Adhesion Force Microscopy (epo) Patents (Class 850/35)
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Patent number: 8997261Abstract: The invention relates to processes for the modification of surfaces and on processes for the measurement of adhesion forces and of different forces of interaction (friction forces, adhesion forces) by scanning probe microscopy functioning in continuous <<curvilinear>> mode, as well as to a scanning probe microscope and a device permitting the implementation of said processes.Type: GrantFiled: May 5, 2011Date of Patent: March 31, 2015Assignees: Centre National de la Recherche Scientifique-CNRS, Universite du Maine (Le Mans)Inventors: Olivier Noel, Pierre-Emmanuel Mazeran, Hussein Nasrallah
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Patent number: 8844061Abstract: In the case of measuring a pattern having a steep side wall, a probe adheres to the side wall by the van der Waals forces acting between the probe and the side wall when approaching the pattern side wall, and an error occurs in a measured profile of the side wall portion. When a pattern having a groove width almost equal to a probe diameter is measured, the probe adheres to both side walls, the probe cannot reach the groove bottom, and the groove depth cannot be measured. When the probe adheres to a pattern side wall in measurements of a microscopic high-aspect ratio pattern using an elongated probe, the probe is caused to reach the side wall bottom by detecting the adhesion of the probe to the pattern side wall, and temporarily increasing a contact force between the probe and the sample. Also, by obtaining the data of the amount of torsion of a cantilever with the shape data of the pattern, a profile error of the side wall portion by the adhesion is corrected by the obtained data of the amount of torsion.Type: GrantFiled: December 26, 2012Date of Patent: September 23, 2014Assignee: HITACHI, Ltd.Inventors: Shuichi Baba, Masahiro Watanabe, Toshihiko Nakata, Yukio Kembo, Toru Kurenuma, Takafumi Morimoto, Manabu Edamura, Satoshi Sekino
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Patent number: 8479309Abstract: Provided are methods and systems for high resolution imaging of a material immersed in liquid by scanning probe microscopy. The methods further relate to imaging a material submersed in liquid by tapping mode atomic force microscopy (AFM), wherein the AFM has a microfabricated AFM probe comprising a nanoneedle probe connected to a cantilever beam. The nanoneedle probe is immersed in the liquid, and the rest of the AFM probe, including the cantilever beam to which the nanoneedle probe is attached, remains outside the liquid. The cantilever is oscillated and the nanoneedle probe tip taps the material to image the material immersed in liquid. In an aspect, the material is supported on a shaped substrate to provide a spatially-varying immersion depth with specially defined regions for imaging by any of the methods and systems of the present invention.Type: GrantFiled: April 28, 2011Date of Patent: July 2, 2013Assignee: The Board of Trustees of the University of IllinoisInventors: Min-Feng Yu, Majid Minary-Jolandan
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Patent number: 8342008Abstract: In the case of measuring a pattern having a steep side wall, a probe adheres to the side wall by the van der Waals forces acting between the probe and the side wall when approaching the pattern side wall, and an error occurs in a measured profile of the side wall portion. When a pattern having a groove width almost equal to a probe diameter is measured, the probe adheres to both side walls, the probe cannot reach the groove bottom, and the groove depth cannot be measured. When the probe adheres to a pattern side wall in measurements of a microscopic high-aspect ratio pattern using an elongated probe, the probe is caused to reach the side wall bottom by detecting the adhesion of the probe to the pattern side wall, and temporarily increasing a contact force between the probe and the sample. Also, by obtaining the data of the amount of torsion of a cantilever with the shape data of the pattern, a profile error of the side wall portion by the adhesion is corrected by the obtained data of the amount of torsion.Type: GrantFiled: August 7, 2008Date of Patent: January 1, 2013Assignee: Hitachi, Ltd.Inventors: Shuichi Baba, Masahiro Watanabe, Toshihiko Nakata, Yukio Kembo, Toru Kurenuma, Takafumi Morimoto, Manabu Edamura, Satoshi Sekino
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Patent number: 8122761Abstract: A microcantilever sensor includes a supporting substrate, a cantilever spring element at least partially disposed over the support substrate, a probe layer disposed over the first side of the cantilever spring element, and a piezoresistive transducer attached to the second side of the cantilever spring element. The cantilever spring element is characterized by having a first side and a second side and comprising a polymer having a Young's modulus less than about 100 Gpa. Sensing systems that incorporate the cantilever sensor of the invention include a detector in communication with the piezoresistive transducer to provide measurements of surface strain changes in the piezoresistive transducer.Type: GrantFiled: January 20, 2006Date of Patent: February 28, 2012Assignee: Wayne State UniversityInventor: Yong Xu
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Patent number: 7631548Abstract: With a scanning probe microscope, if a plurality of sample properties are measured using a scanning scheme of allowing a probe to approach and withdraw from a sample, the sample properties need to be accurately and reliably detected in the minimum required measurement time. Further, the acting force between the probe and the sample varies depending on the type of the probe and the wear condition of a probe tip. Thus, disadvantageously, property values acquired using different probes cannot be compared with one another unless the artifactual effect of the measuring probes are eliminated. In accordance with the present invention, with a scanning probe microscope, the probe is brought into intermittent contact with the sample, while driving means repeatedly allows the probe to approach and withdraw from the sample with a variable amplitude. The sample property is thus acquired at a high speed.Type: GrantFiled: April 20, 2007Date of Patent: December 15, 2009Assignee: Hitachi, Ltd.Inventors: Shuichi Baba, Masahiro Watanabe, Toshihiko Nakata, Toru Kurenuma, Hiroshi Kuroda, Takafumi Morimoto, Yukio Kembo, Manabu Edamura