6852367Abstract: Disclosed are stable organo polysilica resin composition containing a B-staged organo polysilica resin and an organic acid, methods of stabilizing such B-staged organo polysilica resin compositions and methods of manufacturing electronic devices using such stable compositions.Type: GrantFiled: July 12, 2002Date of Patent: February 8, 2005Assignee: Shipley Company, L.L.C.Inventors: Yujian You, Robert H. Gore, Michael K. Gallagher
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Patent number: 6852368Abstract: A resin substrate having a hard coat formed from a hard coat composition which comprises colloidal silica, a silicon compound having a fluoroalkyl group and optionally an ultraviolet light absorbing organic group. This resin substrate can retain water-repellency even when it is used in the open air and prevent the adhesion of a stain while it keeps its abrasion resistance for a long time by the hard coat composition.Type: GrantFiled: April 12, 2002Date of Patent: February 8, 2005Assignee: Nippon Arc Co., Ltd.Inventors: Masayuki Takaguchi, Fujio Sawaragi
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Patent number: 6818722Abstract: For the preparation of organopolysiloxanes, water glass diluted with water to a concentration of 3 to 15 wt % is reacted with a triorganohalosilane in the presence of an acid and an oxygen-containing solvent such as isobutyl alcohol, methyl isobutyl ketone or 1-pentanol. The invention achieves a considerable reduction of the environmental load, an improved utilization of reactants, an improved yield, and a cost reduction, and enables production of low viscosity MQ resins.Type: GrantFiled: January 23, 2003Date of Patent: November 16, 2004Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Kiyoyuki Mutoh, Yasuhito Mohara, Susumu Ueno
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Patent number: 6815519Abstract: The present invention discloses an acidic fluorine-containing hybrid having a uniform distribution of an organic and an inorganic components prepared by a sol-gel process. The organic component is a fluorine-containing poly(siloxane amideimide) having a good processing ability, gas permeability, mechanical properties, and chemical stability. The inorganic component is silica having good heat resistance and moisture resistance. The hybrid has excellent properties, such as a good film formation property, a high gas selectivity, a low dielectric constant, a good resistance to scraping, and a good transparency, etc., and can be used in making industrial products, such as gas detection films, sensors, encapsulation material, photoelectrical communication material, and biomedical material, etc.Type: GrantFiled: March 22, 2002Date of Patent: November 9, 2004Assignee: Chung-Shan Institute of Science & TechnologyInventors: Yie-Shun Chiu, Hsing-Tsai Huang, Te-Chuan Chang, Gaw-Pying Wang, Yaw-Shun Hong
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Patent number: 6811884Abstract: A method is provided for applying a water repellant coating over a substrate surface. The surface is contacted with at least one coating composition including at least one perfluoroalkylalkylsilane, at least one hydrolyzable primer, e.g., a silane and/or siloxane, and at least one non-halogenated, e.g., non-fluorinated, alkylsilane. The perfluoroalkylalkylsilane and non-fluorinated alkylsilane can be selected such that the effective chain length of the non-fluorinated alkylsilane is equal to or longer than the effective chain length of the perfluoroalkylalkylsilane.Type: GrantFiled: December 24, 2002Date of Patent: November 2, 2004Assignee: PPG Industries Ohio, Inc.Inventors: George B. Goodwin, Chia-Cheng Lin
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Patent number: 6800330Abstract: A composition for film formation capable of forming a silica-based coating film having low water absorption and dielectric constant of 2.1 or lower and useful as an interlayer insulating film material in semiconductor devices, etc.Type: GrantFiled: March 25, 2002Date of Patent: October 5, 2004Assignee: JSR CorporationInventors: Eiji Hayashi, Michinori Nishikawa, Atsushi Shiota, Kinji Yamada
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Patent number: 6770726Abstract: Silsesquioxane polymers that are useful for preparing SiO2-rich ceramic coatings are obtained as the polymeric reaction products from the hydrolysis and condensation of organosilanes having a &bgr;-substituted alkyl group. A preferred silsesquioxane polymer is the polymeric reaction product obtained from &bgr;-chloroethyltrichlorosilane. More preferred silsesquioxones are those with non-halogenated alkyl groups, such as the &bgr;-acetoxyethyl- and &bgr;-hydroxyethyl-silsesquioxones. Coating compositions containing such silsesquioxane polymers dissolved in organic solvent may be applied to a substrate and converted to SiO2-rich ceramic thin layers by evaporating the solvent and heating the coated substrate at moderate temperatures.Type: GrantFiled: December 28, 1998Date of Patent: August 3, 2004Assignees: Gelest, Inc., University of PennsylvaniaInventors: Barry C. Arkles, Donald H. Berry
