Plural Diazo Or Diazonium Groups Patents (Class 534/561)
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Patent number: 4791194Abstract: An azo compound with the following general formula (I): ##STR1## wherein X is selected from the group consisting of hydrogen atom, lower alkyl group, lower alkoxy group, halogen atom and cyano group;Y is phenylene or naphthylene group;Z.sub.1 and Z.sub.2 are independently the divalent group represented by the following formula: ##STR2## wherein A is a divalent group derived from the aromatic hydrocarbon or heterocyclic compound including one or more nitrogen atoms in the ring; andn is 1 or 2,is disclosed. Such compounds are useful in forming a photosensitive layer of an electrophotographic photoreceptor.Type: GrantFiled: July 25, 1986Date of Patent: December 13, 1988Assignee: Mitsubishi Chemical Industries, Ltd.Inventors: Tetsumi Suzuki, Tetsuo Murayama, Hitoshi Ono, Shinji Aramaki, Michiyo Yokoyama
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Patent number: 4774171Abstract: Novel bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides of secondary diamines, which amides are represented by the formula ##STR1## in which R is a straight-chain or branched, unsubstituted or hydroxyl-substituted alkyl, cycloalkyl or aralkyl radical which has 1 to 14 carbon atoms and which includes a carbon chain that can be interrupted by either oxygen atoms,R.sub.1 is an alkylene radical which has 2 to 12 carbon atoms and which includes a carbon chain that can be interrupted by ether oxygen atoms, or a mononuclear or polynuclear aralkylene radical which has 8 to 18 carbon atoms and which can, when it is a polynuclear radical, comprise aromatic members that are linked by a single bond, by --O--, --S--, --CO-- or --CR.sub.2 R.sub.3 --, --N[C.sub.1-3 -alkyl]CO-- or a C.sub.2-5 -alkyl group which can be interrupted by ether oxygen atoms, andR.sub.2 and R.sub.Type: GrantFiled: February 4, 1987Date of Patent: September 27, 1988Assignee: Hoechst AktiengesellschaftInventors: Wolfgang Zahn, Gerhard Buhr
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Patent number: 4771005Abstract: The invention provides a stable solid reagent for use in a prepackaged test kit for the detection of cannabinoids comprising a diazonium salt which undergoes characteristic color change when combined with a cannabinoid under basic conditions, the salt comprising an anion capable of causing the entire salt including the diazonium cation thereof to dissolve in an organic solvent when combined therewith to form a stable liquid reagent for the detection of cannabinoids. The invention also provides a stable liquid reagent comprising the aforementioned diazonium salt and an organic solvent as well as providing prepackaged reagent test kits containing the aforementioned reagents and methods for detecting cannabinoids using the reagents of the invention.Type: GrantFiled: June 12, 1984Date of Patent: September 13, 1988Assignee: Erez Forensic Technology Ltd.Inventor: Baruch Spiro
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Patent number: 4754020Abstract: A new method of diazotization consists in using as the diazotizing agent in an aqueous, aqueous organic or organic medium the system comprising salt of nitrous acid+acid insoluble in the reaction medium, in particular organic or inorganic cation exchangers having acid groups. The diazonium salt solutions thus prepared are immediately reacted with coupling components to give azo dyestuffs, the insoluble acid and/or its salt being separated off before or after the coupling.Type: GrantFiled: March 7, 1986Date of Patent: June 28, 1988Assignee: Bayer AktiengesellschaftInventors: Joachim Wolff, Karlheinz Wolf, Reinhold M. Klipper, Peter M. Lange
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Patent number: 4731316Abstract: A photosensitive composition of this invention comprises:(a) a photosensitive diazo resin represented by the following general formula (I): ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 each represents a hydrogen atom, an alkyl or alkoxy group, R represents a hydrogen atom, an alkyl or phenyl group, X represents PF.sub.6 or BF.sub.4 and n represents a number of 1 to 200, in which a resin with the number n in the above formula being 5 or more is contained by more than 20 mol %,(b) an oleophilic high molecular weight compound with hydroxyl group and(c) a high molecular weight organic acid without hydroxyl group, and in which the content of the ingredient (c) is from 1.5 to 30% by weight based on the solid matter in said composition.The photosensitive composition of this invention can provide a photosensitive layer having high sensitivity and being excellent in storage stability and developability as well as excellent in the film strength.Type: GrantFiled: October 1, 1985Date of Patent: March 15, 1988Assignees: Mitsubishi Chemical Industries Limited, Konishiroku Photo Industry Co., Ltd.Inventors: Hiroshi Tomiyasu, Yoshihiro Maeda, Kiyoshi Goto, Norihito Suzuki
