With Silicon Reactant Which Is Free Of Any Silicon To Carbon Bond Patents (Class 528/39)
  • Patent number: 6887934
    Abstract: Resin modified elastomers, methods of making them and their uses. The method for making the elastomers comprises reacting in a diluent an ?SiH functional siloxane; a diene, diyne or ene-yne compound, a resin having the formula (R13SiO1/2)x(SiO4/2)y(R1SiO3/2)z where each R1 is independently a monovalent hydrocarbon group having 1 to 30 carbon atoms or an unsaturated hydrocarbon group having 2 to 30 carbon atoms x is ?1, y?0, z?0 and y+z?1.
    Type: Grant
    Filed: August 26, 2002
    Date of Patent: May 3, 2005
    Assignee: Dow Corning Corporation
    Inventors: Michael Salvatore Ferritto, Tina Marie Leaym, William James Schulz, Jr., Janet Mary Smith
  • Patent number: 6884512
    Abstract: The invention relates to an article superior in making a waterdrop slip down a surface of the article. This article includes a substrate; and a functional film formed on a surface of the substrate. This functional film contains: (a) a silica forming a matrix of the functional film; (b) a silylated-terminal dimethyl silicone represented by the general formula [A], the dimethyl silicone being in an amount of from 0.1 wt % to 10 wt %, based on a total weight of the silica; and (c) a fluoroalkylsilane represented by the general formula [B] B(CF2)rCH2CH2Si(CH3)3-s(O?s??[B].
    Type: Grant
    Filed: July 29, 2003
    Date of Patent: April 26, 2005
    Assignee: Central Glass Company, Limited
    Inventors: Yoshinori Akamatsu, Soichi Kumon, Kaname Hatakenaka, Haruki Kuramashi, Hiroaki Arai, Shigeo Hamaguchi
  • Patent number: 6872456
    Abstract: This invention pertains to a siloxane resin composition comprising R1SiO3/2 siloxane units, R2SiO3/2 siloxane units and (R3O)bSiO(4-b)/2 siloxane units wherein R1 is an alkyl group having 1 to 5 carbons, hydrogen, or mixtures thereof; R2 is a monovalent organic group having 6 to 30 carbons; R3 is a branched alkyl group having 3 to 30 carbons, b is from 1 to 3; and the siloxane resin contains from 2.5 to 85 mole percent R1SiO3/2 units, 2.5 to 50 mole percent R2SiO3/2 units and 5 to 95 mole percent (R3O)bSiO(4-b)/2 units. The siloxane resin is useful to make insoluble porous resin and insoluble porous coatings. Heating a substrate coated with the siloxane resin at a sufficient temperature effects removal of the R2 and R3O groups to form an insoluble insoluble porous coating having a porosity of 1 to 60 volume percent and a dielectric constant in the range of 1.5 to 3.0.
    Type: Grant
    Filed: July 26, 2001
    Date of Patent: March 29, 2005
    Assignee: Dow Corning Corporation
    Inventors: Ronald Paul Boisvert, Duane Raymond Bujalski, Kai Su
  • Patent number: 6872454
    Abstract: This invention relates generally to heat curable compositions, particularly well utilized for use as impregnation sealants curable using hydrosilation chemistry. The heat curable compositions of the present invention can be stored and shipped as a one-part composition. The composition includes at least one curable unsaturated organic component, at least one co-reactant, which has at least two functional groups reactive with the organic component, and at least one catalyst of initiating the cure of the composition.
    Type: Grant
    Filed: May 18, 2001
    Date of Patent: March 29, 2005
    Assignee: Henkel Corporation
    Inventors: Frederick F. Newberth, III, Peter J. Chupas
  • Patent number: 6852367
    Abstract: Disclosed are stable organo polysilica resin composition containing a B-staged organo polysilica resin and an organic acid, methods of stabilizing such B-staged organo polysilica resin compositions and methods of manufacturing electronic devices using such stable compositions.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: February 8, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Yujian You, Robert H. Gore, Michael K. Gallagher
  • Patent number: 6852368
    Abstract: A resin substrate having a hard coat formed from a hard coat composition which comprises colloidal silica, a silicon compound having a fluoroalkyl group and optionally an ultraviolet light absorbing organic group. This resin substrate can retain water-repellency even when it is used in the open air and prevent the adhesion of a stain while it keeps its abrasion resistance for a long time by the hard coat composition.
    Type: Grant
    Filed: April 12, 2002
    Date of Patent: February 8, 2005
    Assignee: Nippon Arc Co., Ltd.
    Inventors: Masayuki Takaguchi, Fujio Sawaragi
  • Patent number: 6818722
    Abstract: For the preparation of organopolysiloxanes, water glass diluted with water to a concentration of 3 to 15 wt % is reacted with a triorganohalosilane in the presence of an acid and an oxygen-containing solvent such as isobutyl alcohol, methyl isobutyl ketone or 1-pentanol. The invention achieves a considerable reduction of the environmental load, an improved utilization of reactants, an improved yield, and a cost reduction, and enables production of low viscosity MQ resins.
