Abstract: A color-stable, antimicrobial glass powder obtained by partial ion exchange at a temperature of 300° C. to 350° C. and an exchange time of 1 to 120 minutes, is formed of a mixture of porous glass particles having micropores and macropores made of borosilicate glass continuously foamed by extrusion having a Fe2O3 content <0.2 wt %, in which the obtained glass foam is subsequently comminuted by dry grinding to average particle sizes of 1.0 to 8.0 ?m. The mixture includes color stabilizers containing 0.1% to 0.2% of ammonium ions and antimicrobial metal ions from dissolved metal salts, wherein the metal ions may be silver and/or zinc and/or copper ions. A method for the production of a color-stable, antimicrobial glass powder and applications for using the color-stable, antimicrobial glass powder are also provided.

Abstract: The present invention disclosed in this application relates to a method for producing glass membranes for filtration purposes. The disclosed method for producing cost effective glass membranes utilizes recycled waste glass, has shorter sintering periods and has lower sintering temperatures.

Abstract: A wavelength conversion structure comprises a sintered body comprising a mixture of a wavelength conversion material and a glass composition, wherein the wavelength conversion material comprises a phosphor and the glass composition comprises ZnO—BaO—SiO2—B2O3.

Abstract: Producing a silica container includes forming a powder mixture by adding an Al compound or a crystal nucleating agent into a first powdered raw material; preliminarily molding to an intended shape by feeding the powder mixture to an inner wall of an outer frame while rotating the outer frame having aspiration holes; forming a silica substrate; and forming a transparent silica glass layer on an inner surface of the silica substrate, wherein the preliminarily molded article is degassed by aspiration from a peripheral side and heated from inside the preliminarily molded article at high temperature making a peripheral part of the preliminarily molded article to a sintered body while an inner part to a fused glass body, and a second powdered raw material having a higher silica purity than the first powdered raw material is spread from inside the silica substrate and heated from the inside at high temperature.

Abstract: A method for producing a silica container includes forming a preliminarily molded substrate, wherein a first powdered raw material is fed to an inner wall of an outer frame having aspiration holes while rotating the outer frame; forming a preliminarily molded intermediate layer, wherein a second powdered raw material added with an aluminum compound or a crystal nucleating agent as an additive is fed to an inner wall of the preliminarily molded substrate; and forming an inner layer, wherein the preliminarily molded substrate and the preliminarily molded intermediate layer are degassed by aspiration from a peripheral side with heating from an inside forming a substrate and an intermediate layer, and a third powdered raw material having a high silica purity is spread from inside the substrate having the formed intermediate layer with heating from the inside forming an inner layer on an inner surface of the intermediate layer.

Abstract: A process is disclosed for simple and rapid production of a shaped body comprising fused silica and a shaped body which leads to virtually no contamination of a melt in contact with the shaped body even at high temperatures. The disclosed process comprises the steps of: a) provision of fused silica in the form of essentially amorphous SiO2 grains of which not more than 5% have a diameter greater than 15 mm, b) addition of water to the fused silica grains to produce a slip, c) casting of the slip into a mold which comprises a hollow body having the inverse shape of the shaped body to be produced, and d) drying of the slip to give an intermediate body, which is then sintered and cooled. A shaped body producible in accordance with the aforementioned process is also disclosed, which comprises at least 99.0 mol % of SiO2.

Abstract: The present invention is directed to a single-crystal silicon pulling silica container, the silica container including a straight body portion, a curved portion, and a bottom portion, wherein the OH group concentration in the straight body portion is 30 to 300 ppm by mass, the OH group concentration in the bottom portion is 30 ppm by mass or less, and the difference in the OH group concentration between the straight body portion and the bottom portion is 30 ppm by mass or more. As a result, a low-cost single-crystal silicon pulling silica container, the silica container that can reduce cavity defects called voids and pinholes in pulled single crystal silicon, is provided.

Abstract: Some embodiments in the present disclosure generally relate to catalytic silica-polyvinyl alcohol composites, silica structures therefrom, and/or microreactors therefrom. Some embodiments in the present disclosure generally relate to porous substrates that can have at least one pore with a catalyst associated with the inside of the pore.

