Abstract: The height of the photo-resist layer “banks” which define pockets for inkjet printing or other patterned processes is optimized to provide a more uniform drying profile for substances which are to be deposited in those pockets and dried therein. Preferably, the height of the photo-resist layer is less than or equal to about three microns and more, preferably, about one micron.
Type:
Grant
Filed:
January 14, 2004
Date of Patent:
April 4, 2006
Assignee:
Osram Opto Semiconductors GmbH
Inventors:
Rahul Gupta, Andrew Ingle, Sriram Natarajan