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Patent number: 6767984Abstract: This invention provides a top coating composition which comprises a coating film-forming resin (I); as well as a silicate compound (II) besides a hydrolyzable silyl-containing resin (III) and/or a silicate-grafted resin (IV) resulting from graft polymerization of a silicate compound (II) onto a hydrolyzable silyl-containing resin (III).Type: GrantFiled: May 10, 2001Date of Patent: July 27, 2004Assignee: Nippon Paint Co., Ltd.Inventors: Teruzo Toui, Hisaki Tanabe, Nobuhisa Sudo, Satoshi Urano, Manabu Yoshioka
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Patent number: 6743517Abstract: An optical device assembled by means of an adhesive composition which is free from the cracking of an adhesive layer thereof, is prepared easily and has excellent adhesive strength. The optical device is produced by placing an adhesive composition prepared by hydrolyzing, dehydrating and condensing a starting solution which contains 10 to 50 mol % of a silane compound represented by SiX14 (X1 is a hydrolyzable group) or a combination of the silane compound and a metal alkoxide, 25 to 65 mol % of a silane compound represented by PhSiX23 (Ph is a phenyl group or substituted phenyl group, and X2 is a hydrolyzable group), and 25 to 65 mol % of a silane compound represented by (CH3)2SiX32 (X3 is a hydrolyzable group) between an optical part and another part and heating it to bond the optical part to the another part.Type: GrantFiled: July 1, 2003Date of Patent: June 1, 2004Assignee: Nippon Sheet Glass Co., Ltd.Inventors: Koichiro Nakamura, Hiroko Shikata, Hiroaki Yamamoto
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Patent number: 6713586Abstract: The present invention pertains to an epoxy-functional organopolysiloxane resin, and an epoxy-functional organopolysiloxane coating composition comprising the epoxy-functional organopolysiloxane resin. The epoxy-functional organopolysiloxane coating composition comprises the epoxy-functional organopolysiloxane resin of the present invention and a hardener. The epoxy-functional organopolysiloxane coating composition may optionally include pigments, a flow additive and a catalyst. The epoxy-functional organopolysiloxane resin is preferably prepared by reacting a silicone resin with a silane having at least one epoxy group per molecule. The coating composition cures through the crosslinking of the epoxy groups of the resin to provide a coating which is weather and corrosion resistant. The polysiloxane moieties in the resin render the cured coating resistant to U.V. light and heat.Type: GrantFiled: February 5, 2002Date of Patent: March 30, 2004Assignee: Wacker Silicones CorporationInventor: James D. Greene
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Patent number: 6709504Abstract: A composition having water-repellency at high temperature is provided. Some of the invention compositions also exhibits oil-repellency at high temperature. The composition comprises a fluorocarbon silane or hydrolyzate thereof; a surfactant; a polymerizable, silicon-containing compound; and a catalyst.Type: GrantFiled: October 18, 2002Date of Patent: March 23, 2004Assignee: E. I. du Pont de Nemours and CompanyInventors: Satoko Iwato, Mureo Kaku
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Patent number: 6709755Abstract: The present invention is a surface treatment for inorganic substrates, using a primer solution to produce a thin film on a surface of an inorganic substrate thereby extending the shelf life of the inorganic coated substrate and enhancing bonding to a subsequently applied energy curable composition. The coated substrate can be used in a number of commercial applications, e.g., applying a polymer to the coated substrate.Type: GrantFiled: October 18, 2001Date of Patent: March 23, 2004Assignees: E. I. du Pont de Nemours and Company, Corning, IncorporatedInventors: Paul M. Ferm, Robert R. Hancock, Jr., Mark A. Lewis
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Patent number: 6670438Abstract: Methods, compositions, and biomimetic catalysts, such as silicateins and block copolypeptides, used to catalyze and spatially direct the polycondensation of silicon alkoxides, metal alkoxides, and their organic conjugates to make silica, polysiloxanes, polymetallo-oxanes, and mixed poly(silicon/metalklo)oxane materials under environmentally benign conditions.Type: GrantFiled: July 16, 2001Date of Patent: December 30, 2003Assignee: The Regents of the University of CaliforniaInventors: Daniel E. Morse, Galen D. Stucky, Timothy D. Deming, Jennifer Cha, Katsuhiko Shimizu, Yan Zhou
