Identical Phenols Patents (Class 568/723)
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Patent number: 9950979Abstract: A process for preparing unsymmetric biphenols, comprising: a) adding a first substituted phenol to the reaction mixture; b) adding a second substituted phenol having different substitution than the first phenol to the reaction mixture; c) adding selenium dioxide to the reaction mixture; d) adding a solvent; and e) heating the reaction mixture such that the first substituted phenol and the second phenol having different substitution are converted to an unsymmetric biphenol.Type: GrantFiled: May 20, 2015Date of Patent: April 24, 2018Assignee: Evonik Degussa GmbHInventors: Katrin Marie Dyballa, Robert Franke, Dirk Fridag, Michael Mirion, Thomas Quell, Siegfried R. Waldvogel
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Patent number: 9517986Abstract: A process for preparing a 2,2?-biphenol, proceeds by a) adding a first phenol to a reaction mixture, b) adding a second phenol to the reaction mixture, c) adding selenium dioxide to the reaction mixture, d) adding an acid having a pKa in the range from 0.0 to 5.0 to the reaction mixture, and e) heating the reaction mixture such that the first phenol and the second phenol are converted to said 2,2?-biphenol.Type: GrantFiled: May 22, 2015Date of Patent: December 13, 2016Assignee: Evonik Degussa GmbHInventors: Katrin Marie Dyballa, Robert Franke, Dirk Fridag, Siegfried R. Waldvogel, Thomas Quell, Michael Mirion
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Patent number: 9454076Abstract: The present invention provides a class of molecular glass photoresist (I and II) comprising bisphenol A as a main structure and their preparation. The molecular glass photoresist is formulated with a photoacid generator, a cross-linking agent, a photoresist solvent, and other additives into a positive or negative photoresist. A photoresist with a uniform thickness is formed on a silicon wafer by spin-coating. The photoresist formulation can be used in modern lithography, such as 248 nm photolithography, 193 nm photolithography, extreme-ultraviolet (EUV) lithography, nanoimprint lithography, electron beam lithography, and particularly in the EUV-lithography technique.Type: GrantFiled: May 18, 2012Date of Patent: September 27, 2016Assignee: INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCESInventors: Guoqiang Yang, Jian Xu, Li Chen, Shuangqing Wang, Shayu Li
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Publication number: 20150105531Abstract: A method for recovering a dihydroxy aromatic compound and urea from a polycarbonate-containing composition comprising a polycarbonate and a phosphorus-containing flame retardant, comprising contacting the composition with ammonia in the presence of a swelling solvent for a time sufficient to depolymerize the polycarbonate producing a dihydroxy aromatic compound and urea.Type: ApplicationFiled: October 15, 2013Publication date: April 16, 2015Inventors: Alexander Stanislaus, Venkata Ramanarayanan Ganapathy Bhotla, PS Sreenivasan, Philip Wesley Bell
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Patent number: 8969629Abstract: Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist pattern formation method using the composition. Specifically disclosed are: a cyclic compound having a specific structure; a process for producing the cyclic compound; a radiation-sensitive composition containing the compound; and a resist pattern formation method using the composition.Type: GrantFiled: November 25, 2010Date of Patent: March 3, 2015Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Masaaki Takasuka, Masatoshi Echigo, Yu Okada
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Patent number: 8846292Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good shape and a method of forming a resist pattern and novel compositions for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Radiation-sensitive composition containing a solvent and a cyclic compound having, e.g., a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups, and a cyclic compound for use in the radiation-sensitive composition.Type: GrantFiled: December 29, 2011Date of Patent: September 30, 2014Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Masatoshi Echigo, Dai Oguro
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Patent number: 8835686Abstract: A method, an apparatus and an article of manufacture for attracting charged nanoparticles using a graphene nanomesh. The method includes creating a graphene nanomesh by generating multiple holes in graphene, wherein each of the multiple holes is of a size appropriate to a targeted charged nanoparticle, selectively passivating the multiple holes of the graphene nanomesh to form a charged ring in the graphene nanomesh by treating the graphene nanomesh with chemistry yielding a trap with an opposite charge to that of the targeted nanoparticle, and electrostatically attracting the target charged nanoparticle to the oppositely charged ring to facilitate docking of the charged nanoparticle to the graphene nanomesh.Type: GrantFiled: November 22, 2011Date of Patent: September 16, 2014Assignee: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Ahmed Maarouf, Glenn J. Martyna
