Abstract: The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.

Abstract: The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.

Abstract: The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90° C. and developing the image. The present invention also relates to a method for generating a photoresist image on a substrate where a polymer comprising fluorocarbinol monomers is used as a protective top coat.

Abstract: Provided is a pharmaceutical composition comprising tyrosine, an optionally modified allergen, and 3-DMPL, which is useful in the prevention and treatment of allergies.

Abstract: A base sequence cluster generating system, method, and program product for performing cluster generation is provided. This is accomplished utilizing a computer system having a database containing base sequences which receives a query sequence. The computer uses spliced base sequences as a query sequence to generate a first cluster including base sequences that are likely to constitute a spliced pair with the query sequence. Spliced alignment is applied to the generated first cluster to generate a second cluster including spliced pairs. The generated second cluster is returned to the requester.

Abstract: The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.

Abstract: The present invention relates to a method for using compositions comprising poly-oxycarbosilane in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer and a pore generator.

Abstract: An antigen-containing formulation is provided, comprising: (a) an antigen; (b) a TH1-inducing adjuvant; and (c) a sparingly soluble amino acid or a derivative thereof. The adjuvant may be, for example, monophosphoryl lipid A, 3?-de-O-acetylated monophosphoryl lipid A, derivatives thereof, or any other adjuvant that enhances an individual's TH1 response to the antigen. Suitable amino acids include tyrosine, tryptophan, derivatives thereof, and the like. Methods for using the formulation are also provided; in a particularly preferred embodiment, the formulation is used as a vaccine.

Abstract: A vacuum release device is provided for temporarily immobilizing objects, the device comprising: a substrate; a plurality of vacuum release subunits which can be operated independent of each other, each vacuum release subunit comprising an adhesive layer over a surface of the substrate; and a spacing material positioned between the substrate and the adhesive layer so as to form a chamber within which a vacuum may be formed, application of the vacuum causing the adhesive layer to recess toward the chamber.

Abstract: Provided is a pharmaceutical composition comprising tyrosine, an optionally modified allergen, and 3-DMPL, the composition is useful in the prevention and treatment of allergies.