Abstract: A ferroelectric memory device includes a channel layer of a dielectric material containing oxygen, source and drain electrode provided on the channel layer across a channel region defined in the channel layer, a ferroelectric memory layer provided on the channel layer so as to cover at least the channel region, and a write control electrode provided on the ferroelectric memory layer for applying an electric field thereto.
Type:
Grant
Filed:
May 12, 1995
Date of Patent:
April 22, 1997
Assignee:
Fujitsu Limited
Inventors:
Kohtaroh Gotoh, Hirotaka Tamura, Akira Yoshida