Material Deposition Or Application (e.g., Spraying, Coating) Patents (Class 700/123)
  • Patent number: 6363292
    Abstract: A universal track interface stores a plurality of pre-defined track types for automatically configuring the interface according to the required timing, electrical and hardware configuration for a plurality of different tracks used in semiconductor processing operations. To interface a pump to a track, a predefined track type, comprising interface parameters stored in a track table, is accessed by a microprocessor and used to generate control signals for configuring the interface. An operator input device allows custom interfaces to be defined and stored in the table for use as needed to interface either to non-standard tracks or to vary this track interface according to processing requirements.
    Type: Grant
    Filed: April 14, 1998
    Date of Patent: March 26, 2002
    Assignee: Mykrolis
    Inventor: Robert F. McLoughlin
  • Publication number: 20020019680
    Abstract: The present invention relates to a control method for improving the productivity of a screen printer for an electronics-mounting machine. Thus, a screen printer according to this invention uses a recognition camera to inspect the results of printing of a circuit board concurrently with a cleaning operation of the rear surface of a screen, thereby enabling the effective use of time. This screen printer also enables cream solder to be automatically supplied to reduce the operation time by determining whether the next screen to be used is unused. During automatic screen replacement, this screen printer enables a desired screen stored in the corresponding stocker to be automatically specified in order to replace the current screen in response to a selected NC program.
    Type: Application
    Filed: January 22, 2001
    Publication date: February 14, 2002
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Noboru Nishikawa, Akihiko Wachi, Hiroyoshi Saito
  • Patent number: 6347257
    Abstract: A method, system and apparatus for forming a three-dimensional object on a layer-by-layer basis involves forming a portion of the three-dimensional object using selective deposition modeling (SDM). SDM involves using at least one orifice, such as a jet, which dispenses a droplet of a flowable material that solidifies upon being dispensed. A drop volume capability of each orifice is adjusted until substantially all orifices have a uniform drop volume capability and all dispensed droplets of the flowable material have a uniform volume.
    Type: Grant
    Filed: February 25, 1999
    Date of Patent: February 12, 2002
    Assignee: 3D Systems, Inc.
    Inventors: Bryan J. L. Bedal, Loc V. Bui
  • Publication number: 20010049568
    Abstract: The invention relates to an apparatus for producing products and a method of controlling such an apparatus, having a programmable logic controller—PLC—an axis control system, for controlling axes, and a visualization system for displaying processes and/or process parameters. In known apparatus of this type, the PLC, the axis control system and the visualization system are implemented in physically self-contained appliances. Linking these components requires a great deal of effort both during construction and during operation of the apparatus. The data interchange between the components requires an “overhead” in order to ensure the communication between the components. This is disadvantageous. The invention therefore seeks to improve such manufacturing apparatus and control methods in that the PLC, the axis control system and the visualization system run on a common physical appliance.
    Type: Application
    Filed: May 3, 2001
    Publication date: December 6, 2001
    Inventors: Heinz Focke, Stephan Schroter, Denis Murnikow
  • Patent number: 6327555
    Abstract: Impurity profiles Pi1 and Ps1 are determined for the same conditions by a reference acquiring means and a simulation capable of producing a result faster than the reference acquiring means, respectively. Errors between the impurity profile Pi1 determined by the reference acquiring means and the impurity profile Ps1 determined by the simulation are determined. An impurity profile Psx is calculated for another kind of conditions by the simulation, and a new impurity profile Psx′ is calculated by correcting the impurity profile Psx so as to reflect the errors.
    Type: Grant
    Filed: April 27, 1999
    Date of Patent: December 4, 2001
    Assignee: Sony Corporation
    Inventors: Shunkichi Shimizu, Mikio Mukai, Yasutoshi Komatsu
  • Publication number: 20010027352
    Abstract: An object of the present invention is to provide a control apparatus for a robot in which the work efficiency is improved in the whole robot peripheral system including the robot, and in which considering the increase in the consciousness of safety such as the standardization of safety apparatuses, both the reliability of the safety circuit of the control apparatus for a robot and the ensuring of the safety are improved.
    Type: Application
    Filed: April 2, 2001
    Publication date: October 4, 2001
    Inventors: Kunitoshi Morita, Kei Aimi, Masahiro Ohto, Kazunori Matsumoto, Takashi Nakatsuka
  • Patent number: 6253116
    Abstract: A method and apparatus for forming three-dimensional patterns by depositing a crystalloid material onto substrate in a layer by layer fashion. The apparatus includes a computer responsive for controlling the material depositing rate and the three-dimensional relative movement between the depositing head and the substrate. The controlling information comes from the sliced CAD model of the part. For each cross-section, the depositing head plots the boundary and the interior while the building material comes out of the head. The crystalloid material deposited on the substrate or previous layer of the part rapidly freezes forming a new layer of the part. The material can be deposited by a continuous extruding device or a drop-on-demand device. Where necessary, support structure is built in the same way but with material of a different melting point.