Abstract: The present invention disclosed in this application relates to a method for producing glass membranes for filtration purposes. The disclosed method for producing cost effective glass membranes utilizes recycled waste glass, has shorter sintering periods and has lower sintering temperatures.

Abstract: A method for producing a silica container, the method including forming a preliminarily molded silica substrate to an intended shape by feeding a powdered substrate's raw material (silica particles) to an inner wall of a carbon-made outer frame having aspiration holes with rotating the outer frame, and forming the silica substrate wherein the preliminarily molded substrate is degassed by aspiration from its outer peripheral side with charging from an inner peripheral side of the preliminarily molded silica substrate a reducing gas containing more than 10% by volume of an H2 gas, and at the same time heated from inside the preliminarily molded silica substrate by a discharge-heat melting method with carbon electrodes, thereby making an outer peripheral part of the preliminarily molded silica substrate to a sintered body while an inner peripheral part of the preliminarily molded silica substrate to a fused glass body.

Abstract: A method for producing a silica container includes forming a preliminarily molded substrate, wherein a first powdered raw material is fed to an inner wall of an outer frame having aspiration holes while rotating the outer frame; forming a preliminarily molded intermediate layer, wherein a second powdered raw material added with an aluminum compound or a crystal nucleating agent as an additive is fed to an inner wall of the preliminarily molded substrate; and forming an inner layer, wherein the preliminarily molded substrate and the preliminarily molded intermediate layer are degassed by aspiration from a peripheral side with heating from an inside forming a substrate and an intermediate layer, and a third powdered raw material having a high silica purity is spread from inside the substrate having the formed intermediate layer with heating from the inside forming an inner layer on an inner surface of the intermediate layer.

Abstract: Producing a silica container includes forming a powder mixture by adding an Al compound or a crystal nucleating agent into a first powdered raw material; preliminarily molding to an intended shape by feeding the powder mixture to an inner wall of an outer frame while rotating the outer frame having aspiration holes; forming a silica substrate; and forming a transparent silica glass layer on an inner surface of the silica substrate, wherein the preliminarily molded article is degassed by aspiration from a peripheral side and heated from inside the preliminarily molded article at high temperature making a peripheral part of the preliminarily molded article to a sintered body while an inner part to a fused glass body, and a second powdered raw material having a higher silica purity than the first powdered raw material is spread from inside the silica substrate and heated from the inside at high temperature.

Abstract: A method is provided for producing a silica container arranged with a substrate, having a rotational symmetry, comprised of mainly a silica, and containing gaseous bubbles at least in its peripheral part, and an inner layer, formed on an inner surface of the substrate and comprised of a transparent silica glass; wherein a powdered silica, having particle diameter of 10 to 1000 ?m, containing Ca, Sr, and Ba with the total concentration of 50 to 5000 ppm by weight, and releasing hydrogen molecules with the amount of 3×1016 to 3×1019 molecules/g upon heating at 1000° C. under vacuum, is prepared at least as a powdered raw material for forming the inner layer, and then the inner layer is formed from the powdered silica as the powdered raw material for forming the inner layer.

Abstract: A method of producing a quartz glass crucible for pulling a single crystal comprising: providing a melting mold comprising a wall having passages between outside and inside; providing an outer layer granulation consisting of first coarser SiO2 particles and forming an outer granulation layer from the outer layer granulation on the inside of the melting mold wall; providing a barrier layer granulation consisting of second finer SiO2 particles and forming a barrier granulation layer from the barrier layer granulation on the outer granulation layer; applying a negative pressure to the outside of the melting mold wall; and heating the barrier granulation layer and the outer granulation layer with formation of a quartz glass crucible with transparent inner layer.

Abstract: A method of producing a quartz glass crucible by arc melting a quartz powder molded product loaded on the inner side of a mold while performing vacuum suction, includes initiating the melting of quartz powder from the rim edge of a quartz powder molded product, subsequently lowering the arc electrode or raising the mold to heat and melt the sections on the downside of the rim edge. The method is preferably carried out such that the inner surface of the crucible is sealed within a time corresponding to 10% of the total arc time starting from the initiation of arc melting, and the seal thickness is 3 mm or less. The quartz glass crucible thus produced is useful for the pulling up of silicon single crystals and has a uniform glass layer with fewer internal bubbles.