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Patent number: 8829192Abstract: Described is the use of specific merocyanine derivatives for protecting body-care and household products from photolytic and oxidative degradation. These compounds perform outstanding UV absorber properties.Type: GrantFiled: July 19, 2006Date of Patent: September 9, 2014Assignee: BASF SEInventors: Barbara Wagner, Oliver Reich
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Patent number: 8748078Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.Type: GrantFiled: August 30, 2010Date of Patent: June 10, 2014Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Hiromi Hayashi, Masatoshi Echigo, Dai Oguro
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Patent number: 8709166Abstract: Methods for extracting bisphenols from polymer substrates are described. The methods include contacting the polymer substrate with an aqueous composition which includes a phase transfer agent, a base and optionally an oxidant, whereby the bisphenol is extracted into the aqueous composition. Suitable phase transfer agents are delineated. Also described are compositions which can be used in the present methods.Type: GrantFiled: December 22, 2010Date of Patent: April 29, 2014Assignee: Empire Technology Development LLCInventor: Kraig Anderson
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Publication number: 20140051803Abstract: A modified ion exchange resin catalyst having an attached dimethyl thiazolidine promoter is disclosed. Also disclosed is a process for catalyzing condensation reactions between phenols and ketones, wherein reactants are contacted with a modified ion exchange resin catalyst having an attached dimethyl thiazolidine promoter. Also disclosed is a process for catalyzing condensation reactions between phenols and ketones that does not utilize a bulk promoter.Type: ApplicationFiled: May 2, 2012Publication date: February 20, 2014Applicant: SABIC INNOVATIVE PLASTICS IP B.V.Inventors: Johannes De Brouwer, Paulus Johannes Maria Eijsbouts
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Publication number: 20140051802Abstract: Methods for performing a condensation reaction are disclosed. Specifically, various methods for the production of highly-pure bisphenol-A are disclosed in which an attached promoter ion exchange resin catalyst system is combined with a solvent crystallization step.Type: ApplicationFiled: May 2, 2012Publication date: February 20, 2014Applicant: SABIC INNOVATIVE PLASTICS IP B.V.Inventors: Johannes De Brouwer, Paulus Johannes Maria Eijsbouts
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Publication number: 20130211036Abstract: A process for oxidizing a composition comprising contacting an alkylbenzene of the general formula (I): where R1 and R2 each independently represents hydrogen or an alkyl group having from 1 to 4 carbon atoms, wherein R1 and R2 may be joined to form a cyclic group having from 4 to 10 carbon atoms, the cyclic group being optionally substituted, and R3 represents hydrogen, one or more alkyl groups having from 1 to 4 carbon atoms or a cyclohexyl group; and (ii) about 0.05 wt % to about 5 wt % of phenol, with oxygen in the presence of a catalyst containing a cyclic imide having the general formula (II): wherein X represents an oxygen atom, a hydroxyl group, or an acyloxy group under conditions effective to convert at least a portion of the alkylbenzene to a hydroperoxide.Type: ApplicationFiled: August 16, 2011Publication date: August 15, 2013Applicant: ExxonMobil Chemical Company - Law TechnologyInventors: Jihad M. Dakka, Edmund J. Mozeleski, Charles Morris Smith, Christopher L. Becker, Stephen Zushma
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Publication number: 20130172514Abstract: In a process for producing a cycloalkylaromatic compound, an aromatic compound, hydrogen and at least one diluent are supplied to a hydroalkylation reaction zone, such that the weight ratio of the diluent to the aromatic compound supplied to the hydroalkylation reaction zone is at least 1:100. The aromatic compound, hydrogen and the at least one diluent are then contacted under hydroalkylation conditions with a hydroalkylation catalyst in the hydroalkylation reaction zone to produce an effluent comprising a cycloalkylaromatic compound.Type: ApplicationFiled: June 28, 2011Publication date: July 4, 2013Applicant: ExxonMobil Chemical Patents Inc.Inventors: Teng Xu, Wenyih F. Lai
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Macromolecular amine-phenolic antioxidant compositions, process technology thereof, and uses thereof