    Type: Grant
    Filed: January 23, 2003
    Date of Patent: November 16, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kiyoyuki Mutoh, Yasuhito Mohara, Susumu Ueno
  • Patent number: 6815519
    Abstract: The present invention discloses an acidic fluorine-containing hybrid having a uniform distribution of an organic and an inorganic components prepared by a sol-gel process. The organic component is a fluorine-containing poly(siloxane amideimide) having a good processing ability, gas permeability, mechanical properties, and chemical stability. The inorganic component is silica having good heat resistance and moisture resistance. The hybrid has excellent properties, such as a good film formation property, a high gas selectivity, a low dielectric constant, a good resistance to scraping, and a good transparency, etc., and can be used in making industrial products, such as gas detection films, sensors, encapsulation material, photoelectrical communication material, and biomedical material, etc.
    Type: Grant
    Filed: March 22, 2002
    Date of Patent: November 9, 2004
    Assignee: Chung-Shan Institute of Science & Technology
    Inventors: Yie-Shun Chiu, Hsing-Tsai Huang, Te-Chuan Chang, Gaw-Pying Wang, Yaw-Shun Hong
  • Patent number: 6811884
    Abstract: A method is provided for applying a water repellant coating over a substrate surface. The surface is contacted with at least one coating composition including at least one perfluoroalkylalkylsilane, at least one hydrolyzable primer, e.g., a silane and/or siloxane, and at least one non-halogenated, e.g., non-fluorinated, alkylsilane. The perfluoroalkylalkylsilane and non-fluorinated alkylsilane can be selected such that the effective chain length of the non-fluorinated alkylsilane is equal to or longer than the effective chain length of the perfluoroalkylalkylsilane.
    Type: Grant
    Filed: December 24, 2002
    Date of Patent: November 2, 2004
    Assignee: PPG Industries Ohio, Inc.
    Inventors: George B. Goodwin, Chia-Cheng Lin
  • Patent number: 6800330
    Abstract: A composition for film formation capable of forming a silica-based coating film having low water absorption and dielectric constant of 2.1 or lower and useful as an interlayer insulating film material in semiconductor devices, etc.
    Type: Grant
    Filed: March 25, 2002
    Date of Patent: October 5, 2004
    Assignee: JSR Corporation
    Inventors: Eiji Hayashi, Michinori Nishikawa, Atsushi Shiota, Kinji Yamada
  • Patent number: 6770726
    Abstract: Silsesquioxane polymers that are useful for preparing SiO2-rich ceramic coatings are obtained as the polymeric reaction products from the hydrolysis and condensation of organosilanes having a &bgr;-substituted alkyl group. A preferred silsesquioxane polymer is the polymeric reaction product obtained from &bgr;-chloroethyltrichlorosilane. More preferred silsesquioxones are those with non-halogenated alkyl groups, such as the &bgr;-acetoxyethyl- and &bgr;-hydroxyethyl-silsesquioxones. Coating compositions containing such silsesquioxane polymers dissolved in organic solvent may be applied to a substrate and converted to SiO2-rich ceramic thin layers by evaporating the solvent and heating the coated substrate at moderate temperatures.
    Type: Grant
    Filed: December 28, 1998
    Date of Patent: August 3, 2004
    Assignees: Gelest, Inc., University of Pennsylvania
    Inventors: Barry C. Arkles, Donald H. Berry
  • Patent number: 6767984
    Abstract: This invention provides a top coating composition which comprises a coating film-forming resin (I); as well as a silicate compound (II) besides a hydrolyzable silyl-containing resin (III) and/or a silicate-grafted resin (IV) resulting from graft polymerization of a silicate compound (II) onto a hydrolyzable silyl-containing resin (III).
    Type: Grant
    Filed: May 10, 2001
    Date of Patent: July 27, 2004
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Teruzo Toui, Hisaki Tanabe, Nobuhisa Sudo, Satoshi Urano, Manabu Yoshioka
  • Patent number: 6743517
    Abstract: An optical device assembled by means of an adhesive composition which is free from the cracking of an adhesive layer thereof, is prepared easily and has excellent adhesive strength. The optical device is produced by placing an adhesive composition prepared by hydrolyzing, dehydrating and condensing a starting solution which contains 10 to 50 mol % of a silane compound represented by SiX14 (X1 is a hydrolyzable group) or a combination of the silane compound and a metal alkoxide, 25 to 65 mol % of a silane compound represented by PhSiX23 (Ph is a phenyl group or substituted phenyl group, and X2 is a hydrolyzable group), and 25 to 65 mol % of a silane compound represented by (CH3)2SiX32 (X3 is a hydrolyzable group) between an optical part and another part and heating it to bond the optical part to the another part.
