Abstract: Embodiments in accordance with the present invention provide for norbornane-type ballast materials, norbornane-type photoactive compounds derived from such ballast materials and alkali-soluble positive-tone polymer compositions that encompass such norbornane-type photoactive compounds and one of a PBO or PNB resin.

Abstract: The present invention relates to novel platensimycin derivatives, their intermediates and preparing methods of the same. Platensimycin is known as an effective antibiotic material having a broad antimicrobial spectrum and its derivatives are also expected to be effective antibiotic candidates. The present invention also relates to a novel preparing method of platensimycin. The intermediates used for the production of platensimycin and its derivatives of the present invention are tricyclo ketone derivatives and tetracyclo derivatives. Tetracyclo derivatives are prepared from tricyclo ketone derivatives prepared by carbonyl ylide [3+2] cycloaddition of dia-zoketone derivative.

Abstract: Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule.

Abstract: A process for producing a substrate having an adhesive surface, which process comprises: (a) contacting the substrate with a carbene precursor, which carbene precursor is a compound of the following formula (1): whose substituent groups are SP defined herein, provided that when R is aryl or heteroaryl, said aryl or heteroaryl may be substituted by one, two, three, four or five groups, which groups are independently selected from various groups including -LB-WB; and (b) either: (i) when WA or WB comprises an adhesive functional group, generating a carbene reactive intermediate from the carbene precursor so that it reacts with the substrate to functionalise the surface, thereby yielding said substrate having an adhesive surface; or (ii) when WA or WB comprises a group which is a precursor of an adhesive functional group, generating a carbene reactive intermediate from the carbene precursor so that it reacts with the substrate to functionalise the surface, and (c) converting said group which is a precursor into

Abstract: A process for the preparation of Balsalazide and its pharmaceutically acceptable salts wherein the reaction comprises: a. the intermediate N-(4-aminobenzoyl)-?-alanine is converted to N-(4-ammoniumbenzoyl)-?-alanine sulfonate salt using a sulfonic acid in water, b. the N-(4-ammoniumbenzoyl)-?-alanine sulfonate salt is treated with aqueous sodium nitrite solution at low temperature to generate N-(4-diazoniumbenzoyl)-?-alanine sulfonate salt, c. the aqueous solution obtained is quenched with aqueous disodium salicylate to furnish Balsalazide disodium solution, d. the solution is acidified to allow isolation of Balsalazide, and e. optionally converting the Balsalazide to a pharmaceutically acceptable salt (such as disodium salt).

Abstract: A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

Abstract: A phototriggerable composition and method for use in crosslinking protein such as collagen comprising application of a tethered diazopyruvate composition followed by irradiation, whereby the composition results in the sutureless wound closure of, for example, a tendon or cornea.

Abstract: Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development.

Abstract: The invention relates to six new crystal polymorphs, &agr; (alpha), &bgr; (beta), &ggr; (gamma), &dgr; (delta), &zgr; (zeta), and &eegr; (eta), of the disazo colorant of the formula I, having characteristic reflections in the X-ray diffraction spectrum. The novel crystal polymorphs are prepared by treatment in organic solvents.

Abstract: Novel alkyl ketone compounds having potent cytotoxic activity are described as anti-tumor agents and are particularly effective against leukemia and breast tumor cells.

Abstract: Proposed is a positive- or negative-working chemical-sensitization photoresist composition having advantages in respect of the contrast and resolution of patterning, photo-sensitivity and cross sectional profile of the patterned resist layer as well as in respect of stability of the latent image formed by pattern-wise exposure to light before post-exposure baking treatment. The composition comprises: (A) 100 parts by weight of a film-forming resinous ingredient which causes a change, i.e. increase or decrease, of solubility in an aqueous alkaline solution by the interaction with an acid; and (B) from 0.5 to 20 parts by weight of a radiation-sensitive acid-generating agent which is a diazomethane compound represented by the general formulaR.sup.1 --SO.sub.2 --C(=N.sub.2)--SO.sub.2 --R.sup.2,in which R.sup.1 and R.sup.2 are each, independently from the other, a monovalent cyclic group substituted on the cyclic nucleus by an acid-dissociable group such as a tert-butoxycarbonyl and acetal groups.