Patent number: 8455414Abstract: This invention relates to novel macromolecular amine-phenolic compositions having oxidation inhibition characteristics that are exhibited when added to organic material normally susceptible to oxidative degradation in the presence of air or oxygen, such as petroleum products, synthetic polymers, and elastomeric substances.Type: GrantFiled: October 17, 2007Date of Patent: June 4, 2013Assignee: Albemarle CorporationInventors: Mahmood Sabahi, Vincent J. Gatto, Hassan Y. Elnagar -
Publication number: 20130131383Abstract: A method, an apparatus and an article of manufacture for attracting charged nanoparticles using a graphene nanomesh. The method includes creating a graphene nanomesh by generating multiple holes in graphene, wherein each of the multiple holes is of a size appropriate to a targeted charged nanoparticle, selectively passivating the multiple holes of the graphene nanomesh to form a charged ring in the graphene nanomesh by treating the graphene nanomesh with chemistry yielding a trap with an opposite charge to that of the targeted nanoparticle, and electrostatically attracting the target charged nanoparticle to the oppositely charged ring to facilitate docking of the charged nanoparticle to the graphene nanomesh.Type: ApplicationFiled: November 22, 2011Publication date: May 23, 2013Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Ali Afzali-Ardakani, Ahmed Maarouf, Glenn J. Martyna
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Patent number: 8389197Abstract: The present invention provides a positive resist composition and a resist pattern forming method that are capable of forming a resist pattern with a reduced level of roughness. The positive resist composition includes the compound represented by the general formula (I) below. The present invention also provides the resist pattern forming method using the positive resist composition above. [wherein, in formula (I), R11 and R12 each represents, independently, an alkyl group of 1 to 10 carbon atoms or an aromatic hydrocarbon group, and may include a hetero atom in the structure thereof; R21 to R24 each represents, independently, a hydrogen atom or an acid dissociable, dissolution inhibiting group, and two of the R21 to R24 represents a hydrogen atom and the others represents an acid dissociable, dissolution inhibiting group; X is a group represented by general formulas (Ia) or (Ib) below].Type: GrantFiled: June 30, 2006Date of Patent: March 5, 2013Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takako Hirosaki, Daiju Shiono, Taku Hirayama, Hideo Hada
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Patent number: 8350096Abstract: A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.Type: GrantFiled: March 18, 2011Date of Patent: January 8, 2013Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Masatoshi Echigo, Dai Oguro
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Patent number: 8216970Abstract: This invention provides 1,1-bis(4-hydroxyphenyl)-1-phenylethane having a crystal form characterized by an X-ray diffraction pattern having one sharp and strong peak at 16.4° and three sharp peaks of intermediate intensity at each of 13°-16° and 17°-20.8° and at least three peaks of intermediate intensity at 22°-23° as a diffraction angle (2?) in an X-ray diffractometry with Cu—K ?-rays, and being capable of giving the storing stability of a colored image and a non-colored portion against heat, water or the like and the low-energy color-developing property suitable for high-speed color development.Type: GrantFiled: July 18, 2007Date of Patent: July 10, 2012Assignee: Nipponkayaku KabushikikaishaInventors: Hiroaki Tsugawa, Soichi Uehori, Mituo Yoshifuji
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Publication number: 20120172568Abstract: Bis-Phenol A (BPA) can now be replaced in industrial processes by BPA substitutes. The BPA substitutes can have structures that are derivatives of BPA. The BPA substitutes can be used in preparing epoxy composition, polycarbonate compositions, and polysulfonate compositions or for other uses in place of BPA.Type: ApplicationFiled: December 29, 2010Publication date: July 5, 2012Applicant: EMPIRE TECHNOLOGY DEVELOPMENT LLCInventor: Masahiro Ueda
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Patent number: 8211588Abstract: A sulfonated poly(arylene sulfone) contains an unsaturated bond. A cross-linked material may be formed from the sulfonated poly(arylene sulfone), and a clay nanocomposite may include the sulfonated poly(arylene sulfone) or the cross-linked material. A fuel cell includes the clay nanocomposite.Type: GrantFiled: January 4, 2010Date of Patent: July 3, 2012Assignees: Samsung Electronics Co., Ltd., Korea Advanced Institute of Science and TechnologyInventors: Yeong-suk Choi, Sang-ouk Kim, Sun-hwa Lee, Won-jun Lee