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Patent number: 6649707Abstract: Polycyclic addition polymers derived from norbornene-type monomers are mixed with a variety of other polymers to generate families of new blends, alloys, and block copolymers.Type: GrantFiled: October 4, 2000Date of Patent: November 18, 2003Assignee: Sumitomo Bakelite Co., Ltd.Inventors: Larry F. Rhodes, Brian L. Goodall, Rolf Mülhaupt, Robert A. Shick, George M. Benedikt, Sai Kumar Jayaraman, Lynn M. Soby, Lester H. McIntosh, III
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Patent number: 6623791Abstract: Coating compositions are provided which include a polysiloxane comprising at least one reactive functional group, at least one material comprising at least one reactive functional group, and at least one boron-containing compound. Also provided are multi-layer composite coatings formed from a basecoat deposited from a pigmented coating composition and a topcoat applied over the basecoat, the topcoat deposited from the aforementioned coating composition. Methods for repairing a multi-layer composite coating and coated substrates are also provided. The compositions of the invention provide highly scratch resistant coatings, particularly highly scratch resistant color-plus-clear coatings, which have excellent intercoat adhesion to subsequently applied coating layers.Type: GrantFiled: July 31, 2001Date of Patent: September 23, 2003Assignee: PPG Industries Ohio, Inc.Inventors: Richard J. Sadvary, Lawrence G. Anderson, Shiryn Tyebjee, Thomas R. Hockswender
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Patent number: 6620516Abstract: Disclosed is an organic domain/inorganic domain hybrid material comprising: an organic domain comprising at least one water-soluble or water-dispersible organic polymer having a plurality of functional groups, and an inorganic domain, the organic domain and the inorganic domain being ionically bonded to each other through the functional groups of the organic polymer to form an ionically crosslinked structure, the inorganic domain comprising a plurality of inorganic bridges, each of which independently comprises at least one silicon atom, at least two oxygen atoms and at least two divalent metal atoms, wherein the weight ratio of the organic domain to the inorganic domain is at least 1.0.Type: GrantFiled: February 13, 2002Date of Patent: September 16, 2003Assignee: Asahi Kasei Kabushiki KaishaInventors: Masaaki Kurihara, Hiroyoshi Matsuyama
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Patent number: 6607590Abstract: An optically clear protective thin film having covalent chemical bonds on a molecular level between organic polymer and in situ generated silica molecules is formed from a hydrolyzed coating solution of tetraalkyl orthosilicate, epoxyalkylalkoxy silanes, (math)acryloxyalkylalkoxy silanes and solvent.Type: GrantFiled: May 30, 2001Date of Patent: August 19, 2003Assignee: nanoFILM, Ltd.Inventors: Dan L. Jin, Brij P. Singh
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Patent number: 6605362Abstract: An absorbing ether-like compound including a siliconethoxy, silicondiethoxy, or silicontriethoxy species attached to a naphthalene or anthracene chromophore via an oxygen linkage is used as an organic light-absorbing compound. The absorbing ether-like compound is incorporated into spin-on glass materials to provide anti-reflective coating materials for deep ultraviolet photolithography. A method of synthesizing the light-absorbing ether compounds is based on the reaction of an alcohol-substituted chromophore with an acetoxysilicon compound in the presence of alcohol. A method of making absorbing spin-on-glass materials including the absorbing ether-like compounds is also provided.Type: GrantFiled: November 5, 2001Date of Patent: August 12, 2003Assignee: Honeywell International Inc.Inventors: Teresa Baldwin, Mary Richey, James S. Drage, Hui-Jung Wu, Richard Spear
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Patent number: 6596404Abstract: This invention pertains to a siloxane resin composition comprising R1SiO3/2 siloxane units, R2SiO3/2 siloxane units and (R3O)bSiO(4-b)/2 siloxane units wherein R1 is an alkyl group having 1 to 5 carbons, hydrogen, or mixtures thereof; R2 is a monovalent organic group having 6 to 30 carbons; R3 is a branched alkyl group having 3 to 30 carbons, b is from 1 to 3; and the siloxane resin contains from 2.5 to 85 mole percent R1SiO3/2 units, 2.5 to 50 mole percent R2SiO3/2 units and 5 to 95 mole percent (R3O)bSiO(4-b)/2 units. The siloxane resin is useful to make insoluble porous resin and insoluble porous coatings. Heating a substrate coated with the siloxane resin at a sufficient temperature effects removal of the R2 and R3O groups to form an insoluble insoluble porous coating having a porosity of 1 to 60 volume percent and a dielectric constant in the range of 1.5 to 3.0.Type: GrantFiled: April 15, 2002Date of Patent: July 22, 2003Assignee: Dow Corning CorporationInventors: John Dean Albaugh, Ronald Paul Boisvert, Duane Raymond Bujalski, Pierre Maurice Chevalier, Russell Keith King, Duan Li Ou, Kai Su, Katsuya Eguchi
