Abstract: High boiling residue from the direct synthesis of alkylchlorosilanes are converted in large part to monosilanes by heating the residue by passage of alternating current in a pressurized reactor.

Abstract: A method of forming a relief image in a structure comprising a substrate and a transfer layer formed thereon comprises covering the transfer layer with a polymerizable fluid composition, and then contacting the polymerizable fluid composition with a mold having a relief structure formed therein such that the polymerizable fluid composition fills the relief structure in the mold. The polymerizable fluid composition is subjected to conditions to polymerize polymerizable fluid composition and form a solidified polymeric material therefrom on the transfer layer. The mold is then separated from the solid polymeric material such that a replica of the relief structure in the mold is formed in the solidified polymeric material; and the transfer layer and the solidified polymeric material are subjected to an environment to selectively etch the transfer layer relative to the solidified polymeric material such that a relief image is formed in the transfer layer.

Abstract: Disclosed herein is a process for the hydrosilylation of a composition containing a silyl hydride and a compound containing at least one unsaturated group, the process comprising contacting a non-previous metal based complex as a catalyst precursor with an activator being a reducing agent shortly before, simultaneously or after contacting the complex with the composition, to cause the silyl hydride to react with the compound containing at least one unsaturated group to produce a hydrosilylation product.

Abstract: Provided is an organic chlorohydrosilane, a useful starting material for preparing silicon polymers and a method for preparing the same. More particularly, the present invention enables the synthesis of various novel organic chlorohydrosilanes in high yield by an exchange reaction between an Si—H bond of a chlorosilane which can be obtained in an inexpensive and easy manner and an Si—Cl bond of an another organic chlorosilane using a quaternary organic phosphonium salt compound as a catalyst. Since the catalyst can be recovered after its use and reused, the present invention is very economical and thus effective for mass-producing silicon raw materials.

Abstract: A silane containing a bulky hydrocarbon group or groups R therein and having the formula (III) R3?(x+y)(R1)x(R2)ySi(OR3) can be produced by reacting a silane of the formula (I) (R1)x(R2)ySiCl3?(x+y)(OR3) with a Grignard reagent of the formula (II) RMgX Further, a tri-organo-chlorosilane of the formula (XIIa) (R1)(R2)(R3)SiCl can be produced by reacting a tri-organo-silane of the formula (XIa) (R1)(R2)(R3)SiZ1 with hydrochloric acid. Furthermore, a tri-organo-monoalkoxysilane of the formula (XXIII) R3?(x+y)(R1)x(R2)ySi(OR3) can be produced when a silane of the formula (XXI) (R1)x(R2)ySiCl4?(x+y) is reacted with a Grignard reagent of the formula (XXII) RMgX with addition of and reaction with an alcohol or an epoxy compound during the reaction.

Abstract: The present invention provides a fullerene derivative represented by the following formula (1): wherein in formula (1), R1 is a substituted or unsubstituted organic group or a hydrogen atom, and wherein in formulae (2) and (3): W is a single bond, C1-C11, alkylene, C2-C12 alkenylene, or C2-C12 alkynylene, wherein any —CH2— in the alkylene, alkenylene or alkynylene can be substituted with —O—, —S—, —COO—, or —OCO—; Z is an element belonging to group IVB; and R21 to R23 are each independently a substituted or unsubstituted C1-C20 alkyl group, a substituted or unsubstituted C2-C15 alkenyl group, or a substituted or unsubstituted C2-C15 alkynyl group.

Abstract: The purpose of the present invention is to provide an organic silicon compound which has a vinyl group more reactive than those of the conventional organic silicon compounds and can be bonded with another compound. The present organic silicon compound is represented by the following formula (1), wherein R1 is, independently of each other, a vinyl group or an alkyl group having 1 to 4 carbon atoms, R2 is an alkylene group having 3 to 6 carbon atoms, and R3 is, independently of each other, a hydrogen atom or an alkyl group having 1 to 4 carbon atoms and optionally substituted with one or more fluorine atoms.