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Publication number: 20120130009Abstract: Vulcanizates with desirable properties can be obtained from compounds incorporating polymers that include hydroxyl group-containing diphenylethylene-type functionalities. The functionalities can be incorporated by using any or all of appropriate initiators, monomers and optional terminating compounds. Such polymers exhibit excellent interactivity with both conventional and non-conventional fillers.Type: ApplicationFiled: June 30, 2010Publication date: May 24, 2012Inventors: Zengquan Qin, Yuan-Yong Yan, Xiao-Dong Pan
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Publication number: 20120115084Abstract: Disclosed are a negative resist composition which shows excellent sensitivity and resolution in pattern formation by exposure to electron beams or EUV, a novel crosslinking agent suitable for the resist composition, and a pattern forming method using the resist composition. The negative resist composition comprises: (A) a polyphenol compound comprising two or more phenolic hydroxyl groups in a molecule thereof and having a molecular weight of 300 to 3,000, (B) an acid generator which directly or indirectly produces acid by exposure to active energy rays having a wavelength of 248 nm or less, and (C) a crosslinking agent represented by the following chemical formula (1). (The symbols shown in the formula (1) are defined in the Description).Type: ApplicationFiled: September 29, 2009Publication date: May 10, 2012Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Kenichi Okuyama, Yasunori Nagatsuka
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Patent number: 8173351Abstract: A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.Type: GrantFiled: January 8, 2008Date of Patent: May 8, 2012Assignee: JSR CorporationInventors: Daisuke Shimizu, Ken Maruyama, Toshiyuki Kai, Tsutomu Shimokawa
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Patent number: 8110334Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition.Type: GrantFiled: November 1, 2007Date of Patent: February 7, 2012Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Masatoshi Echigo, Dai Oguro
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Patent number: 8039679Abstract: An improved process is provided for producing bisphenol-A (BPA) comprising steps of (1) contacting benzene and a C3 alkylating agent to produce an alkylation effluent comprising cumene; (2) oxidizing the cumene to produce the corresponding hydroperoxide; (3) cleaving the hydroperoxide to produce product comprising phenol and acetone; (4) reacting acetone with phenol to form a reaction product stream comprising crude bisphenol-A product; (5) distilling the reaction product stream, while sending downstream to a BPA-phenol adduct crystallization and purification step, the resulting concentrated BPA phenolic feed stream; (6) producing BPA-phenol adduct crystals by crystallization of the concentrated BPA phenolic feed stream; (7) separating the BPA-phenol adduct crystals by solid-liquid separationr; (8) cracking a stream comprising at least a portion of said final mother liquor to recover a product; and (9) recovering and feeding the phenol product of step (8) to step (4) and/or step (7).Type: GrantFiled: August 24, 2006Date of Patent: October 18, 2011Assignee: Badger Licensing LLCInventors: Steven D. Evitt, Stephen W. Fetsko, Chung-Ming Chi
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Publication number: 20110172239Abstract: Bis- and tris-dihydroxyaryl compounds and their methylenedioxy analogs and pharmaceutically acceptable esters, their synthesis, pharmaceutical compositions containing them, and their use in the treatment of amyloid diseases, especially A? amyloidosis, such as observed in Alzheimer's disease, IAPP amyloidosis, such as observed in type 2 diabetes, and synucleinopathies, such as observed in Parkinson's disease, and the manufacture of medicaments for such treatment.Type: ApplicationFiled: July 16, 2010Publication date: July 14, 2011Inventors: Alan D. SNOW, Beth NGUYEN, Gerardo CASTILLO, Virginia SANDERS, Thomas LAKE, Lesley LARSEN, Rex T. WEAVERS, Stephen LORIMER, David LARSEN, David L. COFFEN, Charlotte COFFEN
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Publication number: 20110152389Abstract: A strong-acid cation exchange resin comprising a plurality of acid groups which are partially neutralized with a cation of formula (I); wherein R1 at each occurrence independently is hydrogen or a Ci-4-alkyl group, R2 at each occurrence independently is hydrogen, alkyl or aryl, R3 at each occurrence independently is hydrogen or alkyl or two vicinal groups R3 together form an aromatic ring, m is 1, 2, 3, 4, 5 or 6, n is 1, 2, 3 or 4, o is 1 or 2, and p is 1, 2 or 3, is useful in the production of bisphenols.Type: ApplicationFiled: July 18, 2007Publication date: June 23, 2011Inventor: Johann-Wilhelm Frey
