Abstract: A force or pressure sensor includes a monocrystalline silicon diaphragm coated with silicon dioxide upon which single crystalline silicon resistors are fused in a low profile pattern on the surface. The resistors are almost perfectly electrically isolated from each other and from the underlying silicon substrate. The structure is fabricated by forming resistors in a first wafer and then affixing that surface of the first wafer to the silicon dioxide layer on the second wafer. All of the first wafer except for the resistors has been removed, and metal contact capable of resisting elevated temperatures are formed to provide electrical connections to the resistors.