Abstract: Disclosed are a process for preparing organometalloids functionalized with an unsymmetrical 1,1-disubstituted alkene, and compounds prepared therewith.

Abstract: The present invention provides a method for producing a fullerene derivative, comprising the organic group addition step B in which an organic group is further added by reacting at least a basic compound and a halogen compound with a fullerene derivative, which is obtained by addition of a hydrogen atom and an organic group in the organic group addition step A, in which an organic group is added by reacting at least a Grignard reagent and a polar substance with a fullerene or fullerene derivative.

Abstract: Materials and methods are provided whereby polymers with least 0.5 mole % of the pendant group or end group containing —Si(OR?)3 are used to control aluminosilicate scaling in an industrial process having an alkaline process stream such as a pulping mill process stream or a high level nuclear waste processing plant. When materials of the present invention are added to the alkaline process stream, they reduce and even completely prevent formation of aluminosilicate scale on equipment surfaces such as evaporator walls and heating surfaces. The present materials are effective at treatment concentrations that make them economically practical.

Abstract: A fibrillar, nanotextured coating is deposited on a substrate by contacting the substrate with a reaction mixture comprising a reagent which is hydrolyzable to produced a cross-linked reaction product, and a first solvent which solvates the reagent and the reaction product. The reagent is hydrolyzed so as to provide a cross-linked reaction product which is bonded to the substrate. The substrate is then contacted with a second solvent which is a non-solvent for the reaction product so as to cause nanoscopic phase separation of the reaction product, resulting in the formation of a fibrillar nanotextured coating which is bonded to the substrate. The thus produced coating may be subjected to further chemical modification. The method may be utilized to produce superhydrophobic coatings. Also disclosed are coatings made by the method of the present invention.

Abstract: A method for coating a floor, wherein said method comprises applying an aqueous dispersion comprising polyurethane, an acrylate or a hybride or mixture thereof; drying said coating and subjecting the physically dry coating to ultraviolet radiation whereby a cured coating is obtained. Also claimed is reactive additives suitable for use in the methods as well as the floor itself.

Abstract: An insulating film material for plasma CVD of the present invention is constituted of a silicon compound including two hydrocarbon groups bonded to each other to form a ring structure together with a silicon atom, or at least one branched hydrocarbon group, wherein within the branched hydrocarbon group, ?-carbon that is a carbon atom bonded to the silicon atom constitutes a methylene group, and ?-carbon that is a carbon atom bonded to the methylene group or ?-carbon that is a carbon atom bonded to the ?-carbon is a branching point.

Abstract: Provided is a novel protein phosphatase inhibitor. The protein phosphatase inhibitor contains, as an active ingredient, a silicon compound represented by the following general formula (1) or a salt thereof, wherein R1, R2 and R3 are the same or different and represent a hydrocarbon group having 1 to 12 carbon atoms; X represents an optionally substituted hydrocarbon group having 3 to 36 carbon atoms or an optionally substituted heterocyclic group; and n represents an integer of 0 or 1.

Abstract: An ultra low k dielectric film, including a silicon film containing porosity deriving from a porogen, as formed from a precursor silane and a porogen, wherein the precursor silane has a water content below 10 ppm, based on total weight of the precursor silane, and/or the porogen has a water content below 10 ppm, based on total weight of the porogen. In one implementation, the precursor silane is diethoxymethylsilane, and the porogen is bicyclo[2.2.1]-hepta-2,5-diene having a trace water content below 10 ppm, based on total weight of said bicyclo[2.2.1]-hepta-2,5-diene. These super-dry reagents are unexpectedly polymerization-resistant during their delivery and deposition in the formation of ultra low k films, and are advantageously employed to produce ultra low k films of superior character.

Abstract: The present invention relates to a process for modifying or functionalizing oxide surfaces, such as surfaces of SiO2 and Al2O3, but also metals including alloys such as stainless steel with alkenes or alkynes under mild conditions by photochemical reaction. The process is very well suited to form patterned modified surfaces which are of use for example in microelectronics, biosensing and catalysis.

