Heavy Metal Or Aluminum Containing Patents (Class 534/562)
  • Patent number: 8765480
    Abstract: A method for recovering a metal, capable of recovering a metal easily without requiring the use of an organic medium, is provided. A first complex between a first chelating agent and a metal present in a sample is formed in a first mixture prepared by mixing the first chelating agent and the sample. Then, the first complex is recovered from the first mixture, and a second complex between the metal derived from the first complex and a second chelating agent is formed in a second mixture prepared by mixing the first complex and an aqueous solution of the second chelating agent. The aqueous solution is under the pH conditions where the first chelating agent can be insoluble in the aqueous solution. Then, a liquid fraction containing the second complex is recovered from the second mixture. Thus, the metal can be recovered.
    Type: Grant
    Filed: April 2, 2012
    Date of Patent: July 1, 2014
    Assignee: ARKRAY, Inc.
    Inventor: Yuka Shimomura
  • Publication number: 20100068783
    Abstract: A process for producing a substrate having an adhesive surface, which process comprises: (a) contacting the substrate with a carbene precursor, which carbene precursor is a compound of the following formula (1): whose substituent groups are SP defined herein, provided that when R is aryl or heteroaryl, said aryl or heteroaryl may be substituted by one, two, three, four or five groups, which groups are independently selected from various groups including -LB-WB; and (b) either: (i) when WA or WB comprises an adhesive functional group, generating a carbene reactive intermediate from the carbene precursor so that it reacts with the substrate to functionalise the surface, thereby yielding said substrate having an adhesive surface; or (ii) when WA or WB comprises a group which is a precursor of an adhesive functional group, generating a carbene reactive intermediate from the carbene precursor so that it reacts with the substrate to functionalise the surface, and (c) converting said group which is a precursor into
    Type: Application
    Filed: August 22, 2007
    Publication date: March 18, 2010
    Applicant: ISIS INNOVATION LIMITED
    Inventors: Mark Moloney, Jon-Paul Griffiths
  • Patent number: 6239289
    Abstract: O-(perfluoroalkyl)dibenzofuranium salt derivatives represented by the following general formula (1), (wherein Rf in said general formula (1) is a C1-10 perfluoroalkyl group and X− is a conjugate base of a Brönsted acid). Intermediates for preparation of the derivatives, a preparation method thereof, perfluoroalkylating agents comprising the said derivatives and the said preparation intermediates, and a perfluoroalkylating method.
    Type: Grant
    Filed: February 15, 2000
    Date of Patent: May 29, 2001
    Assignee: Daikin Industries Ltd.
    Inventors: Teruo Umemoto, Kenji Adachi, Sumi Ishihara
  • Patent number: 5430130
    Abstract: An photosensitive polyfunctional aromatic diazo compound having at least two groups of Formula (uD) in the molecule, and a photosensitive composition using the same. The diazo compound can be handled under visible light free from ultraviolet, is highly photosensitive, has good shelf life, and is adequate as a photosensitive agent for lithographic printing plates and screen printing plates: ##STR1## wherein G.sup.1 is a substituent derived from alcoholic hydroxyl group; R.sup.1 and R.sup.2 are hydrogen, or alkyl or alkyloxy of 1 to 8 carbon atoms;R.sup.3 is alkyl or substituted alkyl of 1 to 8 carbon atoms, aralkyl or substituted aralkyl of 7 to 14 carbon atoms, or --CH.sub.2 CHG.sup.2 --CH.sub.2 --;X.sup.- is an anion based on protonic acid from which a proton is removed.
    Type: Grant
    Filed: July 21, 1993
    Date of Patent: July 4, 1995
    Assignee: Toyo Gosei Kogyo Co., Ltd.
    Inventors: Hirotada Iida, Noriaki Tochizawa, Yasuo Kuniyoshi, Masaharu Watanabe, Katsuyo Tokuda, Ichiro Hozumi
  • Patent number: 5206349
    Abstract: An aromatic diazo compound having at least two groups of Formula (I) in the molecule.This aromatic diazo compound can be handled under visible light free from ultraviolet, is high in photosensitivity, and can be produced by a simple synthesis method.The diazo compound has a high solubility in organic solvents, appropriate for use as a photosensitive material for a lithographic printing plate, can be easily developed by an alkaline developing solution mainly based on an alkaline aqueous solution, and has a water solubility appropriate for use in a screen printing plate. ##STR1## wherein Z.sup.1 indicates ##STR2## wherein .phi..sup.1 is arylene or substituted arylene; and -.phi..sup.2 is >C.dbd.O, lower alkyl, lower alkylene, or aryl or substituted aryl.R.sup.1 and R.sup.2 are H, alkyl of C.sub.1 to C.sub.8, or alkyloxy of C.sub.1 to C.sub.8 ; X.sup.- is anion; and R.sup.
    Type: Grant
    Filed: August 5, 1991
    Date of Patent: April 27, 1993
    Assignee: Toyo Gosei Kogy Co., Ltd.
