Abstract: A process for removing photoresist from semiconductor wafers is disclosed wherein at least one semiconductor wafer having at least one layer of photoresist is positioned in a process tank; ozone gas is provided to said process tank; and said semiconductor wafer is spayed with a mixture of ozone and deionized water via at least one nozzle. The temperature during the process is maintained at or above ambient temperature. The ozone gas supplied to the tank is preferably under pressure within said process tank and the nozzles preferably spray the mixture of deionized water and ozone at a nozzle pressure between 5 and 10 atmospheres. In another embodiment, the invention is an apparatus for carrying out the process.

Abstract: A system and method for reducing the amount of contaminants that come into contact with wafer substrates during the production of integrated circuit devices. The system allows for uniform overflow of processing liquid from a process tank while preventing contaminants from reentering the process tank and contacting the wafers. The system in one aspect comprises an inner weir with a top surface, and overflow wall with at least one recess having a bottom, and a structure, the structure connecting the overflow wall and the inner weir to form a drainage basin with at least one drain hole; wherein the top surface of the inner weir is below the bottom of the at least one recess.

Abstract: An apparatus, system, and method of storing and transferring a canister of spent nuclear fuel. In one aspect, the apparatus is a lid for a ventilated vertical overpack having a chamber for receiving spent nuclear fuel, the lid having ventilation ducts. In one aspect, the system comprises: a lid for a ventilated vertical overpack having a chamber for receiving spent nuclear fuel, the lid having ventilation ducts; and a ventilated vertical overpack having a cylindrical body including lower ventilation ducts, a bottom, and a chamber formed by the body and the bottom adapted for receiving a canister of spent nuclear fuel.

Abstract: An apparatus for deploying cable in a body of water comprising an autonomous underwater vehicle (AUV) capable of converting vertical motion into horizontal travel, having a housing and means to deploy cable in a body of water. The cable, usually a cable sensor array, is released from a cable storage section of the AUV as the AUV glides. Vertical motion can be provided by buoyancy change, by dropping the AUV into the water, or by release of the AUV from a weighted bunker at the bottom.