Scanning Near-field Optical Microscopy [snom] Combined With Atomic Force Microscopy [afm] (epo) Patents (Class 850/24)
  • Patent number: 9423416
    Abstract: Provided is a scanning probe microscope that takes measurements at high spatial resolution on physical information such as array structure of water molecules at a specimen-culture fluid interface in a culture fluid as well as irregularities of the surface of a specimen and composition distribution and array structure of molecules, proteins, etc. even in the atmosphere, an ambient air, vacuum, among others. The scanning probe microscope includes: a probing needle (1); a specimen holder (11) in which a specimen (3) is mounted; an oscillator (2) that produces a periodic oscillation to change the probing needle position; a pulse oscillation type laser light source (27, 28) that emits light toward a spot, which is put under measurement by the probing needle, on the specimen; a detector (25) that measures intensity of output light which is output from the specimen by energy spectroscopy; and a control device (26).
    Type: Grant
    Filed: August 28, 2012
    Date of Patent: August 23, 2016
    Assignee: Hitachi, Ltd.
    Inventors: Akira Nambu, Tsuyoshi Yamamoto, Hideaki Koizumi, Tomihiro Hashizume, Seiji Heike
  • Patent number: 9093246
    Abstract: An SACP method includes directing a beam of charged particles onto an object surface of an object using a particle optical system, and detecting intensities of particles emanating from the object. The method further includes: (a1) adjusting an excitation of the second beam deflector for adjusting an impingement location of the beam on the object surface; (a2) adjusting an excitation of the first beam deflector for adjusting an angle of incidence of the beam on the object surface without changing the impingement location and detecting the intensity; and (a3) repeating the adjusting of the excitation of the first beam deflector for adjusting the angle of incidence without changing the impingement location such that a corresponding intensity is detected for each of at least 100 different angles of incidence at the same impingement location.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: July 28, 2015
    Assignee: Carl Zeiss Microscopy GmbH
    Inventor: Dirk Preikszas
  • Patent number: 8904561
    Abstract: An atomic force microscope based apparatus and method for detecting Raman effect on a sample of interest utilizes first and second electromagnetic sources to emit first electromagnetic radiation of frequency Vi and second electromagnetic radiation of frequency V2 onto a probe tip, which is coupled to a structure that can oscillate the probe tip. The frequency Vi and the frequency v2 are selected to induce Raman effect on a sample engaged by the probe tip that results in Raman force interactions between the probe tip and the sample. Oscillations of the probe tip due to the Raman force interactions are then measured.
    Type: Grant
    Filed: July 2, 2012
    Date of Patent: December 2, 2014
    Inventor: H. Kumar Wickramasinghe
  • Patent number: 8713710
    Abstract: To detect both of near-field light and magnetic field generated by a thermal assist type magnetic head and to perform inspection of the head, a cantilever of a scanning probe microscope has a lever in which a probe is formed, a thin magnetic film formed on a surface of the probe, and fine particles or thin film of noble metal or an alloy including noble metal formed on a surface of the magnetic film. An inspection apparatus has the cantilever, a displacement detection unit to detect vibration of the cantilever, a near-field light detection unit to detect scattered light caused by near-field light generated from a near-field light emitter and enhanced on the surface of the probe of the cantilever, and a processing unit to process signals obtained by detection with the displacement detection unit and the near-field light detection unit.
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: April 29, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kaifeng Zhang, Takenori Hirose, Masahiro Watanabe, Tsuneo Nakagomi, Shinji Honma, Teruaki Tokutomi, Toshihiko Nakata, Takehiro Tatizaki
  • Patent number: 8695110
    Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
    Type: Grant
    Filed: August 15, 2012
    Date of Patent: April 8, 2014
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Motoyuki Hirooka
  • Patent number: 8635710
    Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.