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Patent number: 6586551Abstract: A silicone composition and the uses thereof, particularly as a coating on an airbag for protecting the occupant of a vehicle in the event of a collision, are disclosed. The aim is to provide a silicone composition suitable for coating onto the inner surface of the airbag while significantly reducing the weight of the resulting coating layer to form a protective coating having enhanced high-temperature, mechanical and substrate-adhesion properties. Said aim is achieved in that the composition is free of reinforcing mineral fillers and consists of a mixture of (1) at least one polyorganosiloxane with alkenyl groups bound to the silicon; (2) at least one polyorganosiloxane with hydrogen atoms bound to the silicon; (3) a cross-linking catalyst; (4) an adhesion promoter comprising (4.1) at least one alkoxylated organosilane, (4.2) at least one epoxy-functional organosilicon compound, and (4.Type: GrantFiled: December 5, 2001Date of Patent: July 1, 2003Assignee: Rhodia ChimieInventors: Fabrice Bohin, Alain Pouchelon
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Publication number: 20030120018Abstract: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.Type: ApplicationFiled: November 19, 2002Publication date: June 26, 2003Inventors: Teresa Baldwin, Joseph Kennedy, Nigel Hacker, Richard Spear
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Patent number: 6561807Abstract: Improved two component polymerizable polyorganosiloxane compositions are described, particularly for use in making dental impressions, having improved tear strength and wettability. Improved tear strength results from inclusion of a quadri-functional polysiloxane having a vinyl content of 0.16 to 0.24 m-mole/g. Working time is maintained by including sufficient amounts of a retarder composition that delays onset of the vinyl polymerization. Wettability is improved by including a surfactant resulting in a surface contact angle with water at three minutes of less than 50°. The surfactant chosen has an HLB of 8-11, such that the wetting contact angle is achieved within less than two minutes and remains wetting throughout the working time of the impression taking, substantially improving impression quality. A low viscosity impression material is provided and includes a base component and a catalyst component. Both components are siloxane-based materials.Type: GrantFiled: March 1, 2002Date of Patent: May 13, 2003Assignee: Dentsply Research & Development Corp.Inventor: Robert V. Hare
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Patent number: 6552151Abstract: The invention relates to organopolysiloxane resins which have a glass transition temperature of more than 60° C. and OH contents of from 1 percent to 8 percent by weight.Type: GrantFiled: June 7, 2001Date of Patent: April 22, 2003Assignee: Wacker-Chemie GmbHInventors: Thomas Köhler, Walter Blüml
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Patent number: 6552104Abstract: Improved very high viscosity (putty) two component polymerizable polyorganosiloxane composition for use in making non-sweating, low liquid mass loss dental impressions, having improved tear strength, handling and wettability. Improved tear strength results from inclusion of a quadri-functional polysiloxane having a vinyl content of 0.16 to 0.24 m-mole/g. Working time is maintained by including sufficient amounts of a retarder composition that delays onset of the vinyl polymerization. Handling is improved by the addition of a very high viscosity linear vinyl terminated polydimethylsiloxane which reduces tackiness and improves the shelf stability. Wettability is improved by including a surfactant resulting in a surface contact angle with water at three minutes of less than 50°.Type: GrantFiled: March 27, 2001Date of Patent: April 22, 2003Assignee: Dentsply Research & Development Corp.Inventor: Robert V. Hare