Abstract: A composition for film formation which can form a film suitable for use as an interlayer dielectric in a semiconductor device, etc. and having an appropriate even thickness and can give a film having excellent characteristics including permittivity and Young's modulus; and a dielectric film obtained from the film-forming composition. The composition contains a compound (X) having a functional group which is partly eliminated by heating, irradiation with light, irradiation with radiation, or a combination thereof to generate volatile matter and yield an unsaturated group in the remaining part of the functional group.

Abstract: In accordance with one aspect, the present invention provides an amino-siloxane composition comprising at least one of structures I, II, III, IV or V said compositions being useful for the capture of carbon dioxide from gas streams such as power plant flue gases. In addition, the present invention provides methods of preparing the amino-siloxane compositions are provided. Also provided are methods for reducing the amount of carbon dioxide in a process stream employing the amino-siloxane compositions of the invention as species which react with carbon dioxide to form an adduct with carbon dioxide. The reaction of the amino-siloxane compositions provided by the present invention with carbon dioxide is reversible and thus, the method provides for multicycle use of said compositions.

Abstract: A silane containing a bulky hydrocarbon group or groups R therein and having the formula (III) R3?(x+y)(R1)x(R2)ySi(OR3) can be produced by reacting a silane of the formula (I) (R1)x(R2)ySiCl3?(x+y)(OR3) with a Grignard reagent of the formula (II) RMgX Further, a tri-organo-chlorosilane of the formula (XIIa) (R1)(R2)(R3)SiCl can be produced by reacting a tri-organo-silane of the formula (XIa) (R1)(R2)(R3)SiZ1 with hydrochloric acid. Furthermore, a tri-organo-monoalkoxysilane of the formula (XXIII) R3?(x+y)(R1)x(R2)ySi(OR3) can be produced when a silane of the formula (XXI) (R1)x(R2)ySiCl4?(x+y) is reacted with a Grignard reagent of the formula (XXII) RMgX with addition of and reaction with an alcohol or an epoxy compound during the reaction.

Abstract: The present invention provides a method of preparing a cross-condensed compound of an amino-acid derivative and (aminoalkyl)trialkoxysilane using microwave, including: irradiating and heating an amino-acid derivative and (aminoalkyl)trialkoxysilane in a microwave reactor to obtain a reaction product (step 1); and refining the reaction product obtained in the step 1 by removing an unreacted solid material from the reaction product and then leaving the reaction product at room temperature under vacuum to remove excess (aminoalkyl)trialkoxysilane therefrom (step 2). According to the method, since a cross-condensation reaction is performed using microwave, unlike a conventional condensation reaction, economic efficiency is increased due to no catalyst, short reaction time and no solvent. Further, the yield and selectivity of products is increased, and the condensation reaction can be environment-friendly performed because a solvent which can badly influence the environment may not be used.

Abstract: Disclosed are hydroxyphenylbenzophenone derivatives of formula (1), wherein R1 and R2 independently from each other are hydrogen; C1-C20alkenyl; C3-C10cycloalkyl; or R1 and R2 together with the linking nitrogen atom form a 5- 6-membered heterocyclic ring; R3, R4 and R5 independently from each other are C1-C4alkyl; C1-C4alkoxy; or a radical of formula (1a) R6 is C1-C6alkyl; and A is a straight-chain or branched C3-C6alkylene, which is optionally interrupted by one or more *—O—*, or *—O—(CO)—* groups; and m is 0; or a number from 1 to 5. The compounds are useful as cosmetic UV filters with outstanding solubility properties in cosmetic oils.

Abstract: Provided are a charging member capable of maintaining excellent wear resistance even after repeated use, and a process cartridge and an electrophotographic apparatus each having the charging member. The charging member is characterized in that its surface layer has a polysiloxane to which a silsesquioxane is bonded.

