Reduction Of Pressure Patents (Class 95/203)
  • Patent number: 10710020
    Abstract: Solvent absorption processes for separating components of an impure feed gas are disclosed. The processes involve two stages of gas purification. The acid gases including hydrogen sulfide, carbon dioxide and other sulfur compounds are simultaneously removed from the feed gas by contact with a physical solvent in two stages. The subject matter disclosed provides improved processes to reduce the operating costs of the system.
    Type: Grant
    Filed: June 13, 2018
    Date of Patent: July 14, 2020
    Inventor: Xiaoming Wen
  • Publication number: 20150068399
    Abstract: A device evacuates a chamber and purifies the gas extracted from said chamber of any foreign substances. The device comprises a dry-condensing vacuum pump having an input connected to the chamber to be evacuated and is suitable for maintaining the input pressure at a constant level at the output despite variable conditions. An intermediate line which connects to the output of the dry-condensing vacuum pump and a liquid ring vacuum pump, the input of which is connected to the intermediate line, are additionally provided. A corresponding method makes it possible to purify the gas of any foreign substances reliably and effectively.
    Type: Application
    Filed: December 12, 2012
    Publication date: March 12, 2015
    Inventors: Heiner Kösters, Uwe Gottschlich
  • Publication number: 20140366728
    Abstract: The invention relates to a process and an apparatus for separating metal carbonyls from a gas mixture (1) by gas scrubbing with a physically acting scrubbing medium (6), where scrubbing medium (8) loaded with metal carbonyls in the scrub (W) is regenerated and is subsequently reused for separating off metal carbonyls. The invention is characterized in that in order to regenerate the loaded scrubbing medium (8) materials dissolved in the scrubbing medium are separated off only to the extent necessary for removal of the metal carbonyls.
    Type: Application
    Filed: June 18, 2014
    Publication date: December 18, 2014
    Applicant: LINDE AKTIENGESELLSCHAFT
    Inventors: Ulvi KERESTECIOGLU, Thomas HABERLE
  • Patent number: 8623123
    Abstract: CO2 is absorbed from a gas mixture by bringing the gas mixture into contact with an absorbent that comprises water and at least one amine of the formula (I), wherein R1 and R2, independently of each other, are hydrogen or an alkyl group. According to the invention, absorption media comprise sulfolane or an ionic liquid in addition to water and an amine of the formula (I). A device according to the invention for removing CO2 from a gas mixture comprises an absorption unit, a desorption unit, and an absorption medium according to the invention that is conducted in the circuit.
    Type: Grant
    Filed: June 4, 2013
    Date of Patent: January 7, 2014
    Assignee: Evonik Degussa GmbH
    Inventors: Matthias Seiler, Jöm Rolker, Rolf Schneider, Bernd Glöckler, Axel Kobus, Wolfgang Benesch, Thomas Riethmann, Hermann Winkler, Jens Reich, Helmut Brüggemann
  • Patent number: 8500892
    Abstract: CO2 is absorbed from a gas mixture by bringing the gas mixture into contact with an absorbent that comprises water and at least one amine of the formula (I), wherein R1 and R2, independently of each other, are hydrogen or an alkyl group. According to the invention, absorption media comprise sulfolane or an ionic liquid in addition to water and an amine of the formula (I). A device according to the invention for removing CO2 from a gas mixture comprises an absorption unit, a desorption unit, and an absorption medium according to the invention that is conducted in the circuit.
    Type: Grant
    Filed: January 29, 2010
    Date of Patent: August 6, 2013
    Assignee: Evonik Degussa GmbH
    Inventors: Matthias Seiler, Jörn Rolker, Rolf Schneider, Bernd Glöckler, Axel Kobus, Wolfgang Benesch, Thomas Riethmann, Hermann Winkler, Jens Reich, Helmut Brüggemann
  • Patent number: 8500867
    Abstract: CO2 is absorbed from a gas mixture by bringing the gas mixture into contact with an absorbent that comprises water and at least one amine of the formula (I), wherein R1 and R2, independently of each other, are hydrogen or an alkyl group. According to the invention, absorption media comprise sulfolane or an ionic liquid in addition to water and an amine of the formula (1). A device according to the invention for removing CO2 from a gas mixture comprises an absorption unit, a desorption unit, and an absorption medium according to the invention that is conducted in the circuit.
