Abstract: A ring oscillator circuit having an odd plurality of inverter stages (i.e., 2N+1 stages). In accordance with one embodiment of the present invention, only one of the inverter stages is operated in response to a variable input voltage, while the remaining inverter stages are operated in response to a highly filtered constant input voltage. The inverter stages that operate in response to the constant input voltage oscillate at a base frequency. The inverter stage that operates in response to the variable input voltage causes the frequency of the output signal to deviate from the base frequency by an amount determined by the variable input voltage. In this manner, the variable voltage inverter stage implements frequency control for the ring oscillator. The gain of the ring oscillator circuit is reduced by a factor of (2N+1) with respect to the gain of a conventional ring oscillator.

Abstract: A BIST architecture that allows efficient compression and application of deterministic ATPG patterns while tolerating uncertain bits is provided. In accordance with one feature of the invention, a large number of short scan chains can be configured between a decompressor and an observe selector. The observe selector selectively presents values of specific scan chains or scan cells to an external tester, thereby significantly reducing test data and test cycles. Advantageously, the core of the tested device is not changed as would be the case in BIST architectures including MISRs. Moreover, test points or logic to block uncertain bits do not need to be inserted. Furthermore, the loaded care bits for the scan chains as well as the bits for controlling the observe selector can be deterministically controlled, thereby providing optimal testing flexibility.

Abstract: A system and method of analyzing defects on a mask used in lithography are provided. A defect area image is provided as a first input, a set of lithography parameters is provided as a second input, and a set of metrology data is provided as a third input. The defect area image comprises an image of a portion of the mask. A simulated image can be generated in response to the first input. The simulated image comprises a simulation of an image that would be printed on a wafer if the wafer were exposed to a radiation source directed at the portion of the mask. The characteristics of the radiation source comprise the set of lithography parameters and the characteristics of the mask comprise the set of metrology data.

Abstract: A CAM system is provided for determining which data word in a CAM array exhibits the longest continuous, unmasked match with an input data value. The input data value is divided into non-overlapping subfields, thereby creating a series of keys, the first key of the series including either the least significant bit (LSB) or most significant bit (MSB) of the input data value. The CAM array is divided along columns into a similar series of non-overlapping sub-arrays corresponding to the subfields defined by the series of keys. A first CAM sub-array compares the first key with its stored rows of data bit values to generate a first match signal. The first match signal disables each row of the second CAM sub-array for which the corresponding row of the first CAM sub-array did not show a match. A second CAM sub-array then compares the second key with its enabled rows to generate a second match signal.