Search Patents
  • Method and apparatus for applying a liquid emulsion to a screen
    Patent number: 5093160
    Abstract: A method and apparatus for applying a liquid emulsion to a screen. The apparatus includes a rotatable trough holding a liquid emulsion, which is mounted to allow the trough to rotate and coat the screen with the emulsion as the screen is moved over the trough.
    Type: Grant
    Filed: October 2, 1990
    Date of Patent: March 3, 1992
    Assignee: The Chromaline Corporation
    Inventors: Roderick D. Johnson, Jan N. Heath
  • Universal silk screen coating machine
    Patent number: 5346577
    Abstract: A universal coating machine includes a frame and means for securing either a holding means for a liquid emulsion or a means for supporting and supplying a film. The securing means is operatively connected to the frame. The securing means is rotatable between a first position and second position. The securing means is biased to return to the first position when the emulsion or film is being applied to the screen.
    Type: Grant
    Filed: October 7, 1991
    Date of Patent: September 13, 1994
    Assignee: The Chromaline Corporation
    Inventors: Roderick D. Johnson, Jan N. Heath
  • Sandblasting process with blastable pressure sensitive adhesive
    Patent number: 6037106
    Abstract: A novel pressure sensitive adhesive (PSA) for use in sandblasting operations to adhere a sandblast mask to a target surface is disclosed. The PSA comprises a non-elastomeric, thermoplastic resin and a tackifier in combination to produce a composition having a T.sub.g of at less than about -40.degree. C. which is both blastable and water redispersible.
    Type: Grant
    Filed: June 28, 1999
    Date of Patent: March 14, 2000
    Assignee: The Chromaline Corporation
    Inventor: Toshifumi Komatsu
  • Sandblast mask laminate with blastable pressure sensitive adhesive
    Patent number: 5989689
    Abstract: A sandblast mask laminate useful in sandblasting operations is disclosed. The laminate comprises a photoresist mask layer, a pressure sensitive adhesive composition comprising a non-elastomeric resin and a tackifier in combination to produce a composition having a T.sub.g of less than about -40.degree. C., a carrier film layer and a release liner.
    Type: Grant
    Filed: August 13, 1997
    Date of Patent: November 23, 1999
    Assignee: The Chromaline Corporation
    Inventor: Toshifumi Komatsu
  • Photosensitive resin composition
    Patent number: 6248498
    Abstract: Disclosed are photoresist compositions comprising a polymeric backbone and a quaternary heterocyclic pendant group, particularly usefull in the preparation of screen printing and sandblast etching photoresists. The pendant groups comprise furanyl substituted quaternary heterocyclic groups, as seen in the formula: where n ranges from 0 to 4 and Z denotes the atoms necessary to complete a substituted or unsubstituted nitrogen containing heterocyclic ring.
    Type: Grant
    Filed: December 7, 1999
    Date of Patent: June 19, 2001
    Assignee: The Chromaline Corporation
    Inventor: Alexander S. Gybin
  • Imageable photoresist laminate
    Patent number: 6605406
    Abstract: A photosensitive laminate structure including a carrier layer and a photosensitive layer is described. The photosensitive layer includes a polymeric photosensitive resin composition containing at least one cross-linkable unit represented by the formula: wherein X is an organic moity and Y is selected from the following group: wherein Z is selected from at least one of lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, and tetraalkylammonium.
    Type: Grant
    Filed: April 27, 2001
    Date of Patent: August 12, 2003
    Assignee: The Chromaline Corporation
    Inventors: Kyle Johnson, Toshifumi Komatsu, Jeremy William Peterson
  • Photoresist laminate including photoimageable adhesive layer
    Patent number: 5415971
    Abstract: A photosensitive mask laminate having a photoimageable, pressure sensitive adhesive layer and a photoimageable masking layer is disclosed. The laminate also includes a support layer, and it can include a removable carrier layer and a release layer. The laminate can be imaged by selective exposure to light or other radiation, and developing the laminate produces a mask having void and mask areas. The mask can then be used to protect selected portions of a target surface during a sandblast decorative process.