    Inventors: Hirotada Iida, Hajime Arai, Hitoshi Sugiura, Katsuhiko Sugou, Kieko Harada
  • Patent number: 5173382
    Abstract: A photosensitive composition comprising a water-soluble polymer, a dichromate and at least one aromatic diazonium salt selected from aromatic diazonium sulfates, sulfonates and chromates has high sensitivity, and a pattern having high resolution can be formed therefrom with a shortened exposure time.
    Type: Grant
    Filed: January 9, 1990
    Date of Patent: December 22, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Hajime Morishita, Nobuaki Hayashi, Saburo Nonogaki, Masato Ito, Masahiro Nishizawa, Kiyoshi Miura
  • Patent number: 4987221
    Abstract: Bisdiazonium salts of the formula (1) ##STR1## in which R denotes a linear or branched alkyl or alkoxyalkyl radical having 3-5 carbon atoms and X.sup.- represents the radical of a strong acid or of a zinc chloride double salt, and a process for their preparation by diazotizing a 4,4'-diamino-3,3'-dialkoxybiphenyl of the formula (2) ##STR2## in which R has the meaning mentioned, in an aqueous, strong, non-oxidizing inorganic or organic acid at temperatures from about -10.degree. C. to about +40.degree. C. by means of an alkali metal nitrite, and precipitating the resulting bisdiazonium salts by adding an alkali metal chloride, bisulfate, monosulfonate of 1,5-naphthalenedisulfonic acid or tetrafluoroborate or zinc chloride.These salts are useful in dyeing and printing textile fiber materials by the methods of the ice color technique, using suitable coupling components; they are also useful for preparing photographic tracings by the methods of reprography.
    Type: Grant
    Filed: March 27, 1986
    Date of Patent: January 22, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hasso Hertel, Klaus Hunger, Heinrich Frolich
  • Patent number: 4985416
    Abstract: Complexes having the structure ##STR1## in which R, R.sub.1, R.sub.2, R.sub.3 represent lower alkyl groups are cytotoxic to tumor cells in mammals and enhance the killing effect of radiation and heat.
    Type: Grant
    Filed: March 13, 1989
    Date of Patent: January 15, 1991
    Assignee: Dana Farber Cancer Institute, Inc.
    Inventor: Beverly A. Teicher
  • Patent number: 4777246
    Abstract: The invention relates to a process for the preparation of 1-diazo-2-naphthol-4-sulfonic acid by diazotizing 1-amino-2-naphthol-4-sulfonic acid in weakly acid medium and in the presence of iron ions, using only 1 to 30 millimoles of an iron compound per mole of 1-amino-2-naphthol-4-sulfonic acid. Such an insignificant amount is sufficient to protect the 1-amino-2-naphthol-4-sulfonic acid effectively from being oxidized to 1,2-naphthoquinonesulfonic acid and to afford the desired reaction product in good yield.
    Type: Grant
    Filed: March 19, 1986
    Date of Patent: October 11, 1988
    Assignee: Ciba-Geigy Corporation
    Inventor: Bruno Fortsch
  • Patent number: 4775745
    Abstract: This invention relates to a diazonium compound of the formula: ##STR1## wherein Z is selected from the group consisting of biotin, an antigen, an antibody, a photoreactive group, a fluorescent group and heavy metal-containing compounds;X is an alkylene group containing up to 18 carbon atoms in the principle chain and a total of up to 24 carbon atoms or a substituted alkylene group containing up to 18 carbon atoms in the principle chain with substituents selected from the group consisting of solubility-enhancing groups and cleavable --S--S-- containing moieties;Ar is an unsubstituted or substituted aryl or heteroaryl; andY is an anion and n is an integer from 1-3.Such compounds are useful as components for nucleic acid probes.
    Type: Grant
    Filed: December 8, 1986
    Date of Patent: October 4, 1988
    Assignee: National Distillers and Chemical Corporation
    Inventors: John P. Ford, Bernard F. Erlanger, C. William Blewett
  • Patent number: 4603195
    Abstract: A composition obtained by interracting a quinone diazo compound and an organosilicon compound; and use thereof in lithography.
    Type: Grant
    Filed: December 30, 1983
    Date of Patent: July 29, 1986
    Assignee: International Business Machines Corporation
    Inventors: Edward D. Babich, Michael Hatzakis, Jurij R. Paraszczak, Jane M. Shaw
  • Patent number: 4564572
    Abstract: A process for forming a pattern on the interior side of a face plate of a color picture tube by using a photosensitive composition comprising p-diazo-N,N-dimethylaniline chloride-zinc chloride double salt and a p-diazo-bromophenol chloride-zinc chloride double salt and conducting imagewise exposure of coated film of the photosensitive composition to light and contacting with powder particles at least one time gives higher sensitivity compared with a conventional process.
    Type: Grant
    Filed: January 24, 1985
    Date of Patent: January 14, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Hajime Morishita, Kiyoshi Miura, Osamu Sasaya, Saburo Nonogaki