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Patent number: 6541077Abstract: A silicon-containing polymer having a tetrafunctional siloxane portion as the basic skeleton, and containing a carboxylic acid group-containing triorganosiloxane portion and a carboxylic acid derivative group-containing triorganosiloxane portion in a specific proportion. It may be advantageously used as a negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer.Type: GrantFiled: May 9, 2001Date of Patent: April 1, 2003Assignee: Fujitsu LimitedInventors: Miwa Kozawa, Keiji Watanabe, Ei Yano
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Patent number: 6518371Abstract: A polyorganosiloxane containing the units (HR2Si—O1/2) HM units, (Si—O4/2) Q units, (R1Si—O3/2) T units and (R2Si—O2/2) D units in a ratio of from 2:1:0:0 to 6:4:2:2, or (HR2Si—O1/2) HM units, (R1Si—O3/2) T units, (R2Si—O2/2) D units and (R2(R1O)Si—O1/2) in a ratio HM:T:D:alkoxyM of from 1:2:0:0 to 3:4:2:2 is described, where R are identical or different, non-halogenated or halogenated hydrocarbon radicals having from 1 to 18 carbon atoms per radical, or are OR1, where R1 is a monovalent, unsubstituted or substituted hydrocarbon radical having from 1 to 8 carbon atoms, and in each molecule there are at least 3 Si-bonded hydrogen atoms. The polyorganosiloxanes are particularly useful as crosslinking agents in addition curable elastomer formulations.Type: GrantFiled: May 4, 2000Date of Patent: February 11, 2003Assignee: Wacker-Chemie GmbHInventors: Peter Fink, Peter Jerschow, Hedwig Schreiter, Richard Birneder, Alois Riedl
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Patent number: 6512059Abstract: The invention relates to a composition, to a process for its preparation and to a method of coating shaped articles or elastomeric materials, where the composition can be prepared using (1) polymer components selected from the group consisting of (A1) polyorganosiloxanes comprising units (T units) of the formula (R1Si—O3/2) and optionally, units (M units) of the formula (R3Si—O1/2) (A2) polyorganosiloxanes comprising units (Q units) of the formula (Si—O4/2) and, optionally, units (M units) of the formula (R3Si—O1/2) in which R is identical or different and represents unhalogenated or halogenated hydrocarbon radicals having 1 to 18 carbon atom(s) per radical or OR1, where R1 is identical or different and represents hydrogen or a monovalent, unsubstituted or substituted hydrocarbon radical having 1 to 8 carbon atom(s), with the proviso that there are from 0.01% to 3.0% by weight, preferably from 0.Type: GrantFiled: April 14, 2000Date of Patent: January 28, 2003Assignee: Wacker-Chemie GmbHInventor: Johann Mueller
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Patent number: 6503633Abstract: A composition for film formation which, when used in the production of semiconductor devices and the like, can give interlayer insulating films which differ little in dielectric constant even when obtained through curing under different conditions and have excellent adhesion to substrates, a process for producing the composition, and a silica-based film obtained from the composition. The composition for film formation comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing (A-1) at least one compound selected from the group consisting of compounds represented by the following formula (1), compounds represented by the following formula (2), and compounds represented by the following formula (3), and (A-2) at least one compound represented by the following formula (4), in the presence of a catalyst and water; and (B) an organic solvent.Type: GrantFiled: May 21, 2001Date of Patent: January 7, 2003Assignee: JSR CorporationInventors: Michinori Nishikawa, Kouichi Hasegawa, Eiji Hayashi, Kinji Yamada
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Patent number: 6495649Abstract: Spherical silicone fine particles having an average particle diameter of 0.1 to 5 &mgr;m, which can be produced without decreasing a yield and also without conducting a dilution step, and a process for effectively producing the same. Spherical silicone particles are obtained by reacting an organotrialkoxysilane with a tetraalkoxysilane. Water in an amount of 20 to 150 moles is added to 1 mole of the silane mixture, which is subjected to hydrolysis under an acidic condition to obtain an aqueous or alcohol solution of an organosilanol and/or the partial hydrolyzed product thereof, and an aqueous alkaline solution is added thereto, mixed and allowed to stand to conduct polycondensation.Type: GrantFiled: January 16, 2001Date of Patent: December 17, 2002Assignee: GE Toshiba Silicones Co., Ltd.Inventors: Yukinobu Harada, Akira Takagi