Abstract: A method of preparing a disilanol compound by hydrolyzing a dichlorosilane compound having Si—Cl bonds at both ends, characterized in that the method comprises the step of hydrolyzing the dichlorosilane compound in the presence of a tertiary amine compound.

Abstract: Process for preparing surface-modified silicon dioxide particles with a mean particle diameter of at most 100 nm, comprising the steps of: a) providing a predispersion b) high-pressure grinding of the predispersion to form a dispersion c) removing the liquid phase of the dispersion, the predispersion comprising a1) surface-modified silicon dioxide particles which are at least partly aggregated, are bonded to the surface-modifying component via Si—O—Si bonds and still have reactive groups on their surface, a2) one or more organosilicon compounds which have at least one silicon-carbon bond and at least one functional group which can react with the reactive groups to form a covalent Si—O—Si bond, and a3) one or more solvents. Redispersible, surface-modified silicon dioxide particles obtainable by this process. Use of these in toner powders, silicone rubber, adhesives and scratch-resistance surface coatings.

Abstract: A new family of silicon-based polymers has been prepared in which organic host components are bound covalently. The polymer is a polysilsesquioxane matrix comprising, for example, hosts such as cyclodextrins (CD) or calixarenes (CX).

Abstract: The invention relates to aldiminoalkylsilanes ALS which are preparable from the reaction of at least one aminoalkylsilane AS of the formula (I) and at least one aldehyde ALD of the formula (II), and to processes for preparing them. Additionally disclosed are the use of these aldiminoalkylsilanes in compositions comprising amine-reactive compounds, especially polyurethane compositions, and also in adhesion promoter compositions. The aldiminoalkylsilanes ALS and the compositions comprising them have the great advantage that they are low in odor or odorless and also stable on storage.

Abstract: Long chain ?-ketocarbonyl-functional organosilicon waxes are easily synthesized from organosilicon compounds bearing a reactive hydrogen bonded to N, O, or S, with a diketene. The products remain silicone-like despite being waxy, and can be used to gel low viscosity silicones to creamy formulations useful in cosmetics.

Abstract: The present invention relates to precipitated silicic acids, which have a particularly narrow particle size distribution in combination with a special pore size distribution, to a method for the production thereof, and to the use thereof as a filler for rubber mixtures.

Abstract: The present invention provides a process for using nanosized copper, nanosized copper oxides, nanosized copper chlorides, other nanosized copper salts, and mixtures thereof, as sources of catalytic copper in the Direct Synthesis of trialkoxysilanes of the formula HSi(OR)3 wherein R is an alkyl group containing from 1 to 6 carbon atoms inclusive. The nanosized copper, nanosized copper oxides, nanosized copper chlorides, other nanosized copper salts, and their mixtures of this invention have average particle sizes that are in the range from about 0.1 to about 60 nanometers, preferably from about 0.1 to about 30 nanometers, and most preferably from about 0.1 to about 15 nanometers. Nanosized sources of catalytic copper afford high dispersion of catalytic sites on silicon and contribute to high reaction rates, high selectivity and high silicon conversion. The nanosized copper catalyst precursors of the invention permit the use of substantially reduced levels of copper compared to conventional practice.

Abstract: Vinylsilane compounds having a specific amino group, typically diethylaminopropyldimethylvinylsilane, N-methylpiperazinylpropyldimethylvinylsilane, and bistrimethylsilylaminopropyldimethylvinylsilane are novel and useful as a modifier for polymers.

Abstract: Cyclopentadienyl and Indenyl barium/strontium metal precursors and Lewis base adducts thereof are described. Such precursors have utility for forming Ba- and/or Sr-containing films on substrates, in the manufacture of microelectronic devices or structures.

Abstract: Fluorochemical urethane compounds and coating compositions derived therefrom are described. The compounds and compositions may be used in treating substrates, in particular substrates having a hard surface such as ceramics or glass, to render them water, oil, stain, and soil repellent.