    Type: Grant
    Filed: August 4, 1998
    Date of Patent: June 26, 2001
    Assignee: New Jersey Institute of Technology
    Inventors: Wei Zhang, Ming C. Leu, Zhiming Ji, Yongnian Yan
  • Patent number: 6169933
    Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.
    Type: Grant
    Filed: April 23, 1998
    Date of Patent: January 2, 2001
    Assignee: Sandia Corporation
    Inventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
  • Patent number: 6151532
    Abstract: The invention provides a method for predicting a process surface profile that a given plasma process will create on a process substrate. The prediction is based on a test surface profile, the experimental outcome of a test process which is in general different from the plasma process of interest. In another aspect, the invention provides a technique for defining a plasma process that will produce a desired surface profile. Thus, in related aspects, the invention also provides apparatus for predicting a process surface profile and determining process values, a method of configuring a plasma reactor, a method of making semiconductor devices requiring limited empirical calibration, and a device made according to the method.
    Type: Grant
    Filed: March 3, 1998
    Date of Patent: November 21, 2000
    Assignee: Lam Research Corporation
    Inventors: Maria E. Barone, Richard A. Gottscho, Vahid Vahedi
  • Patent number: 6144894
    Abstract: A method for controlling the output power of the magnetron generator, where the method and apparatus defines an ignition power level that ensures that the magnetron generator provides a minimal level of power that will ignite the plasma and not result in a detrimental impedance mismatch between the magnetron and an applicator of a remote plasma source. When the user of the wafer processing system requests a power level (i.e., a requested power level) that is below this ignition level, the ignition level is used to ignite the plasma and the output power of the magnetron is gradually decreased to the requested power level. The decrease is performed within a predetermined time period.
    Type: Grant
    Filed: February 13, 1998
    Date of Patent: November 7, 2000
    Assignee: Applied Materials, Inc.
    Inventor: Tam Nguyen
  • Patent number: 6122564
    Abstract: Repetitive, laser-mediated cladding is used to accumulate the build-up of material on a substrate. The apparatus and methods of use are particularly useful in fabricating metal parts through as might be required for small volume manufacturing, prototype runs, and the like. The laser is used to locally heat a spot on a substrate, forming a melt pool into which material, preferably in powder form, is fed so as to create a deposit having a physical dimension. Optical detection means coupled to an optoelectric sensor are used to monitor a physical dimension of the deposit, and a feedback controller is operative to adjust the laser in accordance with the electrical signal, thereby controlling the rate of material deposition.
    Type: Grant
    Filed: June 30, 1998
    Date of Patent: September 19, 2000
    Inventors: Justin Koch, Jyoti Mazumder
  • Patent number: 6064919
    Abstract: The painting equipment controller controls automotive painting equipment so that desired painting attributes can be achieved. A database is used for storing mathematical models which interrelate painting factors with painting responses. The painting factors include the control settings of the painting equipment. The painting responses include such painting attributes as the appearance of the paint and application attributes of the paint. A database engine determines the values for the painting responses based upon the model and upon initially selected painting factor values. A cooptimizer uses the output of database engine to determine a second set of values for the painting factors which achieve the desired painting attributes. Thereupon, the painting equipment is controlled based upon the painting factor values as determined by the cooptimizer.
    Type: Grant
    Filed: March 24, 1997
    Date of Patent: May 16, 2000
    Assignee: BASF Corporation
    Inventor: Kevin Slusarczyk
  • Patent number: 6028986
    Abstract: High speed integrated circuits are designed and fabricated by taking into account the capacitive loading on the integrated circuit by the integrated circuit potting material. Line drivers may be sized to drive conductive lines as capacitively loaded by the potting material. Repeaters may be provided along long lines, to drive the lines as capacitively loaded by the potting material. Intelligent drivers may sense the load due to the potting material and drive the lines as capacitively loaded by the potting material. The thickness of the passivating layer on the outer conductive lines may also be increased so as to prevent the potting material from extending between the conductive lines. High speed potted integrated circuits may thereby be provided.
    Type: Grant
    Filed: March 31, 1998
    Date of Patent: February 22, 2000
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Minkyu Song