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Patent number: 7932014Abstract: A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R1 to R8 are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an acetoxy group, a phenyl group, a naphthyl group, and an alkyl group in which some or all of the hydrogen atoms are optionally replaced by fluorine atoms; R9 is a hydrogen atom or a hydroxyl group; X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthalene group; and Y is an oxygen atom or a single bond.Type: GrantFiled: February 14, 2008Date of Patent: April 26, 2011Assignee: Canon Kabushiki KaishaInventor: Toshiki Ito
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Patent number: 7902407Abstract: A method for preparing a metal salt of a hydroxy-substituted aromatic compound is described. The method comprises contacting in an aqueous medium at least one hydroxy-substituted aromatic compound with a base comprising a metal cation to provide a mixture comprising water and a metal salt of said hydroxy-substituted aromatic compound. The aqueous metal salt is then contacted with a substantially water-immiscible solvent at a temperature greater than the boiling point of water at the prevailing pressure to provide a slurry comprising the metal salt of the hydroxy-substituted aromatic compound and a vapor stream comprising the water-immiscible solvent and water. The components of the vapor stream are separated using a vapor handling system comprising a partial reflux condenser to provide a water-rich component and a water immiscible solvent-rich component.Type: GrantFiled: March 30, 2005Date of Patent: March 8, 2011Assignee: Sabic Innovative Plastics IP B.V.Inventors: James Manio Silva, Thomas Link Guggenheim, David Winfield Woodruff
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Publication number: 20100297528Abstract: An alkylated bisphenol-based compound, a method of preparing the same, sulfonated polyarylene sulfone polymer prepared from the alkylated bisphenol-based compound, a method of preparing the polymer, and a fuel cell using the sulfonated polyarylene sulfone polymer.Type: ApplicationFiled: April 30, 2010Publication date: November 25, 2010Applicants: Samsung Electronics Co., Ltd., Korea Advanced Institute of Science and TechnologyInventors: Yeong-suk Choi, Sang-ouk Kim, Won-jun Lee, Sun-hwa Lee
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Publication number: 20100234589Abstract: In a process for oxidizing a hydrocarbon to a corresponding hydroperoxide, alcohol, ketone, carboxylic acid or dicarboxylic acid, the hydrocarbon is contacted with an oxygen-containing gas in the presence of a catalyst comprising a cyclic imide of the general formula (I): wherein each of R1 and R2 is independently selected from hydrocarbyl and substituted hydrocarbyl radicals having 1 to 20 carbon atoms, or from the groups SO3H, NH2, OH and NO2, or from the atoms H, F, Cl, Br and I provided that R1 and R2 can be linked to one another via a covalent bond; each of Q1 and Q2 is independently selected from C, CH, N and CR3; each of X and Z is independently selected from C, S, CH2, N, P and an element of Group 4 of the Periodic Table; Y is O or OH; k is 0, 1, or 2; 1 is 0, 1, or 2; m is 1 to 3, and R3 can be any of the entities listed for R1.Type: ApplicationFiled: July 11, 2008Publication date: September 16, 2010Inventors: Jihad M. Dakka, James C. Vartuli, Stephen Zushma
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Patent number: 7737310Abstract: A process for preparing biphenols of the general formula I by reaction of monophenols of the general formula II where the radicals R1, R2 and R3 are each, independently of one another, hydrogen, alkyl, aryl or arylalkyl having from 1 to 10 carbon atoms, in the presence of an oxidant in a reactor, wherein a) the reactor comprises no stationary internals which act as baffles, b) a total of not more than 0.6 mol of oxidant is used per one mol of monophenol, and c) the oxidant is introduced either continuously or discontinuously in a plurality of portions over a period of from 10 minutes to 24 hours, with the amount of oxidant introduced per unit time not being constant over the total period of time but instead being varied.Type: GrantFiled: April 5, 2006Date of Patent: June 15, 2010Assignee: BASF SEInventors: Michael Bartsch, Gerd Haderlein, Tobias Aechtner, Jens Scheidel, Christian Dienes, Alexander Tempel, Thorsten Hofrichter, Werner Weinle
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Patent number: 7696388Abstract: A process for preparing 2,2-bis(4-hydroxyphenyl)propane (p,p-bisphenol-A) from 2,4,4-trimethyl-2-(4-hydroxyphenyl)chroman (chroman 1.5) is disclosed. Phenol and chroman 1.5 are contacted over an acidic ion exchange resin at a given temperature for a given period of time. The process results in improved quality of p,p-bisphenol-A, better performance of catalyst, improved raw material usage, and reduced waste.Type: GrantFiled: July 9, 2008Date of Patent: April 13, 2010Assignee: SABIC Innovative Plastics IP B.V.Inventors: Hatem Abdallah Belfadhel, Umesh Krishna Hasyagar, Gurram Kishan, Rathinam Jothi Mahalingam