    Type: Grant
    Filed: July 1, 2003
    Date of Patent: June 1, 2004
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventors: Koichiro Nakamura, Hiroko Shikata, Hiroaki Yamamoto
  • Patent number: 6713586
    Abstract: The present invention pertains to an epoxy-functional organopolysiloxane resin, and an epoxy-functional organopolysiloxane coating composition comprising the epoxy-functional organopolysiloxane resin. The epoxy-functional organopolysiloxane coating composition comprises the epoxy-functional organopolysiloxane resin of the present invention and a hardener. The epoxy-functional organopolysiloxane coating composition may optionally include pigments, a flow additive and a catalyst. The epoxy-functional organopolysiloxane resin is preferably prepared by reacting a silicone resin with a silane having at least one epoxy group per molecule. The coating composition cures through the crosslinking of the epoxy groups of the resin to provide a coating which is weather and corrosion resistant. The polysiloxane moieties in the resin render the cured coating resistant to U.V. light and heat.
    Type: Grant
    Filed: February 5, 2002
    Date of Patent: March 30, 2004
    Assignee: Wacker Silicones Corporation
    Inventor: James D. Greene
  • Patent number: 6709504
    Abstract: A composition having water-repellency at high temperature is provided. Some of the invention compositions also exhibits oil-repellency at high temperature. The composition comprises a fluorocarbon silane or hydrolyzate thereof; a surfactant; a polymerizable, silicon-containing compound; and a catalyst.
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: March 23, 2004
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Satoko Iwato, Mureo Kaku
  • Patent number: 6709755
    Abstract: The present invention is a surface treatment for inorganic substrates, using a primer solution to produce a thin film on a surface of an inorganic substrate thereby extending the shelf life of the inorganic coated substrate and enhancing bonding to a subsequently applied energy curable composition. The coated substrate can be used in a number of commercial applications, e.g., applying a polymer to the coated substrate.
    Type: Grant
    Filed: October 18, 2001
    Date of Patent: March 23, 2004
    Assignees: E. I. du Pont de Nemours and Company, Corning, Incorporated
    Inventors: Paul M. Ferm, Robert R. Hancock, Jr., Mark A. Lewis
  • Patent number: 6670438
    Abstract: Methods, compositions, and biomimetic catalysts, such as silicateins and block copolypeptides, used to catalyze and spatially direct the polycondensation of silicon alkoxides, metal alkoxides, and their organic conjugates to make silica, polysiloxanes, polymetallo-oxanes, and mixed poly(silicon/metalklo)oxane materials under environmentally benign conditions.
    Type: Grant
    Filed: July 16, 2001
    Date of Patent: December 30, 2003
    Assignee: The Regents of the University of California
    Inventors: Daniel E. Morse, Galen D. Stucky, Timothy D. Deming, Jennifer Cha, Katsuhiko Shimizu, Yan Zhou
  • Patent number: 6649707
    Abstract: Polycyclic addition polymers derived from norbornene-type monomers are mixed with a variety of other polymers to generate families of new blends, alloys, and block copolymers.
    Type: Grant
    Filed: October 4, 2000
    Date of Patent: November 18, 2003
    Assignee: Sumitomo Bakelite Co., Ltd.
    Inventors: Larry F. Rhodes, Brian L. Goodall, Rolf Mülhaupt, Robert A. Shick, George M. Benedikt, Sai Kumar Jayaraman, Lynn M. Soby, Lester H. McIntosh, III
  • Patent number: 6623791
    Abstract: Coating compositions are provided which include a polysiloxane comprising at least one reactive functional group, at least one material comprising at least one reactive functional group, and at least one boron-containing compound. Also provided are multi-layer composite coatings formed from a basecoat deposited from a pigmented coating composition and a topcoat applied over the basecoat, the topcoat deposited from the aforementioned coating composition. Methods for repairing a multi-layer composite coating and coated substrates are also provided. The compositions of the invention provide highly scratch resistant coatings, particularly highly scratch resistant color-plus-clear coatings, which have excellent intercoat adhesion to subsequently applied coating layers.
    Type: Grant
    Filed: July 31, 2001
    Date of Patent: September 23, 2003
    Assignee: PPG Industries Ohio, Inc.
    Inventors: Richard J. Sadvary, Lawrence G. Anderson, Shiryn Tyebjee, Thomas R. Hockswender
  • Patent number: 6620516
    Abstract: Disclosed is an organic domain/inorganic domain hybrid material comprising: an organic domain comprising at least one water-soluble or water-dispersible organic polymer having a plurality of functional groups, and an inorganic domain, the organic domain and the inorganic domain being ionically bonded to each other through the functional groups of the organic polymer to form an ionically crosslinked structure, the inorganic domain comprising a plurality of inorganic bridges, each of which independently comprises at least one silicon atom, at least two oxygen atoms and at least two divalent metal atoms, wherein the weight ratio of the organic domain to the inorganic domain is at least 1.0.