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Patent number: 6448331Abstract: Disclosed is an alkoxysilane/organic polymer composition for use in producing an insulating thin film, comprising (A) a specific alkoxysilane; (B) a specific organic polymer; and (C) a solvent for alkoxysilane (A) and organic polymer (B), wherein solvent (C) comprises at least one organic solvent selected from the group consisting of amide linkage-containing organic solvents and ester linkage-containing organic solvents. Also disclosed are a silica-organic polymer composite thin film which is produced by a process comprising: forming a thin film of the composition of the present invention; subjecting the thin film to a hydrolysis and dehydration-condensation reaction with respect to the alkoxysilane thereof, to thereby cause the alkoxysilane to be gelled in the thin film; and removing the solvent remaining in the thin film by drying, and a porous silica thin film which is obtained by removing the organic polymer from the silica-organic polymer composite thin film.Type: GrantFiled: November 12, 1999Date of Patent: September 10, 2002Assignee: Asahi Kasei Kabushiki KaishaInventors: Takaaki Ioka, Tsuneaki Tanabe
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Publication number: 20020095018Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one organic light-absorbing compound incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining at least one organic absorbing compound with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.Type: ApplicationFiled: November 15, 2001Publication date: July 18, 2002Inventors: Teresa Baldwin, Joseph Kennedy, Nigel Hacker, Richard Spear
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Patent number: 6417310Abstract: A branched organopolysiloxane is prepared by polymerizing an organopolysiloxane mixture of a branch unit-containing organopolysiloxane and a low molecular weight organopolysiloxane in the presence of an acidic or basic catalyst, or by adding a surfactant to the organopolysiloxane mixture, dispersing it in water to form an emulsion, and polymerizing the emulsion.Type: GrantFiled: September 11, 2000Date of Patent: July 9, 2002Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Naoki Omura, Satoshi Kuwata, Yoshihito Osawa
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Patent number: 6413354Abstract: A silicone composition that is oil resistant when cured is described. More particularly, this composition includes a silanol terminated silicone fluid, an organic plasticizer, a filler and a crosslinker, wherein the cured composition remains adhesive after exposure to oil. The present compositions provide superior adhesive properties after exposure to oil than conventional RTV silicone adhesives having M-stopped silicone plasticizers. Methods of making and using cured elastomeric products made from the present compositions are also provided.Type: GrantFiled: February 17, 2000Date of Patent: July 2, 2002Assignee: Loctite CorporationInventors: Hans E. Haas, Frank L. Kovacs
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Patent number: 6399733Abstract: A process for preparing a highly pure silicone ladder polymer of the general formula (1): wherein R1 and R2 represent F, H, a lower alkyl group, an alkenyl group, an aryl group, a lower fluorinated alkyl group, a fluorinated alkenyl group or a fluorinated aryl group; R3, R4, R5 and R6 each represents H, a lower alkyl group or a lower fluorinated alkyl group; and n represents an integer of 5 to 10000, which comprises: (a) a step of obtaining a prepolymer in which at least one organosilane compound is dissolved in an organic solvent and hydrolyzed with ultrapure water; (b) a step of washing the obtained prepolymer with ultrapure water; and, (c) a step of dissolving the washed prepolymer in an organic solvent and heating without a catalyst.Type: GrantFiled: October 11, 2000Date of Patent: June 4, 2002Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Shigeyuki Yamamoto, Naoki Yasuda, Motohisa Taguchi
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Patent number: 6376634Abstract: A composition for film formation which is useful as an interlayer insulating film material in the production of semiconductor devices and the like, and gives a coating film having excellent uniformity, low dielectric constant, low leakage current and excellent storage stability; and a material for insulating film formation using the composition. The composition comprises (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of (A-1) compounds represented by the formula (1): R1aSi(OR2)4−a, and (A-2) compounds represented by the formula (2): R3b(R4O)3−bSi—(R7)d—Si(OR5)3−cR6c; and (B) a compound represented by the formula (3): R8O (CHCH3CH2O)eR9.Type: GrantFiled: June 2, 2000Date of Patent: April 23, 2002Assignee: JSR CorporationInventors: Michinori Nishikawa, Kinji Yamada, Mayumi Kakuta, Yasutake Inoue, Masahiko Ebisawa, Satoko Hakamatsuka, Kentarou Tamaki