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Patent number: 4724259Abstract: Compounds of the general formula I ##STR1## where R.sup.1 and R.sup.2 independently of one another are each C.sub.6 -C.sub.24 -alkyl or are each benzyl which is unsubstituted or substituted by alkyl or by cycloalkyl, and one of the radicals may furthermore be hydrogen, and the rings A, B, C and D can be further substituted by chlorine, methyl or methoxy, with the exception of the compound of the formula ##STR2## are useful as dyes in electrooptical liquid crystal displays or for the production of polarization films.Type: GrantFiled: November 21, 1984Date of Patent: February 9, 1988Assignee: BASF AktiengesellschaftInventors: Karl-Heinz Etzbach, Werner Juenemann, Johannes Dehnert
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Patent number: 4680057Abstract: Diarylide yellow pigment compositions which are sulfonated with 2,2'disulfobenzidine and/or p-sulfo-acetoacetanilide are rendered hydrophobic by treatment with specific quaternary ammonium salts. The pigment compositions are easily flushed into flushed bases. When incorporated into printing inks, the pigments demonstrate improved color strength and transparency.Type: GrantFiled: April 12, 1985Date of Patent: July 14, 1987Assignee: BASF Corporation, Inmont DivisionInventor: Byron G. Hays
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Patent number: 4666805Abstract: The present invention relates to a novel disazo compound having the following general formula (I), ##STR1## wherein A represents ##STR2## (wherein R represents an alkyl, alkoxy, nitro, halogen, cyano or halomethyl group; n represents an integer of 0, 1, 2 or 3; and R may be the same or different when n is an integer of 2 or 3), and a method for preparing the same.The present invention further relates to a photosensitive material for use in electrophotography, characterized by providing a photosensitive layer containing a disazo pigment having the following general formula (VII), ##STR3## wherein A.sub.1 represents a coupler residue and R' represents hydrogen or a lower alkyl group.Type: GrantFiled: June 11, 1985Date of Patent: May 19, 1987Assignee: Ricoh Co., Ltd.Inventor: Mitsuru Hashimoto
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Patent number: 4661432Abstract: A light-sensitive, diazonium group-containing polycondensation product is described which comprises(a) an optionally substituted diphenylamine-dianzonium salt I.(b) a compound corresponding to the formula IIR.sup.4 --O--CH.sub.2 --R.sup.5 (II)whereinR.sup.4 is H, alkyl or acyl, andR.sup.5 is an optionally substituted aromatic radical, and(c) a compound corresponding to the formula IIIR.sup.6 --O--CH.sub.2 --R.sup.8 --CH.sub.2 --O--R.sup.7 (III)whereinR.sup.6 and R.sup.7 are H, alkyl, or acyl andR.sup.8 is the radical of a compound selected from the group consisting of aromatic hydrocarbons, phenols, phenolethers, aromatic thioethers, aromatic heterocyclic compounds, and organic acid amides,with the radicals resulting from compound II being directing linked to the units of the diazonium salt I.In the production of the polycondensation product, I is first condensed with II and then with III.Type: GrantFiled: January 23, 1986Date of Patent: April 28, 1987Assignee: Hoechst AktiengesellschaftInventors: Walter Lutz, Hartmut Steppan
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Patent number: 4647310Abstract: An aqueous ink composition for ink-jet recording comprising an aqueous solution of a water-soluble dye of formula (I) and a humectant dissolved in water: ##STR1## wherein Ar represents an unsubstituted or substituted phenyl group, or an unsubstituted or substituted naphthyl group; X represents a hydroxyl group, an alkoxy group, a halogen atom, an alkylamino group, a hydroxyalkylamino group, a cyclic amino group or an anilino group; M represents hydrogen, K, Na, Li, NH.sub.4 or an organic amine cation; and n is an integer of 1 or 2.Type: GrantFiled: February 24, 1986Date of Patent: March 3, 1987Assignee: Ricoh Company, Ltd.Inventors: Masaru Shimada, Toshiyuki Kawanishi, Kakuji Murakami, Tamotsu Aruga, Hiroyuki Uemura, Kiyofumi Nagai