    Type: Grant
    Filed: February 13, 2002
    Date of Patent: September 16, 2003
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Masaaki Kurihara, Hiroyoshi Matsuyama
  • Patent number: 6607590
    Abstract: An optically clear protective thin film having covalent chemical bonds on a molecular level between organic polymer and in situ generated silica molecules is formed from a hydrolyzed coating solution of tetraalkyl orthosilicate, epoxyalkylalkoxy silanes, (math)acryloxyalkylalkoxy silanes and solvent.
    Type: Grant
    Filed: May 30, 2001
    Date of Patent: August 19, 2003
    Assignee: nanoFILM, Ltd.
    Inventors: Dan L. Jin, Brij P. Singh
  • Patent number: 6605362
    Abstract: An absorbing ether-like compound including a siliconethoxy, silicondiethoxy, or silicontriethoxy species attached to a naphthalene or anthracene chromophore via an oxygen linkage is used as an organic light-absorbing compound. The absorbing ether-like compound is incorporated into spin-on glass materials to provide anti-reflective coating materials for deep ultraviolet photolithography. A method of synthesizing the light-absorbing ether compounds is based on the reaction of an alcohol-substituted chromophore with an acetoxysilicon compound in the presence of alcohol. A method of making absorbing spin-on-glass materials including the absorbing ether-like compounds is also provided.
    Type: Grant
    Filed: November 5, 2001
    Date of Patent: August 12, 2003
    Assignee: Honeywell International Inc.
    Inventors: Teresa Baldwin, Mary Richey, James S. Drage, Hui-Jung Wu, Richard Spear
  • Patent number: 6596404
    Abstract: This invention pertains to a siloxane resin composition comprising R1SiO3/2 siloxane units, R2SiO3/2 siloxane units and (R3O)bSiO(4-b)/2 siloxane units wherein R1 is an alkyl group having 1 to 5 carbons, hydrogen, or mixtures thereof; R2 is a monovalent organic group having 6 to 30 carbons; R3 is a branched alkyl group having 3 to 30 carbons, b is from 1 to 3; and the siloxane resin contains from 2.5 to 85 mole percent R1SiO3/2 units, 2.5 to 50 mole percent R2SiO3/2 units and 5 to 95 mole percent (R3O)bSiO(4-b)/2 units. The siloxane resin is useful to make insoluble porous resin and insoluble porous coatings. Heating a substrate coated with the siloxane resin at a sufficient temperature effects removal of the R2 and R3O groups to form an insoluble insoluble porous coating having a porosity of 1 to 60 volume percent and a dielectric constant in the range of 1.5 to 3.0.
    Type: Grant
    Filed: April 15, 2002
    Date of Patent: July 22, 2003
    Assignee: Dow Corning Corporation
    Inventors: John Dean Albaugh, Ronald Paul Boisvert, Duane Raymond Bujalski, Pierre Maurice Chevalier, Russell Keith King, Duan Li Ou, Kai Su, Katsuya Eguchi
  • Patent number: 6586551
    Abstract: A silicone composition and the uses thereof, particularly as a coating on an airbag for protecting the occupant of a vehicle in the event of a collision, are disclosed. The aim is to provide a silicone composition suitable for coating onto the inner surface of the airbag while significantly reducing the weight of the resulting coating layer to form a protective coating having enhanced high-temperature, mechanical and substrate-adhesion properties. Said aim is achieved in that the composition is free of reinforcing mineral fillers and consists of a mixture of (1) at least one polyorganosiloxane with alkenyl groups bound to the silicon; (2) at least one polyorganosiloxane with hydrogen atoms bound to the silicon; (3) a cross-linking catalyst; (4) an adhesion promoter comprising (4.1) at least one alkoxylated organosilane, (4.2) at least one epoxy-functional organosilicon compound, and (4.
    Type: Grant
    Filed: December 5, 2001
    Date of Patent: July 1, 2003
    Assignee: Rhodia Chimie
    Inventors: Fabrice Bohin, Alain Pouchelon
  • Publication number: 20030120018
    Abstract: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
    Type: Application
    Filed: November 19, 2002
    Publication date: June 26, 2003
    Inventors: Teresa Baldwin, Joseph Kennedy, Nigel Hacker, Richard Spear
  • Patent number: 6561807
    Abstract: Improved two component polymerizable polyorganosiloxane compositions are described, particularly for use in making dental impressions, having improved tear strength and wettability. Improved tear strength results from inclusion of a quadri-functional polysiloxane having a vinyl content of 0.16 to 0.24 m-mole/g. Working time is maintained by including sufficient amounts of a retarder composition that delays onset of the vinyl polymerization. Wettability is improved by including a surfactant resulting in a surface contact angle with water at three minutes of less than 50°. The surfactant chosen has an HLB of 8-11, such that the wetting contact angle is achieved within less than two minutes and remains wetting throughout the working time of the impression taking, substantially improving impression quality. A low viscosity impression material is provided and includes a base component and a catalyst component. Both components are siloxane-based materials.