    Type: Grant
    Filed: April 13, 2012
    Date of Patent: January 21, 2014
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
  • Patent number: 8606426
    Abstract: A system includes a displacement sensor, an actuator connected to the displacement sensor, and a feedback unit. The displacement sensor is configured to measure at least one of a relative position and a relative orientation between the displacement sensor and the target object. The feedback unit receives a signal from the displacement sensor related to the measured relative position or relative orientation and controls the actuator to move the displacement sensor on the basis of variations in the received signal arising due to a change in environmental conditions.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: December 10, 2013
    Assignee: Academia Sinica
    Inventors: Ing-Shouh Hwang, En-Te Hwu, Hans Ulrich Danzebrink, Hartmut Illers
  • Patent number: 8407811
    Abstract: In a scanning probe microscope, a nanotube and metal nano-particles are combined together to configure a plasmon-enhanced near-field probe having an optical resolution on the order of nanometers as a measuring probe in which a metal structure is embedded, and this plasmon-enhanced near-field probe is installed in a highly-efficient plasmon exciting unit to repeat approaching to and retracting from each measuring point on a sample with a low contact force, so that optical information and profile information of the surface of the sample are measured with a resolution on the order of nanometers, a high S/N ratio, and high reproducibility without damaging both of the probe and the sample.
    Type: Grant
    Filed: February 25, 2010
    Date of Patent: March 26, 2013
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Motoyuki Hirooka
  • Patent number: 8272068
    Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
    Type: Grant
    Filed: February 26, 2008
    Date of Patent: September 18, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Motoyuki Hirooka
  • Publication number: 20120204297
    Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.
    Type: Application
    Filed: April 13, 2012
    Publication date: August 9, 2012
    Applicant: Hitachi, Ltd.
    Inventors: Toshihiko NAKATA, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
  • Patent number: 8181268
    Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.
    Type: Grant
    Filed: December 18, 2008
    Date of Patent: May 15, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
  • Patent number: 8108943
    Abstract: There is provided in one embodiment of the invention a method for analyzing a sample material using surface enhanced spectroscopy. The method comprises the steps of imaging the sample material with an atomic force microscope (AFM) to select an area of interest for analysis, depositing nanoparticles onto the area of interest with an AFM tip, illuminating the deposited nanoparticles with a spectrometer excitation beam, and disengaging the AFM tip and acquiring a localized surface enhanced spectrum. The method may further comprise the step of using the AFM tip to modulate the spectrometer excitation beam above the deposited nanoparticles to obtain improved sensitivity data and higher spatial resolution data from the sample material. The invention further comprises in one embodiment a system for analyzing a sample material using surface enhanced spectroscopy.
    Type: Grant
    Filed: November 26, 2008
    Date of Patent: January 31, 2012
    Assignee: California Institute of Technology
    Inventor: Mark S. Anderson
  • Publication number: 20100055349
    Abstract: The present invention is a method for localized chemical vapor deposition (CVD) for localized growing for example for carbon nanotubes (CNT), nanowires, and oxidation using a heated tip or an array of heated tips to locally heat the area of interest. As the tips moved, material such as CNTs grows in the direction of movement. The Scanning Probe Growth (SPG) or nanoCVD technique has similarities to the CVD growth; however it allows for controlled synthesis and direction and eliminates the need for masks.
    Type: Application
    Filed: May 11, 2009
    Publication date: March 4, 2010
    Inventors: Angelo Gaitas, Bhaskar Mitra, Amar Basu, Weibin Zhu
  • Patent number: 7597717
    Abstract: A scanning probe microscopy head may include a base portion, cantilevers coupled to the base portion, and at least one tip coupled to each of the cantilevers. At least two of the cantilevers and associated tips may be configured to perform a different scanning probe microscopy technique. The cantilevers may be positioned perpendicular to the base portion and may be coupled to the perimeter of the base portion. The base portion may include circuitry coupled thereto for providing electricity to the tips. The cantilevers may each be placed into a recessed slot along the perimeter of the base and secured to the base by a securing mechanism, such as a spring clip. The cantilevers may be operatively coupled to a linear positioner, such as a piezoelectric motor, coupled to the perimeter of the base for controlling the amount of protrusion of the cantilevers from the perimeter of the base.
    Type: Grant
    Filed: June 25, 2007
    Date of Patent: October 6, 2009
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Ryan P. Lu, Stephen D. Russell, Ayax D. Ramirez