    Type: Grant
    Filed: August 19, 2012
    Date of Patent: August 6, 2013
    Assignee: Evonik Degussa GmbH
    Inventors: Matthias Seiler, Jörn Rolker, Rolf Schneider, Bernd Glöckler, Axel Kobus, Wolfgang Benesch, Thomas Riethmann, Hermann Winkler, Jens Reich, Helmut Brüggemann
  • Patent number: 8282899
    Abstract: Solvent absorption processes for separating components of an impure feed gas are disclosed. The processes involve two stages of gas-liquid contacting, namely a first, absorption stage and a second, stripping stage. In the case of a carbon dioxide (CO2)-containing methane gas as an impure feed gas, contacting, in the stripping stage, the solvent effluent from the absorption stage with a recycled vapor fraction of the solvent effluent from the stripping stage can improve the recovery and purity of not only the methane (and/or other light hydrocarbons in the impure feed gas), but also that of the CO2 contaminant gas.
    Type: Grant
    Filed: August 31, 2011
    Date of Patent: October 9, 2012
    Assignee: UOP LLC
    Inventors: David A. Bahr, Lamar A. Davis
  • Publication number: 20120017762
    Abstract: CO2 is absorbed from a gas mixture by bringing the gas mixture into contact with an absorbent that comprises water and at least one amine of the formula (I), wherein R1 and R2, independently of each other, are hydrogen or an alkyl group. According to the invention, absorption media comprise sulfolane or an ionic liquid in addition to water and an amine of the formula (I). A device according to the invention for removing CO2 from a gas mixture comprises an absorption unit, a desorption unit, and an absorption medium according to the invention that is conducted in the circuit.
    Type: Application
    Filed: January 29, 2010
    Publication date: January 26, 2012
    Applicant: Evonik Degussa GmbH
    Inventors: Matthias Seiler, Jörn Rolker, Rolf Schneider, Bernd Glöckler, Axel Kobus, Wolfgang Benesch, Thomas Riethmann, Hermann Winkler, Jens Reich, Helmut Brüggemann
  • Publication number: 20110015456
    Abstract: A gas treatment system for hydrocarbon upgradation comprising a water flooded screw type compressor to receive and discharge water and gas to be treated, a scrubber to receive a gas discharged from the compressors and scrubbing water, a stripper/flasher to receive water and gas discharged from the scrubber and recycle the water for use by one or both compressor and scrubber and a recovery system for the gas from scrubber.
    Type: Application
    Filed: February 19, 2009
    Publication date: January 20, 2011
    Inventor: John Stephen Broadbent
  • Patent number: 7811361
    Abstract: One exemplary embodiment can be a process for increasing an efficiency of an acid gas removal zone. The process can include sending a sour gas stream including at least one gas to a first absorber providing an overhead stream absorbing the at least one gas; withdrawing a side-stream from the first absorber and passing the side-stream through a holding tank, a side-stream fluid transfer device, and a side-stream chiller before returning the side-stream to the absorber; and passing the first absorber overhead stream to a pump-around circuit for a second absorber. Usually, the pump-around circuit may include a flash drum, a pump-around fluid transfer device and a pump-around chiller before providing a slipstream to the first absorber and another portion to the second absorber.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: October 12, 2010
    Assignee: UOP LLC
    Inventors: William J. Lechnick, Lamar A. Davis, David Alden Bahr, Carla F. Roberts
  • Publication number: 20100089238
    Abstract: Method for the dissolution of a gas in an input gas flow, in which a soaked solid comprising a porous substrate comprising pores each having a size less than 100 nanometres (nm) and each containing a solvent of the gas, is swept with the input gas flow comprising at least the gas.
    Type: Application
    Filed: December 5, 2008
    Publication date: April 15, 2010
    Applicant: Centre National de la Recherche Scientifique
    Inventors: Sylvain Miachon, Sylvie Lemeulle, Mae Miachon-Lemeulle, Telio Miachon-Lemeulle, Marc Pera Titus, Volaniaina Rakotovao, Jean-Alain Dalmon
  • Patent number: 7309382
    Abstract: The gas to be processed, flowing in through line 10, contains impurities. This gas is contacted in column C1 with a solvent flowing in through line 18. The scrubbed gas is discharged through line 19. The impurity-laden solvent recovered through line 12 is regenerated by expansion, then by distillation in column C2. The invention proposes carrying out expansion by means of two-phase turbines T1 and T2.