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Patent number: 4640884Abstract: Quinone diazide derivatives of adamantane, and especially quinone diazide derivatives of 1,3-dialkyl-5,7-bis(hydroyphenol) adamantanes, have been found to provide unique properties when coated on metal substrate in the preparation of both positive and negative working lithographic plates. The improved lithographic plates are characterized by enhanced speed, coating oleophilicity, alkali resistance, developer latitude and development speed.Type: GrantFiled: March 29, 1985Date of Patent: February 3, 1987Assignee: Polychrome Corp.Inventors: William Rowe, Thomas Dooley
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Patent number: 4603195Abstract: A composition obtained by interracting a quinone diazo compound and an organosilicon compound; and use thereof in lithography.Type: GrantFiled: December 30, 1983Date of Patent: July 29, 1986Assignee: International Business Machines CorporationInventors: Edward D. Babich, Michael Hatzakis, Jurij R. Paraszczak, Jane M. Shaw
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Patent number: 4601969Abstract: A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.Type: GrantFiled: March 28, 1985Date of Patent: July 22, 1986Assignee: International Business Machines CorporationInventors: Nicholas J. Clecak, Barbara D. Grant, Robert D. Miller, Terry C. Tompkins, Carlton G. Willson
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Patent number: 4588670Abstract: A light sensitive composition for the preparation of a positive acting photoresist which is a mixture of an alkali soluble resin and a compound of the formula ##STR1## wherein X is a naphthoquinone-(1,2)-diazide-(2)-sulfonyl residue.Type: GrantFiled: February 28, 1985Date of Patent: May 13, 1986Assignee: American Hoechst CorporationInventors: Michael Kelly, Donald C. Mammato, Dana Durham, Sangya Jain, Lawrence Crane
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Patent number: 4581313Abstract: A photosensitive composition containing a polymer, and a photosensitive material utilizing the composition are disclosed. The polymer, which may be in the form of a copolymer, includes a repeating unit of the formula (I): ##STR1## wherein Y is a divalent substituent; Z.sub.1 and Z.sub.2 independently each represents monovalent substituents; p and q are each 0 or an integer of 1 to 4; when p and q are each 2 or more, each of Z.sub.1 and Z.sub.2 may be the same or different; X.sup..crclbar. is an anion. The composition has high sensitivity and is capable of forming an image on a suitable photographic support without causing fog under incandescent lamps. The composition can be used to produce lithographic printing plates having high sensitivity as well as excellent ware resistance.Type: GrantFiled: December 1, 1983Date of Patent: April 8, 1986Assignee: Fuji Photo Film Co., Ltd.Inventors: Junji Minamizono, Toshiyuki Sekiya
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Patent number: 4533620Abstract: Light sensitive condensed copolymers or multi-polymers of at least two distinct diazonium salts of the types specified herein. The product is characterized by high light speed, good shelf life and very good resistance to thermal and electrical degradation.Type: GrantFiled: August 2, 1983Date of Patent: August 6, 1985Assignee: American Hoechst CorporationInventors: John E. Walls, Thomas A. Dunder
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Patent number: 4499171Abstract: A positive type photosensitive resin composition comprising an alkali-soluble novolac resin and (A) a compound represented by the following general formula (I) and a compound represented by the following general formula (II) or (B) a compound represented by the following general formula (III) and a compound represented by the following general formula (IV), wherein the molar ratio of the compound represented by the general formula (I) to the compound represented by the general formula (II) is 6/4-9/1 or the molar ratio of the compound represented by the general formula (III) to the compound represented by the general formula (IV) is 1/9-9/1 and the total amount of the component (A) or (B) is 5-100 parts by weight per 100 parts by weight of the alkali-soluble novolac resin: ##STR1## wherein R.sub.1, R.sub.5, R.sub.8 and R.sub.10, which may be identical or different, represent alkyl groups, aryl groups or aralkyl groups; and R.sub.2, R.sub.3, R.sub.4, R.sub.6, R.sub.7, R.sub.9, R.sub.11 and R.sub.Type: GrantFiled: April 12, 1983Date of Patent: February 12, 1985Assignee: Japan Synthetic Rubber Co., Ltd.Inventors: Yoshihiro Hosaka, Yoichi Kamoshida, Yoshiyuki Harita, Kunihiro Harada