Abstract: The invention relates to a process for treating a composition comprising organosilanes and at least one polar organic compound and/or at least one extraneous metal and/or a compound containing extraneous metal, wherein the composition is contacted with at least one adsorbent and a composition in which the content of the organic polar compound and/or of the extraneous metal and/or of the compound containing extraneous metal is reduced is subsequently obtained, and also to a corresponding composition in which the content of polar organic compounds and/or extraneous metals has been reduced to traces, and to the use of organic resins, activated carbons, silicates and/or zeolites for reducing the amounts of the compounds mentioned.

Abstract: A semiconductor chip has devices formed on a first principal plane of a semiconductor substrate, wherein a second principal plane of the semiconductor substrate is planarized, and an organic film having plus charges on an outer side is provided on the second principal plane.

Abstract: Modified silicas having low silanol content which are compatible with polar compositions are prepared by modifying silica with a difunctional reactive organosilane or polydialkylsiloxane under oxidizing conditions below 400° C. The silicas have a distinct proportion of T1, T2, and T3 groups.

Abstract: The invention relates to a process for the preparation of onium alkylsulfates by reaction of an onium halide with a symmetrically substituted dialkyl sulfate, in which the alkyl group can have 1 to 14 C atoms, with an asymmetrically substituted dialkyl sulfate, in which one alkyl group can have 4 to 20 C atoms and the second alkyl group denotes methyl or ethyl, with an alkyl trialkylsilyl sulfate, with an alkyl acyl sulfate or with an alkyl sulfonyl sulfate, where the reaction with a dialkyl sulfate is carried out at room temperature.

Abstract: The present invention provides a process for producing a polysilsesquioxane graft polymer (1) which includes applying ionizing radiation or heat to a mixture including a polysilsesquioxane compound (2) and a vinyl compound (3), a polysilsesquioxane compound including an iniferter group, and a pressure-sensitive adhesive and a pressure-sensitive adhesive sheet using the polymer. According to the present invention, a process for producing a polysilsesquioxane graft polymer which may be used as a pressure-sensitive adhesive exhibiting excellent heat resistance and cohesive force, and the like are provided. In the formula, A represents a linking group, R1 represents a hydrocarbon group which may have a substituent, R2 represents a hydrogen atom or the like, R3 represents a polar group or the like, R4 represents a hydrogen atom or the like, k1 to k3 represent arbitrary positive integers, 1 to n represent zero or an arbitrary positive integer (excluding the case where “m=n=0”), and Q represents an iniferter group.

Abstract: Substituted alkylmetal solutions and a method for making the same wherein the solutions include (a) a substituted alkylmetal compound of the formula of M-CH2—W(Ra) (Rb) (Rc) at a concentration of greater than 1.0M; (b) a hydrocarbon solvent; and (c) an amine cosolvent.

Abstract: New organic light-emitting diodes and related hole transport compounds and methods for fabrication, using siloxane self-assembly techniques.

Abstract: The compound is a silane surface treatment agent and is useful for modifying the surfaces of silicon oxide and other metal oxides with hexafluorodimethyl carbinol functional groups. Additionally provided is a surface treatment procedure that effectively bonds it and other alkoxysilanes via homogeneous and heterogeneous amine catalysis onto metal oxide surfaces.

Abstract: The present invention relates to a hydrophobic, fumed silica which is obtained by milling a fumed silica which has fixed dimethylsilyl and/or monomethylsilyl groups on the surface due to silanization; and to a process for the preparation of the silica according to the invention, and to silicone rubber materials containing the silica according to the invention.