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Patent number: 6369184Abstract: A silicone composition and the uses thereof, particularly as a coating on an airbag for protecting the occupant of a vehicle in the event of a collision, are disclosed. The aim is to provide a silicone composition suitable for coating onto the inner surface of the airbag while significantly reducing the weight of the resulting coating layer to form a protective coating having enhance high-temperature, mechanical and substrate-adhesion properties. Said aim is achieved in that the composition is free of reinforcing mineral fillers and consists of a mixture of (1) at least one polyorganosilocane with alkenyl groups bound to the silicon; (2) at least one polyorganosiloxane with hydrogen atoms bound to the silicon; (3) a cross-linking catalyst; (4) an adhesion promoter comprising (4.1) at least one alkoxylated organosilane, (4.2) at least one epoxy-functional organosilicon compound, and (4.Type: GrantFiled: September 24, 1999Date of Patent: April 9, 2002Assignee: Rhodia ChimieInventors: Fabrice Bohin, Alain Pouchelon
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Patent number: 6368400Abstract: An absorbing ether-like compound including a siliconethoxy, silicondiethoxy, or silicontriethoxy species attached to a naphthalene or anthracene chromophore via an oxygen linkage is used as an organic light-absorbing compound. The absorbing ether-like compound is incorporated into spin-on glass materials to provide anti-reflective coating materials for deep ultraviolet photolithography. A method of synthesizing the light-absorbing ether compounds is based on the reaction of an alcohol-substituted chromophore with an acetoxysilicon compound in the presence of alcohol. A method of making absorbing spin-on-glass materials including the absorbing ether-like compounds is also provided.Type: GrantFiled: July 17, 2000Date of Patent: April 9, 2002Assignee: Honeywell InternationalInventors: Teresa Baldwin, Mary Richey, James S. Drage, Hui-Jung Wu, Richard Spear
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Patent number: 6359667Abstract: An organopolysiloxane fine particle comprising as a principal component a polysiloxane having a hydrocarbon group (a) directly bonded to a silicon atom and having an OH group (b) directly bonded to a silicon atom, wherein: (i) carbons contained in the hydrocarbon group (a) constitute 5 to 35% of the weight of the organopolysiloxane fine particles, and (ii) the OH group (b) is in an amount of 1 to 8 meq per g of the organopolysiloxane fine particles, the organopolysiloxane fine particles having: (iii) a 10% compressive modulus of elasticity of 150 to 900 Kg/mm2, (iv) an average compressive deformation (Cr)m of 20 to 60%, (v) an average elastic recovery (Rr)m of 60 to 90%, and (vi) an average particle diameter of 0.5 to 50 &mgr;m.Type: GrantFiled: August 8, 2000Date of Patent: March 19, 2002Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Tsuguo Koyanagi, Michio Komatsu, Kazuhiro Nakayama
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Patent number: 6359096Abstract: Soluble silicone resin compositions having good solution stability and a method for their preparation. The silicone resin comprises the reaction product of a mixture comprising (A) 15-70 mol % of a tetraalkoxysilane described by formula Si(OR1)4, where each R1 is an independently selected alkyl group comprising 1 to about 6 carbon atoms, (B) 12 to 60 mol % of a hydrosilane described by formula HSiX3, where each X is an independently selected hydrolyzable substituent, (C) 15 to 70 mole percent of an organotrialkoxysilane described by formula R2Si(OR3)3, where R2 is a hydrocarbon group comprising about 8 to 24 carbon atoms or a substituted hydrocarbon group comprising a hydrocarbon chain having about 8 to 24 carbon atoms and each R3 is an independently selected alkyl group comprising 1 to about 6 carbon atoms; in the presence of (D) water, (E) hydrolysis catalyst, and (F) organic solvent for the reaction product.Type: GrantFiled: October 25, 1999Date of Patent: March 19, 2002Assignee: Dow Corning CorporationInventors: Bianxiao Zhong, Russell Keith King, Kyuha Chung, Shizhong Zhang
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Patent number: 6344520Abstract: The present invention pertains to an epoxy-functional organopolysiloxane resin, and an epoxy-functional organopolysiloxane coating composition comprising the epoxy-functional organopolysiloxane resin.Type: GrantFiled: June 24, 1999Date of Patent: February 5, 2002Assignee: Wacker Silicones CorporationInventor: James D. Greene
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Patent number: 6342562Abstract: A silicon-containing polymer having a tetrafunctional siloxane portion as the basic skeleton, and containing a carboxylic acid group-containing triorganosiloxane portion and a carboxylic acid derivative group-containing triorganosiloxane portion in a specific proportion. It may be advantageously used as a negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer.Type: GrantFiled: April 20, 2000Date of Patent: January 29, 2002Assignee: Fujitsu LimitedInventors: Miwa Kozawa, Keiji Watanabe, Ei Yano
