Abstract: A novel organoboron polymer and its method of preparation is claimed. The organoboron polymer has a backbone having a repeating unit comprising at least one carboranyl group, at least two acetylenic groups, and one or more silyl or siloxanyl groups.

Abstract: One of the critical experimental parameters affecting the quality and gro rate of chemical vapor deposition species, such as, diamond is the substrate temperature. An apparatus and technique for the precise control of the substrate temperature in a chemical vapor deposition environment has been developed. In a preferred embodiment, the technique uses a variable gas mixture in conjunction with the disclosed apparatus of the present invention to precisely control the temperature of the substrate to within at least .+-.20.degree. C. for extended periods of time and over large area substrates on the order of 1" in diameter or larger.

Abstract: A novel apparatus and method for the cyclic growth-etch deposition of diamond on a substrate by flame chemical vapor deposition (CVD) is developed. The cyclic growth-etch diamond deposition is accomplished by placing a suitable substrate to be coated under a CVD flame and providing a disk or face plate or other shapes having one or more teeth (or holes) wherein upon rotation of the disk, or face plate, or other shape, the teeth attached to the disk, or face plate, or other shape obstruct the path of the CVD flame from contacting the substrate at a desired time scale of .tau..sub.growth and t.sub.cycle to produce high quality (FWHM of 1-3.5 cm.sup.-1) diamond.

Abstract: This invention relates to a new class of novel inorganic-organic hybrid thermosetting polymers and ceramics that are formed from novel linear polymers of varying molecular weight and varying carborane content. These novel organoboron thermoset polymers and ceramics contain an unsaturated cross-linked moiety.

Abstract: The lipids of this invention are derivatives of phosphatidyl choline having the general chemical formula: ##STR1## wherein at least one of R and R' is a polymerizable unsaturated alkyl group, acid or ester, wherein X includes an iminodiacetic acid in the polymerizable metal chelating lipid (2) and wherein z is an integer from 1-20 including 1 and 20. Lipid microstructures are formed by mixing the polymerizable metal chelating lipid monomers (2) with polymerizable non-chelating lipid monomers wherein X includes a non-chelating group, for example, --N.sup.+ (CH.sub.3).sub.3.

Abstract: A non-optical method for the formation of sub-half micron holes, vias, or trenches within a substrate. For example, a substrate having at least two buttresses or a trench having a interbuttress distance or a width of 1.0 to 0.5 microns, respectively, is conformally or non-conformally lined with a layer material. Thereafter, the layer material from horizontal surfaces is removed to expose the substrate underneath while leaving the layer material attached to the essentially vertical walls of the buttresses or the trenches essentially intact, thereby, narrowing the interbuttress distance or the trench width, respectively, to sub-half micron dimensions. The exposed substrate surface is then subjected to anisotropic etching to form sub-half micron trenches, holes or vias in the substrate. Finally, the buttresses and layer material are removed from the substrate.

Abstract: A combination tapered V number matching optical fiber probe is disclosed. The combination taper consists of a first short tapered section along the unclad, distal end of an optical fiber. The first short tapered section has a taper angle steeper than the taper angle of the second tapered section also along the unclad, most distal end of the optical fiber. The first short tapered section is adjacent to and proximal to the second tapered section. Proximal to the unclad, combination tapered section of the optical fiber is the cladded portion of the optical fiber. The cladding surrounds the core of the fiber. The optical fiber is used in conjunction with, for example, fluorescence assays as described herein.

Abstract: A non-optical method for the formation of sub-half micron holes, vias, or trenches within a substrate. For example, a substrate having at least two buttresses or a trench having a interbuttress distance or a width of 1.0 to 0.5 microns, respectively, is conformally or non-conformally lined with a layer material. Thereafter, the layer material from horizontal surfaces is removed to expose the substrate underneath while leaving the layer material attached to the essentially vertical walls of the buttresses or the trenches essentially intact, thereby, narrowing the interbuttress distance or the trench width, respectively, to sub-half micron dimensions. The exposed substrate surface is then subjected to anisotropic etching to form sub-half micron trenches, holes or vias in the substrate. Finally, the buttresses and layer material are removed from the substrate.