Abstract: A method of making a silica crucible in a mold cavity of the type in which air is drawing through silica grain placed in the mold cavity. A pure silica grain layer is formed on top of a natural silica grain layer. At least a portion of the purse silica grain layer is fused while substantially no air is drawn through the silica grain. Any remaining pure silica grain and a least a portion of the natural silica grain layer is fused while drawing a substantially higher volume of air through the silica. At least a portion of the fused pure silica grain layer is then sublimated.

Abstract: A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing Si—O defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E? centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C.

Abstract: The disclosed is a method of manufacturing a silica glass crucible for pulling silicon single crystals. In the method, reduced pressure is imparted from the inner surface to the outer surface of a crucible-shaped molded product and the crucible-shaped molded product is arc-fused while rotating the same to form a silica glass crucible with a transparent layer on the inner surface side and a bubble layer on the outer surface side. The inner surface of the wall portion of the silica glass crucible is fused a second time by arc fusion to cause bubbles present in the transparent layer of the inner surface of the wall portion to be displaced toward the bottom portion of the inner surface of the wall portion. The inner surface of the bottom portion of the silica glass crucible is fuse a second time by arc fusion to cause bubbles present in the transparent layer of the inner surface of the bottom portion to be displaced toward the periphery of the inner surface of the bottom portion.

Abstract: The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-earth metals in a concentration of 0.1-3% by wt. each (based on the total mass of SiO2 and dopant). Starting from this, to provide a quartz glass component for use in semiconductor manufacture in an environment with etching action, which component is distinguished by both high purity and high resistance to dry etching and avoids known drawbacks caused by co-doping with aluminum oxide, it is suggested according to the invention that the first dopant should be nitrogen and that the mean content of metastable hydroxyl groups of the quartz glass is less than 30 wtppm.

Abstract: The invention is directed to a method for reducing striae in ultra-low expansion glass, for example, silica-titania glass, by heat-treating the glass at temperatures above 1600° C. for a time in the range of 72-288 hours. The silica-titania glass is formed by substantially simultaneously forming, collecting and consolidating a silica-titania soot formed in one or a plurality of burners using silicon-containing feedstock and a titanium-containing feedstock. In one embodiment of the invention the glass is heat treated without forcing the glass to flow or “move”. The invention was found to reduce the magnitude of striae in an ultra-low expansion glass by at least 50%, and particularly reduces most of the “higher frequency” striae.

Abstract: The invention relates to porous bioglass and to the preparation method thereof. More specifically, the invention relates to a solid, porous crystalline or partially-crystalline composition containing at least SiO2, Ca<SB>O</SB>, Na2O, and P2O5, comprising micropores and macropores. The invention is characterised in that: the pore ratio varies between 50% and 80%, preferably between 60 and 75%, and is measured using the geometric method; the average diameter of the macropores varies between 100 and 1250 micrometers, preferably between 150 and 300 micrometers; the average diameter of the micropores is less than or equal to 5 micrometers; and the compression strength varies between 7 MPa and 70 MPa. The invention also relates to the method of preparing one such composition and to such a composition treated with a physiological liquid having an ionic composition similar to that of human plasma. The invention also relates to an implant which is made from one such composition.

Abstract: A fused silica glass having a composition for use in bulk IR optical applications. The fused silica glass has a OH concentration of less than 5 ppm (parts per million) by weight and an absorbance of less than about 50 ppm/cm at a wavelength of about 1.3 ?m. A method of making the fused silica glass is also described.

Abstract: The invention provides a method to transform large quantities of waste glass into useful ceramic products by a low-cost manufacturing process. The method improves green strength compared to previous methods, and does not require water or any other liquid solvent. Only one firing step is needed with a low peak firing temperature of about 700° C.to about 1000° C. The method conserves energy and natural resources compared to clay-based traditional ceramic manufacturing. High-quality impervious ceramic products can be produced by the invention.