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Publication number: 20100010273Abstract: A process for preparing 2,2-bis(4-hydroxyphenyl)propane (p,p-bisphenol-A) from 2,4,4-trimethyl-2-(4-hydroxyphenyl)chroman (chroman 1.5) is disclosed. Phenol and chroman 1.5 are contacted over an acidic ion exchange resin at a given temperature for a given period of time. The process results in improved quality of p,p-bisphenol-A, better performance of catalyst, improved raw material usage, and reduced waste.Type: ApplicationFiled: July 9, 2008Publication date: January 14, 2010Applicant: SABIC INNOVATIVE PLASTICS IP BVInventors: Hatem Abdallah Belfadhel, Umesh Krishna Hasyagar, Gurram Kishan, Rathinam Jothi Mahalingam
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Publication number: 20090264657Abstract: Described is the use of specific merocyanine derivatives for protecting body-care and household products from photolytic and oxidative degradation. These compounds perform outstanding UV absorber properties.Type: ApplicationFiled: July 19, 2006Publication date: October 22, 2009Inventors: Barbara Wagner, Oliver Reich
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Patent number: 7601784Abstract: It is an object of the present invention to provide molecular compounds useful in the fields of state-of the-art materials, such as formulations, waste water treatments, energy transducers, conductors and bio-model reactions, in a way that interaction points and forces working inside polymer assemblies are fixed as well as controlled so that constituent polymers are aligned and modified. It is also an object of the present invention to provide methods for aligning and/or modifying polymers having hydrogen bond sites. A molecular compound is produced from a tetrakis aryl compound represented by Formula (I) (wherein, X is (CH2)n, or p-phenylene; n is 0, 1, 2 or 3; Y is hydroxyl, carboxyl or optionally substituted amino: and R1 and R2 are each hydrogen, lower alkyl, optionally substituted phenyl, halogen or lower alkoxy) and a polymer having hydrogen bond sites, such as polyethers, polyalcohols or polyamines.Type: GrantFiled: May 9, 2005Date of Patent: October 13, 2009Assignee: Nippon Soda Co., Ltd.Inventors: Hiroshi Suzuki, Satoru Abe
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Patent number: 7414160Abstract: A process produces an aromatic compound by bringing an aromatic compound (B) into contact with molecular oxygen (C) in the presence of a catalyst (A) comprising at least one of (A1) a heteropolyacid and/or a salt thereof, and (A2) a mixture of oxoacids and/or salts thereof containing, as a whole, one of P and Si and at least one selected from V, Mo and W to thereby yield another aromatic compound (G) than the aromatic compound (B). The process can produce, for example, a corresponding aromatic hydroxy compound (G1) by allowing the aromatic compound (B) to react with the molecular oxygen (C) further in the presence of a reducing agent (D).Type: GrantFiled: December 20, 2005Date of Patent: August 19, 2008Assignee: Daicel Chemical Industries, Ltd.Inventors: Yasutaka Ishii, Tatsuya Nakano
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Publication number: 20080194790Abstract: The invention relates to a hydroxy-aromatic compound of formula (I): wherein: at least one of the set consisting of R1, R3, and R5 is a group of formula (II); any remaining one or two of the set consisting of R1, R3, and R5 being H, OH, a C1-C12 alkyl group or an oligomeric or polymeric system; R2 and R4 are H, OH, a C1-C12 alkyl group or an oligomeric or polymeric system; formula (II) is the following group: wherein EWG is an electron-withdrawing group.Type: ApplicationFiled: December 1, 2005Publication date: August 14, 2008Inventors: Rudolfus A.T.M. Van Benthem, Renier H.M. Kierkels
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Publication number: 20080177113Abstract: A process for preparing biphenols of the general formula I by reaction of monophenols of the general formula II where the radicals R1, R2 and R3 are each, independently of one another, hydrogen, alkyl, aryl or arylalkyl having from 1 to 10 carbon atoms, in the presence of an oxidant in a reactor, wherein a) the reactor comprises no stationary internals which act as baffles, b) a total of not more than 0.6 mol of oxidant is used per one mol of monophenol, and c) the oxidant is introduced either continuously or discontinuously in a plurality of portions over a period of from 10 minutes to 24 hours, with the amount of oxidant introduced per unit time not being constant over the total period of time but instead being varied.Type: ApplicationFiled: April 5, 2006Publication date: July 24, 2008Applicant: BASF AktiengesellschaftInventors: Michael Bartsch, Gerd Haderlein, Tobias Aechtner, Jens Scheidel, Christian Dienes, Alexander Tempel, Thorsten Hofrichter, Werner Weinle