    Type: Grant
    Filed: April 2, 1993
    Date of Patent: May 16, 1995
    Assignee: The Chromaline Corporation
    Inventors: Ron Couture, Todd R. Murphy, Toshifumi Komatsu
  • Screen printing stencil composition with improved water resistance
    Patent number: 6503683
    Abstract: The invention resides in a photosensitive composition for screen printing. Preferably, the composition of the invention comprises a polymer comprising a vinylpyridine monomer or polymer having a pyridinium salt character and a photoreactable constituent. The resulting stencil, once dried, exposed, cured, and subjected to alkaline treatment obtains enhanced solvent/water resistance but can be reclaimed using an acidic wash. In use, the stencil provides a screen/stencil assembly or blockout utility of high structural integrity through repeated use and screen printing images of high resolution and quality.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: January 7, 2003
    Assignee: The Chromaline Corporation
    Inventors: Alexander S. Gybin, Kyle K. Johnson, Toshifumi Komatsu, Lawrence C. Vaniseghem
  • Devices and methods for exposure of photoreactive compositions with light emitting diodes
    Publication number: 20020192569
    Abstract: The present invention is directed to devices and methods for exposing photoreactive compositions. Specifically, the invention is directed to devices and methods for exposing photoreactive compositions with light from light emitting diodes (LEDs). In certain embodiments the device includes an apparatus for retaining a photosensitive substrate containing a photoreactive composition, a light emitting diode array containing a plurality of light emitting diodes, and a control mechanism for regulating the intensity and distribution of light emitted from the light emitting diode array. In such implementations the light emitting diodes are configured and arranged for controlled exposure of the photoreactive composition.
    Type: Application
    Filed: May 15, 2001
    Publication date: December 19, 2002
    Applicant: The Chromaline Corporation
    Inventors: William Charles Ulland, Alexander Sergeievich Gybin, Toshifumi Komatsu, Claude P.A. Piguet
  • Non-photosensitive aqueous blockout composition and blockout method for repairing flaws
    Patent number: 5654032
    Abstract: The invention resides in a photosensitive composition for screen printing. Preferably, the composition of the invention comprises a polymer comprising a vinylpyridine monomer or polymer having a pyridinium salt character and a photoreactable constituent. The resulting stencil, once dried, exposed, cured, and subjected to alkaline treatment obtains enhanced solvent/water resistance but can be reclaimed using an acidic wash. In use, the stencil provides a screen/stencil assembly or blockout utility of high structural integrity through repeated use and screen printing images of high resolution and quality.
    Type: Grant
    Filed: May 26, 1995
    Date of Patent: August 5, 1997
    Assignee: The Chromaline Corporation
    Inventors: Alexander S. Gybin, Kyle K. Johnson, Toshifumi Komatsu, Lawrence C. Vaniseghem
  • Screen printing stencil composition with improved water resistance
    Patent number: 5645975
    Abstract: The invention resides in a photosensitive composition for screen printing. Preferably, the composition of the invention comprises a polymer comprising a vinylpyridine monomer or polymer having a pyridinium salt character and a photoreactable constituent. The resulting stencil, once dried, exposed, cured, and subjected to alkaline treatment obtains enhanced solvent/water resistance but can be reclaimed using an acidic wash. In use, the stencil provides a screen/stencil assembly or blockout utility of high structural integrity through repeated use and screen printing images of high resolution and quality.
    Type: Grant
    Filed: May 26, 1995
    Date of Patent: July 8, 1997
    Assignee: The Chromaline Corporation
    Inventors: Alexander S. Gybin, Kyle K. Johnson, Toshifumi Komatsu, Lawrence C. Vaniseghem
  • Photosensitive resin composition
    Patent number: 6020436
    Abstract: A universal method to make photosensitive polymers from poly(vinyl alcohol) and poly(vinyl pyridine) is disclosed which generally does not require final purification. These polymers comprise a heterocyclic, light-sensitive pendant group including a moiety having the formula: ##STR1## wherein Z.sup.1 denotes the atoms necessary to form a substituted or unsubstituted aromatic heterocyclic ring; Z.sup.2 denotes the atoms necessary to form a substituted or unsubstituted aromatic or aromatic heterocyclic ring; R is hydrogen or a substituted or unsubstituted alkyl group; M is a divalent organic moiety; Y is a residue from a grafting group that is capable of grafting the pendant group onto a polymeric backbone.