Abstract: The invention relates to a method for manufacturing optical glasses and colored glasses with the aid of a fluid phase sintering process from a basic material encompassing at least SiO.sub.2 powder as well as additives for reducing the temperature of the fluid phase sintering and/or melting process encompassing the following steps: the starting materials are dissolved in any sequence in a fluid medium to produce a solution as far as is possible and a suspension to the extent that they are not dispersed in solution; a greenbody is produced from the dissolved and dispersed starting materials; the greenbody is dried the dried greenbody is fluid-phase sintered at temperatures below 1200° C., in particular in the temperature range from 600° C. to 1200° C.

Abstract: A method for producing ultra-high purity, optical quality, glass articles is disclosed which involves: 1. compacting metaloxide or metalloidoxide to granules having a mean particle size of less than about 1 millimeter; 2. optionally fully sintering the granules to produce high purity, artificial sand; 3. casting the artificial sand by conventional techniques, such as, slip casting, to form a high density, porous, green body; 4. optionally drying and partially sintering the green body; 5. optionally fully sintering the green body under vacuum; and 6. optionally hot isostatic pressing the green body.

Abstract: A method of making a glass composition consisting essentially by mol percent of about 55<SiO2<75; 5<BaO<30; and 2<MgO<22 for use as a matrix of composite materials. A method of making a glass matrix-ceramic particulate composition useful for sealing electrochemical structures, such as solid oxide fuel cells is also disclosed. Method steps include the admixture of finely divided Mg2SiO4 particulates with the matrix glass, to reach an overall composition by mol percent of about 55<SiO2<65; 5<BaO<15; and 25<MgO<35.

Abstract: These glass bodies are light weight porous structures such as a boules of high purity fused silica (HPFS). More specifically, the porous structures are supports for HPFS mirror blanks. Porous glass is made utilizing flame deposition of pure silica or doped silica in a manner similar to the production of high purity fused silica. Bubbles or seeds are formed in the glass during laydown. Finely divided silicon carbide (SiC) particles are used to form the bubbles. At least one layer of porous glass is formed in the boule.

Abstract: Disclosed is a method of making a photonic crystal preform using a pore former in combination with silica particles and a binder to form a paste that can be extruded into a greenware body. The pore former can be removed from the greenware body by heating. The brownware body resulting from the heating step has a high porosity that facilitates the removal of impurities, including OH, during subsequent cleansing and sintering stages. The methods disclosed allow the manufacture of relatively large photonic crystals and are flexible enough to provide a periodic array of channels or passageways as the crystal features.

Abstract: Known is a method of producing a quartz glass crucible in which a crucible base body is provided at least in part with an inner layer in which the formation of cristobalite is induced by using a crystallization promoter. On the basis thereof, in order to provide an inexpensive method of producing a quartz glass crucible with reproducible characteristics for long service lives, it is suggested according to the invention that the crystallization promoter and a reducing substance are introduced into the inner layer.

Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content≦10 ppm, a F wt. % concentration≧0.5 wt. %.

Abstract: Known is a method of producing a quartz glass crucible in which a crucible base body is provided at least in part with an inner layer in which the formation of cristobalite is induced by using a crystallization promoter. On the basis thereof, in order to provide an inexpensive method of producing a quartz glass crucible with reproducible characteristics for long service lives, it is suggested according to the invention that the crystallization promoter and a reducing substance are introduced into the inner layer.

Abstract: A method for forming EUV Lithography straie-free glass structures is disclosed which includes forming a mixture of silica soot. The homogenized mixture is extruded into a flat planar pre-form, and the extruded pre-form is then consolidated by, heating into a substantially full density, substantially striae-free lithography glass substrate structure.

Abstract: The present invention is directed to the preparation of in-situ formation of a series of glass-ceramic composites by the Self-propagating High temperature Synthesis (SHS) technique with advantages of processing simplicity as well as the potential of cost savings. The materials produced by the technique contain crystalline TiB2 phase and have either a pure glassy matrix or a glass matrix with partial devitrification based on the Al2O3—CaO system. The materials can potentially be used for infrared light transmission and for other high temperature applications. These materials can also be produced with relatively high porosity.

Abstract: Methods and apparatus for adding metals such as aluminum to fused silica glass articles are disclosed. The methods and apparatus allow for controlled, low level addition of metals into fused silica glass articles. The fused silica glass articles containing added aluminum exhibit improved internal transmission and decreased absorption change when irradiated with a laser.