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Publication number: 20080132722Abstract: Disclosed is a method for producing at least one chemical reaction product by chemically reacting one or several reactants that is/are optionally dissolved in one or several solvents and is/are supplied as a feed stream by bringing the same in contact with a heterogeneous catalyst in a continuously operated fixed-bed reactor which is filled with a particle bed, a continuous annular chromatograph (CAC) that is filled with the particle bed being used as a fixed-bed reaction in which the at least one reaction product is formed and purified while the at least one purified reaction product as well as optionally provided secondary products and/or non-reacted reactants are withdrawn at a different, predetermined azimuthal position of the annular chromatograph, respectively. The inventive method is characterized in that only one type of particle material is used in a single particle bed as both a formation catalyst and a chromatographic medium for purifying the at least one reaction product in the particle bed.Type: ApplicationFiled: January 13, 2005Publication date: June 5, 2008Applicant: A.L.P. Technology AGInventors: Massimo Morbidelli, Marco Mazzotti, Adalbert Prior, Joachim Prior, Frank Lang
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Patent number: 7371902Abstract: Methods for purifying a p,p-bisphenol A generally include distilling a feed stream comprising p,p-BPA in a distillation column at a pressure less than or equal to 20 millibars. The distillation column separates the bisphenol feed stream to produce a light fraction, an intermediate fraction and a heavy fraction. The intermediate fraction comprising the purified bisphenol contains lesser impurities that the p,p-BPA in the feed stream. In one embodiment, the intermediate stream is recovered using a side-draw. The side-draw is located between a first zone and a third zone in the distillation column.Type: GrantFiled: September 29, 2004Date of Patent: May 13, 2008Assignee: General Electric CompanyInventors: Ramachandran Kumar, Gomatam Raghavan Ravi, Hyacinth Mary Bastian, Gururaj Sathyanarayana, Sheldon Jay Shafer, Kumar Krishna Ramamurthy, Dwijaraja Mouli Murukutla, Venkata Rama Narayanan Ganapathy Bhotla
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Patent number: 7115785Abstract: Disclosed is a method for preparing an alkali metal salt of a hydroxy-substituted hydrocarbon which comprises the steps of (i) contacting in solvent media at least one hydroxy-substituted hydrocarbon with a base comprising an alkali metal cation; and (ii) devolatilizing the solvent media comprising alkali metal salt by adding or spraying the solvent media into a substantially water-immiscible organic solvent, said solvent being at a temperature greater than the boiling point of solvent media at the prevailing pressure. In one embodiment the solvent media comprises water, and optionally at least one water-soluble protic organic solvent.Type: GrantFiled: August 25, 2003Date of Patent: October 3, 2006Assignee: General Electric CompanyInventors: Thomas Link Guggenheim, Daniel Joseph Brunelle, David Winfield Woodruff, Lee Harris Bergman, Norman Enoch Johnson, Matthew Hal Littlejohn, Farid Fouad Khouri
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Patent number: 7087799Abstract: An object of the present invention is to provide a material which resolves the drawbacks associated with polyimide polymers, and yet retains the advantages offered by conventional polyimide polymers. An amino group containing phenol derivative of the present invention is represented by a general formula (1) show below, and the present invention also provides a polyimide precursor produced using such an amino group containing phenol derivative. (wherein, R1, R2 and R3, which may be the same or different, each represent an alkyl group of 1 to 9 carbon atoms, an alkoxy group of 1 to 10 carbon atoms, a COOR group (in which R represents an alkyl group of 1 to 6 carbon atoms) or a hydrogen atom; R4 and R5, which may be the same or different, each represent an alkyl group of 1 to 9 carbon atoms or a hydrogen atom; X represents —O—, —S—, —SO2—, —C(CH3)2—, —CH2—, —C(CH3)(C2H5)—, or —C(CF3)2—; and n represents an integer of 1 or greater).Type: GrantFiled: January 31, 2003Date of Patent: August 8, 2006Assignee: Gun Ei Chemical Industry Co., Ltd.Inventors: Takeshi Tsuihiji, Michiyasu Yamazaki
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Patent number: 7067704Abstract: Bisphenol-A is purified in a process which comprises the following steps: a) cooling a liquid mixture comprising bisphenol-A and water in a bisphenol-A crystallizer to form bisphenol-A crystals in a liquid phase; b) separating the bisphenol-A crystals from the liquid phase; c) dividing at least a portion of the liquid phase into a bisphenol-rich organic phase and a water-rich phase; d) feeding phenol and at least a portion of the bisphenol-rich organic phase into a adduct crystallizer to form a crystalline adduct of phenol and bisphenol-A in a mother liquor, and e) separating the crystalline adduct from the mother liquor. Bisphenol-A of high purity at a high yield is obtained.Type: GrantFiled: November 12, 2003Date of Patent: June 27, 2006Assignee: Dow Global Technologies Inc.Inventors: Thomas C. Young, Damian M. Feord, Johann-Wilhelm Frey