    Type: Grant
    Filed: March 9, 1993
    Date of Patent: February 1, 2000
    Assignee: The Chromaline Corporation
    Inventors: Alexander S. Gybin, Lawrence C. Van Iseghem
  • Photosensitive resin composition
    Patent number: 5506089
    Abstract: A universal method to make photosensitive polymers from poly(vinyl alcohol) and poly(vinyl pyridine) is disclosed which generally does not require final purification and can produce photosensitive polymers which are of similar photosensity whether prepared with a poly(vinyl alcohol) or poly(vinyl pyridine) backbone. These polymers comprise a heterocyclic, light-sensitive pendant group including a moiety having the formula: ##STR1## wherein Z.sup.1 denotes the atoms necessary to form a substituted or unsubstituted aromatic heterocyclic ring; Z.sup.2 denotes the atoms necessary to form a substituted or unsubstituted aromatic or aromatic heterocyclic ring; R is hydrogen or a substituted or unsubstituted alkyl group; M is a divalent organic moiety; Y is a residue from a grafting group that is capable of grafting the pendant group onto a polymeric backbone.
    Type: Grant
    Filed: February 14, 1994
    Date of Patent: April 9, 1996
    Assignee: The Chromaline Corporation
    Inventors: Alexander S. Gybin, Lawrence C. Van Iseghem
  • Integral membrane layer formed from a photosensitive layer in an imageable photoresist laminate
    Patent number: 6140006
    Abstract: An integral membrane can be formed in sheet-like photosensitive laminate structures. The process for forming the structure involves coating a first relatively thin photosensitive layer on a substrate or carrier film, then forming a second relatively thicker photosensitive layer (when compared to the first layer) on the first layer. The structure is exposed by directing appropriate actinic radiation against the substrate, film or carrier layer under controlled conditions such that only the first layer is substantially exposed to radiation resulting in polymerization or crosslinking and a substantial reduction in the solubility of the first layer. The relatively thinner less soluble layer then acts as a peelable integral release layer in the photosensitive structure. The thicker second layer can then be imagewise exposed to actinic radiation, and then used conventionally in imaging processes such as sandblasting.
    Type: Grant
    Filed: June 15, 1998
    Date of Patent: October 31, 2000
    Assignee: The Chromaline Corporation
    Inventors: Toshifumi Komatsu, Alexander S. Gybin, Kyle Johnson, Dylan E. MacLean
  • Adherent sandblast photoresist laminate
    Patent number: 4764449
    Abstract: A sandblast photoresist laminate article of manufacture comprising an adhesive layer, a membrane support layer, and a resist layer can be used in etching the surface of articles with a pattern which can be revealed by the resist layer. The resist laminate is usable in a variety of modes of etching such as exposing the resist with a pattern, developing the pattern, applying the developed resist to the object, and etching the pattern into the object. Further, the resist can be used by applying the unexposed sheet-like resist to an object, exposing the resist with a pattern, developing the pattern and etching the pattern into the object. Lastly, the resist laminate can be used by exposing the resist with a pattern, applying the exposed resist to an object, developing the pattern, and etching the pattern into the object. The resist compositions are typically water developable after exposure with actinic radiation.
    Type: Grant
    Filed: November 1, 1985
    Date of Patent: August 16, 1988
    Assignee: The Chromaline Corporation
    Inventor: Lawrence C. VanIseghem
  • Acid soluble photo-resist comprising a photosensitive polymer
    Patent number: 5334485
    Abstract: Photosensitive, photocurable, compositions contain a polymeric backbone which are basic in an aqueous environment having a pendant photosensitive group. The pendant groups are styryl-amine or nitrogen heterocyclic groups which contain an ethylenically unsaturated photocross-linking group. The pendant styryl-amine or nitrogen heterocyclic groups can cross-link two polymer chains by photo addition through ethylenically unsaturated groups in the styryl moiety forming a cyclobutane crosslinked site. The cross-linking is accomplished by irradiating the material with visible light or ultraviolet radiation of appropriate wave length, depending on the absorbitivity of the system. The photocurable polymer can be formulated into useful systems including in liquid resists, pre-coated film resists, etc. and can be used in both negative or positive imaging systems.
    Type: Grant
    Filed: November 5, 1991
    Date of Patent: August 2, 1994
    Assignee: The Chromaline Corporation
    Inventors: Lawrence C. Van Iseghem, Alexander S. Gybin
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