Abstract: A method of making a foam glass having a substantially uniform pore size by first providing a substantially homogenous mixture of a milled glass and an activated carbon foaming agent, and then heating said mixture in the presence of oxygen to a temperature sufficient to react said foaming agent with oxygen. Preferably, the mixture is heated to a temperature of between about 700° C. and about 850° C., and more preferably the mixture is heated to a temperature of between but not limited to about 750° C. and about 800° C. The milled glass is preferably provided as waste soda lime glass. Preferably, the carbon foaming agent is milled to a substantially uniform particle size of less than about 400 mesh, more preferably less than about 325 mesh, and more preferably less than about 270 mesh. Preferably, the glass precursor is milled to a substantially uniform particle size of less than about 400 mesh, more preferably less than about 325 mesh, and more preferably less than about 270 mesh.

Abstract: Methods for producing high purity fused silica (HPFS) glass having desired levels of dissolved hydrogen are provided. The methods involve measuring the level of hydrogen in the cavity of the furnace used to produce the glass and controlling the pressure within the furnace and/or gas flows to the furnace's burners so that the measured concentration has a desired value. In this way, the level of dissolved hydrogen in the glass can be controlled since, as shown in FIG. 3, there is a direct correlation between the hydrogen concentration in the cavity atmosphere and level of dissolved hydrogen in the glass.

Abstract: The invention provides optical projection lithography methods, photolithography photomasks, and optical photolithography mask blanks for use in optical photolithography systems utilizing deep ultraviolet light (DUV) wavelengths below 300 nm, such as DUV projection lithography systems utilizing wavelengths in the 248 nm region and the 193 nm region. The invention provides improved production of lithography patterns by inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks.

Abstract: A method of forming foamed articles suitable for refractory, thermal insulation and construction application in a form such as bricks, blocks, slabs and discs includes the preparation of homogeneous mixture of at least one oxygen-containing, water-insoluble raw material having a particle size <200 microns and at least one gas forming reagent having a particle size <130 microns. The mixture is humidified and shaped and then heated to a formation temperature sufficient to melt the raw material to develop an oxygen-containing molten liquid phase. This phase reacts at the formation temperature with the gas-forming reagent to induce a foamed structure which is then cooled to a solid state. The raw materials preferably make up 99-99.95 wt % of the mixture, and the gas forming reagent makes up the balance.

Abstract: Known is a method of producing a quartz glass crucible in which a crucible base body is provided at least in part with an inner layer in which the formation of cristobalite is induced by using a crystallization promoter. On the basis thereof, in order to provide an inexpensive method of producing a quartz glass crucible with reproducible characteristics for long service lives, it is suggested according to the invention that the crystallization promoter and a reducing substance are introduced into the inner layer.

Abstract: An opaque silica glass article comprising a transparent portion and an opaque portion, wherein the opaque portion has an apparent density of 1.70-2.15 g/cm3 and contains 5×104-5×106 bubbles per cm3, said bubbles having an average diameter of 10-100 &mgr;m; and the transparent portion has an apparent density of 2.19-2.21 g/cm3 and the amount of bubbles having a diameter of at least 100 &mgr;m in the transparent portion is not more than 1×103 per cm3.

Abstract: An object of the present invention is to provide a quartz glass body, especially a quartz glass jig for plasma reaction in producing semiconductors having excellent resistance against plasma corrosion, particularly, excellent corrosion resistance against F-based gaseous plasma; and a method for producing the same. A body made of quartz glass containing a metallic element and having an improved resistance against plasma corrosion is provided that contains bubbles and crystalline phase at an amount expressed by projected area of less than 100 mm2 per 100 cm3.

Abstract: An opaque silica glass article comprising a transparent portion and an opaque portion, wherein the opaque portion has an apparent density of 1.70-2.15 g/cm3 and contains 5×104-5×106 bubbles per cm3, said bubbles having an average diameter of 10-100 &mgr;m; and the transparent portion has an apparent density of 2.19-2.21 g/cm3 and the amount of bubbles having a diameter of at least 100 &mgr;m in the transparent portion is not more than 1×103 per cm. The opaque silica glass article is made by a process wherein a mold is charged with a raw material for forming the opaque portion, which is a mixture comprising a silica powder with a small amount of a silicon nitride powder, and a raw material for forming the transparent portion so that the two raw materials are located in the positions corresponding to the opaque and the transparent portions, respectively, of the silica glass article to be produced; and the raw materials are heated in vacuo to be thereby vitrified.