Abstract: Compounds of the formula ##STR1## where the symbols have the meaning described in the application, have retinoid-like or retinoid antagonist-like biological activity.

Abstract: Polyunsaturated diazonium compounds suitable for use in negative working radiation sensitive compositions are provided. They may be produced by reacting an aromatic diazonium compound of the formula(A.sup.- N.sub.2.sup.+).sub.p --Ar--(R).sub.q --(XH).sub.rwith a polyethylenically unsaturated monoisocyanate compound of the general formula ##STR1## where p and q are integers ranging from 1 to 5, r is an integer ranging from 1 to 10; Ar represents a substituted or unsubstituted divalent or polyvalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or a secondary or tertiary amino group; R represents a single bond or a substituted or unsubstituted divalent or other polyvalent radical and may be the same or different when q is greater than 1; A.sup.- represents an anion; Z represents the residue of a polyisocyanate OCN--Z--(NCO).sub.

Abstract: Polyunsaturated diazonium compounds suitable for use in negative working radiation sensitive compositions are provided. They may be produced by reacting an aromatic diazonium compound of the formula(A.sup.- N.sub.2.sup.+)p--Ar--(R)q--(XH)rwith a polyethlenically unsaturated monoisocyanate compound of the general formula ##STR1## where p and q are integers ranging from 1 to 5, r is an integer ranging from 1 to 10; Ar represents a substituted or unsubstituted divaient or polyvalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or a secondary or tertiary amino group; R represents a single bond or a substituted or unsubstituted divalent or other polyvalent radical and may be the same or different when q is greater than 1; A.sup.- represents an anion; Z represents the residue of a polyisocyanate OCN--Z--(NCO)n where n is 1 or 2; and Y is the residue of a monohydroxy compound of the formula YOH where Y contains at least two ethylenically unsaturated double bonds.

Abstract: A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 are the same or different and each a hydrogen atom, an alkyl group, a halogen atom or a hydroxyl group, provided that at least one of Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 is a hydroxyl group; Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 are the same or different and each a hydrogen atom, an alkyl, an aryl group, a halogen atom or a hydroxyl group, provided that at least one of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 is a hydroxyl group; X is ##STR2## in which R.sub.1 and R.sub.2 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cyclo-alkyl group, an alkoxy group or an aryl group, provided that when at least one of R.sub.1 and R.sub.

Abstract: A monoazo lake pigment and a process for its production; the monoazo lake pigment excellent in clearness, transparency, gloss and tinting strength is obtained by coupling a diazo component which is an aromatic amine having a sulfonic acid group with a coupler component which contains .beta.-naphthol or .beta.-oxynaphthoic acid and adding a laking agent during or after the coupling reaction, the coupler component further containing 0.1 to 30 mol %, based the coupler component, of a compound of the following formula, ##STR1## wherein n=1 or 2.

Abstract: A polymeric compound having the formula ##STR1## wherein x ranges from about 0.05 to about 0.5y ranges from about 0.80 to about 0.35z ranges from about 0.10 to about 0.25n ranges from about 50 to about 1500R is selected from the group consisting of phenyl and C.sub.1 to C.sub.4 alkyl substituted phenyl;K is selected from the group consisting of ##STR2## --S--, --O--, and --CH.sub.2 --, or is absent; P and P.sub.1 are selected from the group consisting of C.sub.1 to C.sub.4 alkyl, methoxy, ethoxy, butoxy, and H; andP.sub.1 may be the same as P or different.

Abstract: A process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulfonic acid or salts thereof, of the general formula Z ##STR1## is disclosed in which X=hydrogen, a metal or an ammonium group, preferably an alkali metal or alkaline earth metal, especially sodium or potassium and the ammonium group.The compounds can be used as much or as intermediates or starting materials for the production of light-sensitive compounds and radiation-sensitive mixtures and materials.

Abstract: Photosensitive compositions comprising a polymer and a photoactive constituent, which are able to be developed with aqueous, alkaline agents exhibit good bleaching properties in the DUV range, whereby the photoactive constituent has good solubility-inhibiting properties and does not evaporate during the drying process, when the photoactive constituent comprises diazo tetronic acid or a diazo tetronic acid derivative of the following structure: ##STR1## where the residues R are the same or different and signify H, alkyl, cycloalkyl, aryl or a silicon-containing residue.