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Patent number: 7045664Abstract: In a process for producing bisphenol A, an adduct of bisphenol A with phenol is promptly recovered in highly purity and high efficiency from a reaction mother liquor in the case of singling out bisphenol A from a reaction product. An adduct layer of bisphenol A with phenol is formed by crystallizing an adduct of bisphenol A with phenol from a solution of bisphenol A in phenol to form a slurry, the bisphenol A being produced by reacting phenol and acetone in the presence of an acid catalyst, subjecting the resultant slurry to a solid-liquid separation treatment, and thereafter removing the phenol from solid components, characterized by pouring onto a filter, a slurry solution of bisphenol A in phenol, the slurry solution containing in a crystalline state, an adduct of bisphenol A having an average particle size in the range of 0.05 to 1 mm with phenol, and filtering the slurry solution under reduced pressure in an atmosphere of an inert gas stream at 30 to 80° C.Type: GrantFiled: July 29, 2003Date of Patent: May 16, 2006Assignee: Idemitsu Kosan Co., Ltd.Inventors: Kazuyuki Hirano, Norio Ogata
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Patent number: 7019179Abstract: A process produces an aromatic compound by bringing an aromatic compound (B) into contact with molecular oxygen (C) in the presence of a catalyst (A) comprising at least one of (A1) a heteropolyacid and/or a salt thereof, and (A2) a mixture of oxoacids and/or salts thereof containing, as a whole, one of P and Si and at least one selected from V, Mo and W to thereby yield another aromatic compound (G) than the aromatic compound (B). The process can produce, for example, a corresponding aromatic hydroxy compound (G1) by allowing the aromatic compound (B) to react with the molecular oxygen (C) further in the presence of a reducing agent (D).Type: GrantFiled: March 6, 2003Date of Patent: March 28, 2006Assignee: Daicel Chemical Industries, Ltd.Inventors: Yasutaka Ishii, Tatsuya Nakano
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Patent number: 6906226Abstract: Hydroxymethyl-substituted polyfunctional phenols, expressed by the following structure: General structure (I) (wherein X represents: bivalent group (a) expressed by the following structure: General structure (II) (wherein R1, R2, R3 and R4 each independently represent a hydrogen atom or an alkyl group with a carbon atom number of 1 through 4); quadrivalent group (b) expressed by the following structure: General structure (III) (wherein R5 and R6 each independently represent a hydrogen atom or an alkyl group with a carbon atom number of 1 through 4); or bivalent group (c) expressed by the following structure: General structure (IV) (wherein R7 and R8 each independently represent a hydrogen atom or a monofluoromethyl, difluoromethyl or trifluoromethyl group; however, R7 and R8 cannot be both hydrogen atoms); wherein n takes 2 when X is bivalent group (a), takes 4 when X is quadrivalent group (b), or takes 2 when X is bivalent group (c)).Type: GrantFiled: April 3, 2003Date of Patent: June 14, 2005Assignee: Honshu Chemical Industry Co., Ltd.Inventors: Kazuya Matsuishi, Takayuki Ohno, Taiichi Shiomi
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Patent number: 6872859Abstract: The present invention relates to a process for preparing bisphenols which comprises reacting a carbonyl compound containing at least two carbon atoms with an aromatic compound, containing a hydroxyl group and at least one hydrogen atom bound to the aromatic ring, in the presence of a catalyst comprising a zeolite characterized by a spaciousness index equal to or higher than 8. The invention also relates to a method for the regeneration of the zeolitic catalyst used in this process and comprises subjecting the exhausted catalyst to hot treatment with a suitable aromatic compound containing at least one activating group, preferably the same hydroxylated aromatic compound used in the process for the preparation of bisphenols from which the exhausted catalyst derives.Type: GrantFiled: May 28, 2002Date of Patent: March 29, 2005Assignee: Enitecnologie S.p.A.Inventors: Carlo Perego, Alberto De Angelis
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Publication number: 20040181100Abstract: A high productivity catalyst for bisphenol-A has been discovered which comprises strongly acidic cation-exchange resin spheres produced from a polystyrene/divinylbenzene (PS/DVB) copolymer sulfonated under conditions to introduce sulfone cross-linking. Surprisingly, the sulfone cross-linking improves the resistance to deformation but does not have a negative effect on the activity and selectivity of the catalyst in bisphenol-A production.Type: ApplicationFiled: March 22, 2004Publication date: September 16, 2004Inventor: Eric Gustave Lundquist