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Publication number: 20010056168Abstract: A silicone rubber composition for extrusion molding applications has a high cure rate and provides silicone rubber extrusion moldings that post-cure and are either free of bubbles or contain bubbles to an extremely limited extent. It contains (A) an organopolysiloxane gum, (B) reinforcing silica, (C) diatomaceous earth powder or quartz powder, and (D) an organoperoxide with the formula R-COOOCOO-R1-OOCOOOC-R, wherein R is a group selected from alkyl, alkoxy, —SiR23, —CH2SiR23, and -Ph-R3c (R2 is alkyl or alkoxy; Ph is phenyl when c is 0, and phenylene when c is 1,2 or 3; R3 is alkyl, alkoxy, SiR23, or —CH2SiR23; and c is 0 to 3) and R1 is C1 to C10 alkylene. A method is described for fabricating silicone rubber extrusion moldings by curing the silicone rubber composition in a hot gas.Type: ApplicationFiled: April 18, 2001Publication date: December 27, 2001Inventors: Hiroshi Honma, Kazuo Hirai, Katsuya Baba
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Patent number: 6326011Abstract: A copolymer having silyl groups with at least one reactive functional group bonded thereto. The copolymer comprises a monomer (A) shown by the following Formula (I): wherein R1 is hydrogen atom or methyl; R2 is alkylene group having 1-6 carbon atoms; and R3, R4 and R5 each is a reactive functional group which can cross-link molecules of the copolymer by hydrolyzing. Further, the copolymer preferably comprises, as a constituent monomer, an alkyl (meth)acrylate and a siloxane-containing (meth)acrylate. A coating-forming method comprises hydrolyzing the composition on a material to be treated to cross-link molecules of the copolymer when on the material. A coating of the cross-linked copolymer has resistance to washing. This coating can modify the nature of hair, improve make-up retention, and provide skin-protecting. It can impart water-repellency, resistance to fouling, suitability as a sizing and crease resistance to fibers.Type: GrantFiled: January 28, 1999Date of Patent: December 4, 2001Assignee: Shiseido Co., Ltd.Inventors: Kazuyuki Miyazawa, Toshio Yanaki, Fumiaki Matsuzaki
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Patent number: 6313217Abstract: The invention relates to aliphatically unsaturated organosilicon compounds having 2 to 17 silicon atoms, to processes for their preparation and to their use in crosslinkable organopolysiloxane compositions, especially in compositions which can be crosslinked peroxidically or by hydrosilylation.Type: GrantFiled: August 4, 1999Date of Patent: November 6, 2001Assignee: Wacker-Chemie GmbHInventors: Herbert Barthel, Johann Schuster, Richard Weidner, Michael Stepp, Volker Frey
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Patent number: 6306928Abstract: Water resistant ink compositions comprising (I) a water-soluble dye compound and/or an organic pigment compound; (II) an organosilicon compound obtained by hydrolyzing a mixture of (A) a hydrolyzable silane obtained by reacting a specific aminated organic group-bearing hydrolyzable silane with an organic monoepoxy compound, or a partial hydrolyzate thereof, and (B) a specific hydrolyzable silane or a partial hydrolyzate thereof; and (III) water have excellent water resistance, good storage and shelf stability, good ink discharge stability, and outstanding color stability. These ink compositions are particularly suitable for use as ink-jet printer inks.Type: GrantFiled: March 3, 1999Date of Patent: October 23, 2001Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Kazuyuki Matsumura, Masanao Kamei, Masaaki Yamaya, Akira Yamamoto
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Publication number: 20010031849Abstract: Spherical silicone fine particles having an average particle diameter of 0.1 to 5 &mgr;m, which can be produced without decreasing a yield and also without conducting a dilution step, and a process for effectively producing the same. Spherical silicone particles are obtained by reacting an organotrialkoxysilane with a tetraalkoxysilane. Water in an amount of 20 to 150 moles is added to 1 mole of the silane mixture, which is subjected to hydrolysis under an acidic condition to obtain an aqueous or alcohol solution of an organosilanol and/or the partial hydrolyzed product thereof, and an aqueous alkaline solution is added thereto, mixed and allowed to stand to conduct polycondensation.Type: ApplicationFiled: January 16, 2001Publication date: October 18, 2001Inventors: Yukinobu Harada, Akira Takagi