Abstract: An electron beam writing method for writing a fine pattern that includes servo patterns and groove patterns, the method including the step of adjusting an exposure amount of the resist by changing, when controlling application timing of the electron beam by an ON/OFF signal to a blanking unit that blocks the electron beam, an application duty ratio of the electron beam by the ON/OFF signal with respect to each writing radius position for each pattern based on sensitivity variation data of the resist with respect to post exposure delay for each pattern.

Abstract: A data storage system that includes a positioning system for positioning the write/read mechanism and the storage medium of the data storage device with respect to each other in first and second predefined directions. In several embodiments, the read/write mechanism is used to mechanically write data to and electrically read data from the storage medium. In still another embodiment, the read/write mechanism is used to optically write data to and electrically read data from the storage medium. In yet another embodiment, the read/write mechanism is acoustically aided in electrically writing data to and reading data from the storage medium.

Abstract: A method of drawing a pattern for magnetic transfer on a substrate, including the steps of rotating the substrate and scanning the substrate, by an electron beam, in a circumferential direction thereof, deflecting, using a deflection signal, the electron beam in a radial direction thereof, and switching irradiation of the electron beam on and off, so as to create the pattern of a plurality of dots.