    Type: Grant
    Filed: March 1, 2002
    Date of Patent: May 13, 2003
    Assignee: Dentsply Research & Development Corp.
    Inventor: Robert V. Hare
  • Patent number: 6552151
    Abstract: The invention relates to organopolysiloxane resins which have a glass transition temperature of more than 60° C. and OH contents of from 1 percent to 8 percent by weight.
    Type: Grant
    Filed: June 7, 2001
    Date of Patent: April 22, 2003
    Assignee: Wacker-Chemie GmbH
    Inventors: Thomas Köhler, Walter Blüml
  • Patent number: 6552104
    Abstract: Improved very high viscosity (putty) two component polymerizable polyorganosiloxane composition for use in making non-sweating, low liquid mass loss dental impressions, having improved tear strength, handling and wettability. Improved tear strength results from inclusion of a quadri-functional polysiloxane having a vinyl content of 0.16 to 0.24 m-mole/g. Working time is maintained by including sufficient amounts of a retarder composition that delays onset of the vinyl polymerization. Handling is improved by the addition of a very high viscosity linear vinyl terminated polydimethylsiloxane which reduces tackiness and improves the shelf stability. Wettability is improved by including a surfactant resulting in a surface contact angle with water at three minutes of less than 50°.
    Type: Grant
    Filed: March 27, 2001
    Date of Patent: April 22, 2003
    Assignee: Dentsply Research & Development Corp.
    Inventor: Robert V. Hare
  • Patent number: 6541077
    Abstract: A silicon-containing polymer having a tetrafunctional siloxane portion as the basic skeleton, and containing a carboxylic acid group-containing triorganosiloxane portion and a carboxylic acid derivative group-containing triorganosiloxane portion in a specific proportion. It may be advantageously used as a negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer.
    Type: Grant
    Filed: May 9, 2001
    Date of Patent: April 1, 2003
    Assignee: Fujitsu Limited
    Inventors: Miwa Kozawa, Keiji Watanabe, Ei Yano
  • Patent number: 6518371
    Abstract: A polyorganosiloxane containing the units (HR2Si—O1/2) HM units, (Si—O4/2) Q units, (R1Si—O3/2) T units and (R2Si—O2/2) D units in a ratio of from 2:1:0:0 to 6:4:2:2, or (HR2Si—O1/2) HM units, (R1Si—O3/2) T units, (R2Si—O2/2) D units and (R2(R1O)Si—O1/2) in a ratio HM:T:D:alkoxyM of from 1:2:0:0 to 3:4:2:2 is described, where R are identical or different, non-halogenated or halogenated hydrocarbon radicals having from 1 to 18 carbon atoms per radical, or are OR1, where R1 is a monovalent, unsubstituted or substituted hydrocarbon radical having from 1 to 8 carbon atoms, and in each molecule there are at least 3 Si-bonded hydrogen atoms. The polyorganosiloxanes are particularly useful as crosslinking agents in addition curable elastomer formulations.
    Type: Grant
    Filed: May 4, 2000
    Date of Patent: February 11, 2003
    Assignee: Wacker-Chemie GmbH
    Inventors: Peter Fink, Peter Jerschow, Hedwig Schreiter, Richard Birneder, Alois Riedl
  • Patent number: 6512059
    Abstract: The invention relates to a composition, to a process for its preparation and to a method of coating shaped articles or elastomeric materials, where the composition can be prepared using (1) polymer components selected from the group consisting of (A1) polyorganosiloxanes comprising units (T units) of the formula (R1Si—O3/2) and optionally, units (M units) of the formula (R3Si—O1/2) (A2) polyorganosiloxanes comprising units (Q units) of the formula (Si—O4/2) and, optionally, units (M units) of the formula (R3Si—O1/2)  in which R is identical or different and represents unhalogenated or halogenated hydrocarbon radicals having 1 to 18 carbon atom(s) per radical or OR1, where R1 is identical or different and represents hydrogen or a monovalent, unsubstituted or substituted hydrocarbon radical having 1 to 8 carbon atom(s),  with the proviso that there are from 0.01% to 3.0% by weight, preferably from 0.
    Type: Grant
    Filed: April 14, 2000
    Date of Patent: January 28, 2003
    Assignee: Wacker-Chemie GmbH
    Inventor: Johann Mueller
  • Patent number: 6503633
    Abstract: A composition for film formation which, when used in the production of semiconductor devices and the like, can give interlayer insulating films which differ little in dielectric constant even when obtained through curing under different conditions and have excellent adhesion to substrates, a process for producing the composition, and a silica-based film obtained from the composition. The composition for film formation comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing (A-1) at least one compound selected from the group consisting of compounds represented by the following formula (1), compounds represented by the following formula (2), and compounds represented by the following formula (3), and (A-2) at least one compound represented by the following formula (4), in the presence of a catalyst and water; and (B) an organic solvent.