    Type: Grant
    Filed: October 1, 2004
    Date of Patent: December 18, 2007
    Assignee: Institut Francais du Petrole
    Inventors: Renaud Cadours, Yves Charron, Fabrice Lecomte
  • Patent number: 6989047
    Abstract: The invention relates to a process for the absorptive separation of NH3 and CH4 from a gas under high pressure, which at least contains NH3, H2, N2 and CH4, using a high-boiling, physically acting and regenerable solvent which contains homologues of alkylene glycol-alkyl-ether and which also may contain water, the absorbed components NH3, H2, N2 and CH4 being separated from the laden solvent in at least two further process steps at different pressure rates, thereby withdrawing at least one NH3-rich and at least one CH4-rich gas fraction from the solvent. This process is particularly suitable to be incorporated as unit in an ammonia production plant.
    Type: Grant
    Filed: April 5, 2002
    Date of Patent: January 24, 2006
    Assignee: Uhde GmbH
    Inventors: Michael Wyschofsky, Vincent Liu
  • Patent number: 6533843
    Abstract: Scrubber liquid from an ethylene oxide process rich in bicarbonate and dissolved ethylene is flashed in two stages to separate ethylene containing vapor from bicarbonate rich solution reduced in ethylene content.
    Type: Grant
    Filed: June 5, 2001
    Date of Patent: March 18, 2003
    Assignee: Scientific Design Company, Inc.
    Inventors: Barry Billig, Chun Chan
  • Patent number: 6203599
    Abstract: The present invention provides a process for removing gas contaminants such as hydrogen sulfide and carbon dioxide from a product gas such as natural gas or synthesis gas. According to the invention the product gas is contacted with a solvent which includes dialkyl ethers of polyethylene glycols and water, and a high pressure recycle loop is utilized to desorb a portion the gas contaminants and co-absorbed product gas from the solvent. The solvent is provided with an amount of water sufficient to increase recovery of co-absorbed product gas while at the same time providing a reduced circulation rate requirement for the solvent and reduced re-compression and cooling requirements for the recycle gas.
    Type: Grant
    Filed: July 28, 1999
    Date of Patent: March 20, 2001
    Assignee: Union Carbide Chemicals & Plastics Technology Corporation
    Inventors: Craig Norman Schubert, William I. Echt
  • Patent number: 5447554
    Abstract: A method for pressurizing a gas using a liquid. The method comprises providing a liquid pump; providing a liquid for introducing to the liquid pump; introducing a gas to the liquid prior to the liquid entering the liquid pump; pumping the liquid and the gas through the liquid pump to provide a compressed mixture of the liquid and gas having an increased pressure; thereafter separating the gas from the liquid while both liquid and gas are under pressure; reducing the pressure of the liquid after the separation; and recirculating the liquid back to the liquid pump.
    Type: Grant
    Filed: January 3, 1994
    Date of Patent: September 5, 1995
    Inventor: C. Edward Eckert
  • Patent number: 5279646
    Abstract: A venturi scrubbing system optimized for removing the most optically active sized particles from a gaseous effluent stream is disclosed. Before entering the venturi the effluent stream is subcooled to cause condensation of water vapor and other condensibles, thereby greatly reducing the volume of the effluent stream. In the venturi stage a scrubbing liquid is added in the form of droplets having a median diameter which is optimized to remove the optically active particles. Preferably, the median diameter of the scrubbing liquid droplets is between 10 and 200 microns. A two-fluid nozzle may be used to efficiently form the droplets. After passing through the scrubbing stage, which may also comprise one or more impingement plates, the cleansed effluent may be passed through an afterburner to remove combustible materials such as organic vapors.
    Type: Grant
    Filed: June 25, 1992
    Date of Patent: January 18, 1994
    Assignee: Process and Control Technology Corporation
    Inventor: James J. Schwab