Patents Represented by Attorney Birget E. Morris

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  • Depositing polysilicon films having improved uniformity and apparatus therefor
    Patent number: 5576059
    Abstract: A barrier to prevent reactant gases from reaching the surfaces of a susceptor support for a substrate upon which polysilicon films are to be deposited provides improved uniformity of the depositing film across the substrate, and prevents substrate-to-substrate variations during sequential depositions. A suitable barrier includes a preheat ring extension that mates with an extension of the susceptor support.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: November 19, 1996
    Assignee: Applied Materials, Inc.
    Inventors: Israel Beinglass, Mahalingam Venkatesan, Christian M. Gronet