    Type: Grant
    Filed: May 21, 2001
    Date of Patent: January 7, 2003
    Assignee: JSR Corporation
    Inventors: Michinori Nishikawa, Kouichi Hasegawa, Eiji Hayashi, Kinji Yamada
  • Patent number: 6495649
    Abstract: Spherical silicone fine particles having an average particle diameter of 0.1 to 5 &mgr;m, which can be produced without decreasing a yield and also without conducting a dilution step, and a process for effectively producing the same. Spherical silicone particles are obtained by reacting an organotrialkoxysilane with a tetraalkoxysilane. Water in an amount of 20 to 150 moles is added to 1 mole of the silane mixture, which is subjected to hydrolysis under an acidic condition to obtain an aqueous or alcohol solution of an organosilanol and/or the partial hydrolyzed product thereof, and an aqueous alkaline solution is added thereto, mixed and allowed to stand to conduct polycondensation.
    Type: Grant
    Filed: January 16, 2001
    Date of Patent: December 17, 2002
    Assignee: GE Toshiba Silicones Co., Ltd.
    Inventors: Yukinobu Harada, Akira Takagi
  • Patent number: 6448331
    Abstract: Disclosed is an alkoxysilane/organic polymer composition for use in producing an insulating thin film, comprising (A) a specific alkoxysilane; (B) a specific organic polymer; and (C) a solvent for alkoxysilane (A) and organic polymer (B), wherein solvent (C) comprises at least one organic solvent selected from the group consisting of amide linkage-containing organic solvents and ester linkage-containing organic solvents. Also disclosed are a silica-organic polymer composite thin film which is produced by a process comprising: forming a thin film of the composition of the present invention; subjecting the thin film to a hydrolysis and dehydration-condensation reaction with respect to the alkoxysilane thereof, to thereby cause the alkoxysilane to be gelled in the thin film; and removing the solvent remaining in the thin film by drying, and a porous silica thin film which is obtained by removing the organic polymer from the silica-organic polymer composite thin film.
    Type: Grant
    Filed: November 12, 1999
    Date of Patent: September 10, 2002
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Takaaki Ioka, Tsuneaki Tanabe
  • Publication number: 20020095018
    Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one organic light-absorbing compound incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining at least one organic absorbing compound with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
    Type: Application
    Filed: November 15, 2001
    Publication date: July 18, 2002
    Inventors: Teresa Baldwin, Joseph Kennedy, Nigel Hacker, Richard Spear
  • Patent number: 6417310
    Abstract: A branched organopolysiloxane is prepared by polymerizing an organopolysiloxane mixture of a branch unit-containing organopolysiloxane and a low molecular weight organopolysiloxane in the presence of an acidic or basic catalyst, or by adding a surfactant to the organopolysiloxane mixture, dispersing it in water to form an emulsion, and polymerizing the emulsion.
    Type: Grant
    Filed: September 11, 2000
    Date of Patent: July 9, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Omura, Satoshi Kuwata, Yoshihito Osawa
  • Patent number: 6413354
    Abstract: A silicone composition that is oil resistant when cured is described. More particularly, this composition includes a silanol terminated silicone fluid, an organic plasticizer, a filler and a crosslinker, wherein the cured composition remains adhesive after exposure to oil. The present compositions provide superior adhesive properties after exposure to oil than conventional RTV silicone adhesives having M-stopped silicone plasticizers. Methods of making and using cured elastomeric products made from the present compositions are also provided.
    Type: Grant
    Filed: February 17, 2000
    Date of Patent: July 2, 2002
    Assignee: Loctite Corporation
    Inventors: Hans E. Haas, Frank L. Kovacs
  • Patent number: 6399733
    Abstract: A process for preparing a highly pure silicone ladder polymer of the general formula (1): wherein R1 and R2 represent F, H, a lower alkyl group, an alkenyl group, an aryl group, a lower fluorinated alkyl group, a fluorinated alkenyl group or a fluorinated aryl group; R3, R4, R5 and R6 each represents H, a lower alkyl group or a lower fluorinated alkyl group; and n represents an integer of 5 to 10000, which comprises: (a) a step of obtaining a prepolymer in which at least one organosilane compound is dissolved in an organic solvent and hydrolyzed with ultrapure water; (b) a step of washing the obtained prepolymer with ultrapure water; and, (c) a step of dissolving the washed prepolymer in an organic solvent and heating without a catalyst.
    Type: Grant
    Filed: October 11, 2000
    Date of Patent: June 4, 2002
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Shigeyuki Yamamoto, Naoki Yasuda, Motohisa Taguchi
  • Patent number: 6376634
    Abstract: A composition for film formation which is useful as an interlayer insulating film material in the production of semiconductor devices and the like, and gives a coating film having excellent uniformity, low dielectric constant, low leakage current and excellent storage stability; and a material for insulating film formation using the composition. The composition comprises (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of (A-1) compounds represented by the formula (1): R1aSi(OR2)4−a, and (A-2) compounds represented by the formula (2): R3b(R4O)3−bSi—(R7)d—Si(OR5)3−cR6c; and (B) a compound represented by the formula (3): R8O (CHCH3CH2O)eR9.
