Heavy Metal Or Aluminum Containing Patents (Class 534/562)
-
Patent number: 8765480Abstract: A method for recovering a metal, capable of recovering a metal easily without requiring the use of an organic medium, is provided. A first complex between a first chelating agent and a metal present in a sample is formed in a first mixture prepared by mixing the first chelating agent and the sample. Then, the first complex is recovered from the first mixture, and a second complex between the metal derived from the first complex and a second chelating agent is formed in a second mixture prepared by mixing the first complex and an aqueous solution of the second chelating agent. The aqueous solution is under the pH conditions where the first chelating agent can be insoluble in the aqueous solution. Then, a liquid fraction containing the second complex is recovered from the second mixture. Thus, the metal can be recovered.Type: GrantFiled: April 2, 2012Date of Patent: July 1, 2014Assignee: ARKRAY, Inc.Inventor: Yuka Shimomura
-
Publication number: 20100068783Abstract: A process for producing a substrate having an adhesive surface, which process comprises: (a) contacting the substrate with a carbene precursor, which carbene precursor is a compound of the following formula (1): whose substituent groups are SP defined herein, provided that when R is aryl or heteroaryl, said aryl or heteroaryl may be substituted by one, two, three, four or five groups, which groups are independently selected from various groups including -LB-WB; and (b) either: (i) when WA or WB comprises an adhesive functional group, generating a carbene reactive intermediate from the carbene precursor so that it reacts with the substrate to functionalise the surface, thereby yielding said substrate having an adhesive surface; or (ii) when WA or WB comprises a group which is a precursor of an adhesive functional group, generating a carbene reactive intermediate from the carbene precursor so that it reacts with the substrate to functionalise the surface, and (c) converting said group which is a precursor intoType: ApplicationFiled: August 22, 2007Publication date: March 18, 2010Applicant: ISIS INNOVATION LIMITEDInventors: Mark Moloney, Jon-Paul Griffiths
-
Patent number: 6239289Abstract: O-(perfluoroalkyl)dibenzofuranium salt derivatives represented by the following general formula (1), (wherein Rf in said general formula (1) is a C1-10 perfluoroalkyl group and X− is a conjugate base of a Brönsted acid). Intermediates for preparation of the derivatives, a preparation method thereof, perfluoroalkylating agents comprising the said derivatives and the said preparation intermediates, and a perfluoroalkylating method.Type: GrantFiled: February 15, 2000Date of Patent: May 29, 2001Assignee: Daikin Industries Ltd.Inventors: Teruo Umemoto, Kenji Adachi, Sumi Ishihara
-
Patent number: 5430130Abstract: An photosensitive polyfunctional aromatic diazo compound having at least two groups of Formula (uD) in the molecule, and a photosensitive composition using the same. The diazo compound can be handled under visible light free from ultraviolet, is highly photosensitive, has good shelf life, and is adequate as a photosensitive agent for lithographic printing plates and screen printing plates: ##STR1## wherein G.sup.1 is a substituent derived from alcoholic hydroxyl group; R.sup.1 and R.sup.2 are hydrogen, or alkyl or alkyloxy of 1 to 8 carbon atoms;R.sup.3 is alkyl or substituted alkyl of 1 to 8 carbon atoms, aralkyl or substituted aralkyl of 7 to 14 carbon atoms, or --CH.sub.2 CHG.sup.2 --CH.sub.2 --;X.sup.- is an anion based on protonic acid from which a proton is removed.Type: GrantFiled: July 21, 1993Date of Patent: July 4, 1995Assignee: Toyo Gosei Kogyo Co., Ltd.Inventors: Hirotada Iida, Noriaki Tochizawa, Yasuo Kuniyoshi, Masaharu Watanabe, Katsuyo Tokuda, Ichiro Hozumi
-
Patent number: 5206349Abstract: An aromatic diazo compound having at least two groups of Formula (I) in the molecule.This aromatic diazo compound can be handled under visible light free from ultraviolet, is high in photosensitivity, and can be produced by a simple synthesis method.The diazo compound has a high solubility in organic solvents, appropriate for use as a photosensitive material for a lithographic printing plate, can be easily developed by an alkaline developing solution mainly based on an alkaline aqueous solution, and has a water solubility appropriate for use in a screen printing plate. ##STR1## wherein Z.sup.1 indicates ##STR2## wherein .phi..sup.1 is arylene or substituted arylene; and -.phi..sup.2 is >C.dbd.O, lower alkyl, lower alkylene, or aryl or substituted aryl.R.sup.1 and R.sup.2 are H, alkyl of C.sub.1 to C.sub.8, or alkyloxy of C.sub.1 to C.sub.8 ; X.sup.- is anion; and R.sup.Type: GrantFiled: August 5, 1991Date of Patent: April 27, 1993Assignee: Toyo Gosei Kogy Co., Ltd.Inventors: Hirotada Iida, Hajime Arai, Hitoshi Sugiura, Katsuhiko Sugou, Kieko Harada
-
Patent number: 5173382Abstract: A photosensitive composition comprising a water-soluble polymer, a dichromate and at least one aromatic diazonium salt selected from aromatic diazonium sulfates, sulfonates and chromates has high sensitivity, and a pattern having high resolution can be formed therefrom with a shortened exposure time.Type: GrantFiled: January 9, 1990Date of Patent: December 22, 1992Assignee: Hitachi, Ltd.Inventors: Hajime Morishita, Nobuaki Hayashi, Saburo Nonogaki, Masato Ito, Masahiro Nishizawa, Kiyoshi Miura
-
Patent number: 4987221Abstract: Bisdiazonium salts of the formula (1) ##STR1## in which R denotes a linear or branched alkyl or alkoxyalkyl radical having 3-5 carbon atoms and X.sup.- represents the radical of a strong acid or of a zinc chloride double salt, and a process for their preparation by diazotizing a 4,4'-diamino-3,3'-dialkoxybiphenyl of the formula (2) ##STR2## in which R has the meaning mentioned, in an aqueous, strong, non-oxidizing inorganic or organic acid at temperatures from about -10.degree. C. to about +40.degree. C. by means of an alkali metal nitrite, and precipitating the resulting bisdiazonium salts by adding an alkali metal chloride, bisulfate, monosulfonate of 1,5-naphthalenedisulfonic acid or tetrafluoroborate or zinc chloride.These salts are useful in dyeing and printing textile fiber materials by the methods of the ice color technique, using suitable coupling components; they are also useful for preparing photographic tracings by the methods of reprography.Type: GrantFiled: March 27, 1986Date of Patent: January 22, 1991Assignee: Hoechst AktiengesellschaftInventors: Hasso Hertel, Klaus Hunger, Heinrich Frolich
-
Patent number: 4985416Abstract: Complexes having the structure ##STR1## in which R, R.sub.1, R.sub.2, R.sub.3 represent lower alkyl groups are cytotoxic to tumor cells in mammals and enhance the killing effect of radiation and heat.Type: GrantFiled: March 13, 1989Date of Patent: January 15, 1991Assignee: Dana Farber Cancer Institute, Inc.Inventor: Beverly A. Teicher
-
Patent number: 4777246Abstract: The invention relates to a process for the preparation of 1-diazo-2-naphthol-4-sulfonic acid by diazotizing 1-amino-2-naphthol-4-sulfonic acid in weakly acid medium and in the presence of iron ions, using only 1 to 30 millimoles of an iron compound per mole of 1-amino-2-naphthol-4-sulfonic acid. Such an insignificant amount is sufficient to protect the 1-amino-2-naphthol-4-sulfonic acid effectively from being oxidized to 1,2-naphthoquinonesulfonic acid and to afford the desired reaction product in good yield.Type: GrantFiled: March 19, 1986Date of Patent: October 11, 1988Assignee: Ciba-Geigy CorporationInventor: Bruno Fortsch
-
Patent number: 4775745Abstract: This invention relates to a diazonium compound of the formula: ##STR1## wherein Z is selected from the group consisting of biotin, an antigen, an antibody, a photoreactive group, a fluorescent group and heavy metal-containing compounds;X is an alkylene group containing up to 18 carbon atoms in the principle chain and a total of up to 24 carbon atoms or a substituted alkylene group containing up to 18 carbon atoms in the principle chain with substituents selected from the group consisting of solubility-enhancing groups and cleavable --S--S-- containing moieties;Ar is an unsubstituted or substituted aryl or heteroaryl; andY is an anion and n is an integer from 1-3.Such compounds are useful as components for nucleic acid probes.Type: GrantFiled: December 8, 1986Date of Patent: October 4, 1988Assignee: National Distillers and Chemical CorporationInventors: John P. Ford, Bernard F. Erlanger, C. William Blewett
-
Patent number: 4603195Abstract: A composition obtained by interracting a quinone diazo compound and an organosilicon compound; and use thereof in lithography.Type: GrantFiled: December 30, 1983Date of Patent: July 29, 1986Assignee: International Business Machines CorporationInventors: Edward D. Babich, Michael Hatzakis, Jurij R. Paraszczak, Jane M. Shaw
-
Patent number: 4564572Abstract: A process for forming a pattern on the interior side of a face plate of a color picture tube by using a photosensitive composition comprising p-diazo-N,N-dimethylaniline chloride-zinc chloride double salt and a p-diazo-bromophenol chloride-zinc chloride double salt and conducting imagewise exposure of coated film of the photosensitive composition to light and contacting with powder particles at least one time gives higher sensitivity compared with a conventional process.Type: GrantFiled: January 24, 1985Date of Patent: January 14, 1986Assignee: Hitachi, Ltd.Inventors: Hajime Morishita, Kiyoshi Miura, Osamu Sasaya, Saburo Nonogaki