Abstract: Based on a known process for the manufacture of opaque quartz glass, by mixing SiO2 particles and an additive which is volatile at a melting temperature, forming a body and melting said body with an advancing melt front forming in the body, it is proposed according to the invention that in order to reduce the danger of contamination, a body (1) be formed with an inner bore (6) and be heated in such a manner that the melt front (10) advances from the inner bore (6) to the outside. The article of pure opaque quartz glass according to the invention has high resistance to temperature change, high mechanical strength and good chemical durability. It is distinguished by an opening (6) enclosed by an inner wall (9), with an inner SiO2 surface layer (15) having a layer thickness ranging from 30 mm to 500 mm and a density of at least 2.15 g/cm3.

Abstract: A number of unique processes are disclosed for manufacture of sintered high-purity quartz glass products in which a shaped silica body or preform is made from an aqueous slurry of micronized silica particles by gel casting, slip casting or electrophoretic deposition. The silica particles may comprise a major portion by weight of crystalline silica. In one embodiment of the invention the sintered quartz glass is transparent, substantially bubble-free and suitable for scientific or optical uses. In another embodiment the porous silica preform is fired in steam to increase the hydroxyl content and then nitrided in a nitrogen-hydrogen reducing atmosphere. A minute amount of chemically-combined nitrogen in the high-purity quartz glass is sufficient to provide a tremendous improvement in physical properties and an incredible increase in the resistance to devitrification.

Abstract: There is a provided a method for fabricating a grating pattern, including the steps of: coating an SOG solution on a glass substrate by spin coating method; heat-treating the SOG thin film coated on the glass substrate, to form a silicon oxide layer; coating a photoresist on the silicon oxide layer and exposing the photoresist layer by masking process; developing the exposed photoresist layer and wet-etching the silicon oxide layer; and developing the photoresist layer used as a mask. According to the present invention, the grating pattern can be fabricated without etching the glass substrate, and high-quality products at a low cost is accomplished since the present invention does not require the expensive sputtering apparatus. Furthermore, the step-shape oxide layer pattern can be obtained through one-time wet etching since the multilevel oxide layer is easily formed.

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract: A composite material has a quartz glass phase and a complex compound phase compounded with the quartz glass phase, which is made of one or more compounds selected from a group of silicon carbide, silicon nitride, silicon, titanium nitride and titanium carbide, as a main ingredient. The composite material can be used instead of quartz glass, and can prevent the generations of microcrack, tipping and particles after the mechanical working.

Abstract: An improved photorecording medium suitable for use in holographic storage systems contains a glassy hybrid inorganic-organic, three dimensional matrix, in which is distributed a photoimageable system comprising one or more photoactive, organic monomers. The medium is fabricated by providing a precursor of the hybrid inorganic-organic matrix, mixing the matrix precursor with the photoimageable system, and curing the matrix precursor to form the matrix in situ. The matrix and photoimageable system exhibit independent chemistries, such that the step of matrix formation does not substantially affect the photoimageable system. The hybrid matrix precursor is typically an oligomer derived from a compound represented by RnM(OR′)4−n, where M is a metallic element having a valence of three or higher, such as silicon, titanium, germanium, zirconium, vanadium, or aluminum, R is an alkyl or aryl, R′ is a lower alkyl, and n ranges from 1 to 2.

Abstract: A silica body useful for forming an optical fiber preform exhibits an ultimate strength of at least 20 MPa at 10 wt. % water loss. The body attains this strength, it is believed, by precipitation of silica at the contact sites of adjacent silica particles, thereby forming neck regions. The resultant network provides the strength to the gel body, such that the body is capable of being dried under more severe conditions than a gel body formed by previous sol-gel methods and is also more robust toward handling. The controlled precipitation is attained by inducing gelation and initiating drying at a pH of about 10.5 or higher, at which silica remains highly soluble. By gelling and drying at this pH level, the solubilized silica appears to precipitate in a controlled manner at the point of contact of adjacent silica particles, since such sites are the minimum free energy sites for precipitation.