    Type: Grant
    Filed: June 2, 2000
    Date of Patent: April 23, 2002
    Assignee: JSR Corporation
    Inventors: Michinori Nishikawa, Kinji Yamada, Mayumi Kakuta, Yasutake Inoue, Masahiko Ebisawa, Satoko Hakamatsuka, Kentarou Tamaki
  • Patent number: 6369184
    Abstract: A silicone composition and the uses thereof, particularly as a coating on an airbag for protecting the occupant of a vehicle in the event of a collision, are disclosed. The aim is to provide a silicone composition suitable for coating onto the inner surface of the airbag while significantly reducing the weight of the resulting coating layer to form a protective coating having enhance high-temperature, mechanical and substrate-adhesion properties. Said aim is achieved in that the composition is free of reinforcing mineral fillers and consists of a mixture of (1) at least one polyorganosilocane with alkenyl groups bound to the silicon; (2) at least one polyorganosiloxane with hydrogen atoms bound to the silicon; (3) a cross-linking catalyst; (4) an adhesion promoter comprising (4.1) at least one alkoxylated organosilane, (4.2) at least one epoxy-functional organosilicon compound, and (4.
    Type: Grant
    Filed: September 24, 1999
    Date of Patent: April 9, 2002
    Assignee: Rhodia Chimie
    Inventors: Fabrice Bohin, Alain Pouchelon
  • Patent number: 6368400
    Abstract: An absorbing ether-like compound including a siliconethoxy, silicondiethoxy, or silicontriethoxy species attached to a naphthalene or anthracene chromophore via an oxygen linkage is used as an organic light-absorbing compound. The absorbing ether-like compound is incorporated into spin-on glass materials to provide anti-reflective coating materials for deep ultraviolet photolithography. A method of synthesizing the light-absorbing ether compounds is based on the reaction of an alcohol-substituted chromophore with an acetoxysilicon compound in the presence of alcohol. A method of making absorbing spin-on-glass materials including the absorbing ether-like compounds is also provided.
    Type: Grant
    Filed: July 17, 2000
    Date of Patent: April 9, 2002
    Assignee: Honeywell International
    Inventors: Teresa Baldwin, Mary Richey, James S. Drage, Hui-Jung Wu, Richard Spear
  • Patent number: 6359667
    Abstract: An organopolysiloxane fine particle comprising as a principal component a polysiloxane having a hydrocarbon group (a) directly bonded to a silicon atom and having an OH group (b) directly bonded to a silicon atom, wherein: (i) carbons contained in the hydrocarbon group (a) constitute 5 to 35% of the weight of the organopolysiloxane fine particles, and (ii) the OH group (b) is in an amount of 1 to 8 meq per g of the organopolysiloxane fine particles, the organopolysiloxane fine particles having: (iii) a 10% compressive modulus of elasticity of 150 to 900 Kg/mm2, (iv) an average compressive deformation (Cr)m of 20 to 60%, (v) an average elastic recovery (Rr)m of 60 to 90%, and (vi) an average particle diameter of 0.5 to 50 &mgr;m.
    Type: Grant
    Filed: August 8, 2000
    Date of Patent: March 19, 2002
    Assignee: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Tsuguo Koyanagi, Michio Komatsu, Kazuhiro Nakayama
  • Patent number: 6359096
    Abstract: Soluble silicone resin compositions having good solution stability and a method for their preparation. The silicone resin comprises the reaction product of a mixture comprising (A) 15-70 mol % of a tetraalkoxysilane described by formula Si(OR1)4, where each R1 is an independently selected alkyl group comprising 1 to about 6 carbon atoms, (B) 12 to 60 mol % of a hydrosilane described by formula HSiX3, where each X is an independently selected hydrolyzable substituent, (C) 15 to 70 mole percent of an organotrialkoxysilane described by formula R2Si(OR3)3, where R2 is a hydrocarbon group comprising about 8 to 24 carbon atoms or a substituted hydrocarbon group comprising a hydrocarbon chain having about 8 to 24 carbon atoms and each R3 is an independently selected alkyl group comprising 1 to about 6 carbon atoms; in the presence of (D) water, (E) hydrolysis catalyst, and (F) organic solvent for the reaction product.
    Type: Grant
    Filed: October 25, 1999
    Date of Patent: March 19, 2002
    Assignee: Dow Corning Corporation
    Inventors: Bianxiao Zhong, Russell Keith King, Kyuha Chung, Shizhong Zhang
  • Patent number: 6344520
    Abstract: The present invention pertains to an epoxy-functional organopolysiloxane resin, and an epoxy-functional organopolysiloxane coating composition comprising the epoxy-functional organopolysiloxane resin.
    Type: Grant
    Filed: June 24, 1999
    Date of Patent: February 5, 2002
    Assignee: Wacker Silicones Corporation
    Inventor: James D. Greene
  • Patent number: 6342562
    Abstract: A silicon-containing polymer having a tetrafunctional siloxane portion as the basic skeleton, and containing a carboxylic acid group-containing triorganosiloxane portion and a carboxylic acid derivative group-containing triorganosiloxane portion in a specific proportion. It may be advantageously used as a negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer.
    Type: Grant
    Filed: April 20, 2000
    Date of Patent: January 29, 2002
    Assignee: Fujitsu Limited
    Inventors: Miwa Kozawa, Keiji Watanabe, Ei Yano
  • Publication number: 20010056168
    Abstract: A silicone rubber composition for extrusion molding applications has a high cure rate and provides silicone rubber extrusion moldings that post-cure and are either free of bubbles or contain bubbles to an extremely limited extent. It contains (A) an organopolysiloxane gum, (B) reinforcing silica, (C) diatomaceous earth powder or quartz powder, and (D) an organoperoxide with the formula R-COOOCOO-R1-OOCOOOC-R, wherein R is a group selected from alkyl, alkoxy, —SiR23, —CH2SiR23, and -Ph-R3c (R2 is alkyl or alkoxy; Ph is phenyl when c is 0, and phenylene when c is 1,2 or 3; R3 is alkyl, alkoxy, SiR23, or —CH2SiR23; and c is 0 to 3) and R1 is C1 to C10 alkylene. A method is described for fabricating silicone rubber extrusion moldings by curing the silicone rubber composition in a hot gas.
    Type: Application
    Filed: April 18, 2001
    Publication date: December 27, 2001
    Inventors: Hiroshi Honma, Kazuo Hirai, Katsuya Baba
  • Patent number: 6326011
    Abstract: A copolymer having silyl groups with at least one reactive functional group bonded thereto. The copolymer comprises a monomer (A) shown by the following Formula (I): wherein R1 is hydrogen atom or methyl; R2 is alkylene group having 1-6 carbon atoms; and R3, R4 and R5 each is a reactive functional group which can cross-link molecules of the copolymer by hydrolyzing. Further, the copolymer preferably comprises, as a constituent monomer, an alkyl (meth)acrylate and a siloxane-containing (meth)acrylate. A coating-forming method comprises hydrolyzing the composition on a material to be treated to cross-link molecules of the copolymer when on the material. A coating of the cross-linked copolymer has resistance to washing. This coating can modify the nature of hair, improve make-up retention, and provide skin-protecting. It can impart water-repellency, resistance to fouling, suitability as a sizing and crease resistance to fibers.
    Type: Grant
    Filed: January 28, 1999
    Date of Patent: December 4, 2001
    Assignee: Shiseido Co., Ltd.
    Inventors: Kazuyuki Miyazawa, Toshio Yanaki, Fumiaki Matsuzaki
  • Patent number: 6313217
    Abstract: The invention relates to aliphatically unsaturated organosilicon compounds having 2 to 17 silicon atoms, to processes for their preparation and to their use in crosslinkable organopolysiloxane compositions, especially in compositions which can be crosslinked peroxidically or by hydrosilylation.
    Type: Grant
    Filed: August 4, 1999
    Date of Patent: November 6, 2001
    Assignee: Wacker-Chemie GmbH
    Inventors: Herbert Barthel, Johann Schuster, Richard Weidner, Michael Stepp, Volker Frey
  • Patent number: 6306928
    Abstract: Water resistant ink compositions comprising (I) a water-soluble dye compound and/or an organic pigment compound; (II) an organosilicon compound obtained by hydrolyzing a mixture of (A) a hydrolyzable silane obtained by reacting a specific aminated organic group-bearing hydrolyzable silane with an organic monoepoxy compound, or a partial hydrolyzate thereof, and (B) a specific hydrolyzable silane or a partial hydrolyzate thereof; and (III) water have excellent water resistance, good storage and shelf stability, good ink discharge stability, and outstanding color stability. These ink compositions are particularly suitable for use as ink-jet printer inks.
    Type: Grant
    Filed: March 3, 1999
    Date of Patent: October 23, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kazuyuki Matsumura, Masanao Kamei, Masaaki Yamaya, Akira Yamamoto
  • Publication number: 20010031849
    Abstract: Spherical silicone fine particles having an average particle diameter of 0.1 to 5 &mgr;m, which can be produced without decreasing a yield and also without conducting a dilution step, and a process for effectively producing the same. Spherical silicone particles are obtained by reacting an organotrialkoxysilane with a tetraalkoxysilane. Water in an amount of 20 to 150 moles is added to 1 mole of the silane mixture, which is subjected to hydrolysis under an acidic condition to obtain an aqueous or alcohol solution of an organosilanol and/or the partial hydrolyzed product thereof, and an aqueous alkaline solution is added thereto, mixed and allowed to stand to conduct polycondensation.
    Type: Application
    Filed: January 16, 2001
    Publication date: October 18, 2001
    Inventors: Yukinobu Harada, Akira Takagi