Abstract: A vinyl- or allyl-containing compound represented by following Formula (3): wherein R2, R3, R4, R5, and R6 each represent hydrogen atom or a nonmetallic atom-containing group; R7 represents a nonmetallic atom-containing group; Y represents a group selected from the group consisting of —Si(R8)(R9)—, —Si(R10)(R11)—O—, the left hand of which is combined with R7, and —NR12—, wherein R8, R9, R10, R11, and R12 each represent hydrogen atom or a nonmetallic atom-containing group; and “n” represents 0 or 1, is prepared by reacting a vinyl or allyl ester compound represented by following Formula (1): wherein R1 represents hydrogen atom or a nonmetallic atom-containing group; R2, R3, R4, R5, R6, and “n” are as defined above, with a compound represented by following Formula (2): R7—Y—H ??(2) wherein R7 and Y are as defined above, in the presence of a transition element compound.

Abstract: A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi (OR3)4-a??(A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.

Abstract: A patterned fine particle film structure includes a fine particle layer including fine particles arranged and bound to a surface of a substrate coated with a patterned film including a first film compound having a first functional group. The fine particles are coated with films including a first coupling agent having a first coupling reactive group that undergoes a coupling reaction with the first functional group to form a bond. The fine particle layer is bound by a bond formed through a coupling reaction. In an embodiment, fine particles coated with films of a film compound that reacts with the first coupling reactive group and the fine particles are alternately bound to the substrate.

Abstract: Organosulfur compounds suitable as protected thiol-containing reactive organic layer precursors, for example 3,5-dimethoxy-?,?-dimethylbenzyloxycarbonyl-3-mercaptopropyltriethoxysilane, are useful in methods of nanometer scale (nanoscale) patterning and fabrication of nanoscale structures on patterned surfaces. The compounds and methods enable the patternwise placement of nanoparticles, with nanometer resolution to form, for example, electrically conductive nanostructures.

Abstract: Disclosed is a method for directly preparing in situ 1-methylcyclopropene which inhibits the action of ethylene of accelerating the ripening process of plants, which comprises reacting a predetermined 1-methylcyclopropene precursor represented by the following Formula 2 or 3 with a base or fluoride anion material, and applying the 1-methylcyclopropene to plants: wherein Me, Et, R1, R2 and X are defined in the specification.

Abstract: The invention relates to a primer composition comprising a compound A1 which contains isocyanate-reactive groups. In order to produce said compound A1, a polyisocyanate A that is provided with at least three isocyanate groups, at least one silane B of formula (I), and a crosslinking agent C comprising at least three isocyanate-reactive functional groups are used. Also disclosed is the use of the inventive primer composition as a primer for adhesives, sealing compounds, or floor coverings, especially one-component moisture-hardening polyurethane adhesives or polyurethane sealing compounds based on polyurethanes or polyurethane-silane hybrids. The inventive primer composition is characterized particularly by excellent adhesion to glass and glass ceramics as well as an extended open time.

Abstract: Materials and a method are provided whereby polymers with least 0.5 mole % of the pendant group or end group containing —Si(OR?)3 (where R? is H, an alkyl group, Na, K, or NH4) are used to control aluminosilicate scaling in an industrial process having an alkaline process stream such as a pulping mill process stream or a high level nuclear waste processing plant. When materials of the present invention are added to the alkaline process stream, they reduce and even completely prevent formation of aluminosilicate scale on equipment surfaces such as evaporator walls and heating surfaces. The present materials are effective at treatment concentrations that make them economically practical.

Abstract: An asymmetric bis-silane compound of the formula A3Si—R1—SiB3 where A, B, and R1 are as defined herein, and to methods for making the bis-silane compound and their use to form layers or films of metal oxide particles, and which layers or films adhere to a suitable substrate. The materials and methods can be used, for example, to make photoactive devices.

Abstract: The present invention relates to a novel anthracene derivative, a method for preparation thereof, and an organic electronic device using the same. The anthracene derivative according to the present invention can function as a hole injecting, hole transporting, electron injecting, electron transporting, or light emitting in an organic electronic device including an organic light emitting device, and in particular, used alone as a light emitting, or as a host or dopant in a host/dopant system. The organic electronic device according to the present invention exhibits excellent characteristics in terms of efficiency, drive voltage, life time, and stability.