Abstract: The present invention relates to a group of organic chelators whose affinity for calcium ion in solution is increased by electromagnetic radiation. Specifically, the chelators are related to BAPTA and utilize the addition of an electron-withdrawing group (e.g., diazocarbonyl) to a ring of BAPTA, para to the amino group. Photochemical rearrangement of the diazoacetyl group converts the group to the electron-donating carboxymethyl group, causing the calcium ion efficiency to increase 25 to 50 fold. These chelators when incorporated into rat fibroblasts either by microinjection or by incubation as the membrane-permeable, enzymatically-labile tetraacetoxymethyl ester and flash-photolyzed cause a drop in intracellular free calcine ion to or below resting valves of about 10.sup.-7 M. These chelators are used to generate controlled fast removal of intracellular free calcium ion to mimic or modulate a number of important cellular responses, especially in nerve or muscle.

Abstract: Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids are disclosed having the general formula A ##STR1## in which R is an alkyl, epoxyalklyl, alkylcarbonyl or alkylsulfonyl group, the carbon chains of which may be interrupted by oxygen atoms, or a substituted or unsubstituted aralkyl, arylcarbonyl or arylsulfonyl group andX is hydrogen, a metal or an ammonium group.A process for the preparation of the compounds is also disclosed. The compounds can be used as such, or preferably after condensation of their sulfonic acid chlorides with aromatic hydroxy compounds or amines to give the corresponding esters or amides, as light-sensitive compounds in radiation-sensitive mixtures or materials.

Abstract: Monoazo pigments are provided which have improved properties achieved by incorporating certain azomethine compounds. The pigment compositions are prepared by reacting a primary amine-terminated alkylene oxide polymer and an acetoacetanilide to form an azomethine coupler and subsequently preparing the monoazo pigment composition by reacting the desired diazo component and coupling component in the presence of the azomethine coupler so as to form an azomethine composition of matter and the desired pigment.

Abstract: Polyfunctional .alpha.-diazo-.beta.-keto esters of the general formula I are described ##STR1## in which R.sup.1 denotes an aliphatic, cycloaliphatic or araliphatic or aromatic radical having 4 to 20 carbon atoms, in which individual CH.sub.2 groups can be replaced by oxygen or sulfur atoms or by N-- or NH groups and/or contain keto groups,X denotes an aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, in which individual CH.sub.2 groups can be replaced by oxygen or sulfur atoms or by the groups ##STR2## in which R.sup.2 and R.sup.3 independently of one another represent hydrogen or an aliphatic, carbocyclic or araliphatic radical,m denotes an integer from 2 to 10 andn denotes an integer from 0 to 2,whereinm-n is .gtoreq.2.The compounds mentioned are used as photoactive components in radiation-sensitive mixtures.

Abstract: 4-Diazo-3-methoxy-2,5-cyclohexandien-1-one, and pharmaceutically acceptable salts thereof, are antibiotics having antibacterial activity against a variety of gram positive and gram negative bacteria, particularly against anaerobic bacteria. The compound can be prepared by culturing aerobically Penicillium funiculosum A.T.C.C. No. 20783 in a culture medium containing assimilable sources of carbohydrates and nitrogen.

Abstract: Process for the preparation of aryloxy-benzoic acids containing a sulphonamide group by the direct reaction of a phenoxy-benzoic acid with a sulphonamide, in the presence of a halogenating agent such as P(O)Cl.sub.3.

Abstract: A diazonium salt polycondensation product which comprises units of(a) a diazonium salt represented by the formula ##STR1## in which R.sup.1, R.sup.2 and R.sup.3 are hydrogen atoms, halogen atoms, alkyl groups or alkoxy groups andX is the anion of an aminoalkanesulfonic acid, and(b) a compound represented by the formulaR.sup.4 --O--CH.sub.2 --R.sup.6 --CH.sub.2 --O--R.sup.5 (II)in whichR.sup.4 and R.sup.5 are hydrogen atoms, alkyl groups or aliphatic acyl radicals andR.sup.6 is the radical of an aromatic hydrocarbon, a phenol, a phenol ether, an aromatic thioether, an aromatic heterocyclic compound or an organic acid amide,and which is suitable as a light-sensitive substance for the preparation of planographic printing plates that can be developed with pure water.

Abstract: This invention relates to a diazonium compound of the formula: ##STR1## wherein Z is selected from the group consisting of biotin, an antigen, an antibody, a photoreactive group, a fluorescent group and heavy metal-containing compounds;X is an alkylene group containing up to 18 carbon atoms in the principle chain and a total of up to 24 carbon atoms or a substituted alkylene group containing up to 18 carbon atoms in the principle chain with substituents selected from the group consisting of solubility-enhancing groups and cleavable --S--S-- containing moieties;Ar is an unsubstituted or substituted aryl or heteroaryl; andY is an anion and n is an integer from 1-3.Such compounds are useful as components for nucleic acid probes.

Abstract: Tetralin derivatives of the formula I ##STR1## where X, R.sup.1, R.sup.2 and R.sup.3 have the meanings stated in the description, and their preparation are described. The novel compounds are useful for the treatment of disorders.

Abstract: A photosensitive composition of this invention comprises:(a) a photosensitive diazo resin represented by the following general formula (I): ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 each represents a hydrogen atom, an alkyl or alkoxy group, R represents a hydrogen atom, an alkyl or phenyl group, X represents PF.sub.6 or BF.sub.4 and n represents a number of 1 to 200, in which a resin with the number n in the above formula being 5 or more is contained by more than 20 mol %,(b) an oleophilic high molecular weight compound with hydroxyl group and(c) a high molecular weight organic acid without hydroxyl group, and in which the content of the ingredient (c) is from 1.5 to 30% by weight based on the solid matter in said composition.The photosensitive composition of this invention can provide a photosensitive layer having high sensitivity and being excellent in storage stability and developability as well as excellent in the film strength.

Abstract: The present invention relates to a photosensitive material for use in electrophotography, characterized by having a photosensitive layer containing a disazo pigment having the following general formula (I), ##STR1## wherein A represents a coupler residue.

Abstract: A light-sensitive, diazonium group-containing polycondensation product is described which comprises(a) an optionally substituted diphenylamine-dianzonium salt I.(b) a compound corresponding to the formula IIR.sup.4 --O--CH.sub.2 --R.sup.5 (II)whereinR.sup.4 is H, alkyl or acyl, andR.sup.5 is an optionally substituted aromatic radical, and(c) a compound corresponding to the formula IIIR.sup.6 --O--CH.sub.2 --R.sup.8 --CH.sub.2 --O--R.sup.7 (III)whereinR.sup.6 and R.sup.7 are H, alkyl, or acyl andR.sup.8 is the radical of a compound selected from the group consisting of aromatic hydrocarbons, phenols, phenolethers, aromatic thioethers, aromatic heterocyclic compounds, and organic acid amides,with the radicals resulting from compound II being directing linked to the units of the diazonium salt I.In the production of the polycondensation product, I is first condensed with II and then with III.

Abstract: A composition obtained by interracting a quinone diazo compound and an organosilicon compound; and use thereof in lithography.

Abstract: Light sensitive condensed copolymers or multi-polymers of at least two distinct diazonium salts of the types specified herein. The product is characterized by high light speed, good shelf life and very good resistance to thermal and electrical degradation.

Abstract: Cresol-formaldehyde novolak resins made from a mixture containing meta- and paracresol or ortho-, meta- and paracresol in a ratio selected from a given range for use in fast positive photoresist compositions together with one or more sensitizing compounds. When dissolved in a mixture of organic solvents, the photoresist compositions are suitable for application as a thin coating to a substrate. After the coating has been dried, the coated substrate can be exposed to image-wise modulated actinic radiation and developed in alkaline solution, yielding a relief pattern of resist on substrate useful for a number of applications.

Abstract: A light-sensitive diazonium group-containing polycondensation product of a diazonium salt corresponding to the general formula ##STR1## wherein R.sup.1, R.sup.2, and R.sup.3 denote hydrogen atoms, halogen atoms, alkyl groups having 1 to 3 carbon atoms or alkoxy groups having 1 to 6 carbon atoms, andX denotes the anion of the diazonium salt,and an aldehyde selected from the group consisting of dialdehydes, acetals of dialdehyde hydrates, and esters of dialdehyde hydrates, a process for producing such a light-sensitive polycondensation product and a light-sensitive recording material comprising a layer support and a light-sensitive layer containing